JP2008299178A5 - - Google Patents
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- Publication number
- JP2008299178A5 JP2008299178A5 JP2007146714A JP2007146714A JP2008299178A5 JP 2008299178 A5 JP2008299178 A5 JP 2008299178A5 JP 2007146714 A JP2007146714 A JP 2007146714A JP 2007146714 A JP2007146714 A JP 2007146714A JP 2008299178 A5 JP2008299178 A5 JP 2008299178A5
- Authority
- JP
- Japan
- Prior art keywords
- film
- polarizing element
- substrate
- metal
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002184 metal Substances 0.000 claims 21
- 229910052751 metal Inorganic materials 0.000 claims 21
- 239000000758 substrate Substances 0.000 claims 10
- 150000002739 metals Chemical class 0.000 claims 9
- 238000005530 etching Methods 0.000 claims 7
- 239000010410 layer Substances 0.000 claims 7
- 239000004973 liquid crystal related substance Substances 0.000 claims 5
- 238000004519 manufacturing process Methods 0.000 claims 5
- 239000011247 coating layer Substances 0.000 claims 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 2
- 239000010931 gold Substances 0.000 claims 2
- 229910052737 gold Inorganic materials 0.000 claims 2
- 238000000059 patterning Methods 0.000 claims 2
- 238000006243 chemical reaction Methods 0.000 claims 1
- 230000008021 deposition Effects 0.000 claims 1
- 238000001312 dry etching Methods 0.000 claims 1
- 229910010272 inorganic material Inorganic materials 0.000 claims 1
- 239000011147 inorganic material Substances 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007146714A JP5045249B2 (ja) | 2007-06-01 | 2007-06-01 | 偏光素子の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007146714A JP5045249B2 (ja) | 2007-06-01 | 2007-06-01 | 偏光素子の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008299178A JP2008299178A (ja) | 2008-12-11 |
| JP2008299178A5 true JP2008299178A5 (enrdf_load_stackoverflow) | 2010-07-01 |
| JP5045249B2 JP5045249B2 (ja) | 2012-10-10 |
Family
ID=40172732
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007146714A Active JP5045249B2 (ja) | 2007-06-01 | 2007-06-01 | 偏光素子の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5045249B2 (enrdf_load_stackoverflow) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010210706A (ja) * | 2009-03-06 | 2010-09-24 | Seiko Epson Corp | 偏光素子 |
| JP5552888B2 (ja) * | 2009-10-30 | 2014-07-16 | セイコーエプソン株式会社 | 偏光素子、偏光素子の製造方法、液晶装置および電子機器 |
| JP5929881B2 (ja) * | 2013-12-11 | 2016-06-08 | ウシオ電機株式会社 | グリッド偏光素子 |
| JP5929886B2 (ja) * | 2013-12-24 | 2016-06-08 | ウシオ電機株式会社 | グリッド偏光素子 |
| KR101729683B1 (ko) | 2015-09-16 | 2017-04-25 | 한국기계연구원 | 선격자 편광자의 제조 방법 |
| WO2017131498A1 (ko) | 2016-01-27 | 2017-08-03 | 주식회사 엘지화학 | 필름 마스크, 이의 제조방법, 이를 이용한 패턴 형성 방법 및 이를 이용하여 형성된 패턴 |
| JP6690814B2 (ja) | 2016-01-27 | 2020-04-28 | エルジー・ケム・リミテッド | フィルムマスク、その製造方法およびこれを用いたパターンの形成方法 |
| CN108351604B (zh) | 2016-01-27 | 2020-10-30 | 株式会社Lg化学 | 膜掩模、其制备方法、使用膜掩模的图案形成方法和由膜掩模形成的图案 |
| US20200089048A1 (en) * | 2016-12-06 | 2020-03-19 | Scivax Corporation | Optical member, liquid crystal panel using the optical member, and manufacturing methods therefor |
| JP6410906B1 (ja) | 2017-09-26 | 2018-10-24 | デクセリアルズ株式会社 | 偏光素子及び光学機器 |
| CN115295574B (zh) * | 2022-08-31 | 2024-09-27 | 厦门天马微电子有限公司 | 发光面板和显示装置 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05289027A (ja) * | 1991-06-14 | 1993-11-05 | Tdk Corp | 偏光子、偏光子付光学素子及びそれらの製造方法 |
| AU2003202404A1 (en) * | 2002-02-12 | 2003-09-04 | Unaxis Balzers Limited | Optical component comprising submicron hollow spaces |
| JP2007010712A (ja) * | 2005-06-28 | 2007-01-18 | Seiko Epson Corp | 光学素子の製造方法、投射型表示装置 |
| JP4497041B2 (ja) * | 2005-07-08 | 2010-07-07 | セイコーエプソン株式会社 | ワイヤーグリッド偏光子の製造方法 |
| JP2007033558A (ja) * | 2005-07-22 | 2007-02-08 | Nippon Zeon Co Ltd | グリッド偏光子及びその製法 |
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2007
- 2007-06-01 JP JP2007146714A patent/JP5045249B2/ja active Active