JP2008159327A - Contact switching device - Google Patents

Contact switching device Download PDF

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Publication number
JP2008159327A
JP2008159327A JP2006344864A JP2006344864A JP2008159327A JP 2008159327 A JP2008159327 A JP 2008159327A JP 2006344864 A JP2006344864 A JP 2006344864A JP 2006344864 A JP2006344864 A JP 2006344864A JP 2008159327 A JP2008159327 A JP 2008159327A
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conductive fluid
injection port
storage chamber
contacts
fluid
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JP2006344864A
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Japanese (ja)
Inventor
Koji Yokoyama
浩司 横山
Riichi Uotome
利一 魚留
Shoichi Kobayashi
昌一 小林
Katsumi Kakimoto
勝己 垣本
Hideki Ueda
英喜 上田
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Panasonic Electric Works Co Ltd
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Matsushita Electric Works Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a contact switching device capable of preventing adhesion of a surplus conductive fluid, in the surrounding of an injection port. <P>SOLUTION: The contact switching device is provided with the body part 1 which has a housing chamber 1d in which a conductive fluid L is stored and a pair of contacts are installed and an injection groove part 20 which is connected to the housing chamber 1d on one end side and has an injection port 2f for injecting the conductive fluid L into the housing chamber 1d on the other end side, a closing plate 4 for closing the injection port 2f, and an actuator 7 which is a drive means for moving the conductive fluid L stored in the housing chamber 1d and switches the conduction status between the pair of contacts 5a, 6a. A projected wall part 21, which protrudes inside and has a projection face 21a substantially in parallel to the injection port 2f opposed to it is formed with a prescribed spacing from the injection port 2f in the thickness direction of the body part 1, on the inner wall of the injection groove part 20. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、接点開閉装置に関する。   The present invention relates to a contact switching device.

従来から、圧電素子の駆動によって液体金属を動かすことで接点を開閉する接点開閉装置(液体金属スイッチ)が提供されており、例えば特許文献1に開示されているようなものがある。この接点開閉装置は、複数のコンタクトを外部に露出した状態で有する圧電基板層と、前記コンタクトと接続される複数の圧電素子及び各圧電素子間を分離する不活性の駆動流体を有する駆動装置流体槽層と、圧電素子によって押圧される薄膜層と、回路基板に接続される複数のスイッチ・コンタクト及び各スイッチ・コンタクト間を接続する液体金属及びスイッチング流体を有する液体金属チャネル層と、スイッチ・コンタクトと接続される回路を有する回路基板層とから成る。該接点開閉装置の動作を以下に説明する。圧電基板層の一対のコンタクト間に電圧を印加すると、該一対のコンタクトに接続された圧電素子が伸長し、該圧電素子の伸長に伴って薄膜層が押圧される。薄膜層が押圧されることによって液体金属チャネル層のスイッチング流体の圧力が上昇し、スイッチング流体の圧力の上昇によって液体金属によるスイッチ・コンタクト間の接続が切断され、而して回路基板層の回路上の接点を開放するようになっている。この接点開閉装置では、接点開閉装置の組立時に駆動流体を注入口から駆動装置流体槽層に注入し、その後注入口を封止することで駆動流体を駆動装置流体槽層に充填している。
特開2004−319477号公報
Conventionally, a contact opening / closing device (liquid metal switch) that opens and closes a contact by moving a liquid metal by driving a piezoelectric element has been provided, for example, as disclosed in Patent Document 1. This contact switching device includes a piezoelectric substrate layer having a plurality of contacts exposed to the outside, a plurality of piezoelectric elements connected to the contacts, and a driving device fluid having an inert driving fluid separating each piezoelectric element A tank layer, a thin film layer pressed by a piezoelectric element, a plurality of switch contacts connected to a circuit board, a liquid metal channel layer having a liquid metal and a switching fluid connecting each switch contact, and a switch contact And a circuit board layer having a circuit connected thereto. The operation of the contact switching device will be described below. When a voltage is applied between the pair of contacts of the piezoelectric substrate layer, the piezoelectric element connected to the pair of contacts expands, and the thin film layer is pressed as the piezoelectric element expands. When the thin film layer is pressed, the pressure of the switching fluid in the liquid metal channel layer rises, and the increase in the pressure of the switching fluid breaks the connection between the switch contacts by the liquid metal, and thus on the circuit board layer circuit. The contact of is open. In this contact switching device, when the contact switching device is assembled, the driving fluid is injected into the driving device fluid tank layer from the inlet, and then the driving fluid is filled in the driving device fluid tank layer by sealing the inlet.
JP 2004-319477 A

ところで、上記のような接点開閉装置の他に、導電性流体が収納されるとともに一対の接点が露設される収納室を有する本体部と、本体部を部分的に変形させることで導電性流体を移動させ、一対の接点間の導通状態を切り換えるアクチュエータとを備えた接点開閉装置が知られている。しかしながら、このような接点開閉装置において、上記従来例の駆動流体の注入と同様に、導電性流体を注入口から収納室に注入した後に注入口を封止すると、注入口の周囲に余分な導電性流体が付着することで注入口の封止が困難になるという問題があった。   By the way, in addition to the contact switching device as described above, a conductive fluid is stored, and a main body having a storage chamber in which a pair of contacts are exposed, and a conductive fluid by partially deforming the main body. There is known a contact opening / closing device provided with an actuator that moves the switch and switches the conduction state between the pair of contacts. However, in such a contact switching device, as in the case of the driving fluid injection in the conventional example, if the injection port is sealed after the conductive fluid is injected from the injection port into the storage chamber, excess conductive material is formed around the injection port. There has been a problem that it becomes difficult to seal the injection port due to adhesion of the ionic fluid.

本発明は、上記の点に鑑みて為されたもので、注入口の周囲に余分な導電性流体が付着するのを防ぐことのできる接点開閉装置を提供することを目的とする。   The present invention has been made in view of the above points, and an object of the present invention is to provide a contact switching device that can prevent an excessive conductive fluid from adhering around the inlet.

請求項1の発明は、上記目的を達成するために、導電性流体が収納される収納室及び一端側で収納室と連結するとともに他端側に導電性流体を収納室内に注入するための注入口が設けられた注入用溝部を有する本体部と、少なくとも一部を収納室内に臨ませた状態で設けられる一乃至複数の接点と、本体部の厚み方向における収納室の壁部を変形させて導電性流体を移動させることによって接点の間を導電性流体を介して導通又は開放させる駆動手段とを備え、前記注入用溝部は、その内壁から内側に突出し且つ注入口と対向する略平行な突面を有する突壁部を本体部の厚み方向において注入口から所定の間隔を空けて設けたことを特徴とする。   In order to achieve the above object, the invention according to claim 1 is a storage chamber for storing the conductive fluid and a note for injecting the conductive fluid into the storage chamber at the other end while being connected to the storage chamber at one end. A main body having an inlet groove provided with an inlet, one or more contacts provided with at least a portion facing the storage chamber, and a wall of the storage chamber in the thickness direction of the main body being deformed. Driving means for conducting or opening between the contacts via the conductive fluid by moving the conductive fluid, and the injection groove protrudes inward from the inner wall and faces the injection port. A protruding wall portion having a surface is provided at a predetermined interval from the injection port in the thickness direction of the main body portion.

請求項2の発明は、請求項1の発明において、突壁部は、注入口と対向する前記突面が微細な凹凸を有した粗面から成ることを特徴とする。   The invention of claim 2 is characterized in that, in the invention of claim 1, the protruding wall portion is formed of a rough surface having fine irregularities on the protruding surface facing the injection port.

請求項3の発明は、請求項1の発明において、突壁部は、注入口と対向する前記突面に撥水性を有する撥水材料の被膜が形成されたことを特徴とする。   A third aspect of the invention is characterized in that, in the first aspect of the invention, the projecting wall portion is formed with a coating of a water-repellent material having water repellency on the projecting surface facing the injection port.

請求項1の発明によれば、注入用溝部の内壁から内側に突出し且つ注入口と対向する略平行な突面を有する突壁部を本体部の厚み方向において注入口から所定の間隔を空けて設けたので、導電性流体を収納室内に注入する際に突壁部の突面まで注入することで、突面から所定の間隔が空いた注入口周縁に余分な導電性流体が付着することがなく、したがって注入口を閉塞する作業を容易に行うことができる。   According to the first aspect of the present invention, the protruding wall portion that protrudes inward from the inner wall of the injection groove and has a substantially parallel protruding surface facing the injection port is spaced from the injection port in the thickness direction of the main body. Since the conductive fluid is injected into the storage chamber, the conductive fluid is injected up to the projecting surface of the projecting wall portion, so that an extra conductive fluid may adhere to the periphery of the injection port spaced a predetermined distance from the projecting surface. Therefore, the operation of closing the injection port can be easily performed.

請求項2の発明によれば、突壁部の突面が微細な凹凸を有した粗面から成るので、導電性流体が突面に付着し難くなり、したがって余分な導電性流体を容易に除去することができる。   According to the second aspect of the present invention, since the projecting surface of the projecting wall portion is a rough surface having fine irregularities, the conductive fluid is difficult to adhere to the projecting surface, and therefore excess conductive fluid is easily removed. can do.

請求項3の発明によれば、突壁部の突面に撥水性を有する撥水材料の被膜を形成したので、導電性流体が突面に付着し難くなり、したがって余分な導電性流体を容易に除去することができる。   According to the invention of claim 3, since the coating film of the water-repellent material having water repellency is formed on the projecting surface of the projecting wall portion, it becomes difficult for the conductive fluid to adhere to the projecting surface. Can be removed.

以下、本発明の接点開閉装置の実施形態について図面を用いて説明する。但し、以下の説明では図1(c)における上下を上下方向と定める。本実施形態は、図1(a),(b)に示すように、導電性流体Lが収納されるとともに一対の接点5a,6aが露設される収納室1d及び一端側で収納室1dと連結するとともに他端側に導電性流体Lを収納室1d内に注入するための注入口2fが設けられた注入用溝部20を有する本体部1と、注入口2fを閉塞する閉塞板4と、収納室1d内に収納された導電性流体Lを移動させ、一対の接点5a,6a間の導通状態を切り換える駆動手段であるアクチュエータ7とを備える。尚、本実施形態では、導電性流体Lとして常温常圧(25℃、1気圧)で液体の金属(例えば、水銀)を用いている。   Hereinafter, embodiments of the contact switching device of the present invention will be described with reference to the drawings. However, in the following description, the vertical direction in FIG. In this embodiment, as shown in FIGS. 1A and 1B, a storage chamber 1d in which a conductive fluid L is stored and a pair of contact points 5a and 6a are exposed, and a storage chamber 1d on one end side, A main body 1 having an injection groove 20 provided with an injection port 2f for connecting and injecting the conductive fluid L into the storage chamber 1d at the other end, and a closing plate 4 for closing the injection port 2f; An actuator 7 is provided as a driving means for moving the conductive fluid L stored in the storage chamber 1d and switching the conduction state between the pair of contacts 5a and 6a. In the present embodiment, a liquid metal (for example, mercury) at normal temperature and normal pressure (25 ° C., 1 atm) is used as the conductive fluid L.

本体部1は、図1(c)〜(e)に示すように、基板2と絶縁基板3とを用いて構成される。基板2は、例えば単結晶のシリコン基板から成り、図1(c)に示すように、その前面には略矩形状の凹部2aが設けられている。この基板2の後面において凹部2aに対応する部位には、導電性流体Lを収納する空洞部1a用の凹所2bが設けられており、図1(b)に示すように、この凹所2bは略菱形に形成されている。また、基板2において凹部2aの底壁部は薄膜状のダイアフラム部2cとなっており、該ダイアフラム部2cの略中央部には、前方へ突出する角錘台形の突部2dが一体に突設されている(図1(c)参照)。   As shown in FIGS. 1C to 1E, the main body 1 is configured using a substrate 2 and an insulating substrate 3. The substrate 2 is made of, for example, a single crystal silicon substrate, and as shown in FIG. 1 (c), a substantially rectangular recess 2a is provided on the front surface thereof. A recess 2b for the cavity 1a for storing the conductive fluid L is provided on the rear surface of the substrate 2 corresponding to the recess 2a. As shown in FIG. Is formed in a substantially diamond shape. Further, in the substrate 2, the bottom wall portion of the recess 2a is a thin-film diaphragm portion 2c, and a truncated pyramid-shaped projection 2d protruding forward is integrally formed at a substantially central portion of the diaphragm portion 2c. (See FIG. 1C).

基板2の後面において凹所2bの一端側(図1(b)における右端側)には、空洞部1a内に導電性流体Lを注入するための通路となる第1チャンネル1b用の第1溝部2eが形成されている。第1溝部2eは、略矩形状に形成されるとともに、基板2の厚み方向に貫設される略角錐台形状の注入用溝部20の下端部と連通している。また、注入用溝部20の上端部は、基板2前面の略正方形状の注入口2fと連通している(図1(c)参照)。注入口2fは、注入用溝部20を介して第1チャンネル1b内に導電性流体Lを注入するために設けられており、導電性流体Lを注入した後に略矩形状のガラス板から成る閉塞板4によって閉塞される(図1(a)参照)。   On the rear surface of the substrate 2, on the one end side of the recess 2b (the right end side in FIG. 1B), the first groove portion for the first channel 1b serving as a passage for injecting the conductive fluid L into the cavity portion 1a. 2e is formed. The first groove portion 2 e is formed in a substantially rectangular shape and communicates with the lower end portion of the substantially truncated pyramid-shaped injection groove portion 20 penetrating in the thickness direction of the substrate 2. Further, the upper end of the injection groove 20 communicates with a substantially square injection port 2f on the front surface of the substrate 2 (see FIG. 1C). The injection port 2f is provided for injecting the conductive fluid L into the first channel 1b through the injection groove 20, and is a blocking plate made of a substantially rectangular glass plate after the conductive fluid L is injected. 4 (see FIG. 1A).

注入用溝部20の内壁には、図1(c)に示すように内側に向かって突出する断面略三角形状の突壁部21が周方向に亘って突設されている。突壁部21の上面は、注入口2fと略平行な突面21aとなっており、該突面21aと注入口2fとは上下方向において所定の間隔が空けられている。また、突面21aに囲まれる部位は、第1溝部2eと連通する略正方形状の通孔21bとなっており、導電性流体Lは注入口2fから該通孔21bを通って収納室1d内に注入されるようになっている。突壁部21下側の部位は、通孔21bから収納室1dに向かうにつれて開口面積が大きくなるような傾斜部となっており、導電性流体Lが収納室1dから通孔21bに向かって逆流するのを防いでいる。   As shown in FIG. 1C, a projecting wall portion 21 having a substantially triangular cross section projecting inwardly protrudes from the inner wall of the injecting groove portion 20 in the circumferential direction. The upper surface of the projecting wall portion 21 is a projecting surface 21a substantially parallel to the injection port 2f, and the projecting surface 21a and the injection port 2f are spaced apart from each other in a vertical direction. Further, the portion surrounded by the projecting surface 21a is a substantially square through hole 21b communicating with the first groove 2e, and the conductive fluid L passes through the through hole 21b from the inlet 2f into the storage chamber 1d. It is supposed to be injected into. The lower portion of the protruding wall portion 21 is an inclined portion whose opening area increases from the through hole 21b toward the storage chamber 1d, and the conductive fluid L flows backward from the storage chamber 1d toward the through hole 21b. To prevent it.

一方、基板2の後面において凹所2bの他端側(図1(b)における左端側)には、導電性流体Lが移動する流路となる第2チャンネル1c用の略コ字状の第2溝部2gが形成されている。   On the other hand, on the other end side of the recess 2b on the rear surface of the substrate 2 (the left end side in FIG. 1B), a substantially U-shaped first channel for the second channel 1c serving as a flow path through which the conductive fluid L moves. Two groove portions 2g are formed.

尚、上記の凹部2a、凹所2b、突部2d、各溝部2e,2g、注入用溝部20及び突壁部21は、ICP(Inductively Coupled Plasma)エッチング等の半導体製造プロセスを利用して基板2に形成してあるが、上記のような半導体製造プロセスは周知であるので、ここでは詳細な説明を省略する。また、基板2の代わりに、基板2と同様の形状に形成された絶縁性を有する樹脂基板等を用いるようにしても構わない。   The recess 2a, the recess 2b, the protrusion 2d, the grooves 2e and 2g, the injection groove 20 and the protrusion wall 21 are formed on the substrate 2 using a semiconductor manufacturing process such as ICP (Inductively Coupled Plasma) etching. However, since the semiconductor manufacturing process as described above is well known, detailed description thereof is omitted here. Further, instead of the substrate 2, an insulating resin substrate formed in the same shape as the substrate 2 may be used.

絶縁基板3は、例えば基板2と略同一の外形寸法を有する透明なガラス基板から成り、基板2の後面に陽極接合等によって接合される。尚、絶縁基板3として、ガラス基板のほかに絶縁性を有する樹脂基板を用いるようにしても構わない。   The insulating substrate 3 is made of, for example, a transparent glass substrate having substantially the same outer dimensions as the substrate 2 and is bonded to the rear surface of the substrate 2 by anodic bonding or the like. In addition to the glass substrate, an insulating resin substrate may be used as the insulating substrate 3.

このように絶縁基板3を基板2の後面に接合することにより、凹所2b及び第1溝部2e並びに第2溝部2gの後面開口がそれぞれ閉塞される。そして、絶縁基板3により後面開口が閉塞された凹所2bが、導電性流体Lを収納する空洞部1aとして、絶縁基板3により後面開口が閉塞された第1溝部2eが、導電性流体Lを空洞部1aに注入するための第1チャンネル1bとして、絶縁基板3により後面開口が閉塞された第2溝部2gが、導電性流体Lの流路となる第2チャンネル1cとしてそれぞれ用いられ、これら空洞部1aと第1チャンネル1b及び第2チャンネル1cとによって導電性流体Lが移動自在に収納される収納室1dが構成される。   By thus bonding the insulating substrate 3 to the rear surface of the substrate 2, the rear surface openings of the recess 2b, the first groove portion 2e, and the second groove portion 2g are respectively closed. Then, the recess 2b whose rear opening is closed by the insulating substrate 3 serves as a cavity 1a for accommodating the conductive fluid L, and the first groove 2e whose rear opening is closed by the insulating substrate 3 serves as the conductive fluid L. As the first channel 1b for injecting into the cavity 1a, the second groove 2g whose rear opening is closed by the insulating substrate 3 is used as the second channel 1c serving as the flow path of the conductive fluid L, respectively. A storage chamber 1d in which the conductive fluid L is movably stored is constituted by the portion 1a, the first channel 1b, and the second channel 1c.

一方、絶縁基板3において、基板2の第2溝部2gに対向する部位、即ち、第2チャンネル1cの底面部となる部位には、貫設孔(スルーホール)3aが4つ貫設されている(図1(b),(d)参照)。これら4つの貫設孔3aのそれぞれの内周面及び前面開口には、ともに導電性金属材料を用いためっき層から成る接点5a,6aが交互に形成されており、これにより絶縁基板3を基板2に接合した際には、各一対の接点5a,6aが第2チャンネル1c内に露設されることになる。尚、各接点5a,6a用の導電性金属材料としては、導電性流体Lに対する濡れ性が良いもの(例えば、半田)を用いることが好ましい。   On the other hand, in the insulating substrate 3, four through holes 3 a are formed through a portion of the substrate 2 that faces the second groove 2 g, that is, a portion that becomes the bottom surface of the second channel 1 c. (See FIGS. 1B and 1D). Contact points 5a and 6a made of a plating layer using a conductive metal material are alternately formed on the inner peripheral surface and the front opening of each of the four through holes 3a. When joined to 2, each pair of contacts 5a, 6a is exposed in the second channel 1c. As the conductive metal material for each contact 5a, 6a, it is preferable to use a material (for example, solder) that has good wettability with respect to the conductive fluid L.

また、絶縁基板3の後面には、銅等の導電性金属材料を用いた一対の電極パッド5b,6bがそれぞれ形成されており、電極パッド5bは配線パターン5cによって一対の接点5aに、電極パッド6bは配線パターン6cによって一対の接点6aにそれぞれ接続されている。   A pair of electrode pads 5b and 6b using a conductive metal material such as copper are formed on the rear surface of the insulating substrate 3, and the electrode pad 5b is connected to the pair of contacts 5a by the wiring pattern 5c. 6b is connected to a pair of contacts 6a by a wiring pattern 6c.

ところで、接点5aは上述したように2つ設けられているが、導電性流体Lが収納室1dに注入された後には、何れか1つのみが残されて他方の接点5aが電極パッド5bから電気的に切断される。この点は接点6aにおいても同様であり、これにより導電性流体Lの注入量のばらつきに対応できるようにしている。例えば、導電性流体Lの注入量が少なく導電性流体Lが何れの接点5a,6aとも接触していない場合と、導電性流体Lの注入量が多く導電性流体Lが接点5aとのみ接触している場合とでは、接点開閉の動作が異なってしまうため、前者の場合には、第2チャンネル1cの奥側となる他端側(図1(b)における右側)の接点5a,6aがそれぞれ電極パッド5b,6bから切断され、後者の場合には、第2チャンネル1cの手前側となる一端側(図1(b)における左側)の接点5aが電極パッド5bから切断されるとともに、第2チャンネル1cの奥側の接点6aが電極パッド6bから切断される。このようにすることで、導電性流体Lの注入量のばらつきに依らず安定した開閉性能を発揮することができる。   By the way, although the two contacts 5a are provided as described above, after the conductive fluid L is injected into the storage chamber 1d, only one of them is left and the other contact 5a is connected to the electrode pad 5b. Electrically disconnected. This also applies to the contact point 6a, and this makes it possible to cope with variations in the injection amount of the conductive fluid L. For example, when the amount of the conductive fluid L injected is small and the conductive fluid L is not in contact with any of the contacts 5a and 6a, the amount of the conductive fluid L injected is large and the conductive fluid L contacts only the contact 5a. In the former case, the contacts 5a, 6a on the other end side (the right side in FIG. 1 (b)), which is the back side of the second channel 1c, are different from each other. The electrode 5b is cut from the electrode pads 5b and 6b. In the latter case, the contact 5a on one end side (the left side in FIG. 1B) on the front side of the second channel 1c is cut from the electrode pad 5b and the second The contact 6a on the back side of the channel 1c is cut from the electrode pad 6b. By doing in this way, the stable opening / closing performance can be exhibited irrespective of the variation in the injection amount of the conductive fluid L.

アクチュエータ7は、例えば扁平な棒状に形成された圧電振動子から成り、先端部を凹部2aと対向させると同時に突部2dの先端に当接させる形で基板2の前面に接合された片持ち梁構造を有している。而して、アクチュエータ7の厚み方向に電圧を印加すれば、固定されていないアクチュエータ7の先端部がダイアフラム部2cに近づく方向に撓んで突部2dを押圧し、これにより基板2のダイアフラム部2cが凹所2b側へ変形する(撓む)ことになる。そして、電圧の印加を停止すれば、アクチュエータ7が突部2を押圧しなくなり、これによりダイアフラム部2cが元の状態に復帰することになる。   The actuator 7 is made of, for example, a piezoelectric vibrator formed in a flat rod shape, and is a cantilever joined to the front surface of the substrate 2 in such a manner that the tip portion is opposed to the recess 2a and at the same time is brought into contact with the tip of the projection 2d. It has a structure. Thus, when a voltage is applied in the thickness direction of the actuator 7, the tip of the unfixed actuator 7 bends in a direction approaching the diaphragm portion 2 c and presses the protrusion 2 d, thereby the diaphragm portion 2 c of the substrate 2. Will be deformed (flexed) toward the recess 2b. When the application of the voltage is stopped, the actuator 7 does not press the protrusion 2 and the diaphragm portion 2c is restored to the original state.

次に、本実施形態の動作について説明する。まず、電圧が印加されていない状態では、アクチュエータ7が動作しないためにダイアフラム部2cが変形していない。この時、収納室1dに収納されている導電性流体Lは何れの接点5a,6aとも接触しておらず、接点5a,6a間は絶縁(開成)されている(オフ状態)。   Next, the operation of this embodiment will be described. First, in a state where no voltage is applied, the actuator 7 does not operate, so that the diaphragm portion 2c is not deformed. At this time, the conductive fluid L stored in the storage chamber 1d is not in contact with any of the contacts 5a and 6a, and the contacts 5a and 6a are insulated (opened) (off state).

このオフ状態から電圧を印加してアクチュエータ7を駆動すると、アクチュエータ7の先端部が突部2dを押圧し、これによりダイアフラム部2cが後方に押し下げられる。ダイアフラム部2cが押し下げられると、空洞部1aの容積が減少し、これにより空洞部1a内に収納されている導電性流体Lが第2チャンネル1c側へ移動させられ、一対の接点5a,6aが導電性流体Lによって短絡(閉成)される(オン状態)。   When a voltage is applied from this OFF state to drive the actuator 7, the tip of the actuator 7 presses the protrusion 2d, and thereby the diaphragm 2c is pushed backward. When the diaphragm portion 2c is pushed down, the volume of the cavity portion 1a is reduced, whereby the conductive fluid L accommodated in the cavity portion 1a is moved to the second channel 1c side, and the pair of contacts 5a and 6a are moved. Short-circuited (closed) by the conductive fluid L (ON state).

そして、このオン状態から電圧の印加を停止すれば、アクチュエータ7によって変形させられていたダイアフラム部2cが元の状態に復帰する。これに伴って空洞部1aの容積が元に戻るため、第2チャンネル1c側に移動していた導電性流体Lが空洞部1a側に戻り、一対の接点5a,6aが開成される(オフ状態)。   When the application of voltage is stopped from this on state, the diaphragm portion 2c deformed by the actuator 7 returns to the original state. Along with this, the volume of the cavity 1a returns to the original, so that the conductive fluid L that has moved to the second channel 1c side returns to the cavity 1a side, and the pair of contacts 5a and 6a are opened (OFF state). ).

以下、導電性流体Lを収納室1dに注入する方法について図面を用いて説明する。まず、導電性流体Lが蓄えられた流体槽8aを有する真空チャンバ8内に本体部1を配置し、真空チャンバ8内を真空ポンプ(図示せず)を用いて真空引きすることで、真空チャンバ8内及び本体部1の収納室1d内を所定の真空度まで減圧する(図2(a)参照)次に、本体部1を流体槽8aに浸し(図2(b)参照)、真空チャンバ8内の圧力を上昇させると、真空チャンバ8内の圧力が収納室1d内の圧力よりも大きくなるために、流体槽8aに蓄えられた導電性流体Lが注入口2fから収納室1d内に浸入する(図2(c)参照)。そして、収納室1dに所定の導電性流体Lが注入されるまで真空チャンバ8内の圧力を上昇させた後に(図2(d)参照)、本体部1を流体槽8aから取り出し、閉塞板4を基板2の前面に接合して注入口2fを閉塞することで、導電性流体Lの収納室1dへの注入工程が終了する。尚、流体槽8aに本体部1を浸す際に、凹部2aにも導電性流体Lが浸入するが、凹部2aに溜まった導電性流体Lは注入口2fを閉塞板4で閉塞した後に除去するため、ここでは凹部2aに溜まる導電性流体Lの図示を省略している。   Hereinafter, a method for injecting the conductive fluid L into the storage chamber 1d will be described with reference to the drawings. First, the main body portion 1 is disposed in a vacuum chamber 8 having a fluid tank 8a in which the conductive fluid L is stored, and the vacuum chamber 8 is evacuated using a vacuum pump (not shown), whereby a vacuum chamber is obtained. 8 and the storage chamber 1d of the main body 1 are depressurized to a predetermined degree of vacuum (see FIG. 2A). Next, the main body 1 is immersed in the fluid tank 8a (see FIG. 2B), and a vacuum chamber is obtained. When the pressure in the chamber 8 is increased, the pressure in the vacuum chamber 8 becomes larger than the pressure in the storage chamber 1d, so that the conductive fluid L stored in the fluid tank 8a enters the storage chamber 1d from the inlet 2f. It penetrates (see FIG. 2 (c)). Then, after increasing the pressure in the vacuum chamber 8 until a predetermined conductive fluid L is injected into the storage chamber 1d (see FIG. 2D), the main body 1 is taken out from the fluid tank 8a, and the blocking plate 4 Is bonded to the front surface of the substrate 2 to close the injection port 2f, whereby the step of injecting the conductive fluid L into the storage chamber 1d is completed. When the main body 1 is immersed in the fluid tank 8a, the conductive fluid L also enters the recess 2a. However, the conductive fluid L accumulated in the recess 2a is removed after the inlet 2f is closed by the closing plate 4. Therefore, illustration of the conductive fluid L that accumulates in the recess 2a is omitted here.

ここで、本実施形態では注入用溝部20に突壁部21を設けているので、図3に示すように、導電性流体Lを収納室1d内に注入する際に突壁部21の突面21aまで導電性流体Lを注入すれば、注入用溝部20の突面21aから注入口2fまでの間の内壁に導電性流体Lが付着するのを防ぐことができる。而して、導電性流体Lが注入口2fの周縁に付着するのを防ぐことで注入口2fを閉塞板4で閉塞する作業を容易に行うことができる。   Here, in this embodiment, since the projecting wall portion 21 is provided in the injecting groove portion 20, as shown in FIG. 3, the projecting surface of the projecting wall portion 21 when injecting the conductive fluid L into the storage chamber 1d. If the conductive fluid L is injected up to 21a, it is possible to prevent the conductive fluid L from adhering to the inner wall between the projecting surface 21a of the injection groove 20 and the injection port 2f. Thus, by preventing the conductive fluid L from adhering to the periphery of the inlet 2f, the operation of closing the inlet 2f with the closing plate 4 can be easily performed.

尚、本実施形態の突面21aには、例えばフッ素樹脂等の撥水性を有する材料から成る被膜を形成してもよく、この場合、導電性流体Lを収納室1d内に注入する際に、突面21aに導電性流体Lが付着するのを防ぐことができ、余分な導電性流体Lを容易に除去することができる。また、突面21aに導電性流体Lが付着するのを防ぐことのできる構成であれば他の構成でもよく、上記のように撥水性を有する材料で被膜を形成する代わりに、例えばサンドブラスト処理によって微細な凹凸を形成することで突面21aを粗面化してもよい。   Note that a film made of a material having water repellency such as a fluororesin may be formed on the projecting surface 21a of the present embodiment. In this case, when injecting the conductive fluid L into the storage chamber 1d, The conductive fluid L can be prevented from adhering to the projecting surface 21a, and the excess conductive fluid L can be easily removed. Further, any other configuration may be used as long as it can prevent the conductive fluid L from adhering to the projecting surface 21a. Instead of forming a film with a water repellent material as described above, for example, by sandblasting. The protruding surface 21a may be roughened by forming fine irregularities.

本発明の実施形態の接点開閉装置を示す図で、(a)は概略前面図で、(b)は概略後面図で、(c)はA−A’線断面矢視図で、(d)はB−B’線断面矢視図で、(e)はC−C’線断面矢視図である。BRIEF DESCRIPTION OF THE DRAWINGS It is a figure which shows the contact switching device of embodiment of this invention, (a) is a schematic front view, (b) is a schematic rear view, (c) is a sectional view on the AA 'line | wire, (d) Is a sectional view taken along the line BB ', and (e) is a sectional view taken along the line CC'. 同上の導電性流体の注入方法を示す図で、(a)は本体部を導電性流体に浸す前を示す図で、(b)は本体部を導電性流体に浸した直後を示す図で、(c)はチャンバ内の圧力を上昇させた場合を示す図で、(d)はチャンバ内の圧力を所定の値まで上昇させた場合を示す図である。It is a figure which shows the injection | pouring method of a conductive fluid same as the above, (a) is a figure which shows before immersing a main-body part in a conductive fluid, (b) is a figure which shows immediately after immersing a main-body part in a conductive fluid, (C) is a figure which shows the case where the pressure in a chamber is raised, (d) is a figure which shows the case where the pressure in a chamber is raised to a predetermined value. 同上の本体部断面の一部拡大図である。It is a partial enlarged view of a main-body part cross section same as the above.

符号の説明Explanation of symbols

1 本体部
1d 収納室
20 注入用溝部
21 突壁部
21a 突面
2c ダイアフラム部(壁部)
2f 注入口
5a,6a 接点
7 アクチュエータ(駆動手段)
L 導電性流体
DESCRIPTION OF SYMBOLS 1 Main-body part 1d Storage chamber 20 Injection groove part 21 Projection wall part 21a Projection surface 2c Diaphragm part (wall part)
2f Inlet 5a, 6a Contact 7 Actuator (drive means)
L Conductive fluid

Claims (3)

導電性流体が収納される収納室及び一端側で収納室と連結するとともに他端側に導電性流体を収納室内に注入するための注入口が設けられた注入用溝部を有する本体部と、少なくとも一部を収納室内に臨ませた状態で設けられる一乃至複数の接点と、本体部の厚み方向における収納室の壁部を変形させて導電性流体を移動させることによって接点の間を導電性流体を介して導通又は開放させる駆動手段とを備え、前記注入用溝部は、その内壁から内側に突出し且つ注入口と対向する略平行な突面を有する突壁部を本体部の厚み方向において注入口から所定の間隔を空けて設けたことを特徴とする接点開閉装置。   A main body having a storage chamber in which a conductive fluid is stored, an injection groove provided with an inlet for connecting the storage fluid to the storage chamber on one end side and injecting the conductive fluid into the storage chamber on the other end; Conductive fluid between one or a plurality of contacts provided with a part facing the storage chamber and the contacts by moving the conductive fluid by deforming the wall of the storage chamber in the thickness direction of the main body. Drive means for conducting or opening through the injection groove portion, and the injection groove portion protrudes inward from the inner wall and has a protruding wall portion having a substantially parallel protruding surface facing the injection port in the thickness direction of the main body portion. A contact opening / closing device provided at a predetermined interval from 前記突壁部は、注入口と対向する前記突面が微細な凹凸を有した粗面から成ることを特徴とする請求項1記載の接点開閉装置。   2. The contact switching device according to claim 1, wherein the projecting wall portion is formed of a rough surface having fine irregularities on the projecting surface facing the injection port. 前記突壁部は、注入口と対向する前記突面に撥水性を有する撥水材料の被膜が形成されたことを特徴とする請求項1記載の接点開閉装置。   2. The contact switching apparatus according to claim 1, wherein the protruding wall portion is formed with a water-repellent water-repellent material coating on the protruding surface facing the injection port.
JP2006344864A 2006-12-21 2006-12-21 Contact switching device Withdrawn JP2008159327A (en)

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