JP2008021748A5 - - Google Patents

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Publication number
JP2008021748A5
JP2008021748A5 JP2006190829A JP2006190829A JP2008021748A5 JP 2008021748 A5 JP2008021748 A5 JP 2008021748A5 JP 2006190829 A JP2006190829 A JP 2006190829A JP 2006190829 A JP2006190829 A JP 2006190829A JP 2008021748 A5 JP2008021748 A5 JP 2008021748A5
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JP
Japan
Prior art keywords
substrate
stations
exposure apparatus
interferometer
reflecting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2006190829A
Other languages
English (en)
Japanese (ja)
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JP2008021748A (ja
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Publication date
Application filed filed Critical
Priority to JP2006190829A priority Critical patent/JP2008021748A/ja
Priority claimed from JP2006190829A external-priority patent/JP2008021748A/ja
Priority to US11/775,094 priority patent/US7495771B2/en
Publication of JP2008021748A publication Critical patent/JP2008021748A/ja
Publication of JP2008021748A5 publication Critical patent/JP2008021748A5/ja
Withdrawn legal-status Critical Current

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JP2006190829A 2006-07-11 2006-07-11 露光装置 Withdrawn JP2008021748A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2006190829A JP2008021748A (ja) 2006-07-11 2006-07-11 露光装置
US11/775,094 US7495771B2 (en) 2006-07-11 2007-07-09 Exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006190829A JP2008021748A (ja) 2006-07-11 2006-07-11 露光装置

Publications (2)

Publication Number Publication Date
JP2008021748A JP2008021748A (ja) 2008-01-31
JP2008021748A5 true JP2008021748A5 (enExample) 2009-08-27

Family

ID=38948937

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006190829A Withdrawn JP2008021748A (ja) 2006-07-11 2006-07-11 露光装置

Country Status (2)

Country Link
US (1) US7495771B2 (enExample)
JP (1) JP2008021748A (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4863948B2 (ja) * 2007-07-30 2012-01-25 株式会社日立ハイテクノロジーズ 露光装置、露光方法、及び表示用パネル基板の製造方法
JP5757397B2 (ja) * 2010-03-29 2015-07-29 株式会社ニコン 露光方法及び露光装置、並びにデバイス製造方法
US8724115B2 (en) * 2011-09-06 2014-05-13 Kla-Tencor Corporation Linear stage and metrology architecture for reflective electron beam lithography
CN102707579B (zh) * 2012-05-28 2014-06-18 清华大学 一种双工件台位置交换过程中驱动器切换装置
JP6488073B2 (ja) * 2014-02-28 2019-03-20 株式会社日立ハイテクノロジーズ ステージ装置およびそれを用いた荷電粒子線装置
CN107278279B (zh) 2015-02-23 2020-07-03 株式会社尼康 基板处理系统及基板处理方法、以及组件制造方法
CN111158220A (zh) 2015-02-23 2020-05-15 株式会社尼康 测量装置及方法、光刻系统、曝光装置及方法
TWI693477B (zh) 2015-02-23 2020-05-11 日商尼康股份有限公司 測量裝置、微影系統及曝光裝置、以及元件製造方法
CN111971622A (zh) 2018-03-29 2020-11-20 Asml荷兰有限公司 位置测量系统、干涉仪系统和光刻装置
CN109029270B (zh) * 2018-08-17 2020-11-27 浙江大丰实业股份有限公司 舞台台面位移监测平台

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1244018C (zh) * 1996-11-28 2006-03-01 株式会社尼康 曝光方法和曝光装置
JP3722346B2 (ja) 1999-08-24 2005-11-30 キヤノン株式会社 位置決めステージ装置、半導体露光装置およびデバイス製造方法
TW490596B (en) 1999-03-08 2002-06-11 Asm Lithography Bv Lithographic projection apparatus, method of manufacturing a device using the lithographic projection apparatus, device manufactured according to the method and method of calibrating the lithographic projection apparatus
CN100468624C (zh) * 2003-08-07 2009-03-11 株式会社尼康 曝光方法及曝光装置、载置台装置、及设备制造方法

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