JP2009010279A5 - - Google Patents

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Publication number
JP2009010279A5
JP2009010279A5 JP2007172226A JP2007172226A JP2009010279A5 JP 2009010279 A5 JP2009010279 A5 JP 2009010279A5 JP 2007172226 A JP2007172226 A JP 2007172226A JP 2007172226 A JP2007172226 A JP 2007172226A JP 2009010279 A5 JP2009010279 A5 JP 2009010279A5
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JP
Japan
Prior art keywords
gas input
gas
susceptor
symbols
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007172226A
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English (en)
Japanese (ja)
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JP2009010279A (ja
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Publication date
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Priority to JP2007172226A priority Critical patent/JP2009010279A/ja
Priority claimed from JP2007172226A external-priority patent/JP2009010279A/ja
Publication of JP2009010279A publication Critical patent/JP2009010279A/ja
Publication of JP2009010279A5 publication Critical patent/JP2009010279A5/ja
Pending legal-status Critical Current

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JP2007172226A 2007-06-29 2007-06-29 薄膜製造装置 Pending JP2009010279A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007172226A JP2009010279A (ja) 2007-06-29 2007-06-29 薄膜製造装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007172226A JP2009010279A (ja) 2007-06-29 2007-06-29 薄膜製造装置

Publications (2)

Publication Number Publication Date
JP2009010279A JP2009010279A (ja) 2009-01-15
JP2009010279A5 true JP2009010279A5 (https=) 2010-03-18

Family

ID=40325052

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007172226A Pending JP2009010279A (ja) 2007-06-29 2007-06-29 薄膜製造装置

Country Status (1)

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JP (1) JP2009010279A (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6040898B2 (ja) * 2013-09-09 2016-12-07 豊田合成株式会社 Ｉｉｉ 族窒化物半導体発光素子の製造方法および製造装置および基板のクリーニング方法
JP6152026B2 (ja) * 2013-09-24 2017-06-21 テルモ株式会社 コーティング装置およびステント製造方法
CN105970188A (zh) * 2016-07-11 2016-09-28 中山德华芯片技术有限公司 一种旋转圆盘式mocvd反应室的进气结构

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001044125A (ja) * 1999-07-29 2001-02-16 Applied Materials Inc エピタキシャル成長装置及び方法
JP4180948B2 (ja) * 2003-03-24 2008-11-12 東京エレクトロン株式会社 基板処理装置および基板処理方法、ガスノズル

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