JP2007503723A5 - - Google Patents

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Publication number
JP2007503723A5
JP2007503723A5 JP2006524747A JP2006524747A JP2007503723A5 JP 2007503723 A5 JP2007503723 A5 JP 2007503723A5 JP 2006524747 A JP2006524747 A JP 2006524747A JP 2006524747 A JP2006524747 A JP 2006524747A JP 2007503723 A5 JP2007503723 A5 JP 2007503723A5
Authority
JP
Japan
Prior art keywords
modulator
soft
extreme ultraviolet
rays
lithographic apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006524747A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007503723A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2004/027049 external-priority patent/WO2005019936A2/en
Publication of JP2007503723A publication Critical patent/JP2007503723A/ja
Publication of JP2007503723A5 publication Critical patent/JP2007503723A5/ja
Pending legal-status Critical Current

Links

JP2006524747A 2003-08-22 2004-08-19 光学アドレス式極紫外線モジュレータ及びこのモジュレータを含むリソグラフィー装置 Pending JP2007503723A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US49720403P 2003-08-22 2003-08-22
PCT/US2004/027049 WO2005019936A2 (en) 2003-08-22 2004-08-19 Optically addressed extreme ultraviolet modulator and lithography system incorporating modulator

Publications (2)

Publication Number Publication Date
JP2007503723A JP2007503723A (ja) 2007-02-22
JP2007503723A5 true JP2007503723A5 (enExample) 2007-10-04

Family

ID=34216097

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006524747A Pending JP2007503723A (ja) 2003-08-22 2004-08-19 光学アドレス式極紫外線モジュレータ及びこのモジュレータを含むリソグラフィー装置

Country Status (4)

Country Link
US (1) US7079306B2 (enExample)
EP (1) EP1664930A2 (enExample)
JP (1) JP2007503723A (enExample)
WO (1) WO2005019936A2 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9097983B2 (en) 2011-05-09 2015-08-04 Kenneth C. Johnson Scanned-spot-array EUV lithography system
US8994920B1 (en) 2010-05-07 2015-03-31 Kenneth C. Johnson Optical systems and methods for absorbance modulation
US9188874B1 (en) 2011-05-09 2015-11-17 Kenneth C. Johnson Spot-array imaging system for maskless lithography and parallel confocal microscopy
WO2015012982A1 (en) * 2013-07-22 2015-01-29 Johnson Kenneth C Scanned-spot-array duv lithography system
US8111380B2 (en) * 2007-09-14 2012-02-07 Luminescent Technologies, Inc. Write-pattern determination for maskless lithography
DE102010025222A1 (de) * 2010-06-23 2011-12-29 Carl Zeiss Smt Gmbh Steuerbare Spiegelanordnung, optisches System mit einer steuerbaren Spiegelanordnung und Verfahren zur Ansteuerung einer steuerbaren Spiegelanordnung
US8653454B2 (en) 2011-07-13 2014-02-18 Luminescent Technologies, Inc. Electron-beam image reconstruction
JP7356439B2 (ja) * 2018-04-03 2023-10-04 エーエスエムエル ネザーランズ ビー．ブイ． 光ビームの空間変調

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5178445A (en) 1989-06-09 1993-01-12 Garrett Moddel Optically addressed spatial light modulator
US5177628A (en) 1990-04-24 1993-01-05 The University Of Colorado Foundation, Inc. Self-powered optically addressed spatial light modulator
US5486936A (en) 1992-03-25 1996-01-23 Tomoegawa Paper Co., Ltd. Optically addressed spatial light modulator
EP0583114B1 (en) 1992-07-30 2001-09-12 Hamamatsu Photonics K.K. Optically-addressed type spatial light modulator
JP2695600B2 (ja) 1993-10-01 1997-12-24 浜松ホトニクス株式会社 光学検査装置
US5617203A (en) 1993-10-01 1997-04-01 Hamamatsu Photonics K.K. Optical detector employing an optically-addressed spatial light modulator
US5637883A (en) 1995-02-27 1997-06-10 The United States Of America As Represented By The Secretary Of The Navy Optically addressed spatial light modulator using an intrinsic semiconductor active material and high resistivity cladding layers
US5691836A (en) 1995-07-11 1997-11-25 Sy Technology, Inc. Optically addressed spatial light modulator and method
US5691541A (en) 1996-05-14 1997-11-25 The Regents Of The University Of California Maskless, reticle-free, lithography
US6025950A (en) 1997-09-22 2000-02-15 Coretek, Inc. Monolithic all-semiconductor optically addressed spatial light modulator based on low-photoconductive semiconductors
KR100280832B1 (ko) * 1997-12-02 2001-04-02 정선종 노광 장비용 프로그래머블 마스크
SE9800665D0 (sv) * 1998-03-02 1998-03-02 Micronic Laser Systems Ab Improved method for projection printing using a micromirror SLM
JP2961230B1 (ja) 1998-07-13 1999-10-12 工業技術院長 金属超微粒子分散体及びその製造方法
US6489984B1 (en) * 1998-12-29 2002-12-03 Kenneth C. Johnson Pixel cross talk suppression in digital microprinters
US6498685B1 (en) 1999-01-11 2002-12-24 Kenneth C. Johnson Maskless, microlens EUV lithography system
US6159643A (en) * 1999-03-01 2000-12-12 Advanced Micro Devices, Inc. Extreme ultraviolet lithography reflective mask
US6140660A (en) 1999-03-23 2000-10-31 Massachusetts Institute Of Technology Optical synthetic aperture array
US6366389B1 (en) 1999-08-17 2002-04-02 Michael Wraback High contrast, ultrafast optically-addressed ultraviolet light modulator based upon optical anisotropy
SE517550C2 (sv) * 2000-04-17 2002-06-18 Micronic Laser Systems Ab Mönstergenereringssystem användande en spatialljusmodulator
FR2809190B1 (fr) 2000-05-22 2002-08-09 Centre Nat Rech Scient Procede de fabrication d'un modulateur de transmission pour microlithographie en ultraviolet profond et modulateur obtenu par ce procede
US6479195B1 (en) * 2000-09-15 2002-11-12 Intel Corporation Mask absorber for extreme ultraviolet lithography

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