JP2007324256A - Led apparatus - Google Patents

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JP2007324256A
JP2007324256A JP2006150913A JP2006150913A JP2007324256A JP 2007324256 A JP2007324256 A JP 2007324256A JP 2006150913 A JP2006150913 A JP 2006150913A JP 2006150913 A JP2006150913 A JP 2006150913A JP 2007324256 A JP2007324256 A JP 2007324256A
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led chip
led
case
light
lead frame
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JP4973011B2 (en
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Shoken Koseki
正賢 古関
Toshio Yamaguchi
寿夫 山口
Yuuki Ito
優輝 伊藤
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Toyoda Gosei Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched

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Abstract

<P>PROBLEM TO BE SOLVED: To prevent the deterioration of light extraction efficiency from an LED apparatus due to the discoloration of a metal part such as a lead frame etc. caused by the high gas transmissivity of silicon resin when the silicon resin is used as the sealant for sealing an LED chip. <P>SOLUTION: In the LED apparatus using the silicon resin as the sealant for sealing the LED chip, the metal part such as the lead frame etc. is covered with a layer of a translucent inorganic material such as sol gel glass etc. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明はLED装置に関する。   The present invention relates to an LED device.

従来のLED装置では、LEDチップを封止材としてエポキシ樹脂等の透光性樹脂で被覆していたが、LEDチップの高出力化に伴い、LEDチップ回りのエポキシ樹脂の変色(黄変)が問題となってきた。
そのため、エポキシ樹脂の代りに耐熱性、耐光性の高い材料であるシリコーン樹脂が封止材として採用されつつある。
他方、LEDチップをゾルゲルガラスで囲繞することも検討されている(特許文献1及び特許文献2参照)。
In the conventional LED device, the LED chip is covered with a light-transmitting resin such as an epoxy resin as a sealing material. However, as the output of the LED chip increases, the color of the epoxy resin around the LED chip changes (yellowing). It has become a problem.
Therefore, a silicone resin, which is a material having high heat resistance and high light resistance, is being adopted as a sealing material instead of an epoxy resin.
On the other hand, surrounding the LED chip with sol-gel glass has also been studied (see Patent Document 1 and Patent Document 2).

特開2005−11933号公報JP 2005-11933 A 特開2002−203989号公報Japanese Patent Laid-Open No. 2002-203989

本発明者らは、LED装置の耐久性を向上すべく鋭意検討を重ねてきたところ、下記の課題を見出すに至った。
シリコーン樹脂はLEDチップの回りにおいてもほとんど変色しない。しかしながら、ガス透過性が高いため、LEDチップ内の金属が徐々に酸化されて変色するおそれがある。かかる金属としてリードフレームや反射層を挙げることができる。当該金属の表面は鏡面化されており、LED装置からの光取出し効率を向上させている。しかし、金属表面の酸化に伴い光反射率が低下する。これが原因となり、シリコーン樹脂を封止材として用いた場合には、LED装置に所望の光取出し効率を維持させることが困難であった。
他方、特許文献1に開示されるように封止材の全てをガラス材料とすると、封止材が割れやすくなり、機械的強度の点に課題が残る。
なお、特許文献2においては封止材の全てをガラス材料とするのではなく、LEDチップをガラス層で囲繞する構成が開示されている。しかしながら、リードフレーム等の金属部分をガラス層で被覆することは何ら開示ないし示唆されていない。従って、封止材にシリコーン樹脂を採用した場合には金属部分の変色にともなう光取出し効率の低下を依然として免れない。
The inventors of the present invention have intensively studied to improve the durability of the LED device, and have found the following problems.
Silicone resin hardly discolors around the LED chip. However, since the gas permeability is high, the metal in the LED chip may be gradually oxidized and discolored. Examples of such a metal include a lead frame and a reflective layer. The surface of the metal is mirror-finished to improve the light extraction efficiency from the LED device. However, the light reflectance decreases with the oxidation of the metal surface. For this reason, when a silicone resin is used as a sealing material, it is difficult for the LED device to maintain a desired light extraction efficiency.
On the other hand, when all of the sealing material is made of a glass material as disclosed in Patent Document 1, the sealing material is easily broken, and a problem remains in terms of mechanical strength.
Patent Document 2 discloses a configuration in which an LED chip is surrounded by a glass layer, instead of using all of the sealing material as a glass material. However, there is no disclosure or suggestion of coating a metal part such as a lead frame with a glass layer. Therefore, when a silicone resin is used as the sealing material, the reduction in light extraction efficiency due to the discoloration of the metal part is still inevitable.

この発明は上記課題を解決すべくなされたものであり、その構成は次のように規定される。
LEDチップ、該LEDチップのケース及び該ケース内へ充填されて前記LEDチップを囲繞するシリコーン封止材を備えてなるLED装置であって、
前記ケース内において金属の部分が透光性の無機材料層で被覆されている、ことを特徴とするLED装置。
The present invention has been made to solve the above-mentioned problems, and its configuration is defined as follows.
An LED device comprising an LED chip, a case of the LED chip, and a silicone sealing material filled in the case and surrounding the LED chip,
An LED device, wherein a metal portion is covered with a light-transmitting inorganic material layer in the case.

このように構成されたLED装置によれば、金属部分が透光性の無機材料で被覆されているので、金属部分の変色を確実に防止できる。これにより、金属部分の反射率が維持され、LED装置としての光取出し効率の低下が防止される。当該光取出し効率の維持には、封止材にシリコーン樹脂を用いたことによる変色防止効果も寄与している。   According to the LED device configured as described above, since the metal portion is coated with the light-transmitting inorganic material, discoloration of the metal portion can be reliably prevented. As a result, the reflectance of the metal portion is maintained, and a decrease in light extraction efficiency as the LED device is prevented. In maintaining the light extraction efficiency, the effect of preventing discoloration due to the use of a silicone resin as the sealing material also contributes.

上記において透光性の無機材料としては、ガラス若しくはハイブリッド材料等を用いることができる。ガラスにはゾルゲルガラスを用いることが好ましい。ゾルゲルガラスは低温で膜成形できるためである。ゾルゲルガラスは通常のガラスに比べるとその密度が小さいが、シリコーン樹脂に比べると格段にその密度が大きいため、殆ど通気性を有さない。かかるゾルゲルガラスの組成はSiO2であるが、これにPBO,ZnO,Al2O3等を配合することもできる。 In the above, as the light-transmitting inorganic material, glass, a hybrid material, or the like can be used. It is preferable to use sol-gel glass as the glass. This is because sol-gel glass can be formed into a film at a low temperature. Although the density of sol-gel glass is smaller than that of ordinary glass, since the density is much higher than that of silicone resin, it has almost no air permeability. The composition of such sol-gel glass is SiO 2 , but PBO, ZnO, Al 2 O 3 or the like can be blended therein.

ハイブリッド材料としては、例えば化学式Ml+(OR l−m(式中R1は炭素数1〜5の炭化水素基、アルコキシアルキル基またはアシル基、R2はビニル、アミノ、イミノ、エポキシ、アクリロイルオキシ、メタクリロイルオキシ、フェニル、メルカプト及びアルキル基から選ばれる少なくとも一種類を含む有機基、lはMの価数で、l及びmは整数を表す)で表されるアルコキシド化合物の加水分解物及び加水分解・縮重合物の混合物を用いることができる。ここにMはSi、Al、Zr、Ti等の元素を用いることができる。 Examples of the hybrid material include chemical formula M 1+ (OR 1 ) m R 2 1−m (wherein R 1 is a hydrocarbon group having 1 to 5 carbon atoms, an alkoxyalkyl group or an acyl group, R 2 is vinyl, amino, imino. An organic group containing at least one selected from epoxy, acryloyloxy, methacryloyloxy, phenyl, mercapto and alkyl groups, l is a valence of M, and l and m are integers). A mixture of a decomposition product and a hydrolysis / condensation polymerization product can be used. Here, M can use an element such as Si, Al, Zr, or Ti.

一般式Ml+(OR l−mで表されるアルコキシド化合物の加水分解・縮重合は次のようにして行われる。

Figure 2007324256
Hydrolysis / condensation polymerization of the alkoxide compound represented by the general formula M 1+ (OR 1 ) m R 2 1−m is performed as follows.
Figure 2007324256

かかるアルコキシド化合物の加水分解・縮重合物の混合物であり、水と同程度の流動性を有する。
上記において金属元素MがSiのときには、次に示されるシラン化合物を用いることができる。ビニルトリメトキシシラン、ビニルトリエトキシシラン、ビニルトリアセトキシシラン、γ−アミノプロピルトリメトキシシラン、γ−グリシドキシプロピルトリメトキシシラン、γ−グリシドキシプロピルトリエトキシシラン、β−(3,4−エポキシシクロヘキシル)エチルトリメトキシシラン、γ−(3,4−エポキシシクロヘキシル)エチルトリエトキシシラン、γ−(メタ)アクリロキシプロピルトリメトキシシラン、フェニルトリメトキシシラン、フェニルトリアセトキシシラン、γ−メルカプトプロピルトリメトキシシラン、γ−クロロプロピルトリメトキシシラン、β−シアノエチルトリエトキシシラン、メチルトリメトキシシラン、メチルトリエトキシシラン、メチルトリプロポキシシラン、メチルトリブトキシシラン、エチルトリメトキシシラン、エチルトリエトキシシラン、テトラメトキシシラン、テトラエトキシシラン、テトラプロポキシシラン、テトラブトキシシランなどである。
It is a mixture of a hydrolyzed / condensed polymer of such an alkoxide compound and has fluidity comparable to water.
In the above, when the metal element M is Si, the following silane compounds can be used. Vinyltrimethoxysilane, vinyltriethoxysilane, vinyltriacetoxysilane, γ-aminopropyltrimethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropyltriethoxysilane, β- (3,4- Epoxycyclohexyl) ethyltrimethoxysilane, γ- (3,4-epoxycyclohexyl) ethyltriethoxysilane, γ- (meth) acryloxypropyltrimethoxysilane, phenyltrimethoxysilane, phenyltriacetoxysilane, γ-mercaptopropyltri Methoxysilane, γ-chloropropyltrimethoxysilane, β-cyanoethyltriethoxysilane, methyltrimethoxysilane, methyltriethoxysilane, methyltripropoxysilane, methyltributoxysilane, ethyl Trimethoxysilane, ethyl triethoxysilane, tetramethoxysilane, tetraethoxysilane, tetrapropoxysilane, and the like tetrabutoxysilane.

透光性の無機材料には任意の蛍光体を配合することができる。かかる蛍光体として次のものを挙げることができる。
無機系蛍光体として、以下のものを採用することができる。例えば、赤色系の発光色を有する6MgO・As:Mn、Y(PV)O:Eu、CaLa0.1Eu0.9Ga、BaY0.9Sm0.1Ga、Ca(Y0.5Eu0.5)(Ga0.5In0.5、Y:Eu、YVO:Eu、Y:Eu、3.5MgO・0.5MgFGeO:Mn、及び(Y・Cd)BO:Eu等で表わされる赤色蛍光体、青色系の発光色を有する(Ba,Ca,Mg)(POCl:Eu、(Ba,Mg)Al1627:Eu、BaMgSi:Eu、BaMgAl1627:Eu、(Sr,Ca)10(POCl:Eu、(Sr,Ca)10(POCl・nB:Eu、Sr10(POCl:Eu、(Sr,Ba,Ca)(POCl:Eu、Sr:Eu、Sr(POCl:Eu、(Sr,Ca,Ba)(POCl:Eu、SrO・P・B:Eu、(BaCa)(POCl:Eu、SrLa0.95Tm0.05Ga、ZnS:Ag、GaWO、YSiO:Ce、ZnS:Ag,Ga,Cl、CaOCl:Eu、BaMgAl:Eu、及び一般式(M1,Eu)10(POCl(M1は、Mg,Ca,Sr,及びBaからなる群から選択される少なくとも1種の元素)等で表される青色蛍光体、緑色系の発光色を有するYAl12:Ce、YSiO:Ce,Tb、SrSi・2SrCl:Eu、BaMgAl1627:Eu,Mn、ZnSiO:Mn、ZnSiO:Mn、LaPO:Tb、SrAl:Eu、SrLa0.2Tb0.8Ga、CaY0.9Pr0.1Ga、ZnGd0.8Ho0.2Ga、SrLa0.6Tb0.4Al、ZnS:Cu,Al、(Zn,Cd)S:Cu,Al、ZnS:Cu,Au,Al、ZnSiO:Mn、ZnSiO:Mn、ZnS:Ag,Cu、(Zn・Cd)S:Cu、ZnS:Cu、GdOS:Tb、LaOS:Tb、YSiO:Ce・Tb、ZnGeO:Mn、GeMgAlO:Tb、SrGaS:Eu2+、ZnS:Cu・Co、MgO・nB:Ge,Tb、LaOBr:Tb,Tm、及びLaS:Tb等で表わされる緑色蛍光体を用いることができる。また、黄色系の発光色を有するCaLu0.5Dy0.5Ga、(Y,Gd)Al12:Ce、(Ba,Sr)SiO:Euで表わされる黄色蛍光体を用いることもできる。
紫外発光LEDの場合、上記した赤色蛍光体、緑色蛍光体及び青色蛍光体を組み合わせて白色光を得ることができる。青色発光のLEDチップの場合、上記した赤色蛍光体と緑色蛍光体との組み合わせ又は黄色蛍光体との組み合わせにより白色光を得ることができる。
蛍光体に光拡散材を併用することもできる。これにより発光ムラの減少を図ることもできる。
Arbitrary fluorescent substance can be mix | blended with a translucent inorganic material. The following can be mentioned as this fluorescent substance.
The following can be employed as the inorganic phosphor. For example, 6MgO · As 2 O 5 : Mn, Y (PV) O 4 : Eu, CaLa 0.1 Eu 0.9 Ga 3 O 7 , BaY 0.9 Sm 0.1 Ga 3 having red emission color. O 7 , Ca (Y 0.5 Eu 0.5 ) (Ga 0.5 In 0.5 ) 3 O 7 , Y 3 O 3 : Eu, YVO 4 : Eu, Y 2 O 2 : Eu, 3.5 MgO • 0.5MgF 2 GeO 2 : Mn, and (Y · Cd) BO 2 : Eu and other red phosphors, blue-based (Ba, Ca, Mg) 5 (PO 4 ) 3 Cl: Eu, (Ba, Mg) 2 Al 16 O 27 : Eu, Ba 3 MgSi 2 O 8 : Eu, BaMg 2 Al 16 O 27 : Eu, (Sr, Ca) 10 (PO 4 ) 6 Cl 2 : Eu, ( sr, Ca) 10 (PO 4 ) 6 Cl 2 · nB O 3: Eu, Sr 10 ( PO 4) 6 Cl 2: Eu, (Sr, Ba, Ca) 5 (PO 4) 3 Cl: Eu, Sr 2 P 2 O 7: Eu, Sr 5 (PO 4) 3 Cl: Eu, (Sr, Ca, Ba) 3 (PO 4 ) 6 Cl: Eu, SrO · P 2 O 5 .B 2 O 5 : Eu, (BaCa) 5 (PO 4 ) 3 Cl: Eu, SrLa 0 .95 Tm 0.05 Ga 3 O 7 , ZnS: Ag, GaWO 4 , Y 2 SiO 6 : Ce, ZnS: Ag, Ga, Cl, Ca 2 B 4 OCl: Eu, BaMgAl 4 O 3 : Eu, and general A blue phosphor represented by the formula (M1, Eu) 10 (PO 4 ) 6 Cl 2 (M1 is at least one element selected from the group consisting of Mg, Ca, Sr, and Ba), etc. Y 3 Al 5 O having the emission color of 12: Ce, Y 2 SiO 5 : Ce, Tb, Sr 2 Si 3 O 8 · 2SrCl 2: Eu, BaMg 2 Al 16 O 27: Eu, Mn, ZnSiO 4: Mn, Zn 2 SiO 4: Mn, LaPO 4 : Tb, SrAl 2 O 4 : Eu, SrLa 0.2 Tb 0.8 Ga 3 O 7 , CaY 0.9 Pr 0.1 Ga 3 O 7 , ZnGd 0.8 Ho 0.2 Ga 3 O 7 , SrLa 0.6 Tb 0.4 Al 3 O 7 , ZnS: Cu, Al, (Zn, Cd) S: Cu, Al, ZnS: Cu, Au, Al, Zn 2 SiO 4 : Mn, ZnSiO 4 : Mn, ZnS : Ag, Cu, (Zn · Cd) S: Cu, ZnS: Cu, GdOS: Tb, LaOS: Tb, YSiO 4: Ce · Tb, ZnGeO 4: Mn, GeMgAlO: Tb, SrG S: Eu 2+, ZnS: Cu · Co, MgO · nB 2 O 3: Ge, Tb, LaOBr: Tb, Tm, and La 2 O 2 S: can be used green phosphor represented by Tb and the like. In addition, yellow fluorescence represented by CaLu 0.5 Dy 0.5 Ga 3 O 7 , (Y, Gd) 3 Al 5 O 12 : Ce, (Ba, Sr) 2 SiO 4 : Eu having a yellow emission color. The body can also be used.
In the case of an ultraviolet light emitting LED, white light can be obtained by combining the above-described red phosphor, green phosphor and blue phosphor. In the case of a blue light emitting LED chip, white light can be obtained by a combination of the above-described red phosphor and green phosphor or a yellow phosphor.
A light diffusing material can also be used in combination with the phosphor. As a result, light emission unevenness can be reduced.

LEDチップにはフェイスアップやフリップチップタイプを採用することができる。また、LEDパッケージとしては、トップビュータイプやサイドビュータイプのSMD、砲弾タイプ、COBタイプなどのパッケージを用いることができる。
なお、封止材の黄変が問題となるは、短波長(緑色〜紫外線)の光を発光するLEDチップであり、当該LEDチップは一般的にIII族窒化物系化合物半導体で形成されている。
ここにIII族窒化物系化合物半導体とは、一般式としてAlGaIn1−X−YN(0≦X≦1、0≦Y≦1、0≦X+Y≦1)の四元系で表され、AlN、GaN及びInNのいわゆる2元系、AlGa1−xN、AlIn1−xN及びGaIn1−xN(以上において0<x<1)のいわゆる3元系を包含する。III族元素の一部をボロン(B)、タリウム(Tl)等で置換しても良く、また、窒素(N)の一部も リン(P)、ヒ素(As)、アンチモン(Sb)、ビスマス(Bi)等で置換できる。
また、n型層にドープされるn型不純物としてSiの他、Ge、Se、Te、C等を用いることもできる。
III族窒化物系化合物半導体層を成長させる基板にはサファイア、スピネル、シリコン、炭化シリコン、酸化亜鉛、リン化ガリウム、ヒ化ガリウム、酸化マグネシウム、酸化マンガン、III族窒化物系化合物半導体単結晶等を用いることができる。
The LED chip can be face-up or flip-chip type. Further, as the LED package, a package such as a top view type or a side view type SMD, a shell type, or a COB type can be used.
The problem of yellowing of the sealing material is an LED chip that emits light of a short wavelength (green to ultraviolet), and the LED chip is generally formed of a group III nitride compound semiconductor. .
Here, the group III nitride compound semiconductor is a quaternary system of Al X Ga Y In 1- XYN (0 ≦ X ≦ 1, 0 ≦ Y ≦ 1, 0 ≦ X + Y ≦ 1) as a general formula. A so-called binary system of AlN, GaN and InN, Al x Ga 1-x N, Al x In 1-x N and Ga x In 1-x N (where 0 <x <1). Includes the system. Part of group III elements may be substituted with boron (B), thallium (Tl), etc., and part of nitrogen (N) may also be phosphorus (P), arsenic (As), antimony (Sb), bismuth. It can be replaced with (Bi) or the like.
In addition to Si, Ge, Se, Te, C, or the like can be used as the n-type impurity doped in the n-type layer.
Sapphire, spinel, silicon, silicon carbide, zinc oxide, gallium phosphide, gallium arsenide, magnesium oxide, manganese oxide, group III nitride compound semiconductor single crystal, etc. for the substrate on which the group III nitride compound semiconductor layer is grown Can be used.

LEDチップのケースはLEDチップをマウントしてこれを保護するとともに、LEDチップから放出された光を効率よく外部へ放出させる。LEDチップからの光取出し効率を向上させるため、ケース内面にも銀などの金属からなる反射層が形成される場合がある。ケースにはLEDチップへ給電するための配線材が配設されている。この配線材、例えばリードフレームの表面における反射率を向上するため、当該リードフレームには銀メッキが施される場合がある。その他、銀合金、アルミニウムやアルミニウム合金等の金属がケース内に表出して配置されることがあるが、いずれの場合においてもその表面は鏡面化されて光反射率の向上が図られている。   The LED chip case mounts and protects the LED chip and efficiently emits the light emitted from the LED chip to the outside. In order to improve the light extraction efficiency from the LED chip, a reflective layer made of metal such as silver may be formed on the inner surface of the case. The case is provided with a wiring material for supplying power to the LED chip. In order to improve the reflectance on the surface of this wiring material, for example, the lead frame, the lead frame may be subjected to silver plating. In addition, a metal such as silver alloy, aluminum, or aluminum alloy may be exposed and disposed in the case. In either case, the surface is mirrored to improve the light reflectance.

かかる金属部分が酸化されると変色するので、この発明では当該金属部分を無機材料層で被覆することとした。従って、LEDチップ自体は当該無機材料で被覆されていても被覆されていなくてもよい。
無機材料層の膜厚は特に限定されるものではないが、金属部分に対する気密性を確保でき、かつ割れが生じない厚さとなるよう任意に選択される。
Since such a metal portion is discolored when oxidized, in the present invention, the metal portion is covered with an inorganic material layer. Therefore, the LED chip itself may or may not be coated with the inorganic material.
The film thickness of the inorganic material layer is not particularly limited, but can be arbitrarily selected so as to ensure a hermeticity with respect to the metal portion and to have a thickness that does not cause cracking.

フリップチップタイプのLEDチップをゾルゲルガラスで被覆する場合、アルミナ基板の屈折率は1.7であり、ゾルゲルガラスの屈折率は1.6であり、シリコーン樹脂の屈折率は1.4であるため、光源側から大気(屈折率:1.0)までの緩やかに屈折率が傾斜することとなる。よって各層界面における反射が少なくなり、この点からも光取出し効率が向上する。   When flip chip type LED chip is covered with sol-gel glass, the refractive index of alumina substrate is 1.7, the refractive index of sol-gel glass is 1.6, and the refractive index of silicone resin is 1.4. The refractive index is gently inclined from the light source side to the atmosphere (refractive index: 1.0). Therefore, the reflection at the interface of each layer is reduced, and the light extraction efficiency is improved from this point.

次に、この発明の実施例について説明をする。
図1は、実施例のLED装置1の構造を示す断面図である。
カップ状のケース2の底部には表面に銀メッキが施されたリードフレーム4が配設されている。この実施例ではケース2の内側面にもその反射率を向上させる見地から銀メッキ(反射層)が施されている。リードフレーム4はケース2の底壁又は側壁を通して外部へ配線されている。ケース2の底部のほぼ中央に、III族窒化物系化合物半導体からなる青色LEDチップ5がD/Bペースト7を介して固定されている。このLEDチップ5にはフェイスアップタイプのSMDを採用した。LEDチップ5の表面に形成された2つのボンディングパッド(図示せず)とリードフレーム4との間にはボンディングワイヤ9が懸架されている。
LEDチップ5にはIII族窒化物系化合物半導体発光素子を用いることが好ましいが、他のタイプのLEDチップの使用を排除するものではない。
Next, examples of the present invention will be described.
FIG. 1 is a cross-sectional view showing the structure of the LED device 1 of the embodiment.
A lead frame 4 having a surface plated with silver is disposed at the bottom of the cup-shaped case 2. In this embodiment, the inner surface of the case 2 is also silver-plated (reflective layer) from the viewpoint of improving the reflectance. The lead frame 4 is wired outside through the bottom wall or side wall of the case 2. A blue LED chip 5 made of a group III nitride compound semiconductor is fixed via a D / B paste 7 at substantially the center of the bottom of the case 2. The LED chip 5 is a face-up type SMD. A bonding wire 9 is suspended between two bonding pads (not shown) formed on the surface of the LED chip 5 and the lead frame 4.
Although it is preferable to use a group III nitride compound semiconductor light emitting element for the LED chip 5, it does not exclude the use of other types of LED chips.

図中の符号11はガラス層であり、この実施例ではLEDチップ5も含めてケース2の内面全域を被覆している。その結果、リードフレーム4はガラス層11で完全に被覆されている。また、ケース2の内側面(銀メッキされている)もガラス層11で被覆される。
ガラス層11にはゾルゲルガラス(無機系(溶剤型))を採用した。LEDチップ5及びボンディングワイヤ9が組付けられたケース2内に硬化前のゾルゲルガラスをポッティングする。ゾルゲルガラス(硬化前)の表面張力及びその粘着性により、ゾルゲルガラス(硬化前)はケース2においてその反射面、リードフレーム4の表面及びLEDチップ5の全体をほぼ同じ厚さで被覆する。ゾルゲルガラスの硬化条件は、まず100℃×10分の前処理を行い、その後に180℃×2時間とした。かかる硬化条件によれば、LEDチップ5をはじめとしてリードフレーム4やケース2に大きなストレスを与えることがない。
Reference numeral 11 in the figure denotes a glass layer, and in this embodiment, the entire inner surface of the case 2 including the LED chip 5 is covered. As a result, the lead frame 4 is completely covered with the glass layer 11. The inner side surface (silver-plated) of the case 2 is also covered with the glass layer 11.
For the glass layer 11, sol-gel glass (inorganic (solvent type)) was employed. The sol-gel glass before curing is potted in the case 2 in which the LED chip 5 and the bonding wire 9 are assembled. Due to the surface tension of the sol-gel glass (before curing) and its adhesiveness, the sol-gel glass (before curing) covers the reflective surface, the surface of the lead frame 4 and the entire LED chip 5 in the case 2 with substantially the same thickness. The curing conditions for the sol-gel glass were first pretreatment of 100 ° C. × 10 minutes, and then 180 ° C. × 2 hours. According to such curing conditions, the LED chip 5 and the lead frame 4 and the case 2 are not stressed greatly.

ガラス層11の厚さは、特に限定されるものではないが、1μm〜50μmとすることが好ましい。1μm未満であると金属部分に対する気密性に不安が残り、50μmを超えて厚くすると割れの発生確率が高くなるので、それぞれ好ましくない。ガラス層11のより好ましい厚さは1μm〜30μmであり、更に好ましくは1μm〜20μmである。
封止材13にはシリコーン樹脂(付加反応型)を用いた。このシリコーン樹脂は流動性のある状態でケース2のガラス層11の上へ充填され、そこで硬化させる。硬化条件は150℃×1時間とした。
Although the thickness of the glass layer 11 is not specifically limited, It is preferable to set it as 1 micrometer-50 micrometers. If the thickness is less than 1 μm, the airtightness with respect to the metal portion remains uneasy, and if it exceeds 50 μm, the probability of cracking increases, which is not preferable. The more preferable thickness of the glass layer 11 is 1 μm to 30 μm, and more preferably 1 μm to 20 μm.
A silicone resin (addition reaction type) was used for the sealing material 13. The silicone resin is filled onto the glass layer 11 of the case 2 in a fluid state and is cured there. The curing conditions were 150 ° C. × 1 hour.

このように構成された図1に示すLED装置1によれば、ケース2内の金属部分(ケース2の内表面、リードフレーム4)がゾルゲルガラスからなるガラス層11で被覆されるので、シリコーン樹脂からなる封止材を空気が透過してきたとしても、当該空気が金属部分に触れることを確実に防止できる。よって、当該金属部分が変色することがなく、その光反射率は低下しない。これにより、LED装置の光取出し効率が長期に渡り維持されることとなる。   According to the LED device 1 shown in FIG. 1 configured as described above, the metal portion in the case 2 (the inner surface of the case 2 and the lead frame 4) is covered with the glass layer 11 made of sol-gel glass. Even if air has permeated through the sealing material made of the above, it is possible to reliably prevent the air from touching the metal portion. Therefore, the metal part is not discolored and the light reflectance is not lowered. As a result, the light extraction efficiency of the LED device is maintained for a long time.

図2には他の実施例のLED装置21を示す。なお、図1と同一の要素については同一の符号を付してその説明を省略する。
この実施例のLED装置21ではLEDチップ25としてフリップチップタイプを採用している。符号27はバンプである。
かかる構成のLED装置21によれば、LEDチップにおける光放出面がサファイア基板(屈折率:1.7)、となりその上にガラス層(屈折率:1.6)とシリコーン樹脂(屈折率:1.4)とが順に積層される。その結果、光源から外部に向けて屈折率の変化が緩やかになり、各層間での光の反射が少なくなる。もって、光取出し効率が向上する。
FIG. 2 shows an LED device 21 of another embodiment. The same elements as those in FIG. 1 are denoted by the same reference numerals and description thereof is omitted.
The LED device 21 of this embodiment employs a flip chip type as the LED chip 25. Reference numeral 27 denotes a bump.
According to the LED device 21 having such a configuration, the light emission surface of the LED chip is a sapphire substrate (refractive index: 1.7), and a glass layer (refractive index: 1.6) and a silicone resin (refractive index: 1) thereon. 4) are stacked in order. As a result, the refractive index changes gradually from the light source to the outside, and the reflection of light between the layers is reduced. As a result, the light extraction efficiency is improved.

この発明は、上記発明の実施例の説明に何ら限定されるものではない。特許請求の範囲の記載を逸脱せず、当業者が容易に想到できる範囲で種々の変形態様もこの発明に含まれる。例えば上記した実施例では配線材としてリードフレームを用いたが、セラミックスパッケージの配線材のように金属ペーストを焼結させたものに対しても適用できる。   The present invention is not limited to the description of the embodiments of the invention. Various modifications may be included in the present invention as long as those skilled in the art can easily conceive without departing from the description of the scope of claims. For example, the lead frame is used as the wiring material in the above-described embodiments, but the present invention can also be applied to a sintered metal paste such as a ceramic package wiring material.

この発明のLED装置の構成を示す平面図である。It is a top view which shows the structure of the LED device of this invention. この発明の他の実施例のLED装置の構成を示す平面図である。It is a top view which shows the structure of the LED apparatus of the other Example of this invention.

符号の説明Explanation of symbols

1,21 LED装置
2 ケース
4 リードフレーム
5、25 LEDチップ
11 ガラス層
13 封止材
1, 21 LED device 2 Case 4 Lead frame 5, 25 LED chip 11 Glass layer 13 Sealing material

Claims (3)

LEDチップ、該LEDチップのケース及び該ケース内へ充填されて前記LEDチップを囲繞するシリコーン封止材を備えてなるLED装置であって、
前記ケース内において金属の部分が透光性の無機材料層で被覆されている、ことを特徴とするLED装置。
An LED device comprising an LED chip, a case of the LED chip, and a silicone sealing material filled in the case and surrounding the LED chip,
An LED device, wherein a metal portion is covered with a light-transmitting inorganic material layer in the case.
前記無機材料層はゾルゲルガラスからなる、ことを特徴とする請求項1に記載のLED装置。 The LED device according to claim 1, wherein the inorganic material layer is made of sol-gel glass. 前記金属の部分は配線材及び/又は反射層である、ことを特徴とする請求項1又は2に記載のLED装置。 The LED device according to claim 1, wherein the metal portion is a wiring material and / or a reflective layer.
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