JP2009043870A - Suction pad of annular frame for holding semiconductor substrate - Google Patents

Suction pad of annular frame for holding semiconductor substrate Download PDF

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JP2009043870A
JP2009043870A JP2007206290A JP2007206290A JP2009043870A JP 2009043870 A JP2009043870 A JP 2009043870A JP 2007206290 A JP2007206290 A JP 2007206290A JP 2007206290 A JP2007206290 A JP 2007206290A JP 2009043870 A JP2009043870 A JP 2009043870A
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annular frame
suction
suction pad
silicon sponge
semiconductor substrate
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Kazuhiro Takaoka
和宏 高岡
Tomio Kubo
富美夫 久保
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Okamoto Machine Tool Works Ltd
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Okamoto Machine Tool Works Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a suction pad without any falling of an annular frame, when a semiconductor substrate is conveyed. <P>SOLUTION: The suction pad 200 is constituted by providing four suction holes in a linear symmetrical arrangement at a position touching an annular frame at a surface member 201 side of a rectangular silicone sponge, wherein a front surface of the silicone sponge with a width of 1 to 5 mm of a suction hole peripheral part touching the annular frame is protruded with a height of 0.5 to 3 mm (201b), and there is provided a level difference between a central spatial portion of a metal annular frame at another surface member side and other silicone sponge front surfaces facing a metal annular frame portion. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、粘着テープを介して半導体基板が貼付された環状フレームを吸着し、マウンタステージやエッチングステージ、あるいは、ダイシングステージなどの次の加工ステージに前記環状フレームを搬送するのに用いる搬送機器の吸着パッドに関する。本発明の吸着パッドは、環状フレームを吸着搬送中、環状フレームの自重により吸着パッドから落下するおそれが少なく、かつ、パッド部分の面積が小さく、高さが低いので、半導体基板が貼付された環状フレームを吸着しに研削ステージに吸着パッドが移送され環状フレームを吸着する作業、または、吸着した環状フレームを次加工ステージへ搬送し、このステージへ載置させる作業が容易である。 The present invention relates to a conveyance device used for adsorbing an annular frame to which a semiconductor substrate is attached via an adhesive tape and conveying the annular frame to a next processing stage such as a mounter stage, an etching stage, or a dicing stage. It relates to a suction pad. The suction pad of the present invention is less likely to fall from the suction pad due to its own weight during suction conveyance of the annular frame, and the pad portion has a small area and a low height. The work of sucking the frame and sucking the suction pad to the grinding stage and sucking the annular frame, or the work of transporting the sucked annular frame to the next processing stage and placing it on this stage is easy.

半導体基板の径が300mm、450mmと拡径するとともに、厚みが20〜80μmと極薄の半導体基板が望まれている。配線プリント面が保護テープで被覆されている半導体基板のシリコン基板面を粘着テープを介して環状フレームに貼付し、研削ステージ上に載置し、研削砥石でシリコン基板面を研削加工し、ついで、研削加工シリコン面を研磨加工または/およびエッチング加工して基板の厚みを20〜80μmと薄肉化することが実施されている。 There is a demand for an extremely thin semiconductor substrate having a diameter of 300 mm or 450 mm and a thickness of 20 to 80 μm. A silicon substrate surface of a semiconductor substrate whose wiring printed surface is covered with a protective tape is attached to an annular frame via an adhesive tape, placed on a grinding stage, and then the silicon substrate surface is ground with a grinding wheel, It has been practiced to reduce the thickness of the substrate to 20 to 80 μm by polishing or / and etching the ground silicon surface.

このような粘着テープを介して半導体基板が貼付された環状フレームを吸着し、マウンタステージやエッチングステージ、あるいは、ダイシングステージなどの次の加工ステージに前記環状フレームを搬送するのに用いる搬送機器として、図4に示すように複数本の吸着パッド(コレット)10aを用いて環状フレーム1を吸着し、次ぎの加工ステージへ搬送する方法が提案されている(例えば、特許文献1参照。)。 As a conveyance device used to adsorb the annular frame to which the semiconductor substrate is attached via such an adhesive tape, and to convey the annular frame to the next processing stage such as a mounter stage, an etching stage, or a dicing stage, As shown in FIG. 4, a method has been proposed in which a plurality of suction pads (collets) 10a are used to suck the annular frame 1 and convey it to the next processing stage (see, for example, Patent Document 1).

この複数本の吸着パッドを用いる搬送機器は、吸着パッドのパッド径が6〜30mm、丈が12〜16mmと大きく、研削砥石8と基板ホルダーテーブル6間の距離を大きく採る必要がある。 The conveyance device using the plurality of suction pads has a large pad diameter of 6 to 30 mm and a length of 12 to 16 mm, and requires a large distance between the grinding wheel 8 and the substrate holder table 6.

前述の特許文献1の複数の吸着パッドの丈が高い欠点を改良するフレームの搬送機器として、図5に示すエッジ把持型搬送ロボットのア−ム10が提案され、粘着テープを用いて半導体基板を半導体基板の直径より若干径の長い厚み0.5〜1mmの円板状剛体サポ−トGに積層した積層体の円板状剛体サポ−トGのエッジを、エッジ把持型搬送ロボット4のア−ム下面に設けられた一対の固定把持部材21と移動把持部材22により把持し、円板状剛体サポ−トGをバキュームチャック上へ搬入、あるいはバキュームチャック上から搬送することが提案されている(例えば、特許文献2参照。)。 As an apparatus for transferring a frame for improving the disadvantages of the plurality of suction pads described in Patent Document 1 described above, an arm 10 of an edge gripping type transfer robot shown in FIG. 5 is proposed, and a semiconductor substrate is mounted using an adhesive tape. The edge of the disk-shaped rigid support G of the laminated body laminated on the disk-shaped rigid support G having a thickness of 0.5 to 1 mm, which is slightly longer than the diameter of the semiconductor substrate, is attached to the edge of the edge gripping transfer robot 4. -It has been proposed to hold by a pair of fixed holding member 21 and moving holding member 22 provided on the lower surface of the drum, and to carry the disc-shaped rigid support G onto the vacuum chuck or to carry it from above the vacuum chuck. (For example, refer to Patent Document 2).

また、中心に穴の空いた音響用CDやDVDをフラット状、リング状、もしくは三日月状の一個のシリコンゴム製吸着パッドを用いて吸着し、搬送することも知られている(例えば、非特許文献1参照。)。 It is also known that an acoustic CD or DVD having a hole in the center is sucked and transported using a single silicon rubber suction pad in a flat, ring or crescent shape (for example, non-patent) Reference 1).

さらに、半導体基板自身を搬送する搬送ロボットの吸着アームとして、円板状のシリコンスポンジの表面側に多数の真空孔を設けた吸着パッドも実用化されている。 Furthermore, a suction pad provided with a number of vacuum holes on the surface side of a disk-like silicon sponge has been put to practical use as a suction arm of a transfer robot that transfers the semiconductor substrate itself.

特開平6−302569号公報Japanese Patent Laid-Open No. 6-302569 特開2007−027591号公報JP 2007-027591 A 大谷技研“各種パッド”、[online]、[平成11年8月1日検索]、インターネット<URL:http://www.ohtani-eng.com/productionfo/cuptype.htm>Otani Giken "Various Pads", [online], [Search August 1, 1999], Internet <URL: http: //www.ohtani-eng.com/productionfo/cuptype.htm>

特許文献2に記載されるエッジ把持型搬送ロボットのア−ムは、特許文献1に記載の複数の吸着パッドを用いる搬送機器より丈が低いので搬入、搬送作業性に優れる利点を有する。しかし、一対の固定把持部材と移動把持部材により円板状剛体サポ−トGの外周縁部を把持する構造であるので、ア−ムの長さが市販のシリコンスポンジの表面側に多数の真空孔を設けた吸着パッドの長さより固定把持部材と移動把持部材の合計長さ分(10〜25mm)余計に長くなる。かかる10〜25mmの長さの拡大は、既存する直径450mmの半導体基板の研削装置において、円板状剛体サポ−トGをエッジ把持型搬送ロボットのア−ムで基板ホルダーチャック上へ搬入する余地のある空間を基板ホルダーチャックに設けるには基板ホルダーチャック径に余裕がなく、改造が困難である。 The arm of the edge gripping type transfer robot described in Patent Document 2 has an advantage that it is excellent in carrying-in and transfer workability because it is lower in height than a transfer device using a plurality of suction pads described in Patent Document 1. However, since the outer peripheral edge of the disc-shaped rigid support G is gripped by a pair of fixed gripping members and moving gripping members, the length of the arm has a large number of vacuums on the surface side of a commercially available silicon sponge. The total length (10 to 25 mm) of the fixed gripping member and the movable gripping member is longer than the length of the suction pad provided with the holes. Such an increase in the length of 10 to 25 mm is a room for carrying the disk-shaped rigid support G onto the substrate holder chuck by the arm of the edge gripping type transfer robot in the existing semiconductor substrate grinding apparatus having a diameter of 450 mm. In order to provide a certain space in the substrate holder chuck, there is no room for the diameter of the substrate holder chuck and it is difficult to modify.

市販の円板状のシリコンスポンジの表面側に多数の真空孔を設けた吸着パッドを前記環状フレームの吸着・搬送に用いると環状フレームのリング空間に位置する20〜52μm厚みの薄いシリコン基板面に吸引孔痕跡が残ることがあり、好ましくない。環状フレームのリング空間に位置する区域に位置するシリコンスポンジの表面側の真空孔を塞いで環状フレームを吸着・搬送したところ、搬送100回当たり1〜2回の割合で吸着パッドの吸着面から環状フレームが落下することが見出された。 When a suction pad provided with a number of vacuum holes on the surface side of a commercially available disc-shaped silicon sponge is used for suction and transport of the annular frame, it is formed on the surface of a thin silicon substrate having a thickness of 20 to 52 μm located in the ring space of the annular frame. A suction hole trace may remain, which is not preferable. When the annular frame is sucked and transported by closing the vacuum hole on the surface side of the silicon sponge located in the area located in the ring space of the annular frame, it is circular from the suction surface of the suction pad at a rate of 1 to 2 times per 100 transports. It was found that the frame fell.

この環状フレームの落下原因は、シリコンスポンジの表面側の表面粗さ(Ramax)が2μm以下と平滑であるのに比較して金属製環状フレームの表面粗さ(Ramax)が150〜300μmと粗い面であり、シリコンスポンジの表面と金属製環状フレームとが接触した部分には約150〜300μmの空気逃げ流路が形成されることとなり、シリコンスポンジの減圧度が低気圧の通過、あるいは真空ポンプ稼動電圧が低圧に変化して金属製環状フレームの自重を持ち堪える減圧度より低くなったときに金属製環状フレームの落下が生じると推測される。 Fall cause of the annular frame, and the surface roughness of the surface of the silicon sponge (Ra max) is 2μm or less and the surface roughness of the metal annular frame compared to a smooth (Ra max) is 150~300μm An air escape passage of about 150 to 300 μm is formed in a rough surface where the surface of the silicon sponge and the metal annular frame are in contact with each other. It is presumed that the metal annular frame falls when the pump operating voltage changes to a low pressure and becomes lower than the degree of decompression that can withstand the weight of the metal annular frame.

よって、搬送時の真空孔の減圧度を1.5〜3倍高くなる電圧で真空ポンプを稼動させることが考えられるが、真空ポンプがより大型のものが必要とされ、搬送機器のコストが増加する。 Therefore, it is conceivable to operate the vacuum pump at a voltage that increases the vacuum pressure reduction degree of the vacuum hole by 1.5 to 3 times, but a larger vacuum pump is required, which increases the cost of the transport equipment. To do.

本発明者らは、シリコンスポンジの表面側に設ける吸引孔の数を4個に減らすとともに、環状フレームに接触する吸引孔部分のシリコンスポンジ表面を0.5〜3mmの高さ突起させることによりシリコンスポンジ表面側の金属製環状フレームの中央空間部や金属製環状フレーム部分に相対する一部との間に段差を設けた構造の吸着パッドとすることにより、低い減圧度でも金属製環状フレームを落下させることがない吸着パッドとすることができた。 The present inventors reduced the number of suction holes provided on the surface side of the silicon sponge to four, and made the silicon sponge surface of the suction hole part in contact with the annular frame protrude by a height of 0.5 to 3 mm. By using a suction pad with a step between the central space of the metal ring frame on the sponge surface side and the part facing the metal ring frame part, the metal ring frame can be dropped even at a low degree of decompression. The suction pad could not be made.

請求項1の発明は、粘着テープを介して半導体基板が貼付された環状フレームを1基の吸着パッドで吸着し、次の加工ステージに前記環状フレームを搬送するのに用いる搬送機器の吸着パッドであって、この吸着パッドは、長方形状のシリコンスポンジの表面部材側に直径1〜8mmの吸引孔を4個線対称に環状フレームに接する位置に設けたものであり、環状フレームに接触する吸引孔外周部分の1〜5mm幅の前記シリコンスポンジ表面を0.5〜3mmの高さ突起させることによりシリコンスポンジ表面部材側の金属製環状フレームの中央空間部や金属製環状フレーム部分に相対する他のシリコンスポンジ表面との間に段差を設けた構造とし、前記4個の吸引孔を長方形状のシリコンスポンジ表面部材側に内蔵されたコ状の中空パイプで連通させた構造の吸着パッドにある。 The invention of claim 1 is an adsorption pad of a conveying device used for adsorbing an annular frame to which a semiconductor substrate is attached via an adhesive tape with one adsorption pad and conveying the annular frame to the next processing stage. In this suction pad, four suction holes having a diameter of 1 to 8 mm are provided on the surface member side of the rectangular silicon sponge at positions where they are in contact with the annular frame in line symmetry, and the suction holes are in contact with the annular frame. By projecting the surface of the silicon sponge having a width of 1 to 5 mm on the outer peripheral portion to a height of 0.5 to 3 mm, the other surface facing the central space portion of the metal annular frame on the silicon sponge surface member side or the metal annular frame portion is provided. A hollow hollow pipe with a structure in which a step is provided between the surface of the silicon sponge and the four suction holes are built into the rectangular silicon sponge surface member side. In the suction pad of the communicated allowed structure.

本発明の吸着パッドは、1基の吸着パッドで環状フレームを吸着・搬送できるので、特許文献1に記載の複数の吸着パッドを用いる搬送機器と比較し、吸着部品部がコンパクトであり、搬入、搬送の作業性に優れる。 Since the suction pad of the present invention can suck and transport the annular frame with one suction pad, the suction part is compact compared to the transport device using a plurality of suction pads described in Patent Document 1, Excellent workability of conveyance.

以下、図を用いて本発明をさらに詳細に説明する。 図1は環状フレーム用搬送機器の斜視図、図2は環状フレームを吸着パッドが吸着している状態を示す平面図、および、図3は吸着パッドの部分断面図で、図2においてI−I線方向の切断図であり、円内に吸着パッドの吸引孔の部分斜視図を付加している。 Hereinafter, the present invention will be described in more detail with reference to the drawings. FIG. 1 is a perspective view of a transport device for an annular frame, FIG. 2 is a plan view showing a state in which the suction pad is sucking the annular frame, and FIG. 3 is a partial sectional view of the suction pad. It is a cutaway view in the line direction, and a partial perspective view of the suction hole of the suction pad is added in a circle.

図1に示す環状フレーム用搬送機器100は、支柱106より基部アーム101、中間アーム102、先端アーム103を回転自在に起立させ、前記先端アーム103上に減圧部材収納室104を設け、この減圧部材収納室104の前方壁部よりパッド支持板105を延長させ、その先に吸着パッド200を支持させた構造となっている。 1 has a base arm 101, an intermediate arm 102, and a distal arm 103 that are rotatably raised from a support column 106. A decompression member storage chamber 104 is provided on the distal arm 103. The pad support plate 105 is extended from the front wall portion of the storage chamber 104, and the suction pad 200 is supported at the tip.

図2および図3に示すように、吸着パッド200は、長方形状のシリコンスポンジの表面部材側201に内径1〜8mm、好ましくは1〜3mm内径の吸引孔203を4個線対称に環状フレームFに接する位置に設けたものであり、環状フレームFに接触する吸引孔203外周部分の1〜5mm幅(L)の前記シリコンスポンジ表面201aを0.5〜3mmの高さ(H)突起201bさせることによりシリコンスポンジ表面部材側の金属製環状フレームの中央空間部Fvや金属製環状フレームF部分に相対する他のシリコンスポンジ表面201aとの間に高さHの段差を設ける。前記4個の吸引孔203を構成するステンレス製筒状物206の各々の端は、コ状の中空パイプ207に連通されている。このコ状のステンレス、アルミニウム、あるいは銅製の中空パイプ207は、前記長方形状のシリコンスポンジ表面部材側201と裏打材202と間に内蔵される。ステンレス製筒状物206の下面とシリコンスポンジ突起201b下面は、面一となっている。 As shown in FIG. 2 and FIG. 3, the suction pad 200 includes four suction holes 203 having an inner diameter of 1 to 8 mm, preferably 1 to 3 mm, on the surface member side 201 of a rectangular silicon sponge. The silicon sponge surface 201a having a width of 1 to 5 mm (L) in the outer peripheral portion of the suction hole 203 that is in contact with the annular frame F is made to have a protrusion 201b having a height (H) of 0.5 to 3 mm. Thus, a step having a height H is provided between the center space portion Fv of the metal annular frame on the silicon sponge surface member side and another silicon sponge surface 201a facing the metal annular frame F portion. Each end of the stainless steel cylindrical body 206 constituting the four suction holes 203 is in communication with a U-shaped hollow pipe 207. The hollow pipe 207 made of stainless steel, aluminum or copper is built in between the rectangular silicon sponge surface member side 201 and the backing material 202. The lower surface of the stainless steel cylinder 206 and the lower surface of the silicon sponge protrusion 201b are flush with each other.

コ状の中空パイプ207の搬送機器の支持板105に近い側には吸引流路207aと噴出流路207bが分岐されており、これら分岐流路207a、207b中空パイプは支持板105の凹部空室を経由して減圧部材収納室104に収納されている中空パイプに連通されている。なお、207cは吸着パッド補強のために設けられた連結中空管である。 A suction channel 207 a and a jet channel 207 b are branched on the side of the U-shaped hollow pipe 207 closer to the support plate 105 of the conveying device, and these branch channels 207 a and 207 b hollow pipes are recessed vacancies in the support plate 105. And communicated with the hollow pipe stored in the decompression member storage chamber 104. Reference numeral 207c is a connecting hollow tube provided to reinforce the suction pad.

前記シリコンスポンジ表面部材201の素材は、耐熱性および耐寒性の面から硬度(Hs)が45〜58のシリコンスポンジ(ゴム)が好ましい。シリコンスポンジの使用温度は、−70℃〜+200℃である。裏打材202もシリコンスポンジが好ましいが、芳香族ポリアミド樹脂、ポリ(ジクロロジフロロエチレン)などのエンジニアプラスチック、ニトリロゴム、あるいはアルミニウム板であってもよい。シリコンスポンジ表面部材201、裏打材202の厚みは、0.5〜3mm、好ましくは、0.8〜1.5mmである。 The material of the silicon sponge surface member 201 is preferably a silicon sponge (rubber) having a hardness (Hs) of 45 to 58 in terms of heat resistance and cold resistance. The operating temperature of the silicon sponge is -70 ° C to + 200 ° C. The backing material 202 is also preferably a silicon sponge, but may be an aromatic polyamide resin, an engineer plastic such as poly (dichlorodifluoroethylene), nitrilo rubber, or an aluminum plate. The thicknesses of the silicon sponge surface member 201 and the backing material 202 are 0.5 to 3 mm, preferably 0.8 to 1.5 mm.

前記吸着パッド200は、粘着テープ(T)を介して半導体基板(w)が貼付された環状フレーム
(F)のフレーム部分を前記4個の吸引孔203で吸着する。減圧度は、−100pKaから−850pKaでよい。
The suction pad 200 sucks the frame portion of the annular frame (F) to which the semiconductor substrate (w) is attached via the adhesive tape (T) through the four suction holes 203. The degree of vacuum may be from -100 pKa to -850 pKa.

コ状の中空パイプ207内の減圧または加圧は、図1の搬送機器100には図示されていない真空ポンプおよびコンプレッサの稼動により行われる。真空ポンプの稼動により環状フレーム(F)の吸着パッド200による吸着が、コンプレッサの稼動により環状フレーム(F)が吸着パッド200より剥離される。 The decompression or pressurization in the hollow U-shaped pipe 207 is performed by operating a vacuum pump and a compressor not shown in the conveying device 100 of FIG. The suction of the annular frame (F) by the suction pad 200 is performed by the operation of the vacuum pump, and the annular frame (F) is separated from the suction pad 200 by the operation of the compressor.

環状フレーム(F)の素材は、ステンレス、アルミニウム、真鍮などの金属でもよいが、ガラス、ポリ(エチレンエーテルケトン)、ナイロン6,10、ナイロン6,12、ポリアセタール等の表面粗さ(Ramax)が1μm以下のリングを与えるものの方がより減圧の程度を小さくできる。 The material of the annular frame (F) may be a metal such as stainless steel, aluminum, or brass, but the surface roughness (Ra max ) of glass, poly (ethylene ether ketone), nylon 6,10, nylon 6,12, polyacetal, etc. However, it is possible to make the degree of decompression smaller when the ring gives a ring of 1 μm or less.

本発明の半導体基板保持用環状フレームの吸着パッドは、環状フレームに吸着パッドが小面積で接するので、減圧洩れが非常に小さくなるので、低気圧の通過や真空ポンプの電圧低下があっても環状フレームを落下させるほどには減圧度が低下しないので、半導体基板加工装置を連続運転していても環状リングの落下の心配が不要である。 Since the suction pad of the annular frame for holding a semiconductor substrate of the present invention is in contact with the annular frame with a small area, the pressure reduction leakage is very small, so that even if there is a low-pressure passage or a vacuum pump voltage drop, Since the degree of decompression does not decrease to the extent that the frame is dropped, there is no need to worry about dropping of the annular ring even if the semiconductor substrate processing apparatus is continuously operated.

環状フレーム用搬送機器の斜視図である。It is a perspective view of the conveyance apparatus for annular frames. 環状フレームを吸着パッドが吸着している状態を示す平面図である。It is a top view which shows the state which the suction pad is adsorbing the annular frame. 吸着パッドの部分断面図である。It is a fragmentary sectional view of a suction pad. 複数本の吸着パッドを用いて環状フレームを搬送する状態を示す図である。(公知)It is a figure which shows the state which conveys a cyclic | annular flame | frame using a several suction pad. (Known) エッジ把持型搬送ロボットのア−ムで環状剛体を把持する状態を示す図である。(公知)It is a figure which shows the state which grips a cyclic | annular rigid body with the arm of an edge gripping type | mold robot. (Known)

符号の説明Explanation of symbols

100 環状フレーム用搬送機器 F 環状フレーム T 粘着テープ w 半導体基板 200 搬送パッド 201 シリコンスポンジの表面部材 201b 段部 202 裏打材 203 吸引孔207 コ状の中空パイプ DESCRIPTION OF SYMBOLS 100 Conveying apparatus for annular frames F Annular frame T Adhesive tape w Semiconductor substrate 200 Conveying pad 201 Silicon sponge surface member 201b Stepped part 202 Backing material 203 Suction hole 207 U-shaped hollow pipe

Claims (1)

粘着テープを介して半導体基板が貼付された環状フレームを1基の吸着パッドで吸着し、次の加工ステージに前記環状フレームを搬送するのに用いる搬送機器の吸着パッドであって、この吸着パッドは、長方形状のシリコンスポンジの表面部材側に直径1〜8mmの吸引孔を4個線対称に環状フレームに接する位置に設けたものであり、環状フレームに接触する吸引孔外周部分の1〜5mm幅の前記シリコンスポンジ表面を0.5〜3mmの高さ突起させることによりシリコンスポンジ表面部材側の金属製環状フレームの中央空間部や金属製環状フレーム部分に相対する他のシリコンスポンジ表面との間に段差を設けた構造とし、前記4個の吸引孔を長方形状のシリコンスポンジ表面部材側に内蔵されたコ状の中空パイプで連通させた構造の吸着パッド。 A suction pad of a transport device used for sucking an annular frame with a semiconductor substrate attached via an adhesive tape with a single suction pad and transporting the annular frame to the next processing stage. Four suction holes with a diameter of 1 to 8 mm are provided on the surface member side of the rectangular silicon sponge at positions where they are in contact with the annular frame in line symmetry, and the outer periphery of the suction hole that contacts the annular frame has a width of 1 to 5 mm. By projecting the surface of the silicon sponge to a height of 0.5 to 3 mm, the silicon sponge surface member side metal ring frame has a central space portion between the metal ring frame and another silicon sponge surface facing the metal ring frame portion. It has a structure in which a step is provided, and the four suction holes are connected by a hollow hollow pipe built in the rectangular silicon sponge surface member side. Wear pad.
JP2007206290A 2007-08-08 2007-08-08 Suction pad of annular frame for holding semiconductor substrate Pending JP2009043870A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016062942A (en) * 2014-09-16 2016-04-25 株式会社ディスコ Wafer transfer mechanism
JP2018108638A (en) * 2016-12-15 2018-07-12 ジャビル インク Device and method for imparting adaptable vacuum cup for end effector

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016062942A (en) * 2014-09-16 2016-04-25 株式会社ディスコ Wafer transfer mechanism
JP2018108638A (en) * 2016-12-15 2018-07-12 ジャビル インク Device and method for imparting adaptable vacuum cup for end effector
JP7180975B2 (en) 2016-12-15 2022-11-30 ジャビル インク Apparatus and method for providing matching vacuum cups for end effectors

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