JP2008262223A - Euvフォトリソグラフィ用の反射投影レンズ - Google Patents
Euvフォトリソグラフィ用の反射投影レンズ Download PDFInfo
- Publication number
- JP2008262223A JP2008262223A JP2008180036A JP2008180036A JP2008262223A JP 2008262223 A JP2008262223 A JP 2008262223A JP 2008180036 A JP2008180036 A JP 2008180036A JP 2008180036 A JP2008180036 A JP 2008180036A JP 2008262223 A JP2008262223 A JP 2008262223A
- Authority
- JP
- Japan
- Prior art keywords
- projection lens
- mirror
- mirrors
- coating
- film thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/02—Catoptric systems, e.g. image erecting and reversing system
- G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
- G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
- G02B17/0657—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0891—Ultraviolet [UV] mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/10—Mirrors with curved faces
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
Abstract
【解決手段】極紫外線(EUV)スペクトル領域からの電磁放射を用いて物体平面上に配置されたパターンを像平面上に結像する投影レンズであって、反射コーティングを有して投影レンズの光軸を定める幾つかの結像鏡が、物体平面および像平面間に配置されており、各々の鏡がその鏡に特徴的な入射角範囲にわたって照射されるように、複数の鏡が相互に構成および配置されており、少なくとも最大入射角範囲を有する鏡が、コーティング軸に関して回転対称であるフィルム厚さ勾配を有する非中心性漸変反射コーティングを有しており、コーティング軸が投影レンズの光軸とほぼ一致している投影レンズ。
【選択図】図1
Description
p(h)=[((1/r)h2)/(1+SQRT(1−(1+K)
(1/r)2h2)]+Ah4+Bh6+...
を使用して計算することができる。したがって、p(h)は、z方向に沿った、すなわち、光軸に沿った表面の反曲点からその表面上の点までの半径方向距離を表す。係数K、A、Bなどは表1に示されている。
過率を大して低減させることなく、図14および図15に見られるひとみにおける非中心性を最小限に抑えることができる。
2 物体平面
3 像平面
4〜9 鏡
10 共通光軸
11 中間実像
Claims (10)
- 極紫外線(EUV)スペクトル領域からの電磁放射を用いて物体平面上に配置されたパターンを像平面上に結像する投影レンズであって、反射コーティングを有して投影レンズの光軸を定める幾つかの結像鏡が、物体平面および像平面間に配置されており、各々の鏡がその鏡に特徴的な入射角範囲にわたって照射されるように、複数の鏡が相互に構成および配置されており、少なくとも最大入射角範囲を有する鏡が、コーティング軸に関して回転対称であるフィルム厚さ勾配を有する非中心性漸変反射コーティングを有しており、コーティング軸が投影レンズの光軸とほぼ一致している投影レンズ。
- 漸変反射コーティングのフィルム厚さ勾配が、ほぼ回転対称であるひとみ放射照度分布を生じるように最適化されている請求項1記載の投影レンズ。
- 幾つか(少なくとも2つ)の鏡が、非中心性漸変反射コーティングを有しており、それらの反射コーティングのフィルム厚さの勾配が、ほぼ回転対称であるひとみ放射照度分布を生じるように、互いに適合されている請求項2記載の投影レンズ。
- 非中心性漸変反射コーティングを有する4個以下の鏡が存在する請求項3記載の投影レンズ。
- 5個より多い、特に6個の鏡が、物体平面および像平面間に配置されている請求項1〜4のいずれか1項記載の投影レンズ。
- すべての鏡が同軸的である請求項1〜5のいずれか1項記載の投影レンズ。
- 物体平面の後に続く少なくとも第5鏡が非中心性漸変反射コーティングを有しており、好ましくは物体平面の後に続く第4および第5鏡または第3および第5鏡が非中心性漸変反射コーティングを有する請求項5または6記載の投影レンズ。
- 投影レンズが、NA≧0.15、特にNA≧0.2である像側開口数NAを有する請求項1〜8のいずれか1項記載の投影レンズ。
- 前記鏡が、物体平面および像平面間に中間像が形成されるように、構成および配置されている請求項1〜9のいずれか1項記載の投影レンズ。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US30886101P | 2001-08-01 | 2001-08-01 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2002218003A Division JP4178862B2 (ja) | 2001-08-01 | 2002-07-26 | Euvフォトリソグラフィ用の反射投影レンズ |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2008262223A true JP2008262223A (ja) | 2008-10-30 |
Family
ID=23195690
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2002218003A Expired - Fee Related JP4178862B2 (ja) | 2001-08-01 | 2002-07-26 | Euvフォトリソグラフィ用の反射投影レンズ |
JP2008180036A Pending JP2008262223A (ja) | 2001-08-01 | 2008-07-10 | Euvフォトリソグラフィ用の反射投影レンズ |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2002218003A Expired - Fee Related JP4178862B2 (ja) | 2001-08-01 | 2002-07-26 | Euvフォトリソグラフィ用の反射投影レンズ |
Country Status (5)
Country | Link |
---|---|
US (3) | US6927901B2 (ja) |
EP (1) | EP1282011B1 (ja) |
JP (2) | JP4178862B2 (ja) |
DE (1) | DE50208750D1 (ja) |
TW (1) | TW565706B (ja) |
Families Citing this family (54)
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US7843632B2 (en) * | 2006-08-16 | 2010-11-30 | Cymer, Inc. | EUV optics |
US7053988B2 (en) * | 2001-05-22 | 2006-05-30 | Carl Zeiss Smt Ag. | Optically polarizing retardation arrangement, and microlithography projection exposure machine |
JP2004325649A (ja) * | 2003-04-23 | 2004-11-18 | Canon Inc | 反射型投影光学系、露光装置及びデバイスの製造方法 |
DE10329793A1 (de) * | 2003-07-01 | 2005-01-27 | Carl Zeiss Smt Ag | Projektionsobjektiv für eine mikrolithographische Projektionsbelichtungsanlage |
EP1496521A1 (en) | 2003-07-09 | 2005-01-12 | ASML Netherlands B.V. | Mirror and lithographic apparatus with mirror |
KR101050320B1 (ko) | 2003-09-17 | 2011-07-19 | 칼 짜이스 에스엠테 게엠베하 | 마스크, 리소그래피 장치와 반도체 구성요소 |
US7164535B2 (en) * | 2003-09-30 | 2007-01-16 | Teledyne Licensing, Llc | Optical coating and configuration for tailored spectral characteristics over viewing angle |
US6977717B1 (en) * | 2003-12-04 | 2005-12-20 | Advanced Micro Devices, Inc. | Method and device for determining projection lens pupil transmission distribution and illumination intensity distribution in photolithographic imaging system |
US7081956B1 (en) | 2003-12-04 | 2006-07-25 | Advanced Micro Devices, Inc. | Method and device for determining reflection lens pupil transmission distribution and illumination intensity distribution in reflective imaging system |
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KR101393912B1 (ko) * | 2007-08-20 | 2014-05-12 | 칼 짜이스 에스엠티 게엠베하 | 반사 코팅을 갖는 미러 소자들을 구비하는 투영 대물렌즈 |
DE102007051669A1 (de) * | 2007-10-26 | 2009-04-30 | Carl Zeiss Smt Ag | Abbildende Optik, Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik sowie Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage |
DE102007062198A1 (de) * | 2007-12-21 | 2009-06-25 | Carl Zeiss Microimaging Gmbh | Katoptrisches Objektiv zur Abbildung eines im Wesentlichen linienförmigen Objektes |
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US9494772B1 (en) | 2014-03-16 | 2016-11-15 | Hyperion Development, LLC | Optical assembly for a wide field of view point action camera with low field curvature |
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DE102016212373A1 (de) | 2016-07-07 | 2018-01-11 | Carl Zeiss Smt Gmbh | Optisches System, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage |
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- 2002-07-26 JP JP2002218003A patent/JP4178862B2/ja not_active Expired - Fee Related
- 2002-07-26 DE DE50208750T patent/DE50208750D1/de not_active Expired - Lifetime
- 2002-08-01 US US10/208,842 patent/US6927901B2/en not_active Expired - Lifetime
- 2002-08-01 TW TW091117312A patent/TW565706B/zh not_active IP Right Cessation
-
2005
- 2005-07-19 US US11/183,877 patent/US7199922B2/en not_active Expired - Lifetime
-
2007
- 2007-03-22 US US11/723,831 patent/US7450301B2/en not_active Expired - Fee Related
-
2008
- 2008-07-10 JP JP2008180036A patent/JP2008262223A/ja active Pending
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JPH09211332A (ja) * | 1995-12-12 | 1997-08-15 | Svg Lithography Syst Inc | 高開口数リングフィールド光学縮小系 |
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Also Published As
Publication number | Publication date |
---|---|
JP4178862B2 (ja) | 2008-11-12 |
US6927901B2 (en) | 2005-08-09 |
US20030099034A1 (en) | 2003-05-29 |
EP1282011A3 (de) | 2004-08-25 |
TW565706B (en) | 2003-12-11 |
US7450301B2 (en) | 2008-11-11 |
US20050248835A1 (en) | 2005-11-10 |
JP2003177319A (ja) | 2003-06-27 |
US20070171558A1 (en) | 2007-07-26 |
US7199922B2 (en) | 2007-04-03 |
EP1282011A2 (de) | 2003-02-05 |
EP1282011B1 (de) | 2006-11-22 |
DE50208750D1 (de) | 2007-01-04 |
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