JP2008055285A - Hydrothermal treatment device and method of carrying out hydrothermal treatment of object to be treated by water component of steam and heat of steam - Google Patents

Hydrothermal treatment device and method of carrying out hydrothermal treatment of object to be treated by water component of steam and heat of steam Download PDF

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JP2008055285A
JP2008055285A JP2006233561A JP2006233561A JP2008055285A JP 2008055285 A JP2008055285 A JP 2008055285A JP 2006233561 A JP2006233561 A JP 2006233561A JP 2006233561 A JP2006233561 A JP 2006233561A JP 2008055285 A JP2008055285 A JP 2008055285A
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treatment
kettle
water vapor
steam
hydrothermal treatment
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Iwao Kimura
巌 木村
Yoshitoyo Kojima
嘉豊 小島
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FUJIMURA TSUSHO KK
KOMASUYA KK
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FUJIMURA TSUSHO KK
KOMASUYA KK
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Priority to JP2006233561A priority Critical patent/JP2008055285A/en
Priority to KR20070034187A priority patent/KR20080020445A/en
Priority to TW96112929A priority patent/TW200811056A/en
Priority to CNA2007100961174A priority patent/CN101134159A/en
Publication of JP2008055285A publication Critical patent/JP2008055285A/en
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B09DISPOSAL OF SOLID WASTE; RECLAMATION OF CONTAMINATED SOIL
    • B09BDISPOSAL OF SOLID WASTE
    • B09B3/00Destroying solid waste or transforming solid waste into something useful or harmless
    • B09B3/40Destroying solid waste or transforming solid waste into something useful or harmless involving thermal treatment, e.g. evaporation
    • B09B3/45Steam treatment, e.g. supercritical water gasification or oxidation
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26DRYING
    • F26BDRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B3/00Drying solid materials or objects by processes involving the application of heat
    • F26B3/02Drying solid materials or objects by processes involving the application of heat by convection, i.e. heat being conveyed from a heat source to the materials or objects to be dried by a gas or vapour, e.g. air
    • F26B3/06Drying solid materials or objects by processes involving the application of heat by convection, i.e. heat being conveyed from a heat source to the materials or objects to be dried by a gas or vapour, e.g. air the gas or vapour flowing through the materials or objects to be dried
    • F26B3/08Drying solid materials or objects by processes involving the application of heat by convection, i.e. heat being conveyed from a heat source to the materials or objects to be dried by a gas or vapour, e.g. air the gas or vapour flowing through the materials or objects to be dried so as to loosen them, e.g. to form a fluidised bed
    • F26B3/084Drying solid materials or objects by processes involving the application of heat by convection, i.e. heat being conveyed from a heat source to the materials or objects to be dried by a gas or vapour, e.g. air the gas or vapour flowing through the materials or objects to be dried so as to loosen them, e.g. to form a fluidised bed with heat exchange taking place in the fluidised bed, e.g. combined direct and indirect heat exchange
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26DRYING
    • F26BDRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B9/00Machines or apparatus for drying solid materials or objects at rest or with only local agitation; Domestic airing cupboards
    • F26B9/06Machines or apparatus for drying solid materials or objects at rest or with only local agitation; Domestic airing cupboards in stationary drums or chambers
    • F26B9/08Machines or apparatus for drying solid materials or objects at rest or with only local agitation; Domestic airing cupboards in stationary drums or chambers including agitating devices, e.g. pneumatic recirculation arrangements
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02ATECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
    • Y02A40/00Adaptation technologies in agriculture, forestry, livestock or agroalimentary production
    • Y02A40/10Adaptation technologies in agriculture, forestry, livestock or agroalimentary production in agriculture
    • Y02A40/20Fertilizers of biological origin, e.g. guano or fertilizers made from animal corpses
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E50/00Technologies for the production of fuel of non-fossil origin
    • Y02E50/30Fuel from waste, e.g. synthetic alcohol or diesel
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02WCLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
    • Y02W30/00Technologies for solid waste management
    • Y02W30/50Reuse, recycling or recovery technologies
    • Y02W30/78Recycling of wood or furniture waste

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for carrying out a hydrothermal treatment which attempts to simply maintain the treatment conditions of a hydrothermal treatment and to enhance the treatment efficiency in conducting the hydrothermal treatment by a water component of steam and heat of steam, and to provide a hydrothermal treatment device therefor. <P>SOLUTION: In introducing steam with high temperature and high pressure of about 200°C/2MPa into a treatment kettle 110 and carrying out the hydrothermal treatment of the object to be treated by the water component of steam with high temperature and high pressure and heat of the steam in the treatment kettle 110, steam to be sent under pressure by a boiler 120 is heated by a steam overheating heater 130. Prior to the introduction of steam, the inside of the treatment kettle 110 is set to a high-pressurized environment in advance by introducing hyperbaric air into the treatment kettle 110 and the object to be treated is warmed in advance by spraying the object to be treated before the hydrothermal treatment is conducted with the residual steam upon the previous hydrothermal treatment. Thus, the treatment environment is maintained at high temperature and high pressure in the treatment kettle 110. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、食品残渣、木くず、紙くず、生ゴミ、食料残飯の他、プラスチック容器弁当やビニール包装オニギリの残飯等の被処理物を水蒸気とその熱にて処理する水熱処理に関する。   TECHNICAL FIELD The present invention relates to a hydrothermal treatment for treating an object to be treated such as food residue, wood waste, waste paper, raw garbage, food residue, plastic container lunch box, and plastic packaging onigiri residue with steam and its heat.

近年、環境保全や資源循環に対する意識が高まり、被処理物の焼却処理といった既存の処理手法に変わる手法が種々提案されている(例えば、特許文献1)。この特許文献では、食品残渣、木くず、紙くず、生ゴミ、食料残飯等の一般廃棄物を被処理物を高温・高圧の水蒸気にて水熱処理して飼料や堆肥を製造している。   In recent years, awareness of environmental conservation and resource circulation has increased, and various methods have been proposed to replace existing processing methods such as incineration of processed objects (for example, Patent Document 1). In this patent document, feed and compost are produced by hydrothermally treating a general waste such as food residue, wood waste, paper waste, raw garbage, and food waste with high-temperature and high-pressure steam.

特開2003−47409号公報JP 2003-47409 A

特許文献1は、水蒸気の水成分と水蒸気の熱にて被処理物を水熱処理するに当たり、処理釜内を1MPaに満たない圧力下で150℃前後の温度とすることが提案されている。こうした水熱処理の研究が進み、処理環境をより高温高圧化することで、プラスチック容器弁当やビニール包装オニギリの残板(以下、これらを便宜上、プラスチック含有残飯と呼ぶ)と一般廃棄物が混合した被処理物をも水熱処理できることが予想されるに到っている。   Patent Document 1 proposes that the temperature in a treatment kettle is set to a temperature of about 150 ° C. under a pressure of less than 1 MPa when the object to be treated is hydrothermally treated with the water component of water vapor and the heat of water vapor. As research on hydrothermal treatment progresses and the treatment environment is increased to a higher temperature and pressure, the remaining plates of plastic container lunch boxes and plastic packaging onigiri (hereinafter referred to as plastic-containing residue) are mixed with general waste. It has been expected that the treated product can also be hydrothermally treated.

しかしながら、水熱処理の処理条件を高温高圧化するとしても、高温・高圧の水蒸気の処理釜導入には水蒸気発生源であるボイラの能力から制約を受けるので、高温高圧下の水熱処理が進まないのが現状である。また、水熱処理の処理能力向上の上から処理釜の大型化も求められているが、釜の大型化に伴い水熱処理の際の処理条件の確保や維持についての改良の余地が残されていた。   However, even if the hydrothermal treatment conditions are increased to high temperatures and pressures, the introduction of high temperature and high pressure steam treatment tanks is limited by the ability of the boiler that is the source of water vapor, so hydrothermal treatment under high temperature and pressure does not proceed. Is the current situation. In addition, there is a need to increase the size of the treatment kettle from the viewpoint of improving the hydrothermal treatment capacity, but there is still room for improvement in securing and maintaining the treatment conditions during hydrothermal treatment as the kettle becomes larger. .

この他、処理効率の向上のために、水熱処理完了後には、速やかな処理生成物の排出による次回処理の早期の開始が望まれる。しかしながら、処理釜が高温高圧の水蒸気で充満されていることから、この水蒸気排出の上では処理釜の冷却による温度低下と圧力降下が必要であるものの、釜の大型化に伴い釜の温度低下と圧力降下に長時間を要していた。このため、次回の被処理物の水熱処理までの短縮化、延いては処理効率向上の上での改良の余地も残されていた。   In addition, in order to improve the processing efficiency, it is desired to start the next processing early by quickly discharging the processing product after the hydrothermal treatment is completed. However, since the treatment kettle is filled with high-temperature and high-pressure steam, a temperature drop and a pressure drop due to cooling of the treatment kettle are necessary for this steam discharge. The pressure drop took a long time. For this reason, there is still room for improvement in terms of shortening the time to the next hydrothermal treatment of the object to be treated, and thus improving the treatment efficiency.

本発明は、処理釜における水蒸気の水成分と水蒸気の熱とによる水熱処理を行うに際しての上記問題点を解決するためになされ、水熱処理の処理条件の簡便な維持や処理効率向上を図ること、或いはその両立を図ることをその目的とする。   The present invention was made in order to solve the above problems when performing hydrothermal treatment by the water component of water vapor and the heat of water vapor in the treatment kettle, and to easily maintain the treatment conditions of hydrothermal treatment and improve the treatment efficiency. Alternatively, the purpose is to achieve both.

かかる課題の少なくとも一部を解決するため、本発明の水熱処理装置とその方法では、水蒸気の水成分と水蒸気の熱にて被処理物を水熱処理するに際し、前記被処理物の投入口と排出口を有する中空の処理釜に、前記被処理物を前記投入口から投入し、この処理釜の内部に、水蒸気を生成する水蒸気生成源から水蒸気を圧送する。こうした水蒸気圧送により、処理釜内部を、投入済みの被処理物が圧送された水蒸気に触れ、水蒸気の持つ熱が被処理物の水熱処理に処される状態となる。そして、前記投入済みの被処理物を前記水蒸気が導入済みの前記処理釜内で攪拌することで、被処理物を満遍なく水蒸気に接触させつつ、被処理物へのより一律な熱の伝搬を図り、水熱処理を進行させる。   In order to solve at least a part of such problems, in the hydrothermal treatment apparatus and method of the present invention, when hydrotreating the workpiece with the water component of steam and the heat of steam, the inlet and outlet of the workpiece are discharged. The object to be processed is introduced into the hollow processing tank having an outlet from the charging port, and steam is pumped into the processing tank from a steam generation source that generates steam. By such steam pumping, the inside of the treatment kettle is brought into contact with the steam that has been fed and the heat of the steam is subjected to the hydrothermal treatment of the workpiece. Then, by stirring the charged object to be processed in the processing vessel into which the steam has been introduced, the object to be processed is uniformly contacted with the water vapor, and more uniform heat is transmitted to the object to be processed. The hydrothermal treatment is advanced.

こうした水熱処理の進行には、水蒸気生成源からの高温高圧の水蒸気の圧送の継続が不可欠であるが、水蒸気生成源の能力上、高温高圧の水蒸気の安定した圧送、並びに圧送水蒸気の高温高圧化には限界があるので、こうした知見に立ち、本発明では、水熱処理に際して処理環境の維持を図ることとした。つまり、前記処理釜に導入される水蒸気を加熱した上で水蒸気を前記処理釜に送り出すことで、水蒸気生成源の能力に拘わらず高温高圧の水蒸気の安定した圧送、並びに圧送水蒸気の高温高圧化を図り、水熱処理の処理環境の維持を図ることとした。この場合、水蒸気の加熱は、処理釜に水蒸気を導入する経路にて行うことが簡便である。   In order to proceed with such hydrothermal treatment, it is indispensable to continue the high-pressure and high-pressure steam pumping from the steam generation source. Therefore, in view of such knowledge, the present invention intends to maintain the treatment environment during the hydrothermal treatment. In other words, by heating the steam introduced into the treatment kettle and then sending the steam to the treatment kettle, it is possible to achieve stable pumping of high-temperature and high-pressure steam regardless of the ability of the steam generation source, and high-temperature and high-pressure pressurization steam. Therefore, it was decided to maintain the hydrothermal treatment environment. In this case, it is easy to heat the steam through a route for introducing the steam into the treatment kettle.

また、前記処理釜の内部に前記水熱処理の開始に先だって加圧エアーを導入することで、処理釜内を予め高圧環境としておき、水熱処理の処理環境の高圧化を図り、水熱処理の処理環境の維持を図ることとした。或いは、前記水熱処理の終了後における前記処理釜の残存水蒸気を前記処理釜から排出して中空容器に蓄え、該蓄えた水蒸気を前記処理釜の前記投入口から投入される次回処理用の前記被処理物に噴射して次回処理被処理物を昇温させることで、次回の水熱処理の際の被処理物投入による温度降下を抑制し、水熱処理の開始当初からの処理環境の維持を図ることとした。次回の被処理物の昇温は残存水蒸気にて行うことから、被処理物の昇温のための熱源を別途用意する必要がなく、構成の簡略化、省資源化を図ることができる。   In addition, by introducing pressurized air into the inside of the treatment tank prior to the start of the hydrothermal treatment, the inside of the treatment pot is set in a high-pressure environment in advance, thereby increasing the pressure of the hydrothermal treatment environment. It was decided to maintain this. Alternatively, the water vapor remaining in the treatment kettle after the hydrothermal treatment is finished is discharged from the treatment kettle and stored in a hollow container, and the stored water vapor is fed from the inlet of the treatment kettle for the next treatment. By spraying on the processed material and raising the temperature of the next processed material, the temperature drop due to the input of the processed material during the next hydrothermal treatment is suppressed, and the processing environment is maintained from the beginning of the hydrothermal treatment. It was. Since the next temperature increase of the object to be processed is performed with the remaining steam, it is not necessary to separately prepare a heat source for increasing the temperature of the object to be processed, and the configuration can be simplified and the resources can be saved.

以上説明した構成を有する本発明は、次のような態様を採ることもできる。例えば、水蒸気生成源から水蒸気を前記処理釜の内部に導入するための水蒸気導入路を、前記処理釜の複数の導入箇所に水蒸気導入を行うように配設し、該複数の導入箇所の少なくとも一つを前記処理釜の前記排出口とし、前記排出口における前記被処理物を前記処理釜内に押し戻すようにできる。こうすれば、高温高圧下での水熱処理の最中に、被処理物が排出口を塞いで固化してしまうことや、排出口が塞がれてしまうことを回避できる。よって、水熱処理後の処理完了物の排出が円滑となり好ましい。   The present invention having the above-described configuration can also take the following aspects. For example, a water vapor introduction path for introducing water vapor from a water vapor generation source into the inside of the treatment kettle is disposed so as to introduce water vapor into a plurality of introduction locations of the treatment kettle, and at least one of the plurality of introduction locations. One can be used as the discharge port of the processing pot, and the object to be processed at the discharge port can be pushed back into the processing pot. If it carries out like this, it can avoid that a to-be-processed object block | closes a discharge port and solidifies in the middle of the hydrothermal treatment under high temperature / high pressure, and a discharge port is blocked. Therefore, the discharge of the processed product after the hydrothermal treatment becomes smooth and preferable.

更に、前記処理釜の周囲に中空の流体導入部を形成し、該流体導入部に導入した流体と前記処理釜との間の熱交換を可能とする熱交換釜と、前記水熱処理の終了後に前記熱交換釜に、前記処理釜に残存する残存水蒸気の温度より低温の流体を導入する流体導入手段と、前記水熱処理の終了後に前記残存水蒸気を前記処理釜から排出する水蒸気排出手段とを備えるようにもできる。こうすれば、水熱処理後の処理釜を低温の流体との熱交換により短時間の内に効率よく冷却して内部の温度低下と圧力降下を促進した上で残存水蒸気を排出できる。よって、既述した水熱処理の処理環境維持に加え、次回の被処理物の水熱処理までの短縮化、延いては処理効率向上を図ることができる。   Furthermore, a hollow fluid introduction part is formed around the treatment kettle, a heat exchange kettle that enables heat exchange between the fluid introduced into the fluid introduction part and the treatment kettle, and after the hydrothermal treatment is finished Fluid introduction means for introducing a fluid having a temperature lower than the temperature of residual water vapor remaining in the treatment kettle to the heat exchange pot, and water vapor discharge means for discharging the residual water vapor from the treatment kettle after completion of the hydrothermal treatment. You can also In this way, the steam after the hydrothermal treatment can be efficiently cooled within a short time by heat exchange with a low-temperature fluid to promote the temperature drop and pressure drop inside, and the remaining water vapor can be discharged. Therefore, in addition to the above-described maintenance of the hydrothermal treatment environment, it is possible to shorten the time until the next hydrothermal treatment of the object to be processed, and to improve the treatment efficiency.

このように熱交換釜と当該釜への低温流体導入は、水熱処理の処理環境維持とは独立して構成でき、こうすれば、次回の被処理物の水熱処理までの短縮化、延いては処理効率向上を図ることができる。   In this way, introduction of the low-temperature fluid into the heat exchange kettle and the kettle can be configured independently of maintaining the treatment environment of the hydrothermal treatment, and in this way, shortening until the next hydrothermal treatment of the workpiece, The processing efficiency can be improved.

熱交換釜と低温流体導入を図る上では、熱交換釜への低温流体の導入に際して、流体温度を前記残存水蒸気の温度から徐々に低下させつつ流体を導入するようにすることもできる。こうすれば、熱交換対象となる処理釜の急激な温度変化(温度低下)を抑制できるので、処理釜の耐久性確保の上から好ましい。   In introducing the low-temperature fluid into the heat exchange kettle, when introducing the low-temperature fluid into the heat exchange kettle, the fluid can be introduced while gradually lowering the fluid temperature from the temperature of the residual water vapor. If it carries out like this, since the rapid temperature change (temperature fall) of the processing pot used as heat exchange object can be suppressed, it is preferable from ensuring durability of a processing pot.

また、熱交換釜への低温流体導入を行うことに加え、次回の前記被処理物の水熱処理に際して、前記熱交換釜に導入済みの前記低温の流体の排出を行った後、前記水蒸気生成源の生成した水蒸気を前記熱交換釜に導入するようにすることもできる。こうすれば、次回の水熱処理では、熱交換釜に導入した水蒸気との熱交換によっても処理釜を昇温できるので、次回の水熱処理の環境維持に対して寄与できる。   Further, in addition to introducing the low-temperature fluid into the heat exchange kettle, in the next hydrothermal treatment of the object to be treated, after discharging the low-temperature fluid already introduced into the heat exchange kettle, the steam generation source It is also possible to introduce the generated water vapor into the heat exchange kettle. In this way, in the next hydrothermal treatment, the temperature of the treatment kettle can be raised also by heat exchange with water vapor introduced into the heat exchange kettle, which can contribute to maintaining the environment of the next hydrothermal treatment.

以上説明した本発明の水熱処理は、例えば、処理釜内での処理環境を、約2MPa程度の高圧下で約200℃の高温環境とすることが望ましい。このような高温高圧環境とすれば、プラスチック含有残飯と一般廃棄物が混合した被処理物をも水熱処理でき、環境保全、資源循環の点からも好ましい。そして、上記した本発明によれば、約2MPa/約200℃という高温高圧下での水熱処理に際しての処理環境維持、生産効率向上に寄与できる。   In the hydrothermal treatment of the present invention described above, for example, it is desirable that the treatment environment in the treatment vessel is a high temperature environment of about 200 ° C. under a high pressure of about 2 MPa. Such a high-temperature and high-pressure environment is preferable from the viewpoints of environmental protection and resource circulation, because it is possible to hydrotreat the processed material in which the plastic-containing residual rice and the general waste are mixed. And according to this invention mentioned above, it can contribute to the processing environment maintenance at the time of the hydrothermal treatment under the high temperature high pressure of about 2 MPa / about 200 degreeC, and improvement of production efficiency.

次に、本発明の実施の形態を実施例に基づき説明する。図1は本発明の実施例である水熱処理装置100の概略構成を示すブロック図である。   Next, embodiments of the present invention will be described based on examples. FIG. 1 is a block diagram showing a schematic configuration of a hydrothermal treatment apparatus 100 according to an embodiment of the present invention.

図示するように、本実施例の水熱処理装置100は、処理釜110と、ボイラ120と、蒸気過熱ヒータ130と、コンプレッサ135と、熱交換釜140と、冷却装置150と、廃棄物投入ホッパ160と、制御装置170とを備える。処理釜110は、本実施例における被処理物たる食品残渣等の一般廃棄物やプラスチック含有残飯を処理するための中空の処理釜であり、耐圧性と耐温性を備えた鋼製の或いはステンレス製の釜である。そして、この処理釜110は、釜の上下に被処理物の投入口111と排出口112を備え、釜内部には複数の攪拌羽根113を回転自在に備えている。投入口111は、制御装置170の制御を受けて駆動する開口開閉機器114により開閉し、被処理物の投入時において開口し、次回の被処理物投入時まで閉鎖状態とされる。排出口112は、制御装置170の制御を受けて駆動する開口開閉機器115により開閉し、被処理物の処理(水熱処理)完了時において開口し、水熱処理の間に亘って閉鎖状態とされる。排出口112から排出された処理完了物、即ち後述する堆肥、飼料、燃料等は、図示しない搬送装置にて外部に搬送される。   As shown in the figure, the hydrothermal treatment apparatus 100 of this embodiment includes a treatment kettle 110, a boiler 120, a steam superheater 130, a compressor 135, a heat exchange kettle 140, a cooling device 150, and a waste charging hopper 160. And a control device 170. The processing pot 110 is a hollow processing pot for processing general waste such as food residue and plastic-containing leftover as a processing object in this embodiment, and is made of steel or stainless steel having pressure resistance and temperature resistance. It is a made kettle. And this processing pot 110 is equipped with the input port 111 and the discharge port 112 of a to-be-processed object in the upper and lower sides of a pot, and is equipped with the some stirring blade 113 inside the pot rotatably. The insertion port 111 is opened and closed by an opening / closing device 114 that is driven under the control of the control device 170, opens when the workpiece is charged, and is closed until the next loading of the workpiece. The discharge port 112 is opened and closed by an opening / closing device 115 that is driven under the control of the control device 170, opens when the processing of the object to be processed (hydrothermal treatment) is completed, and is closed during the hydrothermal treatment. . Processed products discharged from the discharge port 112, that is, compost, feed, fuel, and the like, which will be described later, are transported to the outside by a transport device (not shown).

攪拌羽根113は、処理釜110の外部のモータ116の回転に伴って処理釜110の内部にて回転し、処理釜110の内部に投入済みの被処理物を攪拌する。後述するように、処理釜110の内部は、高温高圧の水蒸気が導入されて水蒸気で充満されていることから、攪拌羽根113は、回転して被処理物を攪拌することで、被処理物を満遍なく水蒸気に接触させつつ、被処理物へのより一律な熱の伝搬を図る。   The stirring blade 113 rotates inside the processing pot 110 as the motor 116 outside the processing pot 110 rotates, and stirs the object to be processed that has been put into the processing pot 110. As will be described later, since the inside of the processing pot 110 is filled with water vapor at a high temperature and high pressure, the stirring blade 113 rotates to stir the object to be processed. A uniform heat transfer to the object to be processed while uniformly contacting the water vapor.

処理釜110には、内部の温度を検出する釜温度センサ200と、内部の圧力を検出する釜圧力センサ201が装着され、これらのセンサは制御装置170に検出信号を出力する。制御装置170は、これらセンサからの出力信号を受けて、ボイラ120や蒸気過熱ヒータ130等を駆動制御する。こうした機器制御の様子については後述する。   The processing pot 110 is equipped with a pot temperature sensor 200 for detecting the internal temperature and a pot pressure sensor 201 for detecting the internal pressure, and these sensors output detection signals to the control device 170. The control device 170 receives the output signals from these sensors, and drives and controls the boiler 120, the steam superheater 130, and the like. The state of such device control will be described later.

ボイラ120は、制御装置170からの制御信号を受けて図示しない熱源にて水蒸気を生成し、その下流の蒸気過熱ヒータ130、延いては処理釜110に水蒸気を圧送する。水蒸気は、ボイラ120から処理釜110にかけて配設された水蒸気導入管180を経て、処理釜110に導入される。水蒸気導入管180は、複数管路に分岐して処理釜110に配管形成されており、処理釜110における複数箇所の噴出孔から処理釜内に水蒸気を噴出する。こうした水蒸気噴出により、水蒸気が処理釜110の内部に導入される。水蒸気導入管180から分岐した分岐水蒸気導入管181は、処理釜110の排出口112に設置された噴出孔182に配管され、この噴出孔182から水蒸気を処理釜110の内部に噴出する。噴出孔182は、排出口112において処理釜110の内部を指向して配設されているので、具体的には釜下方位置の排出口112において上向きに指向して配置されているので、噴出孔182から噴出された水蒸気は、排出口112排出口における被処理物を処理釜110の内部に押し戻す。   The boiler 120 receives a control signal from the control device 170, generates steam with a heat source (not shown), and pumps the steam to the steam superheater 130 on the downstream side, and further to the treatment kettle 110. The steam is introduced into the processing kettle 110 through the steam introducing pipe 180 disposed from the boiler 120 to the processing kettle 110. The steam introduction pipe 180 is branched into a plurality of pipes and formed in the treatment tank 110, and water vapor is ejected into the treatment tank from a plurality of ejection holes in the treatment tank 110. By such water vapor ejection, water vapor is introduced into the processing kettle 110. A branched water vapor introduction pipe 181 branched from the water vapor introduction pipe 180 is piped to an ejection hole 182 installed at the discharge port 112 of the processing tank 110, and water vapor is ejected from the ejection hole 182 into the processing tank 110. Since the ejection hole 182 is disposed so as to face the inside of the processing hook 110 at the discharge port 112, specifically, the ejection hole 182 is directed upward at the discharge port 112 at a position below the pot. The water vapor ejected from 182 pushes the object to be processed at the outlet 112 to the inside of the processing pot 110.

図1においては、水蒸気導入管180の分岐形態を省略したが、水蒸気導入管180からは複数の分岐水蒸気導入管180a、180b、180c等が分岐している。よって、処理釜110の内部は、複数の分岐水蒸気導入管のそれぞれに対応する噴出孔から同時に噴出された水蒸気により、速やかに、且つくまなく充満されることになる。こうした水蒸気の導入・充満は、ボイラ120による水蒸気圧送によって起こり、本実施例では、処理釜110の内部の圧力が約2MPaとなるようにした。   In FIG. 1, the branching form of the water vapor introduction pipe 180 is omitted, but a plurality of branch water vapor introduction pipes 180 a, 180 b, 180 c, etc. are branched from the water vapor introduction pipe 180. Therefore, the inside of the processing pot 110 is quickly and completely filled with the water vapor simultaneously ejected from the ejection holes corresponding to each of the plurality of branch water vapor introduction pipes. Such introduction and filling of water vapor is caused by water vapor pumping by the boiler 120, and in this embodiment, the pressure inside the treatment tank 110 is set to about 2 MPa.

上記したように水蒸気の導入を受ける処理釜110は、2系統の水蒸気排出系を有する。一つの排出系は、水蒸気放出管193と当該管路のバルブ194とサイレンサ195を備える排出系であり、処理釜110から水蒸気を直接大気に放出する。この排出系が、水熱処理の終了後に処理釜110に残存している水蒸気(残存水蒸気)を処理釜110から排出する水蒸気排出手段に該当する。   As described above, the treatment kettle 110 that receives the introduction of water vapor has two water vapor discharge systems. One discharge system is a discharge system including a water vapor discharge pipe 193, a valve 194 of the pipe line, and a silencer 195, and discharges water vapor directly from the processing tank 110 to the atmosphere. This discharge system corresponds to the water vapor discharge means for discharging the water vapor (residual water vapor) remaining in the treatment kettle 110 after the hydrothermal treatment is finished.

他方の排出系は、水熱処理の終了時点で処理釜110の内部に残存する水蒸気(残存水蒸気)を次回の水熱処理に供される被処理物に噴射して当該被処理物を水熱処理に先だって昇温させるためのものであり、処理釜110から廃棄物投入ホッパ160まで配管された水蒸気還流管196と、当該管路のバルブ197とアキュムレータ198とアキュムレータ下流のバルブ199とを備える。バルブ197は、中空の容器であり、バルブ197の管路開放、バルブ199の管路閉鎖の期間において処理釜110の残存水蒸気を蓄え、この蓄えた残存水蒸気を、バルブ197の管路閉鎖、バルブ199の管路開放の期間において廃棄物投入ホッパ160の被処理物(次回処理用の被処理物)に噴射する。これにより、次回処理被処理物は水処理に先だって昇温することから、水蒸気還流管196はアキュムレータ198と協働して本発明の昇温機構を構成し、本発明の維持手段の一つに該当する。   The other exhaust system injects the water vapor (residual water vapor) remaining in the treatment tank 110 at the end of the hydrothermal treatment to the treatment object to be subjected to the next hydrothermal treatment, and the treatment object is subjected to the hydrothermal treatment. A steam reflux pipe 196 piped from the treatment kettle 110 to the waste charging hopper 160, a valve 197 for the pipe line, an accumulator 198, and a valve 199 downstream of the accumulator are provided for raising the temperature. The valve 197 is a hollow container, stores the residual water vapor in the processing tank 110 during the period when the pipe line of the valve 197 is opened and the pipe line of the valve 199 is closed. In the period of 199 opening of the pipe line, the waste is injected into the object to be processed (object to be processed for the next processing) of the hopper 160. As a result, the temperature of the object to be processed next time is increased prior to the water treatment, so that the water vapor reflux pipe 196 cooperates with the accumulator 198 to constitute the temperature increasing mechanism of the present invention, and is one of the maintaining means of the present invention. Applicable.

蒸気過熱ヒータ130は、ボイラ120の下流側において水蒸気導入管180を取り囲んで配設され、図示しないヒータの熱を水蒸気導入管180を通過する水蒸気に与えて当該水蒸気を加熱した上で、その下流の処理釜110の側に加熱済み水蒸気を送り出す。よって、この蒸気過熱ヒータ130は、処理釜110の内部を高温水蒸気の熱で高温環境とするものであることから、本発明の水蒸気加熱機構に該当し、本発明の維持手段の一つに該当する。本実施例では、蒸気過熱ヒータ130による加熱により、約200℃まで昇温させた水蒸気が処理釜110に圧送されるようにした。このため、処理釜110は、高温高圧の水蒸気導入を受けて、圧力が約2MPaで温度が約200℃の高温高圧環境下とされ、当該環境下において攪拌羽根113により被処理物を攪拌しつつ、水熱処理を行う。   The steam superheater 130 is disposed on the downstream side of the boiler 120 so as to surround the steam introduction pipe 180, heats the heater (not shown) to the steam that passes through the steam introduction pipe 180, and heats the steam. Heated water vapor is sent out to the processing pot 110 side. Therefore, since the steam superheater 130 is for making the inside of the processing pot 110 into a high temperature environment by the heat of high temperature steam, it corresponds to the steam heating mechanism of the present invention and corresponds to one of the maintenance means of the present invention. To do. In this embodiment, the steam heated up to about 200 ° C. by heating with the steam superheater 130 is pumped to the treatment kettle 110. For this reason, the treatment kettle 110 is brought into a high-temperature and high-pressure environment having a pressure of about 2 MPa and a temperature of about 200 ° C. upon receiving the introduction of high-temperature and high-pressure steam. Hydrothermal treatment is performed.

水蒸気導入管180は、蒸気過熱ヒータ130により加熱を受ける領域において管路を蛇行して備えるので、蒸気過熱ヒータ130による加熱は、水蒸気導入管180の蛇行により経路が長い範囲で行われる。よって、蒸気過熱ヒータ130による水蒸気の加熱効率を高めることができる。   Since the steam introduction pipe 180 is provided with a meandering pipe line in a region that is heated by the steam superheater 130, heating by the steam superheater 130 is performed in a range where the path is long due to meandering of the steam introduction pipe 180. Therefore, the steam heating efficiency by the steam superheater 130 can be increased.

上記した水蒸気導入管180の開閉は、制御装置170からの駆動信号を受けて駆動するバルブ183や噴出孔近傍のバルブ184によりなされる。分岐水蒸気導入管180a〜180c等においてもそれぞれの管路における噴出孔近傍の図示しないバルブにて開閉される。この場合、分岐水蒸気導入管181については、既述した水蒸気噴出による被処理物の押し戻し機能を担う都合上、最上流のバルブ183によってのみ開閉される。つまり、分岐水蒸気導入管181以外の分岐水蒸気導入管180a等にあってはこれら管路を閉鎖した状態で、分岐水蒸気導入管181からのみ水蒸気噴出ができるように構成されている。この分岐水蒸気導入管181からのみの水蒸気噴出については後述する。   The above-described opening and closing of the water vapor introduction pipe 180 is performed by a valve 183 that is driven by receiving a drive signal from the control device 170 and a valve 184 in the vicinity of the ejection hole. The branch steam introduction pipes 180a to 180c and the like are also opened and closed by a valve (not shown) in the vicinity of the ejection hole in each pipe line. In this case, the branch water vapor introducing pipe 181 is opened and closed only by the most upstream valve 183 for the purpose of taking the function of pushing back the object to be processed by the water vapor ejection described above. In other words, the branch steam introduction pipe 180a other than the branch steam introduction pipe 181 is configured so that steam can be ejected only from the branch steam introduction pipe 181 with these pipes closed. The steam jet only from the branched steam inlet pipe 181 will be described later.

上記した水蒸気導入管180には通過する水蒸気の圧力を検出するセンサ190が、ボイラ120や蒸気過熱ヒータ130には通過する水蒸気の温度を検出するセンサ191〜192が装着されている。これらセンサの検出信号は、制御装置170に出力されて、制御装置170によるボイラ120や蒸気過熱ヒータ130等を制御に用いられる。また、水蒸気導入管180や分岐水蒸気導入管181等の各分岐水蒸気導入管180a〜180c等には、水蒸気の逆流を防止する図示しない逆流弁の他、圧力の過剰上昇時に減圧した上でガス排出を行う図示しない排出弁が適宜設置されている。   A sensor 190 for detecting the pressure of water vapor passing therethrough is mounted on the water vapor introducing pipe 180, and sensors 191 to 192 for detecting the temperature of water vapor passing therethrough are mounted on the boiler 120 and the steam superheater 130. Detection signals of these sensors are output to the control device 170, and are used for controlling the boiler 120, the steam superheater 130, and the like by the control device 170. Further, in each of the branch steam inlet pipes 180a to 180c, such as the steam inlet pipe 180, the branch steam inlet pipe 181 and the like, in addition to a backflow valve (not shown) for preventing the backflow of water vapor, the gas is discharged after being decompressed when the pressure rises excessively. A discharge valve (not shown) for performing is appropriately installed.

また、分岐水蒸気導入管181からは、更に分岐水蒸気導入管185が分岐され、この分岐水蒸気導入管185は、バルブ186、減圧機器ユニット187を経て、減圧水蒸気を後述の熱交換釜140の内部に導入する。この導入タイミングについては後述する。   Further, a branch steam introduction pipe 185 is further branched from the branch steam introduction pipe 181, and this branch steam introduction pipe 185 passes the valve 186 and the decompression equipment unit 187, and the decompression steam is introduced into the heat exchange kettle 140 described later. Introduce. This introduction timing will be described later.

コンプレッサ135は、バルブ136を経て処理釜110と接続されており、ほぼ約2MPaの高圧エアーを処理釜110の内部に導入する。この高圧エアーの導入は、後述するように、処理釜110での水熱処理に先だって行われ処理環境維持のためになされることから、コンプレッサ135は、本発明の加圧エアー導入機構に該当し、本発明の維持手段の一つに該当する。   The compressor 135 is connected to the processing kettle 110 through a valve 136, and introduces approximately 2 MPa of high-pressure air into the processing kettle 110. As will be described later, the introduction of the high-pressure air is performed prior to the hydrothermal treatment in the treatment tank 110 and is performed for maintaining the treatment environment. Therefore, the compressor 135 corresponds to the pressurized air introduction mechanism of the present invention, This corresponds to one of the maintenance means of the present invention.

熱交換釜140は、処理釜110の胴体部周囲を取り囲むよう中空とされた流体導入部141を備える。この流体導入部141は、密閉状であり処理釜110の導体側壁と接触していることから、流体導入部141に導入された流体と処理釜110との間の熱交換を可能とする。流体導入部141に導入される流体は、本実施例では後述するように冷却水と水蒸気である。つまり、熱交換釜140は、流体導入部141からの流体排出路として、冷却水排出管142と水蒸気排出管143を備え、制御装置170により駆動制御される各管路のバルブ144〜145により、流体導入部141における冷却水排出、水蒸気排出を行う。熱交換釜140の流体導入部141への冷却水導入は後述する冷却装置150から行われ、水蒸気導入は既述した分岐水蒸気導入管185を経て行われる。冷却水・水蒸気の導入・排出タイミングについては、後述する。なお、水蒸気排出管143は、図において下方に描画されているが、冷却水の導入・排出に支障がないよう、実際は流体導入部141の上部に設置されている。   The heat exchange pot 140 includes a fluid introduction part 141 that is hollow so as to surround the periphery of the body part of the processing pot 110. Since the fluid introduction part 141 is hermetically sealed and is in contact with the conductor side wall of the processing pot 110, heat exchange between the fluid introduced into the fluid introduction part 141 and the processing pot 110 is enabled. In the present embodiment, the fluid introduced into the fluid introduction part 141 is cooling water and water vapor as will be described later. That is, the heat exchanging pot 140 includes a cooling water discharge pipe 142 and a water vapor discharge pipe 143 as a fluid discharge path from the fluid introduction part 141, and valves 144 to 145 of the respective pipe lines driven and controlled by the control device 170 Cooling water discharge and water vapor discharge are performed in the fluid introduction part 141. Cooling water is introduced into the fluid introduction part 141 of the heat exchange kettle 140 from a cooling device 150 described later, and water vapor is introduced through the branched water vapor introducing pipe 185 described above. The introduction / discharge timing of the cooling water / steam will be described later. In addition, although the water vapor discharge pipe 143 is drawn below in the drawing, it is actually installed at the upper part of the fluid introduction part 141 so as not to hinder the introduction and discharge of the cooling water.

冷却装置150は、第1タンク151と第2タンク152とを備え、両タンク内の冷却水を混合バルブ153にて混合し、その混合冷却水を冷却配管154とその管路のバルブ155を経て熱交換釜140の流体導入部141に導入する。この流体導入部141への冷却水導入は、処理釜110における水熱処理の終了後になされる。第2タンク152は、水蒸気導入管180から分岐した熱交換用配管188の螺旋管部をタンク内に備え、当該配管を通過する水蒸気により、タンク内の冷却水を所定温度、例えば50〜80℃程度に維持する。熱交換用配管188の分岐箇所には分流バルブ189が配設され、この分流バルブ189により定められた分流通過量で、水蒸気は熱交換用配管188を通過する。よって、冷却装置150は、混合バルブ153による混合比に応じた第1タンク151の側からの冷却水量と第2タンク152の側からの冷却水量で定まる温度の冷却水を流体導入部141に送り込むことができる。冷却装置150から流体導入部141に導入される冷却水(混合冷却水)の温度は、第2タンク152における冷却水温度(50〜80℃)が上限であり、この温度は、処理釜110に導入される水蒸気温度(約200℃)より低温である。よって、冷却装置150は、本発明の流体導入手段に該当する。   The cooling device 150 includes a first tank 151 and a second tank 152, mixes the cooling water in both tanks by a mixing valve 153, and passes the mixed cooling water through a cooling pipe 154 and a valve 155 of the pipe line. It introduces into the fluid introduction part 141 of the heat exchange pot 140. The cooling water is introduced into the fluid introduction part 141 after the hydrothermal treatment in the treatment tank 110 is completed. The second tank 152 includes a spiral pipe portion of a heat exchange pipe 188 branched from the water vapor introduction pipe 180 in the tank, and the water in the tank is cooled to a predetermined temperature, for example, 50 to 80 ° C. by the water vapor passing through the pipe. Maintain to a degree. A diversion valve 189 is disposed at a branch point of the heat exchange pipe 188, and water vapor passes through the heat exchange pipe 188 with a diversion passage amount determined by the diversion valve 189. Therefore, the cooling device 150 sends cooling water having a temperature determined by the amount of cooling water from the first tank 151 side and the amount of cooling water from the second tank 152 side according to the mixing ratio by the mixing valve 153 to the fluid introduction unit 141. be able to. The temperature of the cooling water (mixed cooling water) introduced from the cooling device 150 to the fluid introduction unit 141 is the upper limit of the cooling water temperature (50 to 80 ° C.) in the second tank 152, and this temperature is The temperature is lower than the water vapor temperature introduced (about 200 ° C.). Therefore, the cooling device 150 corresponds to the fluid introducing means of the present invention.

廃棄物投入ホッパ160は、処理釜110における水熱処理サイクルに合致したタイミングで被処理物を搬送しつつ、投入口111に投入する。制御装置170は、本実施例の水熱処理装置100の制御を統括的に行うものであり、論理演算を実行するCPUやプログラムやデータを記憶したROM、データの一時的な読み書きを可能とするRAM等を有するコンピュータで構成される。そして、制御装置170は、既述した種々のセンサからの検出信号を入力し、こうした検出信号や図示しない操作盤からの運転条件設定パラメータに応じて、バルブ183等の種々のバルブ駆動制御、ボイラ120等の機器の駆動制御を実行する。   The waste input hopper 160 inputs the object to be processed into the input port 111 while conveying the object to be processed at a timing that matches the hydrothermal treatment cycle in the processing pot 110. The control device 170 performs overall control of the hydrothermal treatment device 100 of this embodiment, and includes a CPU that executes logical operations, a ROM that stores programs and data, and a RAM that allows temporary reading and writing of data. Etc. It is comprised with the computer which has etc. The control device 170 receives detection signals from the various sensors described above, and controls various valve drive controls such as the valve 183 and the boiler according to the detection signals and operating condition setting parameters from an operation panel (not shown). Drive control of equipment such as 120 is executed.

次に、本実施例の水熱処理装置100で行う水熱処理プロセスについて説明する。図2はこの水熱処理プロセスの工程を表す工程図である。水熱処理の説明に先立ち、この水熱処理を行うために水熱処理装置100が実行する処理について説明する。   Next, a hydrothermal treatment process performed in the hydrothermal treatment apparatus 100 of the present embodiment will be described. FIG. 2 is a process diagram showing the steps of the hydrothermal treatment process. Prior to the description of the hydrothermal treatment, a process performed by the hydrothermal treatment apparatus 100 for performing the hydrothermal treatment will be described.

制御装置170は、水蒸気導入管180のセンサ190や、蒸気過熱ヒータ130のセンサ191、ボイラ120のセンサ192、処理釜110の釜温度センサ200および釜圧力センサ201の検出信号を入力し、ボイラ120の運転状態(水蒸気生成量、圧送量等)を制御しつつ、蒸気過熱ヒータ130の運転状態(加熱温度等)を制御する。これにより、水熱処理装置100は、処理釜110が安定した温度・圧力(200℃/2MPa)の水蒸気で充満されるよう、水蒸気を圧送する。この場合、処理釜110への水蒸気の導入初期においては、被処理物との接触による冷却を考慮して、上記の温度より約10℃程度高めの水蒸気を導入するようにすることもできる。   The control device 170 inputs detection signals of the sensor 190 of the steam introduction pipe 180, the sensor 191 of the steam superheater 130, the sensor 192 of the boiler 120, the pot temperature sensor 200 of the processing pot 110 and the pot pressure sensor 201, and the boiler 120. The operation state (heating temperature, etc.) of the steam superheater 130 is controlled while controlling the operation state (water vapor generation amount, pumping amount, etc.). Thereby, the hydrothermal treatment apparatus 100 pumps water vapor so that the treatment pot 110 is filled with water vapor at a stable temperature and pressure (200 ° C./2 MPa). In this case, in the initial stage of introduction of water vapor into the treatment kettle 110, it is possible to introduce water vapor about 10 ° C. higher than the above temperature in consideration of cooling due to contact with the object to be treated.

また、制御装置170は、冷却装置150における第2タンク152の温度制御を行う。つまり、水蒸気導入管180に設けた分流バルブ189のバルブ開度調整を行い、第2タンク152の冷却水温度を、既述した50〜80℃の所定の温度、例えば80℃に調整する。この温度調整に際しては、第2タンク152に設けた図示しない温度センサの検出信号を用いる。第2タンク152のタンク容量は、処理釜110の胴回りの熱交換釜140、詳しくはその流体導入部141を満たすに足りる容量であることから、処理釜110の内容積(本実施例では、約10m3 )に比して十分に小さく、0.5m3 程度である。しかも、調整温度は50〜80℃と、処理釜110に導入する水蒸気温度(約200℃)に比して低温であることから、第2タンク152の冷却水温度調整のために分流バルブ189から熱交換用配管188に分流させる水蒸気量も少量である。よって、上記したように水蒸気を分流させても、水蒸気導入による処理釜110の昇温には影響がない。 In addition, the control device 170 controls the temperature of the second tank 152 in the cooling device 150. That is, the opening degree of the diversion valve 189 provided in the water vapor introduction pipe 180 is adjusted, and the cooling water temperature of the second tank 152 is adjusted to the above-described predetermined temperature of 50 to 80 ° C., for example, 80 ° C. In this temperature adjustment, a detection signal of a temperature sensor (not shown) provided in the second tank 152 is used. The tank capacity of the second tank 152 is a capacity sufficient to fill the heat exchange pot 140 around the trunk of the processing pot 110, more specifically, the fluid introducing portion 141. Therefore, the internal volume of the processing pot 110 (in this embodiment, about 10 m 3 ), which is sufficiently smaller than 0.5 m 3 . Moreover, since the adjustment temperature is 50 to 80 ° C., which is lower than the water vapor temperature (about 200 ° C.) introduced into the processing tank 110, the diverter valve 189 adjusts the cooling water temperature of the second tank 152. The amount of water vapor diverted to the heat exchange pipe 188 is also small. Therefore, even if the water vapor is divided as described above, there is no influence on the temperature rise of the processing pot 110 due to the introduction of the water vapor.

水熱処理装置100は、制御装置170にて上記した機器制御を実行しつつ、図2の水熱処理を行う。この水熱処理プロセスでは、まず、被処理物を廃棄物投入ホッパ160に投入する(ステップS100)。被処理物の導入に続き、制御装置170は、廃棄物投入ホッパ160は、投入された被処理物を攪拌しつつ投入口111まで搬送すると共に、この被処理物に、アキュムレータ198に蓄積済みの水蒸気を噴霧して被処理物の昇温を図る(ステップS110)。アキュムレータ198は、水熱処理完了後の後述のステップ150にて高温状態のままの水蒸気を蓄積するので、制御装置170によるバルブ199の開弁制御により、アキュムレータ198内の高温水蒸気を噴霧して被処理物の昇温を図るのである。水蒸気は、アキュムレータ198での蓄積の間に温度低下を起こすが、次回の水熱処理までの期間では降温程度も少ないため、被処理物の昇温には差し支えない。   The hydrothermal treatment apparatus 100 performs the hydrothermal treatment of FIG. 2 while executing the above-described device control by the control apparatus 170. In this hydrothermal treatment process, first, an object to be treated is introduced into the waste input hopper 160 (step S100). Following the introduction of the object to be processed, the control device 170 causes the waste input hopper 160 to carry the input object to be processed to the input port 111 while stirring and to store the object to be processed in the accumulator 198. Water vapor is sprayed to increase the temperature of the object to be processed (step S110). The accumulator 198 accumulates steam in a high temperature state in step 150 to be described later after completion of the hydrothermal treatment, so that the high temperature steam in the accumulator 198 is sprayed by the valve opening control of the valve 199 by the control device 170. This is to increase the temperature of the object. Although the temperature of the water vapor decreases during the accumulation in the accumulator 198, the temperature of the object to be processed is not increased because the temperature decreases little during the period until the next hydrothermal treatment.

ステップS110に続き、制御装置170は、投入口111を開口開閉機器114により開放し、この投入口111に廃棄物投入ホッパ160から被処理物を昇温状態のまま投入する(ステップS120)。続いて、制御装置170は、投入口111を閉鎖した後、所定時間に亘ってバルブ136を開弁制御し、この間において、コンプレッサ135から処理釜110に圧縮エアーを導入する(ステップS130)。この圧縮エアー導入により、次に行う水蒸気導入による処理釜110の高圧化を促進させる。   Subsequent to step S110, the control device 170 opens the input port 111 with the opening / closing device 114, and inputs an object to be processed from the waste input hopper 160 into the input port 111 in a temperature-rising state (step S120). Subsequently, the control device 170 closes the input port 111 and then controls to open the valve 136 for a predetermined time, and during this time, compressed air is introduced from the compressor 135 to the processing hook 110 (step S130). By introducing this compressed air, the pressure increase of the processing kettle 110 by the subsequent introduction of water vapor is promoted.

続いて、制御装置170は、水蒸気導入管180の最上流のバルブ183と、分岐水蒸気導入管180a〜180c等のそれぞれのバルブを開弁制御し、処理釜110に、ボイラ120で生成し蒸気過熱ヒータ130で高温化した高温高圧(200℃/2MPa)の水蒸気を導入すると共に、処理釜内の攪拌羽根113をモータ116にて回転させ投入済みの被処理物を攪拌する(ステップS140)。こうした高温高圧の水蒸気導入により、処理釜110の内部では、投入済みの被処理物が高温高圧の水蒸気に触れ、水蒸気の持つ熱が被処理物の水熱処理に処される状態となる。そして、攪拌羽根113による被処理物攪拌により、投入済みの被処理物を満遍なく高温高圧の水蒸気に接触させつつ、被処理物へのより一律な熱の伝搬を図り、水熱処理を進行させる。なお、攪拌羽根113による被処理物攪拌は、ステップS130の圧縮エアー導入と並行して行うようにすることもできる。   Subsequently, the control device 170 controls the opening of the uppermost valve 183 of the water vapor introduction pipe 180 and the respective valves such as the branch water vapor introduction pipes 180a to 180c, and the steam generated by the boiler 120 in the treatment tank 110 is steam overheated. High-temperature and high-pressure (200 ° C./2 MPa) water vapor that has been heated by the heater 130 is introduced, and the stirring blade 113 in the processing pot is rotated by the motor 116 to stir the already-treated workpiece (step S140). By introducing such high-temperature and high-pressure steam, inside the treatment tank 110, the already-treated workpiece comes into contact with the high-temperature and high-pressure steam, and the heat of the steam is subjected to the hydrothermal treatment of the workpiece. Then, by stirring the object to be processed by the stirring blade 113, the already-processed object is uniformly brought into contact with the high-temperature and high-pressure steam, and more uniform heat is transmitted to the object to be processed, so that the hydrothermal treatment is advanced. It should be noted that the processing object stirring by the stirring blade 113 may be performed in parallel with the introduction of compressed air in step S130.

水蒸気導入管180と分岐水蒸気導入管180a〜180c等を介した高温高圧の水蒸気導入は、被処理物の水熱処理の間に亘って継続される。そして、排出口112では、分岐水蒸気導入管181を経て釜内の噴出孔182からの水蒸気導入が継続して行われている。よって、水熱処理の間において、排出口112では噴出孔182からの水蒸気導入により被処理物が釜内に押し戻されることから、排出口112の不用意な閉塞を招かないようにできる。   High-temperature and high-pressure steam introduction through the steam introduction pipe 180, the branched steam introduction pipes 180a to 180c, etc. is continued during the hydrothermal treatment of the workpiece. At the discharge port 112, the water vapor is continuously introduced from the outlet hole 182 in the kettle through the branched water vapor introduction pipe 181. Therefore, during the hydrothermal treatment, the object to be processed is pushed back into the kettle by introducing water vapor from the ejection hole 182 at the discharge port 112, so that the discharge port 112 can be prevented from being inadvertently blocked.

水熱処理装置100の制御装置170は、高温高圧の水蒸気による被処理物の水熱処理を所定時間に亘って実行した後、バルブ183の閉弁制御、モータ116の停止制御を行って水熱処理を終了させる。そうすると、制御装置170は、水蒸気還流管196のバルブ197の開弁制御、バルブ199の閉弁制御を実行して、処理釜110における残存水蒸気をアキュムレータ198に導き、このアキュムレータ198に高温のままの水蒸気を蓄積する(ステップS150)。この水蒸気蓄積は、バルブ197の閉弁により終了する。こうして蓄積された水蒸気は、ステップS110にて既述したように被処理物昇温に用いられる。なお、アキュムレータ198の内容積は、処理釜110の内容積(約10m3 )に比して小さいことから、アキュムレータ198への水蒸気蓄積後にあっても、処理釜110には依然として水蒸気が残存している。 The controller 170 of the hydrothermal treatment apparatus 100 performs hydrothermal treatment of the object to be treated with high-temperature and high-pressure steam for a predetermined time, and then performs valve closing control of the valve 183 and stop control of the motor 116 to finish the hydrothermal treatment. Let Then, the control device 170 executes the valve opening control of the valve 197 of the water vapor reflux pipe 196 and the valve closing control of the valve 199 to guide the residual water vapor in the processing tank 110 to the accumulator 198, and the accumulator 198 is kept at a high temperature. Water vapor is accumulated (step S150). This water vapor accumulation is completed when the valve 197 is closed. The water vapor thus accumulated is used to raise the temperature of the workpiece as already described in step S110. Since the internal volume of the accumulator 198 is smaller than the internal volume (about 10 m 3 ) of the processing tank 110, even after the water vapor has accumulated in the accumulator 198, water vapor still remains in the processing tank 110. Yes.

アキュムレータ198への水蒸気蓄積が完了すると、制御装置170は、冷却装置150から熱交換釜140の流体導入部141に冷却水を導入する(ステップS160)。この冷却水導入は次のように行う。   When the accumulation of water vapor in the accumulator 198 is completed, the control device 170 introduces cooling water from the cooling device 150 to the fluid introducing portion 141 of the heat exchange kettle 140 (step S160). This cooling water introduction is performed as follows.

まず、冷却水排出管142のバルブ144を閉弁制御して、流体導入部141を冷却水で満たす。それ以降は、排出側のバルブ144と導入側のバルブ155を開弁制御して、冷却装置150の冷却水を流体導入部141に循環供給する。図3は冷却水の循環供給の様子を説明する説明図である。   First, the valve 144 of the cooling water discharge pipe 142 is controlled to be closed, and the fluid introduction part 141 is filled with cooling water. Thereafter, the valve 144 on the discharge side and the valve 155 on the introduction side are controlled to open, and the cooling water of the cooling device 150 is circulated and supplied to the fluid introduction unit 141. FIG. 3 is an explanatory view for explaining the circulation and supply of cooling water.

この図3に示すように、制御装置170は、冷却水導入当初の期間では、混合バルブ153による流量比を、第2タンク152の側を100%、第1タンク151の側を0%とし、その後、第2タンク152については流量を低減し、第1タンク151については流量を増大させる。そして、冷却水導入の終期においては、第2タンク152の側を0%、第1タンク151の側を100%とする。よって、流体導入部141に循環供給される冷却水の温度は、冷却水導入当初の期間では、第2タンク152の冷却水温度(約80℃)となり、その後は、徐々に低下し、冷却水導入の終期では、第1タンク151の冷却水温(常温)となる。こうした冷却水循環がなされることから、熱交換釜140、詳しくは流体導入部141は、処理釜110との間で熱交換(冷却)を行うに当たり、当初は、処理釜110の内部温度との差が小さい温度で冷却しつつ、徐々により低い温度の冷却水で冷却する。この冷却は、処理釜110の内部の環境が約100℃程度になるまで継続することが望ましい。   As shown in FIG. 3, the control device 170 sets the flow rate ratio by the mixing valve 153 to 100% on the second tank 152 side and 0% on the first tank 151 side during the initial period of introduction of the cooling water, Thereafter, the flow rate of the second tank 152 is reduced, and the flow rate of the first tank 151 is increased. In the final stage of the introduction of the cooling water, the second tank 152 side is set to 0%, and the first tank 151 side is set to 100%. Therefore, the temperature of the cooling water circulated and supplied to the fluid introduction unit 141 becomes the cooling water temperature (about 80 ° C.) of the second tank 152 in the initial period of the introduction of the cooling water, and thereafter gradually decreases, and the cooling water At the end of the introduction, the cooling water temperature (normal temperature) of the first tank 151 is reached. Since such cooling water circulation is performed, the heat exchange kettle 140, specifically, the fluid introduction part 141, performs a heat exchange (cooling) with the treatment kettle 110, and initially the difference from the internal temperature of the treatment kettle 110. While cooling at a low temperature, gradually cool with cooling water at a lower temperature. This cooling is preferably continued until the environment inside the processing pot 110 reaches about 100 ° C.

こうした処理釜110の冷却に続いては、水蒸気放出管193のバルブ194を開弁制御して、冷却完了時点で残存している水蒸気を総て大気に放出するステップS170)。この水蒸気放出は、上記したように温度・圧力とも低下した状態で行われることになる。   Subsequent to the cooling of the treatment tank 110, the valve 194 of the water vapor discharge pipe 193 is controlled to open, and all the water vapor remaining at the completion of the cooling is released to the atmosphere (step S170). This water vapor release is performed in a state where both the temperature and the pressure are lowered as described above.

続いて、制御装置170は、開口開閉機器115を駆動して排出口112を開放し、処理完了物(堆肥、飼料、燃料)を処理釜110から排出する(ステップS180)。処理完了物が排出されると、制御装置170は、排出口112を閉鎖して次回の水熱処理に備える。なお、排出された処理完了物は、図示しないベルトコンベヤ等にて搬送される。   Subsequently, the control device 170 drives the opening / closing device 115 to open the discharge port 112, and discharges the processed product (compost, feed, fuel) from the processing pot 110 (step S180). When the processed product is discharged, the controller 170 closes the discharge port 112 to prepare for the next hydrothermal treatment. The discharged processed product is conveyed by a belt conveyor (not shown).

制御装置170は、ステップS170による残存水蒸気の大気放出が終わると、上記の処理完了物の排出と並行して次回の水熱処理に備えて処理釜110の昇温に取りかかる。即ち、制御装置170は、処理釜110の冷却のために熱交換釜140(詳しくは、流体導入部141)に導入していた冷却水を、冷却水排出管142のバルブ144を開弁制御することで冷却装置150の第1タンク151と第2タンク152に回収する(ステップS190)。次いで、バルブ144を閉弁制御して流体導入部141を密閉状とした上で、流体導入部141に分岐水蒸気導入管185を経て水蒸気を導入し(ステップS200)、処理釜110をその胴回り周囲の流体導入部141により昇温させる。なお、こうして導入された水蒸気は、既述したステップS160における冷却水導入に際して、流体導入部141の水蒸気排出管143から大気放出されるので、冷却水導入に支障はない。   When the residual steam is released into the atmosphere in step S170, the control device 170 starts to raise the temperature of the processing kettle 110 in preparation for the next hydrothermal treatment in parallel with the discharge of the processed material. That is, the control device 170 controls to open the valve 144 of the cooling water discharge pipe 142 with the cooling water introduced into the heat exchange pot 140 (specifically, the fluid introduction part 141) for cooling the processing pot 110. Thereby, it collect | recovers to the 1st tank 151 and the 2nd tank 152 of the cooling device 150 (step S190). Next, the valve 144 is controlled to be closed so that the fluid introduction part 141 is hermetically sealed, and then the steam is introduced into the fluid introduction part 141 via the branch steam introduction pipe 185 (step S200), and the treatment kettle 110 is surrounded by its circumference. The temperature is raised by the fluid introduction part 141. The introduced water vapor is released into the atmosphere from the water vapor discharge pipe 143 of the fluid introduction part 141 when the cooling water is introduced in step S160 described above, so that there is no problem in introducing the cooling water.

以上説明した本実施例の水熱処理装置100では、約200℃/2MPaと言う高温高圧の水蒸気の水成分と水蒸気の熱にて被処理物を処理釜110にて水熱処理するに際し、処理釜110にその投入口111から被処理物を投入し、この処理釜110の内部には、水蒸気導入管180や分岐水蒸気導入管180a〜180c等を経て上記高温高圧の水蒸気をボイラ120および蒸気過熱ヒータ130から圧送する。こうした水蒸気圧送により、処理釜110の内部を、投入済みの被処理物が圧送された高温高圧の水蒸気に触れ、水蒸気の持つ熱が被処理物の水熱処理に処される状態とする。そして、投入済みの被処理物を上記高温高圧の水蒸気が導入済みの処理釜110内で攪拌羽根113により攪拌することで、被処理物を満遍なく水蒸気に接触させつつ、被処理物へのより一律な熱の伝搬を図りつつ、水蒸気の水成分とその熱による水熱処理を進行させる。   In the hydrothermal treatment apparatus 100 of the present embodiment described above, when the object to be treated is hydrothermally treated in the treatment kettle 110 with the water component of high-temperature and high-pressure steam of about 200 ° C./2 MPa and the heat of the steam, the treatment kettle 110 is treated. An object to be processed is introduced into the treatment tank 110, and the high-temperature and high-pressure steam is passed through the steam introduction pipe 180, the branched steam introduction pipes 180a to 180c, and the like into the boiler 120 and the steam superheater 130. Pumped from. By such steam pumping, the inside of the processing pot 110 is brought into contact with the high-temperature and high-pressure steam to which the already-processed workpiece has been pumped, and the heat of the steam is subjected to the hydrothermal treatment of the workpiece. Then, by stirring the charged object to be processed evenly by the stirring blade 113 in the processing vessel 110 into which the high-temperature and high-pressure steam has been introduced, the object to be processed is uniformly contacted with the water vapor. The water component of water vapor and the hydrothermal treatment by the heat are advanced while achieving proper heat propagation.

こうした水熱処理の進行を図るに当たり、本実施例では、ボイラ120の生成した水蒸気をその圧送過程において蒸気過熱ヒータ130により加熱して、約200℃/2MPaと言う高温高圧の水蒸気を処理釜110に継続して導入することとした(ステップS140)。このような高温高圧の水蒸気の生成・圧送をボイラにて担うには、ボイラに高い能力が求められるが、そのボイラ能力には限界があるので、上記したような高温高圧の水蒸気を安定して継続導入することが難しいが、本実施例では、上記したように蒸気過熱ヒータ130による水蒸気加熱を行うことで、高温高圧の水蒸気を安定して継続導入できる。こうした高温高圧水蒸気の継続導入を行う水熱処理装置100によれば、処理釜110を、水熱処理に望ましい処理環境下(約200℃/2MPa)に置くことができると共に、当該処理環境を高温高圧に容易に維持できる。この場合、本実施例では、蒸気過熱ヒータ130による水蒸気加熱を行うに当たり、蒸気過熱ヒータ130による加熱を受ける経路を蛇行経路として経路長を長くして加熱効率を高めたので、水蒸気の高温化、延いては処理釜110の処理環境維持に好適である。   In proceeding with such a hydrothermal treatment, in this embodiment, the steam generated by the boiler 120 is heated by the steam superheater 130 in the pumping process, and high-temperature and high-pressure steam of about 200 ° C./2 MPa is supplied to the processing kettle 110. It was decided to continue introduction (step S140). In order to bear the generation and pumping of such high-temperature and high-pressure steam with a boiler, the boiler is required to have high capacity. However, since the boiler capacity is limited, the high-temperature and high-pressure steam as described above can be stably stabilized. Although it is difficult to continuously introduce, in this embodiment, high-temperature and high-pressure steam can be stably and continuously introduced by performing steam heating by the steam superheater 130 as described above. According to the hydrothermal treatment apparatus 100 that continuously introduces such high-temperature and high-pressure steam, the treatment kettle 110 can be placed in a treatment environment desirable for hydrothermal treatment (about 200 ° C./2 MPa), and the treatment environment is kept at high temperature and high pressure. Easy to maintain. In this case, in the present embodiment, when steam heating is performed by the steam superheater 130, the path to be heated by the steam superheater 130 is a meandering path to increase the heating efficiency by increasing the path length. As a result, it is suitable for maintaining the processing environment of the processing pot 110.

そして、以上説明したように処理釜110の内部での処理環境を約200℃/2MPaといった高温高圧で維持した上で、プラスチック含有残飯やこれと一般廃棄物が混合した被処理物を水熱処理するので、高い生産性を達成できる。また、水熱処理であることから、粉塵・煤煙の発生がなく環境保全の点から好ましいばかりか、被処理物からの有益な処理完了物(堆肥、肥料、燃料)生成という資源循環の点からも好ましい。   Then, as described above, the processing environment inside the processing pot 110 is maintained at a high temperature and high pressure of about 200 ° C./2 MPa, and the plastic-containing residual rice or the processing object mixed with general waste is hydrothermally treated. So you can achieve high productivity. In addition, since it is a hydrothermal treatment, there is no generation of dust and soot, which is preferable from the viewpoint of environmental conservation, and also from the point of view of resource circulation that produces useful processed products (compost, fertilizer, fuel) from the processed material. preferable.

また、上記した高温高圧の水蒸気の導入に先立ち、処理釜110に高圧エアーを導入して処理釜110内を予め高圧環境としておくようにしたので、水熱処理の処理環境を高温高圧に容易に維持できる。しかも、この高温高圧の水蒸気導入に先立つ高圧エアー導入により高圧環境とした上で、その後に処理釜110に高温高圧の水蒸気導入を図ることから、水熱処理の処理環境維持がより一層簡便となる。   Prior to the introduction of the high-temperature and high-pressure steam described above, high-pressure air is introduced into the processing tank 110 so that the inside of the processing tank 110 is set in a high-pressure environment in advance. it can. Moreover, since high-pressure air is introduced by introducing high-temperature air prior to the introduction of high-temperature and high-pressure water vapor, and then high-temperature and high-pressure water vapor is introduced into the treatment tank 110, it becomes even easier to maintain the treatment environment for hydrothermal treatment.

加えて、前回の水熱処理の際に処理釜110内に残存している高温の残存水蒸気を、水熱処理に処す前の被処理物に噴霧して(ステップS110)、当該被処理物を予め昇温させておく。よって、処理釜110の内部への被処理物の投入による温度降下を抑制することができるので、水熱処理の開始当初から処理環境を高温高圧に維持できる。しかも、この被処理物の昇温は、アキュムレータ198に蓄えておいた残存水蒸気にて行うことから、被処理物の昇温のための熱源を別途用意する必要がなく、構成の簡略化、省資源化を図ることができる。   In addition, the high-temperature residual steam remaining in the treatment kettle 110 in the previous hydrothermal treatment is sprayed on the treatment object before the hydrothermal treatment (step S110), and the treatment object is elevated in advance. Keep warm. Therefore, the temperature drop due to the introduction of the workpiece into the processing pot 110 can be suppressed, so that the processing environment can be maintained at a high temperature and high pressure from the beginning of the hydrothermal treatment. In addition, since the temperature of the object to be processed is increased with the remaining water vapor stored in the accumulator 198, it is not necessary to prepare a separate heat source for increasing the temperature of the object to be processed. Recycling can be achieved.

また、本実施例では、水蒸気をボイラ120から処理釜110の内部に導入するための水蒸気導入管180を、複数の分岐水蒸気導入管180a〜180c等に分岐させて複数の導入箇所にて処理釜110の内部に水蒸気導入を行うようにし、その上で、一つの分岐水蒸気導入管181の噴出孔182を処理釜110の排出口112に設置した。分岐水蒸気導入管181を経て噴出孔182から噴射された水蒸気は、排出口112における被処理物を処理釜110内に押し戻すように作用するので、高温高圧下での水熱処理の最中に、被処理物が排出口112を塞いで固化してしまうことや、排出口112が塞がれてしまうことを回避できる。よって、水熱処理後の処理完了物の排出が円滑となり好ましい。   Further, in this embodiment, the steam introduction pipe 180 for introducing steam from the boiler 120 into the processing kettle 110 is branched into a plurality of branch steam introduction pipes 180a to 180c and the like at the plurality of introduction places. Steam was introduced into the interior of 110, and then the ejection hole 182 of one branch steam introduction pipe 181 was installed at the discharge port 112 of the treatment tank 110. The steam sprayed from the ejection hole 182 through the branch steam inlet pipe 181 acts to push the object to be treated at the discharge port 112 back into the treatment tank 110, so that during the hydrothermal treatment under high temperature and high pressure, It can be avoided that the processed material blocks and solidifies the discharge port 112 and the discharge port 112 is blocked. Therefore, the discharge of the processed product after the hydrothermal treatment becomes smooth and preferable.

更に、処理釜110の胴体部周囲を取り囲む中空の流体導入部141を備える熱交換釜140を配設した。そして、水熱処理の完了後には、この流体導入部141に冷却水を導入して、この冷却水との処理釜110の熱交換を行って処理釜110を冷却しつつ、処理釜110内の残存水蒸気を処理釜110から排出するようにした。よって、水熱処理後の処理釜を冷却水との熱交換により短時間の内に効率よく冷却して内部の温度低下と圧力降下を促進した上で、残存水蒸気を排出できる。このため、既述した水熱処理の処理環境維持に加え、次回の被処理物の水熱処理までの短縮化、延いては処理効率向上を図ることができる。   Furthermore, a heat exchange kettle 140 provided with a hollow fluid introduction part 141 surrounding the periphery of the body part of the treatment kettle 110 was disposed. Then, after the hydrothermal treatment is completed, the cooling water is introduced into the fluid introduction part 141, the heat of the processing tank 110 with the cooling water is exchanged to cool the processing tank 110, and the remaining in the processing tank 110. Water vapor was discharged from the treatment kettle 110. Therefore, after the hydrothermal treatment, the treatment kettle can be efficiently cooled within a short time by heat exchange with the cooling water to promote the temperature drop and pressure drop inside, and the remaining water vapor can be discharged. For this reason, in addition to the above-described maintenance of the hydrothermal treatment environment, it is possible to shorten the time until the next hydrothermal treatment of the object to be treated, and to improve the treatment efficiency.

しかも、熱交換釜140(流体導入部141)への冷却水導入に際しては、導入する冷却水の温度が図3に示すように徐々に低くなるようにしたので、熱交換(冷却)の対象となる処理釜110を急激な温度変化(温度低下)に晒さないようにできることから、処理釜の耐久性確保の観点において好ましい。こうした冷却水温度の調整に当たっては、処理釜110に導入される水蒸気の熱を熱交換用配管188にて利用するので、エネルギ効率の上から、好ましい。   In addition, when the cooling water is introduced into the heat exchange pot 140 (fluid introduction part 141), the temperature of the introduced cooling water is gradually lowered as shown in FIG. This is preferable from the viewpoint of ensuring the durability of the treatment kettle because the treatment kettle 110 can be prevented from being exposed to a rapid temperature change (temperature decrease). In adjusting the cooling water temperature, the heat of the steam introduced into the treatment tank 110 is used in the heat exchange pipe 188, which is preferable from the viewpoint of energy efficiency.

また、熱交換釜140(流体導入部141)への冷却水導入に加え、次回の前記被処理物の水熱処理に際して、熱交換釜140(流体導入部141)に導入済みの冷却水の排出を行った後、ボイラ120の生成した水蒸気を前記熱交換釜に導入するようにすることもできる。こうすれば、次回の水熱処理では、熱交換釜に導入した水蒸気との熱交換によっても処理釜を昇温できるので、次回の水熱処理の環境維持に対して寄与できる。   In addition to the introduction of the cooling water into the heat exchange kettle 140 (fluid introduction part 141), the discharge of the cooling water already introduced into the heat exchange kettle 140 (fluid introduction part 141) is performed during the next hydrothermal treatment of the object to be treated. After performing, the water vapor | steam which the boiler 120 produced | generated can also be made to introduce | transduce into the said heat exchanger. In this way, in the next hydrothermal treatment, the temperature of the treatment kettle can be raised also by heat exchange with water vapor introduced into the heat exchange kettle, which can contribute to maintaining the environment of the next hydrothermal treatment.

以上本発明の実施例について説明したが、本発明は上記の実施例や実施形態になんら限定されるものではなく、本発明の要旨を逸脱しない範囲において種々なる態様で実施し得ることは勿論である。例えば、上記の実施例では、処理釜110における処理環境維持に際して、蒸気過熱ヒータ130による水上気化熱、コンプレッサ135による事前の高圧エアー導入、残存水蒸気を用いた次回処理用の被処理物の昇温を併用したが、これらを、処理釜110の内容積や、被処理物の種類、水熱処理の際の環境(温度・圧力)に応じて、適宜選択して採用することもできる。   Although the embodiments of the present invention have been described above, the present invention is not limited to the above-described embodiments and embodiments, and can of course be implemented in various modes without departing from the gist of the present invention. is there. For example, in the above embodiment, when maintaining the processing environment in the processing pot 110, the water vaporization heat by the steam superheater 130, the introduction of high-pressure air in advance by the compressor 135, the temperature increase of the object to be processed for the next processing using the remaining steam. However, these can be appropriately selected and employed according to the internal volume of the treatment kettle 110, the type of the object to be treated, and the environment (temperature / pressure) during hydrothermal treatment.

本発明の実施例である水熱処理装置100の概略構成を示すブロック図である。It is a block diagram which shows schematic structure of the hydrothermal processing apparatus 100 which is an Example of this invention. この水熱処理プロセスの工程を表す工程図である。It is process drawing showing the process of this hydrothermal treatment process. 冷却水の循環供給の様子を説明する説明図である。It is explanatory drawing explaining the mode of circulation supply of a cooling water.

符号の説明Explanation of symbols

100…水熱処理装置
110…処理釜
111…投入口
112…排出口
113…攪拌羽根
114、115…開口開閉機器
116…モータ
120…ボイラ
130…蒸気過熱ヒータ
135…コンプレッサ
136…バルブ
140…熱交換釜
141…流体導入部
142…冷却水排出管
143…水蒸気排出管
144…バルブ
150…冷却装置
151…第1タンク
152…第2タンク
153…混合バルブ
154…冷却配管
155…バルブ
160…廃棄物投入ホッパ
170…制御装置
180…水蒸気導入管
180a〜180c…分岐水蒸気導入管
181…分岐水蒸気導入管
182…噴出孔
183、184…バルブ
185…分岐水蒸気導入管
186…バルブ
187…減圧機器ユニット
188…熱交換用配管
189…分流バルブ
190…センサ
191、192…センサ
193…水蒸気放出管
194…バルブ
195…サイレンサ
196…水蒸気還流管
197…バルブ
198…アキュムレータ
199…バルブ
200…釜温度センサ
201…釜圧力センサ
DESCRIPTION OF SYMBOLS 100 ... Hydrothermal treatment apparatus 110 ... Processing pot 111 ... Input port 112 ... Discharge port 113 ... Stirrer blade 114, 115 ... Opening / closing device 116 ... Motor 120 ... Boiler 130 ... Steam superheater 135 ... Compressor 136 ... Valve 140 ... Heat exchange pot DESCRIPTION OF SYMBOLS 141 ... Fluid introduction part 142 ... Cooling water discharge pipe 143 ... Water vapor discharge pipe 144 ... Valve 150 ... Cooling device 151 ... 1st tank 152 ... 2nd tank 153 ... Mixing valve 154 ... Cooling piping 155 ... Valve 160 ... Waste input hopper DESCRIPTION OF SYMBOLS 170 ... Control apparatus 180 ... Steam introduction pipe 180a-180c ... Branch steam introduction pipe 181 ... Branch steam introduction pipe 182 ... Injection hole 183, 184 ... Valve 185 ... Branch steam introduction pipe 186 ... Valve 187 ... Decompression equipment unit 188 ... Heat exchange Piping 189 ... Diversion valve 190 ... Sensors 191, 192 ... Sensor 193 ... Water vapor discharge pipe 194 ... Valve 195 ... Silencer 196 ... Water vapor reflux pipe 197 ... Valve 198 ... Accumulator 199 ... Valve 200 ... Kettle temperature sensor 201 ... Kettle pressure sensor

Claims (9)

水蒸気の水成分と水蒸気の熱にて被処理物を水熱処理する水熱処理装置であって、
前記被処理物の投入口と排出口を有する中空の処理釜と、
前記処理釜に導入するための水蒸気を生成して圧送する水蒸気生成源と、
該水蒸気生成源の生成した水蒸気を前記処理釜の内部に導入するよう配設された水蒸気導入路と、
前記処理釜に投入された被処理物を処理釜内で攪拌する攪拌手段と、
前記水熱処理に際して処理環境の維持を図る維持手段とを備え、
該維持手段は、
前記水蒸気導入路の経路に形成され、該経路を通過する水蒸気を加熱した上で水蒸気を前記処理釜に送り出す水蒸気加熱機構と、
前記処理釜の内部に前記水熱処理の開始に先だって加圧エアーを導入する加圧エアー導入機構と、
前記水熱処理の終了後における前記処理釜の残存水蒸気を前記処理釜から排出して中空容器に蓄え、該蓄えた水蒸気を前記処理釜の前記投入口から投入される次回処理用の前記被処理物に噴射して次回処理被処理物を昇温させる昇温機構の少なくともいずれか一つの機構を有する
水熱処理装置。
A hydrothermal treatment apparatus for hydrothermally treating an object to be treated with water component of water vapor and heat of water vapor,
A hollow processing pot having an inlet and an outlet for the object to be processed;
A steam generation source for generating and pumping steam for introduction into the treatment kettle;
A water vapor introduction path arranged to introduce the water vapor produced by the water vapor production source into the treatment kettle;
Agitation means for agitating the object to be treated put in the treatment vessel in the treatment vessel;
Maintenance means for maintaining the treatment environment during the hydrothermal treatment,
The maintenance means includes
A steam heating mechanism that is formed in a path of the steam introduction path, and that feeds the steam to the treatment kettle after heating the steam passing through the path;
A pressurized air introduction mechanism that introduces pressurized air into the treatment kettle prior to the start of the hydrothermal treatment;
The residual water vapor in the treatment kettle after completion of the hydrothermal treatment is discharged from the treatment kettle and stored in a hollow container, and the treated water for the next treatment is introduced from the inlet of the treatment kettle. A hydrothermal treatment apparatus having at least one mechanism for raising the temperature of the object to be treated next time by spraying it onto the water.
請求項1に記載の水熱処理装置であって、
前記水蒸気導入路は、前記処理釜の複数の導入箇所に水蒸気導入を行うよう配設され、該複数の導入箇所の少なくとも一つを前記処理釜の前記排出口とし、前記排出口における前記被処理物を前記処理釜内に押し戻す
水熱処理装置。
The hydrothermal treatment apparatus according to claim 1,
The water vapor introduction path is disposed so as to introduce water vapor into a plurality of introduction locations of the treatment kettle, and at least one of the plurality of introduction locations serves as the discharge port of the treatment kettle, and the treatment target in the discharge port A hydrothermal treatment device that pushes objects back into the treatment kettle.
請求項1または請求項2に記載の水熱処理装置であって、
更に、
前記処理釜の周囲に中空の流体導入部を形成し、該流体導入部に導入した流体と前記処理釜との間の熱交換を可能とする熱交換釜と、
前記水熱処理の終了後に前記熱交換釜に、前記処理釜に残存する残存水蒸気の温度より低温の流体を導入する流体導入手段と、
前記水熱処理の終了後に前記残存水蒸気を前記処理釜から排出する水蒸気排出手段と、
を備える
水熱処理装置。
The hydrothermal treatment apparatus according to claim 1 or 2,
Furthermore,
A heat exchange pot that forms a hollow fluid introduction portion around the treatment kettle and enables heat exchange between the fluid introduced into the fluid introduction portion and the treatment kettle;
Fluid introduction means for introducing a fluid having a temperature lower than the temperature of the residual water vapor remaining in the treatment kettle into the heat exchange kettle after completion of the hydrothermal treatment;
Water vapor discharge means for discharging the residual water vapor from the treatment kettle after completion of the hydrothermal treatment;
A hydrothermal treatment apparatus.
水蒸気の水成分と水蒸気の熱にて被処理物を水熱処理する水熱処理装置であって、
前記被処理物の投入口と排出口を有する中空の処理釜と、
前記処理釜に導入するための水蒸気を生成して圧送する水蒸気生成源と、
該水蒸気生成源の生成した水蒸気を前記処理釜の内部に導入するよう配設された水蒸気導入路と、
前記処理釜に投入された被処理物を処理釜内で攪拌する攪拌手段と、
前記処理釜の周囲に中空の流体導入部を形成し、該流体導入部に導入した流体と前記処理釜との間の熱交換を可能とする熱交換釜と、
前記水熱処理の終了後に前記熱交換釜に、前記処理釜に残存する残存水蒸気の温度より低温の流体を導入する流体導入手段と、
前記水熱処理の終了後に前記残存水蒸気を前記処理釜から排出する水蒸気排出手段とを備える
水熱処理装置。
A hydrothermal treatment apparatus for hydrothermally treating an object to be treated with water component of water vapor and heat of water vapor,
A hollow processing pot having an inlet and an outlet for the object to be processed;
A steam generation source for generating and pumping steam for introduction into the treatment kettle;
A water vapor introduction path arranged to introduce the water vapor produced by the water vapor production source into the treatment kettle;
Agitation means for agitating the object to be treated put in the treatment vessel in the treatment vessel;
A heat exchange pot that forms a hollow fluid introduction portion around the treatment kettle and enables heat exchange between the fluid introduced into the fluid introduction portion and the treatment kettle;
Fluid introduction means for introducing a fluid having a temperature lower than the temperature of the residual water vapor remaining in the treatment kettle into the heat exchange kettle after completion of the hydrothermal treatment;
A hydrothermal treatment apparatus comprising: water vapor discharge means for discharging the residual water vapor from the treatment kettle after completion of the hydrothermal treatment.
請求項3または請求項4に記載の水熱処理装置であって、
前記流体導入手段は、
前記熱交換釜に導入する前記流体の温度を前記残存水蒸気の温度から徐々に低下させつつ、流体を導入する
水熱処理装置。
The hydrothermal treatment apparatus according to claim 3 or 4, wherein
The fluid introducing means includes
A hydrothermal treatment apparatus for introducing a fluid while gradually lowering the temperature of the fluid introduced into the heat exchange kettle from the temperature of the residual water vapor.
請求項3ないし請求項5いずれかに記載の水熱処理装置であって、
前記流体導入手段は、
次回の前記被処理物の水熱処理に際して、前記熱交換釜に導入済みの前記低温の流体の排出を行った後、前記水蒸気生成源の生成した水蒸気を前記熱交換釜に導入する
水熱処理装置。
The hydrothermal treatment apparatus according to any one of claims 3 to 5,
The fluid introducing means includes
A hydrothermal treatment apparatus that, after the next hydrothermal treatment of the object to be treated, discharges the low-temperature fluid already introduced into the heat exchange kettle, and then introduces the steam produced by the steam production source into the heat exchange kettle.
水蒸気の水成分と水蒸気の熱にて被処理物を水熱処理する水熱処理方法であって、
前記被処理物の投入口と排出口を有する中空の処理釜に、前記被処理物を前記投入口から投入する工程と、
水蒸気を生成する水蒸気生成源から水蒸気を前記処理釜の内部に圧送する工程と、
前記投入済みの被処理物を前記水蒸気が導入済みの前記処理釜内で攪拌する工程と、
前記水熱処理に際して処理環境の維持を図る工程とを備え、
前記処理環境の維持を図る工程は、
前記処理釜に導入される水蒸気を加熱した上で水蒸気を前記処理釜に送り出す工程と、
前記処理釜の内部に前記水熱処理の開始に先だって加圧エアーを導入する工程と、
前記水熱処理の終了後における前記処理釜の残存水蒸気を前記処理釜から排出して中空容器に蓄え、該蓄えた水蒸気を前記処理釜の前記投入口から投入される次回処理用の前記被処理物に噴射して次回処理被処理物を昇温させる工程の少なくともいずれか一つの工程を有する
水熱処理方法。
A hydrothermal treatment method for hydrothermally treating an object to be treated with water component of water vapor and heat of water vapor,
A step of introducing the object to be processed into the hollow processing pot having an inlet and an outlet of the object to be processed from the inlet;
A step of pumping water vapor from a water vapor generating source for generating water vapor into the processing kettle;
Stirring the charged workpiece in the treatment kettle into which the water vapor has been introduced;
A process for maintaining a treatment environment during the hydrothermal treatment,
The step of maintaining the processing environment includes:
A step of heating the steam introduced into the treatment kettle and then sending the steam to the treatment kettle;
Introducing pressurized air into the treatment kettle prior to the start of the hydrothermal treatment;
The residual water vapor in the treatment kettle after completion of the hydrothermal treatment is discharged from the treatment kettle and stored in a hollow container, and the treated water for the next treatment is introduced from the inlet of the treatment kettle. A hydrothermal treatment method comprising at least one of the steps of injecting water into the substrate and raising the temperature of the object to be processed next time.
請求項7に記載の水熱処理方法であって、
前記処理釜の周囲に形成した中空の流体導入部に流体を導入して該導入した流体と前記処理釜との間の熱交換を可能とする熱交換釜に対して、前記水熱処理の終了後に、前記処理釜に残存する残存水蒸気の温度より低温の流体を導入する工程と、
前記水熱処理の終了後に前記処理釜に残存する残存水蒸気を前記処理釜から排出する工程とを有する
水熱処理方法。
The hydrothermal treatment method according to claim 7,
For a heat exchange kettle that introduces a fluid into a hollow fluid introduction section formed around the treatment kettle and enables heat exchange between the introduced fluid and the treatment kettle, after the hydrothermal treatment is completed. Introducing a fluid having a temperature lower than the temperature of the residual water vapor remaining in the treatment kettle;
A hydrothermal treatment method comprising: discharging residual water vapor remaining in the treatment kettle from the treatment kettle after completion of the hydrothermal treatment.
請求項7または請求項8に記載の水熱処理方法であって、
前記水蒸気生成源から水蒸気を前記処理釜の内部に圧送する工程では、
前記水蒸気を前記処理釜の複数の導入箇所に導入しつつ、該複数の導入箇所の少なくとも一つを前記処理釜の前記排出口とし、前記排出口における前記被処理物を前記処理釜内に押し戻す
水熱処理方法。
The hydrothermal treatment method according to claim 7 or 8,
In the step of pumping steam from the steam generation source into the processing kettle,
While introducing the water vapor into a plurality of introduction points of the processing kettle, at least one of the plurality of introduction points serves as the discharge port of the treatment kettle, and pushes the object to be treated at the discharge port back into the treatment kettle. Hydrothermal treatment method.
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