JP2007296601A - Grinding wheel - Google Patents

Grinding wheel Download PDF

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JP2007296601A
JP2007296601A JP2006125761A JP2006125761A JP2007296601A JP 2007296601 A JP2007296601 A JP 2007296601A JP 2006125761 A JP2006125761 A JP 2006125761A JP 2006125761 A JP2006125761 A JP 2006125761A JP 2007296601 A JP2007296601 A JP 2007296601A
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grinding
grinding wheel
wheel
annular
workpiece
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Minosuke Sekiya
臣之典 関家
Setsuo Yamamoto
節男 山本
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Disco Corp
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Disco Abrasive Systems Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a grinding wheel which grinding a grinding surface of a workpiece such as a wafer without damaging it when grinding, while supplying grinding water to the grinding surface. <P>SOLUTION: Instead of a segment-like grinding wheel, an annular grinding wheel 41 is fixed to a wheel base 43. By radially forming a discharge groove 48 discharging the grinding water to a fixing part 42 fixing the annular grinding wheel 41, the grinding surface of the workpiece is ground without damaging it by a chipped grinding wheel broken piece like the segment-like grinding wheel. Since the grinding water dammed up inside the annular grinding wheel 41 flows out to an external part from the discharge groove 48 radially formed so as to cross with the annular grinding wheel 41, the inside and the outside of the annular grinding wheel 41 are filled with the grinding water, and the annular grinding wheel 41 is sufficiently cooled, and inside grinding chips are discharged. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、ウエーハ等の被加工物を保持するチャックテーブルと、チャックテーブルに保持された被加工物を研削する研削手段と、を備える研削装置に装着される研削ホイールに関するものである。   The present invention relates to a grinding wheel mounted on a grinding apparatus including a chuck table that holds a workpiece such as a wafer, and a grinding means that grinds the workpiece held on the chuck table.

IC、LSI等のデバイスが複数形成されたウエーハは裏面が研削されて所定の厚さに形成され、ダイシング装置等の分割装置によって個々のデバイスに分割されて携帯電話、パソコン等の電子機器に利用される。   A wafer on which a plurality of devices such as IC and LSI are formed has its back surface ground to a predetermined thickness, and is divided into individual devices by a dividing device such as a dicing device and used for electronic devices such as mobile phones and personal computers. Is done.

ウエーハの裏面を研削する研削装置は、ウエーハを保持するチャックテーブルと、チャックテーブルに保持されたウエーハを研削する研削ホイールを回転可能に支持した研削手段と、研削手段を構成する回転スピンドルの軸心に形成された通路を通り研削ホイールに研削水を供給する研削水供給手段と、を備えて構成され、ウエーハを効率よく研削することができる(例えば、特許文献1参照)。   A grinding apparatus for grinding the back surface of a wafer includes a chuck table that holds a wafer, a grinding means that rotatably supports a grinding wheel that grinds the wafer held on the chuck table, and an axis of a rotating spindle that constitutes the grinding means. And a grinding water supply means for supplying the grinding water to the grinding wheel through the passage formed in (1), so that the wafer can be ground efficiently (for example, see Patent Document 1).

また、研削装置には、電子機器の軽量・小型化を可能にするために、ウエーハの厚みを、50μm以下、30μm以上となるように薄く加工する上で、ウエーハのデバイスが形成されたデバイス領域の裏面のみを薄く研削し、このデバイス領域を囲繞する外周余剰領域にリング状補強部を残存させ、薄くなったウエーハの取扱いを容易にしたものもある(例えば、特許文献2参照)。   In addition, in the grinding apparatus, in order to make the electronic equipment lighter and smaller, a device region in which a wafer device is formed when the wafer is thinned to a thickness of 50 μm or less and 30 μm or more. In some cases, only the back surface of the wafer is thinly ground, and the ring-shaped reinforcing portion is left in the outer peripheral surplus area surrounding the device area, thereby facilitating the handling of the thinned wafer (for example, see Patent Document 2).

特開2001−205560号公報JP 2001-205560 A 特開平5−121384号公報JP-A-5-121384

しかしながら、特許文献1等に示される従来の研削装置にあっては、研削ホイールは、セグメント状の研削砥石がホイール基台に固定されていて、研削水が個々のセグメント状の研削砥石に円滑に供給されるものの、セグメント状の研削砥石がウエーハエッジに当った際に欠けた砥石破片によりウエーハの研削面に傷をつけるという問題点がある。特に、デバイス領域を囲繞する外周余剰領域にリング状補強部を残存させて、デバイス領域のウエーハの厚みが50μm以下、30μm以上となるように薄くして鏡面仕上げしようとする場合には、セグメント状の研削砥石の砥石破片によりウエーハの研削面に傷をつけると、切削面にダメージを与えてしまい、鏡面仕上げを実現できなくなってしまう。   However, in the conventional grinding apparatus disclosed in Patent Document 1 and the like, the grinding wheel has a segmented grinding wheel fixed to the wheel base, and the grinding water is smoothly applied to each segmented grinding wheel. Although supplied, there is a problem in that the grinding surface of the wafer is damaged by the grindstone chips that are missing when the segmented grinding wheel hits the wafer edge. In particular, when the ring-shaped reinforcing portion is left in the outer peripheral surplus region surrounding the device region and the wafer thickness in the device region is reduced to 50 μm or less and 30 μm or more to be mirror finished, the segment shape is used. If the grinding surface of the wafer is damaged by the grinding wheel fragments of the grinding wheel, the cutting surface is damaged, and the mirror finish cannot be realized.

本発明は、上記に鑑みてなされたものであって、ウエーハ等の被加工物の研削面に研削水を供給しながら研削する際に研削面に傷をつけることなく研削できる研削ホイールを提供することを目的とする。   The present invention has been made in view of the above, and provides a grinding wheel capable of grinding without damaging the grinding surface when grinding while supplying grinding water to the grinding surface of a workpiece such as a wafer. For the purpose.

上述した課題を解決し、目的を達成するために、本発明に係る研削ホイールは、被加工物を保持するチャックテーブルと、該チャックテーブルに保持された前記被加工物を研削する研削手段と、を備える研削装置に装着される研削ホイールであって、環状の研削砥石と、該環状の研削砥石を固定する固定部を有するホイール基台と、を備え、前記ホイール基台の前記固定部には前記環状の研削砥石と交差するように研削水を外部に放出する放出溝が放射状に形成されていることを特徴とする。   In order to solve the above-described problems and achieve the object, a grinding wheel according to the present invention includes a chuck table for holding a workpiece, and a grinding means for grinding the workpiece held on the chuck table; A grinding wheel mounted on a grinding apparatus comprising: an annular grinding wheel; and a wheel base having a fixing portion for fixing the annular grinding wheel, wherein the fixing portion of the wheel base includes The discharge grooves for discharging the grinding water to the outside are formed radially so as to intersect with the annular grinding wheel.

また、本発明に係る研削ホイールは、被加工物を保持するチャックテーブルと、該チャックテーブルに保持された前記被加工物を研削する研削手段と、を備える研削装置に装着される研削ホイールであって、前記研削手段は、当該研削ホイールを支持するマウントと、該マウントを支持し回転するスピンドルと、該スピンドルを回転駆動するモータと、前記スピンドルの軸心と前記マウントの軸心とに形成された通路に研削水が供給される研削水供給部と、を備えていて、当該研削ホイールは、環状の研削砥石と、該環状の研削砥石を固定する固定部を有するホイール基台と、を備え、前記ホイール基台には前記マウントから供給された研削水を受け入れる開口部が形成されていて、前記固定部には前記環状の研削砥石と交差するように受け入れた研削水を外部に放出する放出溝が放射状に形成されていることを特徴とする。   A grinding wheel according to the present invention is a grinding wheel mounted on a grinding apparatus comprising a chuck table for holding a workpiece and a grinding means for grinding the workpiece held on the chuck table. The grinding means is formed of a mount for supporting the grinding wheel, a spindle for supporting and rotating the mount, a motor for rotationally driving the spindle, an axis of the spindle and an axis of the mount. A grinding water supply unit for supplying grinding water to the passage, and the grinding wheel includes an annular grinding wheel and a wheel base having a fixing part for fixing the annular grinding wheel. The wheel base has an opening for receiving the grinding water supplied from the mount, and the fixed portion receives the annular grinding wheel so as to intersect with the annular grinding wheel. Discharge groove to release the grinding water to the outside which is characterized in that it is formed radially.

また、本発明に係る研削ホイールは、上記発明において、前記環状の研削砥石は、ビトリファイドボンド砥石、レジンボンド砥石、メタルボンド砥石のいずれかであることを特徴とする。   The grinding wheel according to the present invention is characterized in that, in the above invention, the annular grinding stone is any one of a vitrified bond grindstone, a resin bond grindstone, and a metal bond grindstone.

本発明に係る研削ホイールによれば、セグメント状の研削砥石に代え、環状の研削砥石をホイール基台に固定するとともに環状の研削砥石が固定される固定部に研削水を放出する放出溝を放射状に形成したので、セグメント状の研削砥石のように欠けた砥石破片によって被加工物の研削面に傷をつけることなく研削でき、また、当該研削ホイールが被加工物に完全にオーバーラップして研削する場合においても、環状の研削砥石の内部に塞き止められた研削水は環状の研削砥石と交差するように放射状に形成された放出溝から外部に流出するので、環状の研削砥石の内部と外部が研削水で満たされて環状の研削砥石を十分冷却できるとともに内部の研削屑を排出することができるという効果を奏する。   According to the grinding wheel of the present invention, instead of the segmented grinding wheel, the annular grinding wheel is fixed to the wheel base, and the discharge grooves for discharging the grinding water to the fixing portion to which the annular grinding wheel is fixed are radially provided. The grinding wheel can be ground without damaging the grinding surface of the work piece due to chipped pieces like a segmented grinding wheel, and the grinding wheel can completely overlap the work piece for grinding. Even in this case, the grinding water blocked inside the annular grinding wheel flows out from the discharge grooves formed radially so as to intersect the annular grinding wheel. The outside is filled with grinding water, so that the annular grinding wheel can be sufficiently cooled and the internal grinding waste can be discharged.

以下、本発明を実施するための最良の形態である研削装置に装着される研削ホイールを図面を参照して説明する。   Hereinafter, a grinding wheel mounted on a grinding apparatus which is the best mode for carrying out the present invention will be described with reference to the drawings.

図1は、本実施の形態の研削ホイールが装着された研削装置の一例を示す外観斜視図である。研削装置1は、被加工物2を保持し回転可能なチャックテーブル3と、チャックテーブル3に保持された被加工物2を研削する研削ホイール4を回転可能に支持した研削手段5と、研削手段5を研削送りする研削送り手段6とを備える。   FIG. 1 is an external perspective view showing an example of a grinding apparatus to which the grinding wheel of the present embodiment is attached. The grinding apparatus 1 includes a chuck table 3 that holds and rotates a workpiece 2, a grinding means 5 that rotatably supports a grinding wheel 4 that grinds the workpiece 2 held on the chuck table 3, and a grinding means. And a grinding feed means 6 for grinding and feeding 5.

まず、チャックテーブル3は、図示しない駆動源に連結されて回転可能である。また、チャックテーブル3は、ボールネジ、ナット、パルスモータ等による送り機構によってX軸方向に移動可能に設けられている。   First, the chuck table 3 is connected to a drive source (not shown) and can rotate. The chuck table 3 is provided so as to be movable in the X-axis direction by a feed mechanism such as a ball screw, a nut, or a pulse motor.

また、研削手段5は、研削ホイール4と、ハウジング51と、ハウジング51の下端に回転自在に装着されボルト52によって装着された研削ホイール4を支持するマウント53と、マウント53を支持し回転するスピンドル54と、スピンドル54を回転駆動するモータ55と、ハウジング51を装着した移動基台56と、を備える。移動基台56は、被案内レール561を有し、この被案内レール561をハウジング7の支持板8に設けられた案内レール9に移動可能に嵌合することにより研削手段5が上下方向(Z軸方向)に移動可能に支持される。図2は、研削ホイール4付近の構造を、中心線を境に断面位置を異ならせて示す断面図である。研削手段5は、図2に示すように、スピンドル54の軸心とマウント53の軸心とに形成された通路54a,53aに研削水供給源(図示せず)から研削水が供給される研削水供給部57を備える。ここで、マウント53の軸心に形成された通路53aは、マウント53内で複数の通路53bに分岐され、下面側に開口している。   The grinding means 5 includes a grinding wheel 4, a housing 51, a mount 53 that is rotatably attached to the lower end of the housing 51 and supports the grinding wheel 4 attached by a bolt 52, and a spindle that supports and rotates the mount 53. 54, a motor 55 that rotationally drives the spindle 54, and a moving base 56 on which the housing 51 is mounted. The moving base 56 has a guided rail 561, and the guided means rail 561 is movably fitted to a guide rail 9 provided on the support plate 8 of the housing 7 so that the grinding means 5 can move in the vertical direction (Z It is supported so as to be movable in the axial direction. FIG. 2 is a cross-sectional view showing the structure in the vicinity of the grinding wheel 4 with the cross-sectional positions being different from the center line. As shown in FIG. 2, the grinding means 5 is grinding in which grinding water is supplied from a grinding water supply source (not shown) to passages 54 a and 53 a formed in the axis of the spindle 54 and the axis of the mount 53. A water supply unit 57 is provided. Here, the passage 53a formed in the axial center of the mount 53 is branched into a plurality of passages 53b in the mount 53, and opens to the lower surface side.

また、研削送り手段6は、研削手段5の移動基台56を案内レール9に沿って移動させることで研削ホイール4をZ軸方向に研削送りするためのものである。研削送り手段6は、支持板8に案内レール9と平行に上下方向に配設され回転可能に支持された雄ねじロッド61と、雄ねじロッド61を回転駆動するためのパルスモータ62と、移動基台56に装着され雄ねじロッド61と螺合する雌ねじブロック(図示せず)と、を備える。   The grinding feed means 6 is for grinding and feeding the grinding wheel 4 in the Z-axis direction by moving the moving base 56 of the grinding means 5 along the guide rail 9. The grinding feed means 6 includes a male screw rod 61 that is disposed on a support plate 8 in a vertical direction parallel to the guide rail 9 and is rotatably supported, a pulse motor 62 for rotationally driving the male screw rod 61, and a moving base. 56 and a female screw block (not shown) that is screwed with the male screw rod 61.

図3は、研削ホイール4を示す斜視図であり、図4は、研削ホイール4を裏返して示す分解斜視図である。本実施の形態の研削ホイール4は、環状の研削砥石41と、環状の研削砥石41を固定する固定部42を有するホイール基台43と、を備える。環状の研削砥石41は、通常用いられているビトリファイドボンド砥石、レジンボンド砥石、メタルボンド砥石のいずれかの極めて細かい粒子の磁石で全周に亘って連続したドーナツリング状に形成されて、被加工物2の研削面に接触しながら回転することで研削面を鏡面に近い状態に研磨(研削)するものである。   FIG. 3 is a perspective view showing the grinding wheel 4, and FIG. 4 is an exploded perspective view showing the grinding wheel 4 upside down. The grinding wheel 4 of the present embodiment includes an annular grinding wheel 41 and a wheel base 43 having a fixing portion 42 for fixing the annular grinding wheel 41. The annular grinding wheel 41 is formed in a donut ring shape continuous over the entire circumference by a magnet of extremely fine particles of any of the commonly used vitrified bond grindstone, resin bond grindstone, and metal bond grindstone. By rotating while contacting the grinding surface of the object 2, the grinding surface is polished (ground) to a state close to a mirror surface.

ホイール基台43は、環状の研削砥石41を保持するベース材となるもので、ボルト52によってマウント53の下面に取り付けるためのネジ穴44を有する。また、固定部42は、ホイール基台43の下面側において環状の研削砥石41に対応する大きさに形成されて環状の研削砥石41が嵌合される環状の溝45を有する。環状の溝45の深さは、環状の研削砥石41を嵌合させて埋設させたときに所定量だけ突出するように設定されている。また、ホイール基台43は、通路53b,53a,54aを介して研削水供給部57に連通することでマウント53から供給される研削水を基台凹部47内に受け入れるよう各通路53bに対応させて厚み方向に貫通させて形成された複数の開口部46を中心周りに備える。さらに、ホイール基台43の固定部42には、開口部46から受け入れた研削水を、環状の溝45に固定された環状の研削砥石41と交差するようにホイール基台43の外部に放出する放出溝48が放射状に形成されている。本実施の形態では、環状の溝45よりも深く、かつ、環状の溝45を分断するように複数本、例えば8本の放出溝48が等間隔で放射状に形成されている。   The wheel base 43 serves as a base material for holding the annular grinding wheel 41, and has a screw hole 44 to be attached to the lower surface of the mount 53 by a bolt 52. The fixed portion 42 has an annular groove 45 that is formed on the lower surface side of the wheel base 43 in a size corresponding to the annular grinding stone 41 and into which the annular grinding stone 41 is fitted. The depth of the annular groove 45 is set so as to protrude by a predetermined amount when the annular grinding stone 41 is fitted and embedded. Further, the wheel base 43 communicates with the grinding water supply unit 57 via the passages 53b, 53a, 54a, so that the grinding water supplied from the mount 53 is received in the base recess 47 to correspond to each passage 53b. A plurality of openings 46 formed so as to penetrate in the thickness direction are provided around the center. Further, the grinding water received from the opening 46 is discharged to the fixed portion 42 of the wheel base 43 to the outside of the wheel base 43 so as to intersect with the annular grinding wheel 41 fixed to the annular groove 45. The discharge grooves 48 are formed radially. In the present embodiment, a plurality of, for example, eight discharge grooves 48 are formed radially at equal intervals so as to be deeper than the annular groove 45 and to divide the annular groove 45.

図5は、研削ホイール4による被加工物2の研削面の研削中の様子を示す斜視図である。本実施の形態の研削装置1は、デバイス領域を囲繞する外周余剰領域にリング状補強部を残存させて、デバイス領域の被加工物の厚みが50μm以下、30μm以上となるように薄くして鏡面仕上げしようとする場合への適用例を示す。このため、研削対象となる被加工物2は、図2に示すように、表面Waに、複数のデバイスが形成されたデバイス領域W1と、デバイス領域W1を囲繞する外周囲繞領域W2とを有し、裏面Wbが研削ホイール4による研磨対象となる。また、本実施の形態の研削ホイール4は、図5に示すように、研削対象となる被加工物2の大きさに比べて小さめに形成され、研削ホイール4が被加工物2の領域内で常に完全にオーバーラップして研削するものである。   FIG. 5 is a perspective view showing a state in which the grinding surface of the workpiece 2 is being ground by the grinding wheel 4. The grinding apparatus 1 according to the present embodiment is provided with a ring-shaped reinforcing portion in the outer peripheral surplus region surrounding the device region, and is thinned so that the thickness of the workpiece in the device region is 50 μm or less and 30 μm or more. An example of application to finishing is shown. For this reason, as shown in FIG. 2, the workpiece 2 to be ground has a device region W1 where a plurality of devices are formed on the surface Wa and an outer peripheral ridge region W2 surrounding the device region W1. The back surface Wb is an object to be polished by the grinding wheel 4. In addition, as shown in FIG. 5, the grinding wheel 4 of the present embodiment is formed smaller than the size of the workpiece 2 to be ground, and the grinding wheel 4 is within the region of the workpiece 2. Always grind with complete overlap.

被加工物2は、表面Wa側がチャックテーブル3によって保持され、裏面Wb側が露出した状態となる。そして、チャックテーブル3が回転するとともに、モータ55によって研削ホイール4が回転しながら研削手段5が研削送り手段6によって下降することによって、回転する研削ホイール4の環状の研削砥石41が被加工物2の裏面Wbに接触して研削が行われる。このとき、環状の研削砥石41は、被加工物2の表面Waに形成されたデバイス領域W1の裏側に接触させ、その外周側を研削しないようにする。デバイス領域W1の裏側が所定量研削されると、研削が終了する。このように裏面Wbのうちのデバイス領域W1に対応する部分のみを研削することによって、裏面Wbに凹部W3が形成され、外周余剰領域W2に対応する部分には、研削前と同じ厚さを有するリング状補強部W4が残存する。例えば、リング状補強部W4の幅は、2〜3mm程度であり、厚さは数百μm(例えば、700μm)である。一方、デバイス領域W1の厚みは、50μm以下、30μm以上程度に薄くされ、鏡面仕上げされる。このような研削中は、研削水供給源から研削水供給部57に研削水が供給され、研削ホイール4は研削水供給部57から供給される研削水を開口部46で基台凹部47内に受け入れる。   The workpiece 2 is in a state where the front surface Wa side is held by the chuck table 3 and the back surface Wb side is exposed. Then, the chuck table 3 is rotated, and the grinding wheel 5 is lowered by the grinding feed means 6 while the grinding wheel 4 is rotated by the motor 55, whereby the annular grinding wheel 41 of the rotating grinding wheel 4 is moved to the workpiece 2. Grinding is performed in contact with the back surface Wb. At this time, the annular grinding wheel 41 is brought into contact with the back side of the device region W1 formed on the surface Wa of the workpiece 2 so that the outer peripheral side thereof is not ground. When the back side of the device region W1 is ground by a predetermined amount, the grinding is finished. Thus, by grinding only the portion corresponding to the device region W1 in the back surface Wb, the concave portion W3 is formed in the back surface Wb, and the portion corresponding to the outer peripheral surplus region W2 has the same thickness as before grinding. The ring-shaped reinforcing portion W4 remains. For example, the width of the ring-shaped reinforcing portion W4 is about 2 to 3 mm, and the thickness is several hundred μm (for example, 700 μm). On the other hand, the thickness of the device region W1 is reduced to about 50 μm or less and about 30 μm or more, and is mirror-finished. During such grinding, the grinding water is supplied from the grinding water supply source to the grinding water supply unit 57, and the grinding wheel 4 supplies the grinding water supplied from the grinding water supply unit 57 into the base recess 47 through the opening 46. accept.

このような本実施の形態の研削ホイール4によれば、従来のセグメント状の研削砥石に代えて、環状の研削砥石41によって被加工物2の研削面となるデバイス領域W1の裏側を厚みが50μm以下、30μm以上となるように薄く研磨するので、セグメント状の研削砥石のように欠けた砥石破片によって被加工物2の研削面に傷をつけることなく研削でき、凹部W3(研削面)を鏡面仕上げすることができる。   According to the grinding wheel 4 of the present embodiment as described above, the thickness of the back side of the device region W1 that becomes the grinding surface of the workpiece 2 by the annular grinding wheel 41 is 50 μm instead of the conventional segmented grinding wheel. Hereinafter, since it is thinly polished so as to have a thickness of 30 μm or more, it can be ground without damaging the ground surface of the work piece 2 by a chipped grindstone like a segmented grinding wheel, and the recess W3 (grind surface) is mirror-finished. Can be finished.

また、研削ホイール4が常に被加工物2に完全にオーバーラップした状態で研削するため、開口部46で基台凹部47内に受け入れた研削水は、環状の研削砥石41の内部に塞き止められてしまうが、ホイール基台43の固定部42には、環状の研削砥石41と交差するように受け入れた研削水を外部に放出する放出溝48が放射状に形成されているので、環状の研削砥石41の内部に塞き止められた研削水は、図2中に矢印で示すように、環状の研削砥石41の上部をオーバーフローして放出溝48から外部に流出する。これにより、リング状補強部W4に囲まれる凹部W3内において、環状の研削砥石41の内部と外部が研削水で満たされて環状の研削砥石41が十分冷却されるとともに、環状の研削砥石41の内部の研削屑を外部に排出させることができる。   Further, since the grinding wheel 4 always grinds in a state where it completely overlaps the workpiece 2, the grinding water received in the base recess 47 at the opening 46 is blocked inside the annular grinding stone 41. However, since the fixing portion 42 of the wheel base 43 is radially formed with discharge grooves 48 that discharge the grinding water received so as to intersect with the annular grinding stone 41, the annular grinding is performed. The grinding water blocked inside the grindstone 41 overflows the upper part of the annular grinding grindstone 41 and flows out from the discharge groove 48 to the outside, as indicated by arrows in FIG. Thereby, in the recessed part W3 surrounded by the ring-shaped reinforcing part W4, the inside and the outside of the annular grinding stone 41 are filled with the grinding water, and the annular grinding stone 41 is sufficiently cooled. Internal grinding waste can be discharged to the outside.

なお、本実施の形態では、デバイス領域を囲繞する外周余剰領域にリング状補強部を残存させて、デバイス領域のウエーハの厚みが50μm以下、30μm以上となるように薄くして鏡面仕上げする研削装置への適用例として説明したが、このような適用例に限らず、例えば、インゴットから切り出したウエーハのウネリを取り除くために両面研削をする両頭研削装置にも適用できる。図6は、前述したような構造の研削ホイール4A,4Bを研削対象となる被加工物2を挟んで同軸上で対向配置させ、被加工物2を適宜の保持機構で保持しながらローラ等を用いた適宜の回転機構で回転させて研削ホイール4A,4Bで両面から同時に研削する両頭研削装置への適用例を示す概略斜視図である。インゴットから切り出したウエーハのウネリを取り除くために従来のセグメント状の研削砥石を用いた両頭研削装置でウエーハの両面を研削しても、十分にウネリを除去することができなかったが、環状の研削砥石41を有する研削ホイール4A,4Bで両面同時に研削した場合には、インゴットから切り出したウエーハのウネリを取り除くことができたものである。   In the present embodiment, the ring-shaped reinforcing portion is left in the outer peripheral surplus region surrounding the device region, and the wafer thickness in the device region is reduced to 50 μm or less and 30 μm or more to make a mirror finish. However, the present invention is not limited to such an application example. For example, the present invention can also be applied to a double-head grinding apparatus that performs double-side grinding to remove wafer undulation cut out from an ingot. FIG. 6 shows that the grinding wheels 4A and 4B having the structure as described above are arranged coaxially opposite to each other with the workpiece 2 to be ground interposed therebetween, and a roller or the like is held while holding the workpiece 2 with an appropriate holding mechanism. It is a schematic perspective view which shows the example of application to the double-headed grinding apparatus rotated by the appropriate | suitable rotating mechanism used and grind | polished simultaneously from both surfaces with the grinding wheels 4A and 4B. Even if both sides of the wafer were ground with a double-headed grinding machine using a conventional segmented grinding wheel to remove the undulation of the wafer cut out from the ingot, the undulation could not be removed sufficiently, but the ring grinding When both surfaces were ground simultaneously with the grinding wheels 4A and 4B having the grindstone 41, the undulation of the wafer cut out from the ingot could be removed.

さらに、本実施の形態で示した研削ホイール4は、例えば、図7に示すように、研削ホイール4が研削対象となる被加工物2に完全にはオーバーラップせず、部分的にオーバーラップしながら研削を行う通常の研削装置にも適用可能である。   Furthermore, the grinding wheel 4 shown in the present embodiment, for example, as shown in FIG. 7, the grinding wheel 4 does not completely overlap the workpiece 2 to be ground, but partially overlaps. However, the present invention can also be applied to a normal grinding apparatus that performs grinding.

本発明は、上述した実施の形態に限らず、本発明の趣旨を逸脱しない範囲であれば、種々の変形が可能である。   The present invention is not limited to the above-described embodiment, and various modifications can be made without departing from the spirit of the present invention.

本実施の形態の研削ホイールが装着された研削装置の一例を示す外観斜視図である。It is an external appearance perspective view which shows an example of the grinding device with which the grinding wheel of this Embodiment was mounted | worn. 研削ホイール付近の構造を、中心線を境に断面位置を異ならせて示す断面図である。It is sectional drawing which shows the structure of a grinding wheel vicinity, changing a cross-sectional position on the boundary of a centerline. 研削ホイールを示す斜視図である。It is a perspective view which shows a grinding wheel. 研削ホイールを裏返して示す分解斜視図である。It is a disassembled perspective view which turns over and shows a grinding wheel. 研削ホイールによる被加工物の研削面の研削中の様子を示す斜視図である。It is a perspective view which shows a mode during grinding of the grinding surface of the workpiece by a grinding wheel. 両頭研削装置への適用例を示す概略斜視図である。It is a schematic perspective view which shows the example of application to a double-head grinding apparatus. 通常の研削装置への適用例を示す概略斜視図である。It is a schematic perspective view which shows the example of application to a normal grinding apparatus.

符号の説明Explanation of symbols

1 研削装置
2 被加工物
3 チャックテーブル
4,4A,4B 研削ホイール
5 研削手段
41 環状の研削砥石
42 固定部
43 ホイール基台
46 開口部
48 放出溝
53 マウント
53a 通路
54 スピンドル
54a 通路
55 モータ
57 研削水供給部
DESCRIPTION OF SYMBOLS 1 Grinding device 2 Work piece 3 Chuck table 4, 4A, 4B Grinding wheel 5 Grinding means 41 Annular grinding wheel 42 Fixed part 43 Wheel base 46 Opening part 48 Ejection groove 53 Mount 53a Passage 54 Spindle 54a Passage 55 Motor 57 Grinding Water supply section

Claims (3)

被加工物を保持するチャックテーブルと、該チャックテーブルに保持された前記被加工物を研削する研削手段と、を備える研削装置に装着される研削ホイールであって、
環状の研削砥石と、
該環状の研削砥石を固定する固定部を有するホイール基台と、
を備え、
前記ホイール基台の前記固定部には前記環状の研削砥石と交差するように研削水を外部に放出する放出溝が放射状に形成されていることを特徴とする研削ホイール。
A grinding wheel that is mounted on a grinding device comprising: a chuck table that holds a workpiece; and a grinding means that grinds the workpiece held on the chuck table,
An annular grinding wheel;
A wheel base having a fixing portion for fixing the annular grinding wheel;
With
A grinding wheel characterized in that a discharge groove for discharging grinding water to the outside is formed radially on the fixed portion of the wheel base so as to intersect the annular grinding wheel.
被加工物を保持するチャックテーブルと、該チャックテーブルに保持された前記被加工物を研削する研削手段と、を備える研削装置に装着される研削ホイールであって、
前記研削手段は、当該研削ホイールを支持するマウントと、該マウントを支持し回転するスピンドルと、該スピンドルを回転駆動するモータと、前記スピンドルの軸心と前記マウントの軸心とに形成された通路に研削水が供給される研削水供給部と、を備えていて、
当該研削ホイールは、環状の研削砥石と、該環状の研削砥石を固定する固定部を有するホイール基台と、を備え、
前記ホイール基台には前記マウントから供給された研削水を受け入れる開口部が形成されていて、前記固定部には前記環状の研削砥石と交差するように受け入れた研削水を外部に放出する放出溝が放射状に形成されていることを特徴とする研削ホイール。
A grinding wheel that is mounted on a grinding device comprising: a chuck table that holds a workpiece; and a grinding means that grinds the workpiece held on the chuck table,
The grinding means includes a mount for supporting the grinding wheel, a spindle for supporting and rotating the mount, a motor for rotationally driving the spindle, and a passage formed in the spindle center and the mount axis. A grinding water supply unit to which the grinding water is supplied,
The grinding wheel includes an annular grinding wheel and a wheel base having a fixing portion for fixing the annular grinding wheel,
An opening for receiving grinding water supplied from the mount is formed in the wheel base, and a discharge groove for discharging the grinding water received so as to intersect the annular grinding stone to the outside is formed in the fixed portion. A grinding wheel characterized in that is formed radially.
前記環状の研削砥石は、ビトリファイドボンド砥石、レジンボンド砥石、メタルボンド砥石のいずれかであることを特徴とする請求項1または2に記載の研削ホイール。   The grinding wheel according to claim 1 or 2, wherein the annular grinding wheel is any one of a vitrified bond grindstone, a resin bond grindstone, and a metal bond grindstone.
JP2006125761A 2006-04-28 2006-04-28 Grinding wheel Pending JP2007296601A (en)

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JP2010052076A (en) * 2008-08-27 2010-03-11 Disco Abrasive Syst Ltd Grinding wheel
KR100951137B1 (en) 2009-09-15 2010-04-13 아세아연마재(주) Grinder
KR100979067B1 (en) 2009-11-30 2010-08-30 현주빈 A profile wheel for using stone
JP2014083644A (en) * 2012-10-25 2014-05-12 Koyo Mach Ind Co Ltd Surface grinding method and coolant supply apparatus for surface grinder
US20150283670A1 (en) * 2014-04-04 2015-10-08 Disco Corporation Grinding wheel and cleaning method for grinding chamber
CN105328589A (en) * 2015-11-25 2016-02-17 赵光宇 Ceramic bond composite parallel grinding wheel for double end surface grinding
JP2016132070A (en) * 2015-01-21 2016-07-25 株式会社ディスコ Grinding wheel and grinding device
CN112355918A (en) * 2020-10-20 2021-02-12 黄莉 Grinding wheel structure and machining process thereof
CN116766075A (en) * 2023-08-15 2023-09-19 唐山市名鲨五金磨具有限公司 Resin grinding wheel grinding device with cooling function and use method

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JPH031761A (en) * 1989-05-30 1991-01-08 Fujitsu Ltd Picture input device
JPH1158234A (en) * 1997-08-15 1999-03-02 Disco Abrasive Syst Ltd Polishing method and its device

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JPH031761A (en) * 1989-05-30 1991-01-08 Fujitsu Ltd Picture input device
JPH1158234A (en) * 1997-08-15 1999-03-02 Disco Abrasive Syst Ltd Polishing method and its device

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010052076A (en) * 2008-08-27 2010-03-11 Disco Abrasive Syst Ltd Grinding wheel
KR100951137B1 (en) 2009-09-15 2010-04-13 아세아연마재(주) Grinder
KR100979067B1 (en) 2009-11-30 2010-08-30 현주빈 A profile wheel for using stone
JP2014083644A (en) * 2012-10-25 2014-05-12 Koyo Mach Ind Co Ltd Surface grinding method and coolant supply apparatus for surface grinder
US20150283670A1 (en) * 2014-04-04 2015-10-08 Disco Corporation Grinding wheel and cleaning method for grinding chamber
US9731400B2 (en) * 2014-04-04 2017-08-15 Disco Corporation Grinding wheel and cleaning method for grinding chamber
JP2016132070A (en) * 2015-01-21 2016-07-25 株式会社ディスコ Grinding wheel and grinding device
CN105328589A (en) * 2015-11-25 2016-02-17 赵光宇 Ceramic bond composite parallel grinding wheel for double end surface grinding
CN105328589B (en) * 2015-11-25 2018-07-03 赵光宇 A kind of compound parallel grinding wheel of double-end surface milling vitrified bond
CN112355918A (en) * 2020-10-20 2021-02-12 黄莉 Grinding wheel structure and machining process thereof
CN116766075A (en) * 2023-08-15 2023-09-19 唐山市名鲨五金磨具有限公司 Resin grinding wheel grinding device with cooling function and use method
CN116766075B (en) * 2023-08-15 2023-11-28 唐山市名鲨五金磨具有限公司 Resin grinding wheel grinding device with cooling function and use method

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