JP2009095720A - Ultrasonic cleaning apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an ultrasonic cleaning apparatus capable of cleaning an object to be cleaned such as a metal mask plate with a small amount of cleaning liquid in a short time, and drying it at a position right as it is in a short time after cleaning. <P>SOLUTION: A ultrasonic cleaning unit 30 includes a vibration part 33 having a vibration plate 31 disposed facing a cleaning plane of a metal mask plate M with a gap approximately parallel with it and fixed with an ultrasonic vibrator 32, a cleaning media supplying part 34 supplying a cleaning solution into a gap between the vibration plate 31 and the cleaning plane of the metal mask plate M, and a suction removal part 37 disposed at the underneath of the vibration part 33 and sucking and removing the cleaning solution attached on the cleaning plane of the metal mask plate M. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to an ultrasonic cleaning apparatus for ultrasonically cleaning an object to be cleaned such as a metal mask plate.

  2. Description of the Related Art Conventionally, a technique for printing cream solder or an adhesive for component adhesion on a printed wiring board using a metal mask plate is known. A metal plate such as stainless steel or a nickel plate is used for the metal mask plate. Here, for example, when cream solder is printed on a printed wiring board, the solvent of the cream solder is volatilized over time, and the metal mask plate is clogged, and a desired print quality cannot be obtained. Therefore, the metal mask plate used for such printing needs to be washed and dried a predetermined number of times or every predetermined time.

Specifically, conventionally, a metal container of a size that can accommodate a metal mask plate is filled with cleaning liquid, and an ultrasonic vibrator coupled to the bottom surface of the container is vibrated to vibrate the metal mask plate through the cleaning liquid. And ultrasonic cleaning. After that, as shown in Patent Document 1, the washed plate is taken out of the container and set horizontally on the cleaning device, and the plate is dried by spraying air on the plate or removing the cleaning liquid by suction.
JP 2001-225454 A

  However, in the conventional ultrasonic cleaning apparatus, since the cleaning process for cleaning the metal mask plate and the drying process for drying the cleaned metal mask plate are performed in separate apparatuses, the cleaned metal mask plate is cleaned. The work required to be taken out from the container and set in the cleaning device that performs the drying process has been increased, and the number of work steps has increased.

  Further, in the conventional ultrasonic cleaning apparatus, it usually takes about 10 to 20 minutes to clean and dry one metal mask plate, and processing is performed when the number of metal mask plates to be cleaned increases. There is a problem that the capacity is insufficient, and it has been desired to develop an ultrasonic cleaning apparatus having a high processing capacity capable of performing from cleaning to drying in a short time.

  The present invention has been made in view of the above points, and the object of the present invention is to clean an object to be cleaned such as a metal mask plate in a short time with a small amount of cleaning liquid. An object of the present invention is to provide an ultrasonic cleaning apparatus capable of drying in a short time.

  In order to achieve the above-described object, according to the present invention, the ultrasonic cleaning unit that ultrasonically cleans the object to be cleaned is provided with a suction removing unit that sucks and removes the cleaning medium attached to the cleaning surface of the object to be cleaned.

  Specifically, the present invention is directed to an ultrasonic cleaning apparatus for cleaning a flat object to be cleaned, and has taken the following solution.

That is, the invention of claim 1 is an ultrasonic cleaning unit that supplies a cleaning medium to the cleaning surface of the object to be cleaned and ultrasonically cleans the object to be cleaned by ultrasonic vibration;
A holding unit that holds the object to be cleaned substantially vertically or at a predetermined angle so that the cleaning medium supplied by the ultrasonic cleaning unit flows down by its own weight along the cleaning surface of the object to be cleaned;
A moving unit for reciprocating the ultrasonic cleaning unit in the vertical direction along the cleaning surface of the object to be cleaned;
The ultrasonic cleaning unit includes:
Vibrating means having a diaphragm that is disposed to face the cleaning surface of the object to be cleaned, substantially in parallel with a gap, and to which an ultrasonic transducer is attached;
Cleaning medium supply means for supplying a cleaning medium to a gap between the vibration plate and the cleaning surface of the object to be cleaned;
It has a suction removal means that is disposed below the vibration means and sucks and removes the cleaning medium adhering to the cleaning surface of the object to be cleaned.

The invention of claim 2 is the invention according to claim 1,
The ultrasonic cleaning unit is disposed between the vibration unit and the suction removal unit, and is a sliding removal unit that contacts the cleaning surface of the object to be cleaned and slides and removes the cleaning medium attached to the cleaning surface. It is characterized by having.

The invention of claim 3 is the invention according to claim 1 or 2,
A reflective cleaning unit disposed opposite to the back cleaning surface opposite to the surface facing the ultrasonic cleaning unit of the object to be cleaned;
The moving unit is configured to reciprocate in the vertical direction synchronously with the ultrasonic cleaning unit and the reflective cleaning unit facing each other,
The reflective cleaning unit is
Reflecting means having a reflecting plate disposed opposite to the vibration plate across the object to be cleaned and disposed substantially in parallel with the back side cleaning surface of the object to be cleaned;
Cleaning medium supply means for supplying a cleaning medium to a gap between the reflector and the back side cleaning surface of the object to be cleaned;
It has a suction removal means that is disposed below the reflection means and sucks and removes the cleaning medium adhering to the back side cleaning surface of the object to be cleaned.

The invention of claim 4 is the invention according to claim 3,
An ultrasonic transducer is attached to the reflection plate of the reflection cleaning unit.

The invention of claim 5 is the invention of claim 3 or 4,
The reflective cleaning unit is disposed between the reflective means and the suction removing means, and is made to slide to remove the cleaning medium adhering to the back side cleaning surface in contact with the back side cleaning surface of the object to be cleaned. It has the means.

The invention of claim 6 is any one of claims 1 to 5,
The ultrasonic vibration unit operates to vaporize the cleaning medium supplied by the cleaning medium supply means.

The invention of claim 7 is the invention according to any one of claims 1 to 6,
The cleaning medium supply means is configured to supply a mist-like cleaning liquid as the cleaning medium.

  According to the first aspect of the present invention, the ultrasonic cleaning unit is provided with the vibration means, the cleaning medium supply means, and the suction removal means, and the ultrasonic cleaning unit is moved along the cleaning surface of the object to be cleaned. While the cleaning surface is ultrasonically cleaned, the cleaning medium adhering to the cleaning surface can be removed by suction and dried. For this reason, after performing the ultrasonic cleaning, the object to be cleaned can be dried in a short time at the position as it is, and the workability is improved without the need to reset the object to be cleaned.

  Further, since the cleaning medium is supplied to the gap between the cleaning surface of the object to be cleaned and the vibration plate, the object to be cleaned can be cleaned with a small amount of cleaning liquid, and a good dry state can be obtained in a shorter time, which is highly practical. Specifically, in the present invention, the cleaning from one metal mask plate to the drying can be performed in 1 to 2 minutes, and the cleaning is efficiently performed in about one-tenth of the time compared with the conventional ultrasonic cleaning apparatus. Can greatly improve the processing capacity. Furthermore, the amount of cleaning liquid discarded can be greatly reduced, and advantageous effects can be obtained from the viewpoint of environmental measures.

  According to the second aspect of the present invention, since the sliding removal means is provided between the vibration means and the suction removing means, most of the cleaning medium flowing down along the cleaning surface from the vibration means is removed by the sliding removal means. Thereafter, only the cleaning medium remaining in the mask hole opened in the metal mask plate as the object to be cleaned may be suctioned and removed by the suction removing means, and can be further dried in a short time.

  According to the third aspect of the present invention, since the reflective cleaning unit is disposed opposite to the back side cleaning surface opposite to the surface facing the ultrasonic cleaning unit of the object to be cleaned, the cleaning medium and the target object are cleaned from the ultrasonic cleaning unit side. The vibration transmitted to the reflective cleaning unit through the object is reflected by the reflecting plate, and it is possible to peel off the adherents such as cream solder attached to the back surface of the object to be cleaned. Cleaning can be performed well, and further cleaning time and drying time can be shortened.

  According to the invention of claim 4, since the ultrasonic vibrator is attached to the reflection plate of the reflective cleaning unit, when the back surface of the object to be cleaned is heavily soiled, the ultrasonic vibration from the ultrasonic cleaning unit is reduced. Without waiting for transmission, the ultrasonic cleaning of the back surface cleaning surface can be actively performed by operating the ultrasonic vibrator on the reflection cleaning unit side.

  According to the invention of claim 5, since the sliding removal means is provided between the reflecting means and the suction removing means, most of the cleaning medium flowing down along the cleaning surface from the reflecting means is removed by the sliding removing means. Thereafter, only the cleaning medium remaining in the mask hole opened in the metal mask plate as the object to be cleaned may be suctioned and removed by the suction removing means, and can be further dried in a short time.

  According to the sixth aspect of the invention, since the ultrasonic vibration unit is operated so as to vaporize the cleaning medium supplied by the cleaning medium supply means, the drying time of the object to be cleaned is further shortened. That is, by continuously applying ultrasonic vibration, the ultrasonic energy becomes dense at the inner peripheral edge of the mask hole opened in the metal mask plate as the object to be cleaned, and the movement of air molecules becomes intense, which is supplied from the cleaning medium supply means. Then, the cleaning medium that has not contributed to the peeling action of the deposit on the cleaning surface can be vaporized by ultrasonic vibration of the vibration means. As a result, a part of the cleaning medium is vaporized before being sucked by the suction removing means, so that the drying time can be further shortened.

  According to the invention of claim 7, since the mist-like cleaning liquid is supplied by the cleaning medium supply means, the drying time is shortened as compared with the case where the liquid cleaning liquid is supplied while ensuring the cleaning ability. be able to.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings. It should be noted that the following description of the preferred embodiment is merely illustrative in nature and is not intended to limit the present invention, its application, or its use.

  FIG. 1 is a front view showing a schematic configuration of the ultrasonic cleaning apparatus of the present invention, and FIG. 2 is a side view. As shown in FIGS. 1 and 2, the ultrasonic cleaning apparatus 10 includes a rectangular parallelepiped body base 12 formed by combining a plurality of body frames 11.

  The main frame 12 is partitioned into a left chamber 12a and a right chamber 12b by an intermediate column member 13 extending in the vertical direction at the center position in the left-right direction in FIG. The right chamber 12b is divided into an upper chamber 13a and a lower chamber 13b by an intermediate floor material 14 extending in the left-right direction at the center position in the vertical direction.

  In the upper chamber 13a, an ultrasonic cleaning unit 30, a reflection cleaning unit 40, a holding unit 50, a moving unit 55, and a supply pump 23 are disposed. A waste liquid separation tank 22 and a drain tank 25 are disposed in the lower chamber 13b. A suction pump 21 is disposed in the left chamber 12a.

  The holding unit 50 is for holding the metal mask plate M as an object to be cleaned at a cleaning position in the ultrasonic cleaning apparatus 10, and is arranged in a pair in the vertical direction. The metal mask plate M includes a mask plate Ma formed in a substantially square shape and a flat plate shape, and a plate frame Mb provided along the outer peripheral edge of the mask plate Ma. The pair of upper and lower holding units 50, 50 are formed with fitting concave grooves 50a, 50a that are fitted to the upper end portion and the lower end portion of the plate frame Mb of the metal mask plate M, respectively.

  Here, an insertion port 15 communicating with the upper chamber 13a is opened at a position corresponding to the holding unit 50 on the right side wall of the main body gantry 12, and an operator can connect the metal mask plate M through the insertion port 15. It can be replaced and maintained.

  Note that FIG. 2 illustrates a configuration in which the metal mask plate M is held substantially vertically, but a configuration in which the metal mask plate M is held at a predetermined angle may be employed.

  The moving unit 55 synchronizes the ultrasonic cleaning unit 30 and the reflective cleaning unit 40 along the two guide rails 55a and 55a that are installed across the pair of upper and lower holding units 50 and 50, and the guide rail 55a. And a drive unit 55b that reciprocates in the vertical direction. The drive unit 55b is connected to the ultrasonic cleaning unit 30 (and the reflective cleaning unit 40).

  The ultrasonic cleaning unit 30 is disposed below the vibration unit 33, a vibration unit 33 having a vibration plate 31 to which an ultrasonic vibrator 32 is attached, a cleaning medium supply unit 34 for supplying a cleaning liquid such as alcohol or water. And a sliding removal unit 35 that slides and removes the cleaning liquid adhered to the cleaning surface in contact with the cleaning surface of the metal mask plate M, and a suction removal unit 37 disposed below the sliding removal unit 35. ing.

  The vibrating portion 33 is for applying ultrasonic vibration to the cleaning surface in order to peel off deposits adhering to the cleaning surface of the metal mask plate M, and the vibration plate 31 has a gap substantially parallel to the cleaning surface. And are arranged opposite to each other. The vibrating portion 33 is formed in a bottomed cylindrical shape, and the cylindrical bottom plate constitutes the vibrating plate 31. Four ultrasonic transducers 32 are attached to the diaphragm 31 at intervals in the longitudinal direction (left-right direction in FIG. 3).

  In the vibration part 33, the vibration can be transmitted to the cleaning surface via the cleaning liquid, whereby the cleaning liquid can be vaporized and the drying time of the metal mask plate M can be further shortened. That is, by continuously applying ultrasonic vibration, after the ultrasonic energy becomes dense at the inner peripheral edge of the mask hole opened in the metal mask plate M and the movement of air molecules becomes intense and is supplied from the cleaning medium supply unit 34. Thus, it is possible to vaporize the cleaning liquid that does not contribute to the peeling action of the deposit on the cleaning surface by ultrasonic vibration. As a result, a part of the cleaning liquid is vaporized before the cleaning liquid is sucked and removed by the sliding removing unit 35 and the suction removing unit 37, so that the drying time can be further shortened.

  The upper surface plate 31a of the vibrating portion 33 is formed so as to be inclined downward toward the metal mask plate M. The lower surface plate 31b is formed so as to incline upward toward the metal mask plate M. By forming such an inclination, the cleaning liquid supplied from the cleaning medium supply unit 34 can easily flow down to the gap between the vibration plate 31 and the metal mask plate M along the inclination of the upper surface plate 31a. Since the opening area of the drainage portion is gradually increased due to the inclination of the lower surface plate 31b, the cleaning liquid flowing down the gap between the metal mask plate M and the metal mask plate M is easily drained.

  Further, guide plates 33a for preventing the cleaning liquid supplied from the cleaning medium supply unit 34 from flowing out from the longitudinal ends of the upper surface plate 31a at both ends in the longitudinal direction of the upper surface plate 31a of the vibration unit 33. 33a are attached.

  The cleaning medium supply unit 34 is for supplying a cleaning liquid to the gap between the vibration plate 31 and the cleaning surface of the metal mask plate M, and is a supply nozzle provided with a large number of pores (not shown) in the longitudinal direction. 34a is provided. The length of the supply nozzle 34a in the longitudinal direction is set so as to cover a wider range than the width of the portion to be cleaned on the cleaning surface of the metal mask plate M. Then, the cleaning liquid flows out and sprays evenly on the cleaning surface of the metal mask plate M from the many pores of the supply nozzle 34a.

  The supply nozzle 34a of the cleaning medium supply unit 34 is connected to the supply pump 23 via a supply pipe 28, collects the waste liquid after the cleaning operation, and separates the cleaning liquid and the deposits with a filter or the like. The cleaning liquid pumped from the waste liquid separation tank 22 can be used. As a result, the amount of cleaning liquid discarded can be greatly reduced, and an advantageous effect can be obtained as an environmental measure.

  The cleaning medium supply unit 34 may supply a mist-like cleaning liquid in addition to supplying a cleaning liquid such as alcohol as a cleaning medium. If the mist-like cleaning liquid is supplied, the drying time can be shortened as compared with the case where the droplet cleaning liquid is supplied while ensuring the cleaning ability.

  Below the vibration part 33, a sliding removal part 35 and a suction removal part 37 are arranged in this order. The sliding removal unit 35 includes a sliding blade 36 that contacts the cleaning surface of the metal mask plate M, and a waste liquid recovery pipe 26 that recovers the cleaning liquid after cleaning to the waste liquid separation tank 22.

  The sliding blade 36 is erected upward from both a bottom plate portion 35a that receives the cleaning liquid flowing down from the gap between the vibration plate 31 of the vibration portion 33 and the cleaning surface of the metal mask plate M, and both longitudinal ends of the bottom plate portion 35a. Side wall portions 35b and 35b. The side wall portion 35 b prevents the cleaning liquid flowing down from the gap between the vibrating portion 33 and the cleaning surface from flowing outside the both ends in the longitudinal direction of the sliding blade 36. The sliding blade 36 is reciprocated so as to be slidable upward along the cleaning surface together with the ultrasonic cleaning unit 30 by the moving unit 55. The cleaning liquid recovered by the sliding blade 36 flows through the waste liquid recovery pipe 26 and is stored in the waste liquid separation tank 22.

  The suction removing unit 37 is disposed below the sliding removing unit 35. The suction removing unit 37 sucks and removes deposits such as cleaning liquid and cream solder remaining in a mask hole (not shown) of the metal mask plate M that could not be removed by the sliding blade 36 of the sliding removing unit 35. The suction nozzle 38, the suction pump 21 that sucks by negative pressure, and the suction pipe 27 that connects the suction nozzle 38 and the suction pump 21 are provided.

  The suction nozzle 38 is opened on the side facing the metal mask plate M, and the upper end thereof is attached to the bottom surface of the bottom plate of the sliding blade 36. The suction nozzle 38 is disposed with a clearance from the cleaning surface of the metal mask plate M. When the suction pump 21 is operated, air around the suction nozzle 38 is removed from the clearance between the suction nozzle 38 and the cleaning surface. The cleaning liquid and the adhering matter sucked and adhering to the metal mask plate M are sucked by the suction pump 21. The air sucked into the suction pump 21 is exhausted from the exhaust duct 21a.

  In the present embodiment, the configuration in which the slide removing unit 35 and the suction removing unit 37 are provided below the vibration unit 33 has been described. However, a configuration in which the slide removing unit 35 is not provided may be employed. That is, all of the cleaning liquid flowing down from the vibration unit 33 may be sucked and removed by the suction removing unit 37.

  On the other hand, a reflective cleaning unit 40 having a reflective plate 41 is disposed at a position facing the ultrasonic cleaning unit 30 with the metal mask plate M interposed therebetween. Since the basic structure of the reflective cleaning unit 40 is substantially the same as that of the ultrasonic cleaning unit 30, description thereof will be omitted.

  In FIG. 2, a configuration in which the ultrasonic transducer 32 is attached to the reflection plate 41 of the reflective cleaning unit 40 is described, but a configuration in which the ultrasonic transducer 32 is not attached may be used. In this case, the vibration transmitted from the ultrasonic cleaning unit 30 through the cleaning liquid and the metal mask plate M is reflected by the reflecting plate 41 of the reflective cleaning unit 40, and the back side cleaning surface of the metal mask plate M is cleaned. Can be done. As described above, the configuration in which the ultrasonic transducer 32 is not attached to the reflective cleaning unit 40 is advantageous in reducing the cost, such as reducing the number of the ultrasonic transducers 32 or reducing the power for control. Become.

  The intermediate floor 14 of the main body pedestal 12 is formed with a drain port 56 that communicates the upper chamber 13 a and the lower chamber 13 b, and a drain pipe 57 is connected to the drain port 56. The downstream end of the drain pipe 57 is connected to the drain tank 25 disposed in the lower chamber 13b. Here, when a part of the cleaning liquid supplied by the ultrasonic cleaning unit 30 and the reflective cleaning unit 40 is scattered in the upper chamber 13a, the cleaning liquid is on the floor surface of the upper chamber 13a (the upper surface of the intermediate flooring 14). The collected water is collected in the drainage tank 25 through the drainage port 56.

  Hereinafter, the cleaning and drying operation of the metal mask plate M using the ultrasonic cleaning apparatus 10 according to the present embodiment will be described. First, the metal mask plate M to be cleaned is slid and inserted from the insertion opening 15 on the right side wall of the main frame 12 and positioned at the cleaning position between the pair of upper and lower holding units 50, 50.

  Next, the ultrasonic cleaning unit 30 and the reflective cleaning unit 40 are positioned at the lowest standby position of the cleaning surface of the metal mask plate M, and a cleaning operation is started by operating a control box (not shown).

  Specifically, the supply pump 23 is operated, and the cleaning liquid is supplied from the supply nozzle 34a of the cleaning medium supply unit 34 to the gap between the vibration plate 31 (and the reflection plate 41) and the cleaning surface (and the back cleaning surface) of the metal mask plate M. The ultrasonic vibrator 32 is vibrated while being supplied to the cleaning surface, and ultrasonic vibration is applied to the cleaning surface (and back surface cleaning surface) of the metal mask plate M. Due to this ultrasonic vibration, microcracks are generated due to the vibration undulations at the adhesion interface of the deposit, and the cleaning liquid enters the gap and chemically dissolves, and the deposit exfoliates from the cleaning surface beyond the limit of adhesion. Washed. Deposits peeled off from the cleaning surface flow out below the vibrating portion 33 together with the cleaning liquid.

  Here, the drying time can be further shortened by continuously applying ultrasonic vibration in the vibration section 33 to vaporize the cleaning liquid. In other words, the ultrasonic energy becomes dense at the inner peripheral edge of the mask hole opened in the metal mask plate M, and the movement of air molecules becomes intense, so that the surface of the cleaning surface is supplied after being supplied from the cleaning medium supply unit 34. What is necessary is just to vaporize the washing | cleaning liquid which has not contributed to the peeling effect | action of a deposit | attachment by ultrasonic vibration.

  Then, while performing ultrasonic cleaning, the moving unit 55 is operated to synchronize the ultrasonic cleaning unit 30 and the reflective cleaning unit 40 and move them upward along the cleaning surface. As described above, when the ultrasonic cleaning unit 30 and the reflective cleaning unit 40 are moved upward along the cleaning surface, the cleaning liquid used for cleaning the metal mask plate M is received by the sliding blade 36 to separate the waste liquid. It is collected in the tank 22. On the other hand, cleaning liquid and deposits remaining in the mask hole of the metal mask plate M without being collected by the sliding blade 36 are removed by suction by the suction pump 21 of the suction removal unit 37.

  In this way, the ultrasonic cleaning operation in the ultrasonic cleaning unit 30 and the reflective cleaning unit 40, the recovery operation of the cleaning liquid containing the deposits in the sliding removal unit 35 and the suction removal unit 37, and the drying operation of the metal mask plate M are performed. When the ultrasonic cleaning unit 30 and the reflective cleaning unit 40 are moved to the end position at the uppermost end of the cleaning surface by the moving unit 55 while performing continuously, the cleaning operation and the drying operation are completed.

  As described above, according to the ultrasonic cleaning apparatus 10 according to the embodiment of the present invention, the ultrasonic cleaning unit 30 is provided with the vibration unit 33, the cleaning medium supply unit 34, the sliding removal unit 35, and the suction removal unit 37. Since the ultrasonic cleaning unit 30 is moved up and down along the cleaning surface of the metal mask plate M, the cleaning liquid adhering to the cleaning surface is simultaneously removed by suction while drying the cleaning surface while being ultrasonically cleaned. Can do. For this reason, after performing ultrasonic cleaning, the metal mask plate M can be dried in a short time at the position as it is, and the workability is improved without the need to reset the metal mask plate M.

  In addition, since the cleaning liquid is supplied to the gap between the cleaning surface of the metal mask plate M and the vibration plate 31, the metal mask plate M can be cleaned with a small amount of cleaning liquid, and further, a good dry state can be obtained in a short time. Is expensive.

  In this embodiment, the metal mask plate M is used as an object to be cleaned. However, the present invention can be applied to various objects to be cleaned such as surface cleaning of a semiconductor wafer.

  As a modification of the present embodiment, as shown in FIG. 4, if the waste liquid separation tank 22 and the suction pump 21 are connected by a branch pipe 29, the air in the waste liquid separation tank 22 passes through the branch pipe 29. Accordingly, the cleaning liquid collected by the sliding removal unit 35 is actively drawn into the waste liquid separation tank 22 by this suction action. For this reason, it is preferable that the cleaning liquid can be smoothly collected from the sliding removal unit 35 to the waste liquid separation tank 22.

  As described above, according to the present invention, an object to be cleaned such as a metal mask plate can be cleaned in a short time with a small amount of cleaning liquid, and after cleaning, it can be dried in a short time at the same position. Since a highly practical effect that an ultrasonic cleaning apparatus can be provided is obtained, it is extremely useful and has high industrial applicability.

It is a front view which shows schematic structure of the ultrasonic cleaning apparatus which concerns on embodiment of this invention. It is a side view which shows schematic structure of the ultrasonic cleaning apparatus which concerns on this embodiment. It is a front view which shows schematic structure of an ultrasonic cleaning unit. FIG. 3 is a view corresponding to FIG. 1 according to a modification of the present invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 Ultrasonic cleaning apparatus 30 Ultrasonic cleaning unit 31 Diaphragm 32 Ultrasonic vibrator 33 Vibration part (reflection part)
34 Cleaning medium supply unit 35 Sliding removal unit 36 Sliding blade 37 Suction removal unit 38 Suction nozzle 40 Reflective cleaning unit 41 Reflecting plate 50 Holding unit 55 Moving unit M Metal mask plate (object to be cleaned)

Claims (7)

An ultrasonic cleaning apparatus for cleaning a flat object to be cleaned,
An ultrasonic cleaning unit that supplies a cleaning medium to the cleaning surface of the object to be cleaned and ultrasonically cleans the object to be cleaned by ultrasonic vibration;
A holding unit that holds the object to be cleaned substantially vertically or at a predetermined angle so that the cleaning medium supplied by the ultrasonic cleaning unit flows down by its own weight along the cleaning surface of the object to be cleaned;
A moving unit for reciprocating the ultrasonic cleaning unit in the vertical direction along the cleaning surface of the object to be cleaned;
The ultrasonic cleaning unit includes:
Vibrating means having a diaphragm that is disposed to face the cleaning surface of the object to be cleaned, substantially in parallel with a gap, and to which an ultrasonic transducer is attached;
Cleaning medium supply means for supplying a cleaning medium to a gap between the vibration plate and the cleaning surface of the object to be cleaned;
An ultrasonic cleaning apparatus, comprising: a suction removal means that is disposed below the vibration means and sucks and removes a cleaning medium attached to a cleaning surface of the object to be cleaned. In claim 1,
The ultrasonic cleaning unit is disposed between the vibration unit and the suction removal unit, and is a sliding removal unit that contacts the cleaning surface of the object to be cleaned and slides and removes the cleaning medium attached to the cleaning surface. An ultrasonic cleaning apparatus comprising: In claim 1 or 2,
A reflective cleaning unit disposed opposite to the back cleaning surface opposite to the surface facing the ultrasonic cleaning unit of the object to be cleaned;
The moving unit is configured to reciprocate in the vertical direction synchronously with the ultrasonic cleaning unit and the reflective cleaning unit facing each other,
The reflective cleaning unit is
Reflecting means having a reflecting plate disposed opposite to the vibration plate across the object to be cleaned and disposed substantially in parallel with the back side cleaning surface of the object to be cleaned;
Cleaning medium supply means for supplying a cleaning medium to a gap between the reflector and the back side cleaning surface of the object to be cleaned;
An ultrasonic cleaning apparatus, comprising: a suction removing unit that is disposed below the reflecting unit and sucks and removes a cleaning medium attached to a back side cleaning surface of the object to be cleaned. In claim 3,
An ultrasonic cleaning apparatus, wherein an ultrasonic vibrator is attached to a reflection plate of the reflective cleaning unit. In claim 3 or 4,
The reflective cleaning unit is disposed between the reflective means and the suction removing means, and is made to slide to remove the cleaning medium adhering to the back side cleaning surface in contact with the back side cleaning surface of the object to be cleaned. An ultrasonic cleaning apparatus comprising means. In any one of Claims 1 thru | or 5,
The ultrasonic cleaning apparatus, wherein the ultrasonic vibration unit operates to vaporize the cleaning medium supplied by the cleaning medium supply means. In any one of Claims 1 thru | or 6,
The ultrasonic cleaning apparatus, wherein the cleaning medium supply means is configured to supply a mist-like cleaning liquid as the cleaning medium.

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