JP2007516352A - 多方向変形によってスパッタリング物品を形成する方法 - Google Patents

多方向変形によってスパッタリング物品を形成する方法 Download PDF

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Publication number
JP2007516352A
JP2007516352A JP2006533580A JP2006533580A JP2007516352A JP 2007516352 A JP2007516352 A JP 2007516352A JP 2006533580 A JP2006533580 A JP 2006533580A JP 2006533580 A JP2006533580 A JP 2006533580A JP 2007516352 A JP2007516352 A JP 2007516352A
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JP
Japan
Prior art keywords
dimension
slab
deformation
less
preform
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006533580A
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English (en)
Japanese (ja)
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JP2007516352A5 (enExample
Inventor
スプレッケルセン，エリック ボン
ミカルク，クリストファー　エー．
ビー． フォード，ロバート
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Cabot Corp
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Cabot Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cabot Corp filed Critical Cabot Corp
Publication of JP2007516352A publication Critical patent/JP2007516352A/ja
Publication of JP2007516352A5 publication Critical patent/JP2007516352A5/ja
Pending legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21J—FORGING; HAMMERING; PRESSING METAL; RIVETING; FORGE FURNACES
    • B21J1/00—Preparing metal stock or similar ancillary operations prior, during or post forging, e.g. heating or cooling
    • B21J1/02—Preliminary treatment of metal stock without particular shaping, e.g. salvaging segregated zones, forging or pressing in the rough
    • B21J1/025—Preliminary treatment of metal stock without particular shaping, e.g. salvaging segregated zones, forging or pressing in the rough affecting grain orientation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21J—FORGING; HAMMERING; PRESSING METAL; RIVETING; FORGE FURNACES
    • B21J1/00—Preparing metal stock or similar ancillary operations prior, during or post forging, e.g. heating or cooling
    • B21J1/04—Shaping in the rough solely by forging or pressing
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/16—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of other metals or alloys based thereon
    • C22F1/18—High-melting or refractory metals or alloys based thereon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21B—ROLLING OF METAL
    • B21B1/00—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
    • B21B1/02—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling heavy work, e.g. ingots, slabs, blooms, or billets, in which the cross-sectional form is unimportant ; Rolling combined with forging or pressing
    • B21B2001/022—Blooms or billets

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Metal Rolling (AREA)
JP2006533580A 2003-06-09 2004-06-07 多方向変形によってスパッタリング物品を形成する方法 Pending JP2007516352A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US47698403P 2003-06-09 2003-06-09
PCT/US2004/017972 WO2004111295A1 (en) 2003-06-09 2004-06-07 Method of forming sputtering acticles by multidirectional deformation

Publications (2)

Publication Number Publication Date
JP2007516352A true JP2007516352A (ja) 2007-06-21
JP2007516352A5 JP2007516352A5 (enExample) 2007-08-02

Family

ID=33551657

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006533580A Pending JP2007516352A (ja) 2003-06-09 2004-06-07 多方向変形によってスパッタリング物品を形成する方法

Country Status (5)

Country Link
US (1) US7228722B2 (enExample)
EP (1) EP1636398A1 (enExample)
JP (1) JP2007516352A (enExample)
CN (1) CN1833048A (enExample)
WO (1) WO2004111295A1 (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008532765A (ja) * 2005-02-10 2008-08-21 キャボット コーポレイション スパッタリングターゲットおよびその製造方法
JP2010535943A (ja) * 2007-08-06 2010-11-25 エイチ．シー． スターク インコーポレイテッド 組織の均一性が改善された高融点金属プレート
KR101193868B1 (ko) 2010-07-29 2012-10-26 현대제철 주식회사 테이퍼 슬라브의 조압연 방법
CN108356193A (zh) * 2018-05-22 2018-08-03 通裕重工股份有限公司 汽轮发电机转子自由锻成形方法

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE112007000440B4 (de) * 2006-03-07 2021-01-07 Global Advanced Metals, Usa, Inc. Verfahren zum Erzeugen von verformten Metallartikeln
US20070251819A1 (en) * 2006-05-01 2007-11-01 Kardokus Janine K Hollow cathode magnetron sputtering targets and methods of forming hollow cathode magnetron sputtering targets
US7776166B2 (en) * 2006-12-05 2010-08-17 Praxair Technology, Inc. Texture and grain size controlled hollow cathode magnetron targets and method of manufacture
KR100860645B1 (ko) * 2007-05-04 2008-09-26 엘지전자 주식회사 냉장고 및 냉장고 도어용 강판 및 그 제조방법
US8250895B2 (en) * 2007-08-06 2012-08-28 H.C. Starck Inc. Methods and apparatus for controlling texture of plates and sheets by tilt rolling
US8702919B2 (en) * 2007-08-13 2014-04-22 Honeywell International Inc. Target designs and related methods for coupled target assemblies, methods of production and uses thereof
KR101626286B1 (ko) * 2008-11-03 2016-06-01 토소우 에스엠디, 인크 스퍼터 타겟 제조 방법 및 이에 의해 제조된 스퍼터 타겟
US20100180427A1 (en) * 2009-01-16 2010-07-22 Ford Motor Company Texturing of thin metal sheets/foils for enhanced formability and manufacturability
US20100330389A1 (en) * 2009-06-25 2010-12-30 Ford Motor Company Skin pass for cladding thin metal sheets
KR20170134365A (ko) 2015-04-10 2017-12-06 토소우 에스엠디, 인크 탄탈 스퍼터 타겟의 제조 방법 및 그에 의해 제조된 스퍼터 타겟

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6193821B1 (en) * 1998-08-19 2001-02-27 Tosoh Smd, Inc. Fine grain tantalum sputtering target and fabrication process
JP2002530534A (ja) * 1998-11-25 2002-09-17 キャボット コーポレイション 高純度タンタルおよびそれを含む、スパッタターゲットのような製品
JP2004511651A (ja) * 2000-05-22 2004-04-15 キャボット　コーポレイション 高純度ニオブおよびそれを含む製品、ならびにその製造方法
JP2004526863A (ja) * 2001-02-20 2004-09-02 ハー ツェー シュタルク インコーポレイテッド 均一な集合組織を有する耐火金属板及び該板を製造する方法

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US4721537A (en) 1985-10-15 1988-01-26 Rockwell International Corporation Method of producing a fine grain aluminum alloy using three axes deformation
DE3712281A1 (de) 1987-04-10 1988-10-27 Heraeus Gmbh W C Verfahren zur herstellung von hochduktilem tantal-halbzeug
FR2729596A1 (fr) 1992-05-07 1996-07-26 Commissariat Energie Atomique Procede de fabrication de pieces metalliques par forgeage libre et matricage sous presse
KR960013872B1 (ko) 1992-11-10 1996-10-10 미쯔비시주우고오교오 가부시기가이샤 금속판표면의 광택부여방법 및 금속재의 냉간압연방법
US5647923A (en) 1995-07-13 1997-07-15 Teledyne Industries, Inc. Method for producing refractory metal foil
US5993513A (en) 1996-04-05 1999-11-30 Cabot Corporation Method for controlling the oxygen content in valve metal materials
US6569270B2 (en) 1997-07-11 2003-05-27 Honeywell International Inc. Process for producing a metal article
US6348139B1 (en) 1998-06-17 2002-02-19 Honeywell International Inc. Tantalum-comprising articles
US6331233B1 (en) 2000-02-02 2001-12-18 Honeywell International Inc. Tantalum sputtering target with fine grains and uniform texture and method of manufacture
US20020002695A1 (en) 2000-06-02 2002-01-03 Frank Kschischang Method and system for decoding
US6946039B1 (en) 2000-11-02 2005-09-20 Honeywell International Inc. Physical vapor deposition targets, and methods of fabricating metallic materials
US6887356B2 (en) 2000-11-27 2005-05-03 Cabot Corporation Hollow cathode target and methods of making same
IL156802A0 (en) 2001-01-11 2004-02-08 Cabot Corp Tantalum and niobium billets and methods of producing same
US6770154B2 (en) 2001-09-18 2004-08-03 Praxair S.T. Technology, Inc. Textured-grain-powder metallurgy tantalum sputter target
US20040016635A1 (en) 2002-07-19 2004-01-29 Ford Robert B. Monolithic sputtering target assembly

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6193821B1 (en) * 1998-08-19 2001-02-27 Tosoh Smd, Inc. Fine grain tantalum sputtering target and fabrication process
JP2002530534A (ja) * 1998-11-25 2002-09-17 キャボット コーポレイション 高純度タンタルおよびそれを含む、スパッタターゲットのような製品
JP2004511651A (ja) * 2000-05-22 2004-04-15 キャボット　コーポレイション 高純度ニオブおよびそれを含む製品、ならびにその製造方法
JP2004526863A (ja) * 2001-02-20 2004-09-02 ハー ツェー シュタルク インコーポレイテッド 均一な集合組織を有する耐火金属板及び該板を製造する方法

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008532765A (ja) * 2005-02-10 2008-08-21 キャボット コーポレイション スパッタリングターゲットおよびその製造方法
JP4880620B2 (ja) * 2005-02-10 2012-02-22 キャボット コーポレイション スパッタリングターゲットおよびその製造方法
JP2010535943A (ja) * 2007-08-06 2010-11-25 エイチ．シー． スターク インコーポレイテッド 組織の均一性が改善された高融点金属プレート
JP2010535633A (ja) * 2007-08-06 2010-11-25 エイチ．シー． スターク インコーポレイテッド 傾斜圧延法によってプレートおよびシートの組織を制御する方法
JP2013154403A (ja) * 2007-08-06 2013-08-15 Hc Starck Inc 傾斜圧延法によってプレートおよびシートの組織を制御する方法
JP2014012893A (ja) * 2007-08-06 2014-01-23 Hc Starck Inc 組織の均一性が改善された高融点金属プレート
US9095885B2 (en) 2007-08-06 2015-08-04 H.C. Starck Inc. Refractory metal plates with improved uniformity of texture
US9767999B2 (en) 2007-08-06 2017-09-19 H.C. Starck Inc. Refractory metal plates
KR101193868B1 (ko) 2010-07-29 2012-10-26 현대제철 주식회사 테이퍼 슬라브의 조압연 방법
CN108356193A (zh) * 2018-05-22 2018-08-03 通裕重工股份有限公司 汽轮发电机转子自由锻成形方法
CN108356193B (zh) * 2018-05-22 2020-06-23 通裕重工股份有限公司 汽轮发电机转子自由锻成形方法

Also Published As

Publication number Publication date
US20050034503A1 (en) 2005-02-17
US7228722B2 (en) 2007-06-12
CN1833048A (zh) 2006-09-13
WO2004111295A1 (en) 2004-12-23
EP1636398A1 (en) 2006-03-22

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