JP2009117683A - Device and method for manufacturing electromagnetic wave shielding film and patterning method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To automatically select an electromagnetic wave shielding pattern which suppresses the production of moire and avoids the increase of surface resistivity and the deterioration of transparency. <P>SOLUTION: An electromagnetic wave shielding film includes: a comparing part 34 for obtaining a relative distance between the spectrum peak of a two-dimensional Fourier spectrum for pixel array pattern data, and the spectrum peak of a two-dimensional Fourier spectrum for electromagnetic wave shielding pattern data; a determining part 36 for determining whether or not the obtained relative distance exceeds a predetermined space frequency; and a pattern data processing part 38 for deforming the electromagnetic wave shielding pattern data to be input to the comparing part 34 when it is determined that the relative distance does not exceed the predetermined space frequency, and for storing the electromagnetic wave shielding pattern data as selected electromagnetic wave shielding pattern data in a recording medium 64 when it is determined that the relative distance exceeds the predetermined space frequency. It is manufactured in accordance with the selected electromagnetic shield pattern data. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention is an apparatus for manufacturing an electromagnetic wave shielding film in which an electromagnetic wave shielding pattern for shielding electromagnetic waves generated from the display apparatus is formed, a method for manufacturing the electromagnetic wave shielding film, and the generation of moire are installed in a display device such as a plasma display. The present invention relates to a pattern generation method that can be performed.

  2. Description of the Related Art In recent years, with the increase in use of various electric facilities and electronic application facilities, electromagnetic interference (Electro-Magnetic Interference: EMI) has increased rapidly. EMI has been pointed out to be a cause of malfunction and failure of electronic and electrical equipment, as well as a health hazard to operators of these devices. For this reason, electronic / electrical devices are required to keep the intensity of electromagnetic wave emission within the standards or regulations.

  In order to prevent EMI, it is necessary to shield the electromagnetic wave. For this purpose, the property of not allowing the metal electromagnetic wave to penetrate may be used.

  As an electromagnetic shielding film for a plasma display panel (PDP) having excellent translucency and high electromagnetic shielding properties, a method using a metal mesh formed on a film is generally used. However, when such a film is used for a PDP, moire may occur due to interference with a PDP pixel pattern.

  For example, conventionally used fiber mesh has a thick line width to ensure conductivity, and is in a state where moire is likely to occur (see, for example, Patent Document 1). For reducing moire, it is effective to thin the mesh pattern. For example, Patent Document 2 shows that a thin line of about 10 μm can be obtained with a copper foil etching mesh.

  In addition to the above, as a film on which a metal mesh is formed, Patent Documents 3 to 5 disclose that electroless plating is performed by printing metal fine particles as a catalyst and depositing a conductive metal on the printed metal fine particles. Is disclosed. Patent Documents 6 and 7 propose a mesh pattern forming method using a silver salt diffusion transfer method.

  On the other hand, a method of forming a conductive mesh with conductive metal silver obtained by developing silver halide, or a method of forming a conductive mesh by plating metal copper on mesh-shaped developed silver obtained by developing silver halide. A forming method has also been proposed (see, for example, Patent Document 8).

  For example, Patent Document 9 is known as a method for obtaining a pattern for suppressing moire. This patent document 9 is used for a digital copying machine. The sum and difference (moire frequency) of a frequency vector of an original image and a frequency vector of an AM screen are obtained, and the obtained moire frequency is less than 110 lines. In such a case, a warning is given that moire has occurred, and the AM screen is switched to a green noise halftone based on a change request from the user.

JP-A-5-327274 JP 2003-46293 A JP 11-170420 A JP 2004-68119 A JP 2004-68120 A International Publication No. 04/7810 Pamphlet JP 2004-172041 A JP 2004-221564 A JP 2007-129558 A

  As described above, the detection of the occurrence of moire corresponding to a digital copying machine is described in Patent Document 9, but occurs due to interference with an electromagnetic wave shielding pattern constituting an electromagnetic wave shielding film, in particular, a pixel arrangement pattern of the display device. At present, no consideration is given to a method for producing an electromagnetic shielding film by selecting a pattern that suppresses the generation of moire.

  In addition, when selecting an electromagnetic wave shielding pattern, characteristics of the electromagnetic wave shielding film, for example, surface resistivity and transparency must be taken into consideration, and it is not a simple matter that a pattern that does not cause moiré is simply selected.

  The present invention has been made in view of such circumstances, and can suppress the occurrence of moire, and can also avoid the characteristics of the electromagnetic wave shielding film, in particular, the increase in surface resistivity and the deterioration of transparency. An object of the present invention is to provide an electromagnetic shielding film manufacturing apparatus and manufacturing method capable of automatically selecting an appropriate pattern and manufacturing an electromagnetic shielding film suitable for a display device to be installed.

  Another object of the present invention is to provide a pattern generation method capable of suppressing the occurrence of moire.

  An electromagnetic wave shielding film manufacturing apparatus according to a first aspect of the present invention is an electromagnetic wave shielding film manufacturing apparatus provided with an electromagnetic wave shielding pattern that is installed in a display device and shields electromagnetic waves generated from the display device. A pattern selection processing unit that selects electromagnetic wave shield pattern data that suppresses moire associated with interference with the pixel array pattern, the pattern selection processing unit including a spectrum peak of a two-dimensional Fourier spectrum of the pixel array pattern data and the electromagnetic wave A comparison unit for obtaining a relative distance of a spectrum peak of a two-dimensional Fourier spectrum of shield pattern data, a determination unit for determining whether the relative distance obtained by the comparison unit exceeds a predetermined spatial frequency, and the determination unit The relative distance exceeds the predetermined spatial frequency at If it is determined that the relative distance exceeds the predetermined spatial frequency, the electromagnetic wave shield pattern data is transformed and input to the comparison unit. A pattern data processing unit for storing shield pattern data in the storage unit as selected electromagnetic wave shield pattern data, and manufacturing an electromagnetic wave shield film based on the selected electromagnetic wave shield pattern data .

  In the first aspect of the present invention, the pattern selection processing unit further includes a first input unit that inputs pixel array pattern data of the display device, a second input unit that inputs the electromagnetic wave shield pattern data, A pattern deformation unit that changes any one or more of the rotation angle, pitch, and pattern width of the electromagnetic wave shield pattern data; a first calculation unit that calculates a first two-dimensional Fourier spectrum of the input pixel array pattern data; A second calculation unit that calculates a second two-dimensional Fourier spectrum of the input electromagnetic wave shield pattern data or the electromagnetic wave shield pattern data from the pattern deformation unit, and the comparison unit is the first obtained The first two-dimensional Fourier spectrum is compared with the second two-dimensional Fourier spectrum. Obtaining the relative distance between the spectrum peak of the spectrum and the spectrum peak of the second two-dimensional Fourier spectrum, the determination unit determines whether the relative distance obtained by the comparison unit exceeds a predetermined spatial frequency, The pattern data processing unit inputs the electromagnetic wave shield pattern data to the pattern deformation unit when the determination unit determines that the relative distance does not exceed the predetermined spatial frequency, and inputs the electromagnetic wave shield pattern data to the determination unit. When it is determined that the relative distance exceeds the predetermined spatial frequency, the electromagnetic wave shield pattern data may be stored in the storage unit as selected electromagnetic wave shield pattern data.

In this case, the predetermined spatial frequency is preferably 8 cm ⁻¹ . As a result, the moire frequency becomes high and is not visually recognized by human eyes due to human visual characteristics.

  Also, in the first aspect of the present invention, among the information table in which the range of the manufacturable pitch and the range of the pattern width are registered, and the plurality of electromagnetic wave shield pattern data stored in the storage unit, the information is registered in the information table. A first pattern selection unit for selecting one or more electromagnetic wave shield pattern data satisfying the manufacturable pitch range and pattern width range, and the electromagnetic wave selected by the first pattern selection unit An electromagnetic wave shield film may be manufactured based on the shield pattern data. In this case, the electromagnetic wave shield pattern data corresponding to the operational input from the operation unit is selected from the operation unit for inputting an operation instruction by the user and the one or more electromagnetic wave shield pattern data selected by the pattern selection unit. The electromagnetic wave shielding film may be manufactured based on the electromagnetic wave shielding pattern data selected by the second pattern selecting unit.

  Next, the method for producing an electromagnetic wave shielding film according to the second aspect of the present invention is the method for producing an electromagnetic wave shielding film, wherein the electromagnetic wave shielding film is installed in a display device and formed with an electromagnetic wave shielding pattern for shielding electromagnetic waves generated from the display device. A pattern selection processing step of selecting electromagnetic wave shield pattern data for suppressing moire associated with interference with the pixel arrangement pattern of the display device; and a manufacturing step of manufacturing an electromagnetic wave shield film based on the selected electromagnetic wave shield pattern data. The pattern selection processing step includes a comparison step for obtaining a relative distance between a spectrum peak of the two-dimensional Fourier spectrum of the pixel array pattern data and a spectrum peak of the two-dimensional Fourier spectrum of the electromagnetic wave shield pattern data; Gain A step of determining whether or not the relative distance exceeds a predetermined spatial frequency, and the electromagnetic shielding pattern when the determination unit determines that the relative distance does not exceed the predetermined spatial frequency. Data is transformed and input to the comparison step, and when the relative distance is determined to exceed the predetermined spatial frequency by the determination unit, the electromagnetic wave shield pattern data is selected as the selected electromagnetic wave shield pattern. A pattern data processing step for storing the data in a storage unit as data.

  In the second aspect of the present invention, the pattern selection processing step further includes a first input step for inputting pixel array pattern data of the display device, a second input step for inputting the electromagnetic wave shield pattern data, A pattern deformation step for changing any one or more of the rotation angle, pitch, and pattern width of the electromagnetic wave shield pattern data; a first calculation step for calculating a first two-dimensional Fourier spectrum of the input pixel array pattern data; A second calculation step of calculating a second two-dimensional Fourier spectrum of the input electromagnetic wave shield pattern data or the electromagnetic wave shield pattern data from the pattern deforming unit, and the comparing step includes the obtained first A two-dimensional Fourier spectrum and the second two-dimensional Fourier spectrum. And the relative distance between the spectrum peak of the first two-dimensional Fourier spectrum and the spectrum peak of the second two-dimensional Fourier spectrum is determined, and the determination step includes the relative distance obtained by the comparison unit. The pattern data processing step determines whether the relative distance does not exceed the predetermined spatial frequency in the determination step. Is input to the pattern deformation step, and the electromagnetic shielding pattern data is stored as the selected electromagnetic shielding pattern data when it is determined in the determining step that the relative distance exceeds the predetermined spatial frequency. You may make it memorize | store in a part.

In the second aspect of the present invention, the predetermined spatial frequency is preferably 8 cm ⁻¹ .

  Further, in the second aspect of the present invention, an information table in which a manufacturable pitch range and a pattern width range are registered is used, and the information table among the plurality of electromagnetic wave shield pattern data stored in the storage unit. The electromagnetic wave shield pattern data selected in the pattern selection step, the pattern selecting step selecting one or more electromagnetic wave shield pattern data satisfying the manufacturable pitch range and pattern width range registered in An electromagnetic wave shielding film may be manufactured based on the above.

  In this case, an electromagnetic wave shield pattern data corresponding to an operational input from the operation unit is selected from the one or more electromagnetic wave shield pattern data selected in the pattern selection step using an operation unit that inputs an operation instruction by the user. The electromagnetic wave shielding film may be manufactured based on the electromagnetic wave shielding pattern data selected in the second pattern selecting step.

  Next, a pattern generation method according to a third aspect of the present invention includes a pattern selection processing step of selecting a second pattern that suppresses moire caused by interference with the first pattern, and the selected second pattern. Generating a pattern based on data, wherein the pattern selection processing step includes a spectral peak of a two-dimensional Fourier spectrum of the first pattern data and a spectral peak of a two-dimensional Fourier spectrum of the second pattern data. A comparison step for obtaining a relative distance, a determination step for determining whether the relative distance obtained by the comparison unit exceeds a predetermined spatial frequency, and the relative distance determined by the determination unit by the predetermined spatial frequency. If it is determined that the second pattern data is not exceeded, the second pattern data is transformed and input to the comparison step. A pattern processing step of storing the second pattern data in the storage unit as the selected second pattern data when the determination unit determines that the relative distance exceeds the predetermined spatial frequency; It is characterized by having.

  As described above, according to the manufacturing apparatus and the manufacturing method of the electromagnetic wave shielding film according to the present invention, it is possible to suppress the occurrence of moire and, moreover, the characteristics of the electromagnetic wave shielding film, in particular, the increase in surface resistivity and the deterioration of transparency. It is possible to automatically select an electromagnetic wave shielding pattern that can avoid the problem and to manufacture an electromagnetic wave shielding film suitable for a display device to be installed.

  In addition, according to the pattern generation method of the present invention, it is possible to suppress the occurrence of moire.

  Embodiments of an electromagnetic shielding film manufacturing apparatus, an electromagnetic shielding film manufacturing method, and a pattern generation method according to the present invention will be described below with reference to FIGS.

  An apparatus for manufacturing an electromagnetic wave shielding film according to the present embodiment (hereinafter simply referred to as manufacturing apparatus 10) is installed in a display device such as a plasma display, and an electromagnetic wave shielding pattern for shielding electromagnetic waves generated from the display device is formed. It is suitable for manufacturing an electromagnetic shielding film.

  As shown in FIGS. 1 and 2, the electromagnetic wave shielding film 12 includes a transparent support 14 and a mesh-like conductive metal thin film formed on the transparent support 14, that is, an electromagnetic wave shielding pattern 16. In addition, in order to distinguish the electromagnetic shielding pattern 16 of the mesh-like electroconductive metal thin film which comprises the electromagnetic shielding film 12, and the electromagnetic shielding pattern processed by the manufacturing apparatus 10 mentioned later, data is manufactured in the manufacturing apparatus 10. The processed electromagnetic shield pattern is referred to as electromagnetic shield pattern data.

  As shown in FIG. 3, the manufacturing apparatus 10 according to the present embodiment is selected with a pattern selection processing apparatus 20 that selects electromagnetic wave shield pattern data that suppresses moire associated with interference with the pixel arrangement pattern of the display apparatus. And a production line 21 for producing the electromagnetic shielding film 12 based on the electromagnetic shielding pattern data.

  First, as shown in FIG. 3, the pattern selection processing device 20 includes an input device 22 such as a keyboard and a mouse (coordinate input device), a first input unit 24, a second input unit 26, and a pattern deformation unit 28. The first calculation unit 30, the second calculation unit 32, the comparison unit 34, the determination unit 36, the pattern data processing unit 38, the first pattern selection unit 40, the second pattern selection unit 42, and the monitor 44. And have. These units are controlled by a computer (not shown).

  The first input unit 24 includes a first memory 46, and an operation input to the input device 22, for example, from the first database 48 in which pixel array pattern data of the manufactured display device and the display device in the manufacturing process is registered. Based on the above, the pixel array pattern data of the target display device is read out and stored in the first memory 46.

  The second input unit 26 includes a second memory 50, and, for example, one electromagnetic wave based on an operation input to the input device 22 from the second database 52 in which a plurality of predesigned electromagnetic wave shield pattern data is registered. The shield pattern data is read and stored in the second memory 50.

  The pattern deforming unit 28 includes a rotation angle changing unit 54, a pitch changing unit 56, and a pattern width changing unit 58. The rotation angle changing unit 54 rotates the electromagnetic wave shield pattern data stored in the second memory 50 in one direction (for example, clockwise) by an angle θ = 1 ° (see FIG. 2) to obtain new electromagnetic wave shield pattern data. Store in the second memory 50. That is, the electromagnetic wave shield pattern data before change is rewritten (overwritten) with the electromagnetic wave shield pattern data after change. As shown in FIG. 2, the pitch changing unit 56 narrows or widens the pitch P (see FIG. 2) of the electromagnetic wave shield pattern data stored in the second memory 50 by 0.1 μm as new electromagnetic wave shield pattern data, The second memory 50 is overwritten. The pattern width changing unit 58 narrows or widens the pattern width W (see FIG. 2) of the input electromagnetic wave shield pattern data by 0.1 μm to obtain new electromagnetic wave shield pattern data, and overwrites the second memory 50.

  The pattern deformation procedure includes pattern deformation only by the rotation angle changing unit 54, pattern deformation by only the pitch changing unit 56, pattern deformation by only the pattern width changing unit 58, the rotation angle changing unit 54, and the pitch changing unit 56. Pattern deformation in combination, pattern deformation by combining rotation angle changing unit 54 and pattern width changing unit 58, pattern deformation by combining pitch changing unit 56 and pattern width changing unit 58, rotation angle changing unit 54, pitch changing unit 56 and the pattern width changing unit 58 are combined.

  The first arithmetic unit 30 includes a third memory 60, and performs a Fourier transform on the pixel array pattern data read to the first memory 46 by the first input unit 24, thereby obtaining a two-dimensional Fourier spectrum (first first) of the pixel array pattern. 2D Fourier spectrum). This data is stored in the third memory.

  For example, as a pixel arrangement pattern, as shown in FIG. 4, a two-dimensional Fourier spectrum in a case where a lattice-like pattern in which a large number of vertical lines are arranged in the column direction and a large number of horizontal lines are arranged in the row direction is shown in FIG. Strength characteristics as shown in FIG. Note that the numbers in FIG. 4 indicate the ratio between the line width and the distance between lines. Moreover, in FIG. 5, the black part has high intensity | strength and has shown the spectrum peak.

  The second calculation unit 32 includes a fourth memory 62, and performs Fourier transform on the electromagnetic shielding pattern data stored in the second memory 50 to obtain a two-dimensional Fourier spectrum (second two-dimensional Fourier spectrum) of the electromagnetic shielding pattern data. Spectrum). This data is stored in the fourth memory 62.

  For example, as an electromagnetic wave shield pattern, as shown in FIG. 6, a two-dimensional Fourier spectrum assuming a mesh pattern of line width: interline distance = 2: 43 has intensity characteristics as shown in FIG. In FIG. 7, the black portion has a high intensity and shows a spectrum peak.

  The comparison unit 34 compares the first two-dimensional Fourier spectrum stored in the third memory 60 with the second two-dimensional Fourier spectrum stored in the fourth memory 62, and the spectral peak of the first two-dimensional Fourier spectrum. And the relative distance between the spectral peaks of the second two-dimensional Fourier spectrum. There are a plurality of first two-dimensional Fourier spectrum peaks and a plurality of second two-dimensional Fourier spectrum peaks. Since the comparison is made between a plurality of values, a plurality of relative distance values are also obtained. For example, when there are 100 spectrum peaks of the first two-dimensional Fourier spectrum and 100 second 2D Fourier spectrum peaks, the number of relative distances to be obtained is 100 × 100 = 10000. If the number of relative distances required is large and the calculation process takes time, it is possible to select only the first 2D Fourier spectrum peak and the second 2D Fourier spectrum peak that have strong peak intensities in advance. Good. In that case, only the relative distance between the selected peaks is obtained.

As an example, for example, the two-dimensional Fourier spectrum (first two-dimensional Fourier spectrum) of the pixel array pattern shown in FIG. 5 and the two-dimensional Fourier spectrum (second two-dimensional Fourier spectrum) of the electromagnetic wave shielding pattern shown in FIG. The strength characteristics are shown in FIG. In FIG. 8, a pair of spectral peaks in which the intensity of the spectral peaks is strong and the relative distance recognized as moire is 8.0 cm ⁻¹ or less is extracted in an enlarged view. In the enlarged view of FIG. 8, the position of the spectrum peak P1 of the first two-dimensional Fourier spectrum is 45.6 cm ⁻¹ and the position of the spectrum peak P2 of the second two-dimensional Fourier spectrum is 47.0 cm ⁻¹ . . Therefore, the relative distance of each spectral peak is | 47.0-45.6 | = 1.4 cm ⁻¹ .

  The determination unit 36 determines whether the relative distance obtained by the comparison unit 34 exceeds a predetermined spatial frequency. Here, FIG. 9 is a graph showing the contrast sensitivity based on the spatial frequency and human visual characteristics. From FIG. 9, when the spatial frequency is higher than fa, the contrast sensitivity is lowered, and when the spatial frequency is lower than fa, the contrast is high. From this, it can be seen that the human eye becomes more difficult to perceive the contrast as the spatial frequency becomes higher, and the moire becomes invisible.

Therefore, as a predetermined spatial frequency, a critical spatial frequency where moire cannot be visually recognized is cited as a candidate, and for example, 8 cm ⁻¹ is set as the critical spatial frequency. Accordingly, the determination unit 36 determines whether or not the relative distance obtained by the comparison unit 34 exceeds 8 cm ⁻¹ . Since the numerical value of 8 cm ⁻¹ changes depending on the pattern shape of the pixel arrangement pattern of the display device, the critical spatial frequency at which moire occurs is checked at the manufacturing stage. For example, the data of the corresponding pixel arrangement pattern is stored in the first database 48. You may register with. In this case, when reading out the pixel array pattern data from the first database 48, the first input unit 24 also reads out the corresponding critical spatial frequency numerical value, and determines the read out critical spatial frequency value as the determination unit 36. You may make it supply to. The discriminating unit 36 discriminates whether or not the relative distance obtained by the comparing unit 34 exceeds the supplied critical spatial frequency.

  The pattern data processing unit 38 uses the electromagnetic wave shield pattern data stored in the second memory 50 when the determination unit 36 determines that the relative distance does not exceed a predetermined spatial frequency (critical spatial frequency). Input to the pattern deformation unit 28. Thereby, the data processing in the pattern deformation unit 28, the data processing in the second calculation unit 32, the data processing in the comparison unit 34, and the data processing in the determination unit 36 are repeated.

  The pattern data processing unit 38 also determines the electromagnetic wave shielding pattern stored in the second memory 50 when the determination unit 36 determines that the relative distance exceeds a predetermined spatial frequency (critical spatial frequency). Data is stored in a recording medium 64 (optical disk, hard disk, etc.). Therefore, the recording medium 64 may store a plurality of electromagnetic wave shield pattern data.

  The first pattern selection unit 40 includes an information table 66 in which a range of pitches that can be manufactured and a range of pattern widths are registered. Among the plurality of electromagnetic wave shield pattern data stored in the recording medium 64, the first pattern selection unit 40 includes One or more electromagnetic wave shield pattern data satisfying the registered manufacturable pitch range and pattern width range is selected and stored in a specific storage area of the recording medium 64. Here, the pitch range that can be manufactured is the range from the shortest pitch to the longest pitch that can be formed as a mesh pattern on the manufacturing line 21. Moreover, the range of the pattern width which can be manufactured shows the range which can be formed as a mesh pattern with the manufacturing line 21, and satisfies the surface resistivity which can be used favorably as an electromagnetic wave shielding film, and satisfies transparency.

  The second pattern selection unit 42 selects and records one electromagnetic wave shield pattern data corresponding to the operation input from the input device 22 among the one or more electromagnetic wave shield pattern data selected by the first pattern selection unit 40. Store in a specific storage area of the medium 64. Specifically, the second pattern selection unit 42 includes a display control unit 68 that sequentially displays one or more electromagnetic wave shield pattern data stored in the recording medium 64 on the monitor 44 or displays the thumbnail method. Then, one electromagnetic wave shield pattern is selected while viewing the electromagnetic wave shield pattern displayed on the monitor 44, and the display coordinates or identification number is operated and input using the input device 22. The second pattern selection unit 42 reads out one electromagnetic wave shield pattern data corresponding to the display coordinates or the identification number inputted by the operation among the one or more electromagnetic wave shield pattern data stored in the recording medium 64, and stores the recording medium 64. Store in a specific storage area.

  Here, the processing operation of the manufacturing apparatus 10 will be described with reference to the flowchart of FIG.

  First, in step S <b> 1, the first input unit 24 reads out the pixel array pattern data of the target display device from the first database 48 based on the operation input to the input device 22 by the user, and first memory 46. To remember.

  Thereafter, in step S <b> 2, the second input unit 26 reads out one electromagnetic wave shield pattern data from the second database 52 and stores it in the second memory 50 based on an operation input to the input device 22 by the user.

  Thereafter, in step S3, the first calculation unit 30 performs a Fourier transform on the pixel array pattern data stored in the first memory 46 to obtain a two-dimensional Fourier spectrum (first two-dimensional Fourier spectrum) of the pixel array pattern, Store in the third memory 60.

  Thereafter, in step S4, the second calculation unit 32 performs a Fourier transform on the electromagnetic wave shield pattern data stored in the second memory 50 to obtain a two-dimensional Fourier spectrum (second two-dimensional Fourier spectrum) of the electromagnetic wave shield pattern data. And stored in the fourth memory 62.

  Thereafter, in step S5, the comparison unit 34 compares the first two-dimensional Fourier spectrum stored in the third memory 60 with the second two-dimensional Fourier spectrum stored in the fourth memory 62, and compares the first two-dimensional Fourier spectrum. A relative distance (see FIG. 8) between the spectrum peak P1i of the two-dimensional Fourier spectrum and the spectrum peak P2j of the second two-dimensional Fourier spectrum is obtained. Here, i and j are integers of 0 or more, and number the spectrum peaks of the first and second two-dimensional Fourier spectra.

Thereafter, in step S <b> 6, the determination unit 36 determines whether the relative distance obtained by the comparison unit 34 exceeds a predetermined spatial frequency. Specifically, it is determined whether or not the relative distance obtained by the comparison unit 34 exceeds 8 cm ⁻¹ . When the number of relative distances to be obtained is too large, a spectrum peak having a weak peak intensity among the spectrum peaks of the first and second two-dimensional Fourier spectra may be excluded from discrimination targets in advance. This is because moire generated by a combination of the first and second two-dimensional Fourier spectra having a weak peak intensity is weak in the first place.

  When it is determined that the relative distance does not exceed the predetermined spatial frequency (critical spatial frequency), the process proceeds to the next step S7, and the first process in the pattern data processing unit 38 is entered. That is, the electromagnetic wave shield pattern data stored in the second memory 50 is input to the pattern deforming unit 28. As described above, the pattern deforming unit 28 changes any one or more of the rotation angle, pitch, and pattern width of the input electromagnetic wave shield pattern data as new electromagnetic wave shield pattern data, and overwrites the second memory 50. To do.

  Thereafter, the process returns to the processing after step S4, and the two-dimensional Fourier spectrum (second two-dimensional Fourier spectrum) of the new electromagnetic wave shield pattern data stored in the second memory 50 is obtained. A relative distance between the spectrum peak P1 and the spectrum peak P2 of the second two-dimensional Fourier spectrum is obtained, and it is determined whether or not the obtained relative distance exceeds a predetermined spatial frequency (critical spatial frequency).

  If it is determined in step S6 that the relative distance exceeds the predetermined spatial frequency, the process proceeds to step S8, and the second process in the pattern data processing unit 38 is entered. That is, the electromagnetic wave shield pattern data stored in the second memory 50 is stored in the recording medium 64 (optical disk, hard disk, etc.).

  Thereafter, in step 9, it is determined whether or not there is a request indicating the end of the process. This determination is made based on whether or not the processing procedure in the preset pattern deforming unit 28 has been completed, or whether or not there is a request for termination of the selection process.

If there is no request for the end of the process, the process proceeds to step S7 and subsequent processes, and the process in the pattern deforming unit 28, the process in the second calculating unit 32, the process in the comparing unit 34, and the process in the determining unit 36 are repeated. This repetitive processing is performed until a processing end request is made. Every time step S8 is processed, data having various electromagnetic wave shielding patterns with a relative distance exceeding 8 cm ⁻¹ is stored in the recording medium 64.

  Thereafter, in step S10, the first pattern selection unit 40 satisfies the manufacturable pitch range and pattern width range registered in the information table 66 among the plurality of electromagnetic wave shield pattern data stored in the recording medium 64. One or more electromagnetic wave shield pattern data to be selected is selected and stored in the recording medium 64.

  Thereafter, in step S11, the second pattern selection unit 42 selects one electromagnetic shielding pattern corresponding to the operation input from the input device 22 among the one or more electromagnetic shielding pattern data selected by the first pattern selection unit 40. Data is selected and stored in a specific storage area of the recording medium 64.

  One electromagnetic wave shield pattern data is selected at the stage where the processing in step S11 is completed.

  And in the production line 21, the electromagnetic wave shielding film 12 is manufactured based on the selected electromagnetic wave shielding pattern data.

  Here, how the intensity of moiré generation changes due to pattern deformation will be described with reference to FIGS. 4, 6, and 11 to 13 in consideration of human visual characteristics. The intensity of moiré generation can be scored by visual sensory evaluation, but it is related to the multiplication of the peak intensities of the peak pairs of the first and second 2D Fourier spectra and the relative distance between the peaks. ing. The greater the peak intensity multiplication value, the greater the degree of moire generation. As the relative distance between peaks is in a region where human visibility is stronger, the degree of moire generation is stronger.

  As described above (see FIG. 4), the pixel arrangement pattern has a lattice-like pattern in which a large number of vertical lines are arranged in the column direction and a large number of horizontal lines are arranged in the row direction. The ratio between the line width and the distance between lines is shown.

  As shown in FIG. 6, the initial electromagnetic wave shielding pattern has a mesh pattern of line width: interline distance = 2: 43.

Then, when the rotation angle θ of the initial electromagnetic wave shield pattern is determined by changing the rotation angle θ by 1 ° in the rotation angle changing unit 54, the moire generation intensity is obtained, as shown in FIG. 11, the rotation angle θ is increased in the clockwise direction. The contrast sensitivity gradually decreases, and there is a portion where the intensity of moire generation is 0 (portion where the relative distance> 8 cm ⁻¹ ) from the rotation angle θa to θb, and the portion is rotated further clockwise than the rotation angle θb. As a result, the intensity of the occurrence of moire gradually increases. Therefore, when selecting as an electromagnetic wave shield pattern, a plurality of electromagnetic wave shield pattern data rotated clockwise from the initial electromagnetic wave shield pattern by the rotation angles θa to θb is stored in the recording medium 64.

  Similarly, the pattern width changing unit 58 obtains the intensity of occurrence of moire while changing the pattern width of the initial electromagnetic wave shield pattern by 0.1 μm. When the pattern pitch and rotation angle are fixed, as shown in FIG. 12, there is a characteristic that the intensity of moiré generation gradually increases with a certain pattern width Pf as a boundary. Therefore, when selecting as the electromagnetic wave shield pattern, in addition to the initial electromagnetic wave shield pattern data, a plurality of electromagnetic wave shield pattern data from the initial electromagnetic wave shield pattern data to the electromagnetic wave shield pattern data obtained by extending the pattern width to Pf is recorded on the recording medium 64. Will be remembered.

Similarly, the pitch changing unit 56 obtains the intensity of occurrence of moire while changing the pitch of the initial electromagnetic shielding pattern by 0.1 μm. When the pattern width and rotation angle of the pattern are fixed, as shown in FIG. 13, the moire generation intensity gradually decreases as the pitch is widened, and the moire generation intensity is zero from the pitch Wa to Wb ( There is a portion where the relative distance> 8 cm ⁻¹ ), and when the pattern width is further expanded than the pitch Wb, the intensity of occurrence of moire gradually increases. Therefore, when selecting the electromagnetic wave shield pattern data, a plurality of electromagnetic wave shield pattern data whose pitch is increased by Wa to Wb with respect to the initial electromagnetic wave shield pattern data is stored in the recording medium 64.

Thus, since various electromagnetic wave shield pattern data having a relative distance exceeding 8 cm ⁻¹ is stored in the recording medium 64, first, a pattern that can be manufactured is selected by the first pattern selection unit 40, and then The second pattern selection unit 42 selects one electromagnetic wave shield pattern data based on the final judgment by the user.

Of course, after the selection process is started, the electromagnetic wave shield pattern data whose relative distance exceeds 8 cm ^-1 first appears, and then the selection process is terminated and the selected electromagnetic wave shield pattern data is adopted. Also good.

  Next, the manufacturing method in the manufacturing line 21 which manufactures an electromagnetic wave shielding film based on the electromagnetic wave shielding pattern selected as mentioned above is demonstrated, referring FIGS.

  First, as one manufacturing method, as a method of forming the electromagnetic wave shield pattern 16 on the transparent support 14, the silver salt photosensitive layer provided on the transparent support 14 is exposed, developed and fixed. The electromagnetic wave shielding pattern 16 may be configured by the metal silver portion thus formed and a metal layer carried on the metal silver portion.

  Specifically, as shown in FIG. 14A, a silver salt photosensitive layer 74 formed by mixing silver halide 70 (for example, silver bromide grains, silver chlorobromide grains or silver iodobromide grains) with gelatin 72 is transparently supported. Apply on body 14. In FIG. 14A to FIG. 14C, the silver halide 70 is expressed as “grains”, but is exaggerated to help understanding of the present invention, and the size, concentration, etc. are shown. It is not a thing.

  Thereafter, as shown in FIG. 14B, exposure necessary for forming the selected electromagnetic wave shielding pattern is performed on the silver salt photosensitive layer 74. When silver halide 70 receives light energy, it sensitizes and generates minute silver nuclei called “latent images” that cannot be observed with the naked eye.

  Thereafter, development processing is performed as shown in FIG. 14C in order to amplify the latent image into a visualized image that can be observed with the naked eye. Specifically, the silver salt photosensitive layer 74 on which the latent image is formed is developed with a developing solution (both alkaline solution and acidic solution, but usually alkaline solution is large). In this development process, silver ions supplied from the silver halide 70 or the developing solution are reduced to metallic silver by using a latent image silver nucleus as a catalyst nucleus by a reducing agent called a developing agent in the developing solution. The image silver nuclei are amplified to form a visualized silver image (developed silver 76).

  After the development processing, silver halide 70 which can be exposed to light remains in the silver salt photosensitive layer 74. In order to remove this, a fixing processing solution (either an acidic solution or an alkaline solution is used as shown in FIG. 14D). However, fixing is usually performed by using an acidic solution.

  By performing this fixing process, the metal silver portion 78 is formed in the exposed portion, and only the gelatin 72 remains in the unexposed portion, which becomes a light transmission portion. That is, the electromagnetic wave shielding pattern 16 by the metallic silver part 78 is formed on the transparent support 14.

The reaction formula of the fixing process when silver bromide is used as the silver halide 70 and the fixing process is performed with thiosulfate is as follows.
AgBr (solid) + 2 S ₂ O ₃ ions → Ag (S ₂ O ₃ ) ₂
(Easily water-soluble complex)

That is, two thiosulfate ions S ₂ O ₃ and silver ions in gelatin 72 (silver ions from AgBr) form a silver thiosulfate complex. Since the silver thiosulfate complex has high water solubility, it is eluted from the gelatin 72. As a result, the developed silver 76 is fixed and remains as the metallic silver portion 78.

  Therefore, the developing step is a step of causing the developing agent to react with the latent image to deposit the developed silver 76, and the fixing step is a step of eluting the silver halide 70 that has not become the developed silver 76 into water. For details, see T.W. H. James, The Theory of the Photographic Process, 4th ed. , Macmillan Publishing Co. , Inc, NY, Chapter 15, pp. 438-442. See 1977.

  In many cases, the development process is performed with an alkaline solution. Therefore, when entering the fixing process from the development process, the alkaline solution adhered in the development process is a fixing process solution (in many cases, an acidic solution). Therefore, there is a problem that the activity of the fixing processing solution changes. Further, there is a concern that an unintended development reaction may further progress due to the developer remaining in the film after leaving the development processing tank. Therefore, it is preferable to neutralize or acidify the silver salt photosensitive layer 74 with a stop solution such as an acetic acid (vinegar) solution after the development processing and before entering the fixing processing step.

  As shown in FIG. 14E, for example, by performing a plating process (single or combination of electroless plating and electroplating) and supporting the metal layer 80 only on the surface of the metal silver portion 78, the transparent support 14 is formed. The electromagnetic wave shielding pattern 16 may be formed by the metallic silver portion 78 and the metallic layer 80 supported by the metallic silver portion 78.

  Here, the difference between the method using the silver salt photosensitive layer 74 (silver salt photographic technique) and the method using photoresist (resist technique) will be described.

  In resist technology, the photopolymerization initiator absorbs light by the exposure process and the reaction starts, and the photoresist film (resin) itself undergoes a polymerization reaction to increase or decrease the solubility in the developer. The exposed resin is removed. In the resist technique, a solution called a developer is an alkaline solution that does not contain a reducing agent and dissolves unreacted resin components. On the other hand, in the above-described exposure processing of the silver salt photographic technique, as described above, minute silver nuclei called “latent images” are formed from photoelectrons and silver ions generated in the silver halide 70 at the site receiving light. The latent image silver nuclei formed are amplified by a development process (in this case, the developer always contains a reducing agent called a developing agent) to become a visualized silver image. Thus, the resist technology and the silver salt photographic technology have completely different reactions from exposure processing to development processing.

  In the development process of the resist technique, a resin part that has not undergone a polymerization reaction in an exposed part or an unexposed part is removed. On the other hand, in the development processing of the silver salt photographic technology, the developed silver 76 grows to a visible size by causing a reduction reaction with a reducing agent called a developing agent contained in the developer using the latent image as a catalyst nucleus. The gelatin 72 in the unexposed portion is not removed. In this way, the resist technology and the silver salt photographic technology have completely different reactions in development processing.

  The silver halide 70 contained in the unexposed gelatin 72 is eluted by the subsequent fixing process, and the gelatin 72 itself is not removed (see FIG. 14D).

  Thus, in silver salt photographic technology, the main reaction (photosensitive) is silver halide, whereas in resist technology, it is a photopolymerization initiator. In the development processing, the binder (gelatin 72) remains in the silver salt photographic technique (see FIG. 14D), but the binder disappears in the resist technique. In this respect, the silver salt photographic technique and the photoresist technique are greatly different.

  And the mask used by exposure with respect to the silver salt photosensitive layer 74 may have a mask pattern corresponding to the selected electromagnetic wave shield pattern data.

  Alternatively, the silver salt photosensitive layer 74 may be exposed to the electromagnetic wave shield pattern 16 corresponding to the selected electromagnetic wave shield pattern data by digital writing exposure on the silver salt photosensitive layer 74.

  As another manufacturing method, as shown in FIG. 15A, for example, the photoresist film 84 on the copper foil 82 formed on the transparent support 14 is exposed and developed to correspond to the selected electromagnetic shielding pattern data. The electromagnetic wave shield pattern 16 may be formed by forming the resist pattern 86 and etching the copper foil 82 exposed from the resist pattern 86 as shown in FIG. 15B. In this case, the mask used in the exposure for the photoresist film 84 may have a mask pattern corresponding to the selected electromagnetic wave shield pattern data.

  Alternatively, the electromagnetic wave shield pattern 16 corresponding to the selected electromagnetic wave shield pattern data may be exposed on the photoresist film 84 by digital writing exposure on the photoresist film 84.

  Also, as shown in FIG. 16A, a paste 88 containing metal fine particles is printed on the transparent support 14, and the paste 88 is subjected to metal plating 90 as shown in FIG. The electromagnetic shielding pattern 16 corresponding to the above may be formed.

  Alternatively, as shown in FIG. 17, the electromagnetic shielding pattern 16 corresponding to the selected electromagnetic shielding pattern data may be printed and formed on the transparent support 14 using a screen printing plate or a gravure printing plate.

  Thus, in the manufacturing apparatus 10 and the manufacturing method of the electromagnetic wave shielding film 12 according to the present embodiment, the generation of moire can be suppressed, and the characteristics of the electromagnetic wave shielding film 12, particularly the increase in surface resistivity and transparency. The electromagnetic wave shielding pattern 16 that can avoid the deterioration of the electromagnetic wave is automatically selected, and the electromagnetic wave shielding film suitable for the display device to be installed can be manufactured.

  The electromagnetic shielding film manufacturing apparatus, the electromagnetic shielding film manufacturing method, and the pattern generation method according to the present invention are not limited to the above-described embodiments, and various configurations can be adopted without departing from the gist of the present invention. Of course.

It is sectional drawing which abbreviate | omits and shows an example of the electromagnetic wave shield film manufactured with the manufacturing apparatus and manufacturing method which concern on this Embodiment. It is a top view which abbreviate | omits and shows an example of the electromagnetic wave shielding film manufactured with the manufacturing apparatus and manufacturing method which concern on this Embodiment. It is a block diagram which shows the structure of the manufacturing apparatus which concerns on this Embodiment, especially the structure of a pattern selection process part. It is a top view which abbreviate | omits and shows an example of the pixel arrangement pattern of the display apparatus in which an electromagnetic wave shield film is installed. It is a figure which shows the intensity | strength characteristic of the two-dimensional Fourier spectrum of the pixel arrangement pattern shown in FIG. It is a top view which abbreviate | omits and shows an example of an electromagnetic wave shield pattern. It is a figure which shows the intensity | strength characteristic of the two-dimensional Fourier spectrum of an electromagnetic wave shield pattern. It is explanatory drawing which shows the comparison of each two-dimensional Fourier spectrum of a pixel arrangement | sequence pattern and an electromagnetic wave shield pattern. It is a characteristic view which shows the change of the contrast sensitivity with respect to a spatial frequency. It is a flowchart which shows the structure of the manufacturing apparatus which concerns on this Embodiment, especially the processing operation of a pattern selection process part. It is a characteristic view which shows the change of the intensity | strength of generation | occurrence | production of moire with respect to the rotation angle of an electromagnetic wave shield pattern. It is a characteristic view which shows the change of the intensity | strength of generation | occurrence | production of a moire with respect to the pitch of an electromagnetic wave shield pattern. It is a characteristic view which shows the change of the generation | occurrence | production intensity | strength of a moire with respect to the pattern width of an electromagnetic wave shield pattern. 14A to 14E are process diagrams illustrating an example of a method for producing an electromagnetic wave shielding film. 15A and 15B are process diagrams showing another example of a method for producing an electromagnetic wave shielding film. 16A and 16B are process diagrams showing still another example of the method for producing an electromagnetic wave shielding film. It is process drawing which shows the further another example of the manufacturing method of an electromagnetic wave shield film.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 ... Manufacturing apparatus 12 ... Electromagnetic shielding film 14 ... Transparent support 16 ... Electromagnetic shielding pattern 20 ... Pattern selection process part 22 ... Input device 24 ... 1st input part 26 ... 2nd input part 28 ... Pattern deformation | transformation part 30 ... 1st Calculation unit 32 ... second calculation unit 34 ... comparison unit 36 ... discrimination unit 38 ... pattern data processing unit 40 ... first pattern selection unit 42 ... second pattern selection unit 44 ... monitor

Claims (11)

In an apparatus for manufacturing an electromagnetic wave shielding film, which is installed in a display device and formed with an electromagnetic wave shielding pattern for shielding electromagnetic waves generated from the display device,
A pattern selection processing unit for selecting electromagnetic wave shield pattern data for suppressing moire associated with interference with the pixel arrangement pattern of the display device;
The pattern selection processing unit
A comparison unit for obtaining a relative distance between a spectrum peak of the two-dimensional Fourier spectrum of the pixel array pattern data and a spectrum peak of the two-dimensional Fourier spectrum of the electromagnetic wave shield pattern data;
A determination unit for determining whether the relative distance obtained by the comparison unit exceeds a predetermined spatial frequency;
When the discrimination unit determines that the relative distance does not exceed the predetermined spatial frequency, the electromagnetic wave shield pattern data is transformed and input to the comparison unit, and the discrimination unit determines the relative distance. A pattern data processing unit for storing the electromagnetic wave shield pattern data in the storage unit as selected electromagnetic wave shield pattern data when it is determined that the predetermined spatial frequency is exceeded;
An apparatus for producing an electromagnetic wave shielding film, comprising producing an electromagnetic wave shielding film based on the selected electromagnetic wave shielding pattern data. In the manufacturing apparatus of the electromagnetic wave shielding film according to claim 1,
The pattern selection processing unit further includes
A first input unit for inputting pixel array pattern data of the display device;
A second input unit for inputting the electromagnetic shielding pattern data;
A pattern deforming portion that changes any one or more of the rotation angle, pitch, and pattern width of the electromagnetic wave shield pattern data;
A first calculation unit that calculates a first two-dimensional Fourier spectrum of the input pixel array pattern data;
A second calculation unit that calculates a second two-dimensional Fourier spectrum of the input electromagnetic wave shield pattern data or the electromagnetic wave shield pattern data from the pattern deformation unit;
The comparison unit compares the obtained first two-dimensional Fourier spectrum and the second two-dimensional Fourier spectrum to obtain a spectrum peak of the first two-dimensional Fourier spectrum and a spectrum peak of the second two-dimensional Fourier spectrum. Find the relative distance of
The determination unit determines whether the relative distance obtained by the comparison unit exceeds a predetermined spatial frequency,
The pattern data processing unit inputs the electromagnetic wave shield pattern data to the pattern deformation unit when the determination unit determines that the relative distance does not exceed the predetermined spatial frequency, and inputs the electromagnetic wave shield pattern data to the determination unit. An electromagnetic wave shielding film, wherein the electromagnetic wave shielding pattern data is stored in a storage unit as selected electromagnetic wave shielding pattern data when it is determined that the relative distance exceeds the predetermined spatial frequency. Manufacturing equipment. In the manufacturing apparatus of the electromagnetic wave shielding film according to claim 1 or 2,
The said predetermined spatial frequency is 8 cm <^-1> , The manufacturing apparatus of the electromagnetic wave shield film characterized by the above-mentioned. In the manufacturing apparatus of the electromagnetic wave shielding film of any one of Claims 1-3,
An information table in which a range of pitches that can be manufactured and a range of pattern widths are registered;
First, one or more electromagnetic shielding pattern data satisfying the manufacturable pitch range and pattern width range registered in the information table is selected from the plurality of electromagnetic shielding pattern data stored in the storage unit. 1 pattern selection part,
An apparatus for producing an electromagnetic wave shielding film, comprising producing an electromagnetic wave shielding film based on the electromagnetic wave shielding pattern data selected by the first pattern selection unit. In the manufacturing apparatus of the electromagnetic wave shielding film according to claim 4,
An operation unit for inputting operation instructions by the user;
A second pattern selection unit that selects electromagnetic shield pattern data corresponding to an operation input from the operation unit among the one or more electromagnetic shield pattern data selected by the pattern selection unit;
An apparatus for producing an electromagnetic wave shielding film, comprising producing an electromagnetic wave shielding film based on the electromagnetic wave shielding pattern data selected by the second pattern selection unit. In the manufacturing method of the electromagnetic wave shielding film in which the electromagnetic wave shielding pattern which is installed in the display device and shields the electromagnetic wave generated from the display device is formed,
A pattern selection processing step of selecting electromagnetic wave shield pattern data for suppressing moire associated with interference with the pixel arrangement pattern of the display device;
A manufacturing step of manufacturing an electromagnetic wave shielding film based on the selected electromagnetic wave shielding pattern data,
The pattern selection processing step includes
A comparison step for obtaining a relative distance between a spectrum peak of the two-dimensional Fourier spectrum of the pixel array pattern data and a spectrum peak of the two-dimensional Fourier spectrum of the electromagnetic wave shield pattern data;
A determination step of determining whether the relative distance obtained by the comparison unit exceeds a predetermined spatial frequency;
When the determination unit determines that the relative distance does not exceed the predetermined spatial frequency, the electromagnetic wave shield pattern data is transformed and input to the comparison step, and the determination unit determines that the relative distance is A pattern data processing step of storing the electromagnetic wave shield pattern data in the storage unit as the selected electromagnetic wave shield pattern data when it is determined that the predetermined spatial frequency is exceeded. A method for producing a film. In the manufacturing method of the electromagnetic wave shielding film according to claim 6,
The pattern selection processing step further includes:
A first input step of inputting pixel array pattern data of the display device;
A second input step for inputting the electromagnetic wave shield pattern data;
A pattern deformation step of changing any one or more of the rotation angle, pitch, and pattern width of the electromagnetic wave shield pattern data;
A first calculation step of calculating a first two-dimensional Fourier spectrum of the input pixel array pattern data;
A second calculation step of calculating a second two-dimensional Fourier spectrum of the input electromagnetic wave shield pattern data or the electromagnetic wave shield pattern data from the pattern deforming unit;
The comparing step compares the obtained first two-dimensional Fourier spectrum and the second two-dimensional Fourier spectrum, and the spectral peak of the first two-dimensional Fourier spectrum and the spectral peak of the second two-dimensional Fourier spectrum. Find the relative distance of
The determination step determines whether the relative distance obtained by the comparison unit exceeds a predetermined spatial frequency,
In the data processing step, when it is determined in the determination step that the relative distance does not exceed the predetermined spatial frequency, the electromagnetic wave shield pattern data is input to the pattern deformation step, and in the determination step When it is determined that the relative distance exceeds the predetermined spatial frequency, the electromagnetic wave shielding pattern data is stored in the storage unit as the selected electromagnetic wave shielding pattern data. Method. In the manufacturing method of the electromagnetic wave shielding film of Claim 6 or 7,
The method for producing an electromagnetic wave shielding film, wherein the predetermined spatial frequency is 8 cm ⁻¹ . In the manufacturing method of the electromagnetic wave shield film according to any one of claims 6 to 8,
Using an information table in which the range of pitches that can be manufactured and the range of pattern widths are registered,
A pattern for selecting one or more electromagnetic wave shield pattern data satisfying the manufacturable pitch range and pattern width range registered in the information table among the plural electromagnetic wave shield pattern data stored in the storage unit Has a selection step,
A method for producing an electromagnetic wave shielding film, comprising producing an electromagnetic wave shielding film based on the electromagnetic wave shielding pattern data selected in the pattern selection step. In the manufacturing method of the electromagnetic wave shielding film according to claim 9,
Use the operation unit to input operation instructions by the user,
A second pattern selection step of selecting electromagnetic wave shield pattern data corresponding to an operation input from the operation unit among the one or more electromagnetic wave shield pattern data selected in the pattern selection step;
An electromagnetic wave shielding film is produced based on the electromagnetic wave shielding pattern data selected in the second pattern selection step. In the pattern generation method,
A pattern selection processing step of selecting a second pattern for suppressing moire associated with interference with the first pattern;
Generating a pattern based on the selected second pattern data,
The pattern selection processing step includes
A comparison step for obtaining a relative distance between a spectrum peak of the two-dimensional Fourier spectrum of the first pattern data and a spectrum peak of the two-dimensional Fourier spectrum of the second pattern data;
A determination step of determining whether the relative distance obtained by the comparison unit exceeds a predetermined spatial frequency;
When the determination unit determines that the relative distance does not exceed the predetermined spatial frequency, the second pattern data is transformed and input to the comparison step, and the determination unit sets the relative distance. A pattern processing step of storing the second pattern data in the storage unit as the selected second pattern data when it is determined that the frequency exceeds the predetermined spatial frequency. Pattern generation method.

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