JP2008520091A5 - - Google Patents
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- JP2008520091A5 JP2008520091A5 JP2007540474A JP2007540474A JP2008520091A5 JP 2008520091 A5 JP2008520091 A5 JP 2008520091A5 JP 2007540474 A JP2007540474 A JP 2007540474A JP 2007540474 A JP2007540474 A JP 2007540474A JP 2008520091 A5 JP2008520091 A5 JP 2008520091A5
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- JP
- Japan
- Prior art keywords
- loss
- loss element
- matching network
- lost
- power
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 210000002381 Plasma Anatomy 0.000 description 1
Description
ここで、PFは整合回路網14の出力における電力であり、損失素子RMおよび給電素子26における損失素子R F およびプラズマを通って損失される。整合回路網14における
損失素子RMおよび給電素子26における損失素子RFを通って失われる電力は、以下の式によって規定される。
損失素子RMおよび給電素子26における損失素子RFを通って失われる電力は、以下の式によって規定される。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US62778404P | 2004-11-12 | 2004-11-12 | |
US60/627,784 | 2004-11-12 | ||
PCT/CH2005/000669 WO2006050632A2 (en) | 2004-11-12 | 2005-11-11 | Impedance matching of a capacitively coupled rf plasma reactor suitable for large area substrates |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2008520091A JP2008520091A (ja) | 2008-06-12 |
JP2008520091A5 true JP2008520091A5 (ja) | 2008-11-27 |
JP5086092B2 JP5086092B2 (ja) | 2012-11-28 |
Family
ID=36218432
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007540474A Expired - Fee Related JP5086092B2 (ja) | 2004-11-12 | 2005-11-11 | 大面積基板に好適な容量結合型rfプラズマ反応器のインピーダンス整合 |
Country Status (10)
Country | Link |
---|---|
US (1) | US20070252529A1 (ja) |
EP (1) | EP1812949B1 (ja) |
JP (1) | JP5086092B2 (ja) |
KR (1) | KR101107393B1 (ja) |
CN (1) | CN101057310B (ja) |
AT (1) | ATE473513T1 (ja) |
AU (1) | AU2005304253B8 (ja) |
DE (1) | DE602005022221D1 (ja) |
TW (1) | TW200625396A (ja) |
WO (1) | WO2006050632A2 (ja) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100915613B1 (ko) * | 2007-06-26 | 2009-09-07 | 삼성전자주식회사 | 펄스 플라즈마 매칭시스템 및 그 방법 |
TWI440405B (zh) * | 2007-10-22 | 2014-06-01 | New Power Plasma Co Ltd | 電容式耦合電漿反應器 |
KR100979186B1 (ko) | 2007-10-22 | 2010-08-31 | 다이나믹솔라디자인 주식회사 | 용량 결합 플라즈마 반응기 |
US8734664B2 (en) | 2008-07-23 | 2014-05-27 | Applied Materials, Inc. | Method of differential counter electrode tuning in an RF plasma reactor |
US20100018648A1 (en) * | 2008-07-23 | 2010-01-28 | Applied Marterials, Inc. | Workpiece support for a plasma reactor with controlled apportionment of rf power to a process kit ring |
US8578879B2 (en) * | 2009-07-29 | 2013-11-12 | Applied Materials, Inc. | Apparatus for VHF impedance match tuning |
SG178288A1 (en) * | 2009-08-31 | 2012-03-29 | Lam Res Corp | A multi-peripheral ring arrangement for performing plasma confinement |
CN102487572B (zh) * | 2010-12-02 | 2015-06-24 | 理想能源设备(上海)有限公司 | 等离子加工装置 |
TWI455172B (zh) | 2010-12-30 | 2014-10-01 | Semes Co Ltd | 基板處理設備、電漿阻抗匹配裝置及可變電容器 |
SI23611A (sl) | 2011-01-20 | 2012-07-31 | Institut@@quot@JoĹľef@Stefan@quot | Metoda in naprava za vzbujanje visokofrekvenčne plinske plazme |
CN102686004B (zh) * | 2011-03-17 | 2015-05-13 | 中微半导体设备(上海)有限公司 | 用于等离子体发生器的可控制谐波的射频系统 |
US8932429B2 (en) * | 2012-02-23 | 2015-01-13 | Lam Research Corporation | Electronic knob for tuning radial etch non-uniformity at VHF frequencies |
CN102695353B (zh) * | 2012-05-31 | 2015-08-12 | 浙江工商大学 | 利用高电压产生气体等离子放电基本单元及反应器 |
CN104685982B (zh) | 2012-08-27 | 2019-07-30 | 伟巴斯特充电系统公司 | 便携式电动交通工具供电设备 |
CN103794895B (zh) * | 2012-10-30 | 2016-02-24 | 新奥光伏能源有限公司 | 一种射频电源接入器 |
CN103388134B (zh) * | 2013-07-22 | 2016-05-18 | 北京工业大学 | 容性耦合等离子体增强化学气相沉积制备厚度均匀薄膜的方法 |
CN103454489B (zh) * | 2013-09-12 | 2016-09-21 | 清华大学 | 匹配网络的损耗功率标定方法及系统 |
US20180175819A1 (en) * | 2016-12-16 | 2018-06-21 | Lam Research Corporation | Systems and methods for providing shunt cancellation of parasitic components in a plasma reactor |
US10536130B2 (en) | 2017-08-29 | 2020-01-14 | Mks Instruments, Inc. | Balancing RF circuit and control for a cross-coupled SIMO distribution network |
US11107661B2 (en) * | 2019-07-09 | 2021-08-31 | COMET Technologies USA, Inc. | Hybrid matching network topology |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3143594A (en) * | 1960-07-13 | 1964-08-04 | Samuel E Derby | Demountable multiple stage ultra-high vacuum system |
US3471396A (en) * | 1967-04-10 | 1969-10-07 | Ibm | R.f. cathodic sputtering apparatus having an electrically conductive housing |
DE2939167A1 (de) * | 1979-08-21 | 1981-04-02 | Coulter Systems Corp., Bedford, Mass. | Vorrichtung und verfahren zur leistungszufuehrung an eine von dem entladungsplasma einer zerstaeubungsvorrichtung gebildeten last |
JPH0354825A (ja) * | 1989-07-21 | 1991-03-08 | Tokyo Electron Ltd | プラズマ処理装置 |
JPH0685542A (ja) * | 1992-09-03 | 1994-03-25 | Hitachi Metals Ltd | 周波数可変マイクロ波発振器 |
US5981899A (en) * | 1997-01-17 | 1999-11-09 | Balzers Aktiengesellschaft | Capacitively coupled RF-plasma reactor |
JP2961103B1 (ja) * | 1998-04-28 | 1999-10-12 | 三菱重工業株式会社 | プラズマ化学蒸着装置 |
US6395095B1 (en) * | 1999-06-15 | 2002-05-28 | Tokyo Electron Limited | Process apparatus and method for improved plasma processing of a substrate |
JP2002316040A (ja) * | 2001-04-24 | 2002-10-29 | Matsushita Electric Ind Co Ltd | プラズマ処理方法及び装置 |
US6706138B2 (en) * | 2001-08-16 | 2004-03-16 | Applied Materials Inc. | Adjustable dual frequency voltage dividing plasma reactor |
TW200300650A (en) * | 2001-11-27 | 2003-06-01 | Alps Electric Co Ltd | Plasma processing apparatus |
JP4216054B2 (ja) * | 2001-11-27 | 2009-01-28 | アルプス電気株式会社 | プラズマ処理装置及びその運転方法 |
JP4370789B2 (ja) * | 2002-07-12 | 2009-11-25 | 東京エレクトロン株式会社 | プラズマ処理装置及び可変インピーダンス手段の校正方法 |
-
2005
- 2005-11-11 DE DE602005022221T patent/DE602005022221D1/de active Active
- 2005-11-11 CN CN2005800386843A patent/CN101057310B/zh not_active Expired - Fee Related
- 2005-11-11 EP EP05801054A patent/EP1812949B1/en not_active Not-in-force
- 2005-11-11 AU AU2005304253A patent/AU2005304253B8/en not_active Ceased
- 2005-11-11 AT AT05801054T patent/ATE473513T1/de not_active IP Right Cessation
- 2005-11-11 JP JP2007540474A patent/JP5086092B2/ja not_active Expired - Fee Related
- 2005-11-11 US US11/719,115 patent/US20070252529A1/en not_active Abandoned
- 2005-11-11 KR KR1020077007856A patent/KR101107393B1/ko not_active IP Right Cessation
- 2005-11-11 WO PCT/CH2005/000669 patent/WO2006050632A2/en active Application Filing
- 2005-11-14 TW TW094139874A patent/TW200625396A/zh unknown
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