JP2008073633A5 - - Google Patents
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- Publication number
- JP2008073633A5 JP2008073633A5 JP2006257124A JP2006257124A JP2008073633A5 JP 2008073633 A5 JP2008073633 A5 JP 2008073633A5 JP 2006257124 A JP2006257124 A JP 2006257124A JP 2006257124 A JP2006257124 A JP 2006257124A JP 2008073633 A5 JP2008073633 A5 JP 2008073633A5
- Authority
- JP
- Japan
- Prior art keywords
- plate
- treatment agent
- forming member
- film forming
- pressing member
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Claims (18)
前記プレート上に隙間をあけて配置され、前記プレートの回転により前記処理剤が前記隙間を通ることで前記プレート上に前記処理剤の膜を形成する膜形成部材と、
前記膜形成部材に近接して配置され、前記プレートの回転により前記膜形成部材へ向かう前記処理剤を前記プレートに押し付ける押し付け部材と
を具備する塗布装置。 A plate provided rotatably and supplied with a paste-like treatment agent;
A film forming member that is disposed with a gap on the plate, and forms a film of the treatment agent on the plate by passing the gap by the rotation of the plate;
The film is arranged close to forming member, the coating fabric device the treating agent by the rotation of the plate towards the film forming member you and a pressing member pressed against the plate.
前記押し付け部材は、
前記プレートに対面する上壁と、
前記プレートによる回転の外周側に設けられた外周壁と
を有する塗布装置。 The coating apparatus according to claim 1,
The pressing member is
An upper wall facing the plate;
Coated cloth device that having a outer peripheral wall provided on an outer periphery side of the rotation by the plate.
前記上壁は、前記膜形成部材に向かうにしたがい徐々に前記プレートに近づく内面を有する塗布装置。 The coating apparatus according to claim 2,
The top wall is coated cloth device that having a inner surface gradually approaches the plate toward the said film member.
前記上壁は、前記外周壁に向かうにしたがい徐々にプレートに近づく内面を有する塗布装置。 The coating apparatus according to claim 2,
The top wall is coated cloth device that having a inner surface gradually approaching the plate toward the outer peripheral wall.
前記上壁は、
内面と、
前記内面に、前記回転の周方向に形成された複数の溝と
を有する塗布装置。 The coating apparatus according to claim 2,
The upper wall is
Inside,
The inner surface, the coating fabric device that having a plurality of grooves formed in the circumferential direction of the rotation.
前記上壁は、
内面と、
前記プレートの回転により処理剤が徐々に回転の内周側へ向かうように、前記内面に形成された複数の溝と
を有する塗布装置。 The coating apparatus according to claim 2,
The upper wall is
Inside,
As treating agents by the rotation of the plate is directed gradually toward the inner circumferential side of the rotation, the coating fabric device that having a plurality of grooves formed in said inner surface.
前記処理剤が流動するときの圧力により前記押し付け部材が移動するように該押し付け部材を支持する支持機構と、
前記押し付け部材の動きを検出する検出手段と
をさらに具備する塗布装置。 The coating apparatus according to claim 1,
A support mechanism for supporting the pressing member so that the pressing member moves by pressure when the processing agent flows;
The pressing member further be that the coating fabric device and a detection means for detecting a motion of.
前記支持機構は、前記押し付け部材を弾性的に支持する塗布装置。 The coating apparatus according to claim 7,
The support mechanism, the pressing coated fabric device you elastically supporting members.
前記押し付け部材の膜形成部材側に設けられ、前記押し付け部材を回動させるヒンジ機構を有する塗布装置。 The coating apparatus according to claim 7,
The pressing is provided in the membrane forming member side of the member, the coating fabric device that having a hinge mechanism for rotating the pressing member.
前記支持機構は、
前記押し付け部材を回動させるヒンジ機構と、
前記押し付け部材を弾性的に保持するバネと
を有する塗布装置。 The coating apparatus according to claim 7,
The support mechanism is
A hinge mechanism for rotating the pressing member;
Coated cloth device that having a spring for holding the pressing member elastically.
前記支持機構は、前記押し付け部材がリニアに移動可能に支持するリニア移動機構を有する塗布装置。 The coating apparatus according to claim 7,
The support mechanism, the coating fabric device that have a linear moving mechanism for the pressing member is movably supported on linear.
前記押し付け部材の動きを検出する検出手段をさらに具備し、
前記押し付け部材は板バネ状に作用する塗布装置。 The coating apparatus according to claim 1,
It further comprises detection means for detecting the movement of the pressing member,
The pressing member is coated cloth device that acting on shaped leaf spring.
前記押し付け部材は、前記上流側に設けられた開口を有し、
前記塗布装置は、
前記開口の一部を塞ぐように設けられた壁部材を有する、前記プレート上で前記押し付け部材に近接して配置されたカバーをさらに具備する塗布装置。 The coating apparatus according to claim 1,
The pressing member has an opening provided on the upstream side,
The coating device includes:
It said having a wall member provided so as to cover a portion of the opening, further to that coated fabric device comprising a cover disposed in proximity to the pressing member in the plate.
前記プレート上に隙間をあけて、かつ、前記プレートに沿って移動可能に配置され、前記移動により前記処理剤が前記隙間を通ることで前記プレート上に前記処理剤の膜を形成する膜形成部材と、
前記膜形成部材に近接して配置され、前記膜形成部材の移動により前記膜形成部材へ向かう前記処理剤を前記プレートに押し付ける押し付け部材と
を具備する塗布装置。 A plate to which a paste-like treatment agent is supplied;
A film forming member that is disposed on the plate with a gap and is movable along the plate, and forms a film of the treatment agent on the plate by passing the treatment agent through the gap by the movement. When,
The film is arranged close to forming member, the film forming member coated fabric device the processing agent toward the film forming member by moving you and a pressing member pressed against the plate.
前記プレート上に隙間をあけて配置され、前記プレートの回転により前記処理剤が前記隙間を通ることで前記プレート上に前記処理剤の膜を形成する膜形成部材と、
前記プレートの回転により前記膜形成部材に当接して滞留する前記処理剤の量を検出する検出手段と
を具備する塗布装置。 A plate provided rotatably and supplied with a paste-like treatment agent;
A film forming member that is disposed with a gap on the plate, and forms a film of the treatment agent on the plate by passing the gap by the rotation of the plate;
Coated cloth device and a detection means for detecting the amount of the treatment agent staying in contact with the film forming member by the rotation of the plate.
前記プレート上に隙間をあけて、かつ、前記プレートに沿って移動可能に配置され、前記移動により前記処理剤が前記隙間を通ることで前記プレート上に前記処理剤の膜を形成する膜形成部材と、
前記膜形成部材の移動により前記膜形成部材に当接して滞留する前記処理剤の量を検出する検出手段と
を具備する塗布装置。 A plate to which a paste-like treatment agent is supplied;
A film forming member that is disposed on the plate with a gap and is movable along the plate, and forms a film of the treatment agent on the plate by passing the treatment agent through the gap by the movement. When,
The film forming member abuts coated cloth device you and a detection means for detecting the amount of the treating agent remaining in the film forming member by movement of the.
前記プレート上に隙間をあけて配置され、前記プレートの回転により前記処理剤が前記隙間を通ることで前記プレート上に前記処理剤の膜を形成する膜形成部材と、
前記膜形成部材に近接して配置され、前記プレートの回転により前記膜形成部材へ向かう前記処理剤を前記プレートに押し付ける押し付け部材と、
第1の電子部品を保持して移動させることが可能であり、前記プレートに塗布された前記処理剤を前記第1の電子部品に付着させ、前記処理剤が付着した前記第1の電子部品を第2の電子部品上に載置させる実装機構と
を具備する実装装置。 A plate provided rotatably and supplied with a paste-like treatment agent;
A film forming member that is disposed with a gap on the plate, and forms a film of the treatment agent on the plate by passing the gap by the rotation of the plate;
A pressing member that is disposed in proximity to the film forming member and presses the processing agent toward the film forming member by rotation of the plate against the plate;
It is possible to hold and move the first electronic component, the treatment agent applied to the plate is attached to the first electronic component, and the first electronic component to which the treatment agent is attached is attached. you and a mounting mechanism for mounting on a second electronic component implementation device.
前記プレートの回転により、前記プレート上に配置された膜形成部材と前記プレートとの隙間に、前記処理剤が通ることで前記プレート上に前記処理剤の膜を形成し、
前記膜形成部材に近接して配置された押し付け部材により、前記プレートの回転により前記膜形成部材へ向かう前記処理剤を前記プレートに押し付け、
前記プレートに塗布された前記処理剤を第1の電子部品に付着させ、
前記処理剤が付着した前記第1の電子部品を第2の電子部品上に載置させる
ことにより製造された電子部品。 Rotate the plate supplied with the paste treatment agent,
By rotating the plate, a film of the processing agent is formed on the plate by passing the processing agent in a gap between the plate and the film forming member disposed on the plate,
With the pressing member disposed in proximity to the film forming member, the treatment agent heading toward the film forming member by pressing the plate is pressed against the plate,
The treatment agent applied to the plate is attached to the first electronic component,
An electronic component manufactured by placing the first electronic component to which the treatment agent is attached on a second electronic component.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006257124A JP4867548B2 (en) | 2006-09-22 | 2006-09-22 | Coating device, mounting device, and electronic component manufacturing method |
CN200710161811.XA CN101164705B (en) | 2006-09-22 | 2007-09-24 | Coating device, mounting device, coating method, electronic part manufacturing method and electronic parts |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006257124A JP4867548B2 (en) | 2006-09-22 | 2006-09-22 | Coating device, mounting device, and electronic component manufacturing method |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2008073633A JP2008073633A (en) | 2008-04-03 |
JP2008073633A5 true JP2008073633A5 (en) | 2009-11-05 |
JP4867548B2 JP4867548B2 (en) | 2012-02-01 |
Family
ID=39333638
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006257124A Active JP4867548B2 (en) | 2006-09-22 | 2006-09-22 | Coating device, mounting device, and electronic component manufacturing method |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP4867548B2 (en) |
CN (1) | CN101164705B (en) |
Families Citing this family (19)
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JP5082358B2 (en) * | 2006-09-22 | 2012-11-28 | ソニー株式会社 | Coating device, mounting device, and electronic component manufacturing method |
KR101352573B1 (en) * | 2008-08-18 | 2014-01-17 | 삼성테크윈 주식회사 | Flux dipping apparatus |
KR101352574B1 (en) * | 2008-08-18 | 2014-01-17 | 삼성테크윈 주식회사 | Flux dipping apparatus having a sensing members |
CN102698938B (en) * | 2012-06-07 | 2015-03-11 | 珠海格力电器股份有限公司 | Pressure stabilizing block coating heat dissipation paste holding equipment |
CN102784745B (en) * | 2012-08-06 | 2015-08-19 | 昆山微容电子企业有限公司 | The excessive powder recovery system of automatic coating machine |
JP5785576B2 (en) * | 2013-03-11 | 2015-09-30 | 株式会社東芝 | Paste supply unit |
JP5360323B1 (en) * | 2013-04-26 | 2013-12-04 | 富士ゼロックス株式会社 | Viscosity agent thickness adjusting device, mounting device, and manufacturing method of substrate device |
JP6171613B2 (en) * | 2013-06-21 | 2017-08-02 | 日亜化学工業株式会社 | LIGHT EMITTING DEVICE MANUFACTURING METHOD AND LIGHT EMITTING DEVICE |
JP6322807B2 (en) * | 2013-12-12 | 2018-05-16 | パナソニックIpマネジメント株式会社 | Paste transfer device and electronic component mounting machine |
JP6375628B2 (en) * | 2014-01-27 | 2018-08-22 | 三菱電機株式会社 | Resin feeder |
CN205331873U (en) * | 2014-09-28 | 2016-06-22 | 嘉兴山蒲照明电器有限公司 | LED (Light -emitting diode) straight lamp |
WO2017134990A1 (en) * | 2016-02-03 | 2017-08-10 | 富士フイルム株式会社 | Method for producing organic semiconductor film |
JP6683820B2 (en) * | 2016-09-27 | 2020-04-22 | 富士フイルム株式会社 | Membrane manufacturing method |
JP7343982B2 (en) * | 2019-01-29 | 2023-09-13 | 株式会社Fuji | Film forming equipment |
KR102225058B1 (en) * | 2020-11-27 | 2021-03-09 | 주식회사 에스에프이 | Apparatus for applying flux to solder ball |
KR102302956B1 (en) | 2021-06-01 | 2021-09-16 | 주식회사 에스에프이 | Apparatus for applying flux to solder ball |
JPWO2023286231A1 (en) * | 2021-07-15 | 2023-01-19 | ||
CN115213057B (en) * | 2022-07-25 | 2023-12-22 | 加百裕(南通)电子有限公司 | High-efficient rubber coating device of electronic components |
CN116967559B (en) * | 2023-09-21 | 2023-12-08 | 微网优联科技(成都)有限公司 | Device and method for rapidly and precisely welding connector lug on PCB for camera |
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JPS6031376A (en) * | 1983-07-29 | 1985-02-18 | Sony Corp | Video signal reproducing device |
SE447545B (en) * | 1985-06-12 | 1986-11-24 | Inventing Ab | SET AND DEVICE FOR LEAF COATING OF A CURRENT MATERIAL COAT |
JPS63164222A (en) * | 1986-12-25 | 1988-07-07 | Hitachi Electronics Eng Co Ltd | Gas head for cvd apparatus |
US4934309A (en) * | 1988-04-15 | 1990-06-19 | International Business Machines Corporation | Solder deposition system |
JPH0819752A (en) * | 1994-07-08 | 1996-01-23 | Matsushita Electric Ind Co Ltd | Thin film forming device |
JPH10209208A (en) * | 1997-01-23 | 1998-08-07 | Hitachi Ltd | Method and device for manufacturing semiconductor |
JP2001345543A (en) * | 2000-05-31 | 2001-12-14 | Sanyo Electric Co Ltd | Flux transfer apparatus |
JP4263347B2 (en) * | 2000-11-02 | 2009-05-13 | パナソニック株式会社 | Paste supply device for electronic component mounting equipment |
-
2006
- 2006-09-22 JP JP2006257124A patent/JP4867548B2/en active Active
-
2007
- 2007-09-24 CN CN200710161811.XA patent/CN101164705B/en active Active
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