JP2008290331A - Method for production of prepreg - Google Patents

Method for production of prepreg Download PDF

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JP2008290331A
JP2008290331A JP2007137753A JP2007137753A JP2008290331A JP 2008290331 A JP2008290331 A JP 2008290331A JP 2007137753 A JP2007137753 A JP 2007137753A JP 2007137753 A JP2007137753 A JP 2007137753A JP 2008290331 A JP2008290331 A JP 2008290331A
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prepreg
base material
substrate
resin varnish
thickness
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JP5234570B2 (en
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Yasuyuki Kimura
康之 木村
Yoshinobu Fujimura
吉信 藤村
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Asahi Kasei Electronics Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a prepreg production method capable of preventing the thinning of the surface resin layer of a prepreg on the side to be roughened when roughening the organic insulation layer of hardened prepreg using an oxidant in a production process of a multilayer wiring board by a buildup method. <P>SOLUTION: The prepreg production method includes an impregnation process of impregnating a traveling long substrate 1 with a resin varnish 2, a regulation process of regulating the thickness of the impregnated resin varnish, and a drying process of heating and drying the resin varnish. The method is characterized in that when the substrate passes through a thickness regulation means in its process, the substrate is traveled in such a state that the traveling direction of the substrate just after passing through the thickness regulation means is different from that immediately before passing. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は多層プリント配線板などの製造に用いられるプリプレグの製造方法に関するものである。   The present invention relates to a method for producing a prepreg used for producing a multilayer printed wiring board or the like.

近年、内層回路板の導体層上に有機絶縁層と導体層とを交互に積み上げていくビルドアップ方式の多層配線板の製造技術が注目されている。例えば、回路形成された内層回路板にエポキシ樹脂を塗布、加熱硬化により有機絶縁層を形成した後、粗化剤により該有機絶縁層の表面に凹凸の粗化面を形成し、導体層をメッキにより形成する多層プリント配線板の製造方法が提案されている(例えば、特許文献1参照)。しかしながら、ガラスクロス等の補強用基材を含まない樹脂のみを有機絶縁層とする場合は剛性に乏しいため、軽量化の要求に応えた薄物配線板においては、機械的強度に劣るという欠点があった。
そこで、ガラスクロスまたは有機繊維不織布からなる基材と樹脂からなるプリプレグを用いたビルドアップ方式の多層配線板の製造技術が提案されている(特許文献2参照)。当該技術においては、パターン化された内層回路基板に加圧、加熱条件下でプリプレグを積層し一体化させ有機絶縁層を形成した後、酸化材により該有機絶縁層の表面を粗化し、その粗化面に導体層をメッキにより形成する方法を取っている。
In recent years, attention has been paid to a build-up type multilayer wiring board manufacturing technique in which an organic insulating layer and a conductor layer are alternately stacked on a conductor layer of an inner circuit board. For example, an epoxy resin is applied to a circuit-formed inner layer circuit board, an organic insulating layer is formed by heat curing, a roughened surface is formed on the surface of the organic insulating layer with a roughening agent, and a conductive layer is plated Has been proposed (see, for example, Patent Document 1). However, when only the resin that does not contain a reinforcing substrate such as glass cloth is used as the organic insulating layer, the rigidity is poor, and the thin wiring board that meets the demand for weight reduction has the disadvantage of poor mechanical strength. It was.
Thus, a build-up type multilayer wiring board manufacturing technique using a base material made of glass cloth or organic fiber nonwoven fabric and a prepreg made of resin has been proposed (see Patent Document 2). In this technique, after a prepreg is laminated and integrated on a patterned inner layer circuit board under pressure and heating conditions to form an organic insulating layer, the surface of the organic insulating layer is roughened with an oxidizing material, A method of forming a conductor layer on the conversion surface by plating is employed.

一方、現在知られているプリプレグの製造方法としては、バッチ式製法と連続式製法との2種類がある。前者は、必要な大きさに切断した繊維基材に樹脂ワニスを含浸させ加熱乾燥を行う方法であるのに対し、後者は、走行する長尺状の繊維基材に樹脂ワニスを含浸させ加熱乾燥を行った後必要な大きさに切断する方法であり(例えば、特許文献3参照)、大量生産には後者が好ましいと考えられる。
ところでプリプレグの表面には基材を含まない樹脂のみからなる薄層(以下、「表面樹脂層」ともいう。)を設けることが信頼性上好ましいため、プリプレグの製造方法においては、基材に含浸させる樹脂ワニスの量を制御する必要がある。このためには通常、基材に過剰量の樹脂ワニスを一旦含浸させた後、一定の幅を有するスリットまたはロール間を通すことによって余分な樹脂ワニスを掻き落とすことが行われる。その結果、加熱乾燥後のプリプレグの表面樹脂層は、基材の裏表でほぼ同一の厚さの状態で作成される。具体的には、導体パターンをエッチング法で作成するプリント配線板に使用するプリプレグの場合は、表面裏面ともに厚さは0.002〜0.015mm程度であり、導体パターンをメッキ法で作成するプリント配線板に使用するプリプレグの場合はより厚いのが通常である。
On the other hand, there are two types of prepreg production methods that are currently known: a batch production method and a continuous production method. The former is a method of impregnating a resin substrate with a resin base varnish cut to the required size and heat drying, whereas the latter is a method of impregnating a long fiber substrate traveling with resin varnish and heat drying. (See, for example, Patent Document 3), and the latter is considered preferable for mass production.
By the way, since it is preferable in terms of reliability to provide a thin layer (hereinafter, also referred to as “surface resin layer”) composed only of a resin not containing a base material on the surface of the prepreg, the base material is impregnated in the prepreg manufacturing method. It is necessary to control the amount of resin varnish. For this purpose, usually, an excessive amount of resin varnish is once impregnated into the substrate, and then the excess resin varnish is scraped off by passing between slits or rolls having a certain width. As a result, the surface resin layer of the prepreg after heat drying is formed in a state of almost the same thickness on the front and back of the substrate. Specifically, in the case of a prepreg used for a printed wiring board in which a conductor pattern is created by an etching method, the thickness of both the front and back surfaces is about 0.002 to 0.015 mm, and the conductor pattern is created by a plating method. In the case of a prepreg used for a wiring board, it is usually thicker.

特開平7−304932号公報JP-A-7-304932 特開2001−181375号公報JP 2001-181375 A 特開平9−87401号公報Japanese Patent Laid-Open No. 9-87401

ビルドアップ方式の多層配線板の製造工程において、プリプレグを硬化させた有機絶縁層を酸化材にて粗化する場合には、該プリプレグの粗化する側の表面樹脂層の厚みが2μm以上薄くなる。従って、従来のプリプレグを使用する場合は、粗化後の表面樹脂層が薄くなりすぎて信頼性に悪影響を及ぼさないように、表面樹脂層の厚いプリプレグを使用する必要があった。本発明はこの問題点を解決する方法を提供することを目的とするものである。   In the manufacturing process of the build-up type multilayer wiring board, when the organic insulating layer obtained by curing the prepreg is roughened with an oxidizing material, the thickness of the surface resin layer on the roughening side of the prepreg becomes 2 μm or thinner. . Therefore, when a conventional prepreg is used, it is necessary to use a prepreg having a thick surface resin layer so that the surface resin layer after roughening becomes too thin to adversely affect reliability. The present invention aims to provide a method for solving this problem.

本発明者らは表面樹脂層の厚さが表と裏とで2μm以上異なるプリプレグを製造し、該プリプレグの表面樹脂層の厚い側を粗化する側とすることで上記問題点を解決することが可能と考え、裏表で表面樹脂層の厚さが異なるプリプレグを製造する方法を検討した結果、本発明をなすに至った。
すなわち、本発明は、
1.走行する長尺状の基材に樹脂ワニスを含浸させる含浸工程、基材に含浸させた樹脂ワニスの量を調整する調整工程、樹脂ワニスを加熱乾燥する乾燥工程を含むプリプレグの製造方法であって、調整工程において基材が厚さ調整手段を通過するに際し、該厚さ調整手段を通過した直後の該基材の進行方向が該厚さ調整手段を通過する直前の該基材の進行方向と異なる状態で基材を走行させることを特徴とするプリプレグの製造方法、
The present inventors solve the above-mentioned problems by manufacturing prepregs having a surface resin layer thickness of 2 μm or more different between the front and back surfaces, and setting the thick side of the surface resin layer of the prepreg to the roughening side. As a result of studying a method for producing prepregs having different surface resin layer thicknesses on both sides, the present invention has been made.
That is, the present invention
1. A method for producing a prepreg including an impregnation step of impregnating a resinous varnish into a traveling long base material, an adjustment step of adjusting the amount of the resin varnish impregnated in the base material, and a drying step of heating and drying the resin varnish. When the substrate passes through the thickness adjusting means in the adjusting step, the traveling direction of the substrate immediately after passing through the thickness adjusting means is the traveling direction of the substrate immediately before passing through the thickness adjusting means. A method for producing a prepreg characterized by running a substrate in different states,

2.厚さ調整手段を通過した直後の基材の進行方向と該厚さ調整手段を通過する直前の基材の進行方向とのなす角度(A)が0.5〜10度であることを特徴とする1.のプリプレグの製造方法、
3.乾燥工程後のプリプレグの片面又は両面に支持ベースフィルム又は金属箔を積層する積層工程を有することを特徴とする1.または2.に記載のプリプレグの製造方法、
4.基材がガラスクロスであることを特徴とする1.〜3.のいずれかに記載のプリプレグの製造方法、
5.ガラスクロスの厚さが0.010〜0.050mmであることを特徴とする4.に記載のプリプレグの製造方法、に関する。
2. The angle (A) between the traveling direction of the base material immediately after passing through the thickness adjusting means and the traveling direction of the base material immediately before passing through the thickness adjusting means is 0.5 to 10 degrees. 1. Prepreg manufacturing method,
3. 1. It has a lamination process which laminates a support base film or metal foil on one side or both sides of a prepreg after a drying process. Or 2. A method for producing the prepreg according to claim 1,
4). 1. The substrate is a glass cloth. ~ 3. A method for producing the prepreg according to any one of
5. The glass cloth has a thickness of 0.010 to 0.050 mm. The manufacturing method of the prepreg as described in 2. above.

本発明のプリプレグの製造方法は、裏表で表面樹脂層の厚さが異なるプリプレグを製造可能とする。   The method for producing a prepreg of the present invention makes it possible to produce prepregs having different surface resin layers on the front and back sides.

以下本発明の好ましい実施形態を説明する。
本発明で使用される基材としては、従来からプリプレグの基材として用いられる任意のものを使用することができる。例えば、ガラスクロスやガラス不織布などのガラス繊維基材、ポリエステル繊維やアラミド繊維、液晶ポリマーなどの織布や不織布で形成される有機繊維基材、または紙基材が好ましい。また、長尺状の基材とは、幅に比べて長さが長い基材を意味し、取扱い上の理由で通常はロール状に巻かれた形で供給される。
特に基材としてガラスクロスを使用する際には、厚さが0.010〜0.050mmであるものがビルドアップ方式の多層配線板に適するため好ましい。また、ガラスクロスを構成する糸のフィラメント径が3〜5μmと小さく、バスケットホールの少ない厚さ0.010〜0.030mmのガラスクロスを使用すればレーザ加工性に優れておりより好ましい。具体的には旭化成エレクトロニクス株式会社製商品名1027、1037、1067等のガラスクロスが適している。
Hereinafter, preferred embodiments of the present invention will be described.
As a base material used by this invention, the arbitrary things conventionally used as a base material of a prepreg can be used. For example, a glass fiber substrate such as glass cloth or glass nonwoven fabric, an organic fiber substrate formed of woven fabric or nonwoven fabric such as polyester fiber or aramid fiber, liquid crystal polymer, or paper substrate is preferable. In addition, the long base means a base having a longer length than the width, and is usually supplied in a roll form for handling reasons.
In particular, when glass cloth is used as the substrate, one having a thickness of 0.010 to 0.050 mm is preferable because it is suitable for a build-up type multilayer wiring board. Further, it is more preferable to use a glass cloth having a small filament hole diameter of 3 to 5 μm and a thickness of 0.010 to 0.030 mm with a small basket hole, since the laser cloth is excellent. Specifically, glass cloth such as trade names 1027, 1037, and 1067 manufactured by Asahi Kasei Electronics Corporation is suitable.

本発明で使用される樹脂ワニスは、加熱により軟化し、フィルム形成性能があり、高温熱硬化により耐熱性、電気特性などの絶縁材料に必要な特性を満たす樹脂を含有する組成物であって、必要に応じて溶剤により含浸に適切な粘度に調整されたものであれば特に限定されない。プリプレグの表面樹脂層の厚さはラミネートされる内層回路基板の導体厚さ以上で、導体厚さ+(10〜120μm)以下の範囲であるのが一般的であり、且つ基材厚さ+(10〜120μm)以下の範囲にあるのが好ましい。
上記樹脂としては、エポキシ樹脂系、フェノール樹脂系、ポリイミド樹脂系、ポリアミドイミド樹脂系、ポリシアネート樹脂系、ポリフェニレンエーテル樹脂系、不飽和ポリエステル樹脂系の単独樹脂、並びに該樹脂の変成物、または混合物に代表される熱硬化性樹脂を用いることができる。樹脂ワニス中には、該熱硬化性樹脂を必須成分として含有し、
必要に応じてその熱硬化性樹脂の硬化剤、硬化促進剤、及び無機充填材からなる群から選択される少なくとも1種以上の任意成分を含有することができる。
The resin varnish used in the present invention is a composition containing a resin that softens by heating, has a film forming performance, and satisfies the characteristics required for an insulating material such as heat resistance and electrical characteristics by high-temperature thermosetting, The viscosity is not particularly limited as long as it is adjusted to a viscosity suitable for impregnation with a solvent as required. The thickness of the surface resin layer of the prepreg is generally not less than the conductor thickness of the inner circuit board to be laminated and not more than the conductor thickness + (10 to 120 μm), and the substrate thickness + ( 10 to 120 μm) or less is preferable.
Examples of the resin include an epoxy resin, a phenol resin, a polyimide resin, a polyamideimide resin, a polycyanate resin, a polyphenylene ether resin, an unsaturated polyester resin, a single resin, and a modified product or a mixture of the resin The thermosetting resin represented by can be used. The resin varnish contains the thermosetting resin as an essential component,
If necessary, the thermosetting resin can contain at least one optional component selected from the group consisting of a curing agent, a curing accelerator, and an inorganic filler.

また、上記溶剤としては、メチルエチルケトン、アセトン、プロピレングリコールモノメチルエーテル、メチルセロソルブ、キシレン、トルエン、シクロヘキサノン、またはジメチルホルムアミドなど従来から樹脂ワニスの溶剤として用いられている任意のものを使用することができる。なお、樹脂ワニスは溶剤を含有していても良いが、含有溶剤量が少ないと、作業環境や安全性等が向上することから、樹脂によっては無溶剤での適応も可能である。
本発明のプリプレグの製造方法は、走行する長尺状の基材に樹脂ワニスを含浸させる含浸工程、基材に含浸させた樹脂ワニスの量を調整する調整工程、樹脂ワニスを加熱乾燥する乾燥工程を含む。
In addition, as the solvent, any solvent conventionally used as a resin varnish solvent such as methyl ethyl ketone, acetone, propylene glycol monomethyl ether, methyl cellosolve, xylene, toluene, cyclohexanone, or dimethylformamide can be used. The resin varnish may contain a solvent, but if the amount of the solvent is small, the working environment, safety, and the like are improved, and depending on the resin, application without solvent is possible.
The method for producing a prepreg of the present invention includes an impregnation step of impregnating a running long base material with a resin varnish, an adjustment step of adjusting the amount of the resin varnish impregnated into the base material, and a drying step of heating and drying the resin varnish. including.

含浸工程は、走行する長尺状の基材が樹脂ワニスバスに貯められた樹脂ワニスの中を通過することによって、樹脂ワニスを含浸させた基材(以下、「含浸基材」ともいう。)とする工程である。ここで、樹脂ワニス(無溶媒樹脂ワニスも含む)中の固形分(樹脂ワニスの溶剤以外の成分を総称していう。)は30〜100%の間で±5%にコントロールされ、樹脂ワニスの温度は10〜80℃の間で±5℃にコントロールされ、樹脂ワニスの粘度は10〜3000Pa・sの間で±100Pa・sにコントロールされるのが好ましい。
調整工程は、走行する長尺状の含浸基材が厚さ調整手段を通過することによって、樹脂ワニスを過剰に含浸させた含浸基材から余分な樹脂ワニスを掻き落とす工程である。該厚さ調整手段としては、例えば、一定幅のスリット、並びに間隔調整の可能な一対の回転ロールまたは一対のナイフロールがあげられる。材質は、変形しにくい硬質の金属であり、好ましくは信頼性を考慮した錆等の劣化の生じにくいもの、たとえば硬質クロムメッキしたステンレス鋼が好ましい。ロールの大きさはφ50〜150mmの寸法を有するものが好ましい。
In the impregnation step, the traveling long base material passes through the resin varnish stored in the resin varnish bath, thereby impregnating the resin varnish (hereinafter also referred to as “impregnated base material”). It is a process to do. Here, the solid content in the resin varnish (including solvent-free resin varnish) (generally referred to as components other than the solvent of the resin varnish) is controlled to ± 5% between 30% and 100%, and the temperature of the resin varnish Is controlled to ± 5 ° C. between 10 and 80 ° C., and the viscosity of the resin varnish is preferably controlled to ± 100 Pa · s between 10 and 3000 Pa · s.
The adjustment step is a step of scraping off excess resin varnish from the impregnated substrate that has been excessively impregnated with the resin varnish when the traveling long impregnated substrate passes through the thickness adjusting means. Examples of the thickness adjusting means include a slit having a constant width and a pair of rotating rolls or a pair of knife rolls capable of adjusting the interval. The material is a hard metal that is not easily deformed, and is preferably a material that is less susceptible to deterioration such as rust in consideration of reliability, such as stainless steel plated with hard chrome. The roll preferably has a diameter of 50 to 150 mm.

本発明の製造方法においては、調整工程において、上記厚さ調整手段を通過した直後の該基材の進行方向が該厚さ調整手段を通過する直前の該基材の進行方向と異なる状態で基材を走行させることにより、基材の両面における樹脂ワニスを掻き落とす量に差を設けることを特徴としている。例えば、厚さ調整手段を通過した直後の基材の進行方向を鉛直方向とする場合は、該厚さ調整手段を通過する直前の基材の進行方向は、鉛直方向から送り出し側に、又は巻き取り側に数度の角度を持たせることによって含浸基材の両面の表面樹脂層の厚さに差をもたせることができる。厚さ調整手段を通過した直後の基材の進行方向と直前の進行方向とのなす角は0.5〜10度であることが好ましく、1度〜3度であることがより好ましい。該角を10度より高くすると基材が極端に、厚み調整手段に接触し、基材の切断や構成繊維の毛羽等の問題が発生する可能性がある。また、該角を0.5度より小さくすると、ほぼ垂直に基材が厚み調整手段に入り、目的とする両面の表面樹脂層の厚さに差をもたせたプリプレグを作成することができない。   In the manufacturing method of the present invention, in the adjusting step, the base material travels immediately after passing through the thickness adjusting means in a state different from the base material travel direction immediately before passing through the thickness adjusting means. By running the material, a difference is provided in the amount of scraping off the resin varnish on both sides of the base material. For example, when the traveling direction of the base material immediately after passing through the thickness adjusting means is the vertical direction, the traveling direction of the base material immediately before passing through the thickness adjusting means is from the vertical direction to the delivery side or the winding side. By giving the take-off side an angle of several degrees, it is possible to make a difference in the thickness of the surface resin layers on both surfaces of the impregnated substrate. The angle formed by the traveling direction of the substrate immediately after passing through the thickness adjusting means and the immediately preceding traveling direction is preferably 0.5 to 10 degrees, and more preferably 1 to 3 degrees. If the angle is higher than 10 degrees, the base material may extremely come into contact with the thickness adjusting means, and problems such as cutting of the base material and fluff of constituent fibers may occur. If the angle is smaller than 0.5 degrees, the base material enters the thickness adjusting means almost vertically, and a prepreg having a difference in the thicknesses of the surface resin layers on both sides cannot be created.

乾燥工程は、走行する長尺状の含浸基材を加熱することによって、含浸した樹脂ワニスの溶媒の一部を除去するとともに熱硬化性樹脂を半硬化状態(Bステージ)にする工程である。加熱手段としては、例えば熱風乾燥機が使用でき、加熱条件は雰囲気の温度100〜200℃、時間 10〜100秒程度が好適である。
また、乾燥工程後のプリプレグの片面又は両面に支持ベースフィルム又は金属箔を積層する積層工程を有してもよい。この支持ベースフィルム又は金属箔は、プリプレグを上記回路基板上に加圧・加熱して積層する(その後粗面化してメッキされる)に当り、該プリプレグの取扱いを容易にし、且つゴミ等の付着を防止するためのもので、該積層操作の前に剥離されるもの(即ち、剥離性支持ベースフィルム又は金属箔)である。支持ベースフィルムとしては、ポリエチレン等のポリオレフィン、ポリエチレンテレフタレート、ポリ
カーボネート等の樹脂からなり、厚さが10〜150μm程度のフィルムであることが好ましい。金属箔としては、厚さが10〜150μmの銅箔、アルミ箔が好ましい。尚、支持フィルムにはコロナ処理、プラズマ処理の他、離形処理を施してあってもよい。支持ベースフィルムあるいは金属箔をプリプレグに積層する積層工程は、調整工程の後であれば乾燥工程の前であっても後であってもよい。また、支持ベースフィルム又は金属箔を積層したプリプレグはロールに巻き取って保管することが好ましいが、切断して枚葉形態として保管しても特に問題は無い。また、支持ベースフィルムが積層されたプリプレグにおいて、プリプレグの面積は支持ベースフィルムの面積と同じか又は支持ベースフィルムより小さい面積とすることが好ましい。
The drying process is a process of removing a part of the solvent of the impregnated resin varnish and heating the thermosetting resin to a semi-cured state (B stage) by heating the traveling long impregnated base material. As the heating means, for example, a hot-air dryer can be used, and the heating conditions are preferably an atmosphere temperature of 100 to 200 ° C. and a time of about 10 to 100 seconds.
Moreover, you may have the lamination process which laminates | stacks a support base film or metal foil on the single side | surface or both surfaces of the prepreg after a drying process. This supporting base film or metal foil facilitates handling of the prepreg and adhesion of dust etc. when the prepreg is pressed and heated on the circuit board to be laminated (then roughened and plated). It is a thing which peels before this lamination operation (namely, peelable support base film or metal foil). The supporting base film is preferably made of a polyolefin such as polyethylene, a resin such as polyethylene terephthalate or polycarbonate, and has a thickness of about 10 to 150 μm. The metal foil is preferably a copper foil or aluminum foil having a thickness of 10 to 150 μm. The support film may be subjected to a release treatment in addition to the corona treatment and the plasma treatment. The lamination step of laminating the support base film or the metal foil on the prepreg may be before or after the drying step as long as it is after the adjustment step. Further, the prepreg laminated with the support base film or the metal foil is preferably wound and stored on a roll, but there is no particular problem even if it is cut and stored as a single wafer. Moreover, in the prepreg in which the support base film is laminated, the area of the prepreg is preferably the same as the area of the support base film or smaller than the support base film.

次に、上述したプリプレグの製造方法を実施するのに好適な装置を説明する。図1に該装置の一例の断面図を示す。該装置は、上面が開口した樹脂ワニスバス(5)と、一対のロールからなる厚み調整手段(4)を具備する。樹脂ワニスバス(5)には樹脂ワニス(2)が貯留されてワニス溜まりが形成されている。またディップロール(3)は樹脂ワニス(2)に浸漬されるようにして樹脂ワニスバス(5)内に配置されており、図1に示す一定方向に回転駆動されている。
厚み調整手段の形状は、厚み調整が的確に実施されるものであれば特に限定されるものではないが、図2に示した断面が略円形のロールに断面略扇型の切欠部をロールの幅方向全長に亘って設けた形状の一対のナイフロールが好ましいものとしてあげられる。なお、形状より理解できるように、該ナイフロールは回転させずに固定スリットとして使用する。
Next, an apparatus suitable for carrying out the above-described prepreg manufacturing method will be described. FIG. 1 shows a cross-sectional view of an example of the apparatus. The apparatus includes a resin varnish bath (5) whose upper surface is open and a thickness adjusting means (4) comprising a pair of rolls. The resin varnish bath (5) stores the resin varnish (2) to form a varnish reservoir. The dip roll (3) is disposed in the resin varnish bath (5) so as to be immersed in the resin varnish (2), and is driven to rotate in a certain direction shown in FIG.
The shape of the thickness adjusting means is not particularly limited as long as the thickness adjustment is appropriately performed. However, a roll having a substantially circular cross section shown in FIG. A pair of knife rolls having a shape provided over the entire length in the width direction is preferable. As can be understood from the shape, the knife roll is used as a fixed slit without rotating.

また、厚み調整手段(4)は樹脂ワニスバス(5)に貯留された樹脂ワニス(2)の液面から1m以内の上方に配置することが好ましい。厚み調整手段(4)が樹脂ワニスバス(5)に貯留された樹脂ワニス(2)の液面から1mを超えて上方に配置されていると、含浸基材に含まれる樹脂ワニスが重力により流れ落ちることによる筋状の樹脂だれが発生しやすくなり、厚み調整手段(4)のギャップに樹脂ワニスが均一に埋まりきらないために、プリプレグの表面の平滑性が低く厚みが不均一になる恐れがある。
そして、このような装置を用いて長尺状の基材(1)に樹脂ワニス(2)を含浸するにあたっては、まず、ディップロール(3)の下側に接触するように基材(1)を樹脂ワニスバス(5)に貯留された樹脂ワニス(2)内に導入し、基材(1)が樹脂ワニス(2)に浸漬されて基材(1)に樹脂ワニス(2)が含浸される。この時、ディップロール(3)の配置は、厚み調整手段(4)直前の基材の走行方向と直後の基材の走行方向とがなす角度(A)が0.5度〜10度となるよう配置することが好ましい。
Moreover, it is preferable to arrange | position the thickness adjustment means (4) within 1 m or less from the liquid level of the resin varnish (2) stored by the resin varnish bath (5). When the thickness adjusting means (4) is disposed above 1 m from the liquid level of the resin varnish (2) stored in the resin varnish bath (5), the resin varnish contained in the impregnated base material flows down due to gravity. As a result, the resin varnish is not completely buried in the gap of the thickness adjusting means (4), so that the surface of the prepreg is not smooth and the thickness may be uneven.
And in impregnating the long base material (1) with the resin varnish (2) using such an apparatus, first, the base material (1) is brought into contact with the lower side of the dip roll (3). Is introduced into the resin varnish (2) stored in the resin varnish bath (5), the base material (1) is immersed in the resin varnish (2), and the base material (1) is impregnated with the resin varnish (2). . At this time, the arrangement of the dip roll (3) is such that the angle (A) formed by the traveling direction of the base material immediately before the thickness adjusting means (4) and the traveling direction of the base material immediately after is 0.5 to 10 degrees. It is preferable to arrange such that.

厚み調整手段(4)直前の基材の走行方向と直後の基材の走行方向とがなす角度(A)を0.5度〜10度にするためには、図1に示すようにディップロール(3)の配置を送り出し側へ移動する、あるいは巻き取り側へ移動する方法がある。また、厚み調整手段(4)の設置位置を図1に示す位置より巻き取り側、あるいは送り出し側に設置する方法がある。また、厚み調整手段(4)通過後の基材(1)の走行方向を図1に示す鉛直方向から巻取り側あるいは送り出し側に傾くように巻取りロール(図示せず)をセットする方法がある。
先述の特許文献3に記載された従来の方法においては、樹脂ワニスが含浸された基材を樹脂ワニスバス内の樹脂ワニスから垂直に引き上げ、一対の厚み調整手段の間を鉛直に通過させることで、基材の表面に付着する余剰のワニスを除去する方法が記載されている。しかしながら、この方法では表裏で異なる厚さの表面樹脂層を有するプリプレグの作成はできなかった。
In order to set the angle (A) formed by the traveling direction of the substrate immediately before the thickness adjusting means (4) and the traveling direction of the substrate immediately after the thickness to 0.5 degrees to 10 degrees, as shown in FIG. There is a method of moving the arrangement of (3) to the sending side or moving to the winding side. Further, there is a method of installing the thickness adjusting means (4) on the winding side or the sending side from the position shown in FIG. Further, there is a method of setting a winding roll (not shown) so that the traveling direction of the base material (1) after passing through the thickness adjusting means (4) is inclined from the vertical direction shown in FIG. 1 to the winding side or the feeding side. is there.
In the conventional method described in Patent Document 3 described above, the base material impregnated with the resin varnish is pulled up vertically from the resin varnish in the resin varnish bath, and vertically passed between the pair of thickness adjusting means, A method for removing excess varnish adhering to the surface of a substrate is described. However, this method could not produce a prepreg having surface resin layers with different thicknesses on the front and back sides.

このようにして、図1に要部を示した装置により、長尺の基材を走行させることによって、基材に所定量の樹脂ワニスを、表裏で異なる厚さの表面樹脂層を有するように連続的
に含浸、厚さ調整することができる。この後、樹脂ワニスが含浸された基材を乾燥すると共に基材中の樹脂を加熱することによりBステージ化することによって、プリプレグを形成することができる。
In this way, by running a long base material with the apparatus shown in FIG. 1, a predetermined amount of resin varnish is provided on the base material so that the front and back surfaces have different surface resin layers. It is possible to continuously impregnate and adjust the thickness. Thereafter, the base material impregnated with the resin varnish is dried and the resin in the base material is heated to form a B stage, whereby a prepreg can be formed.

以下、本発明を実施例によって具体的に説明するが、本発明は以下の実施例に限定されるものではない。
[エポキシ樹脂ワニスの組成]
5046B80(ジャパンエポキシレジン株式会社製、商品名):70質量%、180S75B70(ジャパンエポキシレジン株式会社製、商品名):14質量%、ジシアンジアミド:1.6質量%、2−エチル−4−メチル−イミダゾール:0.2質量%、ジメチルホルムアミド:7.1質量%、メチルセロソルブ:7.1質量%
EXAMPLES Hereinafter, although an Example demonstrates this invention concretely, this invention is not limited to a following example.
[Composition of epoxy resin varnish]
5046B80 (Japan Epoxy Resin Co., Ltd., trade name): 70% by mass, 180S75B70 (Japan Epoxy Resin Co., Ltd., trade name): 14% by mass, Dicyandiamide: 1.6% by mass, 2-ethyl-4-methyl- Imidazole: 0.2% by mass, dimethylformamide: 7.1% by mass, methyl cellosolve: 7.1% by mass

[実施例1]
図1に示した装置を用いて、基材(1)に樹脂ワニス(2)を含浸した。基材(1)としては旭化成エレクトロニクス株式会社製のガラスクロス(製品名:1027MS 厚さ:0.020mm)を用いた。樹脂ワニス(2)は前述したエポキシ樹脂ワニスを用いた。
また、厚み調整手段(4)直前の基材の走行方向と直後の基材の走行方向とがなす角度(A)を1°(厚み調整手段(4)の高さとディップロール(3)の高さの差が255mm)に設定した。そして、基材(1)を樹脂ワニス(2)に含浸させた後、乾燥温度160℃、時間1分30秒の条件で乾燥させると共に基材(1)中の樹脂をBステージ化することでプリプレグを得た。
[Example 1]
The substrate (1) was impregnated with the resin varnish (2) using the apparatus shown in FIG. As the substrate (1), glass cloth (product name: 1027MS thickness: 0.020 mm) manufactured by Asahi Kasei Electronics Co., Ltd. was used. The above-mentioned epoxy resin varnish was used for the resin varnish (2).
Further, the angle (A) formed by the traveling direction of the base material immediately before the thickness adjusting means (4) and the traveling direction of the base material immediately after is 1 ° (the height of the thickness adjusting means (4) and the height of the dip roll (3)). The difference in thickness was set to 255 mm). Then, after impregnating the base material (1) into the resin varnish (2), it is dried at a drying temperature of 160 ° C. for a time of 1 minute and 30 seconds, and the resin in the base material (1) is B-staged. A prepreg was obtained.

[実施例2]
図1に示した装置を用いて、基材(1)に樹脂ワニス(2)を含浸した。基材(1)としては旭化成エレクトロニクス株式会社製のガラスクロス(製品名:1027MS 厚さ:0.020mm)を用いた。樹脂ワニスは前述したエポキシ樹脂ワニスを用いた。
また、厚み調整手段(4)直前の基材の走行方向と直後の基材の走行方向とがなす角度(A)を2°(厚み調整手段(4)の高さとディップロール(3)の高さの差が255mm)に設定した。そして、基材(1)を樹脂ワニス(2)に含浸させた後、乾燥温度160℃、時間1分30秒の条件で乾燥させると共に基材(1)中の樹脂をBステージ化することでプリプレグを得た。
[Example 2]
The substrate (1) was impregnated with the resin varnish (2) using the apparatus shown in FIG. As the substrate (1), glass cloth (product name: 1027MS thickness: 0.020 mm) manufactured by Asahi Kasei Electronics Co., Ltd. was used. The epoxy resin varnish described above was used as the resin varnish.
Further, the angle (A) formed by the traveling direction of the base material immediately before the thickness adjusting means (4) and the traveling direction of the base material immediately after is 2 ° (the height of the thickness adjusting means (4) and the height of the dip roll (3)). The difference in thickness was set to 255 mm). Then, after impregnating the base material (1) into the resin varnish (2), it is dried at a drying temperature of 160 ° C. for a time of 1 minute and 30 seconds, and the resin in the base material (1) is B-staged. A prepreg was obtained.

[実施例3]
図1に示した装置を用いて、基材(1)に樹脂ワニス(2)を含浸した。基材(1)としては旭化成エレクトロニクス株式会社製のガラスクロス(製品名:1027MS 厚さ:0.020mm)を用いた。樹脂ワニスは前述したエポキシ樹脂ワニスを用いた。
また、厚み調整手段(4)直前の基材の走行方向と直後の基材の走行方向とがなす角度(A)を3°(厚み調整手段(4)の高さとディップロール(3)の高さの差が255mm)に設定した。そして、基材(1)を樹脂ワニス(2)に含浸させた後、乾燥温度160℃、時間1分30秒の条件で乾燥させると共に基材(1)中の樹脂をBステージ化することでプリプレグを得た。
[Example 3]
The substrate (1) was impregnated with the resin varnish (2) using the apparatus shown in FIG. As the substrate (1), glass cloth (product name: 1027MS thickness: 0.020 mm) manufactured by Asahi Kasei Electronics Co., Ltd. was used. The epoxy resin varnish described above was used as the resin varnish.
Further, the angle (A) formed by the traveling direction of the substrate immediately before the thickness adjusting means (4) and the traveling direction of the substrate immediately after is 3 ° (the height of the thickness adjusting means (4) and the height of the dip roll (3)). The difference in thickness was set to 255 mm). Then, after impregnating the base material (1) into the resin varnish (2), it is dried at a drying temperature of 160 ° C. for a time of 1 minute and 30 seconds, and the resin in the base material (1) is B-staged. A prepreg was obtained.

[比較例1]
図1に示した装置を用いて、基材(1)に樹脂ワニス(2)を含浸した。基材(1)としては旭化成エレクトロニクス株式会社製のガラスクロス(製品名:1027MS 厚さ0.020mm)を用いた。樹脂ワニスは前述したエポキシ樹脂ワニスを用いた。
また、厚み調整手段(4)直前の基材の走行方向と直後の基材の走行方向とがなす角度(A)を0°(厚み調整手段(4)の高さとディップロール(3)の高さの差が255m
m)に設定した。そして、基材(1)を樹脂ワニス(2)に含浸させた後、乾燥温度160℃、時間1分30秒の条件で乾燥させると共に基材(1)中の樹脂をBステージ化することでプリプレグを得た。
[Comparative Example 1]
The substrate (1) was impregnated with the resin varnish (2) using the apparatus shown in FIG. As the substrate (1), a glass cloth (product name: 1027MS, thickness 0.020 mm) manufactured by Asahi Kasei Electronics Co., Ltd. was used. The epoxy resin varnish described above was used as the resin varnish.
Further, the angle (A) formed by the traveling direction of the base material immediately before the thickness adjusting means (4) and the traveling direction of the base material immediately after is 0 ° (the height of the thickness adjusting means (4) and the height of the dip roll (3)). The difference in height is 255m
m). Then, after impregnating the base material (1) into the resin varnish (2), it is dried at a drying temperature of 160 ° C. for a time of 1 minute and 30 seconds, and the resin in the base material (1) is B-staged. A prepreg was obtained.

実施例1から3及び比較例1で形成されたプリプレグを、常温硬化のエポキシ樹脂で包埋、研磨してプリプレグ断面を削り出し、電子顕微鏡(日立製作所(株)製 S−570)にて断面写真を(倍率1000)撮影した。各プリプレグの表面樹脂層の厚さを裏面表面それぞれについて測定した結果を表1に示す。単位はmmである。なお、表面樹脂層の厚さは糸束断面において一番表面に近いフィラメントから表面までの距離で定義し、表面樹脂層の厚さが厚いほうを便宜的に裏面とした。
表1から判るように、実施例1から3のプリプレグの表面樹脂層厚さは、裏表でそれぞれ異なった厚みの表面樹脂層を有している。比較例1に関しては、プリプレグ裏表で表面樹脂層の厚さが同じであった。
The prepregs formed in Examples 1 to 3 and Comparative Example 1 were embedded and polished with an epoxy resin cured at room temperature, and the prepreg cross section was cut out. A photograph was taken (magnification 1000). Table 1 shows the results of measuring the thickness of the surface resin layer of each prepreg for each of the back surface. The unit is mm. The thickness of the surface resin layer was defined as the distance from the filament closest to the surface to the surface in the cross section of the yarn bundle, and the surface resin layer having the larger thickness was used as the back surface for convenience.
As can be seen from Table 1, the surface resin layer thicknesses of the prepregs of Examples 1 to 3 have surface resin layers with different thicknesses on the front and back sides. Regarding Comparative Example 1, the thickness of the surface resin layer was the same on the front and back of the prepreg.

Figure 2008290331
Figure 2008290331

本発明は、多層配線板の製造に特に適したプリプレグを製造する方法として好適である。   The present invention is suitable as a method for producing a prepreg particularly suitable for producing a multilayer wiring board.

本発明の方法で好適に使用される装置の要部の一例の断面図である。It is sectional drawing of an example of the principal part of the apparatus suitably used with the method of this invention. 厚み調整手段の好適な断面形状の一例である。It is an example of the suitable cross-sectional shape of a thickness adjustment means.

符号の説明Explanation of symbols

1...基材
2...ワニス
3...ディップロール
4...一対のロールからなる厚み調整手段
5...樹脂ワニスバス
A...厚み調整手段(4)直前の基材の走行方向と直後の基材の走行方向とがなす
角度
B...角度(A)が0度の時の仮想ディップロールに対する実際のディップロール
(3)の位置ズラシ量
C...厚み調整手段(4)と走行する基材が接する接点
1. . . Base material 2. . . Varnish 3. . . Dip roll 4. . . 4. Thickness adjusting means comprising a pair of rolls . . Resin varnish bath A. . . Thickness adjusting means (4) The direction of travel of the base material immediately before and the direction of travel of the base material immediately after
Angle B. . . Actual dip roll for virtual dip roll when angle (A) is 0 degree
Position shift amount of (3) C.I. . . Contact point between thickness adjusting means (4) and traveling substrate

Claims (5)

走行する長尺状の基材に樹脂ワニスを含浸させる含浸工程、基材に含浸させた樹脂ワニスの量を調整する調整工程、樹脂ワニスを加熱乾燥する乾燥工程を含むプリプレグの製造方法であって、調整工程において基材が厚さ調整手段を通過するに際し、該厚さ調整手段を通過した直後の該基材の進行方向が該厚さ調整手段を通過する直前の該基材の進行方向と異なる状態で基材を走行させることを特徴とするプリプレグの製造方法。   A method for producing a prepreg including an impregnation step of impregnating a resinous varnish into a traveling long base material, an adjustment step of adjusting the amount of the resin varnish impregnated in the base material, and a drying step of heating and drying the resin varnish. When the substrate passes through the thickness adjusting means in the adjusting step, the traveling direction of the substrate immediately after passing through the thickness adjusting means is the traveling direction of the substrate immediately before passing through the thickness adjusting means. A method for producing a prepreg, characterized in that a substrate is caused to travel in different states. 厚さ調整手段を通過した直後の基材の進行方向と該厚さ調整手段を通過する直前の基材の進行方向とのなす角度(A)が0.5〜10度であることを特徴とする請求項1のプリプレグの製造方法。   The angle (A) between the traveling direction of the base material immediately after passing through the thickness adjusting means and the traveling direction of the base material immediately before passing through the thickness adjusting means is 0.5 to 10 degrees. The method for producing a prepreg according to claim 1. 乾燥工程後のプリプレグの片面又は両面に支持ベースフィルム又は金属箔を積層する積層工程を有することを特徴とする請求項1または2に記載のプリプレグの製造方法。   The method for producing a prepreg according to claim 1 or 2, further comprising a laminating step of laminating a support base film or a metal foil on one side or both sides of the prepreg after the drying step. 基材がガラスクロスであることを特徴とする請求項1〜3のいずれか1項に記載のプリプレグの製造方法。   The method for producing a prepreg according to any one of claims 1 to 3, wherein the substrate is a glass cloth. ガラスクロスの厚さが0.010〜0.050mmであることを特徴とする請求項4に記載のプリプレグの製造方法。   The thickness of a glass cloth is 0.010-0.050 mm, The manufacturing method of the prepreg of Claim 4 characterized by the above-mentioned.
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014045429A1 (en) * 2012-09-24 2014-03-27 三菱重工業株式会社 Method for manufacturing windmill blade

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1024413A (en) * 1996-07-10 1998-01-27 Takuma Co Ltd Method and apparatus for adjusting resin impregnation amount

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1024413A (en) * 1996-07-10 1998-01-27 Takuma Co Ltd Method and apparatus for adjusting resin impregnation amount

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014045429A1 (en) * 2012-09-24 2014-03-27 三菱重工業株式会社 Method for manufacturing windmill blade

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