JP2009111642A5 - - Google Patents
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- Publication number
- JP2009111642A5 JP2009111642A5 JP2007280866A JP2007280866A JP2009111642A5 JP 2009111642 A5 JP2009111642 A5 JP 2009111642A5 JP 2007280866 A JP2007280866 A JP 2007280866A JP 2007280866 A JP2007280866 A JP 2007280866A JP 2009111642 A5 JP2009111642 A5 JP 2009111642A5
- Authority
- JP
- Japan
- Prior art keywords
- sidewall
- etching
- surface layer
- aqueous solution
- side wall
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005530 etching Methods 0.000 claims 7
- 239000002344 surface layer Substances 0.000 claims 7
- 239000007864 aqueous solution Substances 0.000 claims 6
- 230000015572 biosynthetic process Effects 0.000 claims 5
- 238000000034 method Methods 0.000 claims 5
- 230000001681 protective effect Effects 0.000 claims 4
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 claims 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 229910052710 silicon Inorganic materials 0.000 claims 2
- 239000010703 silicon Substances 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- 239000012670 alkaline solution Substances 0.000 claims 1
- 229910052814 silicon oxide Inorganic materials 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007280866A JP2009111642A (ja) | 2007-10-29 | 2007-10-29 | 微細凹部形成方法およびコンデンサマイクロホンの製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007280866A JP2009111642A (ja) | 2007-10-29 | 2007-10-29 | 微細凹部形成方法およびコンデンサマイクロホンの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2009111642A JP2009111642A (ja) | 2009-05-21 |
| JP2009111642A5 true JP2009111642A5 (enExample) | 2010-09-02 |
Family
ID=40779669
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007280866A Pending JP2009111642A (ja) | 2007-10-29 | 2007-10-29 | 微細凹部形成方法およびコンデンサマイクロホンの製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2009111642A (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI486069B (zh) * | 2010-05-18 | 2015-05-21 | Taiwan Carol Electronics Co Ltd | Capacitive microphone process |
| CN102328899A (zh) * | 2011-08-05 | 2012-01-25 | 上海先进半导体制造股份有限公司 | 不同深度腔体的制造方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3873630B2 (ja) * | 2001-01-29 | 2007-01-24 | セイコーエプソン株式会社 | コンデンサマイクロホンの製造方法 |
| JP2006062148A (ja) * | 2004-08-25 | 2006-03-09 | Fuji Xerox Co Ltd | シリコン構造体製造方法、モールド金型製造方法、シリコン構造体、インクジェット記録ヘッド、画像形成装置、及び、半導体装置 |
-
2007
- 2007-10-29 JP JP2007280866A patent/JP2009111642A/ja active Pending
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