JP2008053758A - 半導体集積回路装置 - Google Patents
半導体集積回路装置 Download PDFInfo
- Publication number
- JP2008053758A JP2008053758A JP2007292929A JP2007292929A JP2008053758A JP 2008053758 A JP2008053758 A JP 2008053758A JP 2007292929 A JP2007292929 A JP 2007292929A JP 2007292929 A JP2007292929 A JP 2007292929A JP 2008053758 A JP2008053758 A JP 2008053758A
- Authority
- JP
- Japan
- Prior art keywords
- wiring
- plug
- film
- insulating film
- integrated circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007292929A JP2008053758A (ja) | 2007-11-12 | 2007-11-12 | 半導体集積回路装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007292929A JP2008053758A (ja) | 2007-11-12 | 2007-11-12 | 半導体集積回路装置 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002181974A Division JP2004031439A (ja) | 2002-06-21 | 2002-06-21 | 半導体集積回路装置およびその製造方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009099263A Division JP2009158987A (ja) | 2009-04-15 | 2009-04-15 | 半導体集積回路装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008053758A true JP2008053758A (ja) | 2008-03-06 |
| JP2008053758A5 JP2008053758A5 (enExample) | 2008-08-14 |
Family
ID=39237422
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007292929A Pending JP2008053758A (ja) | 2007-11-12 | 2007-11-12 | 半導体集積回路装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2008053758A (enExample) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08316330A (ja) * | 1995-05-12 | 1996-11-29 | Hitachi Ltd | 半導体集積回路のレイアウト方法 |
| JP2001337440A (ja) * | 2000-03-24 | 2001-12-07 | Toshiba Corp | 半導体集積回路のパターン設計方法、フォトマスク、および半導体装置 |
-
2007
- 2007-11-12 JP JP2007292929A patent/JP2008053758A/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08316330A (ja) * | 1995-05-12 | 1996-11-29 | Hitachi Ltd | 半導体集積回路のレイアウト方法 |
| JP2001337440A (ja) * | 2000-03-24 | 2001-12-07 | Toshiba Corp | 半導体集積回路のパターン設計方法、フォトマスク、および半導体装置 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US8093723B2 (en) | Method of manufacturing a semiconductor integrated circuit device | |
| US6498089B2 (en) | Semiconductor integrated circuit device with moisture-proof ring and its manufacture method | |
| US20060205204A1 (en) | Method of making a semiconductor interconnect with a metal cap | |
| EP1146558B1 (en) | Semiconductor device with damascene wiring structure and method of its fabrication | |
| US12119262B2 (en) | Semiconductor device structure with resistive element | |
| TWI793522B (zh) | 半導體裝置及其形成方法 | |
| US9553017B2 (en) | Methods for fabricating integrated circuits including back-end-of-the-line interconnect structures | |
| US6346475B1 (en) | Method of manufacturing semiconductor integrated circuit | |
| US10832946B1 (en) | Recessed interconnet line having a low-oxygen cap for facilitating a robust planarization process and protecting the interconnect line from downstream etch operations | |
| US20090166868A1 (en) | Semiconductor devices including metal interconnections and methods of fabricating the same | |
| US8941182B2 (en) | Buried sublevel metallizations for improved transistor density | |
| US9589890B2 (en) | Method for interconnect scheme | |
| US9406883B1 (en) | Structure and formation method of memory device | |
| JP2009158987A (ja) | 半導体集積回路装置 | |
| JP5310721B2 (ja) | 半導体装置とその製造方法 | |
| JP2008053758A (ja) | 半導体集積回路装置 | |
| CN112490357A (zh) | 半导体组件及其制造方法 | |
| KR20060107694A (ko) | 반도체 소자의 제조방법 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20080702 |
|
| A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A712 Effective date: 20100528 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20110712 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20111115 |