JP2008299178A5 - - Google Patents

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Publication number
JP2008299178A5
JP2008299178A5 JP2007146714A JP2007146714A JP2008299178A5 JP 2008299178 A5 JP2008299178 A5 JP 2008299178A5 JP 2007146714 A JP2007146714 A JP 2007146714A JP 2007146714 A JP2007146714 A JP 2007146714A JP 2008299178 A5 JP2008299178 A5 JP 2008299178A5
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JP
Japan
Prior art keywords
film
polarizing element
substrate
metal
layer
Prior art date
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Application number
JP2007146714A
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English (en)
Japanese (ja)
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JP2008299178A (ja
JP5045249B2 (ja
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Priority to JP2007146714A priority Critical patent/JP5045249B2/ja
Priority claimed from JP2007146714A external-priority patent/JP5045249B2/ja
Publication of JP2008299178A publication Critical patent/JP2008299178A/ja
Publication of JP2008299178A5 publication Critical patent/JP2008299178A5/ja
Application granted granted Critical
Publication of JP5045249B2 publication Critical patent/JP5045249B2/ja
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JP2007146714A 2007-06-01 2007-06-01 偏光素子の製造方法 Active JP5045249B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007146714A JP5045249B2 (ja) 2007-06-01 2007-06-01 偏光素子の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007146714A JP5045249B2 (ja) 2007-06-01 2007-06-01 偏光素子の製造方法

Publications (3)

Publication Number Publication Date
JP2008299178A JP2008299178A (ja) 2008-12-11
JP2008299178A5 true JP2008299178A5 (ko) 2010-07-01
JP5045249B2 JP5045249B2 (ja) 2012-10-10

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ID=40172732

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007146714A Active JP5045249B2 (ja) 2007-06-01 2007-06-01 偏光素子の製造方法

Country Status (1)

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JP (1) JP5045249B2 (ko)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010210706A (ja) * 2009-03-06 2010-09-24 Seiko Epson Corp 偏光素子
JP5552888B2 (ja) * 2009-10-30 2014-07-16 セイコーエプソン株式会社 偏光素子、偏光素子の製造方法、液晶装置および電子機器
JP5929881B2 (ja) * 2013-12-11 2016-06-08 ウシオ電機株式会社 グリッド偏光素子
JP5929886B2 (ja) * 2013-12-24 2016-06-08 ウシオ電機株式会社 グリッド偏光素子
KR101729683B1 (ko) * 2015-09-16 2017-04-25 한국기계연구원 선격자 편광자의 제조 방법
EP3410215B1 (en) 2016-01-27 2020-06-17 LG Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby
JP6690814B2 (ja) 2016-01-27 2020-04-28 エルジー・ケム・リミテッド フィルムマスク、その製造方法およびこれを用いたパターンの形成方法
US11029596B2 (en) 2016-01-27 2021-06-08 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby
CN110023799A (zh) * 2016-12-06 2019-07-16 Ｓｃｉｖａｘ株式会社 光学部件及使用该光学部件的液晶面板及它们的制造方法
JP6410906B1 (ja) 2017-09-26 2018-10-24 デクセリアルズ株式会社 偏光素子及び光学機器
CN115295574A (zh) * 2022-08-31 2022-11-04 厦门天马微电子有限公司 发光面板和显示装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05289027A (ja) * 1991-06-14 1993-11-05 Tdk Corp 偏光子、偏光子付光学素子及びそれらの製造方法
CN100592112C (zh) * 2002-02-12 2010-02-24 奥尔利康贸易股份公司（特吕巴赫） 包括亚微米空心空间的部件
JP2007010712A (ja) * 2005-06-28 2007-01-18 Seiko Epson Corp 光学素子の製造方法、投射型表示装置
JP4497041B2 (ja) * 2005-07-08 2010-07-07 セイコーエプソン株式会社 ワイヤーグリッド偏光子の製造方法
JP2007033558A (ja) * 2005-07-22 2007-02-08 Nippon Zeon Co Ltd グリッド偏光子及びその製法

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