JP2009081012A - Field emission display element and its manufacturing method - Google Patents

Field emission display element and its manufacturing method Download PDF

Info

Publication number
JP2009081012A
JP2009081012A JP2007248566A JP2007248566A JP2009081012A JP 2009081012 A JP2009081012 A JP 2009081012A JP 2007248566 A JP2007248566 A JP 2007248566A JP 2007248566 A JP2007248566 A JP 2007248566A JP 2009081012 A JP2009081012 A JP 2009081012A
Authority
JP
Japan
Prior art keywords
substrate
reinforcing plate
seal
field emission
emission display
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007248566A
Other languages
Japanese (ja)
Inventor
Yasuyuki Naito
康之 内藤
Hiroaki Eguchi
博章 江口
Masayuki Ito
正之 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Futaba Corp
Original Assignee
Futaba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Futaba Corp filed Critical Futaba Corp
Priority to JP2007248566A priority Critical patent/JP2009081012A/en
Publication of JP2009081012A publication Critical patent/JP2009081012A/en
Pending legal-status Critical Current

Links

Images

Landscapes

  • Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)
  • Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)
  • Manufacture Of Electron Tubes, Discharge Lamp Vessels, Lead-In Wires, And The Like (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To obtain an FED provided with a reinforcing plate on a rear face of a cathode substrate, without increasing the number of baking times of the cathode substrate at a sealing process using a conventional sealing method excellent in mass productivity. <P>SOLUTION: For the field emission display element firmly fixing a reinforcing plate with a second sealing part on a rear face of the cathode substrate, at least either a length or a width of the reinforcing plate is to be shorter than a length or a width of an outer size of a first sealing part. In such a structure, after the cathode substrate and an anode substrate are positioned, the both are temporarily fixed with a clip member used in a conventional technology, and further, the cathode substrate and the anode substrate are temporarily fixed to the reinforcing plate with another clip member, finally to seal them. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、冷陰極を電子源とする平面型の電界放出表示素子及び電界放出表示素子の製造方法に関するものである。   The present invention relates to a planar field emission display device using a cold cathode as an electron source and a method for manufacturing the field emission display device.

近年、一対のガラス基板等を対向配置して扁平な真空気密空間を作り、この空間内に種種の表示デバイスを内装した薄型の表示装置が作られている。
表示デバイスとなる素子は、例えば電界をかけることによって電子を放出する微細な冷陰極電界放出カソードと、放出された電子が衝突することによって発光する蛍光体を備えた電界放出表示素子(FED)や、真空容器内に設けられた多数のプラズマ放電素子を表示画素とし、映像信号に対応して各表示画素を発光状態に駆動し、映像等を表示するプラズマディスプレイ(PDP)等がある。
FEDの例としてコーン状のエミッタを用いたスピント型、金属/絶縁層/金属型(MIM型)、表面伝導型(SED)、弾道電子放出現象を応用したBSD型、カーボンナノチューブを用いたCNT型等がある。
2. Description of the Related Art In recent years, thin display devices have been made in which a pair of glass substrates and the like are arranged to face each other to create a flat vacuum-tight space, and various display devices are installed in the space.
For example, an element serving as a display device includes a field emission display element (FED) including a fine cold cathode field emission cathode that emits electrons when an electric field is applied and a phosphor that emits light when the emitted electrons collide. There are a plasma display (PDP) or the like in which a large number of plasma discharge elements provided in a vacuum vessel are used as display pixels and each display pixel is driven to emit light in response to a video signal to display an image or the like.
Examples of FED are Spindt type using cone emitter, metal / insulating layer / metal type (MIM type), surface conduction type (SED), BSD type applying ballistic electron emission phenomenon, CNT type using carbon nanotubes Etc.

FEDはアノード基板とカソード基板間が高真空とされており、大気圧に耐えるため前記基板間にスペーサを設けることが一般的である。しかし精細度の極めて高いFEDにおいてはスペーサの存在が表示の妨げとなるためスペーサを設けられない場合がある。またチャージ防止等のため表面処理を施し、高精度に加工したスペーサは高価なため1パネル内の使用本数を減らしたい場合がある。   In an FED, a high vacuum is applied between an anode substrate and a cathode substrate, and a spacer is generally provided between the substrates in order to withstand atmospheric pressure. However, in an FED with extremely high definition, the presence of the spacer hinders display, and thus the spacer may not be provided. In addition, there is a case where it is desired to reduce the number of use in one panel because the spacer processed with high precision to prevent charging is expensive.

かかる場合にアノード基板とカソード基板に用いられるガラス基板の厚さを厚くすることが考えられる。しかしカソード基板の製造には成膜、パターニングに半導体製造と同様のいわゆる薄膜装置を用いている。基板を厚くすると工程中で基板の温度管理が困難になり膜の品質の劣化を招く、また基板の質量が大きくなり基板のハンドリングも難しくなる。   In such a case, it is conceivable to increase the thickness of the glass substrate used for the anode substrate and the cathode substrate. However, so-called thin film devices similar to semiconductor manufacturing are used for film formation and patterning for manufacturing the cathode substrate. If the thickness of the substrate is increased, it becomes difficult to control the temperature of the substrate during the process, resulting in deterioration of the quality of the film, and the mass of the substrate is increased, making it difficult to handle the substrate.

そこでカソード基板の厚さは従来どおり薄くして、カソード基板の裏面に補強板を貼り付けて表示素子を製造する技術が知られている(特許文献1)。
図6に特許文献1に記載された電子放出素子を用いた表示素子の断面図を示す。当該表示素子は表面伝導型電子放出素子の電子放出素子群101を搭載した背面板(カソード基板)102と背面板102と対向配置された前面板(アノード基板)104と、前面板104と背面板102との間にあって、前面板104および背面板102の周縁を電子放出素子群を囲むように支持する支持枠105から構成され、前面板104、背面板102および支持枠105の接合部はフリットガラス106により固着されている。さらに背面板102にはフリットガラス106により背面板102を補強する補強板107が固着されている。
Therefore, a technique for manufacturing a display element by reducing the thickness of the cathode substrate as in the past and attaching a reinforcing plate to the back surface of the cathode substrate is known (Patent Document 1).
FIG. 6 shows a cross-sectional view of a display element using the electron-emitting device described in Patent Document 1. The display device includes a back plate (cathode substrate) 102 on which an electron-emitting device group 101 of surface conduction electron-emitting devices is mounted, a front plate (anode substrate) 104 disposed opposite to the back plate 102, a front plate 104, and a back plate. 102 and a support frame 105 that supports the periphery of the front plate 104 and the back plate 102 so as to surround the electron-emitting device group, and a joint between the front plate 104, the back plate 102, and the support frame 105 is a frit glass. It is fixed by 106. Further, a reinforcing plate 107 that reinforces the back plate 102 with a frit glass 106 is fixed to the back plate 102.

図7(a)から(f)に特許文献1における表示素子の製造方法の例を示す。まず前面板104と支持枠105の接合面にフリットガラス106を塗布して組立てた後、炉中410℃で焼成を行い(図7(a))、前面板104に支持枠105を固定する(図7(b))。   7A to 7F show an example of a method for manufacturing a display element in Patent Document 1. FIG. First, the frit glass 106 is applied to the joint surface between the front plate 104 and the support frame 105 and assembled, and then fired at 410 ° C. in a furnace (FIG. 7A) to fix the support frame 105 to the front plate 104 ( FIG. 7B).

次に支持枠105と背面板102の接合面にフリットガラス106を塗布して組立てた後、炉中410℃で焼成を行い(図7(c))、支持枠105に背面板102を固定する(図 7(d))。さらに背面板102と補強板107の接合面にフリットガラス106を塗布して組立てた後、炉中410℃で焼成を行い(図7(e))、背面板102に補強板107を固定する(図7(f))。そして上記工程で気密接合した素子内を真空状態にするために、支持枠などに設けられた排気管(不図示)により真空に引き、その後、排気管を封止して表示素子とする。
特開平7−302559号公報
Next, after the frit glass 106 is applied to the joint surface between the support frame 105 and the back plate 102 and assembled, firing is performed in a furnace at 410 ° C. (FIG. 7C), and the back plate 102 is fixed to the support frame 105. (FIG. 7 (d)). Further, after the frit glass 106 is applied to the joint surface between the back plate 102 and the reinforcing plate 107 and assembled, firing is performed in a furnace at 410 ° C. (FIG. 7E), and the reinforcing plate 107 is fixed to the back plate 102 ( FIG. 7 (f)). Then, in order to make the inside of the element hermetically bonded in the above process into a vacuum state, a vacuum is drawn by an exhaust pipe (not shown) provided on a support frame or the like, and then the exhaust pipe is sealed to obtain a display element.
Japanese Patent Laid-Open No. 7-302559

補強板を設けたFEDの性能は封着工程に関連して電子放出能力、アノード基板とカソード基板の位置ずれの観点で考慮すべき事項がある。これらについて以下に説明する。
まず電子放出能力についてはFEDのカソードは焼成を繰返すほど電子放出能力が劣化する傾向が知られている。特に電子放出源が金属であるスピント型、MIM型、BSD型等の場合はカソード基板を焼成することにより電子放出源の金属表面が酸化等変質して電子放出能力が劣化する傾向が強い。そこでカソード基板の焼成工程は、表示素子の完成までの工程で極力1回であることが望ましい。(特許文献1においては支持枠との固定と補強板との固定の2回である。)
The performance of the FED provided with the reinforcing plate has matters to be considered in view of the electron emission capability and the positional deviation between the anode substrate and the cathode substrate in relation to the sealing process. These will be described below.
First, regarding the electron emission capability, it is known that the cathode of the FED tends to deteriorate as the firing is repeated. In particular, in the case of Spindt type, MIM type, BSD type, etc., in which the electron emission source is a metal, there is a strong tendency that the metal surface of the electron emission source is altered by oxidation or the like and the electron emission capability is deteriorated by firing the cathode substrate. Therefore, it is desirable that the cathode substrate firing process is performed as much as possible once in the process until the display element is completed. (In Patent Document 1, fixing with the support frame and fixing with the reinforcing plate are performed twice.)

特許文献1においては触れていないが、真空封止に用いられるフリットガラスは粉末の低融点ガラスである。表示素子の製造に用いる場合は有機溶剤やバインダ等に分散してペースト状にした上で部材の所定の部分に塗布する。そして当該ペーストを大気中で融点以上に加熱焼成して溶剤やバインダ分を除去してガラス層とし(以下でこの状態を「低軟化点ガラス層」とする。)、その上で当該低軟化点ガラス層を設けた部材を他の部材と組合せて焼成・溶融して複数の部材を気密に固着するものである。   Although not mentioned in Patent Document 1, the frit glass used for vacuum sealing is a powdery low melting point glass. When used for manufacturing a display element, it is dispersed in an organic solvent, a binder or the like to form a paste and then applied to a predetermined portion of the member. Then, the paste is heated and fired in the atmosphere to a melting point or higher to remove the solvent and binder to form a glass layer (hereinafter, this state is referred to as “low softening point glass layer”), and then the low softening point. A member provided with a glass layer is combined with other members and fired and melted to fix a plurality of members in an airtight manner.

補強板を用いたFEDでカソード基板の封着中の焼成工程を1回にするには、低軟化点ガラス層はアノード基板と補強板に設ける必要がある。そしてアノード基板、補強板とカソード基板を重ねて封着することが望ましい。   In order to perform the firing process during the sealing of the cathode substrate with the FED using the reinforcing plate once, it is necessary to provide the low softening point glass layer on the anode substrate and the reinforcing plate. It is desirable that the anode substrate, the reinforcing plate and the cathode substrate are stacked and sealed.

次に位置ずれについて説明する。封着工程では前記低軟化点ガラス層を対面する基板に密着させるよう基板を荷重する。当該荷重は水平に重ねた基板に錘を載せたり、耐熱性の板バネを用いたクリップ部材で当該重ねた状態の各基板を挟み込んだりして付与される場合が多い。この際に荷重のバランスが悪い、低軟化点ガラス層の高さにばらつきがある、等により低軟化点ガラス層が溶融している間に両基板の位置が相対的にずれることがある。   Next, positional deviation will be described. In the sealing step, the substrate is loaded so that the low softening point glass layer is in close contact with the facing substrate. The load is often applied by placing a weight on a horizontally stacked substrate or sandwiching each stacked substrate with a clip member using a heat-resistant leaf spring. At this time, the positions of the two substrates may be relatively displaced while the low softening point glass layer is melted due to a poor load balance or variations in the height of the low softening point glass layer.

FEDではアノード基板の蛍光体パターンとカソード基板の電子源は一対一で対応している。両者の相対位置が所定の位置からずれると電子源から放出された電子が蛍光体パターンの所定の位置に到達せず、発光ドットの欠けが生じたり、レッド(R)、グリーン(G)、ブルー(B)の蛍光体を有するカラー型の場合には発光色の混色を生じるという致命的な問題を引き起こす。
例えば小形のFEDでピクセルピッチは200〜300μm程度であり、アノード基板とカソード基板が所定の位置から相対的に30μm程度ずれたら上記のような問題が生じる。
In the FED, the phosphor pattern on the anode substrate and the electron source on the cathode substrate correspond one-to-one. When the relative position of the two deviates from the predetermined position, electrons emitted from the electron source do not reach the predetermined position of the phosphor pattern, and the light emitting dots are missing, or red (R), green (G), blue In the case of the color type having the phosphor of (B), a fatal problem of causing a mixture of emission colors is caused.
For example, in a small FED, the pixel pitch is about 200 to 300 μm. If the anode substrate and the cathode substrate are relatively displaced from each other by about 30 μm, the above-described problem occurs.

ここでアノード基板、カソード基板、補強基板を重ねて荷重し、封着することは封着中に溶融する低軟化点ガラス層が2層存在するのでアノード基板とカソード基板の位置ずれを助長するという問題がある。   Here, when the anode substrate, the cathode substrate, and the reinforcing substrate are stacked and loaded and sealed, there are two low-softening point glass layers that melt during the sealing, so that the displacement between the anode substrate and the cathode substrate is promoted. There's a problem.

そこで本発明は量産性にすぐれた従来の封着方法を大きく変更しないことを前提とし、封着工程でのカソード基板の焼成回数を増加させることなく、且つアノード基板とカソード基板の位置ずれの増加を抑えてカソード基板の背面に補強板を設けたFEDを提供すること、およびその製造方法を提供することを課題とする。   Therefore, the present invention is based on the premise that the conventional sealing method with excellent mass productivity is not greatly changed, and without increasing the number of times the cathode substrate is baked in the sealing step, and increasing the positional deviation between the anode substrate and the cathode substrate. It is an object to provide an FED in which a reinforcing plate is provided on the back surface of a cathode substrate while suppressing the above, and to provide a manufacturing method thereof.

本発明に係る電界放出表示素子は、蛍光体が被着された陽極電極を設けたアノード基板と、電子を放出する複数の陰極部を設けたカソード基板と、前記アノード基板と前記カソード基板を所定の間隔で保持し、蛍光体が被着された表示領域の外周縁を気密封止する第1のシール部を有し、前記カソード基板の裏面に補強板を第2のシール部で固着する電界放出型表示素子において、
前記補強板の長さ又は幅の少なくとも一方が前記第1のシールの外形の長さ又は幅よりも短く、前記第1のシールの長さ又は幅の外形端から前記補強板の基板端までの距離が前記補強板の両端において前記第1のシールのシール幅以上であるを特徴とする。
A field emission display device according to the present invention includes an anode substrate provided with an anode electrode coated with a phosphor, a cathode substrate provided with a plurality of cathode portions for emitting electrons, and the anode substrate and the cathode substrate. And a first seal portion that hermetically seals the outer peripheral edge of the display area to which the phosphor is applied, and an electric field that fixes the reinforcing plate to the back surface of the cathode substrate with the second seal portion. In an emission display element,
At least one of the length or width of the reinforcing plate is shorter than the length or width of the outer shape of the first seal, and from the outer end of the length or width of the first seal to the substrate end of the reinforcing plate. The distance is greater than or equal to the seal width of the first seal at both ends of the reinforcing plate.

本発明に係る電界放出表示素子は、蛍光体が被着された陽極電極を設けたアノード基板と、電子を放出する複数の陰極部を設けたカソード基板と、前記アノード基板と前記カソード基板を所定の間隔で保持し、蛍光体が被着された表示領域の外周縁を気密封止する第1のシール部を有し、前記カソード基板の裏面に補強板を第2のシール部で固着する電界放出表示素子において、
前記補強板の長さ又は幅の少なくとも一方に前記第1のシールの外形の長さ又は幅よりも短い少なくとも一対の切り欠き部を有することを特徴とする。
A field emission display device according to the present invention includes an anode substrate provided with an anode electrode coated with a phosphor, a cathode substrate provided with a plurality of cathode portions for emitting electrons, and the anode substrate and the cathode substrate. And a first seal portion that hermetically seals the outer peripheral edge of the display area to which the phosphor is applied, and an electric field that fixes the reinforcing plate to the back surface of the cathode substrate with the second seal portion. In an emission display element,
At least one of the length or width of the reinforcing plate has at least a pair of notches shorter than the length or width of the outer shape of the first seal.

本発明に係る電界放出表示素子は、前記第1のシールの長さ又は幅の外形端から前記補強板の基板端までの距離が前記補強板の両端において前記第1のシールのシール幅の1倍以上3倍以下であることを特徴とする。   In the field emission display device according to the present invention, the distance from the outer end of the length or width of the first seal to the substrate end of the reinforcing plate is 1 of the sealing width of the first seal at both ends of the reinforcing plate. It is characterized by being not less than 3 times and not more than 3 times.

本発明に係る電界放出表示素子は、前記第1のシールの長さ又は幅の外形端から前記補強板の切り欠き端までの距離が前記補強板の両端において前記第1のシールのシール幅の1倍以上3倍以下であることを特徴とする。   In the field emission display device according to the present invention, the distance from the outer end of the length or width of the first seal to the notch end of the reinforcing plate is equal to the seal width of the first seal at both ends of the reinforcing plate. 1 to 3 times or less.

本発明に係る電界放出表示素子は、前記第2のシール部は前記補強板の外周縁に設けた枠状パターンを有することを特徴とする。   The field emission display device according to the present invention is characterized in that the second seal portion has a frame-like pattern provided on an outer peripheral edge of the reinforcing plate.

本発明に係る電界放出表示素子は、前記第2のシール部は前記枠状パターンの内部に複数のストライプ状パターンを設けたことを特徴とする。   The field emission display device according to the present invention is characterized in that the second seal portion is provided with a plurality of stripe patterns inside the frame pattern.

本発明に係る電界放出表示素子は、前記第2のシール部は電界放出表示素子の封着温度で実質的に軟化しないスペーサを含むことを特徴とする。   The field emission display device according to the present invention is characterized in that the second seal portion includes a spacer that does not substantially soften at a sealing temperature of the field emission display device.

本発明に係る電界放出表示素子の製造方法は、前記アノード基板に前記第1のシールを塗布して仮焼成する工程と、前記補強基板に前記第2のシールを塗布して仮焼成する工程と、前記アノード基板と前記カソード基板を位置合せして弾性保持手段により仮固定する工程と、前記アノード基板、前記カソード基板と前記補強基板を仮固定する工程と、前記アノード基板、前記カソード基板と前記補強基板を一括して封着する工程を有することを特徴とする。   The field emission display device manufacturing method according to the present invention includes a step of applying the first seal to the anode substrate and pre-baking, and a step of applying the second seal to the reinforcing substrate and pre-baking. A step of aligning the anode substrate and the cathode substrate and temporarily fixing them by elastic holding means; a step of temporarily fixing the anode substrate, the cathode substrate and the reinforcing substrate; and the anode substrate, the cathode substrate and the It has the process of sealing a reinforcement board | substrate collectively.

本発明によれば量産性にすぐれた従来の封着方法を用いて封着工程でのカソード基板の焼成回数を増加させることなく、、且つアノード基板とカソード基板の位置ずれの増加を抑えてカソード基板の背面に補強板を設けたFEDが得られるという効果がある。   According to the present invention, a conventional sealing method excellent in mass productivity is used to increase the number of times the cathode substrate is fired in the sealing step, and to suppress an increase in misalignment between the anode substrate and the cathode substrate. There is an effect that an FED having a reinforcing plate on the back surface of the substrate can be obtained.

図面を使って、本発明の実施の形態を説明する。図1(a)は、本発明のFED1の上面図を同図(b)は該上面図におけるX−X部の矢印方向切断部端面図を同図(c)はFED1の底面図を示したものである。
この図においてカソード基板11の表面上にはスピント型の電子放出素子群12が形成されている。電子放出素子群12はゲート電極とカソード電極(共に図示しない。)の交差部に設けられる電子放出の単位となる電子放出素子単位の集合である。
Embodiments of the present invention will be described with reference to the drawings. 1A is a top view of the FED 1 according to the present invention, FIG. 1B is an end view of the XX section in the top view, and FIG. 1C is a bottom view of the FED 1. FIG. Is.
In this figure, a Spindt type electron-emitting device group 12 is formed on the surface of the cathode substrate 11. The electron-emitting device group 12 is a set of electron-emitting device units that are units of electron emission provided at intersections of gate electrodes and cathode electrodes (both not shown).

カソード基板11に対峙して気密容器を形成するためのアノード基板13が設けられる。アノード基板13のカソード基板11に対面する表面にはアノード電極14が設けられ、アノード電極14上に蛍光体パターン15が形成される。蛍光体パターン15は電子放出素子から放出された電子を受けて発光するので個々の蛍光体パターン15に対応して前記電子放出単位が設けられている。ここで蛍光体パターン15が形成されており、表示に寄与する領域を表示領域16とする。   An anode substrate 13 is provided for forming an airtight container facing the cathode substrate 11. An anode electrode 14 is provided on the surface of the anode substrate 13 facing the cathode substrate 11, and a phosphor pattern 15 is formed on the anode electrode 14. Since the phosphor pattern 15 emits light upon receiving electrons emitted from the electron-emitting device, the electron emission unit is provided corresponding to each phosphor pattern 15. Here, the phosphor pattern 15 is formed, and a region contributing to display is defined as a display region 16.

カソード基板11とアノード基板13の間には両基板を所定間隔で保持し、表示領域16の外周縁を気密封止する第1のシール部19が設けられる(以下で混同のおそれがない限り単に「シール部19」とする。)。ここで表示領域の外周縁にシール部を設けるとは図1(a)でシール部19の内周が表示領域16に近接して、それを囲むようにシール部19を設ける場合だけでなくシール部19の内周が表示領域16と所定の間隔をもつようにシール部19を設ける場合も意味する。
なお図1(a)でカソード基板11とアノード基板13のシール部19の外側の部分は図示しないゲート電極とカソード電極及びアノード電極14の端子部を構成している。
Between the cathode substrate 11 and the anode substrate 13, there is provided a first seal portion 19 that holds both substrates at a predetermined interval and hermetically seals the outer peripheral edge of the display region 16 (in the following, unless there is a risk of confusion) "Seal part 19"). Here, the provision of the seal portion on the outer peripheral edge of the display area is not only in the case where the inner periphery of the seal portion 19 is close to the display region 16 in FIG. This also means that the seal portion 19 is provided so that the inner periphery of the portion 19 has a predetermined distance from the display area 16.
In FIG. 1A, the outer portions of the seal portion 19 of the cathode substrate 11 and the anode substrate 13 constitute a gate electrode, a cathode electrode, and a terminal portion of the anode electrode 14 (not shown).

アノード基板13の表示領域16外にはカソード基板11とアノード基板13とシール部19より構成される気密容器内のガスを排気する排気穴17が設けられ、排気穴17は排気終了後に内部を気密に保つ排気蓋18で封止される。   Outside the display area 16 of the anode substrate 13, an exhaust hole 17 for exhausting gas in an airtight container composed of the cathode substrate 11, the anode substrate 13, and the seal portion 19 is provided. The exhaust hole 17 is airtight after the exhaust is completed. It is sealed with an exhaust lid 18 that is kept at a low level.

カソード基板11の電子放出素子群12を設けた面の裏面にはカソード基板11の強度を補うための補強板20が第2のシール部21により固着されている。補強板20はカソード基板11が気密容器の一部となった後にカソード基板11が大気圧で破壊しないためのものである。そのため補強板20の形状は気密容器の側壁を構成する第1のシール部19との関係で規定される。   A reinforcing plate 20 for supplementing the strength of the cathode substrate 11 is fixed to the back surface of the cathode substrate 11 on which the electron-emitting device group 12 is provided by a second seal portion 21. The reinforcing plate 20 is for preventing the cathode substrate 11 from being broken at atmospheric pressure after the cathode substrate 11 becomes a part of the hermetic container. Therefore, the shape of the reinforcing plate 20 is defined by the relationship with the first seal portion 19 that forms the side wall of the hermetic container.

図1で補強板20の外形は短辺方向ではシール部19の外形と同じ幅であり、長辺方向ではシール部19の外形よりも小さく(短く)なっている。ここで両者の長さの差として当該長辺方向のシール部19の外形から補強板20の端部までの距離をA寸法とすると、A寸法は当該長辺方向の両端で共にシール部19の幅とほぼ等しくなっている。   In FIG. 1, the outer shape of the reinforcing plate 20 has the same width as the outer shape of the seal portion 19 in the short side direction, and is smaller (shorter) than the outer shape of the seal portion 19 in the long side direction. Here, if the distance from the outer shape of the seal portion 19 in the long side direction to the end portion of the reinforcing plate 20 is the A dimension as the difference in length between the two, the A dimension is the both ends of the seal portion 19 at both ends in the long side direction. It is almost equal to the width.

このように所定のA寸法を持つ領域を設けることでカソード基板11とアノード基板13の位置合せを行った後に従来技術と同様にクリップ部材を用いて両者を仮固定できる。更にカソード基板11とアノード基板13と補強板20を別のクリップ部材で仮固定した上で封着できる。これにより封着工程でのカソード基板の焼成回数を増加させることなくアノード基板とカソード基板の位置ずれの増加を抑えてカソード基板の背面に補強板を設けた電界放出表示素子が得られる。
ここで補強板20は溶融する低軟化点ガラス層を2層挟んだ状態で封着されるので、ずれが大きくなる可能性がある。しかしアノード基板とカソード基板の位置ずれが問題となる30μmに対し、仮にその10倍の300μm補強板20がずれたとしてもパネルの強度には影響がなく問題はない。
Thus, by providing the area | region with predetermined A dimension, after aligning the cathode substrate 11 and the anode substrate 13, both can be temporarily fixed using a clip member similarly to a prior art. Furthermore, the cathode substrate 11, the anode substrate 13, and the reinforcing plate 20 can be sealed after being temporarily fixed by another clip member. Thus, it is possible to obtain a field emission display element in which a reinforcing plate is provided on the back surface of the cathode substrate while suppressing an increase in positional deviation between the anode substrate and the cathode substrate without increasing the number of times of firing the cathode substrate in the sealing step.
Here, since the reinforcing plate 20 is sealed in a state where two layers of the low softening point glass layers to be melted are sandwiched, there is a possibility that the deviation becomes large. However, even if the 300 μm reinforcing plate 20 which is 10 times larger than the 30 μm where the positional deviation between the anode substrate and the cathode substrate becomes a problem, the strength of the panel is not affected and there is no problem.

クリップ部材でカソード基板11とアノード基板13を挟持する寸法は挟持した時の機械的な安定性を考慮しパネル完成時のシール幅は必要であり長い方が安定する。この寸法は例えば図1(b)の左側のA寸法では厳密にはアノード基板端からの寸法であるが、FEDが完成した状態で基板端とシール部19の外形は実質的に一致しているのでシール部19の外形を基準として定義する。
他方この寸法を大きくすると補強板が小さくなりFEDの耐圧力が小さくなる。耐圧力は厳密には各基板の厚さ、基板を固着する位置、シール部の固着強度により影響を受けるが、通常用いられるカソード基板厚さ0.7mmから1.8mmに対して試験したところA部はシール部19の幅の1倍から3倍の範囲であれば耐圧に問題はなかった。従ってA寸法はシール部19の幅の1倍以上3倍以内であることが好ましい。
Considering the mechanical stability when the cathode substrate 11 and the anode substrate 13 are clamped by the clip member, the seal width is necessary when the panel is completed, and the longer one is more stable. For example, in the dimension A on the left side of FIG. 1B, this dimension is strictly the dimension from the end of the anode substrate, but when the FED is completed, the outline of the substrate end and the seal portion 19 are substantially the same. Therefore, the outer shape of the seal portion 19 is defined as a reference.
On the other hand, when this dimension is increased, the reinforcing plate is reduced and the pressure resistance of the FED is reduced. Strictly speaking, the pressure resistance is affected by the thickness of each substrate, the position at which the substrate is fixed, and the fixing strength of the seal portion, but when tested for a commonly used cathode substrate thickness of 0.7 mm to 1.8 mm, A There was no problem with the withstand voltage if the portion was in the range of 1 to 3 times the width of the seal portion 19. Therefore, it is preferable that the dimension A is 1 to 3 times the width of the seal portion 19.

各基板の厚さはカソード基板11が最も薄く、補強板20、アノード基板13の順で厚くなる。またカソード基板11と補強板20の厚さの合計はアノード基板13と等しいか、それ以上となる。アノード基板、カソード基板と補強板の材質は異なる材質とすることもできるが熱膨張を考慮し、同じ材質であることが好ましい。
図1で第2のシール部21はストライプ状であり補強板20の短辺と平行に長辺方向に5箇所設けている。第2のシール部21の材質も低軟化点ガラスであり、第1のシール部19と同じものを使うことが好ましい。
The thickness of each substrate is the smallest in the cathode substrate 11, and increases in the order of the reinforcing plate 20 and the anode substrate 13. The total thickness of the cathode substrate 11 and the reinforcing plate 20 is equal to or greater than that of the anode substrate 13. The anode substrate, the cathode substrate and the reinforcing plate can be made of different materials, but the same material is preferable in consideration of thermal expansion.
In FIG. 1, the second seal portion 21 has a stripe shape and is provided in five locations in the long side direction in parallel with the short side of the reinforcing plate 20. The material of the second seal portion 21 is also a low softening point glass, and it is preferable to use the same material as the first seal portion 19.

なおシール部19は従来技術と同様に支持枠と低軟化点ガラスから構成されるようにしてもよい。また本実施の形態ではカソード基板11とアノード基板13の間の表示領域16内にスペーサを設けない場合を示したが、当該部分にスペーサを設けてもよい。
本実施の形態では各基板、シール形状が矩形の場合を示したが、各基板とシール形状が台形状、平行四辺形等であってもシール部19の外形端から補強板20の端部にA寸法を有する部分を2箇所、第1のシール部19の中心に対して対称に設けておけばよい。
In addition, you may make it the sealing part 19 be comprised from a support frame and low softening point glass similarly to a prior art. In this embodiment, the case where no spacer is provided in the display region 16 between the cathode substrate 11 and the anode substrate 13 is shown, but a spacer may be provided in this portion.
In this embodiment, the case where each substrate and the seal shape are rectangular is shown. However, even if each substrate and the seal shape are trapezoidal, parallelogram, etc., from the outer end of the seal portion 19 to the end of the reinforcing plate 20 Two portions having the dimension A may be provided symmetrically with respect to the center of the first seal portion 19.

次に本発明の電界放出表示素子の製造工程において、特に基板の仮固定から封着排気工程を図2を参照して説明する。まずアノード基板13として幅48mm、長さ105mm、厚さ2.4mmの高歪点ガラス基板を用いて、アノード電極14と蛍光体パターン15を設けた。蛍光体パターン15は□240μm、ピッチ300μmのモノカラーとした。この基板上に低軟化点ガラス(日本電気硝子製 BF103)のペーストにφ0.6mmのセラミックビーズを10wt%混入して矩形状に塗布し、ピーク温度480℃で大気焼成して外形が矩形で枠状の低軟化点ガラス層19’を設けた。低軟化点ガラス層は幅2mm、高さ1mmとした(図2(a))。   Next, in the manufacturing process of the field emission display element of the present invention, the sealing and exhausting process from the temporary fixing of the substrate will be described with reference to FIG. First, an anode electrode 14 and a phosphor pattern 15 were provided using a high strain point glass substrate having a width of 48 mm, a length of 105 mm, and a thickness of 2.4 mm as the anode substrate 13. The phosphor pattern 15 was a monocolor having a square of 240 μm and a pitch of 300 μm. On this substrate, 10 wt% of φ0.6 mm ceramic beads are mixed in a paste of low softening point glass (Nippon Denki Glass BF103) and applied in a rectangular shape, and air-fired at a peak temperature of 480 ° C. to form a rectangular frame. A low softening point glass layer 19 'was provided. The low softening point glass layer had a width of 2 mm and a height of 1 mm (FIG. 2A).

ここでスペーサとしてセラミックビーズを用いたがFEDの封着温度で軟化しない材料であればガラス、ジルコニア等の材料のビーズであってもよい。またスペーサの形状もビーズに限らず円柱や角柱であってもよい。また表示領域16内にスペーサを設ける場合にはシールペーストにスペーサを混入する必要はない。   Here, ceramic beads are used as spacers, but beads made of materials such as glass and zirconia may be used as long as they do not soften at the FED sealing temperature. The shape of the spacer is not limited to beads, and may be a cylinder or a prism. Further, when providing a spacer in the display area 16, it is not necessary to mix the spacer into the seal paste.

補強板20は幅48mm、長さ88mm、厚さ1.8mmの高歪点ガラス基板を用いた。この基板上に低軟化点ガラス(日本電気硝子製 BF103)のペーストをストライプ状に塗布し、ピーク温度480℃で大気焼成(仮焼成)してストライプ状の低軟化点ガラス層21’を設けた。低軟化点ガラス層は幅4mm、長さ45mm、高さ1mmとした(図2(b))。   The reinforcing plate 20 was a high strain point glass substrate having a width of 48 mm, a length of 88 mm, and a thickness of 1.8 mm. A paste of low softening point glass (BF103 manufactured by Nippon Electric Glass) was applied in a stripe shape on this substrate, and was subjected to atmospheric firing (temporary firing) at a peak temperature of 480 ° C. to provide a striped low softening point glass layer 21 ′. . The low softening point glass layer had a width of 4 mm, a length of 45 mm, and a height of 1 mm (FIG. 2B).

カソード基板11は幅56mm、長さ108mm、厚さ1.1mmの低アルカリガラス基板を用いて、当該基板上に電子放出素子群12を蛍光体パターン15に対応させて設けた。そしてアノード基板13とカソード基板11を精密に位置合せした状態で耐熱性の板バネを用いたクリップ部材(弾性保持手段)30を用いて仮固定した。当該クリップ部材30はカソード基板11の補強板20で覆われない部分とそれに対応するアノード基板13の部分を挟持するようにした(図2(c))。   The cathode substrate 11 was a low alkali glass substrate having a width of 56 mm, a length of 108 mm, and a thickness of 1.1 mm, and the electron-emitting device group 12 was provided on the substrate in correspondence with the phosphor pattern 15. Then, in a state where the anode substrate 13 and the cathode substrate 11 were precisely aligned, they were temporarily fixed using a clip member (elastic holding means) 30 using a heat-resistant leaf spring. The clip member 30 sandwiches a portion of the cathode substrate 11 that is not covered with the reinforcing plate 20 and a portion of the anode substrate 13 corresponding to the portion (FIG. 2C).

その状態でカソード基板11に低軟化点ガラス層を設けた補強板20を重ねて、上記と同様のクリップ部材を用いて仮固定した。当該クリップ部材はアノード基板13と補強板20を挟持するようにした。(図2(c))なお図2(c)では当該クリップ部材は図示を省略し、クリップ部材により与えられる荷重を矢印で示す。なおクリップ部材の代わりにアノード基板13、カソード基板11と補強板20を重ねた上から錘を載せて荷重してもよい。また弾性保持部材はコイルバネを用いるものであってもよい。   In this state, the reinforcing plate 20 provided with the low softening point glass layer was placed on the cathode substrate 11 and temporarily fixed using the same clip member as described above. The clip member sandwiched the anode substrate 13 and the reinforcing plate 20. In FIG. 2C, the clip member is not shown, and the load applied by the clip member is indicated by an arrow. Instead of the clip member, the anode substrate 13, the cathode substrate 11, and the reinforcing plate 20 may be stacked and a weight may be put on and loaded. The elastic holding member may use a coil spring.

このように仮固定したものを真空チャンバーの中にセットした。真空チャンバーは加熱手段を有しており、収納した物品を加熱することができる。まず、チャンバー内を不活性ガス雰囲気にて450℃まで昇温して、30分間保持した。450℃はフリットガラスの推奨作業温度である。(推奨作業温度及び軟化温度は仕様するフリットガラスの成分により異なる。)これにより低軟化点ガラス層が溶融して補強板が固着されシール部が気密にされた気密容器が完成した。   What was temporarily fixed in this way was set in a vacuum chamber. The vacuum chamber has a heating means, and can heat the stored articles. First, the temperature in the chamber was raised to 450 ° C. in an inert gas atmosphere and held for 30 minutes. 450 ° C is the recommended operating temperature for frit glass. (Recommended working temperature and softening temperature differ depending on the components of the frit glass to be specified.) As a result, a low softening point glass layer was melted, a reinforcing plate was fixed, and an airtight container with a sealed portion was completed.

その後チャンバー内をポンプで真空に排気し、外囲器内を真空とした。この排気工程中、チャンバー内は350℃の加熱状態に保持した。90分経過後、チャンバー内に前記気密容器と距離をおいてセットされている排気蓋を独立の加熱手段によって加熱した。排気蓋には予め低軟化点ガラス層が形成されており、この加熱により溶融した。この状態で排気蓋18を排気穴17を覆うようにアノード基板13に接触させた。その後、冷却し、チャンバーから取り出してFEDが完成した(図2(d))。   Thereafter, the inside of the chamber was evacuated with a pump, and the inside of the envelope was evacuated. During this evacuation process, the inside of the chamber was kept heated at 350 ° C. After 90 minutes, the exhaust lid set at a distance from the airtight container in the chamber was heated by an independent heating means. A glass layer having a low softening point was previously formed on the exhaust lid and melted by this heating. In this state, the exhaust lid 18 was brought into contact with the anode substrate 13 so as to cover the exhaust hole 17. Then, it cooled and took out from the chamber and completed FED (FIG.2 (d)).

FEDが完成した状態ではアノード基板13に設けた低軟化点ガラス層より構成された第1のシール部は外形が幅48mm、長さ100mmでありシール幅は3mm、高さは0.6mmであった。本実施の形態において補強板20の長さは88mmなのでA寸法は(100−88)/2=6mmとなった。
本実施の形態では補強基板20に設けた低軟化点ガラス層より構成された第2のシール層の幅は8mm、高さは0.3mmであった。
In a state where the FED is completed, the first seal portion composed of the low softening point glass layer provided on the anode substrate 13 has an outer width of 48 mm, a length of 100 mm, a seal width of 3 mm, and a height of 0.6 mm. It was. In the present embodiment, since the length of the reinforcing plate 20 is 88 mm, the dimension A is (100−88) / 2 = 6 mm.
In the present embodiment, the width of the second seal layer made of the low softening point glass layer provided on the reinforcing substrate 20 is 8 mm and the height is 0.3 mm.

本発明の実施例として第2のシール部のパターン形状を変更した例を示す。図3(a)に本発明の実施例1に係るFEDの裏面図を示す。第2のシール部211以外は図1に示す実施の形態と同じである。なお図3(a)ではアノード基板13、カソード基板11、第2のシール部211と補強板20を示し、他は図示を省略する。   The example which changed the pattern shape of the 2nd seal | sticker part as an Example of this invention is shown. FIG. 3A shows a back view of the FED according to the first embodiment of the present invention. Except for the second seal portion 211, the embodiment is the same as the embodiment shown in FIG. 3A shows the anode substrate 13, the cathode substrate 11, the second seal portion 211, and the reinforcing plate 20, and the other illustrations are omitted.

図1(c)に示す実施の形態で第2のシール部21は5本のストライプであるが、実施例1で第2のシール部211は補強板20の外周縁に設けた枠状のパターンとしている。第2のシール部211の厚さと枠の幅は図1の第2のシール部21と同様である。カソード基板11、補強板20と第2のシール部211で構成される空間は気密となっている。   In the embodiment shown in FIG. 1C, the second seal portion 21 has five stripes, but in Example 1, the second seal portion 211 is a frame-like pattern provided on the outer peripheral edge of the reinforcing plate 20. It is said. The thickness of the second seal portion 211 and the width of the frame are the same as those of the second seal portion 21 in FIG. The space formed by the cathode substrate 11, the reinforcing plate 20, and the second seal portion 211 is airtight.

図1に示す実施の形態ではカソード基板11に大気圧が直接かかるが、第2のシール部を図3(a)に示す構成とすることで、枠状の第2のシール部211の内側の部分のカソード基板11に大気圧はかからず、カソード基板11と補強板20が一体となって大気圧を受けることになる。そのため実施例1では図1の実施の形態よりも補強板20の効果が大きく電界放出素子の耐圧力をより高くする効果がある。   In the embodiment shown in FIG. 1, atmospheric pressure is directly applied to the cathode substrate 11, but by configuring the second seal portion as shown in FIG. 3A, the inner side of the frame-like second seal portion 211 is arranged. No atmospheric pressure is applied to the cathode substrate 11, and the cathode substrate 11 and the reinforcing plate 20 are integrated to receive atmospheric pressure. Therefore, in Example 1, the effect of the reinforcing plate 20 is larger than that in the embodiment of FIG. 1, and the effect of increasing the pressure resistance of the field emission device is obtained.

本発明の実施例として第2のシール部のペタン形状を変更した他の例を示す。図3(b)に本発明の実施例2に係るFEDの裏面図を示す。第2のシール部212以外は図1に示す実施の形態と同じである。なお図3(b)ではアノード基板13、カソード基板11、第2のシール部212と補強板20を示し、他は図示を省略する。   As an embodiment of the present invention, another example in which the pattern shape of the second seal portion is changed is shown. FIG. 3B is a back view of the FED according to the second embodiment of the present invention. Except for the second seal portion 212, the embodiment is the same as the embodiment shown in FIG. FIG. 3B shows the anode substrate 13, the cathode substrate 11, the second seal portion 212, and the reinforcing plate 20, and the other illustrations are omitted.

実施例2で第2のシール部212は補強板の外周縁に設けた枠状のパターンとストライプ状のパターンを組合せたパターンにしている。実施例1よりもカソード基板11と補強板20の固着面積が多いので両者の固着が安定する。また全面を固着するよりも第2のシール部212の量が少ないので封着中のガス放出が少ない。
また第2のシール部のパターン形状は図3(c)に示す形状としてもよい。
In the second embodiment, the second seal portion 212 has a combination of a frame-like pattern and a stripe-like pattern provided on the outer peripheral edge of the reinforcing plate. Since the fixing area of the cathode substrate 11 and the reinforcing plate 20 is larger than that of the first embodiment, the fixing of both is stabilized. Further, since the amount of the second seal portion 212 is smaller than the case where the entire surface is fixed, the gas emission during sealing is small.
The pattern shape of the second seal portion may be the shape shown in FIG.

本発明の実施例として矩形の補強板の一部を凹状に切り欠いた例を図4に示す。図4(b)にFEDの裏面図を示し、図4(a)に図4(b)のY−Y線の矢印方向の切断部端面図(補強板201については断面図)を示す。これは図1の実施の形態において補強板201を第1のシール部19の外形と同じ寸法とし、カソード基板11をクリップ部材が実際に挟持する部分だけ凹状に切り欠いたものである。ここではシール部19の外形端から凹状の切り欠きの端面(切り欠き端)までをA寸法として示す。切り欠きの幅はクリップ部材が干渉しない程度の幅であればよい。かかる構成により、カソード基板11と補強板20の固着面積が増加してより耐圧強度を向上させることができる。   FIG. 4 shows an example in which a part of a rectangular reinforcing plate is cut out in a concave shape as an embodiment of the present invention. FIG. 4B shows a rear view of the FED, and FIG. 4A shows an end view (a cross-sectional view of the reinforcing plate 201) taken along the line Y-Y in FIG. 4B. In the embodiment of FIG. 1, the reinforcing plate 201 has the same dimensions as the outer shape of the first seal portion 19, and the cathode substrate 11 is cut out in a concave shape only at the portion where the clip member is actually sandwiched. Here, the dimension A is shown from the outer end of the seal portion 19 to the end face (notch end) of the concave notch. The width of the cutout may be a width that does not interfere with the clip member. With this configuration, the fixing area between the cathode substrate 11 and the reinforcing plate 20 can be increased, and the pressure resistance can be further improved.

この場合第2のシール部214の形状は上記実施の形態のようにストライプ状や補強板201の外周縁に沿って枠状の形状、それらを組合せた形状等を用いることができる。
なお図4では凹状の切り欠きを2箇所設けているが、これは2箇所に限るものではなく、アノード基板13とカソード基板11が大きい場合には更に多くの弾性保持部材で仮固定できるよう4箇所、6箇所等設けてもよい。補強板20の凹状の切り欠きはレーザー切断、切削等により設けることができる。
In this case, as the shape of the second seal portion 214, a stripe shape, a frame shape along the outer peripheral edge of the reinforcing plate 201, a shape combining them, or the like can be used as in the above embodiment.
In FIG. 4, two concave cutouts are provided. However, this is not limited to two. If the anode substrate 13 and the cathode substrate 11 are large, they can be temporarily fixed with more elastic holding members 4. You may provide a place, six places, etc. The concave notch of the reinforcing plate 20 can be provided by laser cutting, cutting, or the like.

本発明の実施例として第2のシール部に封着温度で軟化しないスペーサ22を混入した例を図5に示す。本実施例ではスペーサとしてφ0.2mmのアルミナビーズを用いた。第2のシール部を構成するフリットガラスに対し5wt%のアルミナビーズを混入させて第2のシール部を形成したものである。   FIG. 5 shows an example in which a spacer 22 that does not soften at the sealing temperature is mixed in the second seal portion as an embodiment of the present invention. In this embodiment, φ0.2 mm alumina beads were used as spacers. The second seal portion is formed by mixing 5 wt% alumina beads into the frit glass constituting the second seal portion.

これにより第2のシール部がクリップ部材の荷重ばらつき等により極端に潰れてしまい、シールが補強板20からはみ出してしまう等の不良発生を防ぐことができる。ここでスペーサとしてセラミックビーズを用いたがFEDの封着温度で軟化しない材料であればガラス、ジルコニア等の材料のビーズであってもよい。またスペーサの形状もビーズに限らず円柱や角柱であってもよい。   As a result, it is possible to prevent occurrence of defects such as the second seal portion being extremely crushed due to variations in the load of the clip member and the seal sticking out of the reinforcing plate 20. Here, ceramic beads are used as spacers, but beads made of materials such as glass and zirconia may be used as long as they do not soften at the FED sealing temperature. The shape of the spacer is not limited to beads, and may be a cylinder or a prism.

本発明の電界放出表示素子の実施の形態の構成を説明するための図である。It is a figure for demonstrating the structure of embodiment of the field emission display element of this invention. 本発明の電界放出表示素子の実施の形態の製造工程を説明するための図である。It is a figure for demonstrating the manufacturing process of embodiment of the field emission display element of this invention. 本発明の電界放出表示素子の実施例1、2の構成を説明するための図である。It is a figure for demonstrating the structure of Example 1, 2 of the field emission display element of this invention. 本発明の電界放出表示素子の実施例3の構成を説明するための図である。It is a figure for demonstrating the structure of Example 3 of the field emission display element of this invention. 本発明の電界放出表示素子の実施例4の構成を説明するための図である。It is a figure for demonstrating the structure of Example 4 of the field emission display element of this invention. 従来の電界放出表示素子の構成を説明するための図である。It is a figure for demonstrating the structure of the conventional field emission display element. 従来の界放出表示素子の製造工程を説明するための図である。It is a figure for demonstrating the manufacturing process of the conventional field emission display element.

符号の説明Explanation of symbols

1 電界放出表示素子
11 カソード基板
12 電子放出素子群
13 アノード基板
14 アノード電極
15 蛍光体パターン
16 表示領域
17 排気穴
18 排気蓋
19 第1のシール部
20 補強板
21 第2のシール部
30 クリップ部材
101 電子放出素子群
102 背面板
103 画像形成部材
104 前面板
105 支持枠
106 フリットガラス
DESCRIPTION OF SYMBOLS 1 Field emission display element 11 Cathode substrate 12 Electron emission element group 13 Anode substrate 14 Anode electrode 15 Phosphor pattern 16 Display area 17 Exhaust hole 18 Exhaust lid 19 First seal part 20 Reinforcement plate 21 Second seal part 30 Clip member 101 Electron Emitting Element Group 102 Back Plate 103 Image Forming Member 104 Front Plate 105 Support Frame 106 Frit Glass

Claims (8)

蛍光体が被着された陽極電極を設けたアノード基板と、
電子を放出する複数の陰極部を設けたカソード基板と、
前記アノード基板と前記カソード基板を所定の間隔で保持し、蛍光体が被着された表示領域の外周縁を気密封止する第1のシール部を有し、
前記カソード基板の裏面に補強板を第2のシール部で固着する電界放出表示素子において、
前記補強板の長さ又は幅の少なくとも一方が前記第1のシールの外形の長さ又は幅よりも短く、前記第1のシールの長さ又は幅の外形端から前記補強板の基板端までの距離が前記補強板の両端において前記第1のシールのシール幅以上であることを特徴とする電界放出型表示素子。
An anode substrate provided with an anode electrode coated with a phosphor;
A cathode substrate provided with a plurality of cathode portions for emitting electrons;
A first sealing portion that holds the anode substrate and the cathode substrate at a predetermined interval and hermetically seals an outer peripheral edge of a display region to which the phosphor is deposited;
In a field emission display element in which a reinforcing plate is fixed to the back surface of the cathode substrate with a second seal portion,
At least one of the length or width of the reinforcing plate is shorter than the length or width of the outer shape of the first seal, and from the outer end of the length or width of the first seal to the substrate end of the reinforcing plate. A field emission display element, wherein a distance is equal to or greater than a seal width of the first seal at both ends of the reinforcing plate.
蛍光体が被着された陽極電極を設けたアノード基板と、
電子を放出する複数の陰極部を設けたカソード基板と、
前記アノード基板と前記カソード基板を所定の間隔で保持し、蛍光体が被着された表示領域の外周縁を気密封止する第1のシール部を有し、
前記カソード基板の裏面に補強板を第2のシール部で固着する電界放出表示素子において、
前記補強板の長さ又は幅の少なくとも一方に前記第1のシールの外形の長さ又は幅よりも短い少なくとも一対の切り欠き部を有することを特徴とする電界放出型表示素子。
An anode substrate provided with an anode electrode coated with a phosphor;
A cathode substrate provided with a plurality of cathode portions for emitting electrons;
A first sealing portion that holds the anode substrate and the cathode substrate at a predetermined interval and hermetically seals an outer peripheral edge of a display region to which the phosphor is deposited;
In a field emission display element in which a reinforcing plate is fixed to the back surface of the cathode substrate with a second seal portion,
A field emission display element comprising at least one pair of notches shorter than the length or width of the outer shape of the first seal in at least one of the length and width of the reinforcing plate.
前記第1のシールの長さ又は幅の外形端から前記補強板の基板端までの距離が前記補強板の両端において前記第1のシールのシール幅の1倍以上3倍以下であることを特徴とする請求項1に記載の電界放出表示素子。   The distance from the outer end of the length or width of the first seal to the substrate end of the reinforcing plate is 1 to 3 times the sealing width of the first seal at both ends of the reinforcing plate. The field emission display device according to claim 1. 前記第1のシールの長さ又は幅の外形端から前記補強板の切り欠き端までの距離が前記補強板の両端において前記第1のシールのシール幅の1倍以上3倍以下であることを特徴とする請求項2に記載の電界放出表示素子。   The distance from the outer end of the length or width of the first seal to the cutout end of the reinforcing plate is 1 to 3 times the sealing width of the first seal at both ends of the reinforcing plate. The field emission display device according to claim 2, wherein 前記第5のシール部は前記補強板の外周縁に設けた枠状パターンを有することを特徴とする請求項1乃至4に記載の電界放出表示素子。   5. The field emission display device according to claim 1, wherein the fifth seal portion has a frame-shaped pattern provided on an outer peripheral edge of the reinforcing plate. 6. 前記第2のシール部は前記枠状パターンの内部に複数のストライプ状パターンを設けたことを特徴とする請求項5に記載の電界放出表示素子。   6. The field emission display device according to claim 5, wherein the second seal portion is provided with a plurality of stripe patterns inside the frame pattern. 前記第2のシール部は電界放出表示素子の封着温度で実質的に軟化しないスペーサを含むことを特徴とする請求項1乃至6に記載の電界放出表示素子。   7. The field emission display device according to claim 1, wherein the second seal part includes a spacer that does not substantially soften at a sealing temperature of the field emission display device. 電界放出表示素子の製造方法であって、
前記アノード基板に前記第1のシールを塗布して仮焼成する工程と、
前記補強基板に前記第2のシールを塗布して仮焼成する工程と、
前記アノード基板と前記カソード基板を位置合せして弾性保持手段により仮固定する工程と、
前記アノード基板、前記カソード基板と前記補強基板を仮固定する工程と、
前記アノード基板、前記カソード基板と前記補強基板を一括して封着する工程を有することを特徴とする電界放出表示素子の製造方法。
A method for manufacturing a field emission display element, comprising:
Applying the first seal to the anode substrate and pre-baking;
Applying the second seal to the reinforcing substrate and pre-baking;
Aligning the anode substrate and the cathode substrate and temporarily fixing them by elastic holding means;
Temporarily fixing the anode substrate, the cathode substrate and the reinforcing substrate;
A method of manufacturing a field emission display device, comprising: sealing the anode substrate, the cathode substrate, and the reinforcing substrate together.
JP2007248566A 2007-09-26 2007-09-26 Field emission display element and its manufacturing method Pending JP2009081012A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007248566A JP2009081012A (en) 2007-09-26 2007-09-26 Field emission display element and its manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007248566A JP2009081012A (en) 2007-09-26 2007-09-26 Field emission display element and its manufacturing method

Publications (1)

Publication Number Publication Date
JP2009081012A true JP2009081012A (en) 2009-04-16

Family

ID=40655607

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007248566A Pending JP2009081012A (en) 2007-09-26 2007-09-26 Field emission display element and its manufacturing method

Country Status (1)

Country Link
JP (1) JP2009081012A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102208318A (en) * 2010-03-31 2011-10-05 双叶电子工业株式会社 Hermetically sealed vacuum container for fluorescence emitting tube

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07302540A (en) * 1994-05-02 1995-11-14 Canon Inc Image formation device and its manufacture
JP2000513831A (en) * 1996-12-23 2000-10-17 キャンデセント・テクノロジーズ・コーポレイション Method for reinforcing a flat panel display and related gas removal type device
JP2005011764A (en) * 2003-06-20 2005-01-13 Toshiba Corp Image display device
JP2005085513A (en) * 2003-09-05 2005-03-31 Mitsubishi Electric Corp Picture display panel, picture display assembly and picture display device
JP2005149960A (en) * 2003-11-17 2005-06-09 Toshiba Corp Image display device
JP2007042376A (en) * 2005-08-02 2007-02-15 Futaba Corp Airtight container

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07302540A (en) * 1994-05-02 1995-11-14 Canon Inc Image formation device and its manufacture
JP2000513831A (en) * 1996-12-23 2000-10-17 キャンデセント・テクノロジーズ・コーポレイション Method for reinforcing a flat panel display and related gas removal type device
JP2005011764A (en) * 2003-06-20 2005-01-13 Toshiba Corp Image display device
JP2005085513A (en) * 2003-09-05 2005-03-31 Mitsubishi Electric Corp Picture display panel, picture display assembly and picture display device
JP2005149960A (en) * 2003-11-17 2005-06-09 Toshiba Corp Image display device
JP2007042376A (en) * 2005-08-02 2007-02-15 Futaba Corp Airtight container

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102208318A (en) * 2010-03-31 2011-10-05 双叶电子工业株式会社 Hermetically sealed vacuum container for fluorescence emitting tube
JP2011216273A (en) * 2010-03-31 2011-10-27 Futaba Corp Hermetically sealed vacuum container for fluorescence emitting tube

Similar Documents

Publication Publication Date Title
US7332856B2 (en) Image display device
EP1780756B1 (en) Vacuum envelope and electron emission display having the vacuum envelope
US7839071B2 (en) Vacuum container and method for manufacturing the same, and image display apparatus and method for manufacturing the same
JP2009081012A (en) Field emission display element and its manufacturing method
KR20070007843A (en) Method of producing image display device
KR20060017831A (en) Image display and method for manufacturing same
US20060033419A1 (en) Image display device
JP2003308797A (en) Gate electrode structure and manufacturing method of electrode structure
JP3782347B2 (en) Flat display device and manufacturing method thereof
JP2001351521A (en) Manufacturing method and manufacturing device for image display device
JP2005197050A (en) Image display device and its manufacturing method
JP2566155B2 (en) Flat panel image display
WO2003102999A1 (en) Image display device
JPH07130304A (en) Flat type image display device
JP2006236733A (en) Image forming device and its manufacturing process
US20050269927A1 (en) Image display device
EP1387387A1 (en) Image display device
WO2006019033A1 (en) Method for manufacturing image display and image display
WO2005020271A1 (en) Image display device
JP2002008568A (en) Image forming device
JP2005267894A (en) Image display device
JP2004227833A (en) Image display device and its manufacturing method
EP1755143A1 (en) Image display device
JP2008269998A (en) Airtight container and image display device equipped with airtight container
JP2007335363A (en) Image display device

Legal Events

Date Code Title Description
A621 Written request for application examination

Effective date: 20100705

Free format text: JAPANESE INTERMEDIATE CODE: A621

A977 Report on retrieval

Effective date: 20120710

Free format text: JAPANESE INTERMEDIATE CODE: A971007

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20120724

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20121211