JP2006016649A - Plating fixture - Google Patents

Plating fixture Download PDF

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Publication number
JP2006016649A
JP2006016649A JP2004193948A JP2004193948A JP2006016649A JP 2006016649 A JP2006016649 A JP 2006016649A JP 2004193948 A JP2004193948 A JP 2004193948A JP 2004193948 A JP2004193948 A JP 2004193948A JP 2006016649 A JP2006016649 A JP 2006016649A
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plated
plating
ring
opening
shaped
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JP2004193948A
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JP4280685B2 (en
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Tsunayoshi Aoki
綱芳 青木
Kenichiro Haruki
健一郎 春木
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Fujikura Ltd
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Fujikura Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a plating fixture capable of ensuring a secure sealed state at the time when being sunk into a plating liquid. <P>SOLUTION: The plating fixture is composed of: a base member 3 comprising a plurality of power feeding electrodes 7 provided along the opening periphery of an opening 5 penetrated up and down; a ring-shaped first sealing member 9 arranged along the opening periphery of the opening 5 and mounted and set with the surface of a plating body 17 formed into a sheet shape electrically connected with the power feeding electrode 7; a covering member 21 of covering the whole of the back face of the plating body 17 set in the first sealing member 9; a plating body pressing member 19 coming into contact with the covering member 21 and the back face of the plating body 17, respectively, and pressing the plating body 17 toward the first sealing member 9; and a ring-shaped secondary sealing member 27 arranged along the outer circumference of the plating body pressing member 19, and the covering member 21 and the base member 3 are joined with a plurality of joining tools 9 with the second sealing member 27 sandwiched. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明はウエハ等の表面にのみメッキを施すのに適するメッキ治具に関する。   The present invention relates to a plating jig suitable for plating only the surface of a wafer or the like.

一般に半導体等を実装するウエハ等の表面には銅メッキが施されるようになっている。   In general, copper plating is applied to the surface of a wafer or the like on which a semiconductor or the like is mounted.

ウエハの表面に銅メッキを施すには、メッキ液が満たされたメッキ槽内にウエハ全体を沈めることでメッキが施されるようになるが、前記した通りウエハの表面にのみメッキされるようになっている。ウエハの周縁部及び裏面の一部分にメッキが施されるようになると不良品となって廃棄処分されるため、メッキ作業にあたってウエハの表面のみ露出するようメッキ治具にセットし、メッキ治具ごとメッキ槽内へ沈める手段を採っている。   In order to perform copper plating on the surface of the wafer, plating is performed by immersing the entire wafer in a plating tank filled with a plating solution. However, as described above, plating is performed only on the surface of the wafer. It has become. When plating is performed on the peripheral edge and part of the back surface of the wafer, it is discarded as a defective product. Therefore, in the plating operation, set the plating jig so that only the wafer surface is exposed. The means to sink into the tank is taken.

一般的な公知のメッキ治具の概要は、ゴム製のシールカバー内にウエハをセットすることで、その弾性力によって周縁部及び裏面側にメッキ液が侵入することがないようシールされ、表面のみ露出する構造となっている。   An outline of a general known plating jig is that a wafer is set in a rubber seal cover, which is sealed so that the plating solution does not invade the peripheral portion and the back side by the elastic force, and only the front surface. It has an exposed structure.

ゴム製のシールカバーは、ウエハの表面を除いて全体がカバーされるようになるが、シールカバーに対するウエハのセット管理を怠たるとメッキ液の中へ沈めた時にメッキ液が裏面へ回り込み不良品につながる問題があり、いかに歩留りをアップさせるかが課題となっている。   The rubber seal cover covers the entire surface except for the wafer surface. However, if the wafer is not properly set on the seal cover, the plating solution will wrap around the plating solution and become a defective product. There is a problem of connection, and how to increase the yield is an issue.

そこで、本発明は、メッキ液の中へ沈めた時に確実なシール状態を確保することができるメッキ治具を提供することを目的としている。   Therefore, an object of the present invention is to provide a plating jig capable of ensuring a reliable sealing state when submerged in a plating solution.

前記目的を達成するために、本発明にあっては、上下に貫通した開口の開口周縁に沿って設けられた複数の給電電極を有するベース部材と、前記開口の開口周縁に沿って配置され前記給電電極と電気的に接続し合う板状の形成された被メッキ体の表面が載置セットされるリング状の第1シール部材と、その第1シール部材にセットされる前記被メッキ体の裏面全体を覆うカバー部材と、そのカバー部材と前記被メッキ体の裏面とそれぞれ接触し前記被メッキ体を前記第1シール部材へ向けて押えつける被メッキ押え部材と、前記被メッキ押え部材の外周に沿って配置されたリング状の第2シール部材と、前記カバー部材とベース部材とを前記第2シール部材を挟んで締結する複数の締結具とから成ることを特徴とする。   In order to achieve the above object, in the present invention, a base member having a plurality of feeding electrodes provided along an opening periphery of an opening penetrating vertically, and disposed along the opening periphery of the opening. A ring-shaped first seal member on which the surface of the plate-shaped object to be electrically connected to the power supply electrode is placed and set, and the back surface of the object to be plated set on the first seal member A cover member that covers the entire surface, a plate holding member that contacts the cover member and the back surface of the member to be plated and presses the member to be plated toward the first seal member, and an outer periphery of the plate holding member. A ring-shaped second seal member disposed along the plurality of fasteners that fasten the cover member and the base member with the second seal member interposed therebetween.

本発明のメッキ治具によれば、被メッキ体の表面が露出する開口はリング状の第1シール部材によって確実にシールされ、開口周縁部から侵入するメッキ液を確実に阻止することができる。   According to the plating jig of the present invention, the opening through which the surface of the object to be plated is exposed is reliably sealed by the ring-shaped first seal member, and the plating solution entering from the peripheral edge of the opening can be reliably prevented.

また、カバー部材とベース部材との間はリング状の第2シール部材を挟んで締結されるため、その第2シール部材によって全周が確実にシールされ、被メッキ体の周縁部及び裏面へのメッキ液の侵入を確実に阻止することができるようになり、歩留りの向上が図れる。   Further, since the cover member and the base member are fastened with the ring-shaped second seal member sandwiched therebetween, the entire circumference is surely sealed by the second seal member, and the periphery of the object to be plated and the back surface are sealed. Intrusion of the plating solution can be surely prevented, and the yield can be improved.

第1には、前記被メッキ押え部材を、リング状の円板と、その円板の中央部位に設けられ前記カバー部材の内壁面と接触し合う上下伸縮調整可能な突起体と、前記円板に設けられ前記被メッキ体の裏面外周縁に沿って弾接し合うリング状の弾性部材とによって、全周面にわたってほぼ均一なシール圧が作用する構造とする。   First, the pressed member to be plated includes a ring-shaped disk, a protrusion that is provided at a central portion of the disk and that can be adjusted in the vertical direction to contact the inner wall surface of the cover member, and the disk And a ring-shaped elastic member elastically contacting along the outer peripheral edge of the back surface of the object to be plated so that a substantially uniform sealing pressure acts on the entire peripheral surface.

第2には、前記給電電極を、帯板状に形成された水平部と垂直部とで形成し、前記水平部を前記垂直部を介して入力される入力荷重に対して反発力を備えた弾性体によって支持する一方、前記垂直部の先端縁を前記被メッキ体と電気的に接続させ、弾性体による弾性反力を利用することで給電電極の先端を被メッキ体に確実に接続させる構造とする。   Second, the feeding electrode is formed of a horizontal portion and a vertical portion formed in a strip shape, and the horizontal portion has a repulsive force against an input load input through the vertical portion. A structure in which the tip end of the vertical portion is electrically connected to the object to be plated and the tip of the feeding electrode is securely connected to the object to be plated by utilizing an elastic reaction force by the elastic body while being supported by the elastic body. And

第3には、前記給電電極の垂直部先端縁を、複数の山形形状とし、その山形形状によって被メッキ体に給電電極の先端が確実に突刺さる接続状態が得られる構造とする。   Thirdly, the vertical edge of the feeding electrode has a plurality of chevron shapes, and the chevron shape ensures a connection state in which the tip of the power feeding electrode reliably pierces the object to be plated.

以下、図1乃至図5の図面を参照しながら本発明の実施の形態について具体的に説明する。   Hereinafter, embodiments of the present invention will be specifically described with reference to FIGS. 1 to 5.

図1はメッキ治具の概要断面図、図2はメッキ治具の概要分解断面図をそれぞれ示している。   FIG. 1 is a schematic sectional view of the plating jig, and FIG. 2 is a schematic exploded sectional view of the plating jig.

メッキ治具1のベース部材3は、図1において上下に貫通した開口5とその開口周縁に沿って配置され図外のメッキ槽内に設けられる陽極に対して陰極となる複数の給電電極7を有している。前記開口5の開口周縁には、その開口周縁に沿ってリング状の第1シール部材9が設けられている。   The base member 3 of the plating jig 1 includes a plurality of power supply electrodes 7 that serve as cathodes with respect to an opening 5 penetrating vertically in FIG. 1 and an anode provided in a plating tank outside the drawing. Have. A ring-shaped first seal member 9 is provided on the opening periphery of the opening 5 along the opening periphery.

給電電極7は帯板状に形成された水平部11とその水平部11から垂直に立上がる垂直部13とから成り、水平部11は、上方からの荷重に対して弾性反力を備えた弾性体15の上面に載置されている。この場合、弾性体15は独立して設けてもよく、前記第1シール部材9と一体の一体形成であってもよい。   The feeding electrode 7 includes a horizontal portion 11 formed in a strip shape and a vertical portion 13 rising vertically from the horizontal portion 11, and the horizontal portion 11 is elastic with an elastic reaction force against a load from above. It is placed on the upper surface of the body 15. In this case, the elastic body 15 may be provided independently, or may be integrally formed with the first seal member 9.

垂直部13は、前記第1シール部材9に沿って上方へ延長され、その垂直部先端縁13aは図3に示すように複数の山形形状となっていて前記第1シール部材9に載置セットされるウエハ等の被メッキ体17に対して確実に突刺さるようになっている。この場合、山形形状は2連となっているが3連又は4連であってもよい。   The vertical portion 13 extends upward along the first seal member 9, and the vertical portion tip edge 13 a has a plurality of chevron shapes as shown in FIG. 3 and is placed on the first seal member 9. It is ensured to pierce the object 17 such as a wafer to be plated. In this case, the chevron shape is double, but it may be triple or quadruple.

被メッキ体17は板状に形成され前記開口5を介して表面17aにのみ銅メッキが施されるようになっている。被メッキ体17の裏面17bには、被メッキ押え部材19と、さらにその被メッキ押え部材19全体をカバーするカバー部材21がそれぞれ設けられている。   The object to be plated 17 is formed in a plate shape, and copper plating is applied only to the surface 17 a through the opening 5. A plated member 19 and a cover member 21 that covers the entire plated member 19 are provided on the back surface 17b of the object 17 to be plated.

被メッキ押え部材19は、所定の板厚により面剛性を備えた円板20と、その円板20の中央部位に設けられたねじ式の突起体23と、前記円板20の裏面外周縁に沿って配置されたリング状の弾性部材25とで形成されている。   The to-be-plated holding member 19 includes a disc 20 having surface rigidity with a predetermined plate thickness, a screw-type protrusion 23 provided at a central portion of the disc 20, and a rear outer peripheral edge of the disc 20. It is formed with the ring-shaped elastic member 25 arrange | positioned along.

リング状の弾性部材25は前記第1シール部材9に載置セットされる被メッキ体17の裏面17b外周縁に沿って弾接している。   The ring-shaped elastic member 25 is elastically contacted along the outer peripheral edge of the back surface 17b of the body 17 to be plated placed and set on the first seal member 9.

突起体23は、外周に雄ねじが設けられたスクリュウねじとなっていて円板20の中央に設けられた雌ねじ孔に螺合し、左又は右回転させることで、円板20の上面から上方へ突出する突出量の調整が可能となっている。したがって、突起体23の先端頭部がカバー部材21の内壁面と突当ることで上方からの荷重Wは、前記突起体23が中央部位に位置するという条件と相俟って、前記円板20を介して弾性部材25にほぼ均一に伝達されるようになっている。これにより、被メッキ体7の外周縁は図1下向きに均等に押えつけられる作用が働き全周面にわたって前記第1シール部材9による均一なシール圧が確保されるようになっている。   The protrusion 23 is a screw screw provided with a male screw on the outer periphery, and is screwed into a female screw hole provided in the center of the disk 20 and rotated left or right, so that the protrusion 20 moves upward from the upper surface of the disk 20. The amount of protrusion can be adjusted. Accordingly, the load W from above due to the front end of the protrusion 23 abutting against the inner wall surface of the cover member 21 is coupled with the condition that the protrusion 23 is positioned at the central portion, and the disk 20. Is transmitted almost uniformly to the elastic member 25 via the. As a result, the outer peripheral edge of the object 7 to be plated is pressed evenly downward in FIG. 1 to ensure a uniform sealing pressure by the first seal member 9 over the entire peripheral surface.

カバー部材21は、丸い板状に形成され、リング状の第2シール部材27を挟んで前記ベース部材3と締結可能となっている。カバー部材21の内側外周縁には、第2シール部材セット溝28が全周にわたって設けられると共にその外側に締結用の締結孔30が所定の間隔で7つ設けられている。   The cover member 21 is formed in a round plate shape and can be fastened to the base member 3 with the ring-shaped second seal member 27 interposed therebetween. A second seal member setting groove 28 is provided on the entire inner periphery of the cover member 21 and seven fastening holes 30 are provided outside the cover member 21 at predetermined intervals.

第2シール部材27は、前記被メッキ押え部材19の外周に沿ってリング状に配置されベース部材3とカバー部材21との間を全周にわたってシールするようになっている。   The second seal member 27 is arranged in a ring shape along the outer periphery of the plated presser member 19 and seals between the base member 3 and the cover member 21 over the entire periphery.

カバー部材21とベース部材3を締結する締結具29は、ボルトタイプとなっていて、前記カバー部材21の締結孔30から挿入され、先端部は前記ベース部材3のねじ孔3aと螺合し合う形状となっている。この場合、締結具29はベース部材3から立上がると共に締結孔30を貫通した後、ナットが螺合されるセットボルトタイプであってもよい。   A fastener 29 that fastens the cover member 21 and the base member 3 is a bolt type, and is inserted from the fastening hole 30 of the cover member 21, and the tip portion is screwed into the screw hole 3 a of the base member 3. It has a shape. In this case, the fastener 29 may be a set bolt type in which a nut is screwed after rising from the base member 3 and passing through the fastening hole 30.

したがって、締結具29を取外すことでベース部材3に対する被メッキ押え部材19及びカバー部材21の取外しが可能となり、被メッキ体17のセットが可能となる。   Therefore, by removing the fasteners 29, it is possible to remove the member to be plated 19 and the cover member 21 from the base member 3, and the object to be plated 17 can be set.

このように構成されたメッキ治具1によれば、ウエハ等の被メッキ体17を図1に示すようにセットした後、締結具29を締付けることで、前記第2シール部材27を挟んでカバー部材21とベース部材3との締結状態が確保され、全周にわたって確実なシール状態が得られる。   According to the plating jig 1 configured in this way, after the object to be plated 17 such as a wafer is set as shown in FIG. 1, the fastener 29 is tightened to sandwich the second seal member 27. The fastening state of the member 21 and the base member 3 is ensured, and a reliable sealing state is obtained over the entire circumference.

この締結時において、カバー部材21からの荷重Wは突起体23に伝達される。この時、締結具29による締結力が場所によって異なっても、中央部位の突起体23により円板20を介して弾性部材25にほぼ均等に伝達され、被メッキ体17を押圧する。押圧された被メッキ体17は、図4の鎖線から実線に示すように第1シール部材9及び弾性体15の弾性反力に抗して給電電極7の垂直部先端縁13aを下方へ押圧する。この押圧により蓄積された弾性反力によって第1シール部材9は被メッキ体17と確実に密着し合い全周にわたって確実なシール状態が得られる。   At the time of this fastening, the load W from the cover member 21 is transmitted to the protrusion 23. At this time, even if the fastening force by the fastener 29 varies depending on the location, the projection 23 in the central portion is transmitted almost uniformly to the elastic member 25 via the disk 20 and presses the object 17 to be plated. The pressed object to be plated 17 presses the vertical end edge 13a of the feeding electrode 7 downward against the elastic reaction force of the first seal member 9 and the elastic body 15 as shown by the solid line from the chain line in FIG. . Due to the elastic reaction force accumulated by this pressing, the first seal member 9 is in close contact with the object to be plated 17 and a reliable sealing state is obtained over the entire circumference.

同時に給電電極7は、弾性体15の弾性反力によって山形状の垂直部先端線13aは前記被メッキ体17に突刺さり確実な接続状態が得られるようになる。   At the same time, the power supply electrode 7 is pierced into the plated body 17 by the elastic reaction force of the elastic body 15 so that the mountain-shaped vertical tip end line 13a is pierced into the plated body 17 so that a reliable connection state is obtained.

したがって、被メッキ体17がセットされたメッキ治具1のベース部材3を図外のメッキ槽内へ縦に並べてセットすることで、被メッキ体17の表面のみ銅メッキが確実に得られるようになり、歩留りの向上が図れる。   Therefore, by setting the base member 3 of the plating jig 1 on which the object to be plated 17 is set vertically in a plating tank not shown in the drawing, copper plating can be reliably obtained only on the surface of the object 17 to be plated. Thus, the yield can be improved.

本発明にかかるメッキ治具の概要断面図。The outline sectional view of the plating jig concerning the present invention. メッキ治具の概要分解断面図。The outline exploded sectional view of a plating jig. 給電電極の概要斜視図。The outline perspective view of a feed electrode. 給電電極の垂直部先端縁と被メッキ体の接続状態を示す説明図。Explanatory drawing which shows the connection state of the to-be-plated body and the vertical-part front-end edge of a feed electrode. ベース部材とそのベース部材から取外したカバー部材を裏から見た概要平面図。The outline top view which looked at the base member and the cover member removed from the base member from the back.

符号の説明Explanation of symbols

3…ベース部材
5…開口
7…給電電極
9…第1シール部材
11…水平部
13…垂直部
13a…垂直部先端縁
15…弾性体
17…被メッキ体
19…被メッキ押え部材
20…円板
21…カバー部材
23…突起体
25…弾性部材
27…第2シール部材
29…締結具
DESCRIPTION OF SYMBOLS 3 ... Base member 5 ... Opening 7 ... Feed electrode 9 ... 1st sealing member 11 ... Horizontal part 13 ... Vertical part 13a ... Vertical part front edge 15 ... Elastic body 17 ... Plated body 19 ... Plated pressing member 20 ... Disc 21 ... Cover member 23 ... Projection body 25 ... Elastic member 27 ... Second seal member 29 ... Fastener

Claims (4)

上下に貫通した開口の開口周縁に沿って設けられた複数の給電電極を有するベース部材と、前記開口の開口周縁に沿って配置され前記給電電極と電気的に接続し合う板状に形成された被メッキ体の表面が載置セットされるリング状の第1シール部材と、その第1シール部材にセットされる前記被メッキ体の裏面全体を覆うカバー部材と、そのカバー部材と前記被メッキ体の裏面とそれぞれ接触し前記被メッキ体を前記第1シール部材へ向けて押えつける被メッキ押え部材と、前記被メッキ押え部材の外周に沿って配置されたリング状の第2のシール部材と、前記カバー部材とベース部材とを前記第2シール部材を挟んで締結する複数の締結具とから成ることを特徴とするメッキ治具。   A base member having a plurality of power supply electrodes provided along an opening periphery of an opening penetrating vertically, and a plate shape disposed along the opening periphery of the opening and electrically connected to the power supply electrode A ring-shaped first seal member on which the surface of the object to be plated is placed and set, a cover member that covers the entire back surface of the object to be plated set on the first seal member, the cover member, and the object to be plated A to-be-plated holding member that presses the object to be plated against the first seal member, and a ring-shaped second seal member disposed along the outer periphery of the to-be-plated holding member, A plating jig comprising a plurality of fasteners for fastening the cover member and the base member with the second seal member interposed therebetween. 前記被メッキ押え部材は、リング状の円板と、その円板の中央部位に設けられ前記カバー部材の内壁面と接触し合う上下に伸縮調整可能な突起体と、前記円板に設けられ前記被メッキ体の裏面外周縁に沿って弾接し合うリング状の弾性部材とから成ることを特徴とする請求項1記載のメッキ治具。   The plate member to be plated is a ring-shaped disk, a protrusion that is provided at a central portion of the disk and that can be adjusted to expand and contract in contact with the inner wall surface of the cover member, and the disk. The plating jig according to claim 1, comprising a ring-shaped elastic member that elastically contacts along the outer peripheral edge of the back surface of the object to be plated. 前記給電電極は、帯板状に形成された水平部と垂直部とで形成され、前記水平部は前記垂直部を介して入力される入力荷重に対して、弾性反力を備えた弾性体に支持される一方、前記垂直部の先端縁は前記被メッキ体と電気的に接続していることを特徴とする請求項1記載のメッキ治具。   The feeding electrode is formed of a horizontal portion and a vertical portion formed in a strip shape, and the horizontal portion is an elastic body having an elastic reaction force with respect to an input load input through the vertical portion. The plating jig according to claim 1, wherein the tip edge of the vertical portion is electrically connected to the object to be plated while being supported. 前記給電電極の垂直部先端縁は、複数の山形形状となっていることを特徴とする請求項3記載のメッキ治具。
The plating jig according to claim 3, wherein the leading edge of the vertical portion of the power supply electrode has a plurality of chevron shapes.
JP2004193948A 2004-06-30 2004-06-30 Plating jig Expired - Fee Related JP4280685B2 (en)

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008133526A (en) * 2006-11-29 2008-06-12 Fujikura Ltd Plating tool
JP2008202065A (en) * 2007-02-16 2008-09-04 Mitsubishi Materials Corp Anode electrode attachment structure for electroplating
CN103132123A (en) * 2011-11-29 2013-06-05 北京有色金属研究总院 Fixture for fixing soft material plated piece substrate
JP2013119648A (en) * 2011-12-07 2013-06-17 Yamamoto Mekki Shikenki:Kk Tool for holding workpiece
JP2014065953A (en) * 2012-09-27 2014-04-17 Shin Etsu Polymer Co Ltd Support jig for plating semiconductor wafer

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008133526A (en) * 2006-11-29 2008-06-12 Fujikura Ltd Plating tool
JP2008202065A (en) * 2007-02-16 2008-09-04 Mitsubishi Materials Corp Anode electrode attachment structure for electroplating
CN103132123A (en) * 2011-11-29 2013-06-05 北京有色金属研究总院 Fixture for fixing soft material plated piece substrate
CN103132123B (en) * 2011-11-29 2015-08-26 北京有色金属研究总院 A kind of stationary fixture of soft material plating piece matrix
JP2013119648A (en) * 2011-12-07 2013-06-17 Yamamoto Mekki Shikenki:Kk Tool for holding workpiece
JP2014065953A (en) * 2012-09-27 2014-04-17 Shin Etsu Polymer Co Ltd Support jig for plating semiconductor wafer

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