JP2007515675A5 - - Google Patents
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- Publication number
- JP2007515675A5 JP2007515675A5 JP2006542612A JP2006542612A JP2007515675A5 JP 2007515675 A5 JP2007515675 A5 JP 2007515675A5 JP 2006542612 A JP2006542612 A JP 2006542612A JP 2006542612 A JP2006542612 A JP 2006542612A JP 2007515675 A5 JP2007515675 A5 JP 2007515675A5
- Authority
- JP
- Japan
- Prior art keywords
- photoreactive composition
- substantially inorganic
- unreacted
- particles
- beams
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 claims 9
- 239000002245 particle Substances 0.000 claims 3
- 230000000737 periodic effect Effects 0.000 claims 2
- 230000005855 radiation Effects 0.000 claims 2
- 239000011800 void material Substances 0.000 claims 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- 239000010954 inorganic particle Substances 0.000 claims 1
- 238000005305 interferometry Methods 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 229910001512 metal fluoride Inorganic materials 0.000 claims 1
- 229910044991 metal oxide Inorganic materials 0.000 claims 1
- 150000004706 metal oxides Chemical class 0.000 claims 1
- 239000003504 photosensitizing agent Substances 0.000 claims 1
- 238000000197 pyrolysis Methods 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/728,490 US20050124712A1 (en) | 2003-12-05 | 2003-12-05 | Process for producing photonic crystals |
| PCT/US2004/038644 WO2005062091A2 (en) | 2003-12-05 | 2004-11-18 | Process for producing photonic crystals by irradiation of a photoreactive material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2007515675A JP2007515675A (ja) | 2007-06-14 |
| JP2007515675A5 true JP2007515675A5 (https=) | 2008-01-10 |
Family
ID=34633729
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006542612A Pending JP2007515675A (ja) | 2003-12-05 | 2004-11-18 | フォトニック結晶の製造方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20050124712A1 (https=) |
| EP (1) | EP1706768A2 (https=) |
| JP (1) | JP2007515675A (https=) |
| KR (1) | KR20060124667A (https=) |
| CN (1) | CN100468104C (https=) |
| WO (1) | WO2005062091A2 (https=) |
Families Citing this family (58)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100845565B1 (ko) * | 2003-12-01 | 2008-07-10 | 더 보드 오브 트러스티즈 오브 더 유니버시티 오브 일리노이 | 나노스케일 3차원 구조물의 제조방법 및 장치 |
| JP4430622B2 (ja) * | 2003-12-05 | 2010-03-10 | スリーエム イノベイティブ プロパティズ カンパニー | フォトニック結晶の製造方法 |
| US20080055581A1 (en) * | 2004-04-27 | 2008-03-06 | Rogers John A | Devices and methods for pattern generation by ink lithography |
| KR101260981B1 (ko) | 2004-06-04 | 2013-05-10 | 더 보오드 오브 트러스티스 오브 더 유니버시티 오브 일리노이즈 | 인쇄가능한 반도체소자들의 제조 및 조립방법과 장치 |
| US7799699B2 (en) * | 2004-06-04 | 2010-09-21 | The Board Of Trustees Of The University Of Illinois | Printable semiconductor structures and related methods of making and assembling |
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| US20080233051A1 (en) * | 2006-09-08 | 2008-09-25 | Prasad Paras N | Nanoparticles for two-photon activated photodynamic therapy and imaging |
| WO2008097495A1 (en) * | 2007-02-02 | 2008-08-14 | Massachusetts Institute Of Technology | Three-dimensional particles and related methods including interference lithography |
| US8722182B2 (en) * | 2007-04-16 | 2014-05-13 | Nitto Denko Corporation | Polarizing plate, optical film and image display |
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| IL196690A0 (en) * | 2008-05-29 | 2011-08-01 | Plasan Sasa Ltd | Interchangeable door |
| US8097926B2 (en) | 2008-10-07 | 2012-01-17 | Mc10, Inc. | Systems, methods, and devices having stretchable integrated circuitry for sensing and delivering therapy |
| JP5646492B2 (ja) | 2008-10-07 | 2014-12-24 | エムシー10 インコーポレイテッドMc10,Inc. | 伸縮可能な集積回路およびセンサアレイを有する装置 |
| US8389862B2 (en) | 2008-10-07 | 2013-03-05 | Mc10, Inc. | Extremely stretchable electronics |
| US8886334B2 (en) | 2008-10-07 | 2014-11-11 | Mc10, Inc. | Systems, methods, and devices using stretchable or flexible electronics for medical applications |
| US8372726B2 (en) | 2008-10-07 | 2013-02-12 | Mc10, Inc. | Methods and applications of non-planar imaging arrays |
| CN101881856B (zh) * | 2009-05-06 | 2012-04-25 | 中国科学院半导体研究所 | 一种调节GaAs基二维光子晶体微腔共振模式的方法 |
| TWI573185B (zh) | 2009-05-12 | 2017-03-01 | 美國伊利諾大學理事會 | 用於可變形及半透明顯示器之超薄微刻度無機發光二極體之印刷總成 |
| WO2011041727A1 (en) | 2009-10-01 | 2011-04-07 | Mc10, Inc. | Protective cases with integrated electronics |
| CN101727010B (zh) * | 2009-12-03 | 2011-11-09 | 吉林大学 | 利用多光束干涉光刻技术制备仿生彩色超疏水涂层的方法 |
| EP2513953B1 (en) | 2009-12-16 | 2017-10-18 | The Board of Trustees of the University of Illionis | Electrophysiology using conformal electronics |
| WO2011115643A1 (en) | 2010-03-17 | 2011-09-22 | The Board Of Trustees Of The University Of Illinois | Implantable biomedical devices on bioresorbable substrates |
| US9936574B2 (en) | 2009-12-16 | 2018-04-03 | The Board Of Trustees Of The University Of Illinois | Waterproof stretchable optoelectronics |
| US10441185B2 (en) | 2009-12-16 | 2019-10-15 | The Board Of Trustees Of The University Of Illinois | Flexible and stretchable electronic systems for epidermal electronics |
| JP5530522B2 (ja) * | 2010-07-26 | 2014-06-25 | 浜松ホトニクス株式会社 | 半導体デバイスの製造方法 |
| US9765934B2 (en) | 2011-05-16 | 2017-09-19 | The Board Of Trustees Of The University Of Illinois | Thermally managed LED arrays assembled by printing |
| KR102000302B1 (ko) | 2011-05-27 | 2019-07-15 | 엠씨10, 인크 | 전자, 광학, 및/또는 기계 장치 및 시스템, 그리고 이를 제조하기 위한 방법 |
| US8934965B2 (en) | 2011-06-03 | 2015-01-13 | The Board Of Trustees Of The University Of Illinois | Conformable actively multiplexed high-density surface electrode array for brain interfacing |
| JP5995963B2 (ja) * | 2011-06-08 | 2016-09-21 | スリーエム イノベイティブ プロパティズ カンパニー | ポリマー連結ナノ粒子を含有するフォトレジスト |
| WO2013089867A2 (en) | 2011-12-01 | 2013-06-20 | The Board Of Trustees Of The University Of Illinois | Transient devices designed to undergo programmable transformations |
| US9554484B2 (en) | 2012-03-30 | 2017-01-24 | The Board Of Trustees Of The University Of Illinois | Appendage mountable electronic devices conformable to surfaces |
| US9171794B2 (en) | 2012-10-09 | 2015-10-27 | Mc10, Inc. | Embedding thin chips in polymer |
| EP3044176A1 (en) * | 2013-09-10 | 2016-07-20 | Saint-Gobain Glass France | Laser process for the modification of metallic nanoparticles on large size glass substrates |
| US10133174B2 (en) | 2013-12-06 | 2018-11-20 | 3M Innovative Properties Company | Liquid photoreactive composition and method of fabricating structures |
| US9849464B2 (en) | 2014-04-18 | 2017-12-26 | The Regents Of The University Of Michigan | Devices and methods for spatially and temporally reconfigurable assembly of colloidal crystals |
| WO2016176350A1 (en) | 2015-04-27 | 2016-11-03 | The Regents Of The University Of Michigan | Durable icephobic surfaces |
| CN104795482B (zh) * | 2015-05-08 | 2017-10-03 | 大连民族学院 | 一种led光子晶体的制备方法 |
| BR112017025609A2 (pt) | 2015-06-01 | 2018-08-07 | The Board Of Trustees Of The University Of Illinois | sistemas eletrônicos miniaturizados com potência sem fio e capacidades de comunicação de campo próximo |
| BR112017025616A2 (en) | 2015-06-01 | 2018-08-07 | The Board Of Trustees Of The University Of Illinois | alternative approach to uv capture |
| CN105218708A (zh) * | 2015-10-13 | 2016-01-06 | 浙江理工大学 | 一种引发自由基、阳离子聚合的可见光引发体系 |
| US10925543B2 (en) | 2015-11-11 | 2021-02-23 | The Board Of Trustees Of The University Of Illinois | Bioresorbable silicon electronics for transient implants |
| CN105693903B (zh) * | 2016-02-02 | 2017-10-24 | 东华大学 | 一种基于光子晶体结构色防伪图案的制备方法 |
| EP3306394B1 (en) * | 2016-10-07 | 2019-12-04 | Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. | Method for producing a structure with spatial encoded functionality |
| CN106810707B (zh) * | 2017-01-20 | 2019-11-15 | 哈尔滨工业大学 | 一种可通电膨胀胶体晶体薄膜的制备方法 |
| CN107045158A (zh) * | 2017-03-27 | 2017-08-15 | 邵洪峰 | 一种光纤,其制备方法及其光纤光栅阵列 |
| WO2019190706A2 (en) | 2018-03-05 | 2019-10-03 | The Regents Of The University Of Michigan | Anti-icing surfaces exhibiting low interfacial toughness with ice |
| CN110456614B (zh) * | 2019-07-18 | 2022-03-08 | 北京工业大学 | 一种甲基丙烯酸明胶水凝胶的飞秒激光内部光聚合直写加工方法 |
| CN114502662A (zh) | 2019-10-03 | 2022-05-13 | 3M创新有限公司 | 采用自由基介导固化的有机硅弹性体 |
| US20220250961A1 (en) * | 2021-02-09 | 2022-08-11 | Bonsens Ab | Method and apparatus for additively forming an optical component |
| CN114182546B (zh) * | 2021-12-08 | 2023-07-14 | 华东师范大学 | 一种光子晶体结构色织物及其制备方法和应用 |
| US12504579B2 (en) * | 2022-08-30 | 2025-12-23 | Taiwan Semiconductor Manufacturing Company, Ltd. | Wavelength tuning in silicon photonics |
| CN115976647B (zh) * | 2022-09-06 | 2024-10-01 | 中国科学院福建物质结构研究所 | 一种晶体材料及其制备方法和应用 |
| CN118064980B (zh) * | 2024-02-20 | 2025-03-21 | 同济大学 | 一种半有机锑氟酸盐二阶非线性光学晶体材料及其制备和应用 |
Family Cites Families (62)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US372313A (en) * | 1887-11-01 | Egbert iiaines | ||
| US2801185A (en) * | 1952-05-16 | 1957-07-30 | Du Pont | Silica hydrosol powder |
| US3018262A (en) * | 1957-05-01 | 1962-01-23 | Shell Oil Co | Curing polyepoxides with certain metal salts of inorganic acids |
| NL128404C (https=) * | 1959-12-24 | |||
| US3808006A (en) * | 1971-12-06 | 1974-04-30 | Minnesota Mining & Mfg | Photosensitive material containing a diaryliodium compound, a sensitizer and a color former |
| US3779778A (en) * | 1972-02-09 | 1973-12-18 | Minnesota Mining & Mfg | Photosolubilizable compositions and elements |
| US3741769A (en) * | 1972-10-24 | 1973-06-26 | Minnesota Mining & Mfg | Novel photosensitive polymerizable systems and their use |
| AU497960B2 (en) * | 1974-04-11 | 1979-01-25 | Minnesota Mining And Manufacturing Company | Photopolymerizable compositions |
| US4250053A (en) * | 1979-05-21 | 1981-02-10 | Minnesota Mining And Manufacturing Company | Sensitized aromatic iodonium or aromatic sulfonium salt photoinitiator systems |
| US4279717A (en) * | 1979-08-03 | 1981-07-21 | General Electric Company | Ultraviolet curable epoxy silicone coating compositions |
| US4406992A (en) * | 1981-04-20 | 1983-09-27 | Kulite Semiconductor Products, Inc. | Semiconductor pressure transducer or other product employing layers of single crystal silicon |
| US4491628A (en) * | 1982-08-23 | 1985-01-01 | International Business Machines Corporation | Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone |
| US4522958A (en) * | 1983-09-06 | 1985-06-11 | Ppg Industries, Inc. | High-solids coating composition for improved rheology control containing chemically modified inorganic microparticles |
| US4642126A (en) * | 1985-02-11 | 1987-02-10 | Norton Company | Coated abrasives with rapidly curable adhesives and controllable curvature |
| US4652274A (en) * | 1985-08-07 | 1987-03-24 | Minnesota Mining And Manufacturing Company | Coated abrasive product having radiation curable binder |
| US4751138A (en) * | 1986-08-11 | 1988-06-14 | Minnesota Mining And Manufacturing Company | Coated abrasive having radiation curable binder |
| CA1323949C (en) * | 1987-04-02 | 1993-11-02 | Michael C. Palazzotto | Ternary photoinitiator system for addition polymerization |
| US4735632A (en) * | 1987-04-02 | 1988-04-05 | Minnesota Mining And Manufacturing Company | Coated abrasive binder containing ternary photoinitiator system |
| US4859572A (en) * | 1988-05-02 | 1989-08-22 | Eastman Kodak Company | Dye sensitized photographic imaging system |
| US4963471A (en) * | 1989-07-14 | 1990-10-16 | E. I. Du Pont De Nemours And Company | Holographic photopolymer compositions and elements for refractive index imaging |
| US5142385A (en) * | 1989-07-18 | 1992-08-25 | Massachusetts Institute Of Technology | Holographic lithography |
| US5238744A (en) * | 1990-08-16 | 1993-08-24 | Minnesota Mining And Manufacturing Company | Tough polymeric mixtures |
| TW268969B (https=) * | 1992-10-02 | 1996-01-21 | Minnesota Mining & Mfg | |
| US5335240A (en) * | 1992-12-22 | 1994-08-02 | Iowa State University Research Foundation, Inc. | Periodic dielectric structure for production of photonic band gap and devices incorporating the same |
| US5406573A (en) * | 1992-12-22 | 1995-04-11 | Iowa State University Research Foundation | Periodic dielectric structure for production of photonic band gap and method for fabricating the same |
| EP0678196B1 (en) * | 1993-01-08 | 2002-04-10 | Massachusetts Institute Of Technology | Low-loss optical and optoelectronic integrated circuits |
| US5440421A (en) * | 1994-05-10 | 1995-08-08 | Massachusetts Institute Of Technology | Three-dimensional periodic dielectric structures having photonic bandgaps |
| US5600483A (en) * | 1994-05-10 | 1997-02-04 | Massachusetts Institute Of Technology | Three-dimensional periodic dielectric structures having photonic bandgaps |
| US5856373A (en) * | 1994-10-31 | 1999-01-05 | Minnesota Mining And Manufacturing Company | Dental visible light curable epoxy system with enhanced depth of cure |
| US5648407A (en) * | 1995-05-16 | 1997-07-15 | Minnesota Mining And Manufacturing Company | Curable resin sols and fiber-reinforced composites derived therefrom |
| US5739796A (en) * | 1995-10-30 | 1998-04-14 | The United States Of America As Represented By The Secretary Of The Army | Ultra-wideband photonic band gap crystal having selectable and controllable bad gaps and methods for achieving photonic band gaps |
| US6054007A (en) * | 1997-04-09 | 2000-04-25 | 3M Innovative Properties Company | Method of forming shaped adhesives |
| US6025406A (en) * | 1997-04-11 | 2000-02-15 | 3M Innovative Properties Company | Ternary photoinitiator system for curing of epoxy resins |
| US5998495A (en) * | 1997-04-11 | 1999-12-07 | 3M Innovative Properties Company | Ternary photoinitiator system for curing of epoxy/polyol resin compositions |
| GB9717407D0 (en) * | 1997-08-18 | 1997-10-22 | Isis Innovation | Photonic crystal materials and a method of preparation thereof |
| US5770737A (en) * | 1997-09-18 | 1998-06-23 | The United States Of America As Represented By The Secretary Of The Air Force | Asymmetrical dyes with large two-photon absorption cross-sections |
| US5859251A (en) * | 1997-09-18 | 1999-01-12 | The United States Of America As Represented By The Secretary Of The Air Force | Symmetrical dyes with large two-photon absorption cross-sections |
| US6569602B1 (en) * | 1998-10-05 | 2003-05-27 | E. I. Du Pont De Nemours And Company | Ionization radiation imageable photopolymer compositions |
| US6100405A (en) * | 1999-06-15 | 2000-08-08 | The United States Of America As Represented By The Secretary Of The Air Force | Benzothiazole-containing two-photon chromophores exhibiting strong frequency upconversion |
| GB9922196D0 (en) * | 1999-09-20 | 1999-11-17 | Isis Innovation | Photonic crystal materials |
| TWI228179B (en) * | 1999-09-24 | 2005-02-21 | Toshiba Corp | Process and device for producing photonic crystal, and optical element |
| JP2001194780A (ja) * | 2000-01-11 | 2001-07-19 | Nippon Sheet Glass Co Ltd | パターン膜被覆物品の製造方法および感光性組成物 |
| WO2001066833A1 (en) * | 2000-03-06 | 2001-09-13 | University Of Connecticut | Apparatus and method for fabrication of photonic crystals |
| KR100795759B1 (ko) * | 2000-06-15 | 2008-01-21 | 쓰리엠 이노베이티브 프로퍼티즈 캄파니 | 미세유체 물품의 제조 방법 |
| US7381516B2 (en) * | 2002-10-02 | 2008-06-03 | 3M Innovative Properties Company | Multiphoton photosensitization system |
| WO2001096917A2 (en) * | 2000-06-15 | 2001-12-20 | 3M Innovative Properties Company | Multiphoton curing to provide encapsulated optical elements |
| US7005229B2 (en) * | 2002-10-02 | 2006-02-28 | 3M Innovative Properties Company | Multiphoton photosensitization method |
| US7265161B2 (en) * | 2002-10-02 | 2007-09-04 | 3M Innovative Properties Company | Multi-photon reactive compositions with inorganic particles and method for fabricating structures |
| EP1292863A2 (en) * | 2000-06-15 | 2003-03-19 | 3M Innovative Properties Company | Multiphoton absorption method using patterned light |
| JP4965052B2 (ja) * | 2000-06-15 | 2012-07-04 | スリーエム イノベイティブ プロパティズ カンパニー | 3次元光学素子の加工方法 |
| CA2363277A1 (en) * | 2000-11-17 | 2002-05-17 | Ovidiu Toader | Photonic band gap materials based on spiral posts in a lattice |
| US6858079B2 (en) * | 2000-11-28 | 2005-02-22 | Nec Laboratories America, Inc. | Self-assembled photonic crystals and methods for manufacturing same |
| WO2002061765A1 (en) * | 2001-01-29 | 2002-08-08 | Jsr Corporation | Composite particle for dielectrics, ultramicroparticulate composite resin particle, composition for forming dielectrics and use thereof |
| US20040012872A1 (en) * | 2001-06-14 | 2004-01-22 | Fleming Patrick R | Multiphoton absorption method using patterned light |
| US6593392B2 (en) * | 2001-06-22 | 2003-07-15 | Corning Incorporated | Curable halogenated compositions |
| US6656990B2 (en) * | 2001-07-11 | 2003-12-02 | Corning Incorporated | Curable high refractive index compositions |
| JP2004126312A (ja) * | 2002-10-03 | 2004-04-22 | Japan Science & Technology Corp | 三次元ホログラフィック記録方法および三次元ホログラフィック記録装置 |
| US7008757B2 (en) * | 2002-12-17 | 2006-03-07 | Lucent Technologies Inc. | Patterned structures of high refractive index materials |
| US7168266B2 (en) * | 2003-03-06 | 2007-01-30 | Lucent Technologies Inc. | Process for making crystalline structures having interconnected pores and high refractive index contrasts |
| US20040198582A1 (en) * | 2003-04-01 | 2004-10-07 | Borrelli Nicholas F. | Optical elements and methods of making optical elements |
| US7106519B2 (en) * | 2003-07-31 | 2006-09-12 | Lucent Technologies Inc. | Tunable micro-lens arrays |
| US7118842B2 (en) * | 2003-09-30 | 2006-10-10 | Samsung Electronics Company | Charge adjuvant delivery system and methods |
-
2003
- 2003-12-05 US US10/728,490 patent/US20050124712A1/en not_active Abandoned
-
2004
- 2004-11-18 WO PCT/US2004/038644 patent/WO2005062091A2/en not_active Ceased
- 2004-11-18 KR KR1020067013393A patent/KR20060124667A/ko not_active Withdrawn
- 2004-11-18 JP JP2006542612A patent/JP2007515675A/ja active Pending
- 2004-11-18 EP EP04811371A patent/EP1706768A2/en not_active Ceased
- 2004-11-18 CN CNB2004800406486A patent/CN100468104C/zh not_active Expired - Fee Related
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