JP2007308760A5 - - Google Patents
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- JP2007308760A5 JP2007308760A5 JP2006139017A JP2006139017A JP2007308760A5 JP 2007308760 A5 JP2007308760 A5 JP 2007308760A5 JP 2006139017 A JP2006139017 A JP 2006139017A JP 2006139017 A JP2006139017 A JP 2006139017A JP 2007308760 A5 JP2007308760 A5 JP 2007308760A5
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- 239000000758 substrate Substances 0.000 claims description 51
- 238000004519 manufacturing process Methods 0.000 claims description 15
- 238000007740 vapor deposition Methods 0.000 claims description 11
- 238000012790 confirmation Methods 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 6
- 230000005856 abnormality Effects 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 4
- 238000000151 deposition Methods 0.000 claims description 3
- 230000008021 deposition Effects 0.000 claims description 3
- 238000004140 cleaning Methods 0.000 claims 4
- 238000001704 evaporation Methods 0.000 claims 3
- 229920006311 Urethane elastomer Polymers 0.000 claims 2
- 229920005549 butyl rubber Polymers 0.000 claims 2
- 238000006243 chemical reaction Methods 0.000 claims 2
- 238000007689 inspection Methods 0.000 claims 2
- 230000005855 radiation Effects 0.000 claims 2
- 229910052710 silicon Inorganic materials 0.000 claims 2
- 239000010703 silicon Substances 0.000 claims 2
- 229920002379 silicone rubber Polymers 0.000 claims 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims 1
- 230000008020 evaporation Effects 0.000 claims 1
- 238000001771 vacuum deposition Methods 0.000 claims 1
Description
前記目的を達成するために、本発明の第１の態様は、閉塞された真空チャンバ内で、気相堆積法により基板上に膜形成を行う気相堆積膜の製造方法であって、前記真空チャンバ内に前記基板をセットする工程と、前記基板がセットされた状態で、前記真空チャンバ内を真空に排気した後に、蒸着前の前記基板の表面状態を確認する工程と、成膜材料を前記基板上に膜形成させる工程とを有することを特徴とする気相堆積膜の製造方法を提供するものである（請求項１）。 In order to achieve the above object, a first aspect of the present invention is a method for producing a vapor-deposited film in which a film is formed on a substrate by a vapor-deposition method in a closed vacuum chamber. wherein the step of setting the substrate in the chamber, in a state in which the substrate is set, after evacuating the vacuum chamber to a vacuum, a step of confirming the surface condition of the substrate before deposition, the deposition material The present invention provides a method for producing a vapor-deposited film, comprising the step of forming a film on a substrate.
さらにまた、本発明においては、前記基板の表面状態を確認する工程において前記基板の表面に異常が認められた場合には、前記基板の表面に対して異物を除去する工程を行った後、再度、前記基板の表面状態を確認する工程を有することが好ましい（請求項６）。
さらに、本発明においては、前記基板の表面状態を確認する工程において前記基板の表面に損傷が認められた場合には、その旨を通知する工程を有することが好ましい（請求項７）。
Furthermore, in the present invention, when an abnormality is recognized on the surface of the substrate in the step of checking the surface state of the substrate, a step of removing foreign matters from the surface of the substrate is performed, and then again. Preferably, the method includes a step of confirming a surface state of the substrate .
Furthermore, in the present invention, it is preferable to include a step of notifying that when the surface of the substrate is damaged in the step of checking the surface state of the substrate (claim 7).
さらにまた、本発明においては、前記基板の表面状態確認手段により前記基板の表面に異常が認められた場合には、前記制御手段は、前記基板の表面に対して前記異物除去手段により異物を除去する工程を行った後、再度、前記基板の表面状態確認手段により前記基板の表面状態を確認するよう制御することが好ましい（請求項１３）。
さらに、本発明においては、前記基板の表面状態確認手段により前記基板の表面に損傷が認められた場合には、その旨を通知する基板損傷通知手段を有することが好ましい（請求項１４）。
Furthermore, in the present invention, when an abnormality is recognized on the surface of the substrate by the surface condition confirmation unit of the substrate , the control unit removes the foreign material from the surface of the substrate by the foreign material removal unit. It is preferable to perform control so that the surface state of the substrate is confirmed again by the surface state confirmation unit of the substrate after the step of performing (step 13).
Further, in the present invention, it is preferable that when there is damage on the surface of the substrate by the surface condition confirmation unit of the substrate, there is provided a substrate damage notification unit for notifying that effect .
Claims (15)
前記真空チャンバ内に前記基板をセットする工程と、
前記基板がセットされた状態で、前記真空チャンバ内を真空に排気した後に、蒸着前の前記基板の表面状態を確認する工程と、
成膜材料を前記基板上に膜形成させる工程と
を有することを特徴とする気相堆積膜の製造方法。 A method for producing a vapor deposition film in which a film is formed on a substrate by a vapor deposition method in a closed vacuum chamber,
A step of setting said substrate in said vacuum chamber,
Checking the surface state of the substrate before vapor deposition after evacuating the vacuum chamber with the substrate set, and
Method for producing a vapor deposited film, characterized in that it comprises a step of the film forming material is film formed on the substrate.
請求項１に記載の気相堆積膜の製造方法。 The method for producing a vapor deposition film according to claim 1, wherein the step of checking the surface state of the substrate is performed by a surface state inspection unit.
請求項１または２に記載の気相堆積膜の製造方法。 The method for producing a vapor-deposited film according to claim 1 or 2, wherein foreign matter is removed from the surface of the substrate in the step of checking the surface state of the substrate.
請求項３に記載の気相堆積膜の製造方法。 The method for producing a vapor-deposited film according to claim 3, wherein the step of removing foreign matter adhering to the surface of the substrate is performed by a cleaning roller.
このローラ部は、ブチルゴム，シリコンおよびウレタンゴムのうち、少なくとも１種を主成分とするものにより構成される
請求項４に記載の気相堆積膜の製造方法。 The cleaning roller has a roller portion that contacts the surface of the substrate,
5. The method for producing a vapor deposition film according to claim 4, wherein the roller portion is composed of at least one of butyl rubber, silicon, and urethane rubber as a main component.
請求項３〜５のいずれかに記載の気相堆積膜の製造方法。 In the step of checking the surface state of the substrate, if an abnormality is found on the surface of the substrate, the step of removing foreign matter from the surface of the substrate is performed, and then the surface state of the substrate is checked again. The method for producing a vapor-deposited film according to any one of claims 3 to 5, wherein the step of :
請求項１〜６のいずれかに記載の気相堆積膜の製造方法。 The production of the vapor-deposited film according to any one of claims 1 to 6, wherein when the surface of the substrate is damaged in the step of checking the surface state of the substrate, the fact is notified. Method.
真空チャンバと、
この真空チャンバ内を排気する真空排気手段と、
前記真空チャンバ内に設けられた成膜材料を蒸発させる蒸発手段と、
前記真空チャンバ内に設けられ、前記蒸発手段の上方において、前記基板を保持する基板保持手段と、
前記真空チャンバ内に設けられ、前記基板の表面状態を確認する表面状態確認手段と
を有することを特徴とする気相堆積膜の製造装置。 An apparatus for producing a vapor deposition film that forms a phosphor layer by vacuum deposition on the surface of a sheet-like substrate,
A vacuum chamber;
A vacuum exhaust means for exhausting the inside of the vacuum chamber;
Evaporating means for evaporating the film forming material provided in the vacuum chamber;
A substrate holding means provided in the vacuum chamber and holding the substrate above the evaporation means;
An apparatus for producing a vapor-deposited film, comprising: a surface state confirmation unit provided in the vacuum chamber for confirming a surface state of the substrate.
請求項８に記載の気相堆積膜の製造装置。 9. The apparatus for producing a vapor deposition film according to claim 8, wherein a surface inspection device is used as the surface state confirmation means of the substrate.
前記表面状態確認手段を制御する制御手段と、
この制御手段に接続され、前記基板の表面状態確認手段により前記基板の表面への異物の付着が確認された場合に、その異物を除去する異物除去手段を有する
請求項８または９に記載の気相堆積膜の製造装置。 In addition to the above means,
Control means for controlling the surface condition confirmation means;
10. The air filter according to claim 8, further comprising: a foreign matter removing unit that is connected to the control unit and removes the foreign matter when the adhesion of the foreign matter to the surface of the substrate is confirmed by the surface state confirmation unit of the substrate. Phase deposition film manufacturing equipment.
請求項１０に記載の気相堆積膜の製造装置。 The vapor deposition film manufacturing apparatus according to claim 10, wherein a cleaning roller is used as the foreign matter removing means.
このローラ部は、ブチルゴム，シリコンおよびウレタンゴムのうち、少なくとも１種を主成分とするものにより構成されるものを用いる
請求項１１に記載の気相堆積膜の製造装置。 As the cleaning roller, it has a roller part that contacts the surface of the substrate,
12. The apparatus for producing a vapor deposition film according to claim 11, wherein the roller portion is made of a material mainly composed of at least one of butyl rubber, silicon, and urethane rubber.
請求項１０〜１２のいずれかに記載の気相堆積膜の製造装置。 In the case where an abnormality is recognized on the surface of the substrate by the surface condition confirmation unit of the substrate , the control unit performs a step of removing foreign matter on the surface of the substrate by the foreign matter removing unit, and then again. The apparatus for producing a vapor-deposited film according to any one of claims 10 to 12, wherein control is performed so that the surface state of the substrate is confirmed by the surface state confirmation unit of the substrate .
請求項８〜１３のいずれかに記載の気相堆積膜の製造装置。 If the damage to the surface of the substrate was observed by a surface state confirmation means of the substrate, the production of vapor deposition film according to any one of claims 8 to 13 having a substrate damage notifying means for notifying to that effect apparatus.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006139017A JP2007308760A (en) | 2006-05-18 | 2006-05-18 | Method and apparatus for manufacturing vapor phase deposition film, method for manufacturing radiation image conversion panel |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006139017A JP2007308760A (en) | 2006-05-18 | 2006-05-18 | Method and apparatus for manufacturing vapor phase deposition film, method for manufacturing radiation image conversion panel |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2007308760A JP2007308760A (en) | 2007-11-29 |
| JP2007308760A5 true JP2007308760A5 (en) | 2009-04-16 |
Family
ID=38841893
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006139017A Withdrawn JP2007308760A (en) | 2006-05-18 | 2006-05-18 | Method and apparatus for manufacturing vapor phase deposition film, method for manufacturing radiation image conversion panel |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2007308760A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105702880B (en) * | 2014-11-28 | 2018-04-17 | 上海和辉光电有限公司 | Optical registration compensation device, compactness detection device, deposition system and its method |
| JP6677485B2 (en) * | 2015-11-05 | 2020-04-08 | 芝浦メカトロニクス株式会社 | Vacuum processing equipment |
-
2006
- 2006-05-18 JP JP2006139017A patent/JP2007308760A/en not_active Withdrawn
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