JP2008134600A - Electrooptic device and electronic apparatus - Google Patents

Electrooptic device and electronic apparatus Download PDF

Info

Publication number
JP2008134600A
JP2008134600A JP2007214123A JP2007214123A JP2008134600A JP 2008134600 A JP2008134600 A JP 2008134600A JP 2007214123 A JP2007214123 A JP 2007214123A JP 2007214123 A JP2007214123 A JP 2007214123A JP 2008134600 A JP2008134600 A JP 2008134600A
Authority
JP
Japan
Prior art keywords
transistor
electro
optical device
display
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007214123A
Other languages
Japanese (ja)
Other versions
JP4497328B2 (en
Inventor
Mitsutoshi Miyasaka
光敏 宮坂
Nobuhiko Kenmochi
伸彦 釼持
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=39329519&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JP2008134600(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP2007214123A priority Critical patent/JP4497328B2/en
Priority to CN2007101802955A priority patent/CN101169567B/en
Priority to KR1020070107140A priority patent/KR101345025B1/en
Priority to US11/923,959 priority patent/US7961171B2/en
Publication of JP2008134600A publication Critical patent/JP2008134600A/en
Application granted granted Critical
Publication of JP4497328B2 publication Critical patent/JP4497328B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/165Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on translational movement of particles in a fluid under the influence of an applied field
    • G02F1/1685Operation of cells; Circuit arrangements affecting the entire cell
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09GARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G3/00Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
    • G09G3/20Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
    • G09G3/34Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source
    • G09G3/3433Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source using light modulating elements actuated by an electric field and being other than liquid crystal devices and electrochromic devices
    • G09G3/344Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source using light modulating elements actuated by an electric field and being other than liquid crystal devices and electrochromic devices based on particles moving in a fluid or in a gas, e.g. electrophoretic devices
    • G09G3/3446Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source using light modulating elements actuated by an electric field and being other than liquid crystal devices and electrochromic devices based on particles moving in a fluid or in a gas, e.g. electrophoretic devices with more than two electrodes controlling the modulating element
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/15Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on an electrochromic effect
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/165Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on translational movement of particles in a fluid under the influence of an applied field
    • G02F1/166Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on translational movement of particles in a fluid under the influence of an applied field characterised by the electro-optical or magneto-optical effect
    • G02F1/167Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on translational movement of particles in a fluid under the influence of an applied field characterised by the electro-optical or magneto-optical effect by electrophoresis
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/165Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on translational movement of particles in a fluid under the influence of an applied field
    • G02F1/1675Constructional details
    • G02F1/1676Electrodes
    • G02F1/16766Electrodes for active matrices
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09GARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G3/00Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
    • G09G3/20Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
    • G09G3/2092Details of a display terminals using a flat panel, the details relating to the control arrangement of the display terminal and to the interfaces thereto
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09GARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G2300/00Aspects of the constitution of display devices
    • G09G2300/04Structural and physical details of display devices
    • G09G2300/0421Structural details of the set of electrodes
    • G09G2300/0426Layout of electrodes and connections
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09GARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G2300/00Aspects of the constitution of display devices
    • G09G2300/04Structural and physical details of display devices
    • G09G2300/0439Pixel structures
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09GARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G2300/00Aspects of the constitution of display devices
    • G09G2300/08Active matrix structure, i.e. with use of active elements, inclusive of non-linear two terminal elements, in the pixels together with light emitting or modulating elements
    • G09G2300/0809Several active elements per pixel in active matrix panels
    • G09G2300/0842Several active elements per pixel in active matrix panels forming a memory circuit, e.g. a dynamic memory with one capacitor
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09GARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G2310/00Command of the display device
    • G09G2310/02Addressing, scanning or driving the display screen or processing steps related thereto
    • G09G2310/0243Details of the generation of driving signals
    • G09G2310/0251Precharge or discharge of pixel before applying new pixel voltage
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09GARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G2320/00Control of display operating conditions
    • G09G2320/02Improving the quality of display appearance
    • G09G2320/029Improving the quality of display appearance by monitoring one or more pixels in the display panel, e.g. by monitoring a fixed reference pixel

Abstract

<P>PROBLEM TO BE SOLVED: To provide an electrophoretic device that allows detection of a position specified on its display screen while having a simple configuration. <P>SOLUTION: The electrooptic device is equipped with a plurality of first scan lines, second scan lines with the number identical to that of the first scan lines, a plurality of signal lines disposed so as to intersect the respective first scan lines and the second scan lines, and a plurality of pixels disposed at intersections of the first scan lines and the second scan lines and the signal lines. Each pixel located in an i-th row and a j-th column includes a first transistor, a second transistor, and a pixel electrode. The plurality of pixels are formed in a matrix. A gate of the first transistor is coupled to the first scan line in the i-th row. One of a source and a drain of the first transistor is coupled to the signal line on the j-th column. A gate of the second transistor is coupled to the second scan line in the i-th row. One of a source and a drain of the second transistor is coupled to the other of the source and drain of the first transistor (the source of the first transistor). The other of the source and drain of the first transistor (the source of the first transistor) is coupled to the pixel electrode. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は電気泳動表示装置や液晶表示装置等の電気光学装置に関する。より詳しくは情報の表示及び書き込みが可能となる電気光学装置に関する。   The present invention relates to an electro-optical device such as an electrophoretic display device or a liquid crystal display device. More particularly, the present invention relates to an electro-optical device that can display and write information.

いわゆる電子ペーパーや電子ブック等、従来の紙媒体を代替し得る電子機器の表示部には電気泳動表示装置や液晶表示装置等の電気光学装置が用いられる。斯うした従来の電気光学装置としては、例えば特開2005−24864号公報(特許文献1)や特開2005−283820号公報(特許文献2)、特開2005−84343号公報(特許文献3)等が開示されて居る。此等従来の電気光学装置は、予めメモリに蓄えられたデータ(例えば本や写真等の画像データ)を表示して居るに過ぎない。即ち、従来の電気光学装置は表示用途として用いられるに過ぎず、表示画像内に使用者がメモやアンダーライン等を自由に書き込んだり、或いは画像内の所望位置を指定する等の処理は困難で有った。   An electro-optical device such as an electrophoretic display device or a liquid crystal display device is used for a display unit of an electronic apparatus that can replace a conventional paper medium such as so-called electronic paper or electronic book. As such a conventional electro-optical device, for example, JP 2005-24864 A (Patent Document 1), JP 2005-283820 A (Patent Document 2), JP 2005-84343 A (Patent Document 3). Etc. are disclosed. These conventional electro-optical devices merely display data stored in a memory in advance (for example, image data such as books and photographs). That is, the conventional electro-optical device is only used for display, and it is difficult for the user to freely write a memo, an underline or the like in the display image, or to specify a desired position in the image. There was.

特開2005−24864号公報Japanese Patent Laid-Open No. 2005-24864 特開2005−283820号公報JP 2005-283820 A 特開2005−84343号公報JP 2005-84343 A

そこで本発明は上述の諸課題を鑑み、表示装置であると共に情報採取装置としても機能する電気光学装置を提供する事を目的とする。具体的には簡素な構成に依って画面上の指定位置を検出し、電子ペーパー等の電気光学装置の表示画面に手書き入力が可能と成る電気光学装置を提供する事を目的とする。   In view of the above-described problems, an object of the present invention is to provide an electro-optical device that is a display device and also functions as an information collecting device. Specifically, an object of the present invention is to provide an electro-optical device capable of detecting a designated position on a screen with a simple configuration and enabling handwriting input on a display screen of an electro-optical device such as electronic paper.

本発明は、画像表示期間と情報採取期間とを有する電気光学装置に関する。本発明の電気光学装置はパネル部とデータ処理部とを少なくとも有し、パネル部は第一基板と第二基板と電気光学材料とを有し、第一基板と第二基板との間に電気光学材料が挟持される。第一基板上には、複数の第一走査線と、第一走査線に並列配置される複数の第二走査線と、第一走査線及び第二走査線と交差する複数の信号線と、第一走査線及び第二走査線と信号線との交点に配置される画素とが設けられる。画素は第一基板上で複数個が行列状に形成される。i行j列(i、jはともに自然数)に位置する画素の各々は第1トランジスタと第2トランジスタと画素電極とを含んで居る。本発明は、第1トランジスタのゲートがi行目の第一走査線に接続され、第1トランジスタのソース又はドレインの一方がj列目の信号線に接続され、第2トランジスタのゲートがi行目の第二走査線に接続され、第2トランジスタのソース又はドレインの一方が第1トランジスタのソース又はドレインの他方と接続され、第1トランジスタのソース又はドレインの他方と画素電極とが接続されて居る事を特徴とする。   The present invention relates to an electro-optical device having an image display period and an information collection period. The electro-optical device of the present invention includes at least a panel unit and a data processing unit, and the panel unit includes a first substrate, a second substrate, and an electro-optical material, and an electric circuit is provided between the first substrate and the second substrate. An optical material is sandwiched. On the first substrate, a plurality of first scanning lines, a plurality of second scanning lines arranged in parallel to the first scanning lines, a plurality of signal lines intersecting the first scanning lines and the second scanning lines, Pixels arranged at intersections of the first scanning line and the second scanning line and the signal line are provided. A plurality of pixels are formed in a matrix on the first substrate. Each pixel located in i rows and j columns (i and j are both natural numbers) includes a first transistor, a second transistor, and a pixel electrode. In the present invention, the gate of the first transistor is connected to the i-th first scanning line, one of the source and drain of the first transistor is connected to the signal line of the j-th column, and the gate of the second transistor is connected to the i-th row. Connected to the second scanning line of the eye, one of the source or drain of the second transistor is connected to the other of the source or drain of the first transistor, and the other of the source or drain of the first transistor is connected to the pixel electrode. It is characterized by being.

更に本発明では、第2トランジスタのソース又はドレインの他方が基準電源に接続されて居る事をも特徴とする。基準電源としてi−1行目の第一走査線を利用する事も可能なので、その場合、第2トランジスタのソース又はドレインの他方がi−1行目の第一走査線に接続されて居ても良い。又、本発明は、第1トランジスタのソース又はドレインの他方と基準電源との間に保持容量を備える事をも特徴とする。基準電源としてi−1行目の第一走査線を利用する場合には、第1トランジスタのソース又はドレインの他方とi−1行目の第一走査線との間に保持容量を備える事を特徴とする。   Further, the present invention is characterized in that the other of the source and the drain of the second transistor is connected to the reference power source. Since the first scanning line in the (i-1) th row can be used as the reference power source, in this case, the other of the source and the drain of the second transistor is connected to the first scanning line in the (i-1) th row. Also good. The present invention is also characterized in that a storage capacitor is provided between the other of the source or the drain of the first transistor and the reference power supply. When the first scanning line in the (i-1) th row is used as the reference power source, a storage capacitor is provided between the other of the source or drain of the first transistor and the first scanning line in the (i-1) th row. Features.

上述の回路構成を為す本発明では、第一基板は透明であり、第二基板には共通電極が形成されており、画素電極は透明導電膜にて形成され、第一基板と第2トランジスタとの間に遮光膜が配置されて居る事を特徴とする。保持容量を備える場合には、前述の如く第一基板は透明であり、第二基板には共通電極が形成されており、画素電極は透明導電膜にて形成され、第一基板と第2トランジスタとの間に遮光膜が配置されて居り、保持容量は保持容量第一電極と保持容量第二電極と、此等保持容量第一電極と保持容量第二電極とに挟まれる保持容量誘電体膜とから成り、保持容量第一電極も保持容量第二電極も保持容量誘電体膜もいずれも透明である事を特徴とする。画素電極が保持容量第二電極を兼用して居ても良い。遮光膜は第2トランジスタの活性領域と重なる位置に設けられる事を特徴とする。一方で、この遮光膜は第1トランジスタの活性領域とは重ならない位置に設けられる事をも特徴とする。   In the present invention having the above circuit configuration, the first substrate is transparent, the second substrate is formed with a common electrode, the pixel electrode is formed of a transparent conductive film, and the first substrate, the second transistor, A light-shielding film is arranged between the two. When the storage capacitor is provided, as described above, the first substrate is transparent, the second substrate is formed with a common electrode, the pixel electrode is formed of a transparent conductive film, and the first substrate and the second transistor are formed. And a storage capacitor is a storage capacitor dielectric film sandwiched between the storage capacitor first electrode, the storage capacitor second electrode, and the storage capacitor first electrode and the storage capacitor second electrode. The storage capacitor first electrode, the storage capacitor second electrode, and the storage capacitor dielectric film are both transparent. The pixel electrode may also serve as the storage capacitor second electrode. The light shielding film is provided at a position overlapping the active region of the second transistor. On the other hand, this light shielding film is also characterized in that it is provided at a position that does not overlap with the active region of the first transistor.

上述の回路構成及び断面構造を為す本発明では、第一基板上には、第一走査線に接続して複数の第一走査線から特定の第一走査線を選択する機能を有する第一走査線選択回路と、第二走査線に接続して複数の第二走査線から特定の第二走査線を選択する機能を有する第二走査線選択回路と、信号線の一端側に接続して複数の信号線の各々に各信号線に固有な表示信号を供給する機能を有する表示信号供給回路と、信号線の他端側に接続して複数の信号線の各々から出力される各信号線に固有なセンサ信号を読み取る機能を有するセンサ信号読み出し回路と、が形成されて居る事をも特徴とする。更に本発明は、データ処理部は入力部と制御部と記憶部とを有し、入力部は外部より入力された表示画像情報を制御部乃至は記憶部に供給する機能を有し、制御部は少なくとも第一走査線選択回路と第二走査線選択回路、表示信号供給回路、センサ信号読み出し回路、記憶部を制御する機能を有し、記憶部は表示画像情報とセンサ信号に基づく記載画像情報とを記憶する機能を有する事を特徴とする。制御部は表示画像情報と記載画像情報を用いて新たな表示画像を作製し、新たな表示画像を新たな表示信号として表示信号供給回路に供給する機能を有する。更に本発明は、信号線と表示信号供給回路との間に、信号線と表示信号供給回路との導通乃至は非導通を切り替える切り替え回路が備えられて居る事をも特徴とする。この切り替え回路は画像表示期間に信号線と表示信号供給回路とを導通状態とし、情報採取期間に信号線と表示信号供給回路とを非導通状態とする。   In the present invention having the above-described circuit configuration and cross-sectional structure, a first scan having a function of selecting a specific first scan line from a plurality of first scan lines connected to the first scan line on the first substrate. A line selection circuit; a second scanning line selection circuit connected to the second scanning line and having a function of selecting a specific second scanning line from the plurality of second scanning lines; and a plurality of terminals connected to one end of the signal line A display signal supply circuit having a function of supplying a display signal specific to each signal line to each of the signal lines, and each signal line connected to the other end of the signal line and output from each of the plurality of signal lines. A sensor signal reading circuit having a function of reading a unique sensor signal is also formed. Further, according to the present invention, the data processing unit includes an input unit, a control unit, and a storage unit, and the input unit has a function of supplying display image information input from the outside to the control unit or the storage unit. Has at least a function of controlling the first scanning line selection circuit, the second scanning line selection circuit, the display signal supply circuit, the sensor signal readout circuit, and the storage unit, and the storage unit is the description image information based on the display image information and the sensor signal. It has the function to memorize. The control unit has a function of creating a new display image using the display image information and the description image information, and supplying the new display image to the display signal supply circuit as a new display signal. Furthermore, the present invention is characterized in that a switching circuit for switching conduction or non-conduction between the signal line and the display signal supply circuit is provided between the signal line and the display signal supply circuit. This switching circuit makes the signal line and the display signal supply circuit conductive during the image display period, and makes the signal line and the display signal supply circuit non-conductive during the information collection period.

本発明で用いられる電気光学材料は電気泳動材料、或いは液晶材料又はエレクトロクロミック材料である事をも特徴とする。   The electro-optical material used in the present invention is also characterized by being an electrophoretic material, a liquid crystal material, or an electrochromic material.

又本発明は上述のいずれか1項に記載された電気光学装置を備える電子機器をもその特徴と為す。   The present invention also features an electronic apparatus including the electro-optical device described in any one of the above items.

以下、本発明の実施の形態について図面を参照しながら説明する。
本実施形態で用いられる電気光学材料は電気泳動材料や液晶材料等の電界に応じて表示を変化させる電解効果型表示材料や、エレクトロクロミック材料や有機エレクトロリュミネッサンス材料の様に電流に応じて表示を変化させる電流駆動型表示材料で有る。電解効果型表示材料を用いる際には画素電極と共通電極との間に電解効果型表示材料を挟持し、此等の電極間に所定の電界を掛ける事で各種表示を可能とする。一方、電流駆動型表示材料を用いる際には、画素電極と共通電極との間に電流駆動型表示材料(例えばエレクトロクロミック材料、以下エレクトロクロミック材料と其れを用いた表示装置をECDと略す)を挟持し、此等の電極間に所定の電流を通したり、或いは画素電極に電流源を制御する回路を接続してこの電流源と共通電極との間に電流駆動型表示材料(例えば有機エレクトロリュミネッサンス材料、以下有機エレクトロリュミネッサンス材料と其れを用いた表示装置を有機ELと略す)を挟持して所定の電流を通す事で各種表示を可能とする。いずれの電気光学材料を用いようとも本実施形態は普遍的に利用可能なので、以下では電気光学材料の一例として電気泳動材料を採り上げて本発明を詳述する。従って以下の説明では電気泳動ディスプレイ(EPD)を本発明の電気光学装置の一例として居る。
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
The electro-optic material used in this embodiment is an electro-effect display material that changes its display according to an electric field, such as an electrophoretic material or a liquid crystal material, or an electro-optical material that is displayed according to an electric current, such as an electrochromic material or an organic electroluminescence material. It is a current-driven display material that changes the current. When the electrolytic effect type display material is used, various displays are made possible by sandwiching the electrolytic effect type display material between the pixel electrode and the common electrode and applying a predetermined electric field between these electrodes. On the other hand, when a current-driven display material is used, a current-driven display material (for example, an electrochromic material, hereinafter referred to as an electrochromic material and a display device using the same) is referred to as an ECD between the pixel electrode and the common electrode. And a predetermined current is passed between these electrodes, or a circuit for controlling a current source is connected to the pixel electrode, and a current-driven display material (for example, an organic electro-electric display material) is connected between the current source and the common electrode. Various displays are possible by sandwiching a luminance material, hereinafter referred to as an organic electro-luminance material and a display device using the same, and passing a predetermined current. The present embodiment is universally usable regardless of which electro-optic material is used, and therefore, the present invention will be described in detail below by taking an electrophoretic material as an example of the electro-optic material. Therefore, in the following description, an electrophoretic display (EPD) is an example of the electro-optical device of the present invention.

本実施形態は画像表示期間と情報採取期間とを有する電気光学装置(以下本装置と略称する)に関する。画像表示期間とは、本装置に外部より電気信号乃至は電磁波信号等の形態で入力された一画面の表示画像情報を本装置がその機能平面に表示に費やす期間を指し、画像表示フレームとも称する。この期間に本装置は表示装置の機能を果たす。画像表示フレームは通常の表示装置で1フレームに対応する。これに対して情報採取期間とは機能平面が平面センサと成って居る期間を指し、情報採取フレームとも称す。この期間に本装置は情報採取装置の機能を果たし、一画面のセンサ情報が採取される。例えば本装置の使用者が機能平面上で入力機器を空間的に移動させて情報を入力する期間の一部が情報採取期間となる。入力機器にペン型光照射機器を用いると、この期間に使用者は機能平面上の特定位置を指定する事が出来、画像表示期間と情報採取期間とを組み合わせる事で本装置に手書き入力が可能となる。本装置は斯様に通常の電気的表示装置(例えば電子book)で有ると同時に電気的書き込み装置(例えば電子notebook)でもある。   The present embodiment relates to an electro-optical device (hereinafter abbreviated as this device) having an image display period and an information collection period. The image display period refers to a period during which the apparatus spends displaying one-screen display image information input from the outside in the form of an electrical signal or electromagnetic wave signal on the functional plane of the apparatus, and is also referred to as an image display frame. . During this period, the device functions as a display device. The image display frame corresponds to one frame in a normal display device. On the other hand, the information collection period refers to a period during which the functional plane is a flat sensor, and is also referred to as an information collection frame. During this period, the device functions as an information collecting device, and sensor information for one screen is collected. For example, a part of a period during which the user of this apparatus inputs information by spatially moving an input device on the functional plane is an information collection period. When a pen-type light irradiation device is used as the input device, the user can specify a specific position on the functional plane during this period, and handwriting input is possible by combining the image display period and the information collection period. It becomes. The device is thus an ordinary electrical display device (for example an electronic book) and at the same time an electrical writing device (for example an electronic notebook).

図1及び図2は本実施形態の電気光学装置の回路構成を示している。本装置はパネル部とデータ処理部とを少なくとも有し、パネル部は第一基板と第二基板と電気光学材料とを有し、第一基板と第二基板との間に電気光学材料が挟持される。図1及び図2にはパネル部の一部を為す第一基板60とデータ処理部34とが描かれて居る。第一基板60上には、複数の第一走査線10と、第一走査線10に並列配置される複数の第二走査線12と、第一走査線10及び第二走査線12と交差する複数の信号線14と、第一走査線10及び第二走査線12と信号線14との交点に配置される画素16とが設けられる。画素は第一基板10上で複数個が行列状に配置されて画素部を為す。図2の例では信号線14に並列配置される複数の読み出し線15も設けられて居る。本例では総ての画素に画像表示機能と情報入力機能とを持たせて居るので、第一走査線10の数と第二走査線12の数は同じとし、更に図2の例では信号線14と読み出し線17の数を同じにして居る。しかしながら画像表示機能を持たせる画素数と情報入力機能を持たせる画素数とを異ならせる場合には、第一走査線10と第二走査線12との数や、信号線14と読み出し線15との数を一致させなくても良い。   1 and 2 show a circuit configuration of the electro-optical device according to the present embodiment. The apparatus includes at least a panel unit and a data processing unit. The panel unit includes a first substrate, a second substrate, and an electro-optic material, and the electro-optic material is sandwiched between the first substrate and the second substrate. Is done. 1 and 2 illustrate a first substrate 60 and a data processing unit 34 that form part of the panel unit. On the first substrate 60, the plurality of first scanning lines 10, the plurality of second scanning lines 12 arranged in parallel to the first scanning lines 10, and the first scanning lines 10 and the second scanning lines 12 intersect. A plurality of signal lines 14 and pixels 16 disposed at the intersections of the first scanning lines 10 and the second scanning lines 12 and the signal lines 14 are provided. A plurality of pixels are arranged in a matrix on the first substrate 10 to form a pixel portion. In the example of FIG. 2, a plurality of readout lines 15 arranged in parallel with the signal line 14 are also provided. In this example, since all the pixels have an image display function and an information input function, the number of the first scanning lines 10 and the number of the second scanning lines 12 are the same. In the example of FIG. 14 and the number of readout lines 17 are the same. However, when the number of pixels having the image display function is different from the number of pixels having the information input function, the number of the first scanning lines 10 and the second scanning lines 12, the signal lines 14 and the readout lines 15 It is not necessary to match the number of

図3及び図4は其々図1及び図2に対応する各画素の詳細構成を示す回路で有り、i行j列(i、jはともに自然数)に位置する画素を示している。各画素16は第1トランジスタ40と第2トランジスタ42と画素電極48とを含んで居る。第1トランジスタ40も第2トランジスタ42も薄膜トランジスタ(TFT)である。ここでは画像表示期間に電気泳動ディスプレイ(EPD)に画像が表示される例を用いて本発明を説明しているので、表示信号に対するパスゲートの役割を演ずる第1トランジスタ40をEPDスイッチングTFTとも呼んで居る。同様に情報入力期間に手書き入力する入力機器として光照射機器を例とし、各画素が光を検知する事を想定しているので、光を検知して居る画素を特定する第2トランジスタ42をフォトセンサスイッチングTFTとも呼んで居る。又、第1トランジスタ40のオンオフ状態を制御する第一走査線10をEPD走査線とも呼び、第2トランジスタ42のオンオフ状態を制御する第二走査線12をフォトセンサ走査線とも呼んでいる。本実施形態ではi行j列の画素に於いて、第1トランジスタ40のゲート(G)がi行目の第一走査線10に接続され、第1トランジスタ40のソース(S)又はドレイン(D)の一方がj列目の信号線14に接続される。科学的に厳密を言えば、トランジスタのソースとドレインとの関係は入力信号に応じて交換し得るので、二つの端子の内でどちらかをソース乃至はドレインと定めて仕舞う事は出来ない。しかしながら此処では説明の便宜を図る為に、一方をドレインと名付け、他方をソースと呼ぶ。図3及び図4では第1トランジスタ40のドレインがj列目の信号線14に接続されて居る。更に本実施形態では、第2トランジスタ42のゲートがi行目の第二走査線12に接続され、第2トランジスタ42のソース又はドレインの一方(第2トランジスタのドレイン)が第1トランジスタ40のソース又はドレインの他方(第1トランジスタのソース)と接続され、第1トランジスタ40のソース又はドレインの他方(第1トランジスタのソース)と画素電極48とが接続されて居る。第2トランジスタ42のソース又はドレインの他方(第2トランジスタのソース)は基準電源に接続される。基準電源は高電圧源(例えば3.3Vや5Vと云った所謂正電源)で有っても、低電圧源(例えば0Vと云った所謂負電源)で有っても構わない。図3の例とは異なって、専用の基準電源線を各行毎乃至は二行毎に設けても良いが、図3の例が示す様に、基準電源としてi−1行目の第一走査線(隣の画素の第一走査線)を利用する事も可能なので、その場合、第2トランジスタ42のソース又はドレインの他方(第2トランジスタのソース)はi−1行目の第一走査線10に接続される。斯うすると基準電源は非選択状態の第一走査線電位となる。第1トランジスタ40にN型トランジスタを採用すると、第2トランジスタ42のソースは当該画素の非選択期間中に低電圧源に接続される事になる。一方、図4に示す様に各画素に固有な読み出し線15を設ける場合には基準電源は高電圧源乃至は低電圧源となる。読み出し線15の先には電流計が設けられ、その先に高電圧源乃至は低電圧源が存在する。電流計の先に高電圧源が接続される時には、情報採取期間中にj列目の信号線14は低電圧源に接続される。反対に電流計の先に低電圧源が接続される時には、情報採取期間中にj列目の信号線14は高電圧源に接続される。何れにしても第2トランジスタ42のソースは読み出し線15と電流計とを介して高電圧源乃至は低電圧源の基準電源に接続する。   FIGS. 3 and 4 are circuits showing the detailed configuration of each pixel corresponding to FIGS. 1 and 2, respectively, showing pixels located in i rows and j columns (i and j are both natural numbers). Each pixel 16 includes a first transistor 40, a second transistor 42, and a pixel electrode 48. Both the first transistor 40 and the second transistor 42 are thin film transistors (TFTs). Here, the present invention is described using an example in which an image is displayed on an electrophoretic display (EPD) during an image display period. Therefore, the first transistor 40 that plays the role of a pass gate for a display signal is also called an EPD switching TFT. There is. Similarly, a light irradiation device is taken as an example of an input device for handwritten input during an information input period, and it is assumed that each pixel detects light. Therefore, the second transistor 42 that identifies a pixel that detects light is used as a photo. It is also called a sensor switching TFT. The first scanning line 10 that controls the on / off state of the first transistor 40 is also called an EPD scanning line, and the second scanning line 12 that controls the on / off state of the second transistor 42 is also called a photosensor scanning line. In the present embodiment, in the pixel in i row and j column, the gate (G) of the first transistor 40 is connected to the first scanning line 10 in the i row, and the source (S) or drain (D) of the first transistor 40. ) Is connected to the signal line 14 in the j-th column. Strictly speaking, since the relationship between the source and drain of a transistor can be exchanged according to an input signal, one of the two terminals cannot be determined as a source or drain. Here, however, for convenience of explanation, one is called a drain and the other is called a source. 3 and 4, the drain of the first transistor 40 is connected to the signal line 14 in the j-th column. Further, in the present embodiment, the gate of the second transistor 42 is connected to the second scanning line 12 in the i-th row, and one of the source and the drain of the second transistor 42 (the drain of the second transistor) is the source of the first transistor 40. Alternatively, the other of the drains (the source of the first transistor) is connected, and the other of the sources or the drains of the first transistor 40 (the source of the first transistor) and the pixel electrode 48 are connected. The other of the source and the drain of the second transistor 42 (the source of the second transistor) is connected to a reference power supply. The reference power source may be a high voltage source (for example, a so-called positive power source such as 3.3 V or 5 V) or a low voltage source (for example, a so-called negative power source such as 0 V). Unlike the example of FIG. 3, a dedicated reference power supply line may be provided for each row or every two rows. However, as shown in the example of FIG. It is also possible to use the line (the first scanning line of the adjacent pixel). In this case, the other of the source and the drain of the second transistor 42 (the source of the second transistor) is the first scanning line of the i−1th row. 10 is connected. As a result, the reference power supply becomes the first scanning line potential in the non-selected state. When an N-type transistor is employed as the first transistor 40, the source of the second transistor 42 is connected to a low voltage source during the non-selection period of the pixel. On the other hand, as shown in FIG. 4, when the readout line 15 unique to each pixel is provided, the reference power source is a high voltage source or a low voltage source. An ammeter is provided at the tip of the readout line 15, and a high voltage source or a low voltage source is present at the tip. When the high voltage source is connected to the tip of the ammeter, the signal line 14 in the j-th column is connected to the low voltage source during the information collection period. On the contrary, when the low voltage source is connected to the tip of the ammeter, the signal line 14 in the j-th column is connected to the high voltage source during the information collecting period. In any case, the source of the second transistor 42 is connected to the reference power source of the high voltage source or the low voltage source via the readout line 15 and the ammeter.

上述の構成とする事で本装置は手書き入力可能な表示装置となるので、その原理を此処で説明する。手書き入力可能な表示装置とは、一つの画素が画像表示期間中には画像を表示する機能を有し、情報採取期間中には光を検知すると云った情報を採取する機能を有する事を意味する。まず、画像表示期間には総ての第二走査線12を非選択状態とする。走査線の非選択状態とは、その走査線が制御すべきトランジスタ(此処では第2トランジスタ42)を非選択として居る状態で、例えば対応するトランジスタ(第2トランジスタ42)にN型TFTが採用されて居る場合には、その走査線(第二走査線12)が低電位となる状態(第二走査線が低電圧源に接続される状態)である。第2トランジスタ42が非選択となって居る状態(第2トランジスタ42が高抵抗なオフ状態)に有ると、各画素は第1トランジスタ40を用いて画素電極電位を制御できるので、従来の液晶ディスプレイ(LCD)やEPDと同様に通常の表示装置として機能する。これに対して情報採取期間には、各画素は光検知器と化す。この場合、総ての第一走査線10を非選択状態とし、総ての画素の第1トランジスタ40をオフ状態とする。トランジスタがオフ状態に有ると、トランジスタに照射された光の強弱に応じてトランジスタは光漏れ電流を発生する。光が照射されなければトランジスタのオフ電流(オフ状態に於けるソースドレイン電流)は非常に小さいが、強力な光が照射されると光漏れ電流に依りオフ電流は著しく増大する。これはトランジスタがオフ状態に有る際にはトランジスタのドレイン端(此処でのドレイン端との言葉は物理的に正しい意味で使用しており、図3乃至は図4の説明で用いたドレインとは必ずしも一致しない)にPN接合が電気的に形成され、このPN接合がフォトダイオードとして働く為である。本実施形態はこの特質を積極的に利用し、画像表示期間には表示信号通過の可否を定めるトランジスタ(第1トランジスタ)を情報採取期間には強い光の照度を判定するフォトセンサとして利用するのである。具体的には総ての第一走査線10を非選択状態にして、総ての第1トランジスタ40をオフ状態にする。第1トランジスタ40がフォトセンサと化した状態で順次第二走査線12を選択して行き、選択された第二走査線12が制御する第2トランジスタ42をオン状態にする。斯うすると、信号線14からフォトセンサとして機能して居る第1トランジスタ40とオン状態とされた第2トランジスタ42とを経由して基準電源までが繋がり、第1トランジスタ40に照射される光の強弱に応じて信号線14と基準電源との間に生ずる電流量が変化する。この変化を検出し、当該画素への光照射量を測定するのである。要するに第二走査線選択回路20とセンサ信号読み出し回路26とに依り選択された画素に強力な光が照射されて居れば、第1トランジスタ40での光漏れ電流は大きく成るので、大電流が検出される。反対に第二走査線選択回路20とセンサ信号読み出し回路26とに依り選択された画素に光が照射されて居らなければ、第1トランジスタ40での光漏れ電流は殆ど生ぜず、非常に弱い電流しか検出されない事になる。斯くして本装置では各画素が画像表示期間に画像を表示し、情報採取期間に光照射量を検知するのである。   With this configuration, the present device becomes a display device capable of handwriting input, and the principle will be described here. A display device capable of handwriting input means that one pixel has a function of displaying an image during an image display period and a function of collecting information that light is detected during an information collection period. To do. First, all the second scanning lines 12 are set in a non-selected state during the image display period. The non-selected state of the scanning line is a state in which the transistor to be controlled by the scanning line (here, the second transistor 42) is not selected. For example, an N-type TFT is employed for the corresponding transistor (second transistor 42). If it is, the scanning line (second scanning line 12) is in a low potential state (the second scanning line is connected to a low voltage source). When the second transistor 42 is in a non-selected state (the second transistor 42 is in a high-resistance off state), each pixel can control the pixel electrode potential using the first transistor 40, so that the conventional liquid crystal display It functions as a normal display device like (LCD) and EPD. On the other hand, during the information collection period, each pixel becomes a photodetector. In this case, all the first scanning lines 10 are set to a non-selected state, and the first transistors 40 of all the pixels are turned off. When the transistor is in an off state, the transistor generates a light leakage current in accordance with the intensity of light applied to the transistor. When light is not irradiated, the off-state current of the transistor (source-drain current in the off state) is very small. However, when intense light is irradiated, the off-state current increases remarkably due to light leakage current. This is because when the transistor is in the off state, the drain end of the transistor (the term “drain end” here is used in a physically correct sense), and the drain used in the description of FIGS. This is because a PN junction is electrically formed and does not necessarily match, and this PN junction functions as a photodiode. In the present embodiment, this characteristic is positively utilized, and the transistor (first transistor) that determines whether or not the display signal can pass is used as a photosensor for determining the illuminance of strong light during the information collection period during the image display period. is there. Specifically, all the first scanning lines 10 are set in a non-selected state, and all the first transistors 40 are turned off. The second scanning line 12 is sequentially selected in a state where the first transistor 40 becomes a photosensor, and the second transistor 42 controlled by the selected second scanning line 12 is turned on. In this case, the signal line 14 is connected to the reference power source via the first transistor 40 functioning as a photosensor and the second transistor 42 that is turned on, and the first transistor 40 is irradiated with light. The amount of current generated between the signal line 14 and the reference power supply changes according to the strength. This change is detected, and the light irradiation amount to the pixel is measured. In short, if the pixel selected by the second scanning line selection circuit 20 and the sensor signal readout circuit 26 is irradiated with strong light, the light leakage current in the first transistor 40 increases, so that a large current is detected. Is done. On the other hand, if the pixel selected by the second scanning line selection circuit 20 and the sensor signal readout circuit 26 is not irradiated with light, the light leakage current in the first transistor 40 hardly occurs, and the current is very weak. It will only be detected. Thus, in this apparatus, each pixel displays an image during the image display period, and detects the amount of light irradiation during the information collection period.

さて、画像表示期間に表示される画像を高品質とすべく、本実施形態では、第1トランジスタ40のソース又はドレインの他方(第1トランジスタのソース)と基準電源との間に保持容量を備えても良い。保持容量を設けることでEPDのコントラスト比が増大したり、LCDの表示階調数が増したりする等の画質向上が実現する。前述の如く基準電源としてi−1行目の第一走査線10を利用する場合には(図3)、第1トランジスタ40のソース又はドレインの他方(第1トランジスタのソース)とi−1行目の第一走査線10との間に保持容量46を備える事になる。保持容量46は、画素で表示信号を維持している期間中(画素の非選択期間)に固定電源に接続される必要があるので、図4の様に高電位乃至は低電位の基準電源が読み出し線を経由する場合には、矢張り第1トランジスタ40のソース又はドレインの他方(第1トランジスタのソース)とi−1行目の第一走査線10との間に保持容量46を備える事が望ましい。基準電源としてi−1行目の第一走査線10を利用すると、改めて基準電源線を設ける必要がないので、画素に於ける開口率(画素面積に対する表示に寄与する画素電極面積の割合)を高められる。勿論必要に応じて別途配線を設け、その配線に第2トランジスタのソース又はドレインの他方(第2トランジスタのソース)と保持容量とを接続しても良い。図3では基準電源線として隣接画素を制御する第一走査線10が兼用されて居るので有る。   In the present embodiment, a storage capacitor is provided between the other of the source and the drain of the first transistor 40 (the source of the first transistor) and the reference power supply so that the image displayed during the image display period is of high quality. May be. By providing the storage capacitor, image quality improvement such as an increase in the contrast ratio of the EPD or an increase in the number of display gradations of the LCD is realized. As described above, when the first scanning line 10 in the (i-1) th row is used as the reference power supply (FIG. 3), the other of the source or the drain of the first transistor 40 (the source of the first transistor) and the i-1th row. A holding capacitor 46 is provided between the first scanning line 10 of the eye. Since the storage capacitor 46 needs to be connected to a fixed power supply during a period in which the display signal is maintained in the pixel (non-selection period of the pixel), a reference power supply having a high potential or a low potential is provided as shown in FIG. In the case of passing through the readout line, a storage capacitor 46 is provided between the other of the source and drain of the first transistor 40 (the source of the first transistor) and the first scanning line 10 in the (i−1) th row. Is desirable. When the first scanning line 10 in the (i-1) th row is used as the reference power supply, it is not necessary to provide the reference power supply line again. Therefore, the aperture ratio (the ratio of the pixel electrode area contributing to display to the pixel area) in the pixel is set. Enhanced. Of course, a separate wiring may be provided as necessary, and the other of the source and the drain of the second transistor (the source of the second transistor) and the storage capacitor may be connected to the wiring. In FIG. 3, the first scanning line 10 that controls adjacent pixels is also used as the reference power supply line.

次に本装置の断面構造を、図5を用いて説明する。本実施形態では第1トランジスタを情報採取期間中にフォトセンサとして使用するので、この間に光が第1トランジスタに届く必要がある。第一基板と第二基板との間に電気光学材料を挟持し、其れを第二基板側から(図5の上方から)見る様な表示装置とすると、表示装置が黒を表示し光を遮断して居る状態では、第二基板側からは第一基板に作製された第1トランジスタに光が到達しない。又ECDやEPD等透明でない電気光学材料を用いると、表示の如何に関わりなく、第二基板側から第1トランジスタには光が到達しない。そこで本装置では第一基板側から表示装置を見る構成とする。第一基板の内側と第二基板の内側とに電気光学材料を挟む本装置では、第一基板の外側面が機能平面となり、使用者は第一基板の外側から(図5の下側から)本装置を眺めたり、或いは手書き入力を行うことになる。斯うする事で表示の内容や電気光学材料の種類に係わらず、画像表示機能と情報採取機能とが両立する様になる。具体的には、LCDの場合に光源となるバックライトは第二基板の外側に置かれ、有機ELの場合に光は第一基板側に放射される事(所謂ボトムエミッション型)になる。先に詳述した回路構成を為す本実施形態では、従って第一基板は可視光に対して透明となり、透明なガラス基板や透明樹脂材料から成るプラスティックフィルム等が使用される。これに対して第二基板には特段の透明性は要求されない。第二基板は透明乃至は非透明のガラスやフィルムで有っても良いし、紙や繊維、半導体基板や金属板などであっても構わない。   Next, the cross-sectional structure of this apparatus will be described with reference to FIG. In the present embodiment, since the first transistor is used as a photosensor during the information collection period, light needs to reach the first transistor during this period. When an electro-optic material is sandwiched between the first substrate and the second substrate and viewed from the second substrate side (from the top of FIG. 5), the display device displays black and emits light. In the state of being blocked, light does not reach the first transistor fabricated on the first substrate from the second substrate side. If an electro-optical material such as ECD or EPD that is not transparent is used, light does not reach the first transistor from the second substrate side regardless of display. Therefore, in this apparatus, the display device is viewed from the first substrate side. In this apparatus in which the electro-optic material is sandwiched between the inner side of the first substrate and the inner side of the second substrate, the outer surface of the first substrate is a functional plane, and the user is from the outer side of the first substrate (from the lower side of FIG. 5). This device is viewed or handwritten input is performed. By doing so, the image display function and the information collecting function are compatible with each other regardless of the display contents and the type of electro-optic material. Specifically, a backlight serving as a light source in the case of LCD is placed outside the second substrate, and in the case of organic EL, light is emitted to the first substrate side (so-called bottom emission type). In the present embodiment having the circuit configuration described in detail above, the first substrate is therefore transparent to visible light, and a transparent glass substrate, a plastic film made of a transparent resin material, or the like is used. On the other hand, special transparency is not required for the second substrate. The second substrate may be transparent or non-transparent glass or film, or may be paper or fiber, a semiconductor substrate, a metal plate, or the like.

図5に示す様に、本実施形態の電気光学装置は、透明な第一基板60と、第一基板60と対向配置される第二基板68と、此等一対の基板間に挟まれる電気光学材料52とから成る。第一基板60上には回路層62と遮光膜64と画素電極48とが配置される。遮光膜64は第一基板60と回路層62との間の所定位置に配置される。画素電極48は電気光学材料52と接する様に回路層62上に形成される。電気光学素子層66は画素電極48と共通電極50及び電気光学材料52とから成る。共通電極50は、第一基板面に対して垂直方向に電界や電流を生じさせる電気光学装置(図5に示す垂直型EPDやECD、インプレーンスイッチングでないLCD)では第二基板の内側表面に形成され、第一基板面に対し水平方向に電界や電流を生じさせる電気光学装置(水平型EPDやインプレーンスイッチングLCD、有機EL等)では第一基板に形成される。本実施形態では第一基板60側から電気光学材料を眺め、しかも画素電極48は画素内に占める面積比が大きい為に、画素電極48は透明導電膜にて第一基板60上に形成される。此に依り第一基板60側から表示された画像を見る事が実現する。   As shown in FIG. 5, the electro-optical device according to the present embodiment includes a transparent first substrate 60, a second substrate 68 disposed to face the first substrate 60, and an electro-optical device sandwiched between the pair of substrates. Material 52. A circuit layer 62, a light shielding film 64, and a pixel electrode 48 are disposed on the first substrate 60. The light shielding film 64 is disposed at a predetermined position between the first substrate 60 and the circuit layer 62. The pixel electrode 48 is formed on the circuit layer 62 so as to be in contact with the electro-optic material 52. The electro-optic element layer 66 includes a pixel electrode 48, a common electrode 50, and an electro-optic material 52. The common electrode 50 is formed on the inner surface of the second substrate in the electro-optical device (vertical EPD or ECD shown in FIG. 5 or LCD that is not in-plane switching) that generates an electric field or current in a direction perpendicular to the first substrate surface. In an electro-optical device (horizontal EPD, in-plane switching LCD, organic EL, or the like) that generates an electric field or current in the horizontal direction with respect to the first substrate surface, it is formed on the first substrate. In this embodiment, since the electro-optic material is viewed from the first substrate 60 side and the area ratio of the pixel electrode 48 in the pixel is large, the pixel electrode 48 is formed on the first substrate 60 with a transparent conductive film. . Thus, it is possible to see the image displayed from the first substrate 60 side.

回路層62は、第一走査線10や第二走査線12、信号線14、第1トランジスタ40、第2トランジスタ42、保持容量46を含んで居る。図2や図4に示す構造では、回路層62は読み出し線15をも含む。前述の如く、第1トランジスタ40と第2トランジスタ42は共に電界効果型の薄膜トランジスタにて構成される。斯うした構成に加え、本実施形態では更に第一基板60と第2トランジスタ42との間に遮光膜64が配置される。この遮光膜64は可視光を遮蔽する機能を有し、具体的にはアルミニウムやクロム、タングステン等の金属膜や、厚みが100nmから500nmと云った比較的厚い半導体膜が用いられ、第一基板60側から第2トランジスタ42の半導体膜部分72(活性領域)へ光が入射するのを遮る役割を演ずる。一方で、この遮光膜64は第1トランジスタ40の活性領域とは重ならない位置に設けられねばならない。ここで「活性領域」とは、チャンネル形成領域と、チャンネル形成領域に接するドレイン領域及びチャンネル形成領域に接するソース領域をいう。第1トランジスタ40は情報採取期間にフォトセンサとして機能するので、第1トランジスタ40のドレイン端に光が照射される事が必要となる。此に対して第2トランジスタ42は情報採取期間中に所望の画素を特定する選択機能を有するので、光照射に依って誤動作が有ってはならない。其処で本実施形態では第2トランジスタ42の下部にのみ遮光膜64を配置し、少なくとも第2トランジスタ42の活性領域へは光が入射されない様にする。此に依り第2トランジスタ42の光に依る誤動作が回避され、本装置が情報採取装置として正しく動作する事になる。遮光膜64の目的が第2トランジスタ42の光漏れ電流に依る誤動作防止なので、その遮光性は完璧である必要はない。第2トランジスタ42が誤動作しない程度に遮光すれば十分なのである。遮光膜64に非晶質乃至は多結晶質のシリコン膜を用いると、回路層62を通常のTFT製造プロセスで製造でき、便利である。その場合、遮光膜64は厚みが100nmから500nmもあれば遮光の目的を達する。遮光膜64が厚ければ遮光性は増すが、段差が大きくなったり、遮光膜が剥がれたりすると云った問題が生じやすい。従って遮光膜64となる半導体膜の厚みは150nmから300nmが理想的である。   The circuit layer 62 includes the first scanning line 10, the second scanning line 12, the signal line 14, the first transistor 40, the second transistor 42, and the storage capacitor 46. In the structure shown in FIGS. 2 and 4, the circuit layer 62 also includes the readout line 15. As described above, both the first transistor 40 and the second transistor 42 are formed of field effect thin film transistors. In addition to such a configuration, a light shielding film 64 is further disposed between the first substrate 60 and the second transistor 42 in this embodiment. The light-shielding film 64 has a function of shielding visible light. Specifically, a metal film such as aluminum, chromium, or tungsten, or a relatively thick semiconductor film having a thickness of 100 nm to 500 nm is used. It plays the role of blocking light from entering the semiconductor film portion 72 (active region) of the second transistor 42 from the 60 side. On the other hand, the light shielding film 64 must be provided at a position that does not overlap the active region of the first transistor 40. Here, the “active region” means a channel formation region, a drain region in contact with the channel formation region, and a source region in contact with the channel formation region. Since the first transistor 40 functions as a photosensor during the information collection period, it is necessary to irradiate the drain end of the first transistor 40 with light. On the other hand, since the second transistor 42 has a selection function for specifying a desired pixel during the information collection period, it should not malfunction due to light irradiation. Therefore, in this embodiment, the light shielding film 64 is disposed only under the second transistor 42 so that light is not incident on at least the active region of the second transistor 42. As a result, malfunction due to the light of the second transistor 42 is avoided, and the apparatus operates correctly as an information collecting apparatus. Since the purpose of the light shielding film 64 is to prevent malfunction due to the light leakage current of the second transistor 42, the light shielding property does not need to be perfect. It is sufficient to shield the light so that the second transistor 42 does not malfunction. Use of an amorphous or polycrystalline silicon film for the light shielding film 64 is convenient because the circuit layer 62 can be manufactured by a normal TFT manufacturing process. In that case, if the light shielding film 64 has a thickness of 100 nm to 500 nm, the light shielding purpose is achieved. If the light-shielding film 64 is thick, the light-shielding property is increased, but problems such as a large step or peeling of the light-shielding film are likely to occur. Therefore, the thickness of the semiconductor film that becomes the light shielding film 64 is ideally 150 nm to 300 nm.

保持容量46を備える場合には、保持容量46の構成要素は総て透明で有る事が望ましい。保持容量46は保持容量第一電極と保持容量第二電極と、此等保持容量第一電極と保持容量第二電極とに挟まれる保持容量誘電体膜とから成るが、保持容量第一電極も保持容量第二電極も保持容量誘電体膜もいずれも透明である事が望ましい。前述の如く本実施形態では、第一基板60の外側平面が機能平面となり、第一基板60側から表示を眺める。その為に、第一基板60は透明であり、画素電極48も透明導電膜にて形成される。保持容量46も比較的画素内に占める面積が大きい。取り分けEPDでは画素全体の50%以上の面積を保持容量46が占める事もある。第一基板60側から本装置を見て、電気光学材料が綺麗に見える為には、面積の広い保持容量60も透明で有る事が望まれる。   When the storage capacitor 46 is provided, it is desirable that all the components of the storage capacitor 46 are transparent. The storage capacitor 46 includes a storage capacitor first electrode, a storage capacitor second electrode, and a storage capacitor dielectric film sandwiched between the storage capacitor first electrode and the storage capacitor second electrode. It is desirable that both the storage capacitor second electrode and the storage capacitor dielectric film are transparent. As described above, in the present embodiment, the outer plane of the first substrate 60 is a functional plane, and the display is viewed from the first substrate 60 side. Therefore, the first substrate 60 is transparent, and the pixel electrode 48 is also formed of a transparent conductive film. The storage capacitor 46 also occupies a relatively large area in the pixel. In particular, in the EPD, the storage capacitor 46 may occupy an area of 50% or more of the entire pixel. In order for the electro-optic material to be seen beautifully when the apparatus is viewed from the first substrate 60 side, it is desirable that the storage capacitor 60 having a large area is also transparent.

次に回路層62の構造を説明する。絶縁膜70は下地保護膜で、遮光膜64を覆う様に第一基板60上に形成されている。この絶縁膜70の上面に、島状の半導体膜72が形成される。この半導体膜72は、図5の様に一つの島で第1トランジスタ40と第2トランジスタ42とで共有されても良いし、其々のトランジスタに対して一つ一つの島を対応させても良い。絶縁膜78は各トランジスタのゲート絶縁膜で有り、少なくとも半導体膜72のチャンネル形成領域を覆うように、絶縁膜70上に形成されている。絶縁膜78上であって半導体膜72の上方の所定位置には、第一走査線10及び第二走査線12が形成されている。第一走査線10と第二走査線12とは半導体膜72上に迄延在して、第1トランジスタ40と第2トランジスタ42のゲート電極に其々なる。絶縁膜80は第一層間絶縁膜で、第一走査線10及び第二走査線12を覆うように絶縁膜78上に形成されている。信号線14並びに読み出し線15は絶縁膜80上に形成されており、絶縁膜80に適宜設けられるコンタクトホールを介して半導体膜72等と接続している。同じく配線11は絶縁膜80上に形成されており、絶縁膜80に適宜設けられるコンタクトホールを介して半導体膜72や基準電源(i−1行目の第一走査線など)と接続している。絶縁膜82は第二層間絶縁膜であり、配線11や信号線14、及び他の配線75を覆うように絶縁膜80上に形成されている。この絶縁膜82上に保持容量46の一方の電極74(保持容量第一電極)が形成されている。この保持容量第一電極74は、絶縁膜82に適宜設けられるコンタクトホールを介して、配線11と接続している。絶縁膜84は第三層間絶縁膜であると共に保持容量誘電体膜でもある。保持容量誘電体膜は保持容量第一電極74及び配線76を覆うようにして絶縁膜82上に形成されている。前述の如く、本装置は第一基板60側から視認することを前提としているので、上記の各絶縁膜70や78、80、82、84は総て透明である。具体例には此等絶縁膜として酸化硅素膜や窒化硅素膜が使用される。第三層間絶縁膜上に形成された画素電極48は保持容量第二電極も兼ね、前述の如く透明導電膜にて形成される。画素電極が第1トランジスタのソースと接続すべく、第三層間絶縁膜には適宜コンタクトホールが開口され、下部層の配線(此処では配線76)との接続を取る。この配線76は絶縁膜82に設けられたコンタクトホールを介して配線75を接続されている。これにより、配線75と76とを介して画素電極48が半導体膜72と電気的に接続される。画素電極48も保持容量第一電極74も共に透明導電膜が好ましいので、此等の電極は例えばインジウム・錫酸化物ITO等で形成される。画素電極48上であって絶縁膜84上には電気光学材料52が、必要に応じて絶縁膜などを介して、形成される。此処では、電気光学材料52は白粒子および黒粒子を含有する電気泳動材料とし、以下の説明では白粒子がプラスに帯電し、黒粒子がマイナスに帯電している例を用いて本実施形態を説明する。この電気泳動材料52を覆うように、本例では、共通電極50を有する第二基板68が配置されている。画素電極48と共通電極50との間に電気光学材料52が挟まれることにより、電気光学素子44が構成されている。共通電極50が第二基板上に形成される場合には特段の透明性を要求されないので、アルミニウム等の非透明金属導電膜やITO等の透明導電膜が適宜用いられる。共通電極が第一基板側に形成される場合にはITO等の透明導電膜の使用が好ましい。   Next, the structure of the circuit layer 62 will be described. The insulating film 70 is a base protective film and is formed on the first substrate 60 so as to cover the light shielding film 64. An island-shaped semiconductor film 72 is formed on the upper surface of the insulating film 70. The semiconductor film 72 may be shared by the first transistor 40 and the second transistor 42 on one island as shown in FIG. 5, or each island may be associated with each transistor. good. The insulating film 78 is a gate insulating film of each transistor, and is formed on the insulating film 70 so as to cover at least the channel formation region of the semiconductor film 72. On the insulating film 78 and above the semiconductor film 72, the first scanning line 10 and the second scanning line 12 are formed. The first scanning line 10 and the second scanning line 12 extend to the semiconductor film 72 and become gate electrodes of the first transistor 40 and the second transistor 42, respectively. The insulating film 80 is a first interlayer insulating film and is formed on the insulating film 78 so as to cover the first scanning line 10 and the second scanning line 12. The signal line 14 and the readout line 15 are formed on the insulating film 80 and are connected to the semiconductor film 72 and the like through contact holes provided in the insulating film 80 as appropriate. Similarly, the wiring 11 is formed on the insulating film 80 and is connected to the semiconductor film 72 and a reference power source (the first scanning line in the (i-1) th row) through a contact hole provided in the insulating film 80 as appropriate. . The insulating film 82 is a second interlayer insulating film, and is formed on the insulating film 80 so as to cover the wiring 11, the signal line 14, and the other wiring 75. One electrode 74 (holding capacitor first electrode) of the holding capacitor 46 is formed on the insulating film 82. The storage capacitor first electrode 74 is connected to the wiring 11 through a contact hole appropriately provided in the insulating film 82. The insulating film 84 is a third interlayer insulating film as well as a storage capacitor dielectric film. The storage capacitor dielectric film is formed on the insulating film 82 so as to cover the storage capacitor first electrode 74 and the wiring 76. As described above, since this apparatus is assumed to be viewed from the first substrate 60 side, each of the insulating films 70, 78, 80, 82, 84 is transparent. In a specific example, a silicon oxide film or a silicon nitride film is used as the insulating film. The pixel electrode 48 formed on the third interlayer insulating film also serves as the storage capacitor second electrode and is formed of the transparent conductive film as described above. In order to connect the pixel electrode to the source of the first transistor, a contact hole is appropriately opened in the third interlayer insulating film to establish connection with the lower layer wiring (here, the wiring 76). The wiring 76 is connected to the wiring 75 through a contact hole provided in the insulating film 82. Thereby, the pixel electrode 48 is electrically connected to the semiconductor film 72 via the wirings 75 and 76. Since both the pixel electrode 48 and the storage capacitor first electrode 74 are preferably transparent conductive films, these electrodes are formed of indium tin oxide ITO or the like, for example. An electro-optic material 52 is formed on the pixel electrode 48 and on the insulating film 84 via an insulating film or the like as necessary. Here, the electro-optic material 52 is an electrophoretic material containing white particles and black particles, and in the following description, the embodiment is described using an example in which white particles are positively charged and black particles are negatively charged. explain. In this example, a second substrate 68 having a common electrode 50 is disposed so as to cover the electrophoretic material 52. The electro-optic element 44 is configured by sandwiching the electro-optic material 52 between the pixel electrode 48 and the common electrode 50. When the common electrode 50 is formed on the second substrate, special transparency is not required, and therefore a non-transparent metal conductive film such as aluminum or a transparent conductive film such as ITO is appropriately used. When the common electrode is formed on the first substrate side, it is preferable to use a transparent conductive film such as ITO.

上述の回路構成及び断面構造を為す本実施形態では、第一基板60上に第一走査線選択回路18と第二走査線選択回路20と、表示信号供給回路22と、センサ信号読み出し回路26とが形成される(図1及び図2)。此等の回路は外付けの集積回路を用いても良いが、画素部を為すTFTと同じ工程にてTFTで作製されるのが好ましい。第一走査線選択回路18は、第一走査線10に接続して複数の第一走査線10から特定の第一走査線10を選択する機能を有する。第二走査線選択回路20は、第二走査線12に接続して複数の第二走査線12から特定の第二走査線12を選択する機能を有する。表示信号供給回路22は信号線14の一端側に接続して、複数の信号線14の各々に各信号線14に固有な表示信号を供給する機能を有する。センサ信号読み出し回路26は、信号線14の他端側(図1)又は読み出し線15の他端側(図2)に接続して、複数の信号線14乃至は読み出し線15の各々から出力される各信号線14や各読み出し線15に固有なセンサ信号を読み取る機能を有する。具体的には、センサ信号読み出し回路26はシフトレジスタやデコーダー等から成る選択回路と作動増幅回路等から成る電流比較回路(電流計)とを含み、選択回路が選択した信号線14乃至は読み出し線15に表れた微弱なフォトセンサ信号を電流比較回路(電流計)が増幅して、計測する。   In the present embodiment having the circuit configuration and the cross-sectional structure described above, the first scanning line selection circuit 18, the second scanning line selection circuit 20, the display signal supply circuit 22, and the sensor signal readout circuit 26 are formed on the first substrate 60. Is formed (FIGS. 1 and 2). Although these circuits may use an external integrated circuit, they are preferably made of TFTs in the same process as the TFTs forming the pixel portion. The first scanning line selection circuit 18 has a function of connecting to the first scanning line 10 and selecting a specific first scanning line 10 from the plurality of first scanning lines 10. The second scanning line selection circuit 20 has a function of connecting to the second scanning line 12 and selecting a specific second scanning line 12 from the plurality of second scanning lines 12. The display signal supply circuit 22 is connected to one end side of the signal line 14 and has a function of supplying a display signal unique to each signal line 14 to each of the plurality of signal lines 14. The sensor signal readout circuit 26 is connected to the other end side of the signal line 14 (FIG. 1) or the other end side of the readout line 15 (FIG. 2), and is output from each of the plurality of signal lines 14 to 15. A function of reading a sensor signal unique to each signal line 14 and each readout line 15. Specifically, the sensor signal readout circuit 26 includes a selection circuit composed of a shift register, a decoder and the like, and a current comparison circuit (ammeter) composed of an operation amplification circuit and the like, and the signal line 14 or readout line selected by the selection circuit. A weak photosensor signal appearing at 15 is amplified by a current comparison circuit (ammeter) and measured.

更に本実施形態は、データ処理部34は入力部32と制御部28と記憶部30とを有する。入力部32は外部より電気信号として入力された表示画像情報を制御部28乃至は記憶部30に供給する機能を有すると共に、使用者に依る種々の入力指示を制御部28に伝える機能をも担う。入力指示とは、例えば方向指示キー(十字キー等)や押しボタン等で表現された使用者の意図を反映する電気信号で、入力部32は斯うした信号をも受ける。例えば、詳細は後述するが、本装置で表示モードと手書き入力モードとを切り替える信号を受けて、これを制御部28に伝える。制御部28は少なくとも第一走査線選択回路18と第二走査線選択回路20、表示信号供給回路22、センサ信号読み出し回路26、及び記憶部30を制御する機能を有する。又、記憶部30は表示画像情報と、センサ信号に基づく記載画像情報とを記憶する機能を有する。記載画像情報とは、情報採取期間に本装置が採取したセンサ信号に基づいて合成された情報で、例えば使用者がペン型光照射器を用いて本装置の機能表面に記載した手書き入力情報などに対応する。制御部28は、センサ信号読み出し回路26によって読み出されたデータ(以後「読み出しデータ」と称す)を取得し、これを記憶部30に格納する。次に制御部28は、単数乃至は複数の情報採取期間(情報採取フレーム)から得られた読み出しデータに基づいて、記載画像情報を作成する。更に制御部は記憶部30に格納されて居る表示画像情報とこの記載画像情報とを用いて新たな表示画像を作製し、新たな表示画像を新たな表示信号として表示信号供給回路22に供給する機能を有する。又、制御部28は入力指示を受けて、表示信号供給回路22やセンサ信号読み出し回路26、第一走査線選択回路18、第二走査線選択回路20などから動作が必要な回路を選択し、選択された回路に必要な信号を供給したり、信号を受けたりする機能をも有する。記憶部30は、例えばDRAMやSRAM等の半導体メモリを用いて構成されており、表示画像情報や読み出しデータ、記載画像情報、更には制御部28によって生成乃至は使用される各種データを記憶する機能を担う。   Furthermore, in the present embodiment, the data processing unit 34 includes an input unit 32, a control unit 28, and a storage unit 30. The input unit 32 has a function of supplying display image information input as an electrical signal from the outside to the control unit 28 or the storage unit 30 and also has a function of transmitting various input instructions depending on the user to the control unit 28. . The input instruction is an electric signal that reflects the user's intention expressed by, for example, a direction instruction key (cross key or the like) or a push button, and the input unit 32 also receives such a signal. For example, as will be described later in detail, the apparatus receives a signal for switching between the display mode and the handwriting input mode, and notifies the control unit 28 of this signal. The control unit 28 has a function of controlling at least the first scanning line selection circuit 18 and the second scanning line selection circuit 20, the display signal supply circuit 22, the sensor signal readout circuit 26, and the storage unit 30. The storage unit 30 has a function of storing display image information and description image information based on sensor signals. Described image information is information synthesized based on sensor signals collected by the device during the information collection period, such as handwritten input information written on the functional surface of the device by a user using a pen-type light irradiator, etc. Corresponding to The control unit 28 acquires the data read by the sensor signal reading circuit 26 (hereinafter referred to as “read data”) and stores it in the storage unit 30. Next, the control unit 28 creates description image information based on the read data obtained from one or more information collection periods (information collection frames). Further, the control unit creates a new display image using the display image information stored in the storage unit 30 and the description image information, and supplies the new display image to the display signal supply circuit 22 as a new display signal. It has a function. In response to the input instruction, the control unit 28 selects a circuit that requires an operation from the display signal supply circuit 22, the sensor signal readout circuit 26, the first scanning line selection circuit 18, the second scanning line selection circuit 20, and the like. It also has a function of supplying a necessary signal to the selected circuit and receiving a signal. The storage unit 30 is configured using, for example, a semiconductor memory such as DRAM or SRAM, and stores display image information, read data, description image information, and various data generated or used by the control unit 28. Take on.

又、本実施形態は、専用の読み出し線15が無く信号線14が読み出し線をも兼用する場合(図1)に、各信号線14と表示信号供給回路22との間に切り替え回路24を備える。この切り替え回路24は、パスゲートから成り、制御部28から供給される制御信号に基づいて、信号線14と表示信号供給回路22との導通乃至は非導通を切り替える。切り替え回路24は画像表示期間に信号線14と表示信号供給回路22とを導通状態とし、情報採取期間に信号線14と表示信号供給回路22とを非導通状態とする。即ち、表示信号供給回路22による信号線14への表示画像信号書き込み時に切り替え回路24は導通状態となる。反対にセンサ信号読み出し回路26に依ってセンサ信号を読み出す時に切り替え回路24は非導通状態となる。   Further, the present embodiment includes a switching circuit 24 between each signal line 14 and the display signal supply circuit 22 when there is no dedicated readout line 15 and the signal line 14 also serves as a readout line (FIG. 1). . The switching circuit 24 includes a pass gate, and switches between conduction and non-conduction between the signal line 14 and the display signal supply circuit 22 based on a control signal supplied from the control unit 28. The switching circuit 24 makes the signal line 14 and the display signal supply circuit 22 conductive during the image display period, and makes the signal line 14 and the display signal supply circuit 22 non-conductive during the information collection period. That is, the switching circuit 24 becomes conductive when the display signal supply circuit 22 writes the display image signal to the signal line 14. On the other hand, when the sensor signal is read out by the sensor signal reading circuit 26, the switching circuit 24 becomes non-conductive.

本装置は上述の構成を為し、表示装置で有ると共に情報採取装置でもある。次にその駆動方法並びに使用方法を、図1乃至図2、及び図14を参照して説明する。   This device has the above-described configuration, and is a display device and an information collecting device. Next, the driving method and the usage method will be described with reference to FIGS. 1 to 2 and FIG.

本装置には、その機能平面が表示装置として働いて居る表示モードと、機能平面に使用者が手書き入力を行って居る手書き入力モードとが存在する。手書き入力モードでは機能平面が表示装置として働くと共に平面センサとしても働いている。表示モードは単数乃至は複数の画像表示期間(画像表示フレーム)のみから成り、此等画像表示フレームを用いて本装置は表示装置として働く。これに対して手書き入力モードは画像表示期間(画像表示フレーム)と情報採取期間(情報採取フレーム)とが交互に繰り返され、表示画面上に手書き入力が可能になる。以下此等の詳細を説明する。   This apparatus has a display mode in which the functional plane functions as a display device and a handwriting input mode in which a user performs handwriting input on the functional plane. In the handwriting input mode, the functional plane functions as a display device and also functions as a plane sensor. The display mode consists of only one or a plurality of image display periods (image display frames), and the apparatus functions as a display apparatus using these image display frames. In contrast, in the handwriting input mode, the image display period (image display frame) and the information collection period (information collection frame) are alternately repeated, and handwriting input is possible on the display screen. These details will be described below.

(1)表示モード
表示モードは単数乃至は複数の画像表示フレームから成り、この間に本装置は表示装置となる。各画像表示フレームにて本装置では以下の動作が行われる。まず表示モード時に於いては、制御部28は第二走査線選択回路22とセンサ信号読み出し回路26との動作を完全に停止させる。従って第二走査線選択回路22は全ての第二走査線12を非選択状態とする。第2トランジスタ42がN型であれば、総ての第二走査線12は最低電位(例えば0V)に維持される。此に依り全ての第2トランジスタ42がオフ状態となる。更に本装置に専用の読み出し線が無く信号線14が読み出し線をも兼用する場合(図1)に、制御部28は切り替え回路24を導通状態として、表示信号供給回路22と信号線14とを接続する。入力部32より得られた表示画像情報は記憶部30に格納されると共に、各行毎の表示データに変換され、選択される第一走査線10に対応する表示データは制御部28から表示信号供給回路22に伝達される。次いで制御部28は第一走査線選択回路18を動作させ、複数の第一走査線10から所望の第一走査線10を選択する。第1トランジスタ40がN型であれば、選択時に第一走査線10に最高電位(例えば5V)が与えられ、非選択時に第一走査線10は最低電位(例えば0V)に維持される。所望の第一走査線10が選択された状態で表示信号供給回路22より信号線14を介して各画素に表示データが供給される。以下表示データが画素に供給される必要が有る画素に対して同じ動作が繰り返され、一枚の画像表示フレームが完了する(一回の画像表示期間が終了する)。動画を表示したり、前の画像表示フレームと異なった画像を次の画像表示フレームに表示させる場合、上述と同じ動作を繰り返して次の画像表示フレームを作製して行く。
(1) Display mode The display mode is composed of one or a plurality of image display frames, and this apparatus becomes a display apparatus during this period. The following operations are performed in this apparatus in each image display frame. First, in the display mode, the control unit 28 completely stops the operations of the second scanning line selection circuit 22 and the sensor signal readout circuit 26. Therefore, the second scanning line selection circuit 22 puts all the second scanning lines 12 into a non-selected state. If the second transistors 42 are N-type, all the second scanning lines 12 are maintained at the lowest potential (for example, 0 V). As a result, all the second transistors 42 are turned off. Further, when the apparatus does not have a dedicated readout line and the signal line 14 also serves as a readout line (FIG. 1), the control unit 28 sets the switching circuit 24 in a conductive state so that the display signal supply circuit 22 and the signal line 14 are connected. Connecting. Display image information obtained from the input unit 32 is stored in the storage unit 30 and converted into display data for each row, and display data corresponding to the selected first scanning line 10 is supplied from the control unit 28 as a display signal. It is transmitted to the circuit 22. Next, the control unit 28 operates the first scanning line selection circuit 18 to select a desired first scanning line 10 from the plurality of first scanning lines 10. If the first transistor 40 is N-type, the highest potential (for example, 5 V) is applied to the first scanning line 10 when selected, and the first scanning line 10 is maintained at the lowest potential (for example, 0 V) when not selected. Display data is supplied to each pixel from the display signal supply circuit 22 via the signal line 14 in a state where the desired first scanning line 10 is selected. Thereafter, the same operation is repeated for the pixels for which display data needs to be supplied to the pixels, and one image display frame is completed (one image display period ends). When a moving image is displayed or an image different from the previous image display frame is displayed on the next image display frame, the same operation as described above is repeated to produce the next image display frame.

白粒子が正に帯電し、黒粒子が負に帯電しているEPDを例に取ると、第二走査線選択回路20とセンサ信号読み出し回路26との動作を完全に停止させ(従って総ての第二走査線12は最低電位(例えば0V)に維持され)、切り替え回路24を導通させた状態で、最初の画像表示フレームで全画面に白画像を表示させる(白リセットと称し、全画面を白く消去する事に対応する)。そして次の画像表示フレームで目的の表示画像情報を表示させる。共通電極50は、白リセット時に最高電位(例えば5V)が付与され、表示画像情報を各画素に書き込む際には低電位(例えば0.5V)に維持される。共通電極電位が書き込み時に最低電位(例えば0V)ではなく低電位(例えば0.5V)とされるのは、情報採取期間に共通電極電位を最低電位(例えば0V)とし、共通電極と非選択の第一走査線(EPD走査線)10とを同電位として、表示された画像を情報採取期間中も維持する為である。目的の表示画像情報を表示させる画像表示フレームで、画素を黒表示させる(黒書き込み)時に表示信号供給回路22は信号線14に対して最高電位(例えば5V)を与え、画素を白表示させる(白書き込み)時に信号線14に対して最低電位(例えば0V)の表示信号を供給する。この時、共通電極50の電位は低電位(例えば0.5V)である。   Taking an EPD in which white particles are positively charged and black particles are negatively charged, the operations of the second scanning line selection circuit 20 and the sensor signal readout circuit 26 are completely stopped (thus, all The second scanning line 12 is maintained at the lowest potential (for example, 0 V), and a white image is displayed on the entire screen in the first image display frame in a state where the switching circuit 24 is turned on (referred to as white reset, the entire screen is displayed). It corresponds to erasing white). Then, target display image information is displayed in the next image display frame. The common electrode 50 is given a maximum potential (for example, 5 V) at the time of white reset, and is maintained at a low potential (for example, 0.5 V) when writing display image information to each pixel. The common electrode potential is set to a low potential (for example, 0.5 V) instead of the minimum potential (for example, 0 V) at the time of writing. The common electrode potential is set to the minimum potential (for example, 0 V) during the information collection period. This is because the first scanning line (EPD scanning line) 10 is set to the same potential and the displayed image is maintained during the information collection period. In the image display frame for displaying the target display image information, when the pixel is displayed in black (black writing), the display signal supply circuit 22 gives the highest potential (for example, 5V) to the signal line 14 and displays the pixel in white ( A display signal having the lowest potential (for example, 0 V) is supplied to the signal line 14 during white writing. At this time, the potential of the common electrode 50 is a low potential (for example, 0.5 V).

(2)手書き入力モード
手書き入力モードでは画像表示期間と情報採取期間とが交互に繰り返す。以下図14を用いて手書き入力モードを説明する。画像表示期間に機能平面に画像を表示させる方法は上記の表示モードと同じである。図14―(1)はK次画像表示期間の表示画像情報の一例を示し、機能平面に文章が表示されている。K次画像表示期間の表示画像情報とは現在の情報採取期間が始まる直前の画像表示期間に表示された画像である。
(2) Handwriting input mode In the handwriting input mode, the image display period and the information collection period are alternately repeated. Hereinafter, the handwriting input mode will be described with reference to FIG. The method of displaying an image on the functional plane during the image display period is the same as the display mode described above. FIG. 14- (1) shows an example of display image information in the K-th order image display period, and text is displayed on the functional plane. The display image information in the K-th image display period is an image displayed in the image display period immediately before the current information collection period starts.

利用者が本装置の機能平面に手書き入力を行う際には、まず表示モードから手動入力モードへの切り替え操作を指示する。入力部32が斯うした指示を反映した信号を受理すると、その内容が入力部32から制御部28に伝達される。此を受けて制御部28は表示モードから手書き入力モードへ切り替える制御を行う。具体的には、情報採取期間を開始し、以降画像表示期間と情報採取期間とを交互に繰り返す。情報採取期間に入ると制御部28は表示信号供給回路22と第一走査線選択回路18の動作を停止し、画像表示期間に停止していた第二走査線選択回路20とセンサ信号読み出し回路26とを動作させる。併せて、切り替え回路24が有る場合には(図1)、切り替え回路24を非導通状態とし、表示信号供給回路22と信号線14とを遮断する。   When the user performs handwriting input on the functional plane of the apparatus, first, an instruction to switch from the display mode to the manual input mode is given. When the input unit 32 receives a signal reflecting such an instruction, the content is transmitted from the input unit 32 to the control unit 28. In response to this, the control unit 28 performs control to switch from the display mode to the handwriting input mode. Specifically, the information collection period is started, and thereafter the image display period and the information collection period are alternately repeated. When the information collection period starts, the control unit 28 stops the operations of the display signal supply circuit 22 and the first scanning line selection circuit 18, and the second scanning line selection circuit 20 and the sensor signal readout circuit 26 that have been stopped during the image display period. And make it work. At the same time, when the switching circuit 24 is present (FIG. 1), the switching circuit 24 is turned off and the display signal supply circuit 22 and the signal line 14 are shut off.

白粒子が正に帯電し、黒粒子が負に帯電しているEPDの場合、表示モードで表示された画像を情報採取期間中も維持する為に制御部28は以下の画像維持操作を各回路に行う。情報採取期間に入ると共に、制御部は共通電極50の電位を其れまでの低電位(例えば0.5から)最低電位(例えば0V)に落とす。同時に総ての第一走査線10を最低電位とし、総ての第1トランジスタをオフ状態とする。此に依り保持容量や画素電極と信号線とは完全に遮断される。次いで総ての第二走査線12を一旦選択状態として、最高電位(例えば5V)に上げる。此に依り画素部の総ての第2トランジスタがオン状態に成り、基準電源(この場合最低電位の0V)と画素電極とが導通して総ての画素電極電位が最低電位に落ちる。総ての画素電極電位が最低電位に落ちるが、ほぼ同時に共通電極電位も最低電位に落ちているので、画素電極と共通電極は同電位にあり、画像は維持される。共通電極を最低電位に落とす時刻と画素電極を最低電位に落とす時刻との時間差がEPD材料の応答時間の10分の1以下で有れば、EPD材料を構成する粒子(白粒子や黒粒子)は殆ど動かないので、画像は維持される。通常、EPD材料の応答時間は数百ミリ秒で有るので、この時間差は数十ミリ秒以下で無ければならない。その後、制御部28の制御に基づき、第二走査線選択回路20は、全ての第二走査線12を最低電位(例えば0V)に低下させ、一旦総ての第2トランジスタ42をオフ状態とする。斯うして画像維持が為された後に、制御部28は情報採取を開始する。即ち各画素を光検知器として機能させ、光照射の有無乃至はその照度を計測する。情報採取期間には、第一走査線選択回路18は総ての第一走査線10を非選択状態として、最低電位(例えば0V)の走査信号を供給し、画素部に於ける総ての第1トランジスタ40をオフ状態にして居る。此に依り第1トランジスタ40はフォトダイオードの役割を担う事になる。一方、第二走査線選択回路20は、各第二走査線12を順次選択して、選択行に接続する第2トランジスタ42をオン状態とする。第2トランジスタ42がN型である場合には、選択された第二走査線12には最高電位(例えば5V)のフォトセンサ走査信号が供給される。特定の第二走査線12(例えばi行目の第二走査線)が選択された状態で、j列目の信号線14を基準電源と反対の電位とする。例えば、基準電源が低電位に有れば信号線14は高電位(例えば5V)とし、基準電源が高電位に有れば信号線14は低電位(例えば5V)とされる。此に依り高電圧源は、センサ信号読み出し回路26の一部を為す電流計と、信号線と、光検知すべく選択された画素でオフ状態に有る第1トランジスタ40と、同じく光検知すべく選択された画素でオン状態に有る第2トランジスタ42、とを介して低電圧源と接続される。選択された画素での光照度が高ければ、第1トランジスタ40が光漏れ電流を生じ、光照度に応じて異なる大きさのオフ電流が発生する。このオフ電流を、センサ信号読み出し回路26が読み出し、選択された画素(この場合i行j列の画素)に於ける光照度を測定する。以降センサ信号読み出し回路26が順次列を選択して、フォトセンサ信号(読み出しデータ)を各画素から読み出す。得られた読み出しデータはセンサ信号読み出し回路26から制御部28に転送され、更に記憶部30に格納される。以降センサ信号読み出し回路26は順次列を選択して行き、選択された画素から得られる読み出しデータを次々と記憶部に格納して行く。センサ信号読み出し回路26に依り、一行の読み出しが終了すると、次の行に移る。此の操作を繰り返し、一情報採取期間に平面センサ一枚の全体からフォトセンサ信号(読み出しデータ)を読み出す。上述の駆動方法に依って画像採取期間に本装置は光検知する情報採取装置と化す。   In the case of an EPD in which white particles are positively charged and black particles are negatively charged, the control unit 28 performs the following image maintenance operation in each circuit in order to maintain the image displayed in the display mode even during the information collection period. To do. As the information collection period starts, the control unit lowers the potential of the common electrode 50 to a low potential (for example, from 0.5) to the lowest potential (for example, 0 V). At the same time, all the first scanning lines 10 are set to the lowest potential, and all the first transistors are turned off. As a result, the storage capacitor, the pixel electrode, and the signal line are completely cut off. Next, all the second scanning lines 12 are once selected and raised to the maximum potential (for example, 5 V). As a result, all the second transistors in the pixel portion are turned on, the reference power supply (in this case, the lowest potential of 0V) and the pixel electrode are brought into conduction, and all the pixel electrode potentials drop to the lowest potential. Although all the pixel electrode potentials are lowered to the lowest potential, the common electrode potential is also lowered to the lowest potential almost simultaneously. Therefore, the pixel electrode and the common electrode are at the same potential, and the image is maintained. If the time difference between the time when the common electrode is lowered to the lowest potential and the time when the pixel electrode is lowered to the lowest potential is 1/10 or less of the response time of the EPD material, particles constituting the EPD material (white particles and black particles) Does not move so the image is preserved. Usually, the response time of EPD material is several hundred milliseconds, so this time difference must be tens of milliseconds or less. Thereafter, based on the control of the control unit 28, the second scanning line selection circuit 20 lowers all the second scanning lines 12 to the lowest potential (for example, 0V), and temporarily turns off all the second transistors 42. . Thus, after the image is maintained, the control unit 28 starts collecting information. That is, each pixel is caused to function as a light detector, and the presence or absence of light irradiation or its illuminance is measured. During the information collection period, the first scanning line selection circuit 18 sets all the first scanning lines 10 to a non-selected state, supplies a scanning signal having the lowest potential (for example, 0 V), and sets all the first scanning lines 10 in the pixel portion. One transistor 40 is turned off. Accordingly, the first transistor 40 plays a role of a photodiode. On the other hand, the second scanning line selection circuit 20 sequentially selects the second scanning lines 12 and turns on the second transistors 42 connected to the selected row. When the second transistor 42 is N-type, the selected second scanning line 12 is supplied with a photosensor scanning signal having the highest potential (for example, 5 V). In a state where a specific second scanning line 12 (for example, the i-th second scanning line) is selected, the signal line 14 in the j-th column is set to a potential opposite to that of the reference power source. For example, if the reference power supply is at a low potential, the signal line 14 is set to a high potential (for example, 5V), and if the reference power supply is at a high potential, the signal line 14 is set to a low potential (for example, 5V). Accordingly, the high voltage source includes an ammeter that forms part of the sensor signal readout circuit 26, a signal line, the first transistor 40 that is off in the pixel that is selected to detect light, and the light source that is also to detect light. The selected pixel is connected to the low voltage source through the second transistor 42 that is in the on state. If the light illuminance at the selected pixel is high, the first transistor 40 generates a light leakage current, and an off-current having a different magnitude is generated according to the light illuminance. The sensor signal readout circuit 26 reads this off-current, and measures the light illuminance at the selected pixel (in this case, the pixel in i row and j column). Thereafter, the sensor signal readout circuit 26 sequentially selects columns and reads out photosensor signals (readout data) from each pixel. The obtained readout data is transferred from the sensor signal readout circuit 26 to the control unit 28 and further stored in the storage unit 30. Thereafter, the sensor signal readout circuit 26 sequentially selects columns, and successively stores readout data obtained from the selected pixels in the storage unit. When reading of one line is completed by the sensor signal reading circuit 26, the process proceeds to the next line. This operation is repeated, and a photo sensor signal (read data) is read from one entire flat sensor in one information collecting period. Depending on the driving method described above, this apparatus becomes an information collecting apparatus that detects light during the image collecting period.

所で、各画素に強い光が当たって、第1トランジスタ40のオフ電流が大きいと、画素電極電位が、画像維持操作にて設定された基準電源電位からずれて仕舞う。此を回避するには第2トランジスタ42のオン抵抗が第1トランジスタ40に強い光が照射された際のオフ抵抗よりも十分に小さければ良い。第1トランジスタ40のチャンネル幅とチャンネル長、及び第2トランジスタ42のチャンネル幅とチャンネル長、更に第二走査線12の選択状態の電位(第2トランジスタをオン状態にするゲート電位)は、第1トランジスタ40に強い光が照射された際のオフ抵抗が第2トランジスタ42のオン抵抗よりも100倍以上高くなる様に設定する。此に依り、情報採取期間に画像が乱れる事が無くなる。   However, when strong light hits each pixel and the off-state current of the first transistor 40 is large, the pixel electrode potential is shifted from the reference power supply potential set in the image maintenance operation. In order to avoid this, it is sufficient that the on-resistance of the second transistor 42 is sufficiently smaller than the off-resistance when the first transistor 40 is irradiated with strong light. The channel width and channel length of the first transistor 40, the channel width and channel length of the second transistor 42, and the potential in the selected state of the second scanning line 12 (the gate potential for turning on the second transistor) are the first The off resistance when the transistor 40 is irradiated with strong light is set to be 100 times higher than the on resistance of the second transistor 42. As a result, the image is not disturbed during the information collection period.

さて、入力機器としてペン型光照射機器を用いると、制御部28は読み出しデータに基づいて、利用者が機能平面(第一基板60外側平面)上のいずれの位置をペン型光照射機器でなぞったか(即ち、ペン先の位置)を定める事が出来る。図14−(2)ではK次情報採取期間に平面センサが特定したペンの位置が例として示されている。制御部28は、斯うして得られたペン先の位置検出結果をその後の情報処理に反映させ得る。例えば、表示画像に画像を次のページへ送るページ送りボタンが含まれており、その位置がペン型光照射機器にて指定されたとすると、制御部28は表示画像を次のページに切り替える処理を行う。又、本実施形態の電気光学装置1が種々の電子機器に組み込まれる場合には、制御部28は、図示しない上位の制御部へ位置検出結果を引き渡す事も可能となり、利用者の指示内容を上位の制御部に依るその後の処理に反映させられる。上記の如き利用者に依る指示内容をその後の情報処理に反映させる態様の一つの具体例として、手書き入力の内容を画像中に上書きする方法を以下に簡単に説明する。   Now, when a pen-type light irradiation device is used as the input device, the control unit 28 traces any position on the functional plane (the first substrate 60 outer plane) with the pen-type light irradiation device based on the read data. (That is, the position of the nib) can be determined. In FIG. 14- (2), the position of the pen specified by the flat sensor during the K-th information collection period is shown as an example. The control unit 28 can reflect the pen tip position detection result thus obtained in subsequent information processing. For example, if the display image includes a page feed button for sending an image to the next page and the position is designated by the pen-type light irradiation device, the control unit 28 performs a process of switching the display image to the next page. Do. In addition, when the electro-optical device 1 according to the present embodiment is incorporated into various electronic devices, the control unit 28 can also deliver the position detection result to a higher-level control unit (not shown). This is reflected in the subsequent processing by the upper control unit. As one specific example of the manner in which the contents of instructions given by the user as described above are reflected in subsequent information processing, a method of overwriting the contents of handwritten input in an image will be briefly described below.

制御部28は、K次情報採取期間にセンサ信号読み出し回路26から取得し、記憶部30に格納した読み出しデータに基づき、機能平面(画面)上でのペン型光照射機器の位置を特定する(図14−(2))。次に特定したペン型光照射機器の位置情報を用いて次の(K+1次)画像表示期間に元の(K次)表示画像情報に上書きされる記載画像情報を作成する。記載画像情報とは機能平面から入力された情報を反映する表示情報で、此は次の画像表示期間に表示される。具体的にはペン型光照射機器で書かれた内容に相当する。図14−(3)にはK+1次の画像表示期間に表示する記載画像情報が描かれており、ペン型光照射機器位置に対応する画素を黒表示として居る。次いで制御部28は、記憶部30に格納されているK+1次表示画像情報(図14−(5)、この例ではK次表示画像情報とK+1次表示画像情報は同じ)に対しK+1次記載画像情報を上書きしてK+1次画像表示期間の表示画像を作製し(図14−(4))、其れをK+1次画像表示期間に表示する。斯うして前画面(K次画像表示期間の表示画像情報)での黒表示の画素と、新たにペン型光照射機器によって書き込みされた位置に対応する画素(K+1次画像表示期間の記載画像情報)とが黒表示となる。即ち、前画面での表示内容に利用者が書き込みした画像が得られるのである。   The control unit 28 specifies the position of the pen-type light irradiation device on the functional plane (screen) based on the read data acquired from the sensor signal reading circuit 26 and stored in the storage unit 30 during the K-th order information collection period ( FIG. 14- (2)). Next, description image information to be overwritten on the original (K-order) display image information in the next (K + 1) -order image display period is created using the specified position information of the pen-type light irradiation device. The described image information is display information that reflects information input from the functional plane, and is displayed in the next image display period. Specifically, it corresponds to the content written with a pen-type light irradiation device. In FIG. 14- (3), description image information to be displayed in the (K + 1) -th order image display period is drawn, and pixels corresponding to the pen-type light irradiation device positions are displayed in black. Next, the control unit 28 performs the K + 1 primary display image information with respect to the K + 1 primary display image information (FIG. 14- (5), in this example, the K primary display image information and the K + 1 primary display image information are the same) stored in the storage unit 30. The information is overwritten to produce a display image in the K + 1 primary image display period (FIG. 14- (4)), which is displayed in the K + 1 primary image display period. Thus, the black display pixel in the previous screen (display image information in the K-th image display period) and the pixel corresponding to the position newly written by the pen-type light irradiation device (description image information in the K + 1-order image display period) ) And black display. That is, an image written by the user on the display content on the previous screen is obtained.

K+1次画像表示期間が終了すると、次はK+1次の情報採取期間が始まる。先と同様にこの期間にもペン型光照射機器の位置が特定される(図14−(6))。この位置情報に基づいて制御部は次のK+1次画像表示期間の記載画像情報を作成する(図14−(7))。図14の例ではK次画像表示期間からK+1次画像表示期間の間にペン型光照射機器が動いたので、K+2次画像表示期間の記載画像情報は線となっている(図14−(7))。斯うして得られたK+2次記載画像情報とK+2次表示画像情報(図14−(9)、この例ではK+1次表示画像情報とK+2次表示画像情報は同じ)とを合成してK+2次画像表示期間の表示画像を作製し(図14−(8))、其れをK+2次画像表示期間に表示する。以下同様にして画像表示期間と情報採取期間とを交互に繰り返して、機能平面への手書き入力が進んで行く。   When the K + 1st order image display period ends, the K + 1st order information collection period starts next. As before, the position of the pen-type light irradiation device is specified during this period (FIG. 14- (6)). Based on this position information, the control unit creates description image information for the next K + 1st order image display period (FIG. 14- (7)). In the example of FIG. 14, since the pen-type light irradiation device has moved between the K-order image display period and the K + 1-order image display period, the image information described in the K + second-order image display period is a line (FIG. 14- (7 )). The thus obtained K + secondary description image information and K + secondary display image information (FIG. 14- (9), in this example, K + 1st order display image information and K + secondary display image information are the same) are combined to obtain a K + secondary image. A display image of the display period is produced (FIG. 14- (8)), and it is displayed in the K + secondary image display period. Similarly, the image display period and the information collection period are alternately repeated, and handwriting input to the functional plane proceeds.

図15は、本実施形態の電気光学装置を用いる電子機器の具体例を説明する斜視図である。図15(A)は、いわゆる電子ブックを示す斜視図である。この電子ブック1000は、ブック形状のフレーム1001と、このフレーム1001に対して回動自在に設けられた(開閉可能な)カバー1002と、操作部1003と、本実施形態に係る電気光学装置によって構成された表示部1004と、を備えている。図15(B)は、いわゆる電子ペーパーを示す斜視図である。この電子ペーパー1200は、紙と同様の質感および柔軟性を有するリライタブルシートで構成される本体部1201と、本実施形態に係る電気光学装置によって構成された表示部1202と、を備えている。なお、電気光学装置を適用可能な電子機器の範囲はこれに限定されず、帯電粒子の移動に伴う視覚上の色調の変化を利用した装置を広く含むものである。例えば、上記のような装置の他、電気光学装置が貼り合わせられた壁面等の不動産に属するもの、車両、飛行体、船舶等の移動体に属するものも該当する。   FIG. 15 is a perspective view illustrating a specific example of an electronic apparatus using the electro-optical device according to this embodiment. FIG. 15A is a perspective view illustrating a so-called electronic book. The electronic book 1000 includes a book-shaped frame 1001, a cover 1002 that can be rotated (openable and closable) with respect to the frame 1001, an operation unit 1003, and the electro-optical device according to the present embodiment. The display unit 1004 is provided. FIG. 15B is a perspective view illustrating so-called electronic paper. The electronic paper 1200 includes a main body unit 1201 configured by a rewritable sheet having the same texture and flexibility as paper, and a display unit 1202 configured by the electro-optical device according to the present embodiment. Note that the range of electronic devices to which the electro-optical device can be applied is not limited to this, and includes a wide range of devices that utilize changes in visual color tone accompanying the movement of charged particles. For example, in addition to the above-described devices, those belonging to real estate such as wall surfaces to which an electro-optical device is bonded, and those belonging to moving bodies such as vehicles, flying objects, and ships are also applicable.

以上のように本実施形態の電気光学装置は、第1トランジスタをオフ状態とした際に第2トランジスタを走査して順次オン状態とし、この状態で第1トランジスタに対し、ペン型光照射機器で比較的強い光を当てることによってオフ電流を生じさせ、或いは増加させる。そして、信号線を介して当該オフ電流を検出することにより、オフ電流の大きい第1トランジスタを把握できる。このオフ電流の大きい第1トランジスタの位置に基づき、画面上の指定位置を検出することが可能となる。このように、従来技術と比較して簡素な構成により、画面上の位置検出が可能な電気光学装置を実現することができる。また、かかる構成によれば、透明な第一基板側から第1トランジスタへの光照射を行うことができる。この際に、遮光膜により第2トランジスタへの光入射が遮られるので、第2トランジスタの動作制御がより容易となる。またこの際に、回路層と接する(すなわち第一基板側の)画素電極を透明導電膜とすることにより、画素電極側から電気光学素子の表示状態を視認できる。   As described above, when the first transistor is turned off, the electro-optical device according to the present embodiment scans the second transistor and sequentially turns it on. In this state, the first transistor is moved to the pen-type light irradiation device. The off-current is generated or increased by applying relatively strong light. Then, by detecting the off-current through the signal line, the first transistor having a large off-current can be grasped. The designated position on the screen can be detected based on the position of the first transistor having a large off-state current. As described above, an electro-optical device capable of detecting the position on the screen can be realized with a simple configuration as compared with the related art. Moreover, according to this structure, the light irradiation to the first transistor can be performed from the transparent first substrate side. At this time, since the light incidence to the second transistor is blocked by the light shielding film, the operation control of the second transistor becomes easier. At this time, the display state of the electro-optic element can be visually recognized from the pixel electrode side by using a transparent conductive film as the pixel electrode in contact with the circuit layer (that is, on the first substrate side).

なお、本発明は上述した実施形態の内容に限定されるものではなく、本発明の要旨の範囲内に於いて種々に変形して実施することが可能である。例えば、上述した電気泳動粒子の帯電状態や着色状態(白、黒)は一例であり、これに限定されるものではない。また、電圧値などの数値も具体的な一例という意味であり、これに限定されるものではない。   The present invention is not limited to the contents of the above-described embodiments, and various modifications can be made within the scope of the gist of the present invention. For example, the above-described charged state or colored state (white, black) of the electrophoretic particles is an example, and the present invention is not limited to this. Moreover, numerical values such as voltage values also mean specific examples, and are not limited thereto.

また、上述した実施形態では、電気光学装置の一例として電気光学装置を採り上げていたが、本発明の適用範囲はこれに限定されるものではない。上記実施形態における電気光学素子を液晶素子と置き換えることにより、本発明が具現化された一態様としての液晶装置を得ることができる。同様に、電気光学素子をエレクトロクロミック素子と置き換えることにより、本発明が具現化された一態様としてのエレクトロクロミック装置を得ることができる。   In the above-described embodiment, the electro-optical device is taken as an example of the electro-optical device, but the scope of application of the present invention is not limited to this. By replacing the electro-optical element in the above embodiment with a liquid crystal element, a liquid crystal device as one aspect in which the present invention is embodied can be obtained. Similarly, by replacing the electro-optic element with an electrochromic element, an electrochromic device as one aspect in which the present invention is embodied can be obtained.

(実施例)
図6は画素の配線構造を示す平面図の一例である。なお、図5に示す断面図は概ね図6に示すIII−III線方向に対応する。図示のように、遮光膜64は、半導体膜72の下層側であって、この半導体膜72のうちの第2トランジスタ42を構成する部分、より詳細には少なくともチャネル形成領域と重畳する位置に設けられている。半導体膜72は、第1トランジスタ40と第2トランジスタ42とで共有されている。この半導体膜72よりも上層側に、第一走査線10及び第二走査線12が設けられる。更に上層側に、信号線14及び他の配線11が設けられる。配線11は、図示のように、コンタクトホールを介して半導体膜72(第2トランジスタ42に相当する部分)と接続されており、i−1行目の第一走査線10と接続している。これらの配線等の形成工程を示したのが図7〜図11である。各図に沿って形成工程を簡単に説明する。なお、透明電極と、各配線等の相互間に存在する絶縁膜とについては説明を省略する。まず、第一基板60上の所定位置に遮光膜64が形成される(図7)。次に、これらの遮光膜64と一部が重畳する位置に半導体膜72が形成される(図8)。半導体膜72は、例えば、ポリシリコン膜が成膜され、アイランド状にパターニングされることにより得られる。次に、半導体膜72よりも上層に第一走査線10及び第二走査線12が形成される(図9)。これらは、例えばアルミニウム等の導電膜が成膜され、その後パターニングされることにより得られる。次に、図示しない絶縁膜の所定位置にコンタクトホールが形成される(図10)。次に、半導体膜72よりも上層に、信号線14及び配線11が形成される(図11)。これらは、例えばアルミニウム等の導電膜が成膜され、その後パターニングされることにより得られる。
(Example)
FIG. 6 is an example of a plan view showing a wiring structure of a pixel. The cross-sectional view shown in FIG. 5 generally corresponds to the direction of line III-III shown in FIG. As shown in the figure, the light shielding film 64 is provided on the lower layer side of the semiconductor film 72 and in a portion of the semiconductor film 72 constituting the second transistor 42, more specifically, at a position overlapping with at least the channel formation region. It has been. The semiconductor film 72 is shared by the first transistor 40 and the second transistor 42. The first scanning line 10 and the second scanning line 12 are provided on the upper layer side than the semiconductor film 72. Further, a signal line 14 and another wiring 11 are provided on the upper layer side. As illustrated, the wiring 11 is connected to the semiconductor film 72 (portion corresponding to the second transistor 42) through a contact hole, and is connected to the first scanning line 10 in the (i-1) th row. FIGS. 7 to 11 show a process for forming these wirings and the like. A formation process is demonstrated easily along each figure. In addition, description is abbreviate | omitted about a transparent electrode and the insulating film which exists between each wiring. First, a light shielding film 64 is formed at a predetermined position on the first substrate 60 (FIG. 7). Next, a semiconductor film 72 is formed at a position where the light shielding film 64 partially overlaps (FIG. 8). The semiconductor film 72 is obtained, for example, by forming a polysilicon film and patterning it into an island shape. Next, the first scanning line 10 and the second scanning line 12 are formed above the semiconductor film 72 (FIG. 9). These are obtained, for example, by forming a conductive film such as aluminum and then patterning. Next, a contact hole is formed at a predetermined position of an insulating film (not shown) (FIG. 10). Next, the signal line 14 and the wiring 11 are formed above the semiconductor film 72 (FIG. 11). These are obtained, for example, by forming a conductive film such as aluminum and then patterning.

次に、本実施形態の電気光学装置1に用いられるのに適したペン型光照射機器の構成例について説明する。ここで、ペン型光照射機器とは、一般的なペンと同様の形状を有し、かつその一端側から強い光を放射可能に構成されたものをいう。なお、本装置に手書き入力する機器はこれに限定されるものではなく、小さくて強い光を出す照明機器なら何でも良い。   Next, a configuration example of a pen-type light irradiation apparatus suitable for use in the electro-optical device 1 of the present embodiment will be described. Here, the pen-type light irradiation device refers to a device having the same shape as a general pen and capable of emitting strong light from one end side thereof. Note that the device for handwriting input to the apparatus is not limited to this, and any lighting device that emits small and strong light may be used.

図12は、ペン型光照射機器の構成例を説明する概略図である。図12では、一構成例のペン型光照射機器が平面図で示され、かつ一端(ペン先)が部分的に断面図で示されている。図示のペン型光照射機器3は、本体300の一端側に、反射鏡302、LED光源304及びレンズ306が内蔵されている。LED光源304から放射される光が直接的、および反射鏡302による反射光となってレンズ306に入射する。この入射した光がレンズ306によって焦点308に集光される。焦点308に於いて集光した光はその後発散する。なお、LED光源304は一例であり、他の光源であってもよい。このようなペン型光照射機器3によれば、焦点308における照度の高い光を電気光学装置1の第一基板60の表面に照射することができる。   FIG. 12 is a schematic diagram illustrating a configuration example of a pen-type light irradiation device. In FIG. 12, a pen-type light irradiation device of one configuration example is shown in a plan view, and one end (pen tip) is partially shown in a sectional view. The illustrated pen-type light irradiation device 3 includes a reflecting mirror 302, an LED light source 304, and a lens 306 on one end side of a main body 300. The light emitted from the LED light source 304 enters the lens 306 directly and as reflected light by the reflecting mirror 302. The incident light is collected at the focal point 308 by the lens 306. The light collected at the focal point 308 then diverges. The LED light source 304 is an example, and other light sources may be used. According to such a pen-type light irradiation device 3, it is possible to irradiate the surface of the first substrate 60 of the electro-optical device 1 with light having high illuminance at the focal point 308.

ここで、雨天や晴天など、外界の天候による太陽光照度の如何によらず、ペン型光照射機器3による書き込みを可能とするために必要な条件について考察する。雨の日や暗い日の太陽光照度は概ね2000ルクスであり、快晴の太陽光照度は概ね10万ルクスである。一方、薄膜トランジスタのオフ電流は光照射量に比例する。0ルクスでのオフ電流は1pA(ピコアンペア)、1万ルクスでは10pA程度であり、快晴の太陽光下(照度10万ルクス)でオフ電流は100pA位になる。また、現在存在する高照度LEDを用いると、ビーム径10mmにおける光照度が10万ルクス程度である。従って、レンズ306によってビーム径を1mmに絞ると焦点308における照度は1000万ルクスくらいとなる。すなわち、焦点308に於いては快晴時の太陽光照度の100倍くらいの照度が得られる。この焦点308における光照度に対する薄膜トランジスタのオフ電流は10000pAくらいになり、この値は光照射の有無を判定するに十分な値である。LED光源の発光部は通常0.2mm×0.2mm程度であるので、レンズ306によりこのサイズまでは集光可能である。このサイズで照度は容易に1億ルクスを超え、快晴太陽光の1000倍以上となるので、薄膜トランジスタのオフ電流も1000倍以上となる。従って、快晴下でもペン型光照射機器3による書き込みが可能である。   Here, the conditions necessary to enable writing with the pen-type light irradiating device 3 will be considered regardless of the sunlight illuminance due to external weather such as rainy weather or fine weather. The sunlight illuminance on a rainy day or a dark day is approximately 2000 lux, and the clear sunlight illuminance is approximately 100,000 lux. On the other hand, the off-state current of the thin film transistor is proportional to the amount of light irradiation. The off-current at 0 lux is about 1 pA (picoampere), about 10 pA at 10,000 lux, and the off-current is about 100 pA under clear sunlight (illuminance 100,000 lux). In addition, when a high-intensity LED that currently exists is used, the light illuminance at a beam diameter of 10 mm is about 100,000 lux. Therefore, when the beam diameter is reduced to 1 mm by the lens 306, the illuminance at the focal point 308 is about 10 million lux. That is, at the focal point 308, an illuminance of about 100 times the sunlight illuminance at the time of fine weather can be obtained. The off-state current of the thin film transistor with respect to the light illuminance at the focal point 308 is about 10000 pA, and this value is sufficient to determine the presence or absence of light irradiation. Since the light emitting part of the LED light source is usually about 0.2 mm × 0.2 mm, the lens 306 can collect light up to this size. With this size, the illuminance easily exceeds 100 million lux, and more than 1000 times that of clear sunlight, so the off-state current of the thin film transistor also becomes more than 1000 times. Therefore, the writing with the pen-type light irradiation device 3 is possible even in fine weather.

ここで、図13を用いて、ペン型光照射機器3のペン先から焦点308までの距離の好適範囲について説明する。ペン先から焦点308までの距離をL、第一基板60の厚みをdとすると、図示のように、ペン先から薄膜トランジスタまでの距離Lは次式のように表される。

Figure 2008134600

この計算式に、人間が自然にペンを持つ時の角度θの範囲である60°〜80°を代入すると、距離Lの好適範囲は、1.015d≦L≦1.155dとなる。従って、この値が実現されるような焦点距離を有するレンズ306を用いることが望ましい。 Here, a preferred range of the distance from the pen tip of the pen-type light irradiation device 3 to the focal point 308 will be described with reference to FIG. Assuming that the distance from the pen tip to the focal point 308 is L and the thickness of the first substrate 60 is d, the distance L from the pen tip to the thin film transistor is represented by the following equation as shown in the figure.
Figure 2008134600

Substituting 60 ° to 80 °, which is the range of the angle θ when a human naturally holds a pen, into this calculation formula, the preferable range of the distance L is 1.015d ≦ L ≦ 1.155d. Therefore, it is desirable to use a lens 306 having a focal length that realizes this value.

(技術的思想)
いわゆる電子ペーパや電子ブック等、従来の紙媒体による機能を代替し得る電子機器の表示部は電気泳動装置を用いて構成されている場合が多い。このような従来の電子泳動装置は、例えば特開2005−24864号公報、特開2005−283820号公報、特開2005−84343号公報等に開示されている。しかし、従来の電子ペーパ等は、予めメモリに蓄えられたデータ(例えば、本や写真等の画像データ)に基づく表示を行うものであった。すなわち、電子ペーパ等は表示用途として用いられるにすぎず、表示画像内に使用者がメモやアンダーライン等を自由に書き込んだり、あるいは画像内の所望位置を指定する等の処理を可能に電子ペーパを構成することは難しかった。一例としては電子ペーパ等の表示面上にタッチセンサを設けることが考えられるが、この場合には構成が複雑化してしまい、厚み等のサイズの縮小化や軽量化の観点からは更なる改良の余地がある。また、このような課題は、電気泳動装置に限らず、これに類する液晶装置やエレクトロクロミック装置等においても共通するものである。よって、より簡素な構成によって画面上の指定位置を検出可能な電気光学装置、電子機器が望まれる。
(Technical thought)
In many cases, a display unit of an electronic apparatus that can replace a function of a conventional paper medium such as a so-called electronic paper or an electronic book is configured using an electrophoretic device. Such conventional electrophoretic devices are disclosed in, for example, Japanese Patent Application Laid-Open Nos. 2005-24864, 2005-283820, and 2005-84343. However, conventional electronic paper and the like perform display based on data (for example, image data such as books and photographs) stored in a memory in advance. In other words, electronic paper or the like is only used for display purposes, and allows the user to write a memo or underline freely in the display image, or to perform processing such as designating a desired position in the image. It was difficult to make up. As an example, it is conceivable to provide a touch sensor on the display surface of electronic paper or the like, but in this case, the configuration becomes complicated, and further improvements are made from the viewpoint of size reduction and weight reduction such as thickness. There is room. Such a problem is not limited to the electrophoretic device, but is common to liquid crystal devices, electrochromic devices, and the like. Therefore, an electro-optical device and an electronic apparatus that can detect a designated position on the screen with a simpler configuration are desired.

本発明に係る電気泳動装置は、
複数の第1走査線と、
上記第1走査線と同数であり、上記第1走査線と並列配置される複数の第2走査線と、
上記第1走査線及び上記第2走査線の各々と交差して配置される複数の信号線と、
上記第1走査線及び上記第2走査線と上記信号線との各交点に配置される画素部を複数個行列状に備えた電気光学装置であって、
i行j列(i、jはともに自然数。)に位置する上記画素部の各々は第1トランジスタと第2トランジスタと画素電極とを含み、
上記第1トランジスタのゲートがi行目の上記第1走査線に接続され、一方のソース/ドレインがj列目の上記信号線に接続され、
上記第2トランジスタのゲートがi行目の上記第2走査線に接続され、一方のソース/ドレインが上記第1トランジスタの他方のソースドレインと接続され、
上記第1トランジスタの他方のソース/ドレインに上記画素電極が接続される、
ことを特徴とする電気光学装置である。
The electrophoresis apparatus according to the present invention is
A plurality of first scan lines;
A plurality of second scanning lines equal in number to the first scanning lines and arranged in parallel with the first scanning lines;
A plurality of signal lines arranged crossing each of the first scanning line and the second scanning line;
An electro-optical device comprising a plurality of pixel portions arranged in a matrix in each intersection of the first scanning line, the second scanning line, and the signal line,
Each of the pixel portions located in i rows and j columns (i and j are both natural numbers) includes a first transistor, a second transistor, and a pixel electrode,
The gate of the first transistor is connected to the first scanning line in the i-th row, and one source / drain is connected to the signal line in the j-th column,
The gate of the second transistor is connected to the second scanning line in the i-th row, and one source / drain is connected to the other source / drain of the first transistor,
The pixel electrode is connected to the other source / drain of the first transistor;
This is an electro-optical device.

かかる構成によれば、第1トランジスタをオフ状態とした際に第2トランジスタを走査して順次オン状態とし、この状態で第1トランジスタに対し、例えば一端から光照射可能なペン型器具で比較的強い光を当てることによってオフ電流を生じさせ、或いは増加させる。そして、信号線を介して当該オフ電流を検出することにより、オフ電流の大きい第1トランジスタを把握できる。このオフ電流の大きい第1トランジスタの位置に基づき、画面上の指定位置を検出することが可能となる。すなわち、本発明によれば内部に位置検出のための構成がパネル内に組み込まれた電気光学装置を実現可能であり、従来技術と比較して簡素な構成を実現することができる。   According to such a configuration, when the first transistor is turned off, the second transistor is scanned and sequentially turned on, and in this state, the first transistor can be relatively compared with a pen-type instrument that can irradiate light from one end. Off-current is generated or increased by applying strong light. Then, by detecting the off-current through the signal line, the first transistor having a large off-current can be grasped. The designated position on the screen can be detected based on the position of the first transistor having a large off-state current. That is, according to the present invention, it is possible to realize an electro-optical device in which a configuration for position detection is incorporated in the panel, and a simple configuration can be realized as compared with the conventional technique.

上記の電気光学装置において、好ましくは、上記第2トランジスタの他方のソース/ドレインがi−1行目の上記第1走査線と接続される。   In the electro-optical device, it is preferable that the other source / drain of the second transistor is connected to the first scanning line in the (i−1) th row.

これにより、信号線の数を低減できる。   Thereby, the number of signal lines can be reduced.

上記の電気光学装置において、上記画素部は、画素電極及び共通電極と当該画素電極及び共通電極の相互間に配置される電気光学材料とを含むことが好ましい。ここで「電気光学材料」とは、外界からの電気的刺激(電圧、電流等)によって光学的な状態変化を生じる材料をいい、例えば、電気泳動材料、液晶材料、エレクトロクロミック材料が含まれる。   In the electro-optical device, the pixel portion preferably includes a pixel electrode and a common electrode, and an electro-optical material disposed between the pixel electrode and the common electrode. Here, the “electro-optical material” refers to a material that causes an optical state change due to an electrical stimulus (voltage, current, etc.) from the outside, and includes, for example, an electrophoretic material, a liquid crystal material, and an electrochromic material.

これにより、位置検出のための構成がパネル内に組み込まれた電気泳動装置、液晶装置又はエレクトロクロミック装置が得られる。   Thus, an electrophoretic device, a liquid crystal device, or an electrochromic device in which a configuration for position detection is incorporated in the panel is obtained.

上記の電気泳動装置は、上記第1トランジスタの他方のソース/ドレインとi−1行目の上記第1走査線との間に接続される保持容量を更に備えることが好ましい。   The electrophoretic device preferably further includes a storage capacitor connected between the other source / drain of the first transistor and the first scanning line in the (i−1) th row.

それにより、表示のコントラストを上げることができる。また、i−1行目の第1走査線と接続されることにより、画素の開口率を上げることができる。   Thereby, the display contrast can be increased. In addition, the aperture ratio of the pixel can be increased by being connected to the first scanning line in the (i-1) th row.

上記の電気光学装置は、第1基板と第2基板とを含み、
上記第1基板は透明であり、
上記第1走査線、上記第2走査線、上記信号線、上記第1トランジスタ、上記第2トランジスタ、は上記第1基板上に配置されて、回路層を構成し、
上記回路層上に上記画素電極が透明導電膜にて形成され、
上記第1基板と上記第2トランジスタとの間に遮光膜が配置され、
上記共通電極は上記第2基板に形成され、
上記第1基板と上記第2基板との間に電気光学材料を挟持する、
ことが好ましい。
The electro-optical device includes a first substrate and a second substrate,
The first substrate is transparent;
The first scan line, the second scan line, the signal line, the first transistor, and the second transistor are disposed on the first substrate to form a circuit layer,
The pixel electrode is formed of a transparent conductive film on the circuit layer,
A light shielding film is disposed between the first substrate and the second transistor;
The common electrode is formed on the second substrate;
Sandwiching an electro-optic material between the first substrate and the second substrate;
It is preferable.

かかる構成によれば、透明な第1基板側から第1トランジスタへの光照射を行うことができる。この際に、遮光膜により第2トランジスタへの光入射が遮られるので、第2トランジスタの動作制御がより容易となる。またこの際に、回路層と接する(すなわち第1基板側の)画素電極を透明導電膜とすることにより、画素電極側から電気泳動素子の表示状態を視認できる。   According to such a configuration, light irradiation to the first transistor can be performed from the transparent first substrate side. At this time, since the light incidence to the second transistor is blocked by the light shielding film, the operation control of the second transistor becomes easier. At this time, the display state of the electrophoretic element can be visually recognized from the pixel electrode side by making the pixel electrode in contact with the circuit layer (that is, the first substrate side) a transparent conductive film.

上記の電気光学装置において、保持容量は上記回路層に含まれることが好ましい。   In the above electro-optical device, the storage capacitor is preferably included in the circuit layer.

また、上記の保持容量は、上記画素電極及び保持容量電極と当該画素電極及び保持容量電極との相互間に挟まれる保持容量誘電体膜とを含み、
上記画素電極と上記保持容量電極と上記保持容量誘電体膜はいずれも透明であることが好ましい。
Further, the storage capacitor includes the pixel electrode and the storage capacitor electrode, and a storage capacitor dielectric film sandwiched between the pixel electrode and the storage capacitor electrode,
The pixel electrode, the storage capacitor electrode, and the storage capacitor dielectric film are preferably transparent.

それにより、第1基板側からの表示の視認性が向上する。   Thereby, the visibility of the display from the first substrate side is improved.

上記の電気光学装置において、上記遮光膜は、上記第2トランジスタの活性領域と重なる位置に設けられることが好ましい。ここで「活性領域」とは、チャンネル形成領域と、チャンネル形成領域に接するドレイン領域及びチャンネル形成領域に接するソース領域をいう。また、この遮光膜は、上記第1トランジスタの活性領域とは重ならない位置に設けられることが好ましい。   In the electro-optical device, it is preferable that the light-shielding film is provided at a position overlapping the active region of the second transistor. Here, the “active region” means a channel formation region, a drain region in contact with the channel formation region, and a source region in contact with the channel formation region. The light shielding film is preferably provided at a position that does not overlap with the active region of the first transistor.

少なくとも活性領域への光入射が遮られることにより、第2トランジスタへの悪影響を相当程度、回避することができる。   By blocking light incidence on at least the active region, it is possible to avoid a considerable adverse effect on the second transistor.

また、上記の電気光学装置は、
上記第1走査線に接続される第1走査ドライバーと、
上記第2走査線に接続される第2走査ドライバーと、
上記信号線の一端側に接続される信号線ドライバーと、
上記信号線と上記信号線ドライバーとの間に接続され、上記信号線と上記信号線ドライバーとの導通/非導通を切り替える切り替え回路と、
上記信号線の他端側に接続されるセンスアンプと、
を備えて構成されることが好ましい。
The electro-optical device described above is
A first scan driver connected to the first scan line;
A second scanning driver connected to the second scanning line;
A signal line driver connected to one end of the signal line;
A switching circuit that is connected between the signal line and the signal line driver and switches between conduction and non-conduction between the signal line and the signal line driver;
A sense amplifier connected to the other end of the signal line;
It is preferable to comprise.

かかる構成によれば、画面上の位置検出にかかる制御と電気泳動素子による画像表示にかかる制御とを比較的簡素な構成で両立させることができる。   According to this configuration, it is possible to achieve both control for position detection on the screen and control for image display by the electrophoretic element with a relatively simple configuration.

より好ましくは、上記の電気光学装置は、
上記第1走査ドライバー、上記第2走査ドライバー、上記信号線ドライバー、上記切り替え回路及び上記フォトセンサ信号読み出し回路の各々に制御信号を供給する制御部と、
上記制御部と接続される記憶部と、
を更に備え、
上記制御部は、上記フォトセンサ信号読み出し回路による読み出しデータを上記記憶部に格納する。
More preferably, the electro-optical device described above is
A controller for supplying a control signal to each of the first scanning driver, the second scanning driver, the signal line driver, the switching circuit, and the photosensor signal readout circuit;
A storage unit connected to the control unit;
Further comprising
The control unit stores data read by the photosensor signal readout circuit in the storage unit.

記憶部に格納した読み出しデータを用いて制御部が情報処理を行うことにより、画面上の指定位置を特定し、その後の処理に反映させることができる。また、各ドライバー、切り替え回路及びフォトセンサ信号読み出し回路の動作を制御部によって一元的に管理することができる。   When the control unit performs information processing using the read data stored in the storage unit, the designated position on the screen can be specified and reflected in subsequent processing. In addition, the operations of the drivers, the switching circuit, and the photo sensor signal readout circuit can be managed by the control unit.

上記の読み出しデータを用いた情報処理の好ましい一態様として、上記制御部は、上記読み出しデータに基づいて上記記憶部に格納されている画像データを更新し、当該画像データに応じた制御信号を上記信号線ドライバーに供給する。   As a preferable aspect of the information processing using the read data, the control unit updates the image data stored in the storage unit based on the read data, and sends a control signal corresponding to the image data to the control signal. Supply to signal line driver.

それにより、画面上の位置検出結果に応じた画像を現在の画像に上書きすることが可能となる。   As a result, an image corresponding to the position detection result on the screen can be overwritten on the current image.

また、より好ましい態様としては、
上記制御部と接続された入力部を更に備え、
上記制御部は、上記入力部を用いて所定の操作指示が入力されたときに、上記切り替え回路を制御して上記信号線と上記信号線ドライバーとを非導通状態とし、上記フォトセンサ信号読み出し回路を作動させる、ことが挙げられる。
As a more preferred embodiment,
An input unit connected to the control unit;
The control unit controls the switching circuit to turn off the signal line and the signal line driver when a predetermined operation instruction is input using the input unit, and the photo sensor signal readout circuit Is activated.

それにより、入力部を用いた操作指示に応じて、画像表示モードと手入力モード(例えば、上記のように画像書き込みを行うモード)とを切り替えることができる。   Accordingly, it is possible to switch between an image display mode and a manual input mode (for example, a mode for performing image writing as described above) in accordance with an operation instruction using the input unit.

以上のような本発明に係る電気光学装置は、いわゆる電子ペーパや電子ブック等の電子機器の表示部として好適に用いられる。   The electro-optical device according to the present invention as described above is preferably used as a display unit of an electronic apparatus such as an electronic paper or an electronic book.

それにより、電気光学装置による表示機能と画面上への指示入力機能とを兼ね備えた電子ブック等をより簡素な構成で実現できる。   Accordingly, an electronic book or the like having both a display function by the electro-optical device and an instruction input function on the screen can be realized with a simpler configuration.

一実施形態の電気光学装置の構成を示すブロック図である。1 is a block diagram illustrating a configuration of an electro-optical device according to an embodiment. 一実施形態の電気光学装置の構成を示すブロック図である。1 is a block diagram illustrating a configuration of an electro-optical device according to an embodiment. 画素の詳細構成を示す回路図である。It is a circuit diagram which shows the detailed structure of a pixel. 画素の詳細構成を示す回路図である。It is a circuit diagram which shows the detailed structure of a pixel. 電気光学装置の画素の断面構造を模式的に示す部分断面図である。2 is a partial cross-sectional view schematically showing a cross-sectional structure of a pixel of an electro-optical device. FIG. 画素の配線構造について示す部分平面図である。It is a fragmentary top view shown about the wiring structure of a pixel. 画素の配線等の形成工程を説明する平面図である。It is a top view explaining formation processes, such as pixel wiring. 画素の配線等の形成工程を説明する平面図である。It is a top view explaining formation processes, such as pixel wiring. 画素の配線等の形成工程を説明する平面図である。It is a top view explaining formation processes, such as pixel wiring. 画素の配線等の形成工程を説明する平面図である。It is a top view explaining formation processes, such as pixel wiring. 画素の配線等の形成工程を説明する平面図である。It is a top view explaining formation processes, such as pixel wiring. ペン型光照射機器の構成例を説明する概略図である。It is the schematic explaining the structural example of pen-type light irradiation apparatus. ペン型光照射機器のペン先から焦点までの距離の好適範囲について説明する図である。It is a figure explaining the suitable range of the distance from the pen point of a pen-type light irradiation apparatus to a focus. 手書き入力モードを説明する図である。It is a figure explaining handwriting input mode. 電子機器を例示する概略斜視図である。It is a schematic perspective view which illustrates an electronic device.

符号の説明Explanation of symbols

1…電気光学装置、3…ペン型光照射機器、10…第一走査線、11…配線、12…第二走査線、14…信号線、16…画素、18…第一走査線選択回路、20…第二走査線選択回路、22…表示信号供給回路、24…切り替え回路、26…センサ信号読み出し回路、28…制御部、30…記憶部、32…入力部、40…第1トランジスタ、42…第2トランジスタ、44…電気光学素子、46…保持容量、48…画素電極、50…共通電極、52…電気光学材料、60…第一基板、62…回路層、64…遮光膜、66…電気光学素子層、68…第二基板、70…絶縁膜、72…半導体膜、74…保持容量第一電極、75…配線、76…配線、78…絶縁膜、80…絶縁膜、82…絶縁膜、84…絶縁膜、300…本体、302…反射鏡、304…光源、306…レンズ、308…焦点、1000…電子ブック、1001…フレーム、1002…カバー、1003…操作部、1004…機能平面、1200…電子ペーパー、1201…本体部、1202…機能平面   DESCRIPTION OF SYMBOLS 1 ... Electro-optical apparatus, 3 ... Pen type light irradiation apparatus, 10 ... 1st scanning line, 11 ... Wiring, 12 ... 2nd scanning line, 14 ... Signal line, 16 ... Pixel, 18 ... 1st scanning line selection circuit, DESCRIPTION OF SYMBOLS 20 ... 2nd scanning line selection circuit, 22 ... Display signal supply circuit, 24 ... Switching circuit, 26 ... Sensor signal readout circuit, 28 ... Control part, 30 ... Memory | storage part, 32 ... Input part, 40 ... 1st transistor, 42 ... second transistor 44 ... electro-optic element 46 ... retention capacitor 48 ... pixel electrode 50 ... common electrode 52 ... electro-optic material 60 ... first substrate 62 ... circuit layer 64 ... light-shielding film 66 ... Electro-optical element layer, 68 ... second substrate, 70 ... insulating film, 72 ... semiconductor film, 74 ... retention capacitor first electrode, 75 ... wiring, 76 ... wiring, 78 ... insulating film, 80 ... insulating film, 82 ... insulating Membrane 84 ... Insulating membrane 300 ... Main body 302 ... Reflector 3 4 ... light source, 306 ... lens, 308 ... focus, 1000 ... ebook, 1001 ... frame, 1002 ... cover, 1003 ... operation unit, 1004 ... functional plane, 1200 ... electronic paper, 1201 ... body part, 1202 ... functional plane

Claims (19)

画像表示期間と情報採取期間とを有する電気光学装置に於いて、
該電気光学装置はパネル部とデータ処理部とを有し、
該パネル部は第一基板と第二基板と電気光学材料とを有し、
該第一基板と該第二基板との間に該電気光学材料が挟持され、
該第一基板上には、複数の第一走査線と、該第一走査線に並列配置される複数の第二走査線と、該第一走査線及び該第二走査線と交差する複数の信号線と、該第一走査線及び該第二走査線と該信号線との交点に配置される画素とが設けられ、
該画素は該第一基板上で複数個が行列状に形成され、
i行j列(i、jはともに自然数)に位置する該画素の各々は第1トランジスタと第2トランジスタと画素電極とを含み、
該第1トランジスタのゲートがi行目の該第一走査線に接続され、該第1トランジスタのソース又はドレインの一方がj列目の該信号線に接続され、
該第2トランジスタのゲートがi行目の該第二走査線に接続され、該第2トランジスタのソース又はドレインの一方が該第1トランジスタのソース又はドレインの他方と接続され、
該第1トランジスタのソース又はドレインの他方と該画素電極とが接続されて居る事を特徴とする電気光学装置。
In an electro-optical device having an image display period and an information collection period,
The electro-optical device has a panel unit and a data processing unit,
The panel portion includes a first substrate, a second substrate, and an electro-optic material,
The electro-optic material is sandwiched between the first substrate and the second substrate;
On the first substrate, a plurality of first scanning lines, a plurality of second scanning lines arranged in parallel to the first scanning lines, and a plurality of intersecting the first scanning lines and the second scanning lines A signal line and a pixel disposed at an intersection of the first scanning line and the second scanning line and the signal line;
A plurality of the pixels are formed in a matrix on the first substrate,
Each of the pixels located in i rows and j columns (where i and j are natural numbers) each include a first transistor, a second transistor, and a pixel electrode;
The gate of the first transistor is connected to the first scanning line of the i-th row, and one of the source or drain of the first transistor is connected to the signal line of the j-th column,
The gate of the second transistor is connected to the second scanning line of the i-th row, one of the source or drain of the second transistor is connected to the other of the source or drain of the first transistor,
An electro-optical device, wherein the other of the source and drain of the first transistor and the pixel electrode are connected.
前記第2トランジスタのソース又はドレインの他方が基準電源に接続される事を特徴とする請求項1に記載の電気光学装置。   The electro-optical device according to claim 1, wherein the other of the source and the drain of the second transistor is connected to a reference power source. 前記第2トランジスタのソース又はドレインの他方がi−1行目の前記第一走査線に接続される事を特徴とする請求項1に記載の電気光学装置。   2. The electro-optical device according to claim 1, wherein the other of the source and the drain of the second transistor is connected to the first scanning line in the (i−1) th row. 前記第1トランジスタのソース又はドレインの他方と前記基準電源との間に保持容量を備える事を特徴とする請求項2に記載の電気光学装置。   The electro-optical device according to claim 2, further comprising a storage capacitor between the other of the source and the drain of the first transistor and the reference power source. 前記第1トランジスタのソース又はドレインの他方とi−1行目の前記第一走査線との間に保持容量を備える事を特徴とする請求項3に記載の電気光学装置。   4. The electro-optical device according to claim 3, further comprising a storage capacitor between the other of the source and the drain of the first transistor and the first scan line in the (i−1) th row. 前記第一基板は透明であり、前記第二基板には共通電極が形成されており、前記画素電極は透明導電膜にて形成され、前記第一基板と前記第2トランジスタとの間に遮光膜が配置されて居る事を特徴とする請求項1乃至は3に記載の電気光学装置。   The first substrate is transparent, a common electrode is formed on the second substrate, the pixel electrode is formed of a transparent conductive film, and a light shielding film is formed between the first substrate and the second transistor. The electro-optical device according to claim 1, wherein the electro-optical device is disposed. 前記第一基板は透明であり、前記第二基板には共通電極が形成されており、前記画素電極は透明導電膜にて形成され、前記第一基板と前記第2トランジスタとの間に遮光膜が配置されて居り、
前記保持容量は保持容量第一電極と保持容量第二電極と、該保持容量第一電極と該保持容量第二電極とに挟まれる保持容量誘電体膜とから成り、該保持容量第一電極と該保持容量第二電極と該保持容量誘電体膜はいずれも透明である事を特徴とする請求項4乃至は5に記載の電気光学装置。
The first substrate is transparent, a common electrode is formed on the second substrate, the pixel electrode is formed of a transparent conductive film, and a light shielding film is formed between the first substrate and the second transistor. Is located,
The storage capacitor comprises a storage capacitor first electrode, a storage capacitor second electrode, and a storage capacitor dielectric film sandwiched between the storage capacitor first electrode and the storage capacitor second electrode, 6. The electro-optical device according to claim 4, wherein both the storage capacitor second electrode and the storage capacitor dielectric film are transparent.
前記画素電極が前記保持容量第二電極で有る事を特徴とする請求項7に記載の電気光学装置。   The electro-optical device according to claim 7, wherein the pixel electrode is the storage capacitor second electrode. 前記遮光膜は前記第2トランジスタの活性領域と重なる位置に設けられる事を特徴とする請求項6乃至は8に記載の電気光学装置。   9. The electro-optical device according to claim 6, wherein the light shielding film is provided at a position overlapping with an active region of the second transistor. 前記遮光膜は前記第1トランジスタの活性領域とは重ならない位置に設けられる事を特徴とする請求項6乃至は9に記載の電気光学装置。   The electro-optical device according to claim 6, wherein the light shielding film is provided at a position that does not overlap with an active region of the first transistor. 前記第一基板上には、前記第一走査線に接続して複数の第一走査線から特定の第一走査線を選択する機能を有する第一走査線選択回路と、前記第二走査線に接続して複数の第二走査線から特定の第二走査線を選択する機能を有する第二走査線選択回路と、前記信号線の一端側に接続して複数の信号線の各々に各信号線固有な表示信号を供給する機能を有する表示信号供給回路と、前記信号線の他端側に接続して複数の信号線の各々から出力される各信号線固有なセンサ信号を読み取る機能を有するセンサ信号読み出し回路と、が形成されて居る事を特徴とする請求項1乃至10の何れかに記載の電気光学装置。   On the first substrate, a first scanning line selection circuit connected to the first scanning line and having a function of selecting a specific first scanning line from a plurality of first scanning lines, and the second scanning line A second scanning line selection circuit having a function of connecting and selecting a specific second scanning line from a plurality of second scanning lines; and a signal line connected to one end of the signal line and connected to each of the plurality of signal lines A display signal supply circuit having a function of supplying a unique display signal, and a sensor having a function of reading a sensor signal unique to each signal line connected to the other end of the signal line and output from each of the plurality of signal lines The electro-optical device according to claim 1, wherein a signal readout circuit is formed. 前記データ処理部は入力部と制御部と記憶部とを有し、
該入力部は外部より入力された表示画像情報を該制御部乃至は該記憶部に供給する機能を有し、
該制御部は少なくとも前記第一走査線選択回路と前記第二走査線選択回路、前記表示信号供給回路、前記センサ信号読み出し回路、該記憶部を制御する機能を有し、
該記憶部は該表示画像情報と前記センサ信号に基づく記載画像情報とを記憶する機能を有する事を特徴とする請求項11に記載の電気光学装置。
The data processing unit includes an input unit, a control unit, and a storage unit,
The input unit has a function of supplying display image information input from the outside to the control unit or the storage unit,
The control unit has at least a function of controlling the first scanning line selection circuit, the second scanning line selection circuit, the display signal supply circuit, the sensor signal readout circuit, and the storage unit.
The electro-optical device according to claim 11, wherein the storage unit has a function of storing the display image information and description image information based on the sensor signal.
前記制御部は前記表示画像情報と前記記載画像情報を用いて新たな表示画像を作製し、該新たな表示画像を新たな表示信号として前記表示信号供給回路に供給する機能を有する事を特徴とする請求項12に記載の電気光学装置。   The control unit has a function of creating a new display image using the display image information and the description image information, and supplying the new display image to the display signal supply circuit as a new display signal. The electro-optical device according to claim 12. 前記信号線と前記表示信号供給回路との間には、該信号線と該表示信号供給回路との導通乃至は非導通を切り替える切り替え回路が備えられて居る事を特徴とする請求項11乃至13の何れかに記載の電気光学装置。   14. A switching circuit for switching between conduction and non-conduction between the signal line and the display signal supply circuit is provided between the signal line and the display signal supply circuit. The electro-optical device according to any one of the above. 前記切り替え回路は前記画像表示期間に前記信号線と前記表示信号供給回路とを導通状態とし、前記情報採取期間に前記信号線と前記表示信号供給回路とを非導通状態とする事を特徴とする請求項14に記載の電気光学装置。   The switching circuit sets the signal line and the display signal supply circuit in a conductive state during the image display period, and sets the signal line and the display signal supply circuit in a non-conductive state during the information collection period. The electro-optical device according to claim 14. 前記電気光学材料は電気泳動材料である事を特徴とする請求項1乃至15の何れかに記載の電気光学装置。   16. The electro-optical device according to claim 1, wherein the electro-optical material is an electrophoretic material. 前記電気光学材料は液晶材料である事を特徴とする請求項1乃至15の何れかに記載の電気光学装置。   16. The electro-optical device according to claim 1, wherein the electro-optical material is a liquid crystal material. 前記電気光学材料はエレクトロクロミック材料である事を特徴とする請求項1乃至15の何れかに記載の電気光学装置。   The electro-optical device according to claim 1, wherein the electro-optical material is an electrochromic material. 請求項1乃至18のいずれか1項に記載の電気光学装置を備える電子機器。   An electronic apparatus comprising the electro-optical device according to claim 1.
JP2007214123A 2006-10-25 2007-08-20 Electro-optical device and electronic apparatus Active JP4497328B2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2007214123A JP4497328B2 (en) 2006-10-25 2007-08-20 Electro-optical device and electronic apparatus
CN2007101802955A CN101169567B (en) 2006-10-25 2007-10-23 Electro-optical device and electronic apparatus
KR1020070107140A KR101345025B1 (en) 2006-10-25 2007-10-24 Electrooptic device and electronic apparatus
US11/923,959 US7961171B2 (en) 2006-10-25 2007-10-25 Electrooptic device and electronic apparatus

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006289959 2006-10-25
JP2007214123A JP4497328B2 (en) 2006-10-25 2007-08-20 Electro-optical device and electronic apparatus

Publications (2)

Publication Number Publication Date
JP2008134600A true JP2008134600A (en) 2008-06-12
JP4497328B2 JP4497328B2 (en) 2010-07-07

Family

ID=39329519

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007214123A Active JP4497328B2 (en) 2006-10-25 2007-08-20 Electro-optical device and electronic apparatus

Country Status (4)

Country Link
US (1) US7961171B2 (en)
JP (1) JP4497328B2 (en)
KR (1) KR101345025B1 (en)
CN (1) CN101169567B (en)

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009222901A (en) * 2008-03-14 2009-10-01 Seiko Epson Corp Electrophoretic display device driving method, electrophoretic display device, and electronic device
JP2010145992A (en) * 2008-12-17 2010-07-01 Lg Display Co Ltd Electrophoretic display including touch panel
JP2011145391A (en) * 2010-01-13 2011-07-28 Seiko Epson Corp Electrophoretic display device and electronic equipment
JP2011170172A (en) * 2010-02-19 2011-09-01 Seiko Epson Corp Electrophoretic display device and electronic equipment
WO2011122271A1 (en) * 2010-03-31 2011-10-06 Semiconductor Energy Laboratory Co., Ltd. Field-sequential display device
KR101171762B1 (en) 2009-04-30 2012-08-07 전북대학교산학협력단 Electronic paper display
JP2012220957A (en) * 2011-04-08 2012-11-12 Boe Technology Group Co Ltd Semi-transmissive/semi-reflective array substrate and semi-transmissive/semi-reflective liquid crystal display
JP2014112263A (en) * 2012-08-22 2014-06-19 Toppan Printing Co Ltd Electrophoretic display substrate, electrophoretic display device, electronic paper, method for manufacturing electrophoretic display device, and method for manufacturing electronic paper
JP2014146044A (en) * 2014-03-19 2014-08-14 Seiko Epson Corp Driving method of electrophoretic display device, electrophoretic display device, and electronic equipment
CN104280970A (en) * 2014-11-06 2015-01-14 上海天马微电子有限公司 Array substrate and liquid crystal panel
JP2015096979A (en) * 2015-01-30 2015-05-21 セイコーエプソン株式会社 Driving method of electrophoretic display device, electrophoretic display device, and electronic equipment
JP2017224322A (en) * 2017-07-28 2017-12-21 株式会社ジャパンディスプレイ Display device, and driving method for the same
US10223982B2 (en) 2014-07-04 2019-03-05 Japan Display Inc. Display apparatus and method of driving the same
JP2019203957A (en) * 2018-05-22 2019-11-28 株式会社ジャパンディスプレイ Display and array substrate
JP2021092789A (en) * 2009-11-30 2021-06-17 株式会社半導体エネルギー研究所 Display device

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100955714B1 (en) * 2008-05-06 2010-05-03 실리콘 디스플레이 (주) Electronic Paper Display Device
GB2460090A (en) * 2008-05-16 2009-11-18 Sony Corp Ambient light detection device
JP5790968B2 (en) * 2008-08-18 2015-10-07 Nltテクノロジー株式会社 Display device and manufacturing method thereof
KR101274154B1 (en) 2008-12-19 2013-06-13 엘지디스플레이 주식회사 Electrophoretic display device using photo sensor
JP5444953B2 (en) * 2009-02-06 2014-03-19 セイコーエプソン株式会社 Electrophoretic display device driving method, electrophoretic display device, and electronic apparatus
JP2010204628A (en) * 2009-02-06 2010-09-16 Seiko Epson Corp Method for driving electrophoretic display device, electrophoretic display device, and electronic device
TWI421751B (en) * 2009-08-25 2014-01-01 Au Optronics Corp Touch device, display substrate, liquid crystal display and operation method for photo sensor
TWI396032B (en) * 2009-10-28 2013-05-11 Au Optronics Corp Electro-phoretic display pixel structure and display apparatus
JP5499638B2 (en) * 2009-10-30 2014-05-21 セイコーエプソン株式会社 Electrophoretic display device, driving method thereof, and electronic apparatus
JP2011095564A (en) * 2009-10-30 2011-05-12 Seiko Epson Corp Electrophoretic display device, driving method of the same, and electronic apparatus
CN101699343B (en) * 2009-11-09 2012-01-25 友达光电股份有限公司 Electrophoretic display pixel and display device
KR101590945B1 (en) * 2009-11-17 2016-02-19 삼성디스플레이 주식회사 Liquid crystal display
KR101754799B1 (en) * 2010-03-26 2017-07-07 삼성전자주식회사 Pixel circuit of display panel, display apparatus comprising the same, and controlling method of the display apparatus
US8605059B2 (en) * 2010-07-02 2013-12-10 Semiconductor Energy Laboratory Co., Ltd. Input/output device and driving method thereof
CN101950114A (en) * 2010-08-17 2011-01-19 友达光电股份有限公司 Electrophoresis display panel and manufacturing method thereof
KR101296904B1 (en) * 2010-12-24 2013-08-20 엘지디스플레이 주식회사 Stereoscopic image display device and driving method thereof
JP5691706B2 (en) * 2011-03-22 2015-04-01 セイコーエプソン株式会社 Control device, display device and electronic device
CN102314033B (en) * 2011-09-06 2014-11-19 深圳市华星光电技术有限公司 Pixel structure of liquid crystal panel and liquid crystal panel containing same
US20130057794A1 (en) * 2011-09-06 2013-03-07 Shenzhen China Star Optoelectronics Technology Co. Ltd. Pixel structure for liquid crystal display panel and liquid crystal display panel comprising the same
TWI570623B (en) * 2011-11-07 2017-02-11 元太科技工業股份有限公司 Reading apparatus and control method thereof
CN102654980B (en) 2012-01-09 2015-01-14 京东方科技集团股份有限公司 Electronic paper display device and driving method thereof
CN103366685A (en) * 2012-04-09 2013-10-23 胜华科技股份有限公司 Display integrating light-emitting assembly and electronic book and driving method thereof
TWI483166B (en) * 2012-10-08 2015-05-01 Innocom Tech Shenzhen Co Ltd Touch-control display device and its driving method
JP5686443B2 (en) * 2013-01-10 2015-03-18 日本写真印刷株式会社 Film pressure sensor with adhesive layer, touch pad using the same, protection panel with touch input function, and electronic device
TWI507948B (en) * 2013-08-28 2015-11-11 Au Optronics Corp Substrate with touch function and display using the same substrate
JP6406697B2 (en) * 2014-09-17 2018-10-17 株式会社ワコム Position detection apparatus and position detection method
CN106557205B (en) * 2016-11-11 2019-11-05 京东方科技集团股份有限公司 A kind of hand writing display device and preparation method thereof
JP2018116107A (en) * 2017-01-17 2018-07-26 株式会社ジャパンディスプレイ Display device
US11257463B2 (en) * 2017-03-31 2022-02-22 Cae Inc. Artificial eye system
KR102015269B1 (en) * 2017-11-29 2019-08-28 엘지디스플레이 주식회사 Display device
JP2019138923A (en) * 2018-02-06 2019-08-22 シャープ株式会社 Display device
JP2019174627A (en) * 2018-03-28 2019-10-10 株式会社ジャパンディスプレイ Display
CN109239993B (en) * 2018-10-18 2021-03-26 华北水利水电大学 Liquid crystal optical switch for optical phased array scanning
CN112837620B (en) * 2021-01-22 2023-07-04 武汉京东方光电科技有限公司 Flexible display screen and electronic equipment

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07325319A (en) * 1994-05-31 1995-12-12 Sharp Corp Liquid crystal display device
JPH11237645A (en) * 1998-02-23 1999-08-31 Sharp Corp Liquid crystal display
JP2006133788A (en) * 2004-11-08 2006-05-25 Samsung Electronics Co Ltd Liquid crystal display device including sensing element

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07325323A (en) 1994-06-02 1995-12-12 Matsushita Electric Ind Co Ltd Liquid crystal display device
TWI236556B (en) * 1996-10-16 2005-07-21 Seiko Epson Corp Substrate for a liquid crystal equipment, liquid crystal equipment and projection type display equipment
US6747638B2 (en) * 2000-01-31 2004-06-08 Semiconductor Energy Laboratory Co., Ltd. Adhesion type area sensor and display device having adhesion type area sensor
JP4112184B2 (en) 2000-01-31 2008-07-02 株式会社半導体エネルギー研究所 Area sensor and display device
KR100404225B1 (en) * 2000-12-28 2003-11-01 엘지.필립스 엘시디 주식회사 Liquid crystal display device and method for manufacturing the same
US6982178B2 (en) * 2002-06-10 2006-01-03 E Ink Corporation Components and methods for use in electro-optic displays
KR20040105934A (en) * 2003-06-10 2004-12-17 삼성전자주식회사 Liquid crystal display having multi domain and panel for the same
JP4308594B2 (en) 2003-07-01 2009-08-05 セイコーエプソン株式会社 Method for manufacturing electrophoretic display device
KR100669270B1 (en) * 2003-08-25 2007-01-16 도시바 마쯔시따 디스플레이 테크놀로지 컴퍼니, 리미티드 Display device and photoelectric conversion device
JP4737956B2 (en) 2003-08-25 2011-08-03 東芝モバイルディスプレイ株式会社 Display device and photoelectric conversion element
JP2005084343A (en) 2003-09-08 2005-03-31 Seiko Epson Corp Electrophoretic display device and electronic appliance
JP4903367B2 (en) 2004-03-29 2012-03-28 セイコーエプソン株式会社 Electrophoretic display device, driving method thereof, and memory display device
CN2727798Y (en) * 2004-07-26 2005-09-21 鸿富锦精密工业(深圳)有限公司 Array base plate of active matrix liquid crystal display panel
JP2006044004A (en) 2004-08-03 2006-02-16 Canon Inc Ink tank and head cartridge equipped therewith
US7602380B2 (en) * 2004-08-10 2009-10-13 Toshiba Matsushita Display Technology Co., Ltd. Display device with optical input function
KR20060056634A (en) * 2004-11-22 2006-05-25 삼성전자주식회사 Display device including photosensors and processing method of sensing signals
US7746294B2 (en) * 2006-04-14 2010-06-29 University Of Central Florida Research Foundation, Inc. Transflective liquid crystal display
US7859526B2 (en) * 2006-05-01 2010-12-28 Konicek Jeffrey C Active matrix emissive display and optical scanner system, methods and applications

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07325319A (en) * 1994-05-31 1995-12-12 Sharp Corp Liquid crystal display device
JPH11237645A (en) * 1998-02-23 1999-08-31 Sharp Corp Liquid crystal display
JP2006133788A (en) * 2004-11-08 2006-05-25 Samsung Electronics Co Ltd Liquid crystal display device including sensing element

Cited By (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009222901A (en) * 2008-03-14 2009-10-01 Seiko Epson Corp Electrophoretic display device driving method, electrophoretic display device, and electronic device
JP2010145992A (en) * 2008-12-17 2010-07-01 Lg Display Co Ltd Electrophoretic display including touch panel
US8497835B2 (en) 2008-12-17 2013-07-30 Lg Display Co. Ltd. Electro phoretic display device including touch panel
KR101171762B1 (en) 2009-04-30 2012-08-07 전북대학교산학협력단 Electronic paper display
JP2021092789A (en) * 2009-11-30 2021-06-17 株式会社半導体エネルギー研究所 Display device
US11282477B2 (en) 2009-11-30 2022-03-22 Semiconductor Energy Laboratory Co., Ltd. Liquid crystal display device, method for driving the same, and electronic device including the same
US11636825B2 (en) 2009-11-30 2023-04-25 Semiconductor Energy Laboratory Co., Ltd. Liquid crystal display device, method for driving the same, and electronic device including the same
JP2011145391A (en) * 2010-01-13 2011-07-28 Seiko Epson Corp Electrophoretic display device and electronic equipment
US8593438B2 (en) 2010-02-19 2013-11-26 Seiko Epson Corporation Electrophoretic display and electronic device
JP2011170172A (en) * 2010-02-19 2011-09-01 Seiko Epson Corp Electrophoretic display device and electronic equipment
WO2011122271A1 (en) * 2010-03-31 2011-10-06 Semiconductor Energy Laboratory Co., Ltd. Field-sequential display device
JP2013041288A (en) * 2010-03-31 2013-02-28 Semiconductor Energy Lab Co Ltd Display device
US8941127B2 (en) 2010-03-31 2015-01-27 Semiconductor Energy Laboratory Co., Ltd. Field-sequential display device
JP2011227477A (en) * 2010-03-31 2011-11-10 Semiconductor Energy Lab Co Ltd Field sequential driving type display device
JP2012220957A (en) * 2011-04-08 2012-11-12 Boe Technology Group Co Ltd Semi-transmissive/semi-reflective array substrate and semi-transmissive/semi-reflective liquid crystal display
JP2014112263A (en) * 2012-08-22 2014-06-19 Toppan Printing Co Ltd Electrophoretic display substrate, electrophoretic display device, electronic paper, method for manufacturing electrophoretic display device, and method for manufacturing electronic paper
US9874798B2 (en) 2012-08-22 2018-01-23 Toppan Printing Co., Ltd. Electrophoretic display substrate, method of inspecting same, and electrophoretic display device
JP2014146044A (en) * 2014-03-19 2014-08-14 Seiko Epson Corp Driving method of electrophoretic display device, electrophoretic display device, and electronic equipment
US10223982B2 (en) 2014-07-04 2019-03-05 Japan Display Inc. Display apparatus and method of driving the same
CN104280970B (en) * 2014-11-06 2017-12-22 上海天马微电子有限公司 Array base palte and liquid crystal display panel
US9946132B2 (en) 2014-11-06 2018-04-17 Shanghai Tianma Micro-electronics Co., Ltd. Array substrate and liquid crystal display panel
US9645437B2 (en) 2014-11-06 2017-05-09 Shanghai Tianma Micro-electronics Co., Ltd. Array substrate and liquid crystal display panel
CN104280970A (en) * 2014-11-06 2015-01-14 上海天马微电子有限公司 Array substrate and liquid crystal panel
JP2015096979A (en) * 2015-01-30 2015-05-21 セイコーエプソン株式会社 Driving method of electrophoretic display device, electrophoretic display device, and electronic equipment
JP2017224322A (en) * 2017-07-28 2017-12-21 株式会社ジャパンディスプレイ Display device, and driving method for the same
JP2019203957A (en) * 2018-05-22 2019-11-28 株式会社ジャパンディスプレイ Display and array substrate

Also Published As

Publication number Publication date
JP4497328B2 (en) 2010-07-07
US7961171B2 (en) 2011-06-14
KR101345025B1 (en) 2013-12-26
CN101169567A (en) 2008-04-30
CN101169567B (en) 2013-05-01
US20080100566A1 (en) 2008-05-01
KR20080037547A (en) 2008-04-30

Similar Documents

Publication Publication Date Title
JP4497328B2 (en) Electro-optical device and electronic apparatus
JP4899856B2 (en) Liquid crystal device and electronic device
JP4590340B2 (en) Liquid crystal display device and image sensing method using liquid crystal display device
US8289285B2 (en) Liquid crystal display device
US10571726B2 (en) Display panel and display device
JP4865512B2 (en) Image display device with screen input function
US7786986B2 (en) Image display device
US7812906B2 (en) Liquid crystal device and electronic apparatus
US8411117B2 (en) Display device having optical sensors
US8866751B2 (en) Display device and method of driving the same
KR101252849B1 (en) Backlight unit of LCD
JP5982141B2 (en) Display device and driving method of display device
TWI402560B (en) Display device and electronic apparatus including display device
JP2005189851A (en) Display apparatus and pen input unit
TW561446B (en) Display device
JP2015102642A (en) Circuit board, electro-optical device having input function, and electronic apparatus
CN101859784B (en) Photosensitive element, driving method thereof and liquid crystal display using photosensitive element
JP2008203561A (en) Liquid crystal display device
KR102571652B1 (en) Display panel and display device
JP5509633B2 (en) Electrophoresis equipment, electronic equipment
WO2011111594A1 (en) Drive device and display device employing same
CN114236927A (en) Photosensitive substrate, driving method thereof and liquid crystal writing device
KR20090070307A (en) Liquid crystal display

Legal Events

Date Code Title Description
A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20080909

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20081022

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20081217

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20100324

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130423

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Ref document number: 4497328

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20100406

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130423

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140423

Year of fee payment: 4

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313113

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250