JP2009013496A5 - - Google Patents
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- Publication number
- JP2009013496A5 JP2009013496A5 JP2008149496A JP2008149496A JP2009013496A5 JP 2009013496 A5 JP2009013496 A5 JP 2009013496A5 JP 2008149496 A JP2008149496 A JP 2008149496A JP 2008149496 A JP2008149496 A JP 2008149496A JP 2009013496 A5 JP2009013496 A5 JP 2009013496A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- layer
- film material
- thin
- metal film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 229920000642 polymer Polymers 0.000 claims description 61
- 239000000463 material Substances 0.000 claims description 50
- 239000002184 metal Substances 0.000 claims description 49
- 239000000203 mixture Substances 0.000 claims description 45
- 150000001875 compounds Chemical class 0.000 claims description 31
- 238000004519 manufacturing process Methods 0.000 claims description 29
- 229910021645 metal ion Inorganic materials 0.000 claims description 26
- 239000002923 metal particle Substances 0.000 claims description 24
- 239000007822 coupling agent Substances 0.000 claims description 21
- 238000010521 absorption reaction Methods 0.000 claims description 3
- 239000010408 film Substances 0.000 claims 24
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 claims 4
- -1 methacryloyl group Chemical group 0.000 claims 4
- 238000004132 cross linking Methods 0.000 claims 3
- 125000003700 epoxy group Chemical group 0.000 claims 2
- 125000000524 functional group Chemical group 0.000 claims 2
- 239000007870 radical polymerization initiator Substances 0.000 claims 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims 2
- 238000003776 cleavage reaction Methods 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 230000007017 scission Effects 0.000 claims 1
- 239000010409 thin film Substances 0.000 claims 1
- 230000001376 precipitating effect Effects 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000013528 metallic particle Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008149496A JP2009013496A (ja) | 2007-06-06 | 2008-06-06 | 薄層金属膜材料及びその製造方法 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007150825 | 2007-06-06 | ||
| JP2008149496A JP2009013496A (ja) | 2007-06-06 | 2008-06-06 | 薄層金属膜材料及びその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2009013496A JP2009013496A (ja) | 2009-01-22 |
| JP2009013496A5 true JP2009013496A5 (enrdf_load_stackoverflow) | 2011-09-29 |
Family
ID=40179578
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008149496A Ceased JP2009013496A (ja) | 2007-06-06 | 2008-06-06 | 薄層金属膜材料及びその製造方法 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP2009013496A (enrdf_load_stackoverflow) |
| KR (1) | KR20080107314A (enrdf_load_stackoverflow) |
| CN (1) | CN101319314B (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009098588A (ja) * | 2007-09-28 | 2009-05-07 | Fujifilm Corp | 感光性組成物、それを用いて得られる積層体、金属含有膜材料、その製造方法及び遮光材料 |
| CN117806387B (zh) * | 2024-02-29 | 2024-05-24 | 青岛英诺包装科技有限公司 | 一种基于数据处理的加工温度调控方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7270931B2 (en) * | 2003-10-06 | 2007-09-18 | International Business Machines Corporation | Silicon-containing compositions for spin-on ARC/hardmask materials |
| JP4291718B2 (ja) * | 2004-03-25 | 2009-07-08 | 富士フイルム株式会社 | 導電性パターン形成方法及び導電性パターン材料 |
| JP2006066180A (ja) * | 2004-08-26 | 2006-03-09 | Fuji Photo Film Co Ltd | 導電膜の製造方法及び導電膜 |
| KR101298940B1 (ko) * | 2005-08-23 | 2013-08-22 | 주식회사 동진쎄미켐 | 포토레지스트 조성물 및 이를 이용한 박막 트랜지스터기판의 제조방법 |
| JP2007131875A (ja) * | 2005-11-08 | 2007-05-31 | Fujifilm Corp | 金属膜形成方法及び金属パターン形成方法 |
-
2008
- 2008-06-05 KR KR1020080053304A patent/KR20080107314A/ko not_active Withdrawn
- 2008-06-06 CN CN200810110607XA patent/CN101319314B/zh not_active Expired - Fee Related
- 2008-06-06 JP JP2008149496A patent/JP2009013496A/ja not_active Ceased
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