JP2007535610A - 低発煙フルオロポリマーの調製方法 - Google Patents
低発煙フルオロポリマーの調製方法 Download PDFInfo
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- JP2007535610A JP2007535610A JP2007510991A JP2007510991A JP2007535610A JP 2007535610 A JP2007535610 A JP 2007535610A JP 2007510991 A JP2007510991 A JP 2007510991A JP 2007510991 A JP2007510991 A JP 2007510991A JP 2007535610 A JP2007535610 A JP 2007535610A
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- fluoropolymer
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- 229920002313 fluoropolymer Polymers 0.000 title claims abstract description 173
- 239000004811 fluoropolymer Substances 0.000 title claims abstract description 173
- 238000004519 manufacturing process Methods 0.000 title description 10
- 239000000155 melt Substances 0.000 claims abstract description 38
- 238000000034 method Methods 0.000 claims abstract description 37
- 239000011261 inert gas Substances 0.000 claims abstract description 21
- 238000002844 melting Methods 0.000 claims abstract description 17
- 230000008018 melting Effects 0.000 claims abstract description 17
- 230000009467 reduction Effects 0.000 claims abstract description 10
- 230000001172 regenerating effect Effects 0.000 claims abstract description 5
- 239000000779 smoke Substances 0.000 claims description 25
- 230000008859 change Effects 0.000 claims description 17
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 claims description 16
- 229920001577 copolymer Polymers 0.000 claims description 15
- 238000012360 testing method Methods 0.000 claims description 13
- HCDGVLDPFQMKDK-UHFFFAOYSA-N hexafluoropropylene Chemical group FC(F)=C(F)C(F)(F)F HCDGVLDPFQMKDK-UHFFFAOYSA-N 0.000 claims description 12
- 238000001816 cooling Methods 0.000 claims description 5
- 239000003039 volatile agent Substances 0.000 claims description 3
- 229920000642 polymer Polymers 0.000 abstract description 50
- 239000007789 gas Substances 0.000 description 82
- 230000008929 regeneration Effects 0.000 description 49
- 238000011069 regeneration method Methods 0.000 description 49
- 238000002156 mixing Methods 0.000 description 17
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 14
- 238000001125 extrusion Methods 0.000 description 12
- 238000010128 melt processing Methods 0.000 description 11
- 239000000523 sample Substances 0.000 description 11
- 239000013618 particulate matter Substances 0.000 description 10
- 238000002474 experimental method Methods 0.000 description 9
- 239000000463 material Substances 0.000 description 9
- 229920009441 perflouroethylene propylene Polymers 0.000 description 9
- -1 polytetrafluoroethylene Polymers 0.000 description 9
- 229910052757 nitrogen Inorganic materials 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- 238000004898 kneading Methods 0.000 description 6
- 238000002347 injection Methods 0.000 description 5
- 239000007924 injection Substances 0.000 description 5
- 239000011236 particulate material Substances 0.000 description 5
- 239000008188 pellet Substances 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 4
- 238000009835 boiling Methods 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- BLTXWCKMNMYXEA-UHFFFAOYSA-N 1,1,2-trifluoro-2-(trifluoromethoxy)ethene Chemical compound FC(F)=C(F)OC(F)(F)F BLTXWCKMNMYXEA-UHFFFAOYSA-N 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- 230000009471 action Effects 0.000 description 3
- 230000015556 catabolic process Effects 0.000 description 3
- 238000006731 degradation reaction Methods 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 239000003517 fume Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000005086 pumping Methods 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- OVGRCEFMXPHEBL-UHFFFAOYSA-N 1-ethenoxypropane Chemical compound CCCOC=C OVGRCEFMXPHEBL-UHFFFAOYSA-N 0.000 description 2
- JDQSSIORVLOESA-UHFFFAOYSA-N 2,2-difluoro-4,5-bis(trifluoromethyl)-1,3-dioxole Chemical compound FC(F)(F)C1=C(C(F)(F)F)OC(F)(F)O1 JDQSSIORVLOESA-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 2
- 239000005977 Ethylene Substances 0.000 description 2
- 229910001347 Stellite Inorganic materials 0.000 description 2
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 238000002845 discoloration Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229920001519 homopolymer Polymers 0.000 description 2
- 150000002430 hydrocarbons Chemical group 0.000 description 2
- 238000001746 injection moulding Methods 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000003921 particle size analysis Methods 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 230000001737 promoting effect Effects 0.000 description 2
- 230000002441 reversible effect Effects 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- KHXKESCWFMPTFT-UHFFFAOYSA-N 1,1,1,2,2,3,3-heptafluoro-3-(1,2,2-trifluoroethenoxy)propane Chemical compound FC(F)=C(F)OC(F)(F)C(F)(F)C(F)(F)F KHXKESCWFMPTFT-UHFFFAOYSA-N 0.000 description 1
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 description 1
- OHMHBGPWCHTMQE-UHFFFAOYSA-N 2,2-dichloro-1,1,1-trifluoroethane Chemical compound FC(F)(F)C(Cl)Cl OHMHBGPWCHTMQE-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 229920001780 ECTFE Polymers 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- LXQXZNRPTYVCNG-YPZZEJLDSA-N americium-241 Chemical compound [241Am] LXQXZNRPTYVCNG-YPZZEJLDSA-N 0.000 description 1
- 229920006125 amorphous polymer Polymers 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000004380 ashing Methods 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 150000001722 carbon compounds Chemical class 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- UUAGAQFQZIEFAH-UHFFFAOYSA-N chlorotrifluoroethylene Chemical group FC(F)=C(F)Cl UUAGAQFQZIEFAH-UHFFFAOYSA-N 0.000 description 1
- AHICWQREWHDHHF-UHFFFAOYSA-N chromium;cobalt;iron;manganese;methane;molybdenum;nickel;silicon;tungsten Chemical compound C.[Si].[Cr].[Mn].[Fe].[Co].[Ni].[Mo].[W] AHICWQREWHDHHF-UHFFFAOYSA-N 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 229920006129 ethylene fluorinated ethylene propylene Polymers 0.000 description 1
- 229920000840 ethylene tetrafluoroethylene copolymer Polymers 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 239000007863 gel particle Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 238000004128 high performance liquid chromatography Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
- 239000004816 latex Substances 0.000 description 1
- 229920000126 latex Polymers 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000010309 melting process Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 229920005548 perfluoropolymer Polymers 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000002028 premature Effects 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000010008 shearing Methods 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 230000002110 toxicologic effect Effects 0.000 description 1
- 231100000027 toxicology Toxicity 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J3/00—Processes of treating or compounding macromolecular substances
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F6/00—Post-polymerisation treatments
- C08F6/26—Treatment of polymers prepared in bulk also solid polymers or polymer melts
- C08F6/28—Purification
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2327/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers
- C08J2327/02—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment
- C08J2327/12—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Extrusion Moulding Of Plastics Or The Like (AREA)
Abstract
Description
(a)前記フルオロポリマーを溶融する工程と、
(b)前記溶融フルオロポリマーの表面を形成する工程と、
(c)前記表面を再生する工程と、
(d)前記溶融フルオロポリマーの前記再生表面を不活性ガスと接触させる工程と、
(e)得られた溶融フルオロポリマーの揮発分を除去してその結果として、より少ないオリゴマーを有する前記フルオロポリマーを得る工程と、
(e)揮発分の除去されたフルオロポリマーを冷却する工程と
を含む方法である。
過硫酸アンモニウム(APS)開始剤で重合された、FEPとして公知の、テトラフルオロエチレン(TFE)と12.0〜12.3重量パーセントのヘキサフルオロプロピレン(HFP)、すなわち3.8のHFPI、1.1〜1.3重量パーセントのペルフルオロ(エチルビニルエーテル)(PEVE)とのコポリマーの圧縮フレークが供給材料として使用される。ポリマーは、31.9〜32.5g/10分の初期溶融流量(MFR)を有する。真空装置は、表面更新領域に一切のガスを注入せずに60分間、運転後に開けられ、蝋質材料の少数の小さな粒子が真空装置のスクリーン上に観察される。蝋質材料の、押出機によって加工されたポリマーに対する重量比は2ppmである。これは、実験前のスクリーンの重量を実験後のスクリーンとオリゴマーとの重量から減算して、集められたオリゴマーの重量を定量し、このオリゴマーの重量を溶融加工実験の時間の間に加工されたフルオロポリマー溶融体の重量と比較することによって定量される。
一切のガスを注入せずに10分間、プロセスが運転されることを除いて、実施例1に似た溶融加工および実施例1の場合と同じフルオロポリマーが使用される。窒素の、フルオロポリマーに対する重量比9,500ppmにおいて窒素を40分間注入した。スクリーンを除去する。実施例1において分析された蝋質固体に似た蝋質固体で、しかしもっと多い量でスクリーンを覆う。蝋質材料(オリゴマー)の、窒素注入によって40分間の実験の間、押出機によって加工されたフルオロポリマーに対する重量比(一切の窒素注入を行なわずに10分の運転の間に集められたオリゴマーの量を差し引いた後の正味量)は50ppmである。
実施例1および2の溶融加工から得られたフルオロポリマーのフィルム試料に、このフルオロポリマーの上限連続使用温度である200℃において煙感知器試験を実施し、以下の結果を得た。
実施例1および2の溶融加工から得られたフルオロポリマーのフィルム試料に、350℃において煙感知器試験を実施し、以下の結果を得た。
Claims (5)
- 溶融加工可能なフルオロポリマーのオリゴマー含量を低下させるための方法であって、
(a)前記フルオロポリマーを溶融する工程と、
(b)前記溶融フルオロポリマーの表面を形成する工程と、
(c)前記表面を再生する工程と、
(d)前記溶融フルオロポリマーの前記再生表面を不活性ガスと接触させる工程と、
(e)得られた溶融フルオロポリマーの揮発分を除去してその結果として、より少ないオリゴマーを有する前記フルオロポリマーを得る工程と、
(e)揮発分の除去されたフルオロポリマーを冷却する工程と
を含むことを特徴とする方法。 - 前記オリゴマー含量を少なくとも約25ppm低下させることを特徴とする請求項1に記載の方法。
- 前記冷却の前または後に、さらに前記フルオロポリマーを溶融製造することを特徴とする請求項1に記載の方法。
- 前記フルオロポリマーのオリゴマー含量を低下させる請求項1記載の方法であって、前記低下されたオリゴマー含量を有する前記フルオロポリマーについて、前記フルオロポリマーのための上限連続使用温度において煙感知器試験を実施した際に、前記フルオロポリマーが、重合しただけの(as polymerized)前記フルオロポリマーの電圧変化の少なくとも約20%、電圧変化の低減を示すことを特徴とする請求項1に記載の方法。
- 前記フルオロポリマーが、テトラフルオロエチレンとヘキサフルオロプロピレンとのコポリマーであり、前記コポリマーに煙感知器試験を実施した際に200℃において約0.025ボルト以下または350℃において約2ボルト以下のいずれかの電圧変化を示すほどに、前記コポリマーのオリゴマー含量が低下していることを特徴とする請求項1に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/836,434 US7211629B2 (en) | 2004-04-30 | 2004-04-30 | Process for the preparation of low fuming fluoropolymer |
US10/836,434 | 2004-04-30 | ||
PCT/US2005/014683 WO2005108437A1 (en) | 2004-04-30 | 2005-04-29 | Process for the preparation of low fuming fluoropolymer |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2007535610A true JP2007535610A (ja) | 2007-12-06 |
JP2007535610A5 JP2007535610A5 (ja) | 2008-06-05 |
JP4943321B2 JP4943321B2 (ja) | 2012-05-30 |
Family
ID=34970134
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007510991A Active JP4943321B2 (ja) | 2004-04-30 | 2005-04-29 | 低発煙フルオロポリマーの調製方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7211629B2 (ja) |
EP (1) | EP1765879B1 (ja) |
JP (1) | JP4943321B2 (ja) |
CN (1) | CN100591697C (ja) |
WO (1) | WO2005108437A1 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7423087B2 (en) * | 2004-04-30 | 2008-09-09 | E.I. Du Pont De Nemours And Company | Reduced fuming fluoropolymer |
JP5338660B2 (ja) | 2007-05-16 | 2013-11-13 | 旭硝子株式会社 | フッ素化処理されたパーフルオロポリマーの製造方法 |
EP2608945B1 (en) | 2010-10-29 | 2016-01-13 | Dow Global Technologies LLC | Melt devolatilization extrusion process |
US9464175B2 (en) | 2011-09-27 | 2016-10-11 | Dow Global Technologies Llc | Melt devolatilization extrusion processs |
WO2019208492A1 (ja) * | 2018-04-26 | 2019-10-31 | ダイキン工業株式会社 | 精製フルオロポリマーの製造方法 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4834399B1 (ja) * | 1970-12-18 | 1973-10-20 | ||
JPS60171110A (ja) * | 1984-01-16 | 1985-09-04 | イー・アイ・デユポン・デ・ニモアス・アンド・カンパニー | パーフルオロ化コポリマーの押出仕上げ方法 |
JPH1080917A (ja) * | 1996-09-09 | 1998-03-31 | Daikin Ind Ltd | 含フッ素重合体の安定化方法 |
WO2002050135A1 (fr) * | 2000-12-21 | 2002-06-27 | Daikin Industries, Ltd. | Procede de pretraitement de stabilisation destine a un polymere contenant du fluor |
WO2004058833A1 (ja) * | 2002-12-25 | 2004-07-15 | Daikin Industries, Ltd. | フルオロポリマー及びその組成物 |
JP2007535609A (ja) * | 2004-04-30 | 2007-12-06 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | 発煙を低減されたフルオロポリマー |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4626587A (en) | 1984-01-16 | 1986-12-02 | E. I. Du Pont De Nemours And Company | Extrusion finishing of perfluorinated copolymers |
US4743658A (en) * | 1985-10-21 | 1988-05-10 | E. I. Du Pont De Nemours And Company | Stable tetrafluoroethylene copolymers |
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2004
- 2004-04-30 US US10/836,434 patent/US7211629B2/en active Active
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2005
- 2005-04-29 EP EP05751125A patent/EP1765879B1/en active Active
- 2005-04-29 CN CN200580013269A patent/CN100591697C/zh active Active
- 2005-04-29 JP JP2007510991A patent/JP4943321B2/ja active Active
- 2005-04-29 WO PCT/US2005/014683 patent/WO2005108437A1/en not_active Application Discontinuation
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WO2002050135A1 (fr) * | 2000-12-21 | 2002-06-27 | Daikin Industries, Ltd. | Procede de pretraitement de stabilisation destine a un polymere contenant du fluor |
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JP2007535609A (ja) * | 2004-04-30 | 2007-12-06 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | 発煙を低減されたフルオロポリマー |
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US20050245725A1 (en) | 2005-11-03 |
EP1765879B1 (en) | 2011-12-14 |
WO2005108437A1 (en) | 2005-11-17 |
JP4943321B2 (ja) | 2012-05-30 |
CN100591697C (zh) | 2010-02-24 |
US7211629B2 (en) | 2007-05-01 |
EP1765879A1 (en) | 2007-03-28 |
CN1997673A (zh) | 2007-07-11 |
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