JP2009004161A5 - - Google Patents

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Publication number
JP2009004161A5
JP2009004161A5 JP2007162528A JP2007162528A JP2009004161A5 JP 2009004161 A5 JP2009004161 A5 JP 2009004161A5 JP 2007162528 A JP2007162528 A JP 2007162528A JP 2007162528 A JP2007162528 A JP 2007162528A JP 2009004161 A5 JP2009004161 A5 JP 2009004161A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007162528A
Other languages
Japanese (ja)
Other versions
JP5156276B2 (ja
JP2009004161A (ja
Filing date
Publication date
Priority claimed from JP2007162528A external-priority patent/JP5156276B2/ja
Priority to JP2007162528A priority Critical patent/JP5156276B2/ja
Application filed filed Critical
Priority to TW097110481A priority patent/TWI435361B/zh
Priority to US12/103,354 priority patent/US9194826B2/en
Priority to KR1020080034830A priority patent/KR101549093B1/ko
Publication of JP2009004161A publication Critical patent/JP2009004161A/ja
Publication of JP2009004161A5 publication Critical patent/JP2009004161A5/ja
Priority to JP2013032082A priority patent/JP5719391B2/ja
Publication of JP5156276B2 publication Critical patent/JP5156276B2/ja
Application granted granted Critical
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2007162528A 2007-04-16 2007-06-20 試料表面上の異物除去方法及びこれに用いる荷電粒子線装置 Expired - Fee Related JP5156276B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2007162528A JP5156276B2 (ja) 2007-06-20 2007-06-20 試料表面上の異物除去方法及びこれに用いる荷電粒子線装置
TW097110481A TWI435361B (zh) 2007-04-16 2008-03-25 電子射線裝置及使用該電子射線裝置之試料觀察方法
US12/103,354 US9194826B2 (en) 2007-04-16 2008-04-15 Electron beam apparatus and sample observation method using the same
KR1020080034830A KR101549093B1 (ko) 2007-04-16 2008-04-15 전자선장치 및 이것을 이용한 시료관찰방법
JP2013032082A JP5719391B2 (ja) 2007-06-20 2013-02-21 電子線装置及びこれを用いた試料観察方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007162528A JP5156276B2 (ja) 2007-06-20 2007-06-20 試料表面上の異物除去方法及びこれに用いる荷電粒子線装置

Publications (3)

Publication Number Publication Date
JP2009004161A JP2009004161A (ja) 2009-01-08
JP2009004161A5 true JP2009004161A5 (zh) 2009-08-27
JP5156276B2 JP5156276B2 (ja) 2013-03-06

Family

ID=40320332

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2007162528A Expired - Fee Related JP5156276B2 (ja) 2007-04-16 2007-06-20 試料表面上の異物除去方法及びこれに用いる荷電粒子線装置
JP2013032082A Active JP5719391B2 (ja) 2007-06-20 2013-02-21 電子線装置及びこれを用いた試料観察方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2013032082A Active JP5719391B2 (ja) 2007-06-20 2013-02-21 電子線装置及びこれを用いた試料観察方法

Country Status (1)

Country Link
JP (2) JP5156276B2 (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101842101B1 (ko) 2010-08-03 2018-03-26 가부시키가이샤 에바라 세이사꾸쇼 이물질 부착 방지 기능을 구비한 전자선 검사 장치 및 방법
US9134261B2 (en) 2013-04-22 2015-09-15 Ebara Corporation Inspection apparatus
CN106769162B (zh) * 2017-02-20 2023-06-06 广西大学 一种透射电镜磁性样品预处理器
US10861666B1 (en) * 2020-01-30 2020-12-08 ICT Integrated Circuit Testing Gesellschaft für Halbletterprüftechnik mbH Method of operating a charged particle gun, charged particle gun, and charged particle beam device
US20230381791A1 (en) * 2020-09-24 2023-11-30 Creative Technology Corporation Dust collector and dust collection method

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6431339A (en) * 1987-07-27 1989-02-01 Nikon Corp Charged particle beam device
JPH07161598A (ja) * 1993-12-09 1995-06-23 Tel Varian Ltd 真空処理装置
JPH08298093A (ja) * 1995-04-27 1996-11-12 Topcon Corp 走査型電子顕微鏡及び走査型電子顕微鏡における荷電粒子検出方法
JP3452422B2 (ja) * 1995-05-26 2003-09-29 東京エレクトロン株式会社 真空処理装置
JP3071730B2 (ja) * 1997-06-25 2000-07-31 九州日本電気株式会社 イオン注入装置及びイオン注入方法
JP4239350B2 (ja) * 2000-03-13 2009-03-18 株式会社ニコン 荷電粒子ビーム装置
EP1296352A4 (en) * 2000-06-27 2007-04-18 Ebara Corp INVESTIGATION DEVICE FOR LOADED PARTICLE RAYS AND METHOD FOR PRODUCING A COMPONENT ELEVATED WITH THIS INSPECTION DEVICE
JP2004279163A (ja) * 2003-03-14 2004-10-07 Sony Corp 基板検査装置及びその基板検査方法
JP4248382B2 (ja) * 2003-12-04 2009-04-02 株式会社日立ハイテクノロジーズ 荷電粒子ビームによる検査方法および検査装置
JP2006156134A (ja) * 2004-11-30 2006-06-15 Hitachi Ltd 反射結像型電子顕微鏡
JP4679299B2 (ja) * 2005-08-18 2011-04-27 富士通セミコンダクター株式会社 検査方法、検査装置および半導体装置の製造方法

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