JP2008174770A - Plating fixture - Google Patents

Plating fixture Download PDF

Info

Publication number
JP2008174770A
JP2008174770A JP2007007124A JP2007007124A JP2008174770A JP 2008174770 A JP2008174770 A JP 2008174770A JP 2007007124 A JP2007007124 A JP 2007007124A JP 2007007124 A JP2007007124 A JP 2007007124A JP 2008174770 A JP2008174770 A JP 2008174770A
Authority
JP
Japan
Prior art keywords
power supply
electronic circuit
substrate
plating
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007007124A
Other languages
Japanese (ja)
Other versions
JP4989237B2 (en
Inventor
Tsunayoshi Aoki
綱芳 青木
Kenichiro Haruki
健一郎 春木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujikura Ltd
Original Assignee
Fujikura Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujikura Ltd filed Critical Fujikura Ltd
Priority to JP2007007124A priority Critical patent/JP4989237B2/en
Publication of JP2008174770A publication Critical patent/JP2008174770A/en
Application granted granted Critical
Publication of JP4989237B2 publication Critical patent/JP4989237B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Electroplating Methods And Accessories (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a plating fixture, which reduces an amount of a plating solution carried out by a plating fixture, finely adjusts power-feeding electrodes connected to a surface side of a wafer, and performs rapid detachment and attachment of the wafer. <P>SOLUTION: The plating fixture 1 is composed of a fixture body 3, a plurality of resilient plate-like power-feeding electrodes 15A, 15B and 15C and a substrate attachment/detachment device 23. The fixture body 3 is equipped with a plating hole 9 and a substrate-holding part 11 installed along the edge of the plating hole 9, wherein an electronic circuit card 7 to be plated is placed on the substrate-holding part 11 with its surface 7A facing outward. The power-feeding electrodes 15A, 15B and 15C are installed at a plurality of sites on the substrate-holding part 11 and form connections with the electronic circuit card 7 by a bias working in the direction of holding down the surface 7A of the electronic circuit card 7 with tips of the plate-like power-feeding electrodes. The substrate attachment/detachment device 23 detaches and releases each of the power-feeding electrodes 15 from the surface 7A of the electronic circuit card 7 by resisting against the bias or fixes the electronic circuit card 7 by holding down the electronic circuit card 7 by the bias. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

この発明は、メッキ治具に関し、特にメッキすべくウェハなどの電子回路基板を保持し、前記電子回路基板の表面にメッキするメッキ治具に関する。なお、このメッキ治具は、半導体パッケージ分野におけるウェハメッキプロセスに関するもので、製品を左右するものである。   The present invention relates to a plating jig, and more particularly to a plating jig for holding an electronic circuit board such as a wafer to be plated and plating the surface of the electronic circuit board. The plating jig relates to a wafer plating process in the semiconductor package field, and affects the product.

一般的に、半導体を実装する電子回路基板としての例えばウェハの表面には銅メッキが施される。そのために、メッキ治具にウェハをセット保持してから、このメッキ治具の全体を例えばメッキ槽内の銅メッキ液に没入することで銅メッキが施される。   Generally, for example, the surface of a wafer as an electronic circuit board on which a semiconductor is mounted is plated with copper. For this purpose, after the wafer is set and held on the plating jig, the entire plating jig is immersed in, for example, a copper plating solution in a plating tank to perform copper plating.

図8を参照するに、従来のメッキ治具101としては、例えば、特許文献1に示されているように、板状のベース部材103が上下に貫通した開口105の開口周縁に沿って設けた複数の給電電極107を有している。第1シール部材109は、前記ベース部材103の開口105の開口周縁に沿って配置されるリング状をなすもので、板状に形成されたウェハ111の表面111Aが前記給電電極107と電気的に接続し合うように載置セットされる構成である。なお、図8では第1シール部材109の外周側に、前記給電電極107の水平部を載置して上方からの荷重に対して弾性反力を備えた弾性体109aが設けられている。   Referring to FIG. 8, as a conventional plating jig 101, for example, as shown in Patent Document 1, a plate-like base member 103 is provided along the opening periphery of an opening 105 that penetrates vertically. A plurality of power supply electrodes 107 are provided. The first seal member 109 has a ring shape arranged along the opening periphery of the opening 105 of the base member 103, and the surface 111 </ b> A of the wafer 111 formed in a plate shape is electrically connected to the power supply electrode 107. It is the structure set and mounted so that it may connect. In FIG. 8, on the outer peripheral side of the first seal member 109, there is provided an elastic body 109a on which the horizontal portion of the power supply electrode 107 is placed and has an elastic reaction force against a load from above.

また、カバー部材113は、前記第1シール部材109にセットされるウェハ111の裏面111Bの全体を覆うものである。押さえ部材115は、前記カバー部材113とウェハ111の裏面111Bとの間でそれぞれに接触して前記ウェハ111を前記第1シール部材109へ向けて押さえつけるものである。押さえ部材115とウェハ111の間はリング状の弾性部材117を介して接触しており、押さえ部材115のほぼ中央にはねじ式の突起体119が前記カバー部材113の側に突出する方向に高さ調整可能に設けられており、押さえ部材115とカバー部材113の間は前記突起体119を介して接触している。   The cover member 113 covers the entire back surface 111B of the wafer 111 set on the first seal member 109. The pressing member 115 contacts between the cover member 113 and the back surface 111B of the wafer 111 to press the wafer 111 toward the first seal member 109. The pressing member 115 and the wafer 111 are in contact with each other via a ring-shaped elastic member 117, and a screw-type projection 119 is formed in the center of the pressing member 115 so as to protrude toward the cover member 113. The presser member 115 and the cover member 113 are in contact with each other via the protrusion 119.

また、第2シール部材121は、前記押さえ部材115の外周に沿って配置されるリング状をなすものである。前記カバー部材113とベース部材103は前記第2シール部材121を挟んで複数の締結具としての例えばねじ123で締結される構成である。   The second seal member 121 has a ring shape arranged along the outer periphery of the pressing member 115. The cover member 113 and the base member 103 are configured to be fastened with, for example, screws 123 as a plurality of fasteners with the second seal member 121 interposed therebetween.

したがって、前記カバー部材113とベース部材103が複数の締結具のねじ123で締結されると、カバー部材113の押圧力Wにより突起体119を介して前記押さえ部材115がリング状の弾性部材117を経てウェハ111を前記第1シール部材109へ向けて押さえつける方向に押圧するので、ウェハ111のメッキ液が接触する表面111Aの周辺に配置されたリング状の第1シール部材109でシールされる。また、ウェハ111の裏面111B側は前記カバー部材113とベース部材103との間に挟まれる第2シール部材121でシールされる。その結果、メッキ治具101にセット保持されたウェハ111に銅メッキを行う場合は、メッキ液はウェハ111の裏面111Bに確実に漏れないようにできる。
特開2006−16649号公報
Therefore, when the cover member 113 and the base member 103 are fastened by a plurality of fastener screws 123, the pressing member 115 causes the ring-shaped elastic member 117 to move through the protrusion 119 due to the pressing force W of the cover member 113. Then, the wafer 111 is pressed toward the first seal member 109 so that the wafer 111 is sealed by the ring-shaped first seal member 109 disposed around the surface 111A with which the plating solution of the wafer 111 contacts. Further, the back surface 111 </ b> B side of the wafer 111 is sealed with a second seal member 121 sandwiched between the cover member 113 and the base member 103. As a result, when copper plating is performed on the wafer 111 set and held on the plating jig 101, the plating solution can be surely prevented from leaking to the back surface 111 </ b> B of the wafer 111.
JP 2006-16649 A

ところで、特許文献1の従来のメッキ治具101においては、大別すると、ベース部材103、押さえ部材115、カバー部材113の3つの部材で構成されているため、各部材への付着によるメッキ液の持ち出し量が多く、メッキ液のランニングコストや排水処理への負荷が高いという問題があった。   By the way, the conventional plating jig 101 of Patent Document 1 is roughly divided into three members: a base member 103, a pressing member 115, and a cover member 113. There was a problem that the amount of carry-out was large and the running cost of the plating solution and the load on wastewater treatment were high.

また、上記の押さえ部材115をクランパなどの締結具で押さえる場合は、ウェハ111に対する押圧力Wの制御ができず、ウェハ111の脱着にも時間がかかる。また、複数のねじ123の締結具を使って押さえる場合も、ウェハ111に対する押圧力Wの制御にも多くの調整時間がかかり、複数のねじ123を締め付けたり緩めて取り外したりするので、ウェハ111の脱着に時間がかかるという問題点があった。簡単に言うと、従来のメッキ治具101は、大別すると、ベース部材103、押さえ部材115、カバー部材113の3つの部材で構成されているので、ウェハ111の脱着に時間がかかるのである。   Further, when pressing the pressing member 115 with a fastener such as a clamper, the pressing force W against the wafer 111 cannot be controlled, and it takes time to attach and detach the wafer 111. In addition, when pressing using the fasteners of the plurality of screws 123, it takes a lot of adjustment time to control the pressing force W on the wafer 111, and the plurality of screws 123 are tightened or loosened and removed. There was a problem that it took time to desorb. In brief, the conventional plating jig 101 is roughly composed of three members, that is, a base member 103, a pressing member 115, and a cover member 113. Therefore, it takes time to attach and detach the wafer 111.

また、従来のメッキ治具101では、ウェハ111を取り付けた後に、給電電極107の接続位置の微調整ができないという問題点があった。   Further, the conventional plating jig 101 has a problem in that fine adjustment of the connection position of the feeding electrode 107 cannot be performed after the wafer 111 is attached.

また、給電電極107を接続する箇所にレジスト膜が形成されているウェハ111には、前記レジスト膜を給電電極107で突き破らなければならないために、従来のメッキ治具101では適応が難しいという問題点があった。   Further, since the resist film has to be pierced by the power supply electrode 107 on the wafer 111 where the power supply electrode 107 is connected, the conventional plating jig 101 is difficult to adapt. There was a point.

多層のメッキ処理が行われる際に、従来のメッキ治具101では、前述したように大別すると、ベース部材103、押さえ部材115、カバー部材113の3つの部材で構成されているために各部材への付着によるメッキ液の持ち出し量が多いことから、メッキ治具101の構成部材を少なくすることが要求されていた。しかも、銅層の表面に多層のメッキ処理を行うには、給電電極107をシード層に接続する必要があるので、上述したように給電電極107でウェハ111の外周縁側の表面に露出したレジスト層を突き破る必要があるが、従来のメッキ治具101ではその適応が難しいものであった。   When the multi-layer plating process is performed, the conventional plating jig 101 is roughly composed of the base member 103, the pressing member 115, and the cover member 113 as described above. Since the amount of the plating solution brought out due to adhesion to the surface is large, it has been required to reduce the number of constituent members of the plating jig 101. Moreover, since the power supply electrode 107 needs to be connected to the seed layer in order to perform multilayer plating on the surface of the copper layer, the resist layer exposed on the outer peripheral surface of the wafer 111 by the power supply electrode 107 as described above. However, the conventional plating jig 101 is difficult to adapt.

上記発明が解決しようとする課題を達成するために、この発明のメッキ治具は、メッキ用穴部を備えると共にメッキすべき電子回路基板の表面を外側に向けて載置する基板載置部を前記メッキ用穴部の周縁に沿って設けた治具本体と、
前記基板載置部の複数箇所に配置した弾力性を有する板状の給電電極であって、前記板状の先端で前記電子回路基板の表面を上から挟み込む方向の付勢力で前記電子回路基板に接続する複数の給電電極と、
前記各給電電極を前記付勢力に抗して前記電子回路基板の表面から離反して解放、並びに前記各給電電極の付勢力で前記電子回路基板を挟み込んで固定すべく切り換える基板脱着装置と、で構成されていることを特徴とするものである。
In order to achieve the problem to be solved by the present invention, a plating jig of the present invention includes a substrate mounting portion that includes a hole for plating and places the surface of the electronic circuit board to be plated facing outward. A jig body provided along the periphery of the plating hole;
A plate-like power supply electrode having elasticity arranged at a plurality of locations on the substrate mounting portion, and is applied to the electronic circuit board with a biasing force in a direction of sandwiching the surface of the electronic circuit board from above with the plate-shaped tip. A plurality of feeding electrodes to be connected;
A substrate detaching device that switches the power supply electrodes to be released from the surface of the electronic circuit substrate against the biasing force, and to switch the electronic circuit substrate to be sandwiched and fixed by the biasing force of the power supply electrodes; It is characterized by being comprised.

また、この発明のメッキ治具は、前記メッキ治具において、前記基板脱着装置が、前記給電電極を前記付勢力に抗して前記電子回路基板の表面から離反せしめる大径部と、前記給電電極を前記付勢力で電子回路基板を挟み込む原位置に復帰せしめる小径部で構成するシャフト部材を、前記各給電電極の下側で給電電極の延伸方向にほぼ直交する方向にスライド自在に設けていることが好ましい。   Further, the plating jig of the present invention is the plating jig, wherein the substrate detaching device separates the power supply electrode from the surface of the electronic circuit board against the biasing force, and the power supply electrode. A shaft member constituted by a small-diameter portion that can be returned to the original position where the electronic circuit board is sandwiched by the urging force is provided so as to be slidable in a direction substantially perpendicular to the extending direction of the feeding electrode below each feeding electrode. Is preferred.

また、この発明のメッキ治具は、前記メッキ治具において、前記基板脱着装置が、前記複数の給電電極のうちの少なくとも1つの給電電極を、前記複数の基板載置部に載置した電子回路基板に向けて進退自在に設けることが好ましい。   In the plating jig of the present invention, in the plating jig, the substrate detaching apparatus places at least one of the plurality of feeding electrodes on the plurality of board mounting portions. It is preferable to be provided so as to be able to advance and retract toward the substrate.

以上のごとき課題を解決するための手段から理解されるように、この発明のメッキ治具によれば、大別すると、殆ど治具本体のみで構成されるので、メッキ液の液溜まりを発生する箇所がなくなり、メッキ液の持ち出し量の低減を図ることができる。   As understood from the means for solving the problems as described above, according to the plating jig of the present invention, when roughly classified, it is constituted only by the jig main body, so that a pool of plating solution is generated. There is no place, and the amount of plating solution taken out can be reduced.

また、複数の給電電極を治具本体に剥き出しで設けたので、各給電電極が電子回路基板の表面に接続されているか否かを容易に目視できる。したがって、給電接続する箇所にレジスト層が形成されている電子回路基板であっても、給電電極でレジスト層を突き破って容易に給電接続することができるので、例えば多層のメッキ処理を行うことができる。   In addition, since the plurality of power supply electrodes are exposed on the jig body, it is possible to easily visually check whether or not each power supply electrode is connected to the surface of the electronic circuit board. Therefore, even in an electronic circuit board in which a resist layer is formed at a place where power supply is connected, since the power supply electrode can easily break through the resist layer and connect the power supply, for example, multilayer plating can be performed. .

また、複数の給電電極を治具本体に剥き出しで設けると共に、基板脱着装置を設けたことで、各給電電極を前記付勢力に抗して電子回路基板を解放し、あるいは前記各給電電極の付勢力で前記電子回路基板を固定するように切り換えることができるので、電子回路基板を治具本体にセットした後に、前記各給電電極を容易に微調整することができる。しかも、電子回路基板の脱着を迅速に行うことができ、大幅な脱着時間の低減を図ることができる。   In addition, a plurality of power supply electrodes are provided on the jig body so as to be exposed, and a substrate detaching device is provided so that each power supply electrode is released from the electronic circuit board against the urging force, or each power supply electrode is attached. Since the electronic circuit board can be switched so as to be fixed by force, the power feeding electrodes can be easily finely adjusted after the electronic circuit board is set on the jig body. In addition, the electronic circuit board can be quickly attached and detached, and the removal time can be greatly reduced.

以下、この発明の実施の形態について図面を参照して説明する。   Embodiments of the present invention will be described below with reference to the drawings.

図1ないしは図3を参照するに、この実施の形態に係るメッキ治具1は、治具本体3が矩形の平板状で、塩化ビニル製からなり、上部にはクランプ用穴部5が設けられており、下部にはメッキすべき電子回路基板としての例えばウェハ7の表面7Aに多層のメッキ処理するための図2において上下に貫通したメッキ用穴部9が設けられている。なお、このとき、上記のウェハ7には予め銅メッキが施されており、この銅層の表面7Aに多層のメッキ処理が施されるのである。   Referring to FIGS. 1 to 3, a plating jig 1 according to this embodiment has a jig body 3 having a rectangular flat plate shape and made of vinyl chloride, and is provided with a clamping hole 5 at the top. In the lower part, for example, a surface 7A of a wafer 7 as an electronic circuit board to be plated is provided with a plating hole 9 penetrating vertically in FIG. At this time, the wafer 7 is previously plated with copper, and the surface 7A of the copper layer is subjected to multilayer plating.

さらに、図1に示されているように、前記ウェハ7の表面7Aを外側に向けて載置する基板載置部11がメッキ用穴部9の周縁に沿って設けられている。この基板載置部11としては、メッキ用穴部9の周縁の全体にウェハ7を直接載置するように構成できるが、この実施の形態では少なくとも3つの給電ブロック13A,13B,13Cがメッキ用穴部9の周縁に沿ってほぼ均等な配置で、例えば約120°の角度の間隔で設けられることで、基板載置部11が構成されている。なお、給電ブロック13Aは治具本体3の上部に位置しており、給電ブロック13B,13Cは治具本体3の下部に位置している。   Further, as shown in FIG. 1, a substrate placement portion 11 for placing the surface 7 </ b> A of the wafer 7 facing outward is provided along the periphery of the plating hole 9. The substrate mounting portion 11 can be configured to place the wafer 7 directly on the entire periphery of the plating hole portion 9, but in this embodiment, at least three power supply blocks 13A, 13B, and 13C are used for plating. The substrate mounting portion 11 is configured by being provided with a substantially uniform arrangement along the peripheral edge of the hole portion 9, for example, at an interval of an angle of about 120 °. The power supply block 13A is located at the upper part of the jig body 3, and the power supply blocks 13B and 13C are located at the lower part of the jig body 3.

さらに、上記の基板載置部11には少なくとも3箇所にウェハ7に通電するための給電電極15が設けられている。この実施の形態では、上記の3つの給電ブロック13A,13B,13Cに対応して3つの給電電極15A,15B,15Cが設けられており、各給電電極15A,15B,15Cは弾力性を有する帯板状に形成されている。   Further, the substrate mounting portion 11 is provided with power supply electrodes 15 for energizing the wafer 7 in at least three places. In this embodiment, three power supply electrodes 15A, 15B, and 15C are provided corresponding to the above three power supply blocks 13A, 13B, and 13C, and each of the power supply electrodes 15A, 15B, and 15C has an elastic band. It is formed in a plate shape.

また、図3に示されているように、上記の治具本体3の裏面には、クランプ用穴部5より下側に位置して上記のウェハ7に給電するための少なくとも3つの給電端子部としての例えば電極ピン17が露出されており、各電極ピン17と上記の給電電極15A,15B,15C間を導通するための導電線19が配線されている。なお、導電線19はチタンケーブルで構成されている。   As shown in FIG. 3, at least three power supply terminal portions for supplying power to the wafer 7 located below the clamp hole portion 5 are provided on the back surface of the jig body 3. For example, the electrode pins 17 are exposed, and conductive wires 19 are provided to connect the electrode pins 17 to the power supply electrodes 15A, 15B, and 15C. The conductive wire 19 is made of a titanium cable.

また、ウェハ7を一時的に仮置きするためのウェハ支持ブロック21が、給電ブロック13A,13Bの間と、給電ブロック13A,13Cの間に、それぞれ1つずつ設けられている。つまり、ウェハ支持ブロック21はウェハ7を基板載置部11にセットする際に落下するのを防止するために前記ウェハ7を一時的に支持するものである。   Further, one wafer support block 21 for temporarily placing the wafer 7 is provided between the power supply blocks 13A and 13B and between the power supply blocks 13A and 13C. That is, the wafer support block 21 temporarily supports the wafer 7 in order to prevent the wafer 7 from dropping when the wafer 7 is set on the substrate platform 11.

また、上記の基板載置部11には、上記の給電電極15A,15B,15Cをウェハ7に接続、離反すべく切り換えるための基板脱着装置23が設けられている。   Further, the substrate mounting portion 11 is provided with a substrate detaching device 23 for switching the power feeding electrodes 15A, 15B, and 15C to be connected to and separated from the wafer 7.

上記の基板脱着装置23について図面を参照して詳しく説明する。なお、基板脱着装置23は、給電電極15A,15B,15Cの箇所でほぼ同様であるので、給電電極15Aの基板脱着装置23を例にとって説明する。   The substrate desorbing device 23 will be described in detail with reference to the drawings. The substrate detaching apparatus 23 is substantially the same at the positions of the feeding electrodes 15A, 15B, and 15C, and therefore, the substrate detaching apparatus 23 for the feeding electrode 15A will be described as an example.

図4ないしは図7を併せて参照するに、給電ブロック13Aは、図4において下側に位置してウェハ7を載置するウェハ載置台25と、このウェハ載置台25の図4において左右の両側に立設した左、右側壁27A,27Bと、図4において上側に配置したスライドレール29と、このスライドレール29にガイドされて図4において上下方向にスライドするスライド部材31と、で構成されている。   4 and 7 together, the power supply block 13A includes a wafer mounting table 25 positioned on the lower side in FIG. 4 and mounting the wafer 7, and both left and right sides of the wafer mounting table 25 in FIG. Left and right side walls 27A and 27B, a slide rail 29 arranged on the upper side in FIG. 4, and a slide member 31 that is guided by the slide rail 29 and slides up and down in FIG. Yes.

また、上記のスライド部材31には、給電電極15Aが図4において左右幅のほぼ中央に位置してシャフトねじ部材33で固定されている。前記シャフトねじ部材33は治具本体3に前記スライド部材31のスライド方向と同方向に長く設けた長穴35に挿通して治具本体3の裏面側に突出するように図5において上下方向に延伸している。前記シャフトねじ部材33の図5において下端には前述した電極ピン17に接続する導電線19がナット部材37で連結固定されている。   Further, the power supply electrode 15 </ b> A is positioned on the slide member 31 approximately at the center of the left-right width in FIG. 4 and fixed by a shaft screw member 33. The shaft screw member 33 extends vertically in FIG. 5 so that the shaft screw member 33 is inserted into a long hole 35 provided in the jig body 3 in the same direction as the slide direction of the slide member 31 and protrudes from the back side of the jig body 3. Stretched. A conductive wire 19 connected to the electrode pin 17 described above is connected and fixed to the lower end of the shaft screw member 33 in FIG.

また、給電電極15Aは、図4及び図5に示されているように、弾力性を有する帯板状に形成された水平片39と、この水平片39の先端から図5において下方へほぼ直角で折り曲げられた端子片41で構成されている。前記水平片39の後端側が前述したようにスライド部材31にシャフトねじ部材33で固定されており、前記水平片39の先端側の端子片41の先端は例えば複数の山形形状となって前記ウェハ載置台25に載置セットされるウェハ7に対して確実に突き刺さるようになっている。   Further, as shown in FIGS. 4 and 5, the feeding electrode 15A has a horizontal piece 39 formed in a strip shape having elasticity, and a substantially right angle downward from the tip of the horizontal piece 39 in FIG. It is comprised by the terminal piece 41 bent by. As described above, the rear end side of the horizontal piece 39 is fixed to the slide member 31 by the shaft screw member 33, and the tip of the terminal piece 41 on the front end side of the horizontal piece 39 has, for example, a plurality of chevron shapes. The wafer 7 placed and set on the mounting table 25 is surely pierced.

したがって、給電電極15Aは弾力性を有する帯板状の先端側の端子片41の先端で前記ウェハ7の表面7Aを上から挟み込む方向の付勢力で前記ウェハ7に接続し、かつウェハ7を固定することができる。   Therefore, the feeding electrode 15A is connected to the wafer 7 by the biasing force in the direction of sandwiching the surface 7A of the wafer 7 from above at the tip of the terminal piece 41 on the tip side of the elastic band plate, and the wafer 7 is fixed. can do.

また、基板脱着装置23としては、大径部43と小径部45で構成されているシャフト部材47が、ウェハ載置台25の左、右側壁27A,27Bにブッシュ49を介して、前記給電電極15Aの下側で給電電極15Aの延伸方向にほぼ直交する方向にスライド自在に設けられている。また、前記大径部43は図4及び図5に示されているように給電電極15Aの端子片41を上記の付勢力に抗して前記ウェハ7の表面7Aから離反せしめるもので、前記小径部45は図6及び図7に示されているように給電電極15Aを前記付勢力でウェハ7を挟み込む原位置に復帰せしめるものである。   Further, as the substrate detaching device 23, a shaft member 47 constituted by a large diameter portion 43 and a small diameter portion 45 is provided on the left and right side walls 27A and 27B of the wafer mounting table 25 via bushes 49, and the feeding electrode 15A. On the lower side, it is slidable in a direction substantially perpendicular to the extending direction of the feeding electrode 15A. 4 and 5, the large diameter portion 43 separates the terminal piece 41 of the feeding electrode 15A from the surface 7A of the wafer 7 against the urging force. As shown in FIGS. 6 and 7, the portion 45 returns the power supply electrode 15 </ b> A to the original position where the wafer 7 is sandwiched by the biasing force.

また、シャフト部材47の両端側はそれぞれ治具本体3に設けたカラー部材51でスライド可能に支持されている。   Further, both end sides of the shaft member 47 are slidably supported by collar members 51 provided on the jig body 3.

なお、給電ブロック13B,13Cの基板脱着装置23には、上記の給電ブロック13Aの基板脱着装置23のスライドレール29とスライド部材31は設けられておらず、他は同様である。   Note that the substrate removal apparatus 23 of the power supply blocks 13B and 13C is not provided with the slide rail 29 and the slide member 31 of the substrate attachment / detachment apparatus 23 of the power supply block 13A, and the others are the same.

上記構成により、図2に示されているように、ウェハ7が表面7A側を外側に向けて、つまりウェハ7の裏面7Bをメッキ治具1の治具本体3のメッキ用穴部9の周縁に沿っている基板載置部11の給電ブロック13A,13B,13Cのウェハ載置台25に載置セットするとき、給電ブロック13Aの基板脱着装置23ではスライド部材31が図4の2点鎖線で示されているように図4において上方へ後退しており、これに伴って給電電極15Aも後退している。さらに、給電ブロック13A,13B,13Cの基板脱着装置23では、シャフト部材47が図4の矢印に示されているように大径部43を給電電極15A,15B,15Cの下側に位置するように右側へ移動される。   With the above configuration, as shown in FIG. 2, the wafer 7 faces the front surface 7 </ b> A outward, that is, the back surface 7 </ b> B of the wafer 7 is the peripheral edge of the plating hole 9 of the jig body 3 of the plating jig 1. 4, the slide member 31 is indicated by a two-dot chain line in FIG. 4 in the substrate detachment apparatus 23 of the power supply block 13 </ b> A. As shown in FIG. 4, the power supply electrode 15 </ b> A is also retracted. Further, in the substrate attachment / detachment device 23 of the power supply blocks 13A, 13B, and 13C, the shaft member 47 is arranged such that the large diameter portion 43 is positioned below the power supply electrodes 15A, 15B, and 15C as indicated by the arrows in FIG. To the right.

したがって、各給電電極15A,15B,15Cは、図5に示されているようにシャフト部材47の大径部43によって前述した下方への付勢力に抗して上方へ持ち上げられるので、給電電極15A,15B,15Cの端子片41の先端がウェハ載置台25から離反した状態である。なお、図5はスライド部材31及び給電電極15Aが前進している状態を図示しているが、実際にはウェハ7が載置される前はスライド部材31及び給電電極15Aが後退しているので、ウェハ7を載置するときに給電電極15Aの先端側の端子片41が邪魔にならない。   Accordingly, each of the power supply electrodes 15A, 15B, and 15C is lifted upward against the above-described downward biasing force by the large diameter portion 43 of the shaft member 47 as shown in FIG. , 15B, 15C, the tips of the terminal pieces 41 are separated from the wafer mounting table 25. FIG. 5 shows a state in which the slide member 31 and the power supply electrode 15A are moving forward. Actually, however, the slide member 31 and the power supply electrode 15A are moved backward before the wafer 7 is placed. When the wafer 7 is placed, the terminal piece 41 on the distal end side of the feeding electrode 15A does not get in the way.

その結果、ウェハ7は給電ブロック13A,13B,13Cのウェハ載置台25に容易に載置される。このとき、ウェハ7は落下しないようにウェハ支持ブロック21で一時的に支持されて仮置き(仮止め)されてから、給電ブロック13A,13B,13Cのウェハ載置台25の所定位置に位置決めすべく微調整される。   As a result, the wafer 7 is easily mounted on the wafer mounting table 25 of the power supply blocks 13A, 13B, and 13C. At this time, the wafer 7 is temporarily supported and temporarily placed (temporarily fixed) by the wafer support block 21 so as not to fall, and then positioned at a predetermined position of the wafer mounting table 25 of the power supply blocks 13A, 13B, and 13C. Tweaked.

次いで、給電ブロック13Aの基板脱着装置23ではスライド部材31を図4の実線で示されているように図4において下方へ前進させることで、これに伴って給電電極15Aを前進させる。   Next, in the substrate attaching / detaching device 23 of the power supply block 13A, the slide member 31 is advanced downward in FIG. 4 as shown by the solid line in FIG. 4, and thereby the power supply electrode 15A is advanced.

その後、給電ブロック13A,13B,13Cの基板脱着装置23では、シャフト部材47が図6の矢印に示されているように小径部45を給電電極15A,15B,15Cの下側に位置するように左側へ移動される。したがって、各給電電極15A,15B,15Cは、図7に示されているようにシャフト部材47の小径部45によって大径部43との差の分だけ前述した付勢力で下方の原位置に移動するので、各給電電極15A,15B,15Cの端子片41がウェハ載置台25のウェハ7を挟み込んで容易にウェハ7に接続し、かつウェハ7を固定することができる。   Then, in the board | substrate removal | desorption apparatus 23 of electric power feeding block 13A, 13B, 13C, as the shaft member 47 is shown by the arrow of FIG. 6, the small diameter part 45 is located below electric power feeding electrode 15A, 15B, 15C. Moved to the left. Accordingly, each of the power supply electrodes 15A, 15B, 15C is moved to the lower original position by the aforementioned biasing force by the small diameter portion 45 of the shaft member 47 by the difference from the large diameter portion 43 as shown in FIG. Therefore, the terminal pieces 41 of the power supply electrodes 15A, 15B, and 15C can easily connect to the wafer 7 by sandwiching the wafer 7 of the wafer mounting table 25, and can fix the wafer 7.

また、ウェハ7をメッキ治具1から外すときは、上述したウェハ7をメッキ治具1に装着する動作と逆の動作をすることで、簡単に行うことができる。   Further, when removing the wafer 7 from the plating jig 1, it can be easily performed by performing an operation opposite to the operation of mounting the wafer 7 on the plating jig 1 described above.

以上のように、この実施の形態のメッキ治具1は、大別すると、殆ど治具本体3のみで構成されるので、メッキ液の液溜まりを発生する箇所がなくなり、メッキ液の持ち出し量の低減を図ることができる。   As described above, the plating jig 1 according to this embodiment is roughly composed of only the jig body 3, so that there is no place where the plating liquid pool is generated, and the amount of the plating liquid taken out is reduced. Reduction can be achieved.

また、複数の給電電極15A,15B,15Cを治具本体3に剥き出しで設けたので、前記各給電電極15A,15B,15Cがウェハ7の表面7Aに接続されているか否かを容易に目視できる。したがって、給電接続する箇所にレジスト層が形成されているウェハ7であっても、各給電電極15A,15B,15Cでレジスト層を突き破って容易に給電接続することができるので、例えば多層のメッキ処理を行うことができる。   Further, since the plurality of power supply electrodes 15A, 15B, and 15C are provided on the jig body 3 so as to be exposed, it is possible to easily visually check whether or not the power supply electrodes 15A, 15B, and 15C are connected to the surface 7A of the wafer 7. . Therefore, even in the wafer 7 in which a resist layer is formed at a place where power supply is connected, the power supply electrode 15A, 15B, 15C can easily break through the resist layer and be connected to supply power. It can be performed.

また、複数の給電電極15A,15B,15Cを治具本体3に剥き出しで設けると共に、基板脱着装置23を設けることで、各給電電極15A,15B,15Cをその付勢力に抗してウェハ7を解放し、あるいは前記付勢力で前記ウェハ7を固定するように切り換えることができるので、ウェハ7を治具本体3に載置セットした後に、前記各給電電極15A,15B,15Cを容易に微調整することができる。   In addition, the plurality of power supply electrodes 15A, 15B, and 15C are provided on the jig body 3 so as to be exposed, and the substrate detachment device 23 is provided, so that each of the power supply electrodes 15A, 15B, and 15C is resisted against the biasing force. Since the wafer 7 can be switched to be released or fixed by the urging force, the power supply electrodes 15A, 15B, and 15C can be easily finely adjusted after the wafer 7 is placed and set on the jig body 3. can do.

すなわち、大径部43と小径部45で構成されているシャフト部材47を利用することで、給電ブロック13A,13B,13Cの基板脱着装置23を治具本体3の表面に設置することができ、簡単な構造で給電電極15A,15B,15Cをウェハ7の脱着を容易にすることができ、かつウェハ7をウェハ載置台25で容易に微調整することができる。   That is, by using the shaft member 47 constituted by the large diameter portion 43 and the small diameter portion 45, the substrate detaching device 23 of the power supply blocks 13A, 13B, 13C can be installed on the surface of the jig body 3. The power supply electrodes 15A, 15B, and 15C can be easily attached to and detached from the wafer 7 with a simple structure, and the wafer 7 can be easily finely adjusted by the wafer mounting table 25.

また、上記のように基板脱着装置23を設けたので、ウェハ7の脱着を迅速に行うことができ、大幅な脱着時間の低減を図ることができる。   In addition, since the substrate desorbing device 23 is provided as described above, the demounting of the wafer 7 can be performed quickly, and the desorption time can be greatly reduced.

この発明の実施の形態のメッキ治具の表面側の平面図である。It is a top view of the surface side of the plating jig of embodiment of this invention. 図1の矢視II−II線の断面図である。It is sectional drawing of the arrow II-II line | wire of FIG. 図1の裏面側の平面図である。It is a top view of the back surface side of FIG. 図1のIV部の基板脱着装置の拡大平面図である。FIG. 4 is an enlarged plan view of the substrate detaching apparatus in the IV part of FIG. 1. 図4の矢視V−V線の断面図である。It is sectional drawing of the arrow VV line | wire of FIG. 図1のIV部の基板脱着装置の拡大平面図である。FIG. 4 is an enlarged plan view of the substrate detaching apparatus in the IV part of FIG. 1. 図6の矢視VII−VII線の断面図である。It is sectional drawing of the arrow VII-VII line of FIG. 従来のメッキ治具の断面図である。It is sectional drawing of the conventional plating jig.

符号の説明Explanation of symbols

1 メッキ治具
3 治具本体
5 クランプ用穴部
7 ウェハ(電子回路基板)
7A 表面(ウェハの)
7B 裏面(ウェハの)
9 メッキ用穴部
11 基板載置部
13,13A,13B,13C 給電ブロック
15,15A,15B,15C 給電電極
17 電極ピン(給電端子部)
19 導電線
21 ウェハ支持ブロック
23 基板脱着装置
25 ウェハ載置台
27A,27B 左、右側壁
29 スライドレール
31 スライド部材
33 シャフトねじ部材
35 長穴
37 ナット部材
39 水平片
41 端子片
43 大径部
45 小径部
47 シャフト部材
1 Plating jig 3 Jig body 5 Clamping hole 7 Wafer (electronic circuit board)
7A Surface (of wafer)
7B Back side (wafer)
9 Plating hole 11 Substrate placement part 13, 13A, 13B, 13C Power supply block 15, 15A, 15B, 15C Power supply electrode 17 Electrode pin (power supply terminal part)
19 Conductive wire 21 Wafer support block 23 Substrate removing device 25 Wafer mounting table 27A, 27B Left, right side wall 29 Slide rail 31 Slide member 33 Shaft screw member 35 Long hole 37 Nut member 39 Horizontal piece 41 Terminal piece 43 Large diameter portion 45 Small diameter Part 47 Shaft member

Claims (3)

メッキ用穴部を備えると共にメッキすべき電子回路基板の表面を外側に向けて載置する基板載置部を前記メッキ用穴部の周縁に沿って設けた治具本体と、
前記基板載置部の複数箇所に配置した弾力性を有する板状の給電電極であって、前記板状の先端で前記電子回路基板の表面を上から挟み込む方向の付勢力で前記電子回路基板に接続する複数の給電電極と、
前記各給電電極を前記付勢力に抗して前記電子回路基板の表面から離反して解放、並びに前記各給電電極の付勢力で前記電子回路基板を挟み込んで固定すべく切り換える基板脱着装置と、で構成されていることを特徴とするメッキ治具。
A jig body provided with a substrate mounting portion provided with a plating hole portion and mounted on the outer periphery of the surface of the electronic circuit board to be plated along the periphery of the plating hole portion;
A plate-like power supply electrode having elasticity arranged at a plurality of locations on the substrate mounting portion, and is applied to the electronic circuit board with a biasing force in a direction of sandwiching the surface of the electronic circuit board from above with the plate-shaped tip. A plurality of feeding electrodes to be connected;
A substrate detaching device that switches the power supply electrodes to be released from the surface of the electronic circuit substrate against the biasing force, and to switch the electronic circuit substrate to be sandwiched and fixed by the biasing force of the power supply electrodes; A plating jig characterized by comprising.
前記基板脱着装置が、前記給電電極を前記付勢力に抗して前記電子回路基板の表面から離反せしめる大径部と、前記給電電極を前記付勢力で電子回路基板を挟み込む原位置に復帰せしめる小径部で構成するシャフト部材を、前記各給電電極の下側で給電電極の延伸方向にほぼ直交する方向にスライド自在に設けていることを特徴とする請求項1記載のメッキ治具。   The substrate detaching device has a large diameter part that moves the power supply electrode away from the surface of the electronic circuit board against the biasing force, and a small diameter that returns the power supply electrode to the original position that sandwiches the electronic circuit board by the biasing force. The plating jig according to claim 1, wherein a shaft member constituted by a portion is provided so as to be slidable in a direction substantially orthogonal to the extending direction of the power supply electrode below each of the power supply electrodes. 前記基板脱着装置が、前記複数の給電電極のうちの少なくとも1つの給電電極を、前記複数の基板載置部に載置した電子回路基板に向けて進退自在に設けたことを特徴とする請求項1又は2記載のメッキ治具。   The said board | substrate removal | desorption apparatus provided the at least 1 power supply electrode of these several power supply electrodes so that advancement / retraction was possible toward the electronic circuit board mounted in these board | substrate mounting part. The plating jig according to 1 or 2.
JP2007007124A 2007-01-16 2007-01-16 Plating jig Expired - Fee Related JP4989237B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007007124A JP4989237B2 (en) 2007-01-16 2007-01-16 Plating jig

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007007124A JP4989237B2 (en) 2007-01-16 2007-01-16 Plating jig

Publications (2)

Publication Number Publication Date
JP2008174770A true JP2008174770A (en) 2008-07-31
JP4989237B2 JP4989237B2 (en) 2012-08-01

Family

ID=39701999

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007007124A Expired - Fee Related JP4989237B2 (en) 2007-01-16 2007-01-16 Plating jig

Country Status (1)

Country Link
JP (1) JP4989237B2 (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61182031U (en) * 1985-05-07 1986-11-13
JPH0432600A (en) * 1990-05-30 1992-02-04 Fujitsu Ltd Method and device for plating
JP2004124146A (en) * 2002-10-01 2004-04-22 Nippon Sekkei Kogyo:Kk Tool for sheet deposition and tool assistance mechanism
JP2004292907A (en) * 2003-03-27 2004-10-21 Fujitsu Ltd Electrolysis device, and method for manufacturing semiconductor device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61182031U (en) * 1985-05-07 1986-11-13
JPH0432600A (en) * 1990-05-30 1992-02-04 Fujitsu Ltd Method and device for plating
JP2004124146A (en) * 2002-10-01 2004-04-22 Nippon Sekkei Kogyo:Kk Tool for sheet deposition and tool assistance mechanism
JP2004292907A (en) * 2003-03-27 2004-10-21 Fujitsu Ltd Electrolysis device, and method for manufacturing semiconductor device

Also Published As

Publication number Publication date
JP4989237B2 (en) 2012-08-01

Similar Documents

Publication Publication Date Title
CN1281107C (en) Transfer carrier for flexible printed circuit board and electronic parts mounting method to flexible printed circuit board
KR102532626B1 (en) Apparatus and method of peeling film
TW200809996A (en) ACF attachment device and ACF attachment method
JP4892326B2 (en) Plating jig
CN104759730A (en) Auxiliary welding device for components of PCBA
JP4989237B2 (en) Plating jig
KR20210075861A (en) Substrate holder
JP7483578B2 (en) Contact structure, substrate holder, plating apparatus, and method for supplying power to a substrate
KR20150039395A (en) Apparatus for treating substrate
JP7058209B2 (en) How to hold the board in the board holder
JP2006344725A (en) Manufacturing method of substrate
TWI512856B (en) Bonding stage and manufacturing method thereof
CN212601460U (en) Clamping equipment for processing PCB
CN213304064U (en) Etching jig, auxiliary feeding disc and etching jig assembly
CN213662313U (en) Cleaning clamp for processing circuit board patches
JP2006016649A (en) Plating fixture
JP2011089164A (en) Substrate holder for plating
JP5618135B2 (en) Plating substrate holder
JPH0348218Y2 (en)
JP2007005421A (en) Wafer carrier
JP2006302632A (en) Ic socket
JP2008311024A (en) Ic socket
JP2006344807A (en) Electric apparatus
JP3166818U (en) Fitting for socket substrate of integrated circuit
JP2004170236A (en) Lighting inspection device for display panel

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20091126

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20100519

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20120306

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120404

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20120424

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20120427

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150511

Year of fee payment: 3

LAPS Cancellation because of no payment of annual fees