JP2008227206A - 載置台 - Google Patents
載置台 Download PDFInfo
- Publication number
- JP2008227206A JP2008227206A JP2007064472A JP2007064472A JP2008227206A JP 2008227206 A JP2008227206 A JP 2008227206A JP 2007064472 A JP2007064472 A JP 2007064472A JP 2007064472 A JP2007064472 A JP 2007064472A JP 2008227206 A JP2008227206 A JP 2008227206A
- Authority
- JP
- Japan
- Prior art keywords
- mounting table
- top plate
- table according
- insulating film
- mounting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2855—Environmental, reliability or burn-in testing
- G01R31/286—External aspects, e.g. related to chambers, contacting devices or handlers
- G01R31/2865—Holding devices, e.g. chucks; Handlers or transport devices
- G01R31/2867—Handlers or transport devices, e.g. loaders, carriers, trays
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Environmental & Geological Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Testing Of Individual Semiconductor Devices (AREA)
Abstract
【解決手段】本発明の載置台20は、半導体ウエハWの載置面を有する無酸素銅からなるトッププレート21と、このトッププレート21の下面21A及び側面21Bの下部を連続的に被覆するアルミナからなる絶縁皮膜22と、この絶縁皮膜22と接触するように配置され且つ無酸素銅からなる冷却ジャケット23と、を備えている。
【選択図】図2
Description
21 トッププレート(上部板状体)
21A 下面
21B 側面
21C 吸着用の溝
22 絶縁皮膜
22A 中間層
23 冷却ジャケット(下部板状体)
51A 中心導体(検査用信号を印加するための配線)
51B 外部導体(検査用信号を印加するための配線)
Claims (13)
- 被検査体を載置する載置台において、上記被検査体の載置面を有する導電性材料からなる上部板状体と、この上部板状体の上記載置面とは反対側の面及び側面の少なくとも下部を連続的に被覆する電気絶縁材料からなる絶縁皮膜と、この絶縁皮膜と接触するように配置され且つ導電性材料からなる下部板状体と、を備えたことを特徴とする載置台。
- 上記導電性材料は、銅であることを特徴とする請求項1に記載の載置台。
- 上記電気絶縁材料は、非金属の無機材料であることを特徴とする請求項1または請求項2に記載の載置台。
- 上記無機材料は、セラミックスであることを特徴とする請求項1または請求項2に記載の載置台。
- 上記セラミックスは、アルミナを主体とすることを特徴とする請求項4に記載の載置台。
- 上記アルミナの純度は、99.99重量%以上であることを特徴とする請求項5に記載の載置台。
- 上記絶縁皮膜の膜厚は、0.3〜1.5mmであることを特徴とする請求項5に記載の載置台。
- 上記絶縁皮膜は、溶射により形成されてなることを特徴とする請求項1〜請求項7のいずれか1項に記載の載置台。
- 上記絶縁皮膜は、塗布または蒸着により形成されてなることを特徴とする請求項1〜請求項7のいずれか1項に記載の載置台。
- 上記上部板状体と上記絶縁皮膜の間に、これら両者それぞれの熱膨張係数の間にある熱膨張係数を有する中間層が介在することを特徴とする請求項1〜請求項9に記載の載置台。
- 上記上部板状体は、少なくとも10mmの厚みを有することを特徴とする請求項1〜請求項10のいずれか1項に記載の載置台。
- 上記上部板状体の載置面には上記被検査体を吸着する溝が形成されていることを特徴とする請求項1〜請求項11のいずれか1項に記載の載置台。
- 上記載置面上の上記被検査体の電気的特性検査を行う際に検査用信号を印加するために用いられる配線が上記上部板状体と上記下部板状体にそれぞれ接続されていることを特徴とする請求項1〜請求項12のいずれか1項に記載の載置台。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007064472A JP4965287B2 (ja) | 2007-03-14 | 2007-03-14 | 載置台 |
TW097108862A TWI437658B (zh) | 2007-03-14 | 2008-03-13 | Loading platform |
KR1020080023868A KR100934507B1 (ko) | 2007-03-14 | 2008-03-14 | 탑재대 |
CN2008100860888A CN101266261B (zh) | 2007-03-14 | 2008-03-14 | 载置台 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007064472A JP4965287B2 (ja) | 2007-03-14 | 2007-03-14 | 載置台 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008227206A true JP2008227206A (ja) | 2008-09-25 |
JP4965287B2 JP4965287B2 (ja) | 2012-07-04 |
Family
ID=39845463
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007064472A Expired - Fee Related JP4965287B2 (ja) | 2007-03-14 | 2007-03-14 | 載置台 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4965287B2 (ja) |
KR (1) | KR100934507B1 (ja) |
CN (1) | CN101266261B (ja) |
TW (1) | TWI437658B (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012043916A (ja) * | 2010-08-18 | 2012-03-01 | Mitsubishi Electric Corp | 半導体ウエハ冷却装置 |
JP2016189387A (ja) * | 2015-03-30 | 2016-11-04 | 国立大学法人東北大学 | プローバチャック、磁気メモリ用プローバチャック及びプローバ |
EP3671819A1 (en) * | 2018-12-19 | 2020-06-24 | Tokyo Electron Limited | Mounting table, and method of manufacturing the mounting table |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5356769B2 (ja) * | 2008-10-15 | 2013-12-04 | 東京エレクトロン株式会社 | 載置台 |
JP7176002B2 (ja) * | 2018-12-06 | 2022-11-21 | 日本碍子株式会社 | 半導体装置用基板 |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58220438A (ja) * | 1982-06-17 | 1983-12-22 | Nippon Maikuronikusu:Kk | 半導体ウエハ測定載置台 |
JPH033249A (ja) * | 1989-05-30 | 1991-01-09 | Ulvac Corp | 基板保持装置 |
JPH06326176A (ja) * | 1993-05-12 | 1994-11-25 | Tokyo Electron Ltd | 自己バイアス測定方法及び装置並びに静電吸着装置 |
JP2000021959A (ja) * | 1998-06-29 | 2000-01-21 | Kyocera Corp | 真空吸着盤 |
JP2002217277A (ja) * | 2001-01-16 | 2002-08-02 | Hitachi Chem Co Ltd | 静電チャック |
JP2003282685A (ja) * | 2002-03-27 | 2003-10-03 | Sumitomo Metal Ind Ltd | 冷却プレート |
JP2005057234A (ja) * | 2003-07-24 | 2005-03-03 | Kyocera Corp | 静電チャック |
JP2005142206A (ja) * | 2003-11-04 | 2005-06-02 | Hitachi Chem Co Ltd | 静電チャック |
JP2006245609A (ja) * | 2006-05-19 | 2006-09-14 | Sumitomo Electric Ind Ltd | セラミックス接合体、ウエハ保持体及び半導体製造装置 |
JP2007035737A (ja) * | 2005-07-25 | 2007-02-08 | Sumitomo Electric Ind Ltd | ウェハ保持体及びウェハ保持体を備えたウェハプローバ |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5572144A (en) * | 1993-02-22 | 1996-11-05 | Seagate Technology | Test jig and method for probing a printed circuit board |
JP4062928B2 (ja) * | 2002-02-06 | 2008-03-19 | 東京エレクトロン株式会社 | プラズマ処理装置 |
JP4124622B2 (ja) | 2002-07-24 | 2008-07-23 | 株式会社東京精密 | プローバのチャック機構 |
JP2007042908A (ja) | 2005-08-04 | 2007-02-15 | Sumitomo Electric Ind Ltd | ウェハ保持体およびそれを搭載したウェハプローバ |
-
2007
- 2007-03-14 JP JP2007064472A patent/JP4965287B2/ja not_active Expired - Fee Related
-
2008
- 2008-03-13 TW TW097108862A patent/TWI437658B/zh not_active IP Right Cessation
- 2008-03-14 CN CN2008100860888A patent/CN101266261B/zh not_active Expired - Fee Related
- 2008-03-14 KR KR1020080023868A patent/KR100934507B1/ko not_active IP Right Cessation
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58220438A (ja) * | 1982-06-17 | 1983-12-22 | Nippon Maikuronikusu:Kk | 半導体ウエハ測定載置台 |
JPH033249A (ja) * | 1989-05-30 | 1991-01-09 | Ulvac Corp | 基板保持装置 |
JPH06326176A (ja) * | 1993-05-12 | 1994-11-25 | Tokyo Electron Ltd | 自己バイアス測定方法及び装置並びに静電吸着装置 |
JP2000021959A (ja) * | 1998-06-29 | 2000-01-21 | Kyocera Corp | 真空吸着盤 |
JP2002217277A (ja) * | 2001-01-16 | 2002-08-02 | Hitachi Chem Co Ltd | 静電チャック |
JP2003282685A (ja) * | 2002-03-27 | 2003-10-03 | Sumitomo Metal Ind Ltd | 冷却プレート |
JP2005057234A (ja) * | 2003-07-24 | 2005-03-03 | Kyocera Corp | 静電チャック |
JP2005142206A (ja) * | 2003-11-04 | 2005-06-02 | Hitachi Chem Co Ltd | 静電チャック |
JP2007035737A (ja) * | 2005-07-25 | 2007-02-08 | Sumitomo Electric Ind Ltd | ウェハ保持体及びウェハ保持体を備えたウェハプローバ |
JP2006245609A (ja) * | 2006-05-19 | 2006-09-14 | Sumitomo Electric Ind Ltd | セラミックス接合体、ウエハ保持体及び半導体製造装置 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012043916A (ja) * | 2010-08-18 | 2012-03-01 | Mitsubishi Electric Corp | 半導体ウエハ冷却装置 |
JP2016189387A (ja) * | 2015-03-30 | 2016-11-04 | 国立大学法人東北大学 | プローバチャック、磁気メモリ用プローバチャック及びプローバ |
EP3671819A1 (en) * | 2018-12-19 | 2020-06-24 | Tokyo Electron Limited | Mounting table, and method of manufacturing the mounting table |
Also Published As
Publication number | Publication date |
---|---|
KR100934507B1 (ko) | 2009-12-29 |
JP4965287B2 (ja) | 2012-07-04 |
CN101266261B (zh) | 2011-01-05 |
TWI437658B (zh) | 2014-05-11 |
KR20080084729A (ko) | 2008-09-19 |
TW200901364A (en) | 2009-01-01 |
CN101266261A (zh) | 2008-09-17 |
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