CN213304064U - Etching jig, auxiliary feeding disc and etching jig assembly - Google Patents

Abstract

The utility model discloses an etching jig, supplementary charging tray and etching jig subassembly, etching jig subassembly include etching jig and supplementary charging tray, wherein the etching jig includes the same first splint of structure and second splint, the upper surface and the lower surface of first splint with the second splint all coat and have the metal coating, all be provided with the windowing on first splint and the second splint; the clamping device comprises a plurality of clamps, wherein the clamps are arranged at the edges of the first clamping plate and the second clamping plate and used for fixing the first clamping plate and the second clamping plate.

Description

Etching jig, auxiliary feeding disc and etching jig assembly

Technical Field

The utility model relates to the field of semiconductor technology, in particular to sculpture tool, supplementary charging tray and sculpture tool subassembly of going up.

Background

The plasma etching is the most common form in dry etching, and the principle is that ionized gas atoms are caused to physically bombard the surface of a base material through the acceleration of an electric field or the surface of the base material is etched through chemical reaction, and the surface molecules of the base material are bombarded or sputtered by utilizing free radicals in plasma to form volatile substances, so that the purpose of etching is achieved.

At present, plasma etching is widely applied in the industries of semiconductor manufacturing, packaging substrate manufacturing and the like, and the main applications are plasma cleaning, plasma etching, plasma plating, plasma coating, plasma ashing, surface activation, modification and the like. Through plasma etching treatment, the wetting capacity of the material can be improved, so that various materials can be subjected to operations such as coating, electroplating and the like, the adhesive force and the bonding force are enhanced, and organic pollutants, oil stains, grease and the like can be removed.

The conventional packaging substrate plasma etching equipment is provided with a vacuum cavity, a plurality of parallel electrodes are arranged in the vacuum cavity, a substrate to be processed is placed between the electrodes, and plasma is accelerated through a strong electric field between the parallel electrode plates to carry out plasma etching processing on surface materials on the substrate. A rack vehicle for placing the substrate is arranged in the plasma etching equipment, a corresponding substrate placing rack is arranged on the rack vehicle, the substrate is placed on the placing rack and fixed, and then the substrate is sent into the process chamber to carry out plasma etching operation.

In the plasma etching process, a strong electric field exists between electrodes, under the action of the strong electric field, the edge area of the electrodes can generate a point discharge phenomenon, and the point discharge can cause serious oxidation to metal terminals of a chip embedded on the edge of a substrate or cause the chip to lose efficacy, so that the reliability of the substrate is reduced.

SUMMERY OF THE UTILITY MODEL

The utility model discloses aim at solving one of the technical problem that exists among the prior art at least. Therefore, the utility model provides an sculpture tool, supplementary charging tray and sculpture tool subassembly of going up can prevent the oxidation of base plate edge region chip, promotes the yield and the reliability of base plate or product.

According to the utility model discloses etching tool of first aspect embodiment for fixed baseplate in the plasma etching technology, a serial communication port, include:

the clamping device comprises a first clamping plate and a second clamping plate which are identical in structure, wherein metal coatings are coated on the upper surfaces and the lower surfaces of the first clamping plate and the second clamping plate, and windows are arranged on the first clamping plate and the second clamping plate;

and a plurality of clamps installed at edges of the first clamping plate and the second clamping plate for fixing the first clamping plate and the second clamping plate.

According to the utility model discloses sculpture tool has following beneficial effect at least: in the embodiment of the utility model, the etching jig is used for fixing the substrate in the plasma etching process, the etching jig is composed of a first clamping plate and a second clamping plate, the substrate is arranged between the first clamping plate and the second clamping plate, the first clamping plate, the substrate and the second clamping plate are fixed by a clamp from the edge, the first clamping plate and the second clamping plate are provided with the windowing matched with the substrate size, the circuit or the chip area in the substrate can be exposed for plasma etching, the non-windowing area of the first clamping plate and the second clamping plate is coated with the metal coating, namely, the edge frame surface of the first clamping plate and the second clamping plate is covered by the metal, when the plasma etching is carried out, the edge metal frame can attract the point discharge generated in the electrode edge area of the plasma etching equipment, the point discharge is led to the edge of the etching jig, thereby the chip oxidation problem of the edge position of the substrate caused by the point discharge can be effectively avoided, the reliability of the substrate is improved.

According to the utility model discloses a some embodiments first splint with the edge of second splint is provided with a plurality of draw-in grooves, and is a plurality of anchor clamps correspond respectively to be installed at a plurality of draw-in groove department makes first splint with the second splint location is fixed.

According to the utility model discloses a some embodiments, first splint with still be provided with a plurality of locating holes on the second splint, distribute and be in the edge of windowing for it fixes to cooperate with supplementary charging tray first splint with between the second splint to make the base plate.

According to some embodiments of the invention, the metal coating is a copper coating.

According to the utility model discloses supplementary charging tray of second aspect embodiment for cooperate the sculpture tool in above-mentioned arbitrary embodiment, a serial communication port, include:

a first table top;

the second table top is arranged on the upper surface of the first table top, the length and the width of the first table top are larger than those of the second table top, and the length and the width of the second table top are equal to those of the window;

and the positioning column is arranged on the first table top and can penetrate through the positioning hole of the etching jig, so that the etching jig is fixed on the auxiliary feeding disc.

According to the utility model discloses supplementary charging tray has following beneficial effect at least: the auxiliary feeding disc is used for assisting an etching jig mounting base plate and consists of a first table top and a second table top, the second table top is arranged on the first table top, the length and the width of the second table top are smaller than those of the first table top and are distributed in a step shape with the first table top, a positioning column is arranged at the edge position of the first table top, when the base plate is mounted, a first clamping plate or a second clamping plate is firstly mounted on the auxiliary feeding disc, the edge of the first clamping plate or the second clamping plate is provided with a positioning hole matched with the positioning column, the positioning column penetrates through the positioning hole to fix the first clamping plate or the second clamping plate on the auxiliary feeding disc, and as the first clamping plate or the second clamping plate is provided with a window, the length and the width of the window are equal to those of the second table top, the first clamping plate or the second clamping plate is just embedded between the first table top and the second table top of the, the base plate is arranged on the upper surface of the first clamping plate and is positioned and fixed through the positioning column, the second clamping plate or the first clamping plate is arranged and fixed through the positioning hole and the positioning column again, the first clamping plate, the base plate and the second clamping plate are fixed through the clamp, the etching jig and the base plate are installed, the etching jig fixed with the base plate is further separated from the auxiliary feeding disc, and the etching jig is sent into the etching equipment for plasma etching.

According to some embodiments of the invention, the length and the width of the first table-top are smaller than the length and the width of the first clamping plate or the second clamping plate of the etching jig.

According to some embodiments of the present invention, the height of the second table surface is less than or equal to the height of the first clamping plate or the second clamping plate of the etching jig.

According to the utility model discloses etching tool subassembly of third aspect embodiment for fixed baseplate in the plasma etching technology, a serial communication port, including above-mentioned arbitrary embodiment etching tool and supplementary charging tray.

According to the utility model discloses sculpture tool subassembly has following beneficial effect at least: by adopting the etching jig and the auxiliary feeding disc, point discharge generated in the edge area of the electrode of the plasma etching equipment can be led to the edge of the etching jig, so that the problem of chip oxidation at the edge position of the substrate caused by the point discharge can be effectively avoided, and the reliability of the substrate is improved.

Additional aspects and advantages of the invention will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the invention.

Drawings

The above and/or additional aspects and advantages of the present invention will become apparent and readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings of which:

fig. 1 is an exploded view of an etching jig assembly according to an embodiment of the present invention;

fig. 2 is a top view of an etching jig according to an embodiment of the present invention;

FIG. 3 is a cross-sectional view of an auxiliary feeding tray according to an embodiment of the present invention;

fig. 4 is a cross-sectional view of the etching jig assembly according to the embodiment of the present invention, with respect to the relationship between the etching jig and the auxiliary loading tray.

The etching jig 100, the first clamping plate 110, the second clamping plate 120, the window 130, the clamp 140, the clamping groove 150, the positioning hole 160, the auxiliary feeding tray 200, the first table 210, the second table 220 and the positioning column 230.

Detailed Description

Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the drawings are exemplary only for the purpose of explaining the present invention, and should not be construed as limiting the present invention.

In the description of the present invention, it should be understood that the orientation or positional relationship indicated with respect to the orientation description, such as up, down, front, rear, left, right, etc., is based on the orientation or positional relationship shown in the drawings, and is only for convenience of description and simplification of description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention.

In the description of the present invention, a plurality of means are one or more, a plurality of means are two or more, and the terms greater than, less than, exceeding, etc. are understood as not including the present number, and the terms greater than, less than, within, etc. are understood as including the present number. If the first and second are described for the purpose of distinguishing technical features, they are not to be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated or implicitly indicating the precedence of the technical features indicated.

In the description of the present invention, unless there is an explicit limitation, the words such as setting, installation, connection, etc. should be understood in a broad sense, and those skilled in the art can reasonably determine the specific meanings of the above words in combination with the specific contents of the technical solution.

Referring to fig. 1 and 2, in some embodiments of the present application, an etching jig 100 is provided, which includes a first clamping plate 110 and a second clamping plate 120 having the same structure, wherein upper and lower surfaces of the first clamping plate 110 and the second clamping plate 120 are coated with a metal coating, and the first clamping plate 110 and the second clamping plate 120 are provided with a window 130; and a plurality of clamps 140 mounted on edges of the first clamping plate 110 and the second clamping plate 120 for fixing the first clamping plate 110 and the second clamping plate 120.

In an embodiment, the etching jig 100 is used for fixing a substrate in a plasma etching process to prevent the edge of the substrate from being oxidized, the etching jig 100 is composed of a first clamping plate 110 and a second clamping plate 120, the substrate is disposed between the first clamping plate 110 and the second clamping plate 120, the first clamping plate 110, the substrate and the second clamping plate 120 are fixed from the edge by a clamp 140, a window 130 with a matched substrate size is disposed in the first clamping plate 110 and the second clamping plate 120, a circuit or a chip area in the substrate can be exposed to perform plasma etching, a non-window 130 area of the first clamping plate 110 and the second clamping plate 120 is coated with a metal coating, that is, the surface of an edge frame of the first clamping plate 110 and the second clamping plate 120 is covered by metal, when performing plasma etching, the edge metal frame can attract a point discharge occurring in an electrode edge area of a plasma etching device to cause the point discharge to etch the edge of the jig 100, therefore, the problem of chip oxidation at the edge position of the substrate caused by point discharge can be effectively avoided, and the reliability of the substrate is improved.

It should be noted that the size of the window and the overall size of the etching tool 100 can be adjusted according to the size of the electrode of the plasma etching apparatus and the size of the substrate to be etched.

Referring to fig. 1 and 2, in some embodiments of the present application, a plurality of clamping grooves 150 are formed at edges of the first clamping plate 110 and the second clamping plate 120, and a plurality of clamps 140 are respectively mounted at the plurality of clamping grooves 150 to fix the first clamping plate 110 and the second clamping plate 120 in position.

In an embodiment, a plurality of clamping grooves 150 are formed on the edges of the first clamping plate 110 and the second clamping plate 120, the clamping grooves 150 are used for placing the clamp 140, and the clamp 140 is fixed at the clamping grooves 150, so that the first clamping plate 110 and the second clamping plate 120 are prevented from shifting.

Referring to fig. 1 and 2, in some embodiments of the present application, a plurality of positioning holes 160 are further disposed on the first clamping plate 110 and the second clamping plate 120, and are distributed at the edge of the window 130, for cooperating with the auxiliary charging tray 200 to fix the substrate between the first clamping plate 110 and the second clamping plate 120.

In an embodiment, positioning holes 160 are further disposed around the windows 130 of the first clamping plate 110 and the second clamping plate 120, and the first clamping plate 110, the base plate, and the second clamping plate 120 can be integrally fixed on the auxiliary upper tray 200 by the cooperation of the positioning holes 160 and the positioning posts 230 on the auxiliary upper tray 200, and the positions of the first clamping plate 110, the base plate, and the second clamping plate 120 are relatively fixed.

In some embodiments of the present application, the metal coating is a copper coating. In one embodiment, the surfaces of the first clamping plate 110 and the second clamping plate 120 need to be coated with a metal coating so as to attract the point discharge generated in the electrode edge area of the plasma etching apparatus, the metal coating comprises any metal capable of attracting the point discharge, such as iron, copper, aluminum, and the like, preferably, in one embodiment of the present application, the surfaces of the first clamping plate 110 and the second clamping plate 120 are coated with copper, that is, the first clamping plate 110 and/or the second clamping plate 120 are made of copper-clad plates.

Referring to fig. 1 to 4, in some embodiments of the present application, there is further provided an auxiliary loading tray 200, where the auxiliary loading tray 200 is used to cooperate with the etching jig 100 in any one of the above embodiments, and includes: a first mesa 210; the second table-board 220 is arranged on the upper surface of the first table-board 210, the length and the width of the first table-board 210 are larger than those of the second table-board 220, and the length and the width of the second table-board 220 are equal to those of the open window 130; the positioning posts 230 are disposed on the first platform 210, and the positioning posts 230 can pass through the positioning holes 160 of the etching jig, so that the etching jig 100 is fixed on the auxiliary upper tray 200.

In an embodiment, the auxiliary upper tray 200 is used for assisting the etching jig 100 to mount a substrate, the auxiliary upper tray 200 is composed of a first table 210 and a second table 220, the second table 220 is disposed on the first table 210, the length and width of the second table are smaller than those of the first table 210, the second table is distributed in a step shape with the first table 210, positioning posts 230 are disposed on the first table 210, when the substrate is mounted, the first clamping plate 110 or the second clamping plate 120 is first mounted on the auxiliary upper tray 200, positioning holes 160 matched with the positioning posts 230 are disposed at the edge of the first clamping plate 110 or the second clamping plate 120, the positioning posts 230 pass through the positioning holes 160, the first clamping plate 110 or the second clamping plate 120 is fixed on the auxiliary upper tray 200, because the first clamping plate 110 or the second clamping plate 120 is provided with the windows 130, the length and width of the windows 130 are equal to the length and width of the second table 220, so that the first clamping plate 110 or the second clamping plate 120 is exactly embedded between the first table 210 and the second table 220 of, the substrate is fixed by the positioning column 230, the second clamping plate 120 or the first clamping plate 110 is fixed by the positioning hole 160 and the positioning column 230 through the positioning hole 230 and the positioning column 230, the first clamping plate 110, the substrate and the second clamping plate are fixed by the clamp 140, the etching jig 100 and the substrate are installed, the etching jig 100 fixed with the substrate is further separated from the auxiliary feeding disc 200, and the etching jig 100 is sent into etching equipment for plasma etching.

Referring to fig. 1-4, in some embodiments of the present application, the length and width of the first table top 210 is less than the length and width of the first clamping plate 110 or the second clamping plate 120. In an embodiment, the edge of the first clamping plate 110 and the second clamping plate 120 is provided with a clamping groove 150, the clamp 140 positions and fixes the first clamping plate 110 and the second clamping plate 120 through the clamping groove 150, the first table 210 is disposed below the first clamping plate 110 or the second clamping plate 120, and plays a role of temporary support, if the length and the width of the first table 210 are greater than or equal to the length and the width of the first clamping plate 110 or the second clamping plate 120, the first table is fixed by the influence clamp 140, therefore, the length and the width of the first table 210 need to be smaller than the length and the width of the first clamping plate 110 or the second clamping plate 120, and the size of the specific smaller dimension is determined by the edge distance occupied by the non-influence clamp 140.

Referring to fig. 1-4, in some embodiments of the present application, the height h2 of the second table top 220 is less than or equal to the height h1 of the first clamping plate 110 or the second clamping plate 120. In an embodiment, one of the first clamping plate 110 or the second clamping plate 120 is embedded at the step formed by the first mesa 210 and the second mesa 220, the length and the width of the second mesa 220 are equal to those of the window 130, the second mesa 220 can fix the first clamping plate 110 or the second clamping plate 120, and the height h2 of the second mesa 220 is required to be less than or equal to the height h1 of the first clamping plate 110 or the second clamping plate 120, so that a subsequently placed substrate can be in direct contact with the first clamping plate 110 or the second clamping plate 120, and the substrate and the clamping plate can be fixed more firmly.

Referring to fig. 4, in one embodiment, the positioning posts 230 are also used to fix the substrate in the windows 130. In an embodiment, the positioning columns 230 are disposed on two sides of the auxiliary feeding tray 200, and can be used for right-angle fixation on two sides in the left or right direction and the upper or lower direction, or can be used for linear fixation from one side in the left or right direction or the upper and lower direction, preferably, in an embodiment of the present application, the right-angle fixation is adopted, the substrate can be flexibly adjusted, and the positioning columns 230 can fix the first clamping plate 110, the second clamping plate 120 and the auxiliary feeding tray 200, and can also position the substrate, so that the substrate is fixed at the position of the window 130 opened in the first clamping plate 110 and the second clamping plate 120.

Referring to fig. 1 to 3, in some embodiments of the present application, there is also provided an etching jig assembly for fixing a substrate in a plasma etching process to prevent an edge of the substrate from being oxidized, the etching jig assembly including: the etching fixture 100 and the auxiliary loading tray 200 according to any of the above embodiments.

In an embodiment, the etching jig assembly includes an etching jig 100 and an auxiliary feeding tray 200, the auxiliary feeding tray 200 is used for auxiliary installation of a substrate, the substrate is installed on the etching jig 100 for substrate positioning and fixing, the etching jig 100 has a structure that an edge metal frame can attract point discharge generated in an electrode edge area of a plasma etching device, so that the point discharge is led to the edge of the etching jig 100, thereby effectively avoiding a chip oxidation problem of a substrate edge position caused by the point discharge, and improving the reliability of the substrate.

The present embodiment has been described in detail with reference to the accompanying drawings, but the present invention is not limited to the above embodiments, and various changes can be made without departing from the gist of the present invention within the knowledge of those skilled in the art.

Claims (8)

1. An etching jig is used for fixing a substrate in a plasma etching process, and is characterized by comprising:

the clamping device comprises a first clamping plate and a second clamping plate which are identical in structure, wherein metal coatings are coated on the upper surfaces and the lower surfaces of the first clamping plate and the second clamping plate, and windows are arranged on the first clamping plate and the second clamping plate;

and a plurality of clamps installed at edges of the first clamping plate and the second clamping plate for fixing the first clamping plate and the second clamping plate.

2. The etching jig according to claim 1, wherein a plurality of clamping grooves are formed in edges of the first clamping plate and the second clamping plate, and the plurality of clamps are correspondingly mounted on the plurality of clamping grooves respectively so as to fix the first clamping plate and the second clamping plate.

3. The etching jig of claim 1, wherein the first clamping plate and the second clamping plate are further provided with a plurality of positioning holes distributed on the edge of the window for matching with an auxiliary feeding disc to fix the substrate between the first clamping plate and the second clamping plate.

4. The etching fixture of claim 1, wherein the metal coating is a copper coating.

5. An auxiliary loading tray for matching with the etching jig of any one of claims 1 to 4, comprising:

a first table top;

the second table top is arranged on the upper surface of the first table top, the length and the width of the first table top are larger than those of the second table top, and the length and the width of the second table top are equal to those of the window;

and the positioning column is arranged on the first table top and can penetrate through the positioning hole of the etching jig, so that the etching jig is fixed on the auxiliary feeding disc.

6. The auxiliary feeding tray according to claim 5, wherein the length and width of the first table surface are smaller than those of the first clamping plate or the second clamping plate of the etching jig.

7. The auxiliary feeding tray according to claim 5, wherein the height of the second table is greater than or equal to the height of the first clamping plate or the second clamping plate of the etching jig.

8. The utility model provides an etching tool subassembly for fixed base plate in plasma etching technology, its characterized in that includes:

the etching jig of any one of claims 1 to 4 and the auxiliary loading tray of any one of claims 5 to 7.

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