JP2008123663A - パターン化磁気記録媒体及びその製造方法、垂直磁気記録システム - Google Patents
パターン化磁気記録媒体及びその製造方法、垂直磁気記録システム Download PDFInfo
- Publication number
- JP2008123663A JP2008123663A JP2007289594A JP2007289594A JP2008123663A JP 2008123663 A JP2008123663 A JP 2008123663A JP 2007289594 A JP2007289594 A JP 2007289594A JP 2007289594 A JP2007289594 A JP 2007289594A JP 2008123663 A JP2008123663 A JP 2008123663A
- Authority
- JP
- Japan
- Prior art keywords
- medium
- recording layer
- substrate
- layer
- magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 106
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 10
- 239000000463 material Substances 0.000 claims abstract description 80
- 239000000758 substrate Substances 0.000 claims abstract description 64
- 238000000034 method Methods 0.000 claims abstract description 14
- 238000009792 diffusion process Methods 0.000 claims description 52
- 229910052710 silicon Inorganic materials 0.000 claims description 29
- 230000004888 barrier function Effects 0.000 claims description 23
- 229910052732 germanium Inorganic materials 0.000 claims description 21
- 229910045601 alloy Inorganic materials 0.000 claims description 15
- 239000000956 alloy Substances 0.000 claims description 15
- 229910052697 platinum Inorganic materials 0.000 claims description 12
- 229910052742 iron Inorganic materials 0.000 claims description 11
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 9
- 229910052763 palladium Inorganic materials 0.000 claims description 9
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 9
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 8
- 238000000151 deposition Methods 0.000 claims description 7
- 229910052715 tantalum Inorganic materials 0.000 claims description 6
- 229910018979 CoPt Inorganic materials 0.000 claims description 5
- -1 FeAlSi Inorganic materials 0.000 claims description 5
- 150000001875 compounds Chemical class 0.000 claims description 5
- 229910052758 niobium Inorganic materials 0.000 claims description 5
- 229910018936 CoPd Inorganic materials 0.000 claims description 4
- 229910052804 chromium Inorganic materials 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims description 4
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 4
- 229910000531 Co alloy Inorganic materials 0.000 claims description 3
- 229910015187 FePd Inorganic materials 0.000 claims description 3
- 229910005335 FePt Inorganic materials 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 229910052702 rhenium Inorganic materials 0.000 claims description 3
- 229910052721 tungsten Inorganic materials 0.000 claims description 3
- 229910019236 CoFeB Inorganic materials 0.000 claims description 2
- 229910005435 FeTaN Inorganic materials 0.000 claims description 2
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 claims description 2
- 229910052796 boron Inorganic materials 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 229910052720 vanadium Inorganic materials 0.000 claims description 2
- 229910001182 Mo alloy Inorganic materials 0.000 claims 1
- 229910001257 Nb alloy Inorganic materials 0.000 claims 1
- 229910000691 Re alloy Inorganic materials 0.000 claims 1
- 229910001362 Ta alloys Inorganic materials 0.000 claims 1
- 229910001080 W alloy Inorganic materials 0.000 claims 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims 1
- 239000000696 magnetic material Substances 0.000 abstract description 16
- 239000010410 layer Substances 0.000 description 105
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 14
- 239000000523 sample Substances 0.000 description 14
- 229910004298 SiO 2 Inorganic materials 0.000 description 13
- 239000010408 film Substances 0.000 description 13
- 238000000137 annealing Methods 0.000 description 12
- 230000008569 process Effects 0.000 description 10
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 9
- 235000012431 wafers Nutrition 0.000 description 9
- 239000011651 chromium Substances 0.000 description 8
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 8
- 230000005415 magnetization Effects 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 230000005294 ferromagnetic effect Effects 0.000 description 6
- 238000000059 patterning Methods 0.000 description 6
- 238000001020 plasma etching Methods 0.000 description 6
- 230000005307 ferromagnetism Effects 0.000 description 5
- 239000010955 niobium Substances 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 239000000725 suspension Substances 0.000 description 4
- 230000002411 adverse Effects 0.000 description 3
- 239000003302 ferromagnetic material Substances 0.000 description 3
- 238000001459 lithography Methods 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 239000002178 crystalline material Substances 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000000609 electron-beam lithography Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 239000003870 refractory metal Substances 0.000 description 2
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910017150 AlTi Inorganic materials 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910000684 Cobalt-chrome Inorganic materials 0.000 description 1
- 241000258963 Diplopoda Species 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000005290 antiferromagnetic effect Effects 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000010952 cobalt-chrome Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical compound [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- 238000007885 magnetic separation Methods 0.000 description 1
- 238000000386 microscopy Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 230000005641 tunneling Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/855—Coating only part of a support with a magnetic layer
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/1278—Structure or manufacture of heads, e.g. inductive specially adapted for magnetisations perpendicular to the surface of the record carrier
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
- G11B5/66—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers
- G11B5/667—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers including a soft magnetic layer
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
- G11B5/66—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers
- G11B5/676—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers having magnetic layers separated by a nonmagnetic layer, e.g. antiferromagnetic layer, Cu layer or coupling layer
- G11B5/678—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers having magnetic layers separated by a nonmagnetic layer, e.g. antiferromagnetic layer, Cu layer or coupling layer having three or more magnetic layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/736—Non-magnetic layer under a soft magnetic layer, e.g. between a substrate and a soft magnetic underlayer [SUL] or a keeper layer
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/7368—Non-polymeric layer under the lowermost magnetic recording layer
- G11B5/7369—Two or more non-magnetic underlayers, e.g. seed layers or barrier layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/739—Magnetic recording media substrates
- G11B5/73911—Inorganic substrates
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/739—Magnetic recording media substrates
- G11B5/73911—Inorganic substrates
- G11B5/73913—Composites or coated substrates
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B2005/0002—Special dispositions or recording techniques
- G11B2005/0026—Pulse recording
- G11B2005/0029—Pulse recording using magnetisation components of the recording layer disposed mainly perpendicularly to the record carrier surface
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/90—Magnetic feature
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Record Carriers (AREA)
Abstract
【解決手段】磁性材料をそれらの端部231上に有する離間した柱230を有し、柱230の間に非磁性のトレンチ232を備えたタイプのパターン化垂直磁気記録媒体が、プリエッチングされた基板212の使用を可能にする方法を用いて作成される。基板212は、トレンチ232においてほぼ平面の表面214を有するとともに、加熱されると、磁気記録層材料中に拡散し、記録層に標準的に使用される元素の1つまたは複数と化学反応する材料を含む。柱230は、記録層234中に拡散しない材料で形成される。
【選択図】図3C
Description
50…書込みヘッド、
60…読取りヘッド、
212、212′、312…基板、
213、213′、313…拡散層、
214、314…表面、
216、316…透磁性下層(SUL)、
218、318…基部、
219、319、320…拡散障壁、
230、330…柱、
232、332…トレンチ、
234、334…記録層、
231…端部、
236、336…非磁性領域。
Claims (24)
- ほぼ平面の表面と、前記表面からほぼ垂直に延びる複数の離間した柱とを有する基板と、
前記柱の頂部上の垂直磁気異方性を有する記録層であって、Co、Fe、Pt、およびPdから成る群から選択された1つまたは複数の元素を含む材料で形成された記録層と、
前記柱の間の前記表面にある、前記記録層の元素の少なくとも1つを含む非磁性領域とを備える、パターン化磁気記録媒体。 - 前記基板がSiおよびGeから選択された材料を含み、前記非磁性領域が、前記少なくとも1つの記録層元素と前記選択されたSiまたはGeとの化合物を含む、請求項1に記載の媒体。
- 前記基板が、前記ほぼ平面の表面を有するほぼ非晶質のSiの層を備え、前記非磁性領域が、前記少なくとも1つの記録層元素とSiとの化合物を含む、請求項1に記載の媒体。
- 前記基板が、軟磁性かつ透磁性の材料の下層と、前記下層と前記非晶質Si層の間の拡散障壁とをさらに備える、請求項3に記載の媒体。
- 前記基板が、前記ほぼ平面の表面を有する第1の拡散障壁を備え、前記柱がSiおよびGeから選択された材料を含み、前記非磁性領域が、前記柱からの前記選択されたSiまたはGeをさらに含むとともに、前記記録層と前記柱の端部との間に第2の拡散障壁をさらに備える、請求項1に記載の媒体。
- 前記基板が、軟磁性かつ透磁性の材料の下層をさらに備え、前記第1の拡散障壁が前記下層上に形成された、請求項5に記載の媒体。
- 前記柱が、窒化シリコン、酸化シリコン、酸化アルミニウム、W、W合金、Mo、Mo合金、Nb、Nb合金、Ta、Ta合金、Re、およびRe合金から成る群から選択された非磁性材料で形成された、請求項1に記載の媒体。
- 前記記録層が、Co/Pt、Co/Pd、Fe/Pt、およびFe/Pdの多層から成る群から選択された多層である、請求項1に記載の媒体。
- 前記記録層の材料が粒状Co合金を含む、請求項1に記載の媒体。
- 前記記録層の材料が、CoPt、CoPd、FePt、およびFePdから成る群から選択された化学的規則性をもつ合金を含む、請求項1に記載の媒体。
- 前記柱が、複数のほぼ同心の円形トラックの形で前記基板上に配置された、請求項1に記載の媒体。
- 前記柱が、相互に垂直な列の配列の形で前記基板上に配置された、請求項1に記載の媒体。
- Siを含むとともに、ほぼ平面の表面と、前記表面からほぼ垂直に延びる、ほぼ同一平面上にある端部を有する複数の離間した柱とを有する基板と、
前記柱の前記端部上の垂直磁気異方性を有する記録層であって、Co、Fe、Pt、およびPdから成る群から選択された1つまたは複数の元素を含む材料で形成された記録層と、
前記柱の間の前記表面にある、Siと前記記録層の元素の少なくとも1つとの化合物を含む非磁性領域とを備える、パターン化磁気記録媒体。 - 前記基板が、前記ほぼ平面の表面を有するほぼ非晶質のSiの層を備える、請求項13に記載の媒体。
- 前記基板が、軟磁性かつ透磁性の材料の下層と、前記下層と前記非晶質Si層の間の拡散障壁とをさらに備える、請求項14に記載の媒体。
- 前記下層の材料が、CoNiFe、FeCoB、CoCuFe、NiFe、FeAlSi、FeTaN、FeN、FeTaC、CoTaZr、CoFeTaZr、CoFeB、およびCoZrNbから成る合金の群から選択された合金を含む、請求項15に記載の媒体。
- 前記記録層が、CoおよびFeから成る群から選択された第1の材料の層と、PtおよびPdから成る群から選択された第2の材料の層とが交互になった多層を備える、請求項13に記載の媒体。
- 前記記録層の材料が粒状Co合金を含む、請求項13に記載の媒体。
- 前記記録層の材料が、Si、Ta、Ti、Nb、Cr、V、およびBの1つまたは複数の酸化物をさらに含む、請求項18に記載の媒体。
- 前記記録層の材料が、CoPt、CoPd、FePt、およびFePdから成る群から選択された化学的規則性をもつ合金を含む、請求項13に記載の媒体。
- 前記媒体が磁気記録ディスクであり、前記柱が、複数のほぼ同心の円形トラックの形で前記基板上に配置された、請求項13に記載の媒体。
- 前記柱が、相互に垂直な列の配列の形で前記基板上に配置された、請求項13に記載の媒体。
- 請求項13に記載の媒体と、
前記柱の前記端部上の前記記録層を、前記柱がそこから延びる前記基板表面にほぼ垂直な方向で磁化する書込みヘッドと、
前記柱端部上の磁化された前記記録層を検出する読取りヘッドとを備える、垂直磁気記録システム。 - SiおよびGeから選択された材料を含むとともに、ほぼ平面の表面と、前記表面からほぼ垂直に延びる複数の柱であって、ほぼ同一平面上にある端部を有し、前記表面において柱の間にトレンチを規定するように前記表面上で離間している柱とを有する基板を提供する工程と、
前記柱の端部上および前記トレンチ内に、Co、Fe、Pt、およびPdから成る群から選択された1つまたは複数の元素を含む垂直磁気記録材料の層を蒸着する工程と、
前記記録材料の層を蒸着した後に、前記選択されたSiまたはGeを、前記トレンチ内の前記記録層元素の少なくとも1つと化学反応させるため、前記基板を加熱する工程とを含む、パターン化垂直磁気記録媒体の製造方法。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/558,846 US7732071B2 (en) | 2006-11-10 | 2006-11-10 | Perpendicular magnetic recording system with patterned medium and manufacturing process for the medium |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008123663A true JP2008123663A (ja) | 2008-05-29 |
JP2008123663A5 JP2008123663A5 (ja) | 2010-11-25 |
Family
ID=38799331
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007289594A Pending JP2008123663A (ja) | 2006-11-10 | 2007-11-07 | パターン化磁気記録媒体及びその製造方法、垂直磁気記録システム |
Country Status (5)
Country | Link |
---|---|
US (1) | US7732071B2 (ja) |
EP (1) | EP1921612A1 (ja) |
JP (1) | JP2008123663A (ja) |
KR (1) | KR20080042704A (ja) |
CN (1) | CN101178907B (ja) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20080074786A1 (en) * | 2006-09-21 | 2008-03-27 | Canon Kabushiki Kaisha | Magnetic recording medium and method of manufacturing the same |
JP4745307B2 (ja) * | 2007-09-28 | 2011-08-10 | 株式会社東芝 | 磁気記録媒体および磁気記録媒体の製造方法 |
US8130468B2 (en) | 2007-12-17 | 2012-03-06 | Hitachi Global Storage Technolgies Netherlands B.V. | System and apparatus for patterned media with reduced magnetic trench material |
US8189292B2 (en) * | 2008-12-24 | 2012-05-29 | Hitachi Global Storage Technologies Netherlands B.V. | Method for manufacturing a magnetic write head having a write pole with a trailing edge taper using a Rieable hard mask |
US8748018B2 (en) * | 2009-10-12 | 2014-06-10 | HGST Netherlands B.V. | Patterned perpendicular magnetic recording medium with data islands having a flux channeling layer below the recording layer |
US8351151B2 (en) * | 2010-11-02 | 2013-01-08 | Hitachi Global Storage Technologies Netherlands B.V. | Thermally assisted magnetic write head employing a near field transducer (NFT) having a diffusion barrier layer between the near field transducer and a magnetic lip |
US20120273999A1 (en) * | 2011-04-29 | 2012-11-01 | Seagate Technology, Llc | Method for patterning a stack |
US8771847B2 (en) * | 2011-10-14 | 2014-07-08 | Seagate Technology | Reader stop-layers |
US9147423B2 (en) | 2012-04-17 | 2015-09-29 | HGST Netherlands B.V. | Method for improving a patterned perpendicular magnetic recording disk with annealing |
CN103544968B (zh) * | 2013-10-14 | 2017-01-25 | 中国计量学院 | 一种磁记录薄膜结构及其制备方法 |
WO2015105939A1 (en) | 2014-01-08 | 2015-07-16 | University Of Houston System | Systems and methods for locally reducing oxides |
CN106244076B (zh) * | 2016-07-28 | 2019-03-01 | 北京化工大学 | 一种磁场中图案的固定方法 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05109047A (ja) * | 1991-03-12 | 1993-04-30 | Hitachi Ltd | 磁気記録媒体及びその製造方法 |
JP2002133647A (ja) * | 2000-10-27 | 2002-05-10 | Showa Denko Kk | 磁気記録媒体、その製造方法、磁気記録再生装置、および媒体基板 |
JP2005228816A (ja) * | 2004-02-10 | 2005-08-25 | Tdk Corp | 磁性膜の形成方法、磁性パターンの形成方法及び磁気記録媒体の製造方法 |
JP2006018954A (ja) * | 2004-07-05 | 2006-01-19 | Hitachi Maxell Ltd | 情報記録媒体 |
JP2006147148A (ja) * | 2006-03-03 | 2006-06-08 | Toshiba Corp | 磁気記録媒体 |
JP2008192275A (ja) * | 2006-09-21 | 2008-08-21 | Canon Inc | 磁気記録媒体およびその製造方法 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2371777A1 (fr) * | 1976-11-18 | 1978-06-16 | Loic Henry | Procede de fabrication d'une barriere de diffusion en nitrure de silicium sur un substrat de semiconducteur, en particulier du type iii-v |
JP2769420B2 (ja) * | 1992-05-01 | 1998-06-25 | インターナショナル・ビジネス・マシーンズ・コーポレイション | 磁気モーメント低下方法及びデータ記憶装置 |
US5587223A (en) * | 1992-10-19 | 1996-12-24 | Board Of Trustees Leland Stanford, Jr. University | High density magnetic information storage medium |
US5585140A (en) * | 1992-10-30 | 1996-12-17 | International Business Machines Corporation | Magnetic film patterning by germanium or silicon diffusion |
US5774783A (en) * | 1995-03-17 | 1998-06-30 | Fujitsu Limited | Magnetic recording medium |
US5820769A (en) * | 1995-05-24 | 1998-10-13 | Regents Of The University Of Minnesota | Method for making magnetic storage having discrete elements with quantized magnetic moments |
US5858474A (en) * | 1996-02-20 | 1999-01-12 | Seagate Technology, Inc. | Method of forming a magnetic media |
US5900729A (en) * | 1997-03-20 | 1999-05-04 | International Business Machines Corporation | Magnetic force microscopy probe with integrated coil |
US6440520B1 (en) * | 1999-07-09 | 2002-08-27 | International Business Machines Corporation | Patterned magnetic recording disk with substrate patterned by ion implantation |
US6331364B1 (en) * | 1999-07-09 | 2001-12-18 | International Business Machines Corporation | Patterned magnetic recording media containing chemically-ordered FePt of CoPt |
US6383597B1 (en) * | 2000-06-21 | 2002-05-07 | International Business Machines Corporation | Magnetic recording media with magnetic bit regions patterned by ion irradiation |
US6754017B2 (en) * | 2001-10-26 | 2004-06-22 | Hitachi Global Storage Technologies, Netherlands B.V. | Patterned media magnetic recording disk drive with timing of write pulses by sensing the patterned media |
JP2004062995A (ja) | 2002-07-29 | 2004-02-26 | Fuji Electric Holdings Co Ltd | 垂直磁気記録媒体用基板およびその製造方法並びに垂直磁気記録媒体およびその製造方法 |
JP2004164692A (ja) * | 2002-11-08 | 2004-06-10 | Toshiba Corp | 磁気記録媒体及びその製造方法 |
US6947235B2 (en) * | 2003-12-03 | 2005-09-20 | Hitachi Global Storage Technologies Netherlands B.V. | Patterned multilevel perpendicular magnetic recording media |
US7931977B2 (en) | 2004-07-22 | 2011-04-26 | Universitat Konstanz | Information storage media |
JP2007035164A (ja) * | 2005-07-27 | 2007-02-08 | Toshiba Corp | 凹凸パターン基板およびその製造方法、磁気記録媒体、ならびに磁気記録装置 |
-
2006
- 2006-11-10 US US11/558,846 patent/US7732071B2/en not_active Expired - Fee Related
-
2007
- 2007-07-24 EP EP07252924A patent/EP1921612A1/en not_active Withdrawn
- 2007-11-07 KR KR1020070113142A patent/KR20080042704A/ko not_active Application Discontinuation
- 2007-11-07 JP JP2007289594A patent/JP2008123663A/ja active Pending
- 2007-11-12 CN CN2007101863342A patent/CN101178907B/zh not_active Expired - Fee Related
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05109047A (ja) * | 1991-03-12 | 1993-04-30 | Hitachi Ltd | 磁気記録媒体及びその製造方法 |
JP2002133647A (ja) * | 2000-10-27 | 2002-05-10 | Showa Denko Kk | 磁気記録媒体、その製造方法、磁気記録再生装置、および媒体基板 |
JP2005228816A (ja) * | 2004-02-10 | 2005-08-25 | Tdk Corp | 磁性膜の形成方法、磁性パターンの形成方法及び磁気記録媒体の製造方法 |
JP2006018954A (ja) * | 2004-07-05 | 2006-01-19 | Hitachi Maxell Ltd | 情報記録媒体 |
JP2006147148A (ja) * | 2006-03-03 | 2006-06-08 | Toshiba Corp | 磁気記録媒体 |
JP2008192275A (ja) * | 2006-09-21 | 2008-08-21 | Canon Inc | 磁気記録媒体およびその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
CN101178907B (zh) | 2010-06-02 |
US7732071B2 (en) | 2010-06-08 |
KR20080042704A (ko) | 2008-05-15 |
EP1921612A1 (en) | 2008-05-14 |
CN101178907A (zh) | 2008-05-14 |
US20080112079A1 (en) | 2008-05-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US7846565B2 (en) | Perpendicular magnetic recording disk drive with patterned disk having capping layer for suppression of surface diffusion of trench material | |
US7732071B2 (en) | Perpendicular magnetic recording system with patterned medium and manufacturing process for the medium | |
US6947235B2 (en) | Patterned multilevel perpendicular magnetic recording media | |
US8021769B2 (en) | Patterned perpendicular magnetic recording medium with exchange coupled recording layer structure and magnetic recording system using the medium | |
US6865044B1 (en) | Method for magnetic recording on patterned multilevel perpendicular media using thermal assistance and fixed write current | |
US6906879B1 (en) | Magnetic recording system with patterned multilevel perpendicular magnetic recording | |
US7960044B2 (en) | Patterned-media perpendicular magnetic recording disk with servo regions having magnetized servo pillars and oppositely-magnetized servo trenches | |
US6882488B1 (en) | Method for magnetic recording on patterned multilevel perpendicular media using variable write current | |
US8399051B1 (en) | Method for making a patterned perpendicular magnetic recording disk having a FePt or CoPt chemically ordered recording layer | |
US8268461B1 (en) | Patterned perpendicular magnetic recording medium with ultrathin oxide film and reduced switching field distribution | |
US20120147718A1 (en) | PATTERNED PERPENDICULAR MAGNETIC RECORDING MEDIUM WITH EXCHANGE-COUPLED COMPOSITE RECORDING STRUCTURE OF A FePt LAYER AND A Co/X MULTILAYER | |
US8320232B1 (en) | Patterned perpendicular magnetic recording medium with multiple magnetic layers and interlayers | |
US8824084B1 (en) | Perpendicular magnetic recording disk with patterned servo regions and templated growth method for making the disk | |
US8748018B2 (en) | Patterned perpendicular magnetic recording medium with data islands having a flux channeling layer below the recording layer | |
US9183865B1 (en) | Patterned perpendicular magnetic recording medium with ultrathin noble metal interlayer | |
US9147423B2 (en) | Method for improving a patterned perpendicular magnetic recording disk with annealing | |
VVITI | i, United States Patent (10) Patent No.: US 8.252. 153 B2 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20101006 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20101006 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20111025 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20111129 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20120508 |