JP2003229271A - Organic electroluminescent image display device and manufacturing method of the same - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an organic electroluminescent image display device capable of displaying a good image without a defect like a dark area, and to provide a manufacturing method by which, the image display device like the above can be easily manufactured. <P>SOLUTION: The organic electroluminescent image display device is formed by successively arranging a color filter layer, a color conversion phosphor layer, a transparent protection layer, a transparent electrode layer, an organic electroluminescent element layer, and a back side electrode layer on a transparent base board. The transparent barrier layer is formed into a multi-layer structure by repeatedly applying a vacuum film forming method, inserting a cleaning process cleaning the surface on which a film is formed, between respective film forming processes. <P>COPYRIGHT: (C)2003,JPO

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an organic electroluminescent image display device, and more particularly to an organic electroluminescent image display device capable of excellent image display without defects such as dark areas and a manufacturing method thereof.

[0002]

2. Description of the Related Art Organic electroluminescence (E
The L) element has advantages such as high visibility due to self-coloring, being an all-solid-state display unlike a liquid crystal display, being hardly affected by temperature changes, and having a wide viewing angle. Practical application is progressing as a pixel of a device. As an image display device using an organic EL element, (1) an organic EL element layer of three primary colors is formed in a predetermined pattern for each emission color, (2) an organic EL element layer of white emission is used, and three primary colors are used. To be displayed through the color filter of (3) Blue-emitting organic EL
It has been proposed that an element layer is used and a color conversion phosphor layer using a fluorescent dye is provided to convert blue light into green fluorescence or red fluorescence to display three primary colors.

However, in the above-mentioned (1) organic EL image display device, it is necessary to develop a light emitting material of each color in order to emit light of different colors to make it multicolored, and the material itself is an organic compound. Therefore, there is a problem that the resistance in the multicolor patterning by the photolithography method is poor. Further, the multicolor patterning by a dry process other than the photolithography method has a complicated process, and there is a problem in mass production. Further, in the organic EL image display device of the above (2), a color filter is used for the color conversion layer, but when white light is separated by the color filters of the three primary colors,
The emission efficiency of one of the three primary colors is reduced to one-third that of white light, and the extraction efficiency is poor. Therefore, a highly efficient white organic EL
Although an element is required, a white organic EL element capable of stably obtaining sufficient brightness has not been obtained yet.

On the other hand, in the above-mentioned (3) organic EL image display device, a phosphor is used for the color conversion layer, and this color conversion phosphor layer absorbs light and has a longer wavelength (smaller energy). ) Has the function of converting to fluorescence, the conversion efficiency of the color conversion phosphor layer is determined by the product of light absorption efficiency and fluorescence efficiency, and by using a fluorescent dye with high light absorption efficiency and fluorescence efficiency It is possible to emit three primary colors with extremely high conversion efficiency.

Here, in the case of the structure in which the organic EL element layer is laminated on the color conversion phosphor layer, the organic EL element layer has a structure in which a thin organic EL element is sandwiched between electrodes, and therefore the underlying color conversion phosphor is used. The presence of irregularities on the surface of the layer adversely affects the organic EL element layer. For example, due to the unevenness of the surface of the color conversion phosphor layer, a leak may occur between the electrodes sandwiching the organic EL element or the electrode may be broken.
The driving of the light emitting device is adversely affected, and the manufacturing yield of the organic EL image display device is reduced. For this reason, a transparent protective layer is formed so as to cover the color conversion phosphor layer and flattened. In addition, since it is deteriorated by gas such as water vapor, oxygen, organic monomer, and low-molecular component generated from the color conversion phosphor layer or the transparent protective layer, the organic EL element layer cannot be directly formed on the transparent protective layer. In some cases, the organic EL element layer is formed via the transparent barrier layer.

[0006]

However, when there are pinholes in the transparent barrier layer, water and the like generated in the color conversion phosphor layer, the transparent protective layer, etc. reach the organic EL element layer through the transparent barrier layer. However, the organic EL element is deteriorated. Such deterioration of the organic EL element is not preferable because it causes a defective light emission portion (dark area) and is a factor that deteriorates image quality. The present invention has been made in view of the above circumstances, and an organic electroluminescent image display device capable of good image display without defects such as dark areas, and such an image display device can be simply provided. An object is to provide a manufacturing method for manufacturing.

[0007]

In order to achieve such an object, an organic electroluminescent image display device of the present invention comprises a transparent base material and a color filter layer sequentially provided on the transparent base material. , A color conversion phosphor layer, a transparent protective layer, a transparent barrier layer, a transparent electrode layer, an organic electroluminescent element layer, and at least a back electrode layer,
The transparent barrier layer had a multi-layer structure.

As another aspect of the present invention, the transparent barrier layer is configured so that pinholes having a size of 1 μm or more do not exist in an area of 5 cm ² . According to another aspect of the present invention, a black matrix having a predetermined opening pattern is provided between the transparent substrate and the color filter. Further, as another aspect of the present invention, the organic electroluminescence element layer emits blue light, the color conversion phosphor layer converts the blue light into green fluorescence and emits light, and the blue light emits red fluorescence. And a red conversion layer that emits light after being converted into.

The method of manufacturing an organic electroluminescent image display device of the present invention comprises a transparent substrate, a color filter layer, a color conversion phosphor layer, a transparent protective layer and a transparent barrier which are sequentially provided on the transparent substrate. Layer, a transparent electrode layer, an organic electroluminescent element layer, and a back electrode layer, in a method for manufacturing an organic electroluminescent image display device, transparent by performing a plurality of film formation by a vacuum film formation method. The barrier layer was formed, and at least the film-forming surface was washed between the film-forming steps.

As another aspect of the present invention, the cleaning is performed by a dry cleaning method and / or an adhesive roller method. In the present invention as described above, since the transparent barrier layer has a multi-layered structure, even if pinholes are present, it is covered and repaired by another layer, so that the area of 5 cm ² has a size of 1 μm. The above-mentioned pinholes do not exist, and the moisture generated in the color conversion phosphor layer, the transparent protective layer, etc. is reliably blocked by the transparent barrier layer, and the organic EL
Deterioration of the element layer is prevented.

[0011]

DETAILED DESCRIPTION OF THE INVENTION The present invention will be described below with reference to the drawings. FIG. 1 is a partial plan view showing an embodiment of the organic electroluminescent (EL) image display device of the present invention, and FIG. 2 is a vertical section taken along line II-II of the organic EL image display device shown in FIG. 3 is a plan view, and FIG. 3 is a vertical cross-sectional view taken along line III-III of the organic EL image display device shown in FIG. Incidentally, in FIG. 1, in order to show an auxiliary electrode 8 and a transparent electrode layer 9 which will be described later, the blue organic EL element layer 1
0 and a part of the back electrode layer 11 are cut away. 1 to 3, the organic EL image display device 1 is
A transparent base material 2 and a color filter layer 4 including a band-shaped red coloring layer 4R, a green coloring layer 4G, and a blue coloring layer 4B are provided on the transparent base material 2 through a black matrix 3 having a predetermined opening pattern. Has been.

On the color filter layer 4, a color conversion phosphor layer 5 composed of a red conversion phosphor layer 5R, a green conversion phosphor layer 5G and a blue conversion dummy layer 5B is formed. Each layer constituting the color conversion phosphor layer 5 is a red colored layer 4R.
A red conversion phosphor layer 5R, a green conversion phosphor layer 5G, and a blue conversion dummy layer 5B are arranged in a strip shape on the upper side, the green color layer 4G, and the blue color layer 4B, respectively. The positional relationship between the color filter layer 4 and the color conversion phosphor layer 5 is shown in FIG. However, in FIG. 4, in order to show the states of the black matrix 3 and the color filter layer 4, a part of the color conversion phosphor layer 5 is cut away.

A transparent protective layer 6 is provided on the transparent substrate 2 so as to cover the color conversion phosphor layer 5, and a transparent barrier layer 7 is provided so as to cover the transparent protective layer 6, which is a transparent barrier. An auxiliary electrode 8 and a transparent electrode layer 9 are formed on the layer 7 in a band shape from the peripheral terminal portion to the central pixel region. FIG. 5 is a partial plan view showing a state in which the auxiliary electrode 8 and the transparent electrode layer 9 are thus formed on the transparent barrier layer 7. Although the transparent electrode layer 9 is formed on the auxiliary electrode 8 in the illustrated example, the auxiliary electrode 8 may be formed on the transparent electrode layer 9.

In the present invention, the transparent barrier layer 7 has a multi-layer structure. Therefore, even if pinholes are present in the layer forming the transparent barrier layer 7, the transparent barrier layer 7 is covered with another layer and repaired, so that 5 cm ² In the range of the area of 1, the pinhole having a size of 1 μm or more does not exist. The presence of pinholes with a size of 1 μm or more has the function of the transparent barrier layer 7 blocking the gases such as water vapor, oxygen, organic monomers and low-molecular components generated in the color conversion phosphor layer 5 and the transparent protective layer 6. It is a parameter to be shown, and the lower the value, the higher the barrier performance. The present invention defines the existence degree of pinholes having a size of 1 μm or more in the transparent barrier layer 7 so that the blue organic EL element layer 10 due to water or the like generated in the color conversion phosphor layer 5, the transparent protective layer 6 or the like can be formed. It focuses on the fact that deterioration can be reliably suppressed. Transparent barrier layer 7
When a pinhole having a size of 1 μm or more is generated in the area of 5 cm ² , the barrier performance of the transparent barrier layer 7 becomes insufficient, and the color conversion phosphor layer 5 and the transparent protective layer 6 are
The organic EL element layer 10 is deteriorated due to moisture or the like generated in such a case, which is not preferable because it causes a defective light emission portion (dark area). In the present invention, the presence of pinholes having a size of 1 μm or more is defined as 5 cm ^{2 of the} transparent barrier layer.
A value obtained by counting the number of pinholes having a size of 1 μm or more in the area of 1) with an optical microscope photograph (magnification = 1000 times) is used.

In the organic EL image display device 1 of the present invention, the strip-shaped blue organic EL element layer 10 and the back electrode layer 11 intersect the strip-shaped transparent electrode layer 9 at a right angle, and the openings of the black matrix 3 are formed. It is formed on the transparent barrier layer 7 so as to be located thereabove. Further, the partition portion 15 is formed on the transparent barrier layer 7 via the insulating layer 13 so as to intersect the strip-shaped transparent electrode layer 9 at a right angle and to be located on the light shielding portion of the black matrix 3. A dummy organic EL element layer 10 ′ and a back electrode layer 11 ′ are formed on the upper plane of the partition wall portion 15. These are the blue organic EL element layer 1 using the partition wall portion 15 as a patterning means.
It is formed as a result of removing unnecessary forming material by adhering to the partition wall portion 15 so as not to reach the transparent electrode layer 9 in order to form a strip-shaped pattern in the formation of the 0 and the back electrode layer 11. In addition, in the illustrated example, the insulating layer 13 is provided in a stripe shape only in the formation portion of the partition wall portion 15, but the present invention is not limited to this, and the transparent electrode layer 9 is provided.
Alternatively, the insulating layer 13 may be a lattice-shaped pattern in which the back electrode layer 11 and the back electrode layer 11 have openings at respective portions (picture elements) intersecting each other with the blue organic EL element layer 10 interposed therebetween.

In the organic EL image display device 1 of the present invention as described above, the blue light emitted from the blue organic EL element layer 10 is converted into red fluorescence by the red conversion phosphor layer 5R and the green conversion phosphor layer. The light is made green in 5G, and the blue light is transmitted through the blue conversion dummy layer 5B as it is. After that, the light of each color is color-corrected by the color filter layer 4 to display the three primary colors. In addition, since the external light is also made to fluoresce by the color conversion phosphor layer of each color, the color filter layer 4 is also required to filter the external light. Since there is no pinhole having a size of 1 μm or more in the area of 5 cm ² of the transparent barrier layer 7, the color conversion phosphor layer 5 and the transparent protective layer 6 are formed.
Moisture and the like generated in the above are surely blocked in the transparent barrier layer 7, the deterioration of the organic EL element layer is prevented, and the generation of a defective light emitting portion (dark area) is prevented. As a result, high quality image display is possible. Although the constituent layers such as the color filter layer 4 are provided via the black matrix 3 in the above-described embodiment, the black matrix 3 may not be provided.

The color conversion phosphor layer 5 is a blue organic EL.
It is provided with a red conversion phosphor layer 5R and a green conversion phosphor layer 5G that convert the blue light emitted from the element layer 10 into red fluorescence and green fluorescence, but the present invention is not limited to this. Also, any material having a color conversion phosphor layer capable of converting to long-wavelength fluorescence may be used. Then, by setting the combination with the color filter layer 4 that enhances the color purity by color-correcting the light of each color from the color conversion phosphor layer 5, it is possible to display the three primary colors.

Next, each component of the organic EL image display device 1 of the present invention will be described, and the organic E of the present invention will be described.
A method of manufacturing the L image display device will be described. Organic EL
As the transparent base material 2 constituting the image display device 1, a material made of a glass material, a resin material, or a composite material thereof having light transmittance can be used. The thickness of the transparent substrate 2 can be set in consideration of the material, the usage status of the image display device, and the like, and can be set to about 0.5 to 1.2 mm, for example.

The black matrix 3 has openings 3a and light-shielding portions 3b in a predetermined pattern. FIG. 6 is a partial plan view showing a state in which the color filter layer 4 is formed on the transparent substrate 2 with the black matrix 3 interposed therebetween. To show the state of the black matrix 3, the red colored layer 4 is shown.
A part of R is shown in a cutout state. Such a black matrix 3 contains a thin metal film of chromium or the like having a thickness of about 1000 to 2000 Å formed by a sputtering method, a vacuum deposition method or the like, and is formed by patterning the thin film, and light shielding particles such as carbon fine particles. A resin layer of polyimide resin, acrylic resin, epoxy resin, etc. is formed, and the resin layer is patterned to form a photosensitive resin layer containing light shielding particles such as carbon fine particles and metal oxides. However, it may be any of those formed by patterning this photosensitive resin layer.

The color filter layer 4 is a color conversion phosphor layer 5
The color filter layer 4 also plays a role of filtering external light, since the color purity of each color from each color is corrected to increase the color purity, and the external light is also fluorescent by the color conversion phosphor layer of each color. Have The blue coloring layer 4B, the red coloring layer 4R, and the green coloring layer 4G that form the color filter layer 4 are blue light emitted from the blue organic EL element layer 10, red fluorescence from the red conversion phosphor layer 5R, and green conversion fluorescence. Body layer 5G
The material can be appropriately selected according to the characteristics of the green fluorescence from the above. The color filter layer 4 can be formed by a pigment dispersion method using a photosensitive resin containing a desired coloring material, and further can be formed by a known method such as a printing method, an electrodeposition method or a transfer method. it can. The thickness of such a color filter layer 4 can be appropriately set according to the material of each colored layer, the fluorescence emitted from the color conversion phosphor layer 5, and the like, and is set, for example, in the range of about 1 to 2 μm. be able to.

Of the color conversion phosphor layers 5 constituting the organic EL image display device 1, the red conversion phosphor layers 5R and the green conversion phosphor layers 5G are layers composed of a fluorescent dye alone or fluorescent dyes in a resin. Is a layer containing. The fluorescent dye used in the red conversion phosphor layer 5R that converts blue light emission into red fluorescence is 4-dicyanomethylene-2-methyl-
Cyanine dye such as 6- (p-dimethylaminostyryl) -4H-pyran, pyridine such as 1-ethyl-2- [4- (p-dimethylaminophenyl) -1,3-butadienyl] -pyridinium-perchlorate Examples include dyes, rhodamine dyes such as rhodamine B and rhodamine 6G, and oxazine dyes. Further, as the fluorescent dye used for the green conversion phosphor layer 5G that converts blue light emission into green fluorescence, 2,3,5,6-1H, 4H-tetrahydro-8-
Trifluoromethylquinolidino (9,9a, 1-gh)
Coumarin, 3- (2'-benzothiazolyl) -7-diethylaminocoumarin, 3- (2'-benzimidazolyl) -7-N, N-diethylaminocoumarin, etc., coumarin dye, basic yellow 51, etc., coumarin dye, solvent Yellow 11, Solvent Yellow 11
Naphthalimide dyes such as 6 are listed. Further, various dyes such as direct dyes, acid dyes, basic dyes and disperse dyes can also be used if they have fluorescence. The above-mentioned fluorescent dyes can be used alone or in combination of two or more. When the red conversion phosphor layer 5R and the green conversion phosphor layer 5G contain a fluorescent dye in the resin, the content of the fluorescent dye should be determined in consideration of the fluorescent dye to be used, the thickness of the color conversion phosphor layer, and the like. Can be appropriately set by, for example, 10 ^-4 -1 for 1 kg of resin used
It can be about molar. The blue conversion dummy layer 5B transmits the blue light emitted from the blue organic EL element layer 10 as it is and sends it to the color filter layer 4. The blue conversion dummy layer 5B includes a red conversion phosphor layer 5R and a green conversion phosphor layer 5G. The transparent resin layer can have almost the same thickness.

When the red conversion phosphor layer 5R and the green conversion phosphor layer 5G contain a fluorescent dye in a resin, the resin may be polymethylmethacrylate, polyacrylate, polycarbonate, polyvinyl alcohol, polyvinylpyrrolidone, hydroxy. Use transparent (visible light transmittance 50% or more) resin such as ethyl cellulose, carboxymethyl cellulose, polyvinyl chloride resin, melamine resin, phenol resin, alkyd resin, epoxy resin, polyurethane resin, polyester resin, maleic acid resin, polyamide resin be able to. When the pattern formation of the color conversion phosphor layer 5 is performed by a photolithography method, for example, a photocurable resist having a reactive vinyl group such as acrylic acid type, methacrylic acid type, polyvinyl cinnamate type, ring rubber type, etc. Resins can be used. Furthermore, these resins can be used for the blue conversion dummy layer 5B described above.

When the red color conversion phosphor layer 5R and the green color conversion phosphor layer 5G constituting the color conversion phosphor layer 5 are formed of a fluorescent dye alone, for example, a vacuum deposition method or a sputtering method via a desired pattern mask. Can be formed into a strip shape. Further, when formed as a layer containing a fluorescent dye in the resin, for example, a coating solution obtained by dispersing or solubilizing the fluorescent dye and the resin, spin coating, roll coating,
The red conversion phosphor layer 5R and the green conversion phosphor are applied by a method such as cast coating to form a film, and a method of patterning this by a photolithography method, a method of pattern printing the above coating solution by a screen printing method, or the like. The layer 5G can be formed. The blue conversion dummy layer 5B is
Spin coat, roll coat, or coat the desired photosensitive resin paint
It can be formed by a method such as cast coating or the like to form a film and then patterning it by a photolithography method or a method of pattern-printing a desired resin coating solution by a screen printing method or the like.

The thickness of the color conversion phosphor layer 5 is such that the red conversion phosphor layer 5R and the green conversion phosphor layer 5G sufficiently absorb the blue light emitted from the blue organic EL element layer 10 to generate fluorescence. It is necessary to consider the fluorescent dye to be used, the fluorescent dye concentration, etc. to be used, and it can be appropriately set, for example, can be about 5 to 15 μm, and the red conversion phosphor layer 5R The green conversion phosphor layer 5G and the green conversion phosphor layer 5G may have different thicknesses.

When the transparent protective layer 6 constituting the organic EL image display device 1 has a step (surface irregularity) due to the constitution of the color conversion phosphor layer 5 and below, the step is eliminated to achieve flatness. It serves to flatten the blue organic EL element layer 10 so as to prevent uneven thickness. Such a transparent protective layer 6 can be formed of a transparent (visible light transmittance of 50% or more) resin. Specifically, an acrylate-based or methacrylate-based photocurable resin or thermosetting resin having a reactive vinyl group can be used. Further, as the transparent resin, polymethylmethacrylate, polyacrylate, polycarbonate, polyvinyl alcohol, polyvinylpyrrolidone, hydroxyethylcellulose, carboxymethylcellulose, polyvinyl chloride resin, melamine resin, phenol resin, alkyd resin, epoxy resin, polyurethane resin, polyester resin, Maleic acid resin, polyamide resin, etc. can be used.

When the above resin material is a liquid, the transparent protective layer 6 is formed by applying a film by a method such as spin coating, roll coating, cast coating or the like, and the photocurable resin is necessary after irradiation with ultraviolet rays. The thermosetting resin is cured as it is after the film formation. When the material used is formed into a film, it can be attached directly or via an adhesive. Such a transparent protective layer 6
Can have a thickness of, for example, about 2 to 7 μm.

The transparent barrier layer 7 constituting the organic EL image display device 1 has a multi-layer structure, and it is preferable to provide an electrically insulating inorganic oxide film. This inorganic oxide film is composed of silicon oxide, aluminum oxide, titanium oxide, yttrium oxide, germanium oxide, zinc oxide, magnesium oxide,
It can be formed using one or more oxides such as calcium oxide, boron oxide, strontium oxide, barium oxide, lead oxide, zirconium oxide, sodium oxide, lithium oxide and potassium oxide, and particularly silicon oxide, Aluminum oxide and titanium oxide can be preferably used. Further, such an inorganic oxide film may contain a nitride such as silicon nitride as an accessory component.

The transparent barrier layer 7 preferably has a multilayer structure made of the same material in terms of manufacturing cost, but may have a multilayer structure made of different materials within the range of the above materials. In the manufacturing method of the present invention, a step of forming such a transparent barrier layer 7 by performing film formation by a vacuum film formation method a plurality of times and cleaning at least the film formation surface between each film formation step. To have. As the vacuum film forming method, a vacuum vapor deposition method, a sputtering method, an ion plating method or the like can be used, and the number of times of film formation is appropriately determined in consideration of the set thickness of the transparent barrier layer 7 to be formed and the vacuum film forming condition. Although it can be set, for example, about 2 to 4 times. The thickness of the transparent barrier layer 7 can be appropriately set in the range of 0.01 to 1 μm in consideration of the barrier property and the transparency.

The cleaning process performed between each film forming process may be performed inside the vacuum chamber or may be performed inside a clean room outside the vacuum chamber. Examples of the cleaning method include a dry cleaning method and an adhesive roll method. The dry cleaning method is a method that removes dust such as fine particles on the film formation surface by vacuum suction without using water or chemicals.By combining an ultrasonic generator with a vacuum suction device This is preferable because the effect is improved. Further, the adhesive roll method is a method in which a roller having an adhesive property on its peripheral surface is scanned over the film-forming surface and dust such as fine particles is adhered to the roller surface to be removed. The hardness and adhesiveness of the roller surface can be appropriately set according to the material of the film forming surface and the like.

In the above cleaning step, either one of the dry cleaning method and the adhesive roll method may be used, or each method may be combined. Further, in order to remove the embedded particles, polishing may be performed before the above cleaning.

As described above, in the manufacturing method of the present invention, the transparent barrier layer is formed by a plurality of film formations. Therefore, even if a pinhole is formed in the thin film formed by one film formation, this pin The hole portion is repaired with a thin film at the time of another film formation, and a fine particle or the like which causes pinholes can be removed by a cleaning process provided between each film formation process.
Thereby, the formed transparent barrier layer 7 has a thickness of 5 cm ^2.
No pinholes having a size of 1 μm or more are present in the area range.

A metal material is generally used for the auxiliary electrode 8 constituting the organic EL image display device 1, and gold, silver, copper,
Examples thereof include magnesium alloys (MgAg and the like), aluminum alloys (AlLi, AlCa, AlMg and the like), metallic calcium and the like. Such an auxiliary electrode 8 is arranged so as to be located on the light shielding portion of the black matrix 3 from the peripheral terminal portion to the central pixel area.

The material of the transparent electrode layer 9 constituting the organic EL image display device 1 has a large work function (4e).
V or more) metals, alloys, and mixtures thereof can be used, and examples thereof include conductive materials such as indium tin oxide (ITO), indium oxide, zinc oxide, and stannic oxide. The transparent electrode layer 9 is arranged in a strip shape so as to be located on the opening portion of the black matrix 3 and on the auxiliary electrode 8 from the peripheral terminal portion to the central pixel area. The transparent electrode layer 9 preferably has a sheet resistance of several hundreds Ω / □ or less, and the thickness of the transparent electrode layer 9 is, for example, 10 nm to 300 nm, preferably 100 to 200 nm, although it depends on the material. it can. The auxiliary electrode 8 and the transparent electrode layer 9 can be formed into a desired shape by forming a thin film using the above materials by a vacuum deposition method or a sputtering method and performing pattern etching using the photolithography method.

The blue organic EL element layer 10 constituting the organic EL image display device 1 has a structure composed of a light emitting layer alone, a structure in which a hole injection layer is provided on the transparent electrode layer 9 side of the light emitting layer, and a back electrode of the light emitting layer. For example, an electron injection layer may be provided on the layer 11 side, a hole injection layer may be provided on the transparent electrode layer 9 side of the light emitting layer, and an electron injection layer may be provided on the back electrode layer 11 side. The light emitting layer forming the blue organic EL element layer 10 also has the following functions. -Injection function: A function that can inject holes from the anode or the hole injection layer when an electric field is applied, and can inject electrons from the cathode or the electron injection layer-Transport function: Injected charges (electrons and holes) Function of moving electrons by the force of an electric field, light emitting function: a function of providing a field for recombination of electrons and holes and connecting this to light emission

Examples of the material of the light emitting layer having such a function include fluorescent brightening agents such as benzothiazole type, benzimidazole type and benzoxazole type disclosed in JP-A-8-279394, and metal chelates. Oxynoid compounds, styrylbenzene compounds, distyrylpyrazine derivatives, aromatic dimethylidene compounds, and the like.

Specifically, a benzothiazole system such as 2-2 '-(p-phenylenedivinylene) -bishenzothiazole; 2- [2- [4- (2-benzimidazolyl) phenyl] vinyl] benzimidazole, 2- [2
-(4-Carboxyphenyl) vinyl] benzimidazole-based compounds such as benzimidazole;
7-di-t-pentyl-2-benzoxazolyl)-
1,3,4-thiadiazole, 4,4'-bis (5,7
Examples of optical brighteners such as benzoxazole-based compounds such as -t-pentyl-2-benzoxazolyl) stilbene and 2- [2- (4-chlorophenyl) vinyl] naphtho [1,2-d] oxazole. it can.

Examples of the metal chelated oxinoid compound include 8-hydroxyquinoline compounds such as tris (8-quinolinol) aluminum, bis (8-quinolinol) magnesium, and bis (benzo [f] -8-quinolinol) zinc. Examples thereof include metal complexes and dilithium epinetridione. The styrylbenzene compounds include 1,4-bis (2-methylstyryl) benzene and 1,4-bis (3-methylstyryl).
Benzene, 1,4-bis (4-methylstyryl) benzene, distyrylbenzene, 1,4-bis (2-ethylstyryl) benzene, 1,4-bis (3-ethylstyryl) benzene, 1,4-bis (2-methylstyryl)-
Examples thereof include 2-methylbenzene and 1,4-bis (2-methylstyryl) -2-ethylbenzene.

As the above-mentioned distyrylpyrazine derivative, 2,5-bis (4-methylstyryl) pyrazine, 2,5-bis (4-ethylstyryl) pyrazine,
2,5-bis [2- (1-naphthyl) vinyl] pyrazine, 2,5-bis (4-methoxystyryl) pyrazine,
2,5-bis [2- (4-biphenyl) vinyl] pyrazine, 2,5-bis [2- (1-pyrenyl) vinyl] pyrazine and the like can be mentioned. Moreover, as the above-mentioned aromatic dimethylidene-based compound, 1,4-phenylene dimethylidene, 4,4-phenylene dimethylidene, 2,
5-Xylylenedimethylidene, 2,6-Naphthylenedimethylidene, 1,4-Biphenylenedimethylidene,
1,4-p-Telephenylenedimethyridin, 9,10
-Anthracenediyldilmethylidyne, 4,4'-bis (2,2-di-t-butylphenylvinyl) biphenyl, 4,4'-bis (2,2-diphenylvinyl) biphenyl and the like, and their derivatives Can be mentioned.

Further, as a material for the light emitting layer, there is disclosed in
The general formula (Rs-
Q) The compound represented by 2-AL-OL can also be mentioned (wherein AL is a carbon atom 6 containing a benzene ring).
~ 24 hydrocarbons, OL is a phenylate ligand, Q is a substituted 8-quinolinolate ligand,
Rs represents an 8-quinolinolate substituent selected to sterically hinder the attachment of two or more substituted 8-quinolinolate ligands to the aluminum atom). In particular,
Bis (2-methyl-8-quinolinolato) (para-phenylphenolato) aluminum (III), bis (2-
Methyl-8-quinolinolate) (1-naphtholato) aluminum (III) and the like. The thickness of the light emitting layer is not particularly limited and may be, for example, about 5 nm to 5 μm.

The material for the hole injecting layer is any of those conventionally used as a hole injecting material for a photoconductive material and known materials for a hole injecting layer for an organic EL device. Can be selected and used. The material of the hole injection layer has either hole injection or electron barrier properties, and may be either an organic substance or an inorganic substance. Specifically, triazole derivatives, oxadiazole derivatives, imidazole derivatives, polyarylalkane derivatives, pyrazoline derivatives, pyrazolone derivatives, phenylenediamine derivatives, arylamine derivatives, amino-substituted chalcone derivatives, oxazole derivatives,
Styrylanthracene derivative, fluorenone derivative, hydrazone derivative, stilbene derivative, silazane derivative,
Examples thereof include polysilane-based and aniline-based copolymers and dielectric polymer oligomers such as thiophene oligomers.

Further, as the material of the hole injection layer, a porphyrin compound, an aromatic tertiary amine compound and a styrylamine compound can be mentioned. Examples of the porphyrin compound include polyfin, 1,10,15,20-
Tetraphenyl-21H, 23H-polyfin copper (I
I), aluminum phthalocyanine chloride, copper octamethylphthalocyanine and the like. Also,
Examples of aromatic tertiary amine compounds and styrylamine compounds include N, N, N ', N'-tetraphenyl-4,
4'-diaminophenyl, N, N'-diphenyl-N,
N'-bis (3-methylphenyl)-[1,1'-biphenyl] -4,4'-diamine, 4- (di-p-tolylamino) -4 '-[4 (di-p-tolylamino) styryl ] Stilbene, 3-methoxy-4′-N, N-diphenylaminostilbenzene, 4,4′-bis [N- (1
-Naphthyl) -N-phenylamino] biphenyl, 4,
4 ', 4 "-tris [N- (3-methylphenyl) -N
-Phenylamino] triphenylamine and the like can be mentioned. The thickness of the hole injection layer is not particularly limited and may be, for example, about 5 nm to 5 μm.

The material for the electron injecting layer may have a function of transmitting electrons injected from the cathode to the light emitting layer, and any material can be selected from conventionally known compounds. Can be used. Specifically, a nitro-substituted fluorene derivative, an anthraquinodimethane derivative, a diphenylquinone derivative, a thiopyran dioxide derivative, a heterocyclic tetracarboxylic acid anhydride such as naphthalene perylene, a carbodiimide, a fluorenylidene methane derivative, an anthraquinodimethane. And anthrone derivative, oxadiazole derivative, thiazole derivative in which oxygen atom of the above oxadiazole ring is substituted with sulfur atom, quinoxaline derivative having quinoxaline ring known as electron withdrawing group, tris (8-quinolinol)
A metal complex of an 8-quinolinol derivative such as aluminum,
Examples thereof include phthalocyanine, metal phthalocyanine, and distyrylpyrazine derivatives. The thickness of the electron injection layer is not particularly limited and may be, for example, about 5 nm to 5 μm.

The blue organic EL element layer 10 can be formed by using the above-mentioned light emitting layer material with the partition wall 15 as a mask by a method such as a vacuum vapor deposition method. In this method, the film is formed through a photomask (a mask for preventing film formation on the electrode terminals formed of the auxiliary electrode 8 and the transparent electrode layer 9 in the peripheral portion) having an opening corresponding to the image display region. As a result, the partition portions 15 serve as a mask pattern, and the light emitting layer material can pass through only between the partition portions 15 and reach the transparent electrode layer 9. Thereby, the band-shaped blue organic EL element layer 10 can be formed without performing patterning such as photolithography. In the formation of the blue organic EL element layer 10 using the partition wall portion 15 as described above, as shown in FIGS. 1 and 2, among the barrier portion 15 arranged in a plurality, the partition wall located at the most peripheral portion. The edge of the image display area is located on the upper plane of the portion 15, and the dummy organic EL element layer 10 ′ is formed only in about half (the image display area side) in the width direction.

Further, the blue organic EL element layer 10 does not have a structure in which the light emitting layer is used alone, but has a structure in which a hole injection layer is provided on the transparent electrode layer 9 side of the light emitting layer, and electrons are injected on the back electrode layer 11 side of the light emitting layer. In the case of a structure including a layer, a structure including a hole injection layer on the transparent electrode layer 9 side of the light emitting layer and an electron injection layer on the back electrode layer 11 side, the above-described hole injection layer material and electron injection layer, respectively. By using a material and forming a film by a method such as a vacuum vapor deposition method, it is possible to form a belt-like pattern in the same manner as the above-mentioned light emitting layer.

The material of the back electrode layer 11 constituting the organic EL image display device 1 is formed of a metal, an alloy or a mixture thereof having a low work function (4 eV or less). Specifically, sodium, sodium-potassium alloy, magnesium, lithium, magnesium / copper mixture, magnesium / silver mixture, magnesium / aluminum mixture,
Examples thereof include a magnesium / indium mixture, an aluminum / aluminum oxide (Al ₂ O ₃ ) mixture, indium, a lithium / aluminum mixture, a rare earth metal and the like.
Considering the electron injecting property and the durability against oxidation etc. as an electrode, a mixture of an electron injecting metal and a second metal which is a stable metal having a larger work function value is preferable, for example, a magnesium / silver mixture. ,magnesium/
Examples thereof include an aluminum mixture, a magnesium / indium mixture, an aluminum / aluminum oxide (Al ₂ O ₃ ) mixture, a lithium / aluminum mixture and the like. The sheet resistance of the back electrode layer 11 is preferably several hundreds Ω / □ or less, and therefore, the thickness of the back electrode layer 11 can be set to, for example, 10 nm to 1 μm, preferably about 50 to 200 nm.

The back electrode layer 11 can be formed by using the above-mentioned electrode material with the partition wall 15 as a mask by a method such as a vacuum deposition method. That is, the partition portions 15 serve as a mask pattern, and the electrode material can pass through only between the partition portions 15 and reach the blue organic EL element layer 10. Since it is not necessary to perform patterning such as photolithography, the characteristics of the blue organic EL element layer 10 are not deteriorated.

The insulating layer 13 constituting the organic EL image display device 1 is formed so as to be located on the light shielding portion of the black matrix 3. The insulating layer 13 can be formed into a desired shape by using the same material and method as those of the transparent protective layer 6 described above, for example. Such an insulating layer 13
Can have a thickness of about 1 to 5 μm.

As described above, the partition wall portion 15 constituting the organic EL image display device 1 intersects the belt-shaped transparent electrode layer 9 at a right angle so that the blue organic EL element layer 10 and the back electrode layer 11 are formed.
It is a partition pattern for forming and in a strip shape. Such a partition 15 can be formed using a known photosensitive resist material, but in the case of a positive type photosensitive resist, the partition (insulating layer 13 side) has a narrow V-shaped cross section. Since it is difficult to form the portion 15, it is preferable to use a negative photosensitive resist. The partition wall 15 is formed by applying a photosensitive resin such as polyimide, cyclized rubber, or polycinnamic acid by a method such as spin coating, roll coating, or cast coating to form a film, which is then patterned by photolithography. Can be formed. Partition 1
The height of 5 can be set to about 5 to 20 μm, and the width can be set according to the width of the light shielding portion of the black matrix 3 and the like, and can usually be set to about 10 to 50 μm.

[0049]

EXAMPLES Next, the present invention will be described in more detail by showing examples.

[Example] Formation of Black Matrix As a transparent substrate, 150 mm x 150 mm, thickness 0.7
mm soda glass (Sn surface polished product manufactured by Central Glass Co., Ltd.) was prepared. After cleaning this transparent substrate according to a standard method, a thin film of composite chromium oxynitride (thickness 0.2 μm) is formed on the entire surface of one side of the transparent substrate by a sputtering method, and a photosensitive resist is applied on this thin film of composite chromium. ,
Mask exposure, development, and etching of the composite chromium thin film are performed to form a rectangular opening of 84 μm × 284 μm to 100 mm.
A black matrix provided in a matrix with a pitch of μm was formed.

Formation of Color Filter Layer Three kinds of photosensitive coating materials for colored layers of red, green and blue were prepared. That is, the photosensitive coating for the red colored layer is a perylene pigment, a lake pigment, an azo pigment, a quinacridone pigment,
A coloring material composed of an anthraquinone-based pigment, an anthracene-based pigment, an isoindoline-based pigment or the like, or a mixture of two or more kinds thereof is dispersed in a binder resin. As the binder resin, transparent (visible light transmittance 50
% Or more), and examples thereof include transparent resins such as polymethylmethacrylate, polyacrylate, polycarbonate, polyvinyl alcohol, polyvinylpyrrolidone, hydroxyethyl cellulose and carboxymethyl cellulose. Further, the content of the coloring material was set so as to be contained in the formed coloring layer in an amount of 5 to 50% by weight.

The photosensitive coating material for the green colored layer may be a halogen polysubstituted phthalocyanine pigment, a halogen polysubstituted copper phthalocyanine pigment, a triphenylmethane basic dye, an isoindoline pigment, an isoindolinone pigment, or the like, or A coloring material composed of a mixture of two or more kinds was dispersed in a binder resin. Examples of the binder resin include the above-mentioned transparent resins, and the content of the coloring material was set to be 5 to 50% by weight in the formed colored layer. The photosensitive coating material for the blue colored layer is a binder resin that is a single component of a copper phthalocyanine pigment, an indanthrene pigment, an indophenol pigment, a cyanine pigment, a dioxazine pigment, or a mixture of two or more kinds. It was dispersed in. Examples of the binder resin include the above-mentioned transparent resins, and the content of the coloring material was set to be 5 to 50% by weight in the formed colored layer.

Next, the colored layers of the respective colors were formed using the above-mentioned three types of photosensitive paints for colored layers. That is, a photosensitive coating material for the green colored layer was applied to the entire surface of the transparent substrate on which the black matrix had been formed by spin coating, and prebaking (80 ° C., 30 minutes) was performed. Then, it exposed using the photomask for predetermined coloring layers. Then, development is performed with a developing solution (0.05% KOH aqueous solution), and then post-baking (100 ° C., 30 minutes) is performed to form a strip-shaped (width 90 μm) green at a predetermined position with respect to the black matrix pattern. A colored layer (thickness 1.5 μm) was formed. Similarly, a strip-shaped (width 90 μm) red color layer (thickness 1.5 μm) was formed at a predetermined position with respect to the black matrix pattern using the photosensitive coating material for the red color layer. Further, a band-shaped (width 90 μm) blue color layer (thickness 1.5 μm) was formed at a predetermined position with respect to the black matrix pattern using the photosensitive coating material for the blue color layer.

Formation of Color Conversion Phosphor Layer Next, a blue conversion dummy layer coating liquid (Color Mosaic CB-7 manufactured by Fuji Hunt Electronics Technology Co., Ltd.)
001) was applied on the colored layer by spin coating and prebaked (80 ° C., 30 minutes). Next, patterning was performed by a photolithography method, and post baking (100 ° C., 30 minutes) was performed. This allows
A band-shaped (width 90 μm) blue conversion dummy layer (thickness 10 μm) was formed on the blue colored layer.

Next, an alkali-soluble negative resist in which a green-converting phosphor (Coumarin 6 manufactured by Aldrich Co., Ltd.) is dispersed is used as a coating liquid for a green-converting phosphor layer, and this is applied onto the colored layer by spin coating. , Prebake (8
(0 ° C., 30 minutes). Then, patterning is performed by photolithography, and post bake (10
(0 ° C., 30 minutes). As a result, a strip-shaped (width 90 μm) green conversion phosphor layer (thickness 10 μm is formed on the green colored layer.
m) was formed. Furthermore, an alkali-soluble negative resist in which a red-converting phosphor (Rhodamine 6G manufactured by Aldrich Co., Ltd.) is dispersed is used as a coating liquid for a red-converting phosphor layer, which is applied onto the colored layer by a spin coating method and prebaked ( 80 degreeC, 30 minutes) was performed. Next, patterning was performed by a photolithography method, and post baking (100 ° C., 30 minutes) was performed. As a result, a band-shaped (width 90 μm) red conversion phosphor layer (thickness 10 μm) was formed on the red colored layer.

Formation of transparent protective layer A norbornene resin having an average molecular weight of about 100,000 (ARTON manufactured by JSR Corporation) was diluted with toluene, and a transparent protective layer coating solution was used to spin-coat a transparent substrate on a transparent substrate. After coating, baking (100 ° C., 30 minutes) was performed. As a result, a transparent protective layer (thickness 7 μm) was formed so as to cover the color conversion phosphor layer. The formed transparent protective layer was a transparent and uniform film.

Surface Flattening Treatment of Transparent Protective Layer The transparent protective layer formed as described above was lapping-polished while spraying pure water with a # 800 polishing tape. Then, mirror polishing (polishing) was performed on the transparent protective layer using a rotary polishing machine (manufactured by Speed Fam) while spraying an alumina fine particle abrasive.

Formation of Transparent Barrier Layer Next, a silicon oxide film is formed three times on the above-mentioned transparent protective layer by the sputtering method under the following conditions to have a thickness of 300 nm.
To form a transparent barrier layer. Between each film forming step, the transparent substrate is taken out of the vacuum chamber and is placed in a clean room using an ultrasonic dry cleaning device (UVU- manufactured by Shinko Co., Ltd.).
Using F), the film formation surface was dry-cleaned under the following conditions.

(Silicon oxide film forming conditions) RF sputtering power: 50 W / cm ² , frequency 13.56 MHz Film forming rate: 10 nm / min Film forming pressure: 0.5 Pa SiO ₂ target: 4 N (density) 2.25 g / cm ³ )

(Conditions for dry cleaning) ・ Ultrasonic pressure: 14 Pa ・ Clearance from film forming surface: Approximately 1.5 mm ・ Transparent speed of transparent substrate: 100 mm / sec Regarding the transparent barrier layer thus formed, 5c
Pinholes with a size of 1 μm or more in the area of m ² ,
As a result of observing with an optical microscope photograph (magnification = 1000 times), it could not be detected.

Formation of Transparent Electrode Layer Next, an indium tin oxide (IT) film having a thickness of 150 nm is formed on the transparent barrier layer by an ion plating method.
O) An electrode film was formed, a photosensitive resist was applied on the ITO electrode film, mask exposure, development, and etching of the ITO electrode film were performed to form a transparent electrode layer. The transparent electrode layer is a strip-shaped pattern having a width of 60 μm formed on the transparent barrier layer so as to ride on the color conversion phosphor layer from the transparent substrate, and each color of the color filter layer is formed on the color conversion phosphor layer. It was located on a layer.

Formation of Auxiliary Electrode Next, a chromium thin film (thickness: 0.
2 μm) was formed, a photosensitive resist was applied on the chromium thin film, mask exposure, development, and etching of the chromium thin film were performed to form an auxiliary electrode. This auxiliary electrode is a striped pattern formed on the transparent electrode layer so as to ride on the color conversion phosphor layer from the transparent base material, and the width of 14 μm on the color conversion phosphor layer is a black matrix light-shielding portion. The width of the terminal portion of the peripheral portion of the transparent substrate located above was 60 μm.

Formation of insulating layer and partition wall A norbornene resin (ARTON manufactured by JSR Corporation) having an average molecular weight of about 100,000 is diluted with toluene, and a transparent protective layer coating solution is used. On the transparent barrier layer so as to cover the film, and then baking (100 ° C., 30 minutes) is performed to form an insulating film (thickness 1 μm
m) was formed. Next, a photosensitive resist was applied on the insulating film, mask exposure, development, and etching of the insulating film were performed to form an insulating layer. This insulating layer has a stripe-shaped (width 20 μm) pattern that intersects the transparent electrode layer at a right angle, and is located on the light-shielding portion of the black matrix.

Next, a partition wall coating material (photoresist ZPN1100 manufactured by Nippon Zeon Co., Ltd.) is applied to the entire surface by spin coating so as to cover the insulating layer, and prebaked (7
(0 ° C., 30 minutes). After that, exposure is performed using a predetermined photomask for the partition wall, and a developing solution (Zeon Corporation)
ZTMA-100) manufactured, and then post-baked (100 ° C., 30 minutes). This allows
A partition portion was formed on the insulating layer. This partition has a height of 10
μm, lower part (insulating layer side) width 15 μm, upper part width 26 μm
It had a shape that was m.

Formation of Blue Organic EL Element Layer Next, a blue organic E consisting of a hole injection layer, a light emitting layer, and an electron injection layer is formed by a vacuum evaporation method using the partition wall as a mask.
The L element layer was formed. That is, first, 4, 4 ', 4 "
-Tris [N- (3-methylphenyl) -N-phenylamino] triphenylamine was vapor-deposited to a thickness of 200 nm through a photomask having an opening corresponding to an image display area to form a film, and then, 4,4'-bis [N- (1
20-naphthyl) -N-phenylamino] biphenyl
By depositing and forming a film with a thickness of nm, the partition wall portions became a mask pattern, and the hole injection layer material passed only between the partition wall portions to form the hole injection layer on the transparent electrode layer. Similarly, 4,4'-bis (2,2-diphenylvinyl) biphenyl was vapor-deposited to a thickness of 50 nm to form a film, thereby forming a light emitting layer. Then, tris (8-quinolinol) aluminum was vapor-deposited to a thickness of 20 nm to form an electron injection layer. The blue organic EL element layer thus formed is present as a strip-shaped pattern having a width of 280 μm between the partition portions, and the upper surface of the partition portion has a similar layer structure and is a dummy blue organic EL element layer. Was formed.

Formation of Back Electrode Layer Next, magnesium and silver are simultaneously vapor-deposited by a vacuum vapor deposition method in a region where the partition wall is formed through a photomask having a predetermined opening wider than the image display region. (Magnesium vapor deposition rate = 1.3 to 1.4 nm / sec, silver vapor deposition rate = 0.1 nm / sec) to form a film. As a result, the back electrode layer (thickness: 200 nm) made of the magnesium / silver mixture serves as a blue organic EL by using the partition wall as a mask.
It was formed on the device layer. This back electrode layer has a width of 280μ
The strip-shaped pattern of m was present on the blue organic EL element layer, and a dummy back electrode layer was also formed on the upper surface of the partition wall.

As described above, an organic EL image display device was obtained. The transparent electrode layer and the back electrode layer intersect each other by continuously applying a voltage of 8.5 V DC at a constant current density of 10 mA / cm ² to the transparent electrode layer and the back electrode layer of this organic EL image display device. Then, the blue organic EL element layer in the desired portion was illuminated. And color conversion with the color conversion phosphor layer,
Alternatively, as a result of measuring the defect occurrence rate due to the dark area for the light emission of each color observed on the opposite surface side of the transparent substrate after passing through as it is and color-corrected by the color filter layer, it is 0.5%, It was possible to display high quality three primary color images.

Comparative Example A transparent protective layer was prepared in the same manner as in the example. Then, a silicon oxide film (thickness: 300 nm) was formed on the transparent protective layer by a single film-forming process under the following conditions by a sputtering method to form a transparent barrier layer. (Silicon oxide film forming conditions) RF sputtering power: 50 W / cm ² , frequency 13.56 MHz Film forming rate: 10 nm / min Film forming pressure: 0.5 Pa SiO ₂ target: 4 N (density 2.25 g) / Cm ³ )

With respect to the transparent barrier layer thus formed, the number of pinholes having a size of 1 μm or more in a region of 5 cm ² was counted by an optical microscope photograph (magnification = 1000 times), and as a result, it was three. Then, an organic EL image display device was produced in the same manner as in the example. This organic E
A voltage was applied to the L image display device in the same manner as in the embodiment, the image display quality was observed, and the defect occurrence rate due to the dark area was measured. As a result, it was as high as 10%, and good three primary color image display was impossible. there were.

[0070]

As described in detail above, according to the present invention,
Even if there is a pinhole in one layer that constitutes the transparent barrier layer, it is covered and repaired by another layer. Therefore, the transparent barrier layer must have a pinhole with a size of 1 μm or more within an area of 5 cm ^2. Since this transparent barrier layer surely blocks moisture and the like generated in the color conversion phosphor layer, the transparent protective layer, etc., deterioration of the organic EL element layer is prevented, and the occurrence of defective light emission areas (dark areas) is prevented. Thus, an organic electroluminescent image display device capable of displaying a high quality image is obtained. Further, by forming the transparent barrier layer by forming the film multiple times by the vacuum film forming method, even if a pinhole is generated in the thin film formed by one film forming, this pinhole part is formed by another film forming. Since the fine particles that cause pinholes are removed by a cleaning process that is repaired with a thin film and that is provided between each film formation process, the formed transparent barrier layer has an area of 5 cm ^2. And the size is 1 μm
The above pinholes do not exist and the barrier performance is excellent.

[Brief description of drawings]

FIG. 1 is a partial plan view showing an embodiment of an organic electroluminescent image display device of the present invention.

FIG. 2 is a vertical sectional view taken along line II-II of the organic electroluminescent image display device shown in FIG.

FIG. 3 is a vertical sectional view taken along line III-III of the organic electroluminescent image display device shown in FIG.

FIG. 4 is a partial plan view showing a positional relationship between a color filter layer and a color conversion phosphor layer in the organic electroluminescent image display device of the present invention.

FIG. 5 is a partial plan view showing a state of an auxiliary electrode and a transparent electrode layer formed on a transparent protective layer in the organic electroluminescent image display device of the present invention.

FIG. 6 is a partial plan view showing a state where a color filter layer is formed on a transparent substrate via a black matrix.

[Explanation of symbols]

1. Organic electroluminescent image display device 2 ... Transparent base material 3 ... Black matrix 4 ... Color filter layer 4R, 4G, 4B ... Colored layer 5 ... Color conversion phosphor layer 5R ... Red conversion phosphor layer 5G ... Green conversion phosphor layer 5B ... Blue conversion dummy layer 6 ... Transparent protective layer 7 ... Transparent barrier layer 8 ... Auxiliary electrode 9 ... Transparent electrode layer 10 ... Organic electroluminescence element layer 11 ... Back electrode layer 13 ... Insulating layer 15 ... Partition wall

Claims (6)

[Claims] 1. A transparent substrate, a color filter layer, a color conversion phosphor layer, a transparent protective layer, which are sequentially provided on the transparent substrate,
An organic electroluminescent image display device comprising at least a transparent barrier layer, a transparent electrode layer, an organic electroluminescent element layer, and a back electrode layer, wherein the transparent barrier layer has a multilayer structure. 2. The organic electroluminescent image display device according to claim 1, wherein the transparent barrier layer has no pinholes having a size of 1 μm or more in an area of 5 cm ² . 3. The organic electroluminescent image display according to claim 1, further comprising a black matrix having a predetermined opening pattern between the transparent substrate and the color filter. apparatus. 4. The organic electroluminescence element layer emits blue light, and the color conversion phosphor layer converts a blue light into a green fluorescence to emit light, and a blue conversion light into a red fluorescence to emit light. The organic electroluminescent image display device according to any one of claims 1 to 3, further comprising: 5. A transparent substrate, a color filter layer, a color conversion phosphor layer, a transparent protective layer, which are sequentially provided on the transparent substrate,
In a method for manufacturing an organic electroluminescent image display device including at least a transparent barrier layer, a transparent electrode layer, an organic electroluminescent element layer, and a back electrode layer, performing film formation by a vacuum film formation method multiple times. A method of manufacturing an organic electroluminescent image display device, comprising: forming a transparent barrier layer by means of; and cleaning at least the film-forming surface between each film-forming step. 6. The cleaning method is a dry cleaning method and / or an adhesive roller method.
A method for manufacturing the organic electroluminescent image display device according to 1.