JP2008128891A - Micropattern observation device and micropattern correction device using the same - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a micropattern correction device capable of providing an observed image, without irregularities. <P>SOLUTION: In this micropattern correction device, a glass surface plate 9 is divided into two sub-glass surface plates 10 and 11 movably disposed horizontally. When a lifter pin hole 22 of the sub glass surface plate 11 exists under an observation position P, the sub-glass surface plate 11 is moved to separate the lifter pin hole 22 from the observation position P. Thus, irregularities of the observation image, resulting from the lifter pin hole 22, can be eliminated. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to a fine pattern observation apparatus for observing a fine pattern with transmitted light and a fine pattern correction apparatus using the same, and in particular, a fine pattern observation for observing defects generated in a manufacturing process of a color filter for an LCD (liquid crystal display). The present invention relates to an apparatus and a fine pattern correction apparatus using the apparatus.

  In recent years, with the increase in size and resolution of LCDs (liquid crystal displays), the number of pixels has increased, making it difficult to manufacture LCDs without defects, and the probability of occurrence of defects has also increased. Under these circumstances, in order to improve the yield, a fine pattern correction device that corrects defects that occur in the manufacturing process of the color filter of the LCD has become indispensable for the production line.

  FIGS. 11A to 11C are diagrams showing defects that occur in the manufacturing process of the color filter of the LCD. 11A to 11C, the color filter includes a transparent substrate, a lattice pattern called a black matrix 50 formed on the surface thereof, a plurality of sets of R (red) pixels 51, and G (green). A pixel 52 and a B (blue) pixel 53. In the manufacturing process of the color filter, the white defect 54 in which the color of the pixel or the black matrix 50 is lost as shown in FIG. 11A, or the color of the adjacent pixel is mixed as shown in FIG. 11B. Or a black defect 55 in which the black matrix 50 protrudes from the pixel, or a foreign substance defect 56 in which a foreign substance adheres to the pixel as shown in FIG.

  As a method for correcting the white defect 54, an ink having the same color as that of the pixel in which the white defect 54 exists is attached to the tip of the application needle by the ink application mechanism, and the ink attached to the tip of the application needle is applied to the white defect 54. There is a method of applying and correcting (see, for example, Patent Document 1). Further, as a method of correcting the black defect 55 and the foreign object defect 56, the defective portion is laser-cut to form a rectangular white defect 54, and then the ink applied to the tip of the application needle is removed by the ink application mechanism. There is a method in which the defect 54 is applied and corrected (see, for example, Patent Document 2).

  When correcting the white defect 54 of the color filter of the LDC, it is necessary to observe in which color portion of the color filter the white defect 54 is generated. Further, even after correcting the white defect 54 by applying the correction ink, it is necessary to observe that portion in order to confirm the correction state. When observing the color of the color filter, it is necessary to observe the transmitted illumination light because the color state of the color filter cannot be observed by the observation of the incident illumination light. Conventionally, the glass substrate to be corrected on which the color filter is formed is mounted on a glass surface plate, irradiated with transmitted illumination light from below the glass surface plate, and the color state of the color filter is confirmed from above the glass surface plate. It was.

  In addition, the recent increase in size of liquid crystal substrates is remarkable, and the glass substrate size in the manufacturing process is 1000 × 1500 mm for the current production line glass substrate size (5th generation), 1500 × 1800 mm for the next 6th generation, 7th generation Then it is said that it becomes 1700x2000mm. As the size of the glass substrate increases, it is essential to increase the size of the fine pattern correction device, but simply increasing the size of the device is not allowed due to the occupied area in the clean room. It is necessary to change the size of the device as much as possible. Along with this, gantry-type devices in which the glass substrate is stationary and the head portion on which the laser device and the observation optical system are mounted are becoming mainstream.

  In order to realize transmitted illumination light observation by the gantry method, a mechanism for moving the transmitted illumination light source disposed below the glass surface plate in synchronization with the observation optical system disposed above the glass surface plate is required. Therefore, the supporting member cannot be disposed under the glass surface plate, and the glass surface plate can be supported only at the peripheral portion, so that there is a high possibility that the glass surface plate will be bent or the glass surface plate will be damaged.

Therefore, a method has been proposed in which a reflection film is formed on the back surface side of the glass surface plate, illumination light is emitted from the front surface side of the glass surface plate, and transmitted illumination light observation is performed using light reflected by the reflection film (for example, (See Patent Document 3). In this method, since it is not necessary for the glass surface plate to transmit the illumination light, the entire back surface of the glass surface plate can be supported by a metal mount, and the possibility of the glass surface plate being bent or broken is reduced. .
JP 9-236933 A JP-A-9-262520 JP 2006-38825 A

  Further, in such a fine pattern correction device, correction is required for the purpose of labor saving and correction efficiency, and defect recognition by image processing and state observation after correction are required.

  However, in the conventional transmitted illumination observation method, there are cases where unevenness occurs in the observed image. That is, a plurality of lifter pin holes for passing a plurality of lifter pins used when receiving the glass substrate to be corrected from the robot hand to the correction device are formed in the glass surface plate. In addition, a plurality of grooves and holes for adsorbing and fixing the glass substrate to be corrected to the glass surface plate are also formed. Due to the influence of these holes and grooves, some unevenness occurs in the image depending on the observation position. This unevenness is a permissible level when the operator looks at the monitor to determine the presence or absence of defects, etc., but exceeds the permissible level when judging by image processing and causes a malfunction. there were.

  Therefore, a main object of the present invention is to provide a fine pattern observation apparatus capable of obtaining an observation image without unevenness and a fine pattern correction apparatus using the same.

  A fine pattern observation apparatus according to the present invention is a fine pattern observation apparatus for observing a fine pattern that is formed on a transparent substrate and at least partially transmits light, and an observation optical system for observing the fine pattern; A light source that emits illumination light to a transparent substrate and a transparent surface plate that horizontally supports the transparent substrate, and the transparent surface plate is divided into a plurality of sub-transparent surface plates that are provided so as to be movable in the horizontal direction. It is characterized by.

  Preferably, each sub-transparent surface plate is provided with a plurality of holes, and the sub-transparent surface plate selected from the plurality of sub-transparent surface plates is moved in the horizontal direction, and the holes of the sub-transparent surface plate are formed. Drive means for separating from the observation position is provided.

  Preferably, the driving means lowers the selected sub transparent surface plate from among the plurality of sub transparent surface plates relative to the other sub transparent surface plate, and between the sub transparent surface plate and the transparent substrate. Open a gap.

  Also preferably, vacuum suction is performed by adsorbing a transparent substrate through a plurality of holes of at least one sub transparent surface plate that is not selected from among the plurality of sub transparent surface plates, and fixing the transparent substrate to the sub transparent surface plate. Means.

  Preferably, a gas that injects gas to the transparent substrate through a plurality of holes of the selected sub transparent surface plate among the plurality of sub transparent surface plates and opens a gap between the sub transparent surface plate and the transparent substrate. Injecting means is provided.

  Preferably, a reflective member is provided on the back side of each sub-transparent surface plate and reflects the illumination light emitted from the light source to irradiate the fine pattern, and the light source emits illumination light from the front side of the sub-transparent surface plate. The observation optical system performs observation of transmitted illumination light with a fine pattern from the surface side of the sub-transparent surface plate.

  Preferably, the light source emits illumination light from one side of the sub-transparent surface plate, and the observation optical system performs transmission illumination light observation of a fine pattern from the other side of the sub-transparent surface plate.

  According to another aspect of the present invention, there is provided a fine pattern correcting apparatus comprising the fine pattern observing apparatus and an application unit for applying a correction liquid to a defective portion of the fine pattern.

  In the fine pattern observation apparatus and fine pattern correction apparatus according to the present invention, the transparent surface plate is divided into a plurality of sub transparent surface plates, and each sub transparent surface plate is provided so as to be movable in the horizontal direction. Therefore, when there is a lifter pin hole or the like of the sub-transparent surface plate below the observation position, the lifter pin hole or the like can be separated from the observation position by moving the sub-transparent surface plate. Therefore, an observation image without unevenness can be obtained.

  FIG. 1 is a perspective view showing the overall configuration of a fine pattern correction apparatus according to an embodiment of the present invention. 1, in this fine pattern correction device, a laser device 1, an observation optical system 2, a ring illuminator 3, and an ink application mechanism 4 are fixed to a Z-axis table 5, and the Z-axis table 5 is arranged in the Z-axis direction ( It is provided to be movable in the vertical direction. The Z-axis table 5 is provided on the X-axis table 6 so as to be movable in the X-axis direction (lateral direction). The X-axis table 6 is provided on the Y-axis table 7 so as to be movable in the Y-axis direction (lateral direction).

  A glass surface plate 9 on which the glass substrate 8 to be corrected is mounted is provided below the X-axis table 6. The glass surface plate 9 is divided into two sub-glass surface plates 10 and 11 each provided so as to be movable in the Y-axis direction.

  The laser device 1 irradiates the white defect, the black defect, and the foreign matter defect of the color filter on the glass substrate 8 to be corrected with a laser beam to convert it into a rectangular white defect, or an unnecessary correction ink applied. The portion is removed by irradiation with laser light. The observation optical system 2 captures an image of a defective part and displays the captured image on a television monitor (not shown). The ring illuminator 3 irradiates light to the glass substrate 8 to be corrected and the glass surface plate 9. The ink application mechanism 4 applies correction ink to white defects of the color filter on the glass substrate 8 to be corrected. The applied correction ink is light-cured or heat-cured by ultraviolet illumination (not shown) or halogen lamp illumination (not shown).

  Since the laser device 1, the observation optical system 2, the ring illuminator 3, and the ink application mechanism 4 are attached to the Z-axis table 5, they can be positioned on the glass substrate 8 to be corrected at an arbitrary height. In addition, since the Z-axis table 5 is placed on the X-axis table 6 and the Y-axis table 7, it can be moved to any position in the X-axis direction and the Y-axis direction with respect to the glass substrate 8 to be corrected. In addition, a control computer (not shown) for controlling each mechanism and a host computer (not shown) for controlling the entire apparatus are provided.

  Next, the operation of this pattern correction apparatus will be described. The X-axis table 6 and the Y-axis table 7 are moved in the X-axis direction and the Y-axis direction, respectively, and the Z-axis table 5 is moved in the Z-axis direction, so that the observation optical system 2 captures an image on the glass substrate 8 to be corrected. . The host computer determines whether there is a filter defect based on the captured image. The captured image is displayed on a monitor, and the operator determines the presence or absence of a filter defect by visual observation.

  When the presence of a filter defect is determined, the defective portion is irradiated with laser light to be converted into a rectangular white defect, and the correction ink is applied to the white defect by the ink application mechanism 4 and cured. When an unnecessary portion is generated by the cured ink, the laser device 1 irradiates the unnecessary portion with a laser beam, and sublimates or scatters it with the thermal energy of the laser beam.

  FIG. 2 is a diagram illustrating a method for observing transmitted illumination light of the glass substrate 8 to be corrected. In FIG. 2, in this fine pattern correction apparatus, a reflective film 12 is formed on the back surfaces of the sub-glass surface plates 10 and 11, and a halogen lamp light is guided by an optical fiber, and a ring illuminator which is an emission end of the light. 3 is arranged around the objective lens 13 of the observation optical system 2. The ring-shaped light emitted from the ring illuminator 3 is focused on one point on the optical axis of the objective lens 13. The ring-shaped light emitted from the ring illuminator 3 passes through the peripheral region of the observation target portion of the glass substrate 8 to be corrected and the auxiliary glass surface plate 10 or 11 and is reflected by the reflective film 12, and the auxiliary glass surface plate. 10 or 11 and the observation target portion of the glass substrate 8 to be corrected are transmitted and incident on the objective lens 13. Thereby, transmitted illumination light observation is realized.

  Moreover, as shown in FIG. 3, in order to levitate the glass substrate 8 to be corrected by sucking and fixing the glass substrate 8 to be corrected to each of the secondary glass surface plates 10 and 11, or by blowing out air. The groove 14 and the small hole 15 are formed. A plurality of grooves 14 are provided at a predetermined pitch on the surfaces of the auxiliary glass surface plates 10 and 11. The holes 15 are formed at the bottom of each groove 14, and a plurality of holes 15 are provided at a predetermined pitch in the length direction of the grooves 14. FIG. 3 shows a state where the objective lens 13 is positioned directly above the small hole 14 of the auxiliary glass surface plate 10 or 11. In this fine pattern observing apparatus, each of the auxiliary glass surface plates 10 and 11 can be supported by the entire back surface, so that the auxiliary glass surface plates 10 and 11 can be mounted on the Y-axis tables 16 and 17, respectively. .

  Exhaust holes are formed in the Y-axis tables 16 and 17 at positions corresponding to the small holes 15 of the auxiliary glass surface plates 10 and 11. A ring-shaped recess is formed around the upper opening of the exhaust hole, and a ring-shaped rubber packing 18 is fitted into the recess. A plurality of exhaust holes corresponding to the plurality of small holes 15 communicate with each other in the Y-axis table 16 or 17. An air joint 19 is joined to the lower opening of one of the plurality of exhaust holes, and the air joint 19 is connected to one end of the air hose 20. The other end of the air hose 20 is selectively connected to a vacuum pump (not shown) or an air supply device (not shown) by an electromagnetic valve.

  Even in such a case, since the air joint 19 can be attached to the X-axis table 16 or 17, only the portion of the small hole 15 is removed from the reflective film 12 on the back surface of the auxiliary glass surface plates 10 and 11. The light emitted from the ring illuminator 3 is reflected around the small hole 15 to secure a sufficient amount of light for observation of the transmitted illumination light. However, some unevenness due to the small holes 15 and the grooves 14 occurs in the image. Although this unevenness is not a problem for the operator to observe visually, it causes a malfunction when image processing is performed.

  Further, as shown in FIG. 4, the secondary glass surface plates 10 and 11 have lifter pin holes 22 through which the lifter pins 21 of the lift-up mechanism for lifting up when the glass substrate 8 to be corrected is loaded and discharged. Is formed. A plurality of lifter pins 21 and lifter pin holes 22 are provided at a predetermined pitch. FIG. 4 shows a state in which the objective lens 13 is located directly above the lifter pin hole 22. In this fine pattern correction device, the reflective film 12 is provided on the back surfaces of the sub-glass surface plates 10 and 11, but the reflective film 12 cannot be formed on the lifter pin hole 22. Therefore, the light emitted from the ring illuminator 3 cannot be sufficiently reflected. Therefore, the LED illumination light source 23 is arranged inside the lifter pin 21 and irradiates light upward from the tip of the lifter pin 21. As a result, it is possible to obtain a sufficient amount of light for observation of transmitted illumination light. However, some unevenness occurs due to the lifter pin hole 22 in the image. Although this unevenness is not a problem for the operator to observe visually, it causes a malfunction when image processing is performed.

  Therefore, in this fine pattern correction device, the glass surface plate 9 is divided into two sub glass surface plates 10 and 11 as shown in FIG. Each of the auxiliary glass surface plates 10 and 11 is provided to be movable in the Y direction in the drawing. A total of three notches 24 are formed at the upper and left ends of the auxiliary glass surface plate 11 in the drawing and the left end portion of the auxiliary glass surface plate 10 in the drawing, and a positioning pin 25 stands at the center of each notch portion 24. It is installed. The glass substrate 8 to be corrected is mounted on the auxiliary glass surface plates 10 and 11 by being brought into contact with the three positioning pins 25 at the upper side and the left side and fixed by suction.

  Alignment marks M1 and M2 are provided at the upper left corner and the lower right corner of the glass substrate 10 to be corrected, respectively. Two marks M1 and M2 are imaged by the observation optical system 2, and the coordinate systems of the X-axis table 6 and the Y-axis table 7 are corrected based on the imaging results. Thereby, the observation optical system 2 and the like can be moved to the position of the defect based on the position data of the defect from the previous inspection apparatus.

  As shown in FIG. 5A, when the observation position P, which is the focal point of the observation optical system 2, is at the upper end of the lifter pin hole 22, image unevenness occurs. Therefore, as shown in FIG. Only the glass surface plate 11 is moved downward in the figure to separate the lifter pin hole 22 from the observation position P. Thereby, image unevenness can be eliminated.

  FIGS. 6A to 6E are diagrams illustrating a method of moving the auxiliary glass surface plates 10 and 11. As shown in FIG. 6A, the auxiliary glass surface plates 10 and 11 are mounted on the Y-axis tables 16 and 17, respectively. The Y axis tables 16 and 17 move in the Y direction along the rail 26 in accordance with a control signal from the host computer. As shown in FIG. 5B, when the secondary glass surface plate 11 is moved closer to the secondary glass surface plate 10, the Y axis table 17 is moved toward the Y axis table 16 as shown in FIG. Move to. At this time, as shown in FIG. 6C, the glass substrate 8 to be corrected is vacuum-sucked through the small holes 15 of the secondary glass surface plate 10, and the glass substrate 8 to be corrected is fixed to the secondary glass surface plate 10. Keep it. As a result, the position of the glass substrate 8 to be corrected does not change, the position of the lifter pin hole 22 of the sub glass platen 11 with respect to the glass substrate 8 to be corrected changes, and image unevenness is eliminated.

  In addition, as shown in FIG.6 (d), air is injected to the glass substrate 8 to be corrected through the small hole 15 of the secondary glass surface plate 11 to move, and the secondary glass surface plate 11 and the glass substrate 8 to be corrected 8 are injected. It is possible to prevent the glass substrate 8 to be corrected from being scratched by making a minute gap between them.

  Further, as shown in FIG. 6 (e), the Y-axis tables 10 and 11 are replaced with YZ-axis tables 27 and 28, respectively, and the sub glass platen 11 to be moved is lowered to move the sub glass platen 11 and the object to be corrected. By forming a minute gap between the glass substrates 8, it is possible to reliably prevent the glass substrate 8 to be corrected from being damaged. At this time, it is possible to prevent the glass substrate 8 to be corrected from being bent by ejecting air of a predetermined pressure to the glass substrate 8 to be corrected through the small hole 14 of the sub glass platen 11 to be moved. .

  FIG. 7 is a block diagram illustrating a vacuum suction means for sucking the glass substrate 8 to be corrected to the auxiliary glass surface plates 10 and 11. In FIG. 7, the vacuum suction means includes a vacuum pump 30 and electromagnetic valves 31 and 32. The suction port of the vacuum pump 30 is connected to the small holes 15 group of the auxiliary glass platen 10 via the electromagnetic valve 31 and is connected to the small holes 15 group of the auxiliary glass platen 11 via the electromagnetic valve 32. . If both the electromagnetic valves 31 and 32 are opened, the glass substrate 8 to be corrected is attracted and fixed to both the auxiliary glass surface plates 10 and 11. If only the electromagnetic valve 31 is opened, the glass substrate 8 to be corrected is adsorbed and fixed only to the auxiliary glass platen 10. If only the electromagnetic valve 32 is opened, the glass substrate 8 to be corrected is adsorbed and fixed only to the auxiliary glass surface plate 11. If both the electromagnetic valves 31 and 32 are closed, the glass substrate 8 to be corrected is not attracted and fixed to the auxiliary glass surface plates 10 and 11.

  FIG. 8 is a block diagram illustrating air blowing means for blowing air to the glass substrate 8 to be corrected through the auxiliary glass surface plates 10 and 11. In FIG. 8, the air ejection means includes an air supply device 33 and electromagnetic valves 34 and 35. The supply port of the air supply device 33 is connected to the small holes 15 group of the auxiliary glass platen 10 via the electromagnetic valve 34 and is connected to the small holes 15 group of the auxiliary glass platen 11 via the electromagnetic valve 35. The If both the electromagnetic valves 34 and 35 are opened, the glass substrate 8 to be corrected floats, and a gap is formed between the glass substrate 8 to be corrected 8 and the auxiliary glass surface plates 10 and 11. If only the electromagnetic valve 34 is opened, the glass substrate 8 to be corrected is bent, and a gap is formed between the glass substrate 8 to be corrected and the auxiliary glass surface plate 10. If only the electromagnetic valve 35 is opened, the glass substrate 8 to be corrected is bent, and a gap is formed between the glass substrate 8 to be corrected 8 and the auxiliary glass surface plate 11. If both the electromagnetic valves 31 and 32 are closed, there is no gap between the glass substrate 8 to be corrected and the auxiliary glass surface plates 10 and 11.

  FIGS. 9A and 9B are diagrams showing a comparative example of this embodiment, and are compared with FIGS. 5A and 5B. 9 (a) and 9 (b), this comparative example is different from the embodiment in that two sub glass surface plates 10, 11 are replaced with one glass surface plate 36, and three positionings are performed. The pin 25 is movably provided.

  As shown in FIG. 9A, when the observation position P is at the upper end of the lifter pin hole 22, image unevenness occurs. Therefore, as shown in FIG. 9B, the three positioning pins 25, the object to be corrected, The glass substrate 8 and the observation optical system 2 are moved upward in the figure to separate the observation position P from the lifter pin hole 22. Thereby, image unevenness can be eliminated.

  However, in this comparative example, since the three positioning pins 25, the glass substrate 8 to be corrected, and the observation optical system 2 are moved with respect to the glass surface plate 36, the alignment operation, that is, the imaging of the alignment marks M1 and M2 and the table are performed again. It is necessary to correct the 6 and 7 coordinate systems. Moreover, in order to move the glass substrate 8 to be corrected, it is necessary to once cancel the adsorption to the glass surface plate 36, and it takes time to re-adsorb. Further, when it is necessary to prevent the back surface of the substrate 8 from being damaged, it is necessary to inject air from the entire surface of the glass platen 36 to float the glass substrate 8 to be corrected, and further time is required. Therefore, in this comparative example, an alignment operation is required and re-adsorption over the entire surface of the substrate 8 is required, so that the correction tact is longer than that in the present embodiment.

  In this embodiment, when the glass surface plate 9 is divided into two sub glass surface plates 10 and 11 and the observation position P is located above the lifter pin hole 22, the groove 14, or the small hole 15, the sub glass surface plate is fixed. The board 10 or 11 can be moved, and the lifter pin hole 22, the groove 14, and the small hole 15 can be retracted from the observation position P. Therefore, an observation image without unevenness can be obtained, and automatic correction by image processing can be performed.

  Moreover, since the other sub glass surface plate is moved in a state where the glass substrate 8 to be corrected is fixed on one of the sub glass surface plates 10 and 11, the sub glass surface plate is moved. It is not necessary to perform an alignment operation, and the correction tact can be shortened.

  In addition, by injecting air from each small hole 15 of the sub glass platen to be moved and moving the subglass platen with a gap between the subglass platen and the glass substrate 8 to be corrected, the glass substrate to be corrected It is possible to prevent the back surface of 8 from being scratched. Furthermore, it is possible to prevent the occurrence of scratches on the back surface of the glass substrate 8 to be corrected more reliably by lowering and moving the sub glass surface plate to be moved.

  In addition, the workability of the glass surface plate 9 and the handling property when mounted on the apparatus have deteriorated with the increase in the size of the glass surface plate 9, but the glass surface plate 9 is composed of two sub glass surface plates 10,11. The size and size of the glass platen 9 can be improved by improving the workability and handling of the glass surface plate 9.

  In this embodiment, the case where the glass surface plate 9 is divided into the two auxiliary glass surface plates 10 and 11 has been described, but the glass surface plate 9 may be divided into three or more auxiliary glass surface plates. I do not care.

  Moreover, since the glass surface plate 9 is divided into the two sub glass surface plates 10 and 11, the influence of the bending of the glass surface plate 9 is reduced. Therefore, as shown in FIG. 10, a method of removing the reflective film 12 on the back surface of the secondary glass surface plates 10 and 11 and emitting illumination light from below the secondary glass surface plates 10 and 11 may be used. The auxiliary glass surface plates 10 and 11 are mounted on the frame-shaped Y-axis tables 27 and 28, respectively. Further, illumination light is emitted toward the objective lens 13 from the condensing lens 37 below the auxiliary glass surface plates 10 and 11. The condenser lens 37 is connected to a light source through an optical fiber. When the objective lens 37 moves, the condenser lens 37 moves to a position facing the objective lens 13.

  In this embodiment, the auxiliary glass surface plates 10 and 11 are provided so as to be movable in the Y-axis direction, but may be provided so as to be movable in the X-axis direction, or in both the X-axis and Y-axis directions. It may be provided so as to be movable.

  The embodiment disclosed this time should be considered as illustrative in all points and not restrictive. The scope of the present invention is defined by the terms of the claims, rather than the description above, and is intended to include any modifications within the scope and meaning equivalent to the terms of the claims.

1 is a perspective view showing an overall configuration of a fine pattern correction apparatus according to an embodiment of the present invention. It is a figure which shows the method of performing the transmitted illumination light observation of the glass substrate to be corrected shown in FIG. It is a figure which shows the case where a groove | channel and a small hole are right under the objective lens shown in FIG. It is a figure which shows the case where a lifter pin hole is right under the objective lens shown in FIG. It is a figure which shows the usage method of the subglass surface plate shown in FIG. It is a figure which illustrates the drive method of the subglass surface plate shown in FIG. It is a figure which illustrates the method of adsorb | sucking a to-be-corrected glass substrate to the subglass surface plate shown in FIG. It is a figure which illustrates the method of levitating a to-be-corrected glass substrate from the subglass surface plate shown in FIG. It is a figure which shows the comparative example of this embodiment. It is a figure which shows the example of a change of this embodiment. It is a figure which shows the defect which generate | occur | produces in the color filter of LCD.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1 Laser apparatus, 2 Observation optical system, 3 Ring illuminator, 4 Ink application mechanism, 5 Z-axis table, 6 X-axis table, 7, 16, 17 Y-axis table, 8 Glass substrate to be corrected, 9,36 Glass fixed Panel, 10, 11 Sub-glass surface plate, 12 Reflective film, 13 Objective lens, 14 Groove, 15 Small hole, 18 Rubber packing, 19 Air joint, 20 Air hose, 21 Lifter pin, 22 Lifter pin hole, 23 LED illumination light source, 24 Notch Part, 25 positioning pin, M1, M2 alignment mark, P observation position, 26 rail, 27, 28 YZ axis table, 30 vacuum pump, 31, 32, 34, 35 electromagnetic valve, 33 air supply device, 37 condenser lens, 50 Black matrix, 51 R pixel, 52 G pixel, 53 B pixel, 54 White defect, 55 Black defect, 5 Foreign matter defect.

Claims (8)

A fine pattern observation apparatus for observing a fine pattern formed on a transparent substrate and transmitting light at least partially.
An observation optical system for observing the fine pattern;
A light source that emits illumination light to the transparent substrate;
A transparent surface plate that horizontally supports the transparent substrate,
The fine pattern observation apparatus, wherein the transparent surface plate is divided into a plurality of sub-transparent surface plates each provided so as to be movable in the horizontal direction. Each sub-transparent surface plate has a plurality of holes,
The drive means for moving a selected sub transparent surface plate of the plurality of sub transparent surface plates in a horizontal direction and separating a hole of the sub transparent surface plate from an observation position. 1. The fine pattern observation apparatus according to 1.   The drive means lowers a selected sub transparent surface plate of the plurality of sub transparent surface plates relative to other sub transparent surface plates, and between the sub transparent surface plate and the transparent substrate. The fine pattern observation apparatus according to claim 2, wherein a gap is formed.   Vacuum suction for adsorbing the transparent substrate through the plurality of holes of at least one sub transparent surface plate not selected from the plurality of sub transparent surface plates, and fixing the transparent substrate to the sub transparent surface plate 4. The fine pattern observation apparatus according to claim 2, further comprising means.   Gas that injects gas to the transparent substrate through the plurality of holes of the selected sub transparent surface plate among the plurality of sub transparent surface plates, and opens a gap between the sub transparent surface plate and the transparent substrate. The fine pattern observation apparatus according to any one of claims 2 to 4, further comprising an injection unit. Provided on the back side of each sub-transparent surface plate, comprising a reflective member that reflects the illumination light emitted from the light source and irradiates the fine pattern,
The light source emits illumination light from the surface side of the sub-transparent surface plate,
The fine pattern observation apparatus according to claim 1, wherein the observation optical system performs transmission illumination light observation of the fine pattern from the surface side of the sub-transparent surface plate. The light source emits illumination light from one side of the sub-transparent surface plate,
6. The fine pattern observation apparatus according to claim 1, wherein the observation optical system performs transmission illumination light observation of the fine pattern from the other side of the sub-transparent surface plate. The fine pattern observation apparatus according to any one of claims 1 to 7,
An apparatus for correcting a fine pattern, comprising: application means for applying a correction liquid to a defective portion of the fine pattern.

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