WO2005086901A3 - Cynoadamantyl compound and polymers and photoresists compresing same - Google Patents

Cynoadamantyl compound and polymers and photoresists compresing same Download PDF

Info

Publication number
WO2005086901A3
WO2005086901A3 PCT/US2005/007910 US2005007910W WO2005086901A3 WO 2005086901 A3 WO2005086901 A3 WO 2005086901A3 US 2005007910 W US2005007910 W US 2005007910W WO 2005086901 A3 WO2005086901 A3 WO 2005086901A3
Authority
WO
WIPO (PCT)
Prior art keywords
polymers
photoresists
cynoadamantyl
compresing
compound
Prior art date
Application number
PCT/US2005/007910
Other languages
French (fr)
Other versions
WO2005086901A2 (en
Inventor
Young C Bae
Robert J Kavanagh
Original Assignee
Rohm & Haas Elect Mat
Young C Bae
Robert J Kavanagh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm & Haas Elect Mat, Young C Bae, Robert J Kavanagh filed Critical Rohm & Haas Elect Mat
Publication of WO2005086901A2 publication Critical patent/WO2005086901A2/en
Publication of WO2005086901A3 publication Critical patent/WO2005086901A3/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/039Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C255/00Carboxylic acid nitriles
    • C07C255/01Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms
    • C07C255/31Carboxylic acid nitriles having cyano groups bound to acyclic carbon atoms having cyano groups bound to acyclic carbon atoms of a carbon skeleton containing rings other than six-membered aromatic rings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C255/00Carboxylic acid nitriles
    • C07C255/45Carboxylic acid nitriles having cyano groups bound to carbon atoms of rings other than six-membered aromatic rings
    • C07C255/47Carboxylic acid nitriles having cyano groups bound to carbon atoms of rings other than six-membered aromatic rings to carbon atoms of rings being part of condensed ring systems
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/12Esters of monohydric alcohols or phenols
    • C08F220/16Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1811C10or C11-(Meth)acrylate, e.g. isodecyl (meth)acrylate, isobornyl (meth)acrylate or 2-naphthyl (meth)acrylate
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/26Esters containing oxygen in addition to the carboxy oxygen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/42Nitriles
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00Systems containing at least three condensed rings
    • C07C2603/56Ring systems containing bridged rings
    • C07C2603/58Ring systems containing bridged rings containing three rings
    • C07C2603/70Ring systems containing bridged rings containing three rings containing only six-membered rings
    • C07C2603/74Adamantanes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/04Anhydrides, e.g. cyclic anhydrides
    • C08F222/06Maleic anhydride
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F232/00Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
    • C08F232/08Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having condensed rings

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

Cyanoadamantyl compounds, polymers that comprise polymerized units of such compounds, and photoresist compositions that comprise such polymers are provided. Preferred polymers of the invention are employed in photoresists imaged at wavelengths less than 250 nm such as 248 nm and 193 run.
PCT/US2005/007910 2004-03-08 2005-03-08 Cynoadamantyl compound and polymers and photoresists compresing same WO2005086901A2 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US55144804P 2004-03-08 2004-03-08
US60/551,448 2004-03-08
US55188004P 2004-03-09 2004-03-09
US60/551,880 2004-03-09

Publications (2)

Publication Number Publication Date
WO2005086901A2 WO2005086901A2 (en) 2005-09-22
WO2005086901A3 true WO2005086901A3 (en) 2006-10-26

Family

ID=34976225

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2005/007910 WO2005086901A2 (en) 2004-03-08 2005-03-08 Cynoadamantyl compound and polymers and photoresists compresing same

Country Status (1)

Country Link
WO (1) WO2005086901A2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11597781B2 (en) 2020-12-29 2023-03-07 Canon Kabushiki Kaisha Photocurable composition for making layers with high etch resistance

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5399647A (en) * 1992-06-10 1995-03-21 Fujitsu Limited Photoresist composition of 1-(1'-cyanoethenyl)adamantane

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5399647A (en) * 1992-06-10 1995-03-21 Fujitsu Limited Photoresist composition of 1-(1'-cyanoethenyl)adamantane

Also Published As

Publication number Publication date
WO2005086901A2 (en) 2005-09-22

Similar Documents

Publication Publication Date Title
WO2002021212A3 (en) Fluorinated phenolic polymers and photoresist compositions comprising same
TW200639586A (en) Photoresist compositions comprising resin blends
EP2372456A3 (en) Novel polymers and photoresist compositions
WO2004037866A3 (en) Photoresists containing sulfonamide component
TW200643623A (en) Antireflective hardmask composition and methods for using same
WO2005066714A3 (en) Photoresist composition
WO2003011855A3 (en) Pyrazole-derived kinase inhibitors and uses thereof
WO2007146965A3 (en) Compounds for the treatment of periodontal disease
WO2004087229A3 (en) Bone cement compositions
WO2003075857A3 (en) Amino-methyl substituted tetracycline compounds
WO2005091853A3 (en) Methods and compositions for treating il-13 related pathologies
WO2004101490A3 (en) Photoactive compounds
EP1526120A3 (en) Concrete surface retarders
WO2004106293A3 (en) Oxazolyl - and thiazolyl - purine based tricyclic compounds.
WO2005000912A3 (en) Novel positive photosensitive resin compositions
WO2005030144A3 (en) Pyrrolopyridazine compounds and methods of use thereof for the treatment of proliferative disorders
IL173807A (en) Amphiphilic antioxidant compounds, mitoquinone derivatives and pharmaceutical compositions containing the same
WO2006013475A3 (en) Photoresist compositions
WO2006128796A3 (en) Polymer composition comprising polyolefins and amphiphilic block copolymers and optionally other polymers and/or fillers
WO2006110588A3 (en) Methods for treating mild cognitive impairment
WO2002069039A3 (en) Photoacid generator systems for short wavelength imaging
WO2005044200A3 (en) Methods and compositions for treating mcp-1 related pathologies
DE60210598D1 (en) 3,7-DIAZABICYCLOc3.3.1Ü FORMULATIONS AS ANTIARRHYTHMIKA
TW200604740A (en) Cyanoadamantyl compounds and polymers and photoresists comprising same
WO2004108770A8 (en) Low odor chain transfer agents for controlled radical polymerization

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A2

Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SM SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW

AL Designated countries for regional patents

Kind code of ref document: A2

Designated state(s): GM KE LS MW MZ NA SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LT LU MC NL PL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG

NENP Non-entry into the national phase

Ref country code: DE

WWW Wipo information: withdrawn in national office

Country of ref document: DE

122 Ep: pct application non-entry in european phase