JP2009026977A - 投影光学系及びそれを有する露光装置 - Google Patents

投影光学系及びそれを有する露光装置 Download PDF

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Publication number
JP2009026977A
JP2009026977A JP2007189042A JP2007189042A JP2009026977A JP 2009026977 A JP2009026977 A JP 2009026977A JP 2007189042 A JP2007189042 A JP 2007189042A JP 2007189042 A JP2007189042 A JP 2007189042A JP 2009026977 A JP2009026977 A JP 2009026977A
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Japan
Prior art keywords
optical system
lens
projection optical
object side
liquid
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Pending
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JP2007189042A
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Japanese (ja)
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JP2009026977A5 (enExample
Inventor
Hiroyuki Yuki
寛之 結城
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Canon Inc
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Canon Inc
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Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2007189042A priority Critical patent/JP2009026977A/ja
Publication of JP2009026977A publication Critical patent/JP2009026977A/ja
Publication of JP2009026977A5 publication Critical patent/JP2009026977A5/ja
Pending legal-status Critical Current

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  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2007189042A 2007-07-20 2007-07-20 投影光学系及びそれを有する露光装置 Pending JP2009026977A (ja)

Priority Applications (1)

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JP2007189042A JP2009026977A (ja) 2007-07-20 2007-07-20 投影光学系及びそれを有する露光装置

Applications Claiming Priority (1)

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JP2007189042A JP2009026977A (ja) 2007-07-20 2007-07-20 投影光学系及びそれを有する露光装置

Publications (2)

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JP2009026977A true JP2009026977A (ja) 2009-02-05
JP2009026977A5 JP2009026977A5 (enExample) 2010-09-02

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JP2007189042A Pending JP2009026977A (ja) 2007-07-20 2007-07-20 投影光学系及びそれを有する露光装置

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005286026A (ja) * 2004-03-29 2005-10-13 Canon Inc 露光装置
JP2006245590A (ja) * 2005-03-04 2006-09-14 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
WO2006121009A1 (ja) * 2005-05-12 2006-11-16 Nikon Corporation 投影光学系、露光装置、および露光方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005286026A (ja) * 2004-03-29 2005-10-13 Canon Inc 露光装置
JP2006245590A (ja) * 2005-03-04 2006-09-14 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
WO2006121009A1 (ja) * 2005-05-12 2006-11-16 Nikon Corporation 投影光学系、露光装置、および露光方法

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