JP2007316500A - Method for manufacturing optical filter, method for discriminating optical filter, and organic el display device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing an optical filter usable in a display device, a method for surely discriminating whether the optical filter is usable in the display device, and a high-reliability organic EL display device. <P>SOLUTION: The method for manufacturing the optical filter comprises the steps of: forming a color filter layer on a transparent base material; and degassing the color filter layer-formed base material. The method for discriminating the optical filter comprises the steps of: scraping away a laminate on the transparent base material of the optical filter by 10 mg; heating the scraped laminate in a nitrogen atmosphere at 220°C for 3 hours; and discriminating a non-defective product usable in the organic EL display device when a weight decrease rate (((the weight of the laminate before heated)-(the weight of the laminate after heated))/(the weight of the laminate before heated)×100) is ≤1%. The organic EL display device is provided with an organic EL element, which has a luminescent layer at the least between electrodes, arranged on the optical filter, which is manufactured by the manufacturing method, on the side opposite to the transparent base material. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to a manufacturing method and a discrimination method of an optical filter, particularly an optical filter for a display device, and an organic EL display device.

An organic EL display device using an organic electroluminescence (EL) element has high visibility due to self-emission, is an all-solid-state display device unlike a liquid crystal display device, is not significantly affected by temperature changes, In recent years, it has been put into practical use as an organic light emitting display device such as a full color display device, an area color display device, and illumination.
As an organic EL display device, for example, (1) a system in which three primary color organic EL elements are arranged in a predetermined pattern for each emission color, and (2) a white light emitting organic EL element is used, and a three primary color filter layer is formed. (3) Using a blue light emitting organic EL element, installing a color conversion phosphor layer (CCM layer) using a fluorescent dye, and converting blue light into green fluorescence or red fluorescence A CCM system that displays three primary colors has been proposed.

In such an organic EL display device, light emitted from the organic EL element passes through an optical filter including a color filter layer, a color conversion phosphor layer, and the like, and is recognized as display light by an observer. However, organic EL elements are deteriorated by gases such as water vapor, oxygen, organic monomers, and low molecular components generated from the color filter layer and color conversion phosphor layer constituting the optical filter, resulting in dark areas, dark spots, shrinkage. There was a problem of producing such defects.
In order to solve such a problem, an organic EL display device in which a passivation film (barrier layer) is interposed between an optical filter and an organic EL element has been developed (Patent Document 1).
JP 2005-276446 A

However, by forming a transparent barrier layer on the optical filter, there is a problem that the manufacturing process of the organic EL display device becomes complicated and hinders the reduction of the manufacturing cost.
On the other hand, when the transparent barrier layer is not formed on the optical filter, it is inevitable that the optical filter is a defective product after the organic EL element is formed on the optical filter, and the entire display device becomes a defective product. In order to prevent this, it is necessary to determine whether the optical filter is good or not with respect to gas generation, but there has been no reliable determination method in the past.
The present invention has been made in view of such a situation, and reliably manufactures an optical filter that can be used for a display device and whether the optical filter can be used for a display device. It is an object to provide a method for discriminating and a highly reliable organic EL display device.

In order to achieve such an object, the method for producing an optical filter of the present invention is configured such that a color filter layer is formed on a transparent substrate, and then degassing is performed.
As another aspect of the present invention, the degassing treatment is a heat treatment under a low oxygen concentration. Furthermore, the heat treatment under the low oxygen concentration is configured to be at least one of a heat treatment in an inert gas atmosphere and a heat treatment in a vacuum.
As another aspect of the present invention, the degassing process is configured to be at least one of a hot air blowing process, a microwave irradiation process, and a far infrared irradiation process.
As another aspect of the present invention, the degassing treatment is configured to be at least one of boiling treatment in silicon oil, boiling treatment in an organic solvent, and ultrasonic cleaning treatment in an organic solvent. It was.

As another aspect of the present invention, the degassing process is a freeze-drying process.
As another aspect of the present invention, a planarization layer is formed so as to cover the color filter layer, and then the degassing treatment is performed.
As another aspect of the present invention, a color conversion phosphor layer is formed on the color filter layer, a planarization layer is laminated so as to cover the layer, and then the degassing treatment is performed. .
As another aspect of the present invention, a transparent barrier layer is formed after the degassing treatment.
As another aspect of the present invention, an inorganic anchor layer is formed after the degassing treatment.
As another aspect of the present invention, after the degassing treatment, a transparent barrier layer is formed, and an inorganic anchor layer is further formed.

The method for discriminating an optical filter of the present invention involves scraping 10 mg of a laminate on a transparent substrate of the optical filter, heating the laminate at 220 ° C. for 3 hours in a nitrogen atmosphere, and reducing the weight reduction rate [(weight before heating When the weight after heating) / weight before heating × 100] is 1% or less, it is determined that the organic EL display device is a non-defective product.
An organic EL display device of the present invention includes an optical filter manufactured by the above-described optical filter manufacturing method of the present invention, and an organic EL element having at least a light emitting layer between electrodes on the opposite side of the transparent substrate of the optical filter. It was set as the structure provided with.
As another aspect of the present invention, the light emitting layer is configured such that the light emitting layers of the three primary colors are arranged in a desired pattern.
As another aspect of the present invention, the light emitting layer is configured to be a white light emitting layer.
As another aspect of the present invention, the light emitting layer is configured to be a blue light emitting layer.

As another aspect of the present invention, the organic EL element is of an active matrix drive type.
As another aspect of the present invention, the optical filter is positioned on the electrode side provided with the drive element among the opposed electrodes constituting the active matrix drive system.
As another aspect of the present invention, the optical filter is positioned on the electrode side that does not include a drive element among the opposed electrodes constituting the active matrix drive system.
As another aspect of the present invention, the organic EL element is of a passive matrix drive type.

In the method for producing an optical filter of the present invention, an optical filter that enables an organic EL device in which the occurrence of defects such as dark areas, dark spots, and shrinks is suppressed can be produced. In the present invention, when a transparent barrier layer is further formed after degassing treatment, a higher quality optical filter can be manufactured.
Further, according to the determination method of the present invention, it is possible to reliably determine whether or not the optical filter can be used in an organic EL display device with very little gas generation, and it is possible to prevent generation of defective products after the formation process of the organic EL element. Can be prevented.
Furthermore, in the organic EL display device of the present invention, the deterioration of the organic EL element due to the gas generated from the constituent members is prevented, and the display is highly reliable and clear.

The present invention will be described below with reference to the drawings.
[Method of manufacturing optical filter]
In the method for producing an optical filter of the present invention, a color filter layer is formed on a transparent substrate, and then degassing treatment is performed.
The degassing treatment can be a heat treatment under a low oxygen concentration. In this case, for example, a heat treatment in an inert gas atmosphere and a heat treatment in a vacuum can be mentioned. In the present invention, the low oxygen concentration means that the upper limit of the oxygen concentration is 5% and includes the oxygen concentration of 0%.
Examples of the degassing process include a hot air blowing process, a microwave irradiation process, and a far infrared irradiation process.
Examples of degassing treatment include boiling treatment in silicon oil, boiling treatment in an organic solvent, and ultrasonic cleaning treatment in an organic solvent.
Furthermore, a freeze-drying process can be mentioned as a degassing process.

Any of the above processing methods may be performed alone, or two or more processing methods may be combined. By performing such degassing treatment, the optical filter produced by the present invention generates very little gas such as water vapor, oxygen, organic monomer, and low molecular components, and generates defects such as dark areas, dark spots, and shrinks. It is possible to manufacture an organic EL device in which the above is suppressed.
FIG. 1 is a schematic configuration diagram showing an example of an optical filter manufactured by such a manufacturing method of the present invention. The optical filter 1 shown in FIG. 1 includes a transparent substrate 2, a color filter layer 3 composed of three primary color layers 3R, 3G, and 3B on one surface of the transparent substrate 2, and colored layers 3R, 3G, A black matrix 4 having a pattern shape corresponding to the boundary portion of 3B is provided.
As the transparent substrate 2 usable in the present invention, a glass material, a resin material, or a composite material thereof, for example, a glass plate provided with a protective plastic film or a protective plastic layer is used.

Examples of the resin material and protective plastic material include fluorine resin, polyethylene, polypropylene, polyvinyl chloride, polyvinyl fluoride, polystyrene, ABS resin, polyamide, polyacetal, polyester, polycarbonate, modified polyphenylene ether, polysulfone, and polyarylate. , Polyetherimide, polyamideimide, polyimide, polyphenylene sulfide, liquid crystalline polyester, polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, polyoxymethylene, polyethersulfone, polyetheretherketone, polyacrylate, acrylonitrile-styrene resin, Phenolic resin, urea resin, melamine resin, unsaturated polyester resin, epoxy resin, polyurethane, Recone resins, amorphous polyolefins, and the like. Even other resin materials can be used as long as they are polymer materials that can be used for organic EL display devices, for example.
Moreover, the thickness of the transparent base material 2 can be normally set to about 50 μm to 2.0 mm.

In the case of producing an optical filter for an organic EL display device, such a transparent substrate 2 is more preferable if it has a good gas barrier property such as water vapor or oxygen. A gas barrier layer such as water vapor or oxygen may be formed on the transparent substrate 2. As such a gas barrier layer, for example, an inorganic oxide such as silicon oxide, aluminum oxide, or titanium oxide may be formed by a physical vapor deposition method such as a sputtering method or a vacuum vapor deposition method.
The color filter layer 3 formed in the present invention can correct incident light in color, increase color purity, or can be appropriately set according to a display device using an optical filter. Although it is composed of the three primary color layers 3R, 3G, 3B, it is not limited to this. Moreover, the material used for formation of a color filter layer is not specifically limited, For example, it can form with the pigment dispersion composition containing a pigment, a pigment dispersant, binder resin, a reactive compound, and a solvent. Furthermore, the thickness of the color filter layer 3 can be appropriately set according to the material used, the optical characteristics of incident light, and the like, and can be set, for example, in the range of about 0.5 to 10 μm.
Further, in the method for producing an optical filter of the present invention, a planarization layer may be formed so as to cover the color filter layer, and then the above degassing treatment may be performed.

  FIG. 2 is a schematic configuration diagram showing an example of an optical filter manufactured by such a manufacturing method of the present invention. The optical filter 11 shown in FIG. 2 includes a transparent base 12 and a color filter layer 13 composed of three primary color layers 13R, 13G, and 13B on one surface of the transparent base 12, and colored layers 13R, 13G, A black matrix 14 having a pattern shape corresponding to the boundary portion 13B and a planarizing layer 15 covering the color filter layer 13 are provided.

  The planarization layer 15 can be formed by applying a resin material by a method such as spin coating, roll coating, cast coating, and curing. Examples of the material for the flattening layer include photo-curing resins, thermosetting resins, and transparent resins having a reactive vinyl group such as acrylate-based, methacrylate-based, polyvinyl cinnamate, or cyclized rubber. , Polymethyl methacrylate, polyacrylate, polycarbonate, polyvinyl alcohol, polyvinyl pyrrolidone, hydroxyethyl cellulose, carboxymethyl cellulose, polyvinyl chloride resin, melamine resin, phenol resin, alkyd resin, epoxy resin, polyurethane resin, polyester resin, maleic acid resin, polyamide Resin, polyimide amide resin, cyclic polyolefin resin, norbornene resin, 4-methylpentene resin, polysulfone resin, polyethersulfone resin, polyarylate resin, polyethylene terephthalate Resin, polyethylene terephthalate naphthalate resin, polypropylene terephthalate resin, fluorine resin, polyurethane resin, polystyrene resin, polyethylene resin, polypropylene resin, polyvinyl chloride resin, polyester resin, silicone resin, a transparent resin material such as maleic acid resins. Furthermore, a sol-gel material composed of a polysiloxane oligomer or the like, or an organic-inorganic hybrid material composed of a polysiloxane oligomer or the like and an organic polymer can also be mentioned.

The transparent substrate 12 in the optical filter 11 can be the same as the transparent substrate 2 described above, and the degassing treatment after the formation of the color filter layer 13 and the flattening layer 15 is performed in the optical filter 1 described above. It can carry out similarly to preparation of this.
In the method for producing an optical filter of the present invention, a color conversion phosphor layer is formed on the color filter layer, and a planarization layer is formed so as to cover the color conversion phosphor layer. You may give it.

FIG. 3 is a schematic configuration diagram showing an example of the optical filter manufactured by the manufacturing method of the present invention. The optical filter 21 shown in FIG. 3 includes a transparent base material 22, a color filter layer 23 composed of three primary color layers 23 R, 23 G, and 23 B on one surface of the transparent base material 22, and colored layers 23 R, 23 G, A black matrix 24 having a pattern corresponding to the boundary portion of 23B, a color conversion phosphor layer 26 disposed on the color filter layer 23, and a planarization layer 25 covering the color conversion phosphor layer 26 are provided. Yes.
The color conversion phosphor layer 26 is a layer for converting incident light into fluorescence of a desired color. In the illustrated example, the red conversion phosphor layer 26R that converts blue light emitted from the organic EL element into red fluorescence. The green conversion phosphor layer 26G that converts blue light into green fluorescence and the blue conversion dummy layer 26B that transmits blue light as it is. The red conversion phosphor layer 26R, the green conversion phosphor layer 26G, and the blue conversion dummy layer 26B are formed at positions corresponding to the three primary color layers 23R, 23G, and 23R of the color filter layer 23.

  The color conversion phosphor layer 26 can be formed, for example, in the form of a strip by using a single fluorescent dye and vacuum deposition or sputtering through a desired pattern mask. In addition, for example, a method in which a coating solution in which a fluorescent dye and a resin are dispersed or solubilized is applied by spin coating, roll coating, cast coating, or the like, and this is patterned by a photolithography method, The coating liquid can be formed as a layer containing a fluorescent dye in the resin by a method of pattern printing using a screen printing method or the like.

  As a fluorescent dye used for the red conversion phosphor layer 26R for converting the blue light emission into red fluorescence, cyanine compounds such as 4-dicyanomethylene-2-methyl-6- (p-dimethylaminostyryl) -4H-pyran are used. Dyes, pyridine dyes such as 1-ethyl-2- [4- (p-dimethylaminophenyl) -1,3-butadienyl] -pyridium-perchlorate, rhodamine dyes such as rhodamine B and rhodamine 6G, oxazine dyes, etc. Is mentioned. Moreover, as a fluorescent dye used for the green conversion phosphor layer 26G that converts blue light emission into green fluorescence, 2,3,5,6-1H, 4H-tetrahydro-8-trifluoromethylquinolidino (9,9a) , 1-gh) coumarin, 3- (2′-benzothiazolyl) -7-diethylaminocoumarin, 3- (2′-benzimidazolyl) -7-N, N-diethylaminocoumarin and other coumarin dyes, and basic yellow 51 and other coumarins. Examples thereof include dye-based dyes, naphthalimide dyes such as Solvent Yellow 11 and Solvent Yellow 116. Furthermore, various dyes such as direct dyes, acid dyes, basic dyes, and disperse dyes can be used as long as they have fluorescence. The above fluorescent dyes can be used alone or in combination of two or more. When the red conversion phosphor layer and the green conversion phosphor layer contain a fluorescent dye in the resin, the content of the fluorescent dye is appropriately determined in consideration of the fluorescent dye to be used, the thickness of the color conversion phosphor layer, etc. Although it can set, it can be set as about 0.1-1 weight part with respect to 100 weight part of resin to be used, for example.

Further, the blue conversion dummy layer 26B transmits blue light emitted from the organic EL element as it is, and is a transparent resin layer having substantially the same thickness as the red conversion phosphor layer 26R and the green conversion phosphor layer 26G. Can do.
When the red conversion phosphor layer and the green conversion phosphor layer contain a fluorescent dye in the resin, as the resin, polymethyl methacrylate, polyacrylate, polycarbonate, polyvinyl alcohol, polyvinyl pyrrolidone, hydroxyethyl cellulose, carboxymethyl cellulose, Transparent (visible light transmittance of 50% or more) resin such as polyvinyl chloride resin, melamine resin, phenol resin, alkyd resin, epoxy resin, polyurethane resin, polyester resin, maleic acid resin, polyamide resin can be used. When pattern formation of the color conversion phosphor layer is performed by photolithography, for example, a photocurable resist resin having a reactive vinyl group such as acrylic acid, methacrylic acid, polyvinyl cinnamate, and ring rubber Can be used. Furthermore, these resins can be used for the above-mentioned blue conversion dummy layer.

The thickness of such a color conversion phosphor layer 26 can be, for example, about 10 to 20 μm, and the thickness may be different between the color conversion phosphor layers of each color.
The transparent substrate 22 in the optical filter 21 can be the same as the transparent substrate 2 described above, and the formation of the color filter layer 23, the formation of the flattening layer 25, and the degassing process are the same as those of the optical filter 21 described above. It can be performed in the same manner as the production of the filters 1 and 11.
In the optical filter manufacturing method of the present invention as described above, it is possible to manufacture an optical filter that generates very little gas such as water vapor, oxygen, organic monomers, and low molecular components, but in order to further enhance the effect of preventing gas generation. In addition, after the degassing treatment, a transparent barrier layer may be formed. In the method for producing an optical filter of the present invention, the inorganic anchor layer may be formed after degassing or after forming the transparent barrier layer.

FIG. 4 is a schematic configuration diagram showing an example of an optical filter manufactured by such a manufacturing method of the present invention. The optical filter 31 shown in FIG. 4 includes a transparent base material 32, a color filter layer 33 including three primary color layers 33R, 33G, and 33B on one surface of the transparent base material 32, and colored layers 33R, 33G, A black matrix 34 having a pattern corresponding to the boundary portion 33B, a flattening layer 35 covering the color filter layer 33, a transparent barrier layer 37, and an inorganic anchor layer 38 are provided.
The transparent barrier layer 37 is preferably provided with an electrically insulating inorganic oxide film. For example, silicon oxide, aluminum oxide, titanium oxide, yttrium oxide, germanium oxide, zinc oxide, magnesium oxide, calcium oxide, boron oxide, Using one or more oxides such as strontium oxide, barium oxide, lead oxide, zirconium oxide, sodium oxide, lithium oxide, potassium oxide, etc., vacuum deposition, sputtering, ion plating, etc. It can be formed by a film system. The thickness of the transparent barrier layer to be formed can be appropriately set in the range of 0.01 to 1 μm in consideration of barrier properties and transparency. Such a transparent barrier layer may have a multilayer structure of two or more layers made of the inorganic oxide film as described above, or may contain a nitride such as silicon nitride as a subcomponent. .

  The inorganic anchor layer 38 is formed on the optical filter manufactured according to the present invention, for example, indium tin oxide (ITO), indium oxide, indium zinc oxide (IZO), zinc oxide, stannic oxide, or gold. In the case of forming a transparent conductive film, it acts to improve the adhesion of the transparent conductive film. As such an inorganic anchor layer, for example, one or more of silicon oxide, silicon dioxide, silicon oxynitride, silicon nitride and the like are used, and vacuum deposition such as vacuum deposition, sputtering, ion plating, or the like is performed. It can be formed by a film system. The thickness of the inorganic anchor layer to be formed can be appropriately set in the range of 0.005 to 1 μm in consideration of transparency.

The transparent substrate 32 in the optical filter 31 can be the same as the transparent substrate 2 described above, and the formation of the color filter layer 33, the formation of the flattening layer 35, and the degassing treatment are the same as those described above. It can be performed in the same manner as the production of the filters 1 and 11.
The manufacturing method of the optical filter of the present invention is not limited to the above-described embodiment. For example, the black matrix 4, 14, 24, 34 may not be formed.

[Distinguishing method of optical filter]
The method for discriminating an optical filter of the present invention discriminates whether or not gas generation is suppressed to such an extent that the optical filter can be used in an organic EL display device.
Such an optical filter discriminating method of the present invention is obtained by scraping 10 mg of a laminated body on a transparent substrate of the optical filter, heating the laminated body at 220 ° C. for 3 hours under a nitrogen atmosphere, and reducing the weight reduction rate [(heating When “previous weight−weight after heating) / weight before heating × 100” is 1% or less, it is determined that the organic EL display device is a non-defective product.

If the heating condition is less than 220 ° C. or less than 3 hours, the weight reduction rate is not accurately measured, and it is difficult to reliably identify a good product. Moreover, under conditions severer than the above heating conditions, weight loss is excessively measured, and what should be determined as a non-defective product is regarded as defective and is not preferable.
In the method for manufacturing an optical filter of the present invention as described above, the determination time according to the determination method of the present invention is after the degassing process is completed. For example, an inorganic anchor layer or a transparent barrier layer is formed. In some cases, it is performed before these forming steps.
The discriminating method of the present invention as described above can surely discriminate whether or not it is an optical filter that can be used in an organic EL display device, and prevents the generation of defective products after the formation process of the organic EL element. Can do.

[Organic EL display device]
The organic EL display device of the present invention includes an optical filter manufactured by the method for manufacturing an optical filter of the present invention, and an organic EL element having at least a light emitting layer between electrodes on the side of the optical filter opposite to the transparent substrate. Is.
FIG. 5 is a schematic configuration diagram showing an embodiment of the organic EL display device of the present invention. An organic EL display device 41 shown in FIG. 5 includes the optical filter 11 manufactured by the optical filter manufacturing method of the present invention and an organic EL element 42.
The optical filter 11 has the same configuration as that shown in FIG. 2 described above, and is a color filter comprising a transparent base 12 and three primary color layers 13R, 13G, and 13B on one surface of the transparent base 12. A black matrix 14 having a pattern shape corresponding to a boundary portion between the layer 13, the colored layers 13 </ b> R, 13 </ b> G, and 13 </ b> B, and a planarizing layer 15 that covers the color filter layer 13 are provided.

  The organic EL element 42 is disposed on the opposite side of the optical filter 11 from the transparent substrate 12, and the driving method may be either a passive matrix driving method or an active matrix driving method. In the illustrated example, the organic EL element 42 includes a pair of first electrode layer 44 and second electrode layer 45, and an organic EL light emitting layer 43 sandwiched between the first electrode layer 44 and the second electrode layer 45. Passive matrix drive system. Further, when the organic EL element 42 is an active matrix driving method, the first electrode layer 44 is a common electrode, the second electrode layer 45 is a pixel electrode, and the pixel electrode is a signal line, a scanning line, or a driving element. An electrode wiring pattern is configured together with a certain TFT (thin film transistor). The first electrode layer 44 may be a pixel electrode, and the second electrode layer 45 may be a common electrode.

The organic EL light emitting layer 43 constituting the organic EL element 42 is formed by arranging organic EL light emitting layers 43R, 43G, and 43B of three primary colors in a predetermined pattern. The positions of the organic EL light emitting layers 43R, 43G, and 43B correspond to the three primary color layers 13R, 13G, and 13R of the color filter layer 13.
In the present invention, the three primary color organic EL light emitting layers 43R, 43G, and 43B constituting the organic EL light emitting layer 43 and the patterns of the second electrode layer 45 are defined by the partition walls 46 (shown by chain lines in FIG. 5). ) May be separated. By providing such a partition wall 46, the organic EL light emitting layers 43R, 43G, and 43B and the second electrode layer 45 can be formed by using the partition wall 46 as a patterning unit in the manufacturing process.
FIG. 6 is a schematic configuration diagram showing another embodiment of the organic EL display device of the present invention. An organic EL display device 51 shown in FIG. 6 includes the optical filter 11 manufactured by the optical filter manufacturing method of the present invention and an organic EL element 52.

The optical filter 11 has the same configuration as that shown in FIG. 2 described above, and is a color filter comprising a transparent base 12 and three primary color layers 13R, 13G, and 13B on one surface of the transparent base 12. A black matrix 14 having a pattern shape corresponding to a boundary portion between the layer 13, the colored layers 13 </ b> R, 13 </ b> G, and 13 </ b> B, and a planarizing layer 15 that covers the color filter layer 13 are provided.
The organic EL element 52 is disposed on the opposite side of the optical filter 11 from the transparent substrate 12, and the organic EL light emitting layer 53 constituting the organic EL display 52 emits white light. In the illustrated example, the organic EL element 52 includes a pair of a first electrode layer 54 and a second electrode layer 55, and an organic EL light emitting layer 53 sandwiched between the first electrode layer 54 and the second electrode layer 55. It is a passive matrix drive system. However, as with the organic EL element 42 described above, the organic EL element 52 may be driven by either a passive matrix driving system or an active matrix driving system.

FIG. 7 is a schematic configuration diagram showing another embodiment of the organic EL display device of the present invention. The organic EL display device 61 shown in FIG. 7 includes the optical filter 21 manufactured by the optical filter manufacturing method of the present invention and an organic EL element 62.
The optical filter 21 has the same configuration as that shown in FIG. 3 described above, and is a color filter composed of a transparent base material 22 and three primary color layers 23R, 23G, and 23B on one surface of the transparent base material 22. A black matrix 24 having a pattern shape corresponding to a boundary portion of the layer 23, the colored layers 23R, 23G, and 23B, a color conversion phosphor layer 26 disposed on the color filter layer 23, and a planarizing layer 25. . The color conversion phosphor layer 26 includes a red conversion phosphor layer 26R that converts blue light emitted from the organic EL element 62 into red fluorescence, a green conversion phosphor layer 26G that converts blue light into green fluorescence, and the blue light as it is. The transparent blue conversion dummy layer 26 </ b> B is transmitted, and these are formed at positions corresponding to the three primary color layers 23 </ b> R, 23 </ b> G, 23 </ b> R of the color filter layer 23.

The organic EL element 62 is disposed on the side of the optical filter 21 opposite to the transparent substrate 22, and the organic EL light emitting layer 63 constituting the organic EL display 62 emits blue light. In the illustrated example, the organic EL element 62 includes a pair of a first electrode layer 64 and a second electrode layer 65, and an organic EL light emitting layer 63 sandwiched between the first electrode layer 64 and the second electrode layer 65. It is a passive matrix drive system. However, the driving method of the organic EL element 62 may be either a passive matrix driving method or an active matrix driving method, similarly to the organic EL element 42 described above.
The organic EL display device of the present invention is not limited to the above-described embodiment. For example, in the organic EL display devices 41 and 51, the above-described optical filters 1 and 31 may be used instead of the optical filter 11. In the organic EL display device 61, the optical filter 21 may include a transparent barrier layer and an inorganic anchor layer.

Next, each component of the organic EL display device of the present invention will be described.
The optical filters 11 and 21 constituting the organic EL display devices 41, 51, and 61 have been described in the manufacturing method of the present invention described above, and thus description thereof is omitted here.
As described above, the organic EL elements 42, 52, and 62 constituting the organic EL display device of the present invention have at least a pair of electrode layers and a light emitting layer positioned between the electrode layers, and the driving method is as follows. Any of a passive matrix and an active matrix may be used.
The first electrode layers 44, 54, and 64 are transparent electrode layers, and the material thereof is not particularly limited as long as it is used in a normal organic EL display device, and is oxidized like the electrode layer 32 described above. Examples thereof include thin film electrode materials such as indium tin (ITO), indium oxide, indium zinc oxide (IZO), zinc oxide, stannic oxide, and gold. When this first electrode layer 44, 54, 64 is an electrode for injecting holes, ITO having a large work function (4 eV or more) transparent or translucent material so that holes can be easily injected, IZO, indium oxide, and gold are preferable. The first electrode layers 44, 54, and 64 preferably have a sheet resistance of several hundred Ω / □ or less, and the thickness can be, for example, about 0.005 to 1 μm, depending on the material.

  The second electrode layers 45, 55, and 65 are disposed so as to be orthogonal to the first electrode layers 44, 54, and 64 via the organic EL light emitting layers 43, 53, and 63. If it is used for a normal organic EL display device, it is not particularly limited, and in the same manner as the first electrode layers 44, 54, 64, indium tin oxide (ITO), indium oxide, indium zinc oxide (IZO). In addition, a thin film electrode material such as zinc oxide, stannic oxide, or gold, a magnesium alloy (for example, MgAg), aluminum or an alloy thereof (AlLi, AlCa, AlMg, or the like), silver, or the like can be used. When the second electrode layers 45, 55, and 65 are electrodes for injecting electrons, a magnesium alloy, aluminum, silver, or the like having a small work function (4 eV or less) is preferable so that electrons can be easily injected. Such second electrode layers 45, 55, and 65 preferably have a sheet resistance of several hundred Ω / □ or less. For this reason, the thickness of the second electrode layers 45, 55, and 65 is, for example, 0.005 to 0.5 μm. Can be about.

In the case where the organic EL elements 42, 52, 62 are of an active matrix driving system, one of the first electrode layer 44 and the second electrode layer 45, one of the first electrode layer 54 and the second electrode layer 55, One of the first electrode layer 64 and the second electrode layer 65 is a pixel electrode, and the other is a common electrode. Then, the pixel electrode constitutes an electrode wiring pattern together with a signal line, a scanning line, and a TFT (thin film transistor) as a driving element.
The organic EL light emitting layers 43, 53, 63 constituting the organic EL elements 42, 52, 62 have, for example, a structure in which a hole injection layer, a light emitting layer, and an electron injection layer are stacked from the electrode layers 44, 54, 64 side. , A structure composed of a light emitting layer alone, a structure composed of a hole injection layer and a light emitting layer, a structure composed of a light emitting layer and an electron injection layer, and a hole transport layer interposed between the hole injection layer and the light emitting layer Or a structure in which an electron transport layer is interposed between the light emitting layer and the electron injection layer.

In addition, for the purpose of adjusting the emission wavelength or improving the light emission efficiency, an appropriate material can be doped in each of the above layers.
The light-emitting layers constituting the organic EL light-emitting layers 43, 53, and 63 are the three primary colors of red light emission, green light emission, and blue light emission in the embodiment shown in FIG. 5, but depending on the purpose of use of the organic EL display device, etc. The light emitting layer having a desired light emission color (for example, yellow, light blue, orange) alone, or any desired combination of a plurality of light emission colors other than red light emission, green light emission, and blue light emission, etc. There may be. Further, the organic EL light emitting layer 53 shown in FIG. 6 emits white light, and the organic EL light emitting layer 63 shown in FIG. 7 emits blue light.

Examples of the organic light emitting material used for the light emitting layers constituting the organic EL light emitting layers 43, 53, and 63 include the following dye-based, metal complex-based, and polymer-based materials.
(1) Dye-based luminescent materials cyclopentadiene derivatives, tetraphenylbutadiene derivatives, triphenylamine derivatives, oxadiazole derivatives, pyrazoloquinoline derivatives, distyrylbenzene derivatives, distyrylarylene derivatives, silole derivatives, thiophene ring compounds, pyridine rings Examples thereof include compounds, perinone derivatives, perylene derivatives, oligothiophene derivatives, trifumanylamine derivatives, oxadiazole dimers, and pyrazoline dimers.

(2) Metal complex light emitting material Aluminum quinolinol complex, benzoquinolinol beryllium complex, benzoxazole zinc complex, benzothiazole zinc complex, azomethylzinc complex, porphyrin zinc complex, europium complex, etc. , Tb, Eu, Dy and the like, and a metal complex having oxadiazole, thiadiazole, phenylpyridine, phenylbenzimidazole, quinoline structure and the like as a ligand.

(3) Polymer-based light-emitting material Examples include polyparaphenylene vinylene derivatives, polythiophene derivatives, polyparaphenylene derivatives, polysilane derivatives, polyacetylene derivatives, polyvinylcarbazole derivatives, polyfluorene derivatives, and the like.
In particular, in the organic EL element 62 shown in FIG. 7, examples of the organic light emitting material that emits blue light used for the organic EL light emitting layer 63 include fluorescent whitening agents such as benzothiazole, benzimidazole, and benzoxazole. And metal chelated oxinoid compounds, styrylbenzene compounds, distyrylpyrazine derivatives, aromatic dimethylidin compounds, and the like.

Specifically, benzothiazoles such as 2-2 '-(p-phenylenedivinylene) -bishenzothiazole; 2- [2- [4- (2-benzimidazolyl) phenyl] vinyl] benzimidazole, 2- [ Benzimidazoles such as 2- (4-carboxyphenyl) vinyl] benzimidazole; 2,5-bis (5,7-di-t-pentyl-2-benzoxazolyl) -1,3,4-thiadiazole, Benzoxazole series such as 4,4'-bis (5,7-t-pentyl-2-benzoxazolyl) stilbene, 2- [2- (4-chlorophenyl) vinyl] naphtho [1,2-d] oxazole And the like.
Examples of the metal chelated oxinoid compound include 8-hydroxyquinoline metal complexes such as tris (8-quinolinol) aluminum, bis (8-quinolinol) magnesium, and bis (benzo [f] -8-quinolinol) zinc. Examples include dilithium epinetridione.

Examples of the styrylbenzene compound include 1,4-bis (2-methylstyryl) benzene, 1,4-bis (3-methylstyryl) benzene, 1,4-bis (4-methylstyryl) benzene, Distyrylbenzene, 1,4-bis (2-ethylstyryl) benzene, 1,4-bis (3-ethylstyryl) benzene, 1,4-bis (2-methylstyryl) -2-methylbenzene, 1,4 -Bis (2-methylstyryl) -2-ethylbenzene and the like can be mentioned.
Examples of the distyrylpyrazine derivative include 2,5-bis (4-methylstyryl) pyrazine, 2,5-bis (4-ethylstyryl) pyrazine, and 2,5-bis [2- (1-naphthyl). Vinyl] pyrazine, 2,5-bis (4-methoxystyryl) pyrazine, 2,5-bis [2- (4-biphenyl) vinyl] pyrazine, 2,5-bis [2- (1-pyrenyl) vinyl] pyrazine Etc.

  Examples of the aromatic dimethylidin compounds include 1,4-phenylene dimethylidin, 4,4-phenylene dimethylidin, 2,5-xylene dimethylidin, 2,6-naphthylene dimethylidin, , 4-biphenylenedimethylidin, 1,4-p-terephenylenedimethylidin, 9,10-anthracenediyldimethylidin, 4,4'-bis (2,2-di-t-butylphenylvinyl) Biphenyl, 4,4'-bis (2,2-diphenylvinyl) biphenyl, and the like, and derivatives thereof can be mentioned.

  Furthermore, as a material of the light emitting layer, a compound represented by the general formula (Rs-Q) 2-AL-OL can be exemplified (in the above formula, AL has 6 to 24 carbon atoms including a benzene ring). A hydrocarbon, OL is a phenylate ligand, Q is a substituted 8-quinolinolato ligand, Rs is a steric bond of two or more substituted 8-quinolinolato ligands to an aluminum atom. Represents an 8-quinolinolate substituent selected to interfere with. Specific examples include bis (2-methyl-8-quinolinolato) (paraphenylphenolate) aluminum (III), bis (2-methyl-8-quinolinolato) (1-naphtholato) aluminum (III), and the like.

The doping material, hole transporting material, hole injecting material, electron injecting material, etc. used for each layer constituting the organic EL light emitting layers 43, 53, 63 may be any of inorganic materials and organic materials as exemplified below. The thickness of each layer constituting the organic EL light emitting layers 43, 53, 63 is not particularly limited, and can be, for example, about 10 to 1000 nm.
(Doping material)
Examples include perylene derivatives, coumarin derivatives, rubrene derivatives, quinacridone derivatives, squalium derivatives, porphyrin derivatives, styryl dyes, tetracene derivatives, pyrazoline derivatives, decacyclene, phenoxazone, and the like.

(Hole transport material)
Oxadiazole, oxazole, triazole, thiazole, triphenylmethane, styryl, pyrazoline, hydrazone, aromatic amine, carbazole, polyvinylcarbazole, stilbene, enamine, azine, tri Examples include phenylamine-based, butadiene-based, polycyclic aromatic compound-based, and stilbene dimer.
Further, as the π-conjugated polymer, polyacetylene, polydiacetylene, poly (P-phenylene), poly (P-phenylene sulfide), poly (P-phenylene oxide), poly (1,6-heptadiene), poly (P— Phenylene vinylene), poly (2,5-thienylene), poly (2,5-pyrrole), poly (m-phenylene sulfide), poly (4,4'-biphenylene) and the like.

  As the charge transfer polymer complex, polystyrene / AgC104, polyvinylnaphthalene / TCNE, polyvinylnaphthalene / P-CA, polyvinylnaphthalene / DDQ, polyvinylmesitylene / TCNE, polynaphthaacetylene / TCNE, polyvinylanthracene / Br2, polyvinylanthracene / I2 , Polyvinyl anthracene / TNB, polydimethylaminostyrene / CA, polyvinyl imidazole / CQ, poly-P-phenylene / I2, poly-1-vinylpyridine / I2, poly-4-vinylpyridine / I2, poly-P-1- Examples include phenylene, I2, polyvinylpyridium, TCNQ, and the like. Further, TCNQ-TTF and the like are exemplified as a charge transfer low molecular complex, and polycopper phthalocyanine and the like are exemplified as a polymer metal complex.

As the hole transport material, a material having a low ionization potential is preferable, and in particular, a butadiene system, an enamine system, a hydrazone system, and a triphenylamine system are preferable.
(Hole injection material)
Phenylamine, starburst amine, phthalocyanine, oxide such as vanadium oxide, molybdenum oxide, ruthenium oxide, aluminum oxide, amorphous carbon, polyaniline, polythiophene derivative, triazole derivative, oxadiazole derivative, imidazole derivative, polyaryl Alkane derivatives, pyrazoline derivatives, pyrazolone derivatives, phenylenediamine derivatives, arylamine derivatives, amino-substituted chalcone derivatives, oxazole derivatives, styrylanthracene derivatives, fluorenone derivatives, hydrazone derivatives, stilbene derivatives, silazane derivatives, polysilanes, aniline copolymers, And dielectric polymer oligomers such as thiophene oligomers.

  Furthermore, examples of the hole injection material include a porphyrin compound, an aromatic tertiary amine compound, and a styrylamine compound. Examples of the porphyrin compound include polyfin, 1,10,15,20-tetraphenyl-21H, 23H-polyfin copper (II), aluminum phthalocyanine chloride, copper octamethylphthalocyanine, and the like. In addition, aromatic tertiary amine compounds and styrylamine compounds include N, N, N ′, N′-tetraphenyl-4,4′-diaminophenyl, N, N′-diphenyl-N, N′-bis. (3-methylphenyl)-[1,1′-biphenyl] -4,4′-diamine, 4- (di-p-tolylamino) -4 ′-[4 (di-p-tolylamino) styryl] stilbene, 3, -Methoxy-4'-N, N-diphenylaminostilbenzene, 4,4'-bis [N- (1-naphthyl) -N-phenylamino] biphenyl, 4,4 ', 4 "-tris [N- ( 3-methylphenyl) -N-phenylamino] triphenylamine and the like.

(Electron injection material)
Calcium, barium, lithium aluminum, lithium fluoride, strontium, magnesium oxide, magnesium fluoride, strontium fluoride, calcium fluoride, barium fluoride, aluminum oxide, strontium oxide, calcium oxide, polymethyl methacrylate, sodium polystyrene sulfonate, Nitro-substituted fluorene derivatives, anthraquinodimethane derivatives, diphenylquinone derivatives, thiopyrandioxide derivatives, heterocyclic tetracarboxylic anhydrides such as naphthaleneperylene, carbodiimides, fluorenylidenemethane derivatives, anthraquinodimethane and anthrone derivatives, oxa Diazole derivatives, thiazole derivatives in which the oxygen atom of the above oxadiazole ring is substituted with a sulfur atom, quinoxaline known as an electron withdrawing group Can quinoxaline derivative having, tris (8-quinolinol) metal complexes of 8-quinolinol derivatives, such as aluminum, phthalocyanine, metal phthalocyanine, a distyryl pyrazine derivatives.
The layers constituting the organic EL light-emitting layers 43, 53, and 63 can be formed by forming a film by a printing method such as gravure offset printing or a screen printing method, a vacuum vapor deposition method using a photomask, or the like.
The above-described embodiment of the present invention is an exemplification, and the present invention is not limited thereto.

Next, an Example is shown and this invention is demonstrated further in detail.
[Example 1]
<Production of optical filter>
As a transparent substrate, soda glass (manufactured by Central Glass Co., Ltd.) having a thickness of 370 mm × 470 mm and a thickness of 0.7 mm was prepared.
(Formation of black matrix)
A thin film (thickness 0.2 μm) of oxynitride composite chromium was formed on the transparent substrate by a sputtering method. A photosensitive resist was coated on the oxynitride composite chromium thin film, and mask exposure and development were performed to form a resist pattern. Next, the composite chromium oxynitride is etched using this resist pattern as a mask, and a black matrix in which rectangular openings of 80 μm × 280 μm are arranged in a matrix with a pitch of 100 μm in the short side direction and a pitch of 300 μm in the long side direction is formed. Formed.

(Formation of color filter layer)
First, three types of photosensitive coatings for colored layers of red, green, and blue were prepared. That is, a condensed azo pigment (Chromophthalred BRN manufactured by Ciba Geigy Co.) as a red colorant, a phthalocyanine pigment green pigment (Lionol Green 2Y-301 manufactured by Toyo Ink Co., Ltd.) as a green colorant, and a blue colorant An anthraquinone pigment (Chromophthal Blue A3R manufactured by Ciba Geigy Co.) was prepared. Using these colorants, polyvinyl alcohol (10% aqueous solution) is used as a binder resin, and each colorant is blended in a proportion of 1 part by weight with respect to 10 parts by weight of the polyvinyl alcohol aqueous solution. 1 part by weight of ammonium dichromate was added as a crosslinking agent to 100 parts by weight of the resulting solution to obtain three types of photosensitive paints for colored layers of red, green and blue.

  Next, a color filter layer was formed by forming a colored layer of each color using the three types of photosensitive paints for colored layers. That is, a photosensitive coating for a red colored layer was applied to the entire transparent base material on which the black matrix was formed by spin coating, and prebaked (100 ° C., 3 minutes). Then, it exposed using the predetermined photomask for colored layers. Next, development is performed with a developer (0.05% KOH aqueous solution), followed by post-baking (230 ° C., 30 minutes), and a strip-like (width 85 μm) red colored layer (thickness 1.5 μm) is obtained. It was formed at a pitch of 300 μm so that the width direction was the short side direction of the black matrix and was on the aperture arrangement of the black matrix.

  Similarly, by using the photosensitive paint of the green colored layer, a belt-like (width 85 μm) green colored layer (thickness 1.5 μm) is placed on the black matrix opening array parallel to the extending direction of the red colored layer. Each was formed with a pitch of 300 μm. The pitch between the adjacent red colored layer and green colored layer was 100 μm. Further, by using the photosensitive paint of the blue colored layer, a belt-like (width 85 μm) blue colored layer (thickness 1.5 μm) is formed in parallel with the extending direction of the red colored layer and the red colored layer and the green colored layer. In the intermediate region (on the black matrix opening array), each was formed at a pitch of 300 μm. As a result, strip-shaped (85 μm wide) red colored layer, green colored layer, and blue colored layer are arranged at a pitch of 100 μm within a width of 300 μm perpendicular to the extending direction of the colored layer, and this 300 μm unit can be repeated. A colored layer was formed.

(Formation of planarization layer)
A flattening layer coating solution was prepared by diluting an acrylate-based photo-curable resin (JUPC manufactured by JSR Corporation) with propylene glycol monomethyl ether acetate. This flattening layer coating solution was applied onto the color filter layer by spin coating, and pre-baked (120 ° C., 3 minutes). Thereafter, exposure and development were performed using a predetermined photomask, followed by post-baking (230 ° C., 30 minutes) to form a planarization layer (thickness 2 μm) covering the color filter layer.

(Degassing treatment)
The transparent substrate that had been subjected to the formation of the flattening layer as described above was subjected to a degassing process at 240 ° C. for 48 hours in an argon atmosphere.
With respect to the optical filter after the above degassing treatment, 10 mg of the laminate formed on the transparent substrate as described above is scraped off, and 220 nm under a nitrogen atmosphere using a thermal analyzer Thermo Plus2 manufactured by Rigaku Corporation. The mixture was heated at 0 ° C. for 3 hours, and the weight loss rate [(weight before heating−weight after heating) / weight before heating × 100] was measured. As a result, the weight loss was 0.76%, and it was determined that the optical filter for the organic EL display device was a non-defective product by the determination method of the present invention.
The optical filter after the above degassing treatment was cut out to a size of 1 mm × 1 mm, and this was cut from room temperature to 230 ° C. in vacuum using a high-accuracy temperature-programmed desorption gas analyzer manufactured by Electronic Science Co., Ltd. The heated H ₂ O molecules were quantified when heated (temperature rising rate 60 ° C./min) and held at 230 ° C. for 30 minutes. As a result, the number of desorbed H ₂ O molecules was 6.27E + 16.

(Formation of inorganic anchor layer)
Next, a silicon oxide film was formed on the planarizing layer of the optical filter by a sputtering method to form an inorganic anchor layer (thickness 150 mm).

<Production of organic EL display device>
(Formation of first electrode layer)
On the inorganic anchor layer of the optical filter, an indium tin oxide (ITO) electrode film having a thickness of 150 nm is formed by an ion plating method, a photosensitive resist is applied on the ITO electrode film, mask exposure, development, The ITO electrode film was etched to form a transparent electrode layer as the first electrode layer. This transparent electrode layer was a strip pattern having a width of 80 μm formed in parallel with each colored layer of the color filter layer, and was located on each colored layer.

(Formation of auxiliary electrode)
Next, a chromium thin film (thickness 0.2 μm) is formed by sputtering on the entire surface of the inorganic anchor layer so as to cover the first electrode layer, a photosensitive resist is applied on the chromium thin film, mask exposure, Development and etching of the chromium thin film were performed to form auxiliary electrodes. This auxiliary electrode is a striped pattern formed on the first electrode layer so as to run on the color filter layer from the transparent substrate, and 5 μm of the width of 15 μm is located on the first electrode layer. The remaining portion in the direction is located on the inorganic anchor layer, and the width of the terminal portion at the peripheral edge of the transparent substrate is 60 μm.

(Formation of insulating layer and partition)
Acrylic resin (V-259PA manufactured by Nippon Steel Chemical Co., Ltd.) is diluted with propylene glycol monomethyl ether acetate to prepare a coating solution for a transparent insulating layer. This coating solution is spin coated to form a first electrode layer (transparent The electrode layer was coated on the inorganic anchor layer and pre-baked (100 ° C., 3 minutes). Subsequently, after patterning by a photolithography method, post-baking (200 ° C., 30 minutes) was performed to form an insulating layer (thickness 1 μm). This insulating layer was a belt-like pattern (width 20 μm) that intersected the first electrode layer (transparent electrode layer) at a right angle, and was located on the light shielding portion of the black matrix.
Next, a partition wall coating material (photograph ZPN1100 manufactured by Nippon Zeon Co., Ltd.) was applied to the entire surface by a spin coating method so as to cover the insulating layer, and prebaked (70 ° C., 30 minutes). Then, it exposed using the photomask for predetermined | prescribed partition, developed with the developing solution (Nippon ZEON Co., Ltd. product ZTMA-100), and then post-baked (200 degreeC, 30 minutes). Thereby, the partition was formed on the insulating layer. The partition wall had a shape with a height of 10 μm, a lower portion (insulating layer side) width of 15 μm, and an upper portion width of 26 μm.

(Formation of white organic EL element layer)
Next, a white organic EL element layer composed of a hole injection layer, a light emitting layer, and an electron injection layer was formed by a vacuum deposition method using the partition walls as a mask. That is, first, 4,4 ′, 4 ″ -tris [N- (3-methylphenyl) -N-phenylamino] triphenylamine is 200 nm thick through a mask having an opening corresponding to the image display region. By vapor-depositing to 4 nm, and then depositing 4,4′-bis [N- (1-naphthyl) -N-phenylamino] biphenyl to a thickness of 20 nm, the partition wall becomes a mask pattern, The hole injection layer material passed only between the partition walls, and a hole injection layer was formed on the transparent electrode layer.

Next, in the same manner as described above, 4,4′-bis (2,2-diphenylvinyl) biphenyl was deposited to a thickness of 50 nm using the partition walls as a mask to form a light emitting layer. At the same time, a small amount of rubrene (manufactured by Aldrich Co.) was contained.
Next, tris (8-quinolinol) aluminum was evaporated to a thickness of 20 nm to form an electron injection layer.
The white organic EL element layer formed in this way exists between the partition walls as a band-shaped pattern having a width of about 280 μm, and a dummy organic EL element layer is formed on the upper surface of the partition walls with the same layer structure. It was.

(Formation of second electrode layer)
Next, magnesium and silver are simultaneously vapor-deposited in a region where the partition wall is formed through a mask having a predetermined opening wider than the image display region (vacuum deposition rate of magnesium = 1. 3 to 1.4 nm / second, silver deposition rate = 0.1 nm / second).
Thereby, the partition was used as a mask, and a second electrode layer (back electrode layer) having a thickness of 200 nm made of a magnesium / silver mixture was formed on the white organic EL element layer. This back electrode layer was present on the white organic EL element layer as a band-like pattern having a width of 280 μm, and a dummy back electrode layer was also formed on the upper surface of the partition wall.
Thereafter, a sealing plate was bonded to the surface on which the second electrode layer was formed via an ultraviolet curable adhesive to seal the organic EL element, thereby obtaining an organic EL display device.

<Evaluation of organic EL display device>
Applying a voltage of DC 8.5 V to the first electrode layer (transparent electrode layer) and the second electrode layer (back electrode layer) of the organic EL display device at a constant current density of 10 mA / cm ² to drive continuously. Thus, the white organic EL light emitting layer at a desired portion where the transparent electrode layer and the back electrode layer intersect was caused to emit light.
When an arbitrary 5 mm × 5 mm region of the light emitting portion was observed with an optical microscope, no non-light emitting portion having a size of 10 μm or more was observed, no defects were caused by dark areas and dark spots, and shrinkage was not generated. Therefore, it was confirmed that high-quality three primary color images can be displayed.

[Example 2]
<Production of optical filter>
An optical filter was produced in the same manner as in the example except that the degassing treatment was performed in vacuum (1.0 × 10 ⁻¹ Torr) at 220 ° C. for 48 hours.
For this optical filter, the weight reduction rate [(weight before heating−weight after heating) / weight before heating × 100] was measured in the same manner as in Example 1. As a result, the weight reduction was 0.89%, and it was determined that the optical filter for the organic EL display device was defective by the determination method of the present invention.
In addition, about the optical filter which said degassing process was complete | finished, as a result of quantifying the desorbed H ₂ O molecule in the same manner as in Example 1, the number of desorbed H ₂ O molecules was 6.81E + 16.
Next, a silicon oxide film was formed on the planarizing layer of the optical filter by a sputtering method to form an inorganic anchor layer (thickness 150 mm).

<Production of organic EL display device>
Using the above optical filter, an organic EL display device was produced in the same manner as in Example 1.
<Evaluation of organic EL display device>
About said organic EL display apparatus, the white organic EL light emitting layer of the desired site | part which a transparent electrode layer and a back electrode layer cross | intersect on the conditions similar to Example 1 was light-emitted. Then, when the light emitting part was observed in the same manner as in Example 1, no non-light emitting part having a size of 10 μm or more was observed, there was no defect due to dark areas and dark spots, no shrinkage, and high quality. It was confirmed that the three primary color images can be displayed.

[Comparative Example 1]
<Production of optical filter>
An optical filter was produced in the same manner as in Example 1 except that the degassing treatment was not performed.
For this optical filter, the weight reduction rate [(weight before heating−weight after heating) / weight before heating × 100] was measured in the same manner as in Example 1. As a result, the weight loss was 1.70%, and it was determined that the optical filter for the organic EL display device was defective by the determination method of the present invention.
As a result of quantifying the desorbed H ₂ O molecules in the same manner as in Example 1, the number of desorbed H ₂ O molecules was 1.27E + 17.
Next, a silicon oxide film was formed on the planarizing layer of the optical filter by a sputtering method to form an inorganic anchor layer (thickness 150 mm).

<Production of organic EL display device>
Using the above optical filter, an organic EL display device was produced in the same manner as in Example 1.
<Evaluation of organic EL display device>
About said organic EL display apparatus, the white organic EL light emitting layer of the desired site | part which a transparent electrode layer and a back electrode layer cross | intersect on the conditions similar to Example 1 was light-emitted. And when the light emission part was observed similarly to Example 1, the growth of the non-light emission part was observed in the pixel.

[Comparative Example 2]
<Production of optical filter>
An optical filter was produced in the same manner as in Example 1 except that the degassing conditions were 200 ° C. and 48 hours in the atmosphere.
For this optical filter, the weight reduction rate [(weight before heating−weight after heating) / weight before heating × 100] was measured in the same manner as in Example 1. As a result, the weight loss was 1.26%, and it was determined that the optical filter for the organic EL display device was defective by the determination method of the present invention.
In addition, about the optical filter which said degassing process was complete | finished, as a result of quantifying the desorbed H ₂ O molecule in the same manner as in Example 1, the number of desorbed H ₂ O molecules was 1.19E + 17.
Next, a silicon oxide film was formed on the planarizing layer of the optical filter by a sputtering method to form an inorganic anchor layer (thickness 150 mm).

<Production of organic EL display device>
Using the above optical filter, an organic EL display device was produced in the same manner as in Example 1.
<Evaluation of organic EL display device>
About said organic EL display apparatus, the white organic EL light emitting layer of the desired site | part which a transparent electrode layer and a back electrode layer cross | intersect on the conditions similar to Example 1 was light-emitted. And when the light emission part was observed similarly to Example 1, the growth of the non-light emission part was observed in the pixel.

[Comparative Example 3]
<Production of optical filter>
An optical filter was produced in the same manner as in Example 1 except that the degassing treatment was performed at 240 ° C. for 48 hours in the atmosphere.
However, this optical filter has been yellowed in the flattening layer and cannot be put to practical use.

  It is useful in the manufacture of display devices including various organic light emitting display devices such as full color display devices, area color display devices, and lighting.

It is a schematic block diagram which shows an example of the optical filter manufactured by the manufacturing method of this invention. It is a schematic block diagram which shows an example of the optical filter manufactured by the manufacturing method of this invention. It is a schematic block diagram which shows an example of the optical filter manufactured by the manufacturing method of this invention. It is a schematic block diagram which shows an example of the optical filter manufactured by the manufacturing method of this invention. It is a schematic block diagram which shows one Embodiment of the organic electroluminescent display apparatus of this invention. It is a schematic block diagram which shows other embodiment of the organic electroluminescent display apparatus of this invention. It is a schematic block diagram which shows other embodiment of the organic electroluminescent display apparatus of this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1, 11, 21, 31 ... Optical filter 2, 12, 22, 32 ... Transparent base material 3, 13, 23, 33 ... Color filter layer 15, 25, 35 ... Flattening layer 26 ... Color conversion phosphor layer 37 ... Transparent barrier layer 38 ... inorganic anchor layer 41, 51, 61 ... organic EL display device 42, 52, 62 ... organic EL element 43, 53, 63 ... organic EL light emitting layer 44, 54, 64 ... first electrode layer 45, 55 , 65 ... second electrode layer

Claims (20)

  A method for producing an optical filter, comprising: forming a color filter layer on a transparent substrate, and then performing a degassing treatment.   The method for producing an optical filter according to claim 1, wherein the degassing treatment is a heat treatment under a low oxygen concentration.   The method for producing an optical filter according to claim 2, wherein the heat treatment under a low oxygen concentration is at least one of a heat treatment in an inert gas atmosphere and a heat treatment in a vacuum. .   The method of manufacturing an optical filter according to claim 1, wherein the degassing process is at least one of a hot air blowing process, a microwave irradiation process, and a far infrared irradiation process.   The degassing treatment is at least one of a boiling treatment in silicon oil, a boiling treatment in an organic solvent, and an ultrasonic cleaning treatment in an organic solvent. Manufacturing method of optical filter.   The method for manufacturing an optical filter according to claim 1, wherein the degassing process is a freeze-drying process.   The method for producing an optical filter according to any one of claims 1 to 6, wherein a planarization layer is laminated so as to cover the color filter layer, and then the degassing treatment is performed.   7. A color conversion phosphor layer is formed on the color filter layer, a planarization layer is formed so as to cover the layer, and then the degassing process is performed. The manufacturing method of the optical filter in any one.   The method for manufacturing an optical filter according to claim 1, wherein a transparent barrier layer is formed after the degassing treatment.   9. The method of manufacturing an optical filter according to claim 1, wherein an inorganic anchor layer is formed after the degassing treatment.   9. The method of manufacturing an optical filter according to claim 1, wherein after the degassing treatment, a transparent barrier layer is formed, and an inorganic anchor layer is further formed.   10 mg of the laminate on the transparent substrate of the optical filter is scraped off, and the laminate is heated at 220 ° C. for 3 hours in a nitrogen atmosphere, and the weight reduction rate [(weight before heating−weight after heating) / before heating When the weight × 100] is 1% or less, the optical filter discriminating method is discriminated as a non-defective product for an organic EL display device.   An optical filter manufactured by the method for manufacturing an optical filter according to any one of claims 1 to 11, and an organic EL element having at least a light emitting layer between electrodes on a side opposite to the transparent base of the optical filter. An organic EL display device comprising:   14. The organic EL display device according to claim 13, wherein the light emitting layer is formed by arranging the light emitting layers of the three primary colors in a desired pattern.   14. The organic EL display device according to claim 13, wherein the light emitting layer is a white light emitting layer.   14. The organic EL display device according to claim 13, wherein the light emitting layer is a blue light emitting layer.   The organic EL display device according to claim 13, wherein the organic EL element is of an active matrix drive type.   18. The organic EL display device according to claim 17, wherein the optical filter is located on an electrode side provided with a drive element among opposed electrodes constituting the active matrix drive system.   18. The organic EL display device according to claim 17, wherein the optical filter is located on an electrode side that does not include a drive element among opposed electrodes constituting the active matrix drive system.   The organic EL display device according to claim 13, wherein the organic EL element is of a passive matrix drive type.

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