JP2009081396A - Copper foil for printed wiring board, and processing method of surface thereof - Google Patents

Copper foil for printed wiring board, and processing method of surface thereof Download PDF

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JP2009081396A
JP2009081396A JP2007251382A JP2007251382A JP2009081396A JP 2009081396 A JP2009081396 A JP 2009081396A JP 2007251382 A JP2007251382 A JP 2007251382A JP 2007251382 A JP2007251382 A JP 2007251382A JP 2009081396 A JP2009081396 A JP 2009081396A
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copper foil
layer
printed wiring
nickel
cobalt
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JP4941204B2 (en
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Yuko Matsumoto
雄行 松本
Takashi Miyaji
孝 宮地
Shinichiro Shimizu
慎一郎 清水
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Hitachi Cable Ltd
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Hitachi Cable Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a copper foil for a printed wiring board, which enhances a heat-resistance against discoloration of a copper foil glossy face so as not to cause a discoloration in a high temperature process, also has an excellent acid-soluble property, and takes into consideration an environment not using hexavalent chromium. <P>SOLUTION: In the copper foil for the printed wiring board 1, an alloy layer 3 made of nickel and cobalt is formed on a surface of a copper foil 2, and an antirust layer made of a zinc layer 4 and a chromate layer 5 is formed thereon to form a glossy face. In the alloy layer 3 made of nickel and cobalt, a nickel attachment amount is 0.5 to 2.0 μg/cm<SP>2</SP>, and a cobalt attachment amount is 40 to 80% mass with respect to the total of the nickel attachment amount and the cobalt attachment amount. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、銅箔の光沢面側に表面処理を施したプリント配線板用銅箔及びその表面処理方法に係り、特に、耐加熱変色性と酸溶解性に優れた皮膜を有し、環境保護を配慮したプリント配線板用銅箔及びその表面処理方法に関する。   The present invention relates to a copper foil for a printed wiring board having a surface treated on the glossy surface side of the copper foil and a surface treatment method thereof, and in particular, has a film excellent in heat discoloration resistance and acid solubility, and protects the environment. The present invention relates to a copper foil for a printed wiring board and a surface treatment method thereof.

プリント配線板は、一般に銅箔と合成樹脂などの基材とを加熱圧着して張り合わせて銅張積層板を形成し、その後目的とする回路を形成するためにフォトレジストによる回路を印刷した後、不要の銅部をエッチングにより除去して回路を形成することにより作製される。プリント配線板用銅箔は、基材との接着面となる粗化面と配線の表面になる光沢面とを有する。   A printed wiring board is generally formed by bonding a copper foil and a base material such as a synthetic resin by thermocompression bonding to form a copper-clad laminate, and then printing a circuit using a photoresist to form a desired circuit, The circuit is formed by removing unnecessary copper portions by etching. The copper foil for printed wiring boards has a roughened surface that becomes an adhesive surface with a substrate and a glossy surface that becomes the surface of the wiring.

粗化面においては基材との接着力を確保するための処理を行い、さらに基材との接着性における耐熱、耐薬品などの接着特性やエッチング特性などを安定化させることについて様々な表面処理が付与されている。   Various surface treatments are performed on the roughened surface to ensure adhesion to the substrate, and to stabilize the adhesive properties such as heat resistance and chemical resistance, and etching properties in terms of adhesion to the substrate. Is granted.

一方、反対側の面である光沢面においては耐加熱変色性、半田ぬれ性、レジスト密着性、酸溶解性などが要求されており粗化面側、光沢面側においてそれぞれ別の処理法が必要であり検討されている。   On the other hand, the glossy surface, which is the opposite side, requires heat discoloration resistance, solder wettability, resist adhesion, acid solubility, etc., and requires different treatment methods on the roughened surface side and the glossy surface side. It is being studied.

一般にプリント配線板に用いられる基材としては、リジッド材であるガラスエポキシ基材が用いられているが、近年、電子機器の小型、軽量化から、プリント配線板においては薄くて軽く、また折り曲げ性に優れたフレキシブル基板の需要が増えており、基材としてはポリイミド基材が主に用いられる。   In general, a glass epoxy base material, which is a rigid material, is used as a base material used for printed wiring boards. However, in recent years, printed circuit boards are thin and light, and bendability due to the small size and light weight of electronic devices. The demand for flexible substrates is excellent, and a polyimide base material is mainly used as the base material.

リジッド基板用のガラスエポキシ基材と銅箔とを張り合わせる際には160〜170℃の温度で1〜2時間加熱圧着されるが、フレキシブル基板用のポリイミド基材に対しては高温の条件で張り合わされ、特に接着剤を介さない2層フレキ(ポリイミドワニスを直接銅箔上に塗布し、フレキシブル基板としたもので、ポリイミド層と銅箔層の2層構造となっているため、2層フレキと呼ぶ)においてはさらに高温で張り合わせるため、銅箔の光沢面側特性のうち耐加熱変色性はきわめて重要な特性の1つになっている。   When laminating a glass epoxy base material for a rigid substrate and a copper foil, it is thermocompression bonded at a temperature of 160 to 170 ° C. for 1 to 2 hours, but for a polyimide base material for a flexible substrate under a high temperature condition. Two-layer flexible (a polyimide substrate and a copper foil layer have a two-layer structure). In other words, heat discoloration resistance is one of the most important characteristics among the glossy surface side characteristics of the copper foil.

また、最近では配線のファイン化にともない銅箔の薄厚化が必要になり、基材と銅箔とを張り合わせた後、銅箔を酸により溶解する処理を行うため、酸溶解性も重要な特性となっている。   In addition, copper foils have recently become thinner due to finer wiring, and after bonding the substrate and copper foil, the copper foil is dissolved with acid, so acid solubility is also an important characteristic. It has become.

耐加熱変色性においては、これまで200〜250℃で10分程度の処理で酸化されなければよかったが、先に述べた特に2層フレキに対しては300℃で30分の加熱処理でも酸化変色しない耐加熱変色性が求められる。一方、酸溶解性に対しては、銅用の酸溶解液を用いた表面処理層の溶解速度が銅と同等であることが必要になっている。   In the heat discoloration resistance, until now, it has been necessary to oxidize at a temperature of 200 to 250 ° C. for about 10 minutes. No heat discoloration resistance is required. On the other hand, for acid solubility, the dissolution rate of the surface treatment layer using an acid solution for copper is required to be equivalent to that of copper.

なお、この出願の発明に関連する先行技術文献情報としては、次のものがある。   The prior art document information related to the invention of this application includes the following.

特許第2517503号公報Japanese Patent No. 2517503 特開平10−135594号公報Japanese Patent Laid-Open No. 10-135594 特開2006−319287号公報JP 2006-319287 A 特開2003−201585号公報JP 2003-201585 A 特開平9−87888号公報JP-A-9-87888 特開2006−319286号公報JP 2006-319286 A 特開2005−240132号公報JP-A-2005-240132

一般に、光沢面側の処理においては、亜鉛めっきしてクロメート処理が施されるが、この処理においては、200〜250℃で10分程度の耐加熱変色性しか有さない。したがって、300℃、30分の高温処理でも変色せず、また酸溶解性が良好な表面処理が必要になる。   In general, in the treatment on the glossy surface side, the chromate treatment is performed by galvanizing, but this treatment has only heat discoloration resistance at 200 to 250 ° C. for about 10 minutes. Therefore, a surface treatment that does not change color even at a high temperature treatment of 300 ° C. for 30 minutes and has good acid solubility is required.

さらに、施すクロメート処理は6価クロムを用いた処理を行っており、近年規制の厳しくなった環境問題において使用しないことが好ましくなっている。   Furthermore, the chromate treatment to be performed is a treatment using hexavalent chromium, and it is preferable that the chromate treatment is not used in an environmental problem that has become stricter in recent years.

そこで、本発明の目的は、従来からの亜鉛めっきとクロメート処理に対して300℃、30分の高温処理でも変色を起こさないよう銅箔光沢面の耐加熱変色性を高め、また酸に対する溶解性が良好で、6価クロムを用いない環境にも配慮したプリント配線板用銅箔及びその表面処理方法を提供することにある。   Therefore, the object of the present invention is to increase the heat discoloration resistance of the glossy surface of the copper foil so as not to cause discoloration even at a high temperature treatment of 300 ° C. and 30 minutes compared to the conventional galvanizing and chromate treatment, and the solubility in acid. Is to provide a copper foil for printed wiring boards and a surface treatment method thereof in consideration of the environment in which hexavalent chromium is not used.

本発明は上記目的を達成するために創案されたものであり、請求項1の発明は、銅箔の表面に、ニッケルとコバルトからなる合金層を形成し、その上に亜鉛層とクロメート層とからなる防錆層を形成して光沢面を形成するプリント配線板用銅箔において、前記合金層は、ニッケル付着量が0.5μg/cm以上2.0μg/cm以下であり、コバルト付着量が、ニッケル付着量とコバルト付着量の合計に対して40%以上80%以下の質量比であるプリント配線板用銅箔である。 The present invention was devised to achieve the above object, and the invention of claim 1 is characterized in that an alloy layer made of nickel and cobalt is formed on the surface of a copper foil, and a zinc layer and a chromate layer are formed thereon. In the copper foil for printed wiring boards that forms a glossy surface by forming a rust preventive layer, the alloy layer has a nickel adhesion amount of 0.5 μg / cm 2 or more and 2.0 μg / cm 2 or less, and cobalt adhesion The amount is a copper foil for printed wiring boards having a mass ratio of 40% or more and 80% or less with respect to the total amount of nickel adhesion and cobalt adhesion.

請求項2の発明は、前記亜鉛層の亜鉛付着量が0.5μg/cm以上2.0μg/cm以下であり、前記クロメート層のクロム付着量が0.3μg/cm以上1.2μg/cm以下である請求項1に記載のプリント配線板用銅箔である。 According to a second aspect of the present invention, the zinc adhesion amount of the zinc layer is 0.5 μg / cm 2 or more and 2.0 μg / cm 2 or less, and the chromium adhesion amount of the chromate layer is 0.3 μg / cm 2 or more and 1.2 μg. The copper foil for printed wiring board according to claim 1, which is / cm 2 or less.

請求項3の発明は、前記銅箔の裏面に粗化めっき層を形成し、前記合金層、前記亜鉛層、および前記クロメート層を順次形成して粗化面を形成する請求項1または2に記載のプリント配線板用銅箔である。   Invention of Claim 3 forms a roughening plating layer in the back surface of the said copper foil, forms the roughening surface by forming the said alloy layer, the said zinc layer, and the said chromate layer one by one. It is a copper foil for printed wiring boards as described.

請求項4の発明は、銅箔の表面に、ニッケルとコバルトからなる合金層を形成し、その上に亜鉛層とクロメート層とからなる防錆層を形成して光沢面を形成するプリント配線板用銅箔の表面処理方法において、前記合金層を、ニッケル付着量が0.5μg/cm以上2.0μg/cm以下、コバルト付着量が、ニッケル付着量とコバルト付着量の合計に対して40%以上80%以下の質量比で形成するプリント配線板用銅箔の表面処理方法である。 The invention according to claim 4 is a printed wiring board in which an alloy layer composed of nickel and cobalt is formed on the surface of a copper foil, and a rust preventive layer composed of a zinc layer and a chromate layer is formed thereon to form a glossy surface. In the copper foil surface treatment method, the alloy layer has a nickel adhesion amount of 0.5 μg / cm 2 or more and 2.0 μg / cm 2 or less, and the cobalt adhesion amount is the sum of the nickel adhesion amount and the cobalt adhesion amount. This is a surface treatment method for a copper foil for printed wiring board formed at a mass ratio of 40% or more and 80% or less.

請求項5の発明は、前記合金層と前記亜鉛層とは電気めっきにより形成し、前記クロメート層は3価のクロメート処理液で浸漬処理して形成する請求項4に記載のプリント配線板用銅箔の表面処理方法である。   5. The printed wiring board copper according to claim 4, wherein the alloy layer and the zinc layer are formed by electroplating, and the chromate layer is formed by immersion treatment with a trivalent chromate treatment solution. This is a foil surface treatment method.

請求項6の発明は、前記銅箔の裏面に粗化めっき層を形成した後、前記銅箔の表面と裏面とに、前記合金層、前記亜鉛層、および前記クロメート層を順次同時に形成する請求項4または5に記載のプリント配線板用銅箔の表面処理方法である。   According to a sixth aspect of the present invention, after the rough plating layer is formed on the back surface of the copper foil, the alloy layer, the zinc layer, and the chromate layer are sequentially formed simultaneously on the front surface and the back surface of the copper foil. Item 6. A surface treatment method for a copper foil for printed wiring board according to Item 4 or 5.

本発明によれば、銅箔の光沢面において、プリント配線板作製時の高温の熱処理に対しても変色しない耐加熱変色性を有し、かつプリント配線板のファイン化にともなう銅箔の薄肉化のための酸処理に対して酸溶解性が良好であるプリント配線板用銅箔を実現できる。   According to the present invention, the glossy surface of the copper foil has heat discoloration resistance that does not change even when subjected to high-temperature heat treatment during the production of the printed wiring board, and the copper foil is thinned as the printed wiring board is refined. Therefore, it is possible to realize a copper foil for a printed wiring board having good acid solubility with respect to acid treatment for the purpose.

以下、本発明の好適な実施形態を添付図面にしたがって説明する。   Preferred embodiments of the present invention will be described below with reference to the accompanying drawings.

図1は、本発明の好適な実施形態を示すプリント配線板用銅箔の断面図である。   FIG. 1 is a cross-sectional view of a copper foil for a printed wiring board showing a preferred embodiment of the present invention.

図1に示すように、本実施形態に係るプリント配線板用銅箔1は、銅箔2の表面s1に、ニッケルとコバルトからなる合金層3を形成し、その上に亜鉛層4とクロメート層5とからなる防錆層を形成して光沢面Sを形成するものであり、ニッケルとコバルトからなる合金層3は、ニッケル付着量が0.5μg/cm以上2.0μg/cm以下、望ましくは0.7μg/cm以上2.0μg/cm以下、さらに望ましくは1.2μg/cm以上2.0μg/cm以下であり、コバルト付着量が、ニッケル付着量とコバルト付着量の合計に対して40%以上80%以下、望ましくは60%以上80%以下、さらに望ましくは65%以上80%以下の質量比である。 As shown in FIG. 1, the copper foil 1 for printed wiring boards which concerns on this embodiment forms the alloy layer 3 which consists of nickel and cobalt on the surface s1 of the copper foil 2, and the zinc layer 4 and chromate layer on it 5 to form a glossy surface S, and the alloy layer 3 made of nickel and cobalt has a nickel adhesion amount of 0.5 μg / cm 2 or more and 2.0 μg / cm 2 or less, desirably 0.7 [mu] g / cm 2 or more 2.0 [mu] g / cm 2 or less, more desirably not more than 1.2 ug / cm 2 or more 2.0 [mu] g / cm 2, the cobalt coating weight, the nickel coating weight and cobalt deposition amount The mass ratio is 40% or more and 80% or less, desirably 60% or more and 80% or less, and more desirably 65% or more and 80% or less.

これは、ニッケル付着量が0.5μg/cm未満では、高温処理(例えば、300℃、30分の加熱処理)によって変色が生じ、耐加熱変色性が悪化し、2.0μg/cmを超えると表面色が灰色状になり、半田濡れ性が悪化するためである。 This is because when the nickel adhesion amount is less than 0.5 μg / cm 2 , discoloration occurs due to high-temperature treatment (for example, heat treatment at 300 ° C. for 30 minutes), heat discoloration resistance deteriorates, and 2.0 μg / cm 2 is reduced. This is because the surface color becomes gray and the solder wettability deteriorates.

また、コバルト付着量がニッケル付着量とコバルト付着量の合計に対して40%未満の質量比では酸溶解性が悪化し、80%を超える質量比では効果に変化が無く、不経済である。   Further, if the cobalt adhesion amount is less than 40% with respect to the total of the nickel adhesion amount and the cobalt adhesion amount, the acid solubility deteriorates, and if the mass ratio exceeds 80%, the effect is not changed, which is uneconomical.

ニッケルとコバルトからなる合金層3は、耐加熱変色性および耐湿変色性を向上させると同時に、良好な酸溶解性を有する。ニッケルおよびコバルトはそれぞれ単体のめっきでも耐加熱変色性、耐湿変色性を有するが、ニッケルとコバルトからなる合金とすることでその効果を高めることができる。また、このニッケルとコバルトからなる合金層3は、銅箔2の銅原子の拡散を防止するバリア層としても機能し、さらに銅箔2と亜鉛層4とが合金化することを防ぐ。また、コバルトはポリイミドの反応を活発にすると考えられており、基材(図示せず)としてポリイミドを用いる場合、粗化面Mにおいて基材との接着性を向上させる効果もある。   The alloy layer 3 made of nickel and cobalt improves heat discoloration resistance and moisture discoloration resistance, and at the same time has good acid solubility. Nickel and cobalt each have heat discoloration resistance and moisture discoloration resistance even with single plating, but the effect can be enhanced by using an alloy composed of nickel and cobalt. The alloy layer 3 made of nickel and cobalt also functions as a barrier layer for preventing the diffusion of copper atoms in the copper foil 2 and further prevents the copper foil 2 and the zinc layer 4 from being alloyed. Further, cobalt is considered to activate the reaction of polyimide, and when polyimide is used as a base material (not shown), there is also an effect of improving the adhesion with the base material on the roughened surface M.

銅箔2としては、圧延銅箔もしくは電解銅箔を用いるとよい。   As the copper foil 2, a rolled copper foil or an electrolytic copper foil may be used.

また、本実施形態に係るプリント配線板用銅箔1では、亜鉛層4の亜鉛付着量が0.5μg/cm以上2.0μg/cm以下であり、クロメート層5のクロム付着量が0.3μg/cm以上1.2μg/cm以下であるとよい。 Further, the copper foil for printed wiring boards 1 according to the present embodiment, a zinc coating weight of the zinc layer 4 is 0.5 [mu] g / cm 2 or more 2.0 [mu] g / cm 2 or less, chromium coating weight of the chromate layer 5 is 0 .3μg / cm 2 or more 1.2 ug / cm 2 may or less.

これは、亜鉛層4の亜鉛付着量が0.5μg/cm未満であると防錆層としての役割を果たさず、さらにクロム付着量を制御することが困難となり、2.0μg/cmを超えると、プリント配線板を形成する際にエッチングにより回路側面に露出した亜鉛が、製造工程中に塩酸や無電解スズめっき液によって溶出しやすくなるためである。無電解スズめっきは、プリント配線板の製造工程において、他のプリント配線板や電子部品との接続部分や半田接合する部分などに、防食性や半田濡れ性の向上を目的として施されることがある。 If the zinc adhesion amount of the zinc layer 4 is less than 0.5 μg / cm 2, it does not play a role as a rust prevention layer, and it becomes difficult to control the chromium adhesion amount, and 2.0 μg / cm 2 is reduced. This is because, when the printed wiring board is formed, zinc exposed to the circuit side surface by etching is easily eluted by hydrochloric acid or electroless tin plating solution during the manufacturing process. Electroless tin plating may be applied in the printed wiring board manufacturing process for the purpose of improving anticorrosion and solder wettability, etc. on the parts connected to other printed wiring boards and electronic components and soldered parts. is there.

また、クロム付着量が0.3μg/cm未満であると防錆能力が不足し、1.2μg/cmを超えるとクロメート層5が厚く脆弱になり、剥離しやすくなる。 Further, the amount of chromium deposited is insufficient anticorrosive ability is less than 0.3μg / cm 2, 1.2μg / cm 2 by weight, become chromate layer 5 thick brittle, consisting apt to be removed.

このクロメート層5は、有害な6価クロムを含まない、3価のクロメート処理液で浸漬処理して形成するとよい。   The chromate layer 5 is preferably formed by dipping in a trivalent chromate treatment solution that does not contain harmful hexavalent chromium.

亜鉛層4は、クロメート層5の形成を補助すると共に防錆層として機能し、クロメート層5は防錆層として機能すると共に耐食性を付与する。   The zinc layer 4 assists the formation of the chromate layer 5 and functions as a rust-proof layer, and the chromate layer 5 functions as a rust-proof layer and imparts corrosion resistance.

また、本実施形態に係るプリント配線板用銅箔1では、銅箔2の裏面s2に粗化めっき層6を形成した後、ニッケルとコバルトからなる合金層33、亜鉛層34、およびクロメート層35を順次形成して粗化面Mを形成する。粗化めっき層6は、プリント配線板用銅箔1と図示しない基材とを接着する際に、接着性を高めるために形成される。   Further, in the printed circuit board copper foil 1 according to the present embodiment, after the rough plating layer 6 is formed on the back surface s2 of the copper foil 2, the alloy layer 33, the zinc layer 34, and the chromate layer 35 made of nickel and cobalt are formed. Are sequentially formed to form the roughened surface M. The rough plating layer 6 is formed in order to enhance the adhesiveness when the printed wiring board copper foil 1 and a base material (not shown) are bonded.

さらに、プリント配線板用銅箔1の粗化面Mにおいては、クロメート層35の上にシランカップリング剤を塗布し、これを乾燥させてシランカップリング処理層7を形成する。
シランカップリング剤としては、基材にポリイミドを用いる場合、アミノシランなどを用いるとよい。
Further, on the roughened surface M of the copper foil 1 for printed wiring board, a silane coupling agent is applied on the chromate layer 35 and dried to form the silane coupling treatment layer 7.
As the silane coupling agent, aminosilane or the like is preferably used when polyimide is used for the base material.

次に、本実施形態に係るプリント配線板用銅箔の表面処理方法を説明する。   Next, the surface treatment method of the copper foil for printed wiring boards according to the present embodiment will be described.

本実施形態に係るプリント配線板用銅箔の表面処理方法は、まず、銅箔2の表面を清浄化するため、前処理として水酸化ナトリウム、炭酸ナトリウムなどのアルカリ溶液で陰極電解脱脂した後、硫酸などの酸溶液に浸漬して酸処理を行うとよい。   In the surface treatment method of the copper foil for printed wiring board according to the present embodiment, first, in order to clean the surface of the copper foil 2, as a pretreatment, after cathodic electrolysis with an alkaline solution such as sodium hydroxide or sodium carbonate, The acid treatment may be performed by dipping in an acid solution such as sulfuric acid.

前処理を行った後、銅箔2の粗化面に粗化めっき層6を形成する。   After the pretreatment, the roughened plating layer 6 is formed on the roughened surface of the copper foil 2.

この粗化めっき層6は、例えば、ヤケめっきによって銅箔2の粗化面に粒状の銅を析出させる、または酸を用いて結晶粒界の選択エッチングを行うことで形成するとよい。   The rough plating layer 6 may be formed, for example, by depositing granular copper on the rough surface of the copper foil 2 by burn plating, or by performing selective etching of crystal grain boundaries using an acid.

その後、銅箔2の表面と裏面とに、ニッケルとコバルトからなる合金層3、33を電気めっき(電解めっき)により同時に形成する。   Thereafter, alloy layers 3 and 33 made of nickel and cobalt are simultaneously formed on the front and back surfaces of the copper foil 2 by electroplating (electrolytic plating).

このとき、図2のめっき装置20を用いて電気めっきする。   At this time, electroplating is performed using the plating apparatus 20 of FIG.

このめっき装置20は、被めっき対象である銅箔2の表面に電気めっき処理を行う装置であり、複数の不溶性陽極板22(図2では3つ)と、銅箔21を搬送する複数の搬送用ロール23(図2では3つ)とを備え、銅箔2を陰極とし、不溶性陽極板22を陽極として電気めっきを行うものである。   The plating apparatus 20 is an apparatus that performs electroplating on the surface of the copper foil 2 to be plated, and includes a plurality of insoluble anode plates 22 (three in FIG. 2) and a plurality of transports that transport the copper foil 21. And rolls 23 (three in FIG. 2), and electroplating is performed using the copper foil 2 as a cathode and the insoluble anode plate 22 as an anode.

不溶性陽極板22としては、例えば、チタン、チタン合金、白金、白金合金、チタンに白金をめっきしたもの、およびチタンに酸化イリジウムを付着させたものなどを用いるとよい。   As the insoluble anode plate 22, for example, titanium, titanium alloy, platinum, platinum alloy, titanium plated with platinum, titanium with iridium oxide attached, or the like may be used.

ニッケルとコバルトからなる合金層3、33を形成するためのめっき浴Aの浴組成および処理条件の一例を次に示す。   An example of the bath composition and processing conditions of the plating bath A for forming the alloy layers 3 and 33 made of nickel and cobalt is shown below.

めっき浴A
硫酸ニッケル六水和物(NiSO・6HO):150〜200g/L
硫酸コバルト七水和物(CoSO・7HO):20〜30g/L
クエン酸一水和物(C・HO):10〜20g/L
液温:35〜45℃
pH:3.0〜4.0
電流密度Dk:0.5〜2.0A/dm
処理時間:2〜5秒
めっき浴Aを用いてニッケルとコバルトからなる合金層3、33を形成した後、そのニッケルとコバルトからなる合金層3、33の上に亜鉛層4、34を電気めっきにより同時に形成する。
Plating bath A
Nickel sulfate hexahydrate (NiSO 4 .6H 2 O): 150 to 200 g / L
Cobalt sulfate heptahydrate (CoSO 4 · 7H 2 O): 20-30 g / L
Citric acid monohydrate (C 6 H 8 O 7 · H 2 O): 10~20g / L
Liquid temperature: 35-45 degreeC
pH: 3.0-4.0
Current density Dk: 0.5 to 2.0 A / dm 2
Processing time: 2 to 5 seconds After forming the alloy layers 3 and 33 made of nickel and cobalt using the plating bath A, the zinc layers 4 and 34 are electroplated on the alloy layers 3 and 33 made of nickel and cobalt. At the same time.

亜鉛層4、34を形成するためのめっき浴Bの浴組成および処理条件の一例を次に示す。   An example of the bath composition and processing conditions of the plating bath B for forming the zinc layers 4 and 34 is shown below.

めっき浴B
硫酸亜鉛七水和物(ZnSO・7HO):80〜100g/L
クエン酸三ナトリウム(CNa):15〜25g/L
液温:15〜25℃
pH:3.0〜4.0
電流密度Dk:0.3〜2.0A/dm
処理時間:2〜5秒
めっき浴Bを用いて亜鉛層4、34を形成した後、3価のクロメート処理液で浸漬処理してクロメート層5、35を同時に形成する。
Plating bath B
Zinc sulfate heptahydrate (ZnSO 4 .7H 2 O): 80 to 100 g / L
Trisodium citrate (C 6 H 5 Na 3 O 7): 15~25g / L
Liquid temperature: 15-25 ° C
pH: 3.0-4.0
Current density Dk: 0.3 to 2.0 A / dm 2
Treatment time: 2 to 5 seconds After the zinc layers 4 and 34 are formed using the plating bath B, the chromate layers 5 and 35 are simultaneously formed by immersion treatment with a trivalent chromate treatment solution.

クロメート層5、35を形成するためのクロメート処理液Cの浴組成および処理条件の一例を次に示す。   An example of the bath composition and treatment conditions of the chromate treatment liquid C for forming the chromate layers 5 and 35 is shown below.

クロメート処理液C
硫酸クロム九水和物(Cr(SO・9HO):0.05〜0.25g/L
硝酸(HNO):2〜20g/L
液温:20〜30℃
pH:3.0〜4.0
処理時間:2〜10秒
クロメート処理液Cを用いてクロメート層5、35を形成した後、粗化面Mのクロメート層35の上にシランカップリング剤を塗布し、これを乾燥してシランカップリング処理層7を形成する。
Chromate treatment liquid C
Chromium sulfate nonahydrate (Cr (SO 4) 3 · 9H 2 O): 0.05~0.25g / L
Nitric acid (HNO 3 ): 2 to 20 g / L
Liquid temperature: 20-30 degreeC
pH: 3.0-4.0
Treatment time: 2 to 10 seconds After the chromate layers 5 and 35 are formed using the chromate treatment liquid C, a silane coupling agent is applied on the chromate layer 35 on the roughened surface M, and this is dried to obtain a silane cup. A ring processing layer 7 is formed.

以上により、本実施形態に係るプリント配線板用銅箔1が得られる。   As described above, the printed wiring board copper foil 1 according to the present embodiment is obtained.

本実施形態に係るプリント配線板用銅箔1を用いてプリント配線板を作製する際は、プリント配線板用銅箔1の粗化面Mを基材側として基材と加熱圧着する、もしくはプリント配線板用銅箔1の粗化面に直接ポリイミドワニスを塗布して基材とプリント配線板用銅箔1を接着する。その後、プリント配線板用銅箔1の光沢面Sにフォトレジストによる回路を印刷した後、不要の銅部をエッチングにより除去して回路を形成するとよい。また、配線のファイン化のため、プリント配線板用銅箔1を酸により溶解する処理を行ってもよい。   When producing a printed wiring board using the copper foil 1 for printed wiring boards according to the present embodiment, the printed wiring board copper foil 1 is heat-pressed with the base material with the roughened surface M of the copper foil 1 for printed wiring board as the base material side, or printed. A polyimide varnish is directly applied to the roughened surface of the copper foil 1 for wiring boards, and the substrate and the copper foil 1 for printed wiring boards are bonded. Then, after printing the circuit by a photoresist on the glossy surface S of the copper foil 1 for printed wiring boards, it is good to form a circuit by removing an unnecessary copper part by an etching. Moreover, you may perform the process which melt | dissolves the copper foil 1 for printed wiring boards with an acid for refinement | miniaturization of wiring.

本実施形態の作用を説明する。   The operation of this embodiment will be described.

本実施形態に係るプリント配線板用銅箔1は、ニッケルとコバルトからなる合金層3のニッケル付着量が0.5μg/cm以上2.0μg/cm以下であり、コバルト付着量が、ニッケル付着量とコバルト付着量の合計に対して40%以上80%以下の質量比としている。 In the copper foil 1 for printed wiring board according to the present embodiment, the nickel adhesion amount of the alloy layer 3 made of nickel and cobalt is 0.5 μg / cm 2 or more and 2.0 μg / cm 2 or less, and the cobalt adhesion amount is nickel. The mass ratio is 40% or more and 80% or less with respect to the total of the adhesion amount and the cobalt adhesion amount.

これにより、ニッケル付着量が不足して耐加熱変色性が低下するのを防ぐことができ、例えば、300℃、30分の高温処理によっても変色が生じないようにすることができる。   Thereby, it can prevent that nickel adhesion amount runs short and heat-resistant discoloration resistance falls, for example, it can prevent discoloration also by 300 degreeC and a high temperature process for 30 minutes.

また、コバルト付着量が不足して酸溶解性が低下するのを防ぐことができるため、銅と同等の良好な酸溶解速度を得ることができる。   Moreover, since it can prevent that the cobalt adhesion amount runs short and acid solubility falls, the favorable acid dissolution rate equivalent to copper can be obtained.

さらに、ニッケル付着量が多すぎて半田濡れ性が悪化すること、コバルト付着量が過大となり不経済となることを防ぐことができる。   Further, it is possible to prevent the nickel adhesion amount from being excessively high and the solder wettability from being deteriorated, and the cobalt adhesion amount from being excessive and uneconomical.

また、本実施形態に係るプリント配線板用銅箔1では、亜鉛層4の亜鉛付着量が0.5μg/cm以上2.0μg/cm以下であり、クロメート層5のクロム付着量が0.3μg/cm以上1.2μg/cm以下としている。 Further, the copper foil for printed wiring boards 1 according to the present embodiment, a zinc coating weight of the zinc layer 4 is 0.5 [mu] g / cm 2 or more 2.0 [mu] g / cm 2 or less, chromium coating weight of the chromate layer 5 is 0 .3μg / cm 2 or more 1.2μg / cm 2 are the following.

これにより、亜鉛付着量およびクロム付着量が不足して防錆層としての機能が低下するのを防ぐことができ、かつ亜鉛付着量が多すぎて亜鉛層4の亜鉛が溶出したり、クロム付着量が多すぎてクロメート層5が剥離しやすくなるのを防ぐことができる。   As a result, it is possible to prevent the zinc adhesion amount and chromium adhesion amount from being insufficient and prevent the function as a rust-preventing layer from being deteriorated, and the zinc adhesion amount is too large, so that the zinc of the zinc layer 4 is eluted or chromium adhesion occurs. It is possible to prevent the chromate layer 5 from being easily peeled off due to an excessive amount.

また、本実施形態に係るプリント配線板用銅箔の表面処理方法では、クロメート層5は3価のクロメート処理液で浸漬処理して形成している。   Moreover, in the surface treatment method for the copper foil for printed wiring board according to the present embodiment, the chromate layer 5 is formed by dipping with a trivalent chromate treatment solution.

これにより、有害な6価クロムを用いないため、環境への負荷を低減できる。   Thereby, since harmful hexavalent chromium is not used, the burden on the environment can be reduced.

さらに、本実施形態に係るプリント配線板用銅箔の表面処理方法は、銅箔2の裏面s2に粗化めっき層6を形成した後、ニッケルとコバルトからなる合金層3、33、亜鉛層4、34、およびクロメート層5、35を順次同時に形成している。   Furthermore, the surface treatment method of the copper foil for printed wiring boards which concerns on this embodiment forms the roughening plating layer 6 in the back surface s2 of the copper foil 2, Then, the alloy layers 3 and 33 which consist of nickel and cobalt, and the zinc layer 4 , 34 and chromate layers 5 and 35 are sequentially formed simultaneously.

これにより、銅箔2の表面s1と裏面s2とに同時にめっき処理ができ、作業時間を短縮できる。   Thereby, the plating process can be simultaneously performed on the front surface s1 and the back surface s2 of the copper foil 2, and the working time can be shortened.

また、本実施形態に係るプリント配線板用銅箔の表面処理方法によれば、本実施形態に係るプリント配線板用銅箔1を容易に作製できる。   Moreover, according to the surface treatment method of the copper foil for printed wiring boards which concerns on this embodiment, the copper foil 1 for printed wiring boards which concerns on this embodiment can be produced easily.

銅箔2には厚さ18μmの圧延銅箔を用いた。圧延銅箔表面を清浄化するために水酸化ナトリウム40g/L、炭酸ナトリウム20g/L、温度40℃のアルカリ溶液で電流密度5A/dm、処理時間30秒にて陰極電解脱脂した後、硫酸10%、室温の溶液で30秒処理による前処理を施した。 As the copper foil 2, a rolled copper foil having a thickness of 18 μm was used. In order to clean the rolled copper foil surface, sodium hydroxide 40 g / L, sodium carbonate 20 g / L, cathodic electrolytic degreasing with an alkaline solution at a temperature of 40 ° C. with a current density of 5 A / dm 2 and a treatment time of 30 seconds, and then sulfuric acid A pretreatment was performed with a 10% room temperature solution for 30 seconds.

この銅箔2に硫酸ニッケル六水和物175g/L、硫酸コバルト七水和物25g/L、クエン酸一水和物15g/L、温度40℃、pH3.3に調整しためっき浴Aを用いて電流密度0.8A/dmで3.5秒間電解処理してニッケルとコバルトからなる合金層3、33を施した。 A plating bath A adjusted to 175 g / L of nickel sulfate hexahydrate, 25 g / L of cobalt sulfate heptahydrate, 15 g / L of citric acid monohydrate, temperature of 40 ° C. and pH 3.3 was used for this copper foil 2. Then, electrolytic treatment was performed for 3.5 seconds at a current density of 0.8 A / dm 2 to provide alloy layers 3 and 33 made of nickel and cobalt.

次いで、硫酸亜鉛七水和物95g/L、クエン酸三ナトリウム20g/L、温度25℃、pH3.2に調整しためっき浴Bを用いて電流密度0.5A/dmで3.5秒間電解処理して亜鉛層4、34を施した。 Subsequently, electrolysis is performed for 3.5 seconds at a current density of 0.5 A / dm 2 using a plating bath B adjusted to 95 g / L of zinc sulfate heptahydrate, 20 g / L of trisodium citrate, a temperature of 25 ° C., and a pH of 3.2. The zinc layers 4 and 34 were applied after treatment.

次いで、硫酸クロム九水和物0.2g/L、硝酸10g/L、温度25℃、pH3.7に調整したクロメート処理液Cを用いて5秒間浸漬処理して3価クロメート処理を施した。   Next, a trivalent chromate treatment was performed by immersion treatment for 5 seconds using a chromate treatment liquid C adjusted to 0.2 g / L of chromium sulfate nonahydrate, 10 g / L of nitric acid, a temperature of 25 ° C., and a pH of 3.7.

めっき付着量は、皮膜を酸に溶解した後、誘導プラズマ発光分光分析装置(ICP−AES)により測定を行った。その結果、ニッケル付着量が1.2μg/cm、コバルト付着量が2.2μg/cm、亜鉛付着量が1.2μg/cm、クロム付着量が0.8μg/cmであることを確認した(実施例1)。 The plating adhesion amount was measured with an induction plasma emission spectroscopic analyzer (ICP-AES) after dissolving the film in acid. As a result, the nickel coating weight of 1.2 ug / cm 2, the cobalt adhesion amount 2.2μg / cm 2, the zinc coating weight is 1.2 ug / cm 2, the amount of chromium deposited is 0.8 [mu] g / cm 2 Confirmed (Example 1).

実施例2〜8では、電流密度と浴組成とを調整することで、ニッケルとコバルトからなる合金層3、33のニッケル付着量、コバルト付着量、およびニッケルとコバルトの質量比を変えて実施例1と同様にプリント配線板用銅箔1を作製した。   In Examples 2 to 8, the current density and bath composition were adjusted to change the nickel adhesion amount, the cobalt adhesion amount, and the mass ratio of nickel and cobalt in the alloy layers 3 and 33 made of nickel and cobalt. The copper foil 1 for printed wiring boards was produced similarly to 1.

得られたプリント配線板用銅箔1の光沢面Sの特性について下記の耐加熱変色性と酸溶解性の項目についてそれぞれ評価した。   The characteristics of the glossy surface S of the obtained copper foil 1 for printed wiring boards were evaluated for the following items of heat discoloration resistance and acid solubility.

(1)耐加熱変色性
耐加熱変色性は、恒温槽を用いて300℃、30分加熱処理し、変色の評価は色彩色差計を用いてL(明るさ)、a(赤−緑軸の色度)、b(黄−青軸の色度)を測定し、(JIS Z 8729)に基づいて式(1)に示す色差△Eabにより評価した。
(1) Heat discoloration resistance Heat discoloration resistance was heat-treated at 300 ° C. for 30 minutes using a thermostatic bath, and the color change was evaluated using a color difference meter using L * (brightness), a * (red-green Axis chromaticity), b * (yellow-blue axis chromaticity) were measured and evaluated based on (JIS Z 8729) by the color difference ΔE * ab shown in equation (1).

△Eab=[(△L+(△a+(△b1/2 (1)
色差は、△Eab値により表1のように評価される。
ΔE * ab = [(ΔL * ) 2 + (Δa * ) 2 + (Δb * ) 2 ] 1/2 (1)
The color difference is evaluated as shown in Table 1 based on the ΔE * ab value.

Figure 2009081396
Figure 2009081396

(2)酸溶解性
酸溶解性はプリント配線板用銅箔1を過酸化水素と硫酸とを主成分とした市販のエッチング液(CPE700、三菱瓦斯化学製)で溶解し、溶解前後の重量測定より溶解速度を測定した。銅単体での溶解速度を基準にして評価した。
(2) Acid solubility The acid solubility is obtained by dissolving the copper foil 1 for printed wiring boards with a commercially available etchant (CPE700, manufactured by Mitsubishi Gas Chemical Co., Ltd.) mainly composed of hydrogen peroxide and sulfuric acid, and measuring the weight before and after the dissolution. More dissolution rate was measured. Evaluation was based on the dissolution rate of copper alone.

比較例として、ニッケルとコバルトの合金層においてニッケル付着量が0.5μg/cm未満の場合(比較例1)、ニッケルとコバルトからなる合金層が無い、亜鉛めっきとクロメート処理のみを施した場合(比較例2)、ニッケルとコバルトからなる合金層にかえてニッケル単体層にした場合(比較例3)、銅箔単体の場合(比較例4)の試料を作製し、実施例と同様の評価を行った。 As a comparative example, when the nickel adhesion amount is less than 0.5 μg / cm 2 in the alloy layer of nickel and cobalt (Comparative Example 1), there is no alloy layer made of nickel and cobalt, and only zinc plating and chromate treatment are performed (Comparative Example 2) Samples for the case of using a nickel simple substance layer instead of an alloy layer made of nickel and cobalt (Comparative Example 3) and for the case of a copper foil simple substance (Comparative Example 4) were prepared and evaluated in the same manner as in the examples. Went.

試験結果をまとめて表2に示す。   The test results are summarized in Table 2.

Figure 2009081396
Figure 2009081396

表2の試験結果より、本発明による実施例1〜8では耐加熱変色性、酸溶解性がともに良好であることがわかる。これに対して、ニッケル付着量が0.5μg/cm未満の比較例1、亜鉛めっきとクロメート処理のみの比較例2では耐加熱変色性が悪く、ニッケル単体層のみでコバルトが含まれない比較例3では、酸溶解性が悪くなっている。さらに、実施例1〜8は銅箔単体である比較例4とほぼ同等の酸溶解速度であることがわかった。 From the test results of Table 2, it can be seen that in Examples 1 to 8 according to the present invention, both heat discoloration resistance and acid solubility are good. On the other hand, in Comparative Example 1 in which the nickel adhesion amount is less than 0.5 μg / cm 2 and Comparative Example 2 in which only the zinc plating and the chromate treatment are performed, the heat discoloration resistance is poor and only the nickel single layer is not included in cobalt. In Example 3, the acid solubility is poor. Furthermore, it turned out that Examples 1-8 are an acid dissolution rate substantially equivalent to the comparative example 4 which is copper foil single-piece | unit.

したがって、銅箔表面に亜鉛めっきとクロメート処理の前にニッケルとコバルトからなる合金層をニッケル付着量が0.5μg/cm以上2.0μg/cm以下、コバルトの付着量がニッケル付着量とコバルト付着量の合計に対して40%以上80%以下の質量比で形成することにより、300℃、30分の耐加熱変色試験に対して変色せず、また酸溶解性においてはバリヤー金属として一般に知られるニッケル皮膜よりも優れた酸溶解性を示し、更に素材の銅と同等で良好な酸溶解性が得られることが確認できた。 Therefore, before the galvanization and chromate treatment on the copper foil surface, the nickel adhesion amount of the nickel and cobalt alloy layer is 0.5 μg / cm 2 or more and 2.0 μg / cm 2 or less, and the cobalt adhesion amount is the nickel adhesion amount. By forming at a mass ratio of 40% or more and 80% or less with respect to the total amount of cobalt adhesion, it is not discolored with respect to a heat discoloration test at 300 ° C. for 30 minutes, and in terms of acid solubility, it is generally used as a barrier metal. It was confirmed that the acid solubility was superior to that of the known nickel coating, and that good acid solubility was obtained, equivalent to the copper material.

発明の好適な実施形態を示すプリント配線板用銅箔の横断面図である。It is a cross-sectional view of the copper foil for printed wiring boards which shows suitable embodiment of invention. 本実施形態に係るプリント配線板用銅箔の表面処理方法に用いるめっき装置の概略図である。It is the schematic of the plating apparatus used for the surface treatment method of the copper foil for printed wiring boards which concerns on this embodiment.

符号の説明Explanation of symbols

1 プリント配線板用銅箔
2 銅箔
3 合金層
4 亜鉛層
5 クロメート層
DESCRIPTION OF SYMBOLS 1 Copper foil for printed wiring boards 2 Copper foil 3 Alloy layer 4 Zinc layer 5 Chromate layer

Claims (6)

銅箔の表面に、ニッケルとコバルトからなる合金層を形成し、その上に亜鉛層とクロメート層とからなる防錆層を形成して光沢面を形成するプリント配線板用銅箔において、前記合金層は、ニッケル付着量が0.5μg/cm以上2.0μg/cm以下であり、コバルト付着量が、ニッケル付着量とコバルト付着量の合計に対して40%以上80%以下の質量比であることを特徴とするプリント配線板用銅箔。 In the copper foil for printed wiring boards, an alloy layer composed of nickel and cobalt is formed on the surface of the copper foil, and a rust preventive layer composed of a zinc layer and a chromate layer is formed thereon to form a glossy surface. The layer has a nickel adhesion amount of 0.5 μg / cm 2 or more and 2.0 μg / cm 2 or less, and a cobalt adhesion amount of 40% or more and 80% or less of the total of nickel adhesion amount and cobalt adhesion amount. The copper foil for printed wiring boards characterized by being. 前記亜鉛層の亜鉛付着量が0.5μg/cm以上2.0μg/cm以下であり、前記クロメート層のクロム付着量が0.3μg/cm以上1.2μg/cm以下である請求項1に記載のプリント配線板用銅箔。 According zinc coating weight of the zinc layer has a 0.5 [mu] g / cm 2 or more 2.0 [mu] g / cm 2 or less, chromium deposition amount of the chromate layer is 0.3 [mu] g / cm 2 or more 1.2 ug / cm 2 or less Item 4. A copper foil for printed wiring board according to item 1. 前記銅箔の裏面に粗化めっき層を形成し、前記合金層、前記亜鉛層、および前記クロメート層を順次形成して粗化面を形成する請求項1または2に記載のプリント配線板用銅箔。   The copper for printed wiring boards of Claim 1 or 2 which forms a roughening plating layer on the back surface of the said copper foil, and forms the said alloy layer, the said zinc layer, and the said chromate layer in order, and forms a roughening surface. Foil. 銅箔の表面に、ニッケルとコバルトからなる合金層を形成し、その上に亜鉛層とクロメート層とからなる防錆層を形成して光沢面を形成するプリント配線板用銅箔の表面処理方法において、前記合金層を、ニッケル付着量が0.5μg/cm以上2.0μg/cm以下、コバルト付着量が、ニッケル付着量とコバルト付着量の合計に対して40%以上80%以下の質量比で形成することを特徴とするプリント配線板用銅箔の表面処理方法。 A surface treatment method for a copper foil for printed wiring board, in which an alloy layer composed of nickel and cobalt is formed on the surface of the copper foil, and a rust preventive layer composed of a zinc layer and a chromate layer is formed thereon to form a glossy surface. In the alloy layer, the nickel adhesion amount is 0.5 μg / cm 2 or more and 2.0 μg / cm 2 or less, and the cobalt adhesion amount is 40% or more and 80% or less with respect to the total of the nickel adhesion amount and the cobalt adhesion amount. The surface treatment method of the copper foil for printed wiring boards characterized by forming by mass ratio. 前記合金層と前記亜鉛層とは電気めっきにより形成し、前記クロメート層は3価のクロメート処理液で浸漬処理して形成する請求項4に記載のプリント配線板用銅箔の表面処理方法。   The surface treatment method for a copper foil for a printed wiring board according to claim 4, wherein the alloy layer and the zinc layer are formed by electroplating, and the chromate layer is formed by immersion treatment with a trivalent chromate treatment solution. 前記銅箔の裏面に粗化めっき層を形成した後、前記銅箔の表面と裏面とに、前記合金層、前記亜鉛層、および前記クロメート層を順次同時に形成する請求項4または5に記載のプリント配線板用銅箔の表面処理方法。   6. The roughened plating layer is formed on the back surface of the copper foil, and then the alloy layer, the zinc layer, and the chromate layer are sequentially and simultaneously formed on the front surface and the back surface of the copper foil. Surface treatment method for copper foil for printed wiring boards.
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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011044550A (en) * 2009-08-20 2011-03-03 Hitachi Cable Ltd Copper foil for printed wiring board, and method of manufacturing the same
WO2011078077A1 (en) * 2009-12-24 2011-06-30 Jx日鉱日石金属株式会社 Surface-treated copper foil
JP2012186211A (en) * 2011-03-03 2012-09-27 Jx Nippon Mining & Metals Corp Copper foil for printed wiring board and laminate sheet using the same
US9580829B2 (en) 2010-05-07 2017-02-28 Jx Nippon Mining & Metals Corporation Copper foil for printed circuit
CN114182264A (en) * 2021-12-10 2022-03-15 南京大学 Method for removing trace impurities on surface of copper foil for PCB (printed Circuit Board) by using sodium carbonate/citric acid aqueous solution

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JP2002016111A (en) * 2000-04-25 2002-01-18 Nippon Denkai Kk Copper foil used for tab tape carrier, and tab carrier tape and tab tape carrier using copper foil
JP2002176242A (en) * 2000-12-05 2002-06-21 Nikko Materials Co Ltd Copper foil for electronic circuit and method for forming electronic circuit
JP2006319286A (en) * 2005-05-16 2006-11-24 Hitachi Cable Ltd Copper foil for printed circuit board with taking environmental conservation into consideration

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JPH02292894A (en) * 1989-05-02 1990-12-04 Nikko Guurudo Fuoiru Kk Treatment method for copper foil for printed circuit
JPH0654829B2 (en) * 1990-08-14 1994-07-20 株式会社ジャパンエナジー Method of treating copper foil for printed circuits
JP2002016111A (en) * 2000-04-25 2002-01-18 Nippon Denkai Kk Copper foil used for tab tape carrier, and tab carrier tape and tab tape carrier using copper foil
JP2002176242A (en) * 2000-12-05 2002-06-21 Nikko Materials Co Ltd Copper foil for electronic circuit and method for forming electronic circuit
JP2006319286A (en) * 2005-05-16 2006-11-24 Hitachi Cable Ltd Copper foil for printed circuit board with taking environmental conservation into consideration

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011044550A (en) * 2009-08-20 2011-03-03 Hitachi Cable Ltd Copper foil for printed wiring board, and method of manufacturing the same
WO2011078077A1 (en) * 2009-12-24 2011-06-30 Jx日鉱日石金属株式会社 Surface-treated copper foil
CN102666939A (en) * 2009-12-24 2012-09-12 吉坤日矿日石金属株式会社 Surface-treated copper foil
JPWO2011078077A1 (en) * 2009-12-24 2013-05-09 Jx日鉱日石金属株式会社 Surface treated copper foil
US9580829B2 (en) 2010-05-07 2017-02-28 Jx Nippon Mining & Metals Corporation Copper foil for printed circuit
US10472728B2 (en) 2010-05-07 2019-11-12 Jx Nippon Mining & Metals Corporation Copper foil for printed circuit
JP2012186211A (en) * 2011-03-03 2012-09-27 Jx Nippon Mining & Metals Corp Copper foil for printed wiring board and laminate sheet using the same
CN114182264A (en) * 2021-12-10 2022-03-15 南京大学 Method for removing trace impurities on surface of copper foil for PCB (printed Circuit Board) by using sodium carbonate/citric acid aqueous solution
CN114182264B (en) * 2021-12-10 2023-11-17 南京大学 Method for removing trace impurities on surface of copper foil for PCB (printed circuit board) by using sodium carbonate/citric acid aqueous solution

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