JP2007532863A5 - - Google Patents

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Publication number
JP2007532863A5
JP2007532863A5 JP2006532577A JP2006532577A JP2007532863A5 JP 2007532863 A5 JP2007532863 A5 JP 2007532863A5 JP 2006532577 A JP2006532577 A JP 2006532577A JP 2006532577 A JP2006532577 A JP 2006532577A JP 2007532863 A5 JP2007532863 A5 JP 2007532863A5
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JP
Japan
Prior art keywords
under test
device under
temperature
actuator
heater block
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006532577A
Other languages
English (en)
Japanese (ja)
Other versions
JP4994842B2 (ja
JP2007532863A (ja
Filing date
Publication date
Priority claimed from US10/822,841 external-priority patent/US7304264B2/en
Application filed filed Critical
Publication of JP2007532863A publication Critical patent/JP2007532863A/ja
Publication of JP2007532863A5 publication Critical patent/JP2007532863A5/ja
Application granted granted Critical
Publication of JP4994842B2 publication Critical patent/JP4994842B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2006532577A 2004-04-13 2005-04-13 被試験装置の近接制御温度管理機能を有すマイクロサーマルチャンバ Expired - Fee Related JP4994842B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/822,841 2004-04-13
US10/822,841 US7304264B2 (en) 2004-04-13 2004-04-13 Micro thermal chamber having proximity control temperature management for devices under test
PCT/JP2005/007491 WO2005101040A1 (en) 2004-04-13 2005-04-13 Micro thermal chamber having proximity control temperature management for devices under test

Publications (3)

Publication Number Publication Date
JP2007532863A JP2007532863A (ja) 2007-11-15
JP2007532863A5 true JP2007532863A5 (https=) 2008-05-08
JP4994842B2 JP4994842B2 (ja) 2012-08-08

Family

ID=34965349

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006532577A Expired - Fee Related JP4994842B2 (ja) 2004-04-13 2005-04-13 被試験装置の近接制御温度管理機能を有すマイクロサーマルチャンバ

Country Status (5)

Country Link
US (1) US7304264B2 (https=)
JP (1) JP4994842B2 (https=)
KR (1) KR20070041680A (https=)
CN (1) CN1997907A (https=)
WO (1) WO2005101040A1 (https=)

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Publication number Priority date Publication date Assignee Title
US8057094B2 (en) * 2007-11-16 2011-11-15 Infineon Technologies Ag Power semiconductor module with temperature measurement
FR2933201B1 (fr) * 2008-06-30 2010-11-19 Airbus France Systeme et procede de deverminage d'equipements
DE102008052898B4 (de) * 2008-10-23 2014-01-16 Gerhard Bauer Vorrichtung und Verfahren zum Temperieren von Bauteilen
WO2012127383A1 (en) 2011-03-18 2012-09-27 Ecolab Usa Inc. Heat system for killing pests
US9101125B2 (en) 2012-04-06 2015-08-11 Elizabeth Knote Heat chamber for termination of bed bugs and other arthropods
US9400291B2 (en) 2012-08-31 2016-07-26 Intel Corporation Integrated circuit test temperature control mechanism
US9029740B2 (en) * 2013-01-15 2015-05-12 Nordson Corporation Air impingement heater
US9454499B2 (en) 2013-06-11 2016-09-27 Intel Corporation Asynchronous communication between devices
KR101584425B1 (ko) * 2014-03-06 2016-01-11 한양대학교 에리카산학협력단 극저온 냉매를 이용한 국부적 저온 챔버
AT516900A1 (de) * 2015-03-09 2016-09-15 Dr Collin Gmbh Vorrichtung und Verfahren zum Testen von Werkstoffen
CN108037064A (zh) * 2017-12-26 2018-05-15 华测检测认证集团股份有限公司 多任务多温度段同时进行汽车电子元器件可靠性测试装置
US20190339751A1 (en) * 2018-05-02 2019-11-07 Microsoft Technology Licensing, Llc Server testing applying controlled flow and temperature
JP2023149981A (ja) 2022-03-31 2023-10-16 株式会社アドバンテスト 温度調整装置、電子部品ハンドリング装置、電子部品試験装置、及びｄｕｔの温度調整方法
US11693051B1 (en) * 2022-10-21 2023-07-04 AEM Holdings Ltd. Thermal head for independent control of zones
US11828795B1 (en) 2022-10-21 2023-11-28 AEM Holdings Ltd. Test system with a thermal head comprising a plurality of adapters for independent thermal control of zones
CN120677396A (zh) 2022-10-21 2025-09-19 新加坡商永科股份有限公司 用于对多个区域进行独立的控制的热头
US11796589B1 (en) 2022-10-21 2023-10-24 AEM Holdings Ltd. Thermal head for independent control of zones
US11656272B1 (en) 2022-10-21 2023-05-23 AEM Holdings Ltd. Test system with a thermal head comprising a plurality of adapters and one or more cold plates for independent control of zones
US11828796B1 (en) 2023-05-02 2023-11-28 AEM Holdings Ltd. Integrated heater and temperature measurement

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6002109A (en) * 1995-07-10 1999-12-14 Mattson Technology, Inc. System and method for thermal processing of a semiconductor substrate
JPH10256353A (ja) * 1997-03-13 1998-09-25 Sony Corp ヒートアップステージの冷却装置およびその冷却方法
US5821505A (en) * 1997-04-04 1998-10-13 Unisys Corporation Temperature control system for an electronic device which achieves a quick response by interposing a heater between the device and a heat sink
US5844208A (en) * 1997-04-04 1998-12-01 Unisys Corporation Temperature control system for an electronic device in which device temperature is estimated from heater temperature and heat sink temperature
US6280790B1 (en) * 1997-06-30 2001-08-28 Applied Materials, Inc. Reducing the deposition rate of volatile contaminants onto an optical component of a substrate processing system
US5966940A (en) * 1997-11-18 1999-10-19 Micro Component Technology, Inc. Semiconductor thermal conditioning apparatus and method
US6091062A (en) * 1998-01-27 2000-07-18 Kinetrix, Inc. Method and apparatus for temperature control of a semiconductor electrical-test contractor assembly
US6248671B1 (en) * 1998-08-19 2001-06-19 Micron Technology, Inc. Semiconductor processing apparatuses, and methods of forming antireflective coating materials over substrates
US6307388B1 (en) * 2000-02-23 2001-10-23 Unisys Corporation Electromechanical apparatus for testing IC chips using first and second sets of substrates which are pressed together
US6893505B2 (en) * 2002-05-08 2005-05-17 Semitool, Inc. Apparatus and method for regulating fluid flows, such as flows of electrochemical processing fluids
US6857283B2 (en) * 2002-09-13 2005-02-22 Isothermal Systems Research, Inc. Semiconductor burn-in thermal management system
US6768084B2 (en) * 2002-09-30 2004-07-27 Axcelis Technologies, Inc. Advanced rapid thermal processing (RTP) using a linearly-moving heating assembly with an axisymmetric and radially-tunable thermal radiation profile

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