JP2007531815A5 - - Google Patents
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- Publication number
- JP2007531815A5 JP2007531815A5 JP2007506856A JP2007506856A JP2007531815A5 JP 2007531815 A5 JP2007531815 A5 JP 2007531815A5 JP 2007506856 A JP2007506856 A JP 2007506856A JP 2007506856 A JP2007506856 A JP 2007506856A JP 2007531815 A5 JP2007531815 A5 JP 2007531815A5
- Authority
- JP
- Japan
- Prior art keywords
- examples
- propanediol
- hydroxymethyl
- nitro
- glycol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/817,987 | 2004-04-05 | ||
| US10/817,987 US7081511B2 (en) | 2004-04-05 | 2004-04-05 | Process for making polyesters |
| PCT/IB2005/000879 WO2005097867A1 (en) | 2004-04-05 | 2005-03-31 | Process for making polyesters |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2007531815A JP2007531815A (ja) | 2007-11-08 |
| JP2007531815A5 true JP2007531815A5 (https=) | 2008-05-08 |
| JP5003958B2 JP5003958B2 (ja) | 2012-08-22 |
Family
ID=34962724
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007506856A Expired - Lifetime JP5003958B2 (ja) | 2004-04-05 | 2005-03-31 | ポリエステルの製造方法 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US7081511B2 (https=) |
| EP (1) | EP1751210B1 (https=) |
| JP (1) | JP5003958B2 (https=) |
| KR (1) | KR101178123B1 (https=) |
| CN (2) | CN1946759A (https=) |
| DE (1) | DE602005023438D1 (https=) |
| MY (1) | MY134455A (https=) |
| TW (1) | TWI375693B (https=) |
| WO (1) | WO2005097867A1 (https=) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7264913B2 (en) * | 2002-11-21 | 2007-09-04 | Az Electronic Materials Usa Corp. | Antireflective compositions for photoresists |
| JP4703284B2 (ja) * | 2005-06-22 | 2011-06-15 | セントラル硝子株式会社 | ポリエステル化合物およびそれを用いたレジスト材料 |
| US7638262B2 (en) * | 2006-08-10 | 2009-12-29 | Az Electronic Materials Usa Corp. | Antireflective composition for photoresists |
| US20080286689A1 (en) * | 2007-05-14 | 2008-11-20 | Hong Zhuang | Antireflective Coating Compositions |
| US20090035704A1 (en) * | 2007-08-03 | 2009-02-05 | Hong Zhuang | Underlayer Coating Composition Based on a Crosslinkable Polymer |
| US8039201B2 (en) * | 2007-11-21 | 2011-10-18 | Az Electronic Materials Usa Corp. | Antireflective coating composition and process thereof |
| US8221965B2 (en) * | 2008-07-08 | 2012-07-17 | Az Electronic Materials Usa Corp. | Antireflective coating compositions |
| US8329387B2 (en) | 2008-07-08 | 2012-12-11 | Az Electronic Materials Usa Corp. | Antireflective coating compositions |
| US20100092894A1 (en) * | 2008-10-14 | 2010-04-15 | Weihong Liu | Bottom Antireflective Coating Compositions |
| US20100143546A1 (en) | 2008-12-09 | 2010-06-10 | The Coca-Cola Company | Container and composition for enhanced gas barrier properties |
| US8110265B2 (en) | 2008-12-09 | 2012-02-07 | The Coca-Cola Company | Pet container and compositions having enhanced mechanical properties and gas barrier properties |
| US8551686B2 (en) * | 2009-10-30 | 2013-10-08 | Az Electronic Materials Usa Corp. | Antireflective composition for photoresists |
| US8507192B2 (en) * | 2010-02-18 | 2013-08-13 | Az Electronic Materials Usa Corp. | Antireflective compositions and methods of using same |
| US9170494B2 (en) | 2012-06-19 | 2015-10-27 | Az Electronic Materials (Luxembourg) S.A.R.L. | Antireflective compositions and methods of using same |
| CN109642016B (zh) | 2016-07-13 | 2021-07-06 | 阿克佐诺贝尔国际涂料股份有限公司 | 制备环氧官能聚酯的方法，通过该方法获得的环氧官能聚酯和包含该环氧官能聚酯的涂料组合物 |
| KR102875404B1 (ko) * | 2021-02-01 | 2025-10-22 | 주식회사 엘지화학 | 폴리카보네이트 및 이의 제조방법 |
| CN115215970B (zh) * | 2022-09-21 | 2022-12-06 | 山东旺林新材料有限公司 | 一种采光型不饱和聚酯树脂及其制备方法 |
Family Cites Families (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2585323A (en) | 1949-05-31 | 1952-02-12 | California Research Corp | Linear pyromellitic polyesters and their derivatives |
| NL245996A (https=) * | 1958-12-02 | |||
| US3483169A (en) | 1967-08-21 | 1969-12-09 | Case Leslie C | Polyester-polyethers and process of preparing the same |
| US3497472A (en) | 1967-12-05 | 1970-02-24 | Sun Oil Co | Polyesters of adamantanediols and aromatic tetracarboxylic acid dianhydrides |
| JPS5517768B2 (https=) * | 1972-10-20 | 1980-05-14 | ||
| US3919172A (en) | 1972-10-30 | 1975-11-11 | California Inst Of Techn | Method of preparing polyesters from polymeric polyols and dianhydrides |
| US3856752A (en) | 1973-10-01 | 1974-12-24 | Ciba Geigy Corp | Soluble polyimides derived from phenylindane diamines and dianhydrides |
| US4196129A (en) | 1977-01-21 | 1980-04-01 | California Institute Of Technology | Prepolymer dianhydrides |
| US4491628A (en) | 1982-08-23 | 1985-01-01 | International Business Machines Corporation | Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone |
| JPS5988770A (ja) | 1982-11-13 | 1984-05-22 | Canon Inc | 電子写真複写装置 |
| DE3621039A1 (de) * | 1986-06-24 | 1988-01-07 | Bayer Ag | Verfahren zur herstellung von hydroxylgruppen aufweisenden oligoestern und deren verwendung |
| JPS63132915A (ja) * | 1986-11-25 | 1988-06-04 | New Japan Chem Co Ltd | 新規なポリエステルアクリレ−ト系化合物 |
| US4912160A (en) | 1987-11-16 | 1990-03-27 | The Sherwin-Williams Company | Acid-functional polymers from hydroxy polymers and cyclic anhydrides |
| DE3817012A1 (de) | 1988-05-19 | 1989-11-30 | Basf Ag | Positiv und negativ arbeitende strahlungsempfindliche gemische sowie verfahren zur herstellung von reliefmustern |
| DE69125634T2 (de) | 1990-01-30 | 1998-01-02 | Wako Pure Chem Ind Ltd | Chemisch verstärktes Photolack-Material |
| JP3000745B2 (ja) | 1991-09-19 | 2000-01-17 | 富士通株式会社 | レジスト組成物とレジストパターンの形成方法 |
| FR2694012B1 (fr) | 1992-07-23 | 1994-08-26 | Kermel Snc | Solutions de polyimide et leur procédé d'obtention. |
| US5294680A (en) | 1992-07-24 | 1994-03-15 | International Business Machines Corporation | Polymeric dyes for antireflective coatings |
| DE4224761A1 (de) | 1992-07-27 | 1994-02-03 | Basf Ag | Verwendung von Polykondensaten und neue Polykondensate |
| DE69424937T2 (de) | 1993-04-21 | 2001-01-11 | The University Of Akron, Akron | Polyamidfolie mit negativer doppelbrechung |
| US5395918A (en) | 1994-04-21 | 1995-03-07 | The University Of Akron | Organo-soluble polyimides from substituted dianhydrides |
| JP3804138B2 (ja) | 1996-02-09 | 2006-08-02 | Ｊｓｒ株式会社 | ＡｒＦエキシマレーザー照射用感放射線性樹脂組成物 |
| WO1997033198A1 (en) | 1996-03-07 | 1997-09-12 | The B.F. Goodrich Company | Photoresist compositions comprising polycyclic polymers with acid labile pendant groups |
| US5843624A (en) | 1996-03-08 | 1998-12-01 | Lucent Technologies Inc. | Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material |
| KR100265597B1 (ko) | 1996-12-30 | 2000-09-15 | 김영환 | Arf 감광막 수지 및 그 제조방법 |
| JPH10273525A (ja) * | 1997-03-31 | 1998-10-13 | Jsr Corp | アルカリ可溶性重合体 |
| US5935760A (en) | 1997-10-20 | 1999-08-10 | Brewer Science Inc. | Thermosetting polyester anti-reflective coatings for multilayer photoresist processes |
| EP1058701B2 (en) | 1998-02-23 | 2011-03-16 | Stepan Company | Low viscosity polyester polyols and methods for preparing same |
| US5962621A (en) | 1998-04-28 | 1999-10-05 | The Dow Chemical Company | Process for preparing hydroxy-functionalized polyesters |
| US6593058B1 (en) | 1998-09-23 | 2003-07-15 | E. I. Du Pont De Nemours And Company | Photoresists, polymers and processes for microlithography |
| WO2000067072A1 (en) | 1999-05-04 | 2000-11-09 | E.I. Du Pont De Nemours And Company | Fluorinated polymers, photoresists and processes for microlithography |
| JP2001316465A (ja) * | 2000-05-10 | 2001-11-13 | Toyo Ink Mfg Co Ltd | ポリエステル |
| US7264913B2 (en) | 2002-11-21 | 2007-09-04 | Az Electronic Materials Usa Corp. | Antireflective compositions for photoresists |
-
2004
- 2004-04-05 US US10/817,987 patent/US7081511B2/en not_active Expired - Lifetime
-
2005
- 2005-03-15 TW TW94107857A patent/TWI375693B/zh not_active IP Right Cessation
- 2005-03-31 JP JP2007506856A patent/JP5003958B2/ja not_active Expired - Lifetime
- 2005-03-31 DE DE200560023438 patent/DE602005023438D1/de not_active Expired - Lifetime
- 2005-03-31 KR KR1020067023010A patent/KR101178123B1/ko not_active Expired - Lifetime
- 2005-03-31 CN CNA2005800124944A patent/CN1946759A/zh active Pending
- 2005-03-31 EP EP20050718352 patent/EP1751210B1/en not_active Expired - Lifetime
- 2005-03-31 WO PCT/IB2005/000879 patent/WO2005097867A1/en not_active Ceased
- 2005-03-31 CN CN2010101630151A patent/CN101824141B/zh not_active Expired - Lifetime
- 2005-04-04 MY MYPI20051503A patent/MY134455A/en unknown
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