JP2007270282A - Barrel plating method - Google Patents

Barrel plating method Download PDF

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JP2007270282A
JP2007270282A JP2006097916A JP2006097916A JP2007270282A JP 2007270282 A JP2007270282 A JP 2007270282A JP 2006097916 A JP2006097916 A JP 2006097916A JP 2006097916 A JP2006097916 A JP 2006097916A JP 2007270282 A JP2007270282 A JP 2007270282A
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barrel
insulating member
plating
electrical insulating
plated
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JP4198161B2 (en
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Hidetoshi Watanabe
秀利 渡辺
Masahiko Konno
正彦 今野
Yoshihiro Kamibayashi
義広 上林
Kazuhiro Shibuya
和博 渋谷
Tomonori Sugiyama
智紀 杉山
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TDK Corp
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TDK Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a barrel plating method by which both of increase of plating efficiency and increase of separation efficiency of work pieces from one another can be satisfied. <P>SOLUTION: In the barrel plating method, a plate-like electric insulating member 20 having a specific gravity which is smaller than that of a plating solution 5 and larger than that of a washing liquid 6 is put in a barrel 3, together with electronic components 10. Since the electric insulating member 20 is present so as to cover an upper part of the inner wall of the barrel 3 in electroplating, electric power lines C concentrate on a lower part of the barrel 3 in which the electronic components 10 are located; accordingly plating efficiency is increased. The electric insulating member 20 goes down to the lower part of the barrel 3 so as to cover the electric components 10 in washing of the electric components 10, whereby the flow range of the electric components 10 is regulated. By this regulation, one electric component 10 hits frequently against other electric components 10 and the lower surface of the electric insulating member 20; accordingly separation efficiency of electric components 10 from one another is increased. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、バレルめっき方法に関する。   The present invention relates to a barrel plating method.

バレルめっきは、被めっき物をバレル内で攪拌しながらめっき処理を行う方法である。この方法では、複数の被めっき物を収容したバレルをめっき液中に浸漬すると共に、バレルの外側に1対の陽極を配置し、バレル内に陰極を配置する。そして、バレルを一定の速度で回転させながら、陽極と陰極との間に形成される電流線の作用によって、めっき液中の金属を被めっき物の表面に析出させる。   Barrel plating is a method of performing a plating process while stirring an object to be plated in the barrel. In this method, a barrel containing a plurality of objects to be plated is immersed in the plating solution, a pair of anodes are disposed outside the barrel, and a cathode is disposed in the barrel. Then, the metal in the plating solution is deposited on the surface of the object to be plated by the action of current lines formed between the anode and the cathode while rotating the barrel at a constant speed.

このようなバレルめっきに関する技術として、例えば特許文献1に記載の電子部品のバレルめっき方法がある。この従来の電子部品のバレルめっき方法では、被めっき素体よりも比重の大きく、かつ被めっき素体よりも大きな形状の攪拌補助部材を、導電性媒体と共にバレル内に投入している。このような攪拌補助部材の投入により、回転するバレル内において、被めっき物と導電性媒体とを攪拌補助部材の個体間の隙間に取り込み、攪拌効率の向上を図っている。
特開2000−256899号公報
As a technique related to such barrel plating, for example, there is a barrel plating method for electronic components described in Patent Document 1. In this conventional barrel plating method for electronic parts, an agitation assisting member having a specific gravity larger than that of the body to be plated and larger than that of the body to be plated is placed in the barrel together with the conductive medium. By introducing such an agitation auxiliary member, the object to be plated and the conductive medium are taken into the space between the individual agitation auxiliary members in the rotating barrel to improve the agitation efficiency.
JP 2000-256899 A

本発明は、めっき効率の向上と、被めっき物同士の分離効率の向上とを両立させることができるバレルめっき方法を提供することを目的とする。   An object of this invention is to provide the barrel plating method which can make the improvement of plating efficiency and the improvement of the isolation | separation efficiency of to-be-plated objects compatible.

上記課題の解決のため、本願発明者らは、まずバレルめっき方法における被めっき物へのめっきの成長速度(めっき効率)の向上について鋭意研究を行った。その過程において、本願発明者らは、バレルの外側の陽極からバレル内の陰極に向かって形成される電流線の密度に着目した。そして、被めっき物はバレル内において下部に沈んでいることから、電気絶縁部材によって被めっき物の存在しないバレル上部に向かう電流線を遮ることにより、電流線をバレル下部に集中させることができれば、めっき効率の向上を図れることを見出した。なお、上述した電子部品のバレルめっき方法では、攪拌補助部材の比重は被めっき物よりも大きく、バレル上部に向かう電流線を遮るという技術的思想は開示されていない。   In order to solve the above-mentioned problems, the inventors of the present application first conducted intensive research on improving the growth rate (plating efficiency) of plating on an object to be plated in the barrel plating method. In the process, the present inventors paid attention to the density of current lines formed from the anode outside the barrel toward the cathode inside the barrel. And since the object to be plated sinks in the lower part in the barrel, by blocking the current line toward the upper part of the barrel where there is no object to be plated by the electrical insulating member, if the current line can be concentrated at the lower part of the barrel, It has been found that the plating efficiency can be improved. In the above-described barrel plating method for electronic parts, the specific gravity of the auxiliary stirring member is larger than that of the object to be plated, and the technical idea of blocking the current line toward the upper part of the barrel is not disclosed.

一方で、めっき効率の向上を追及すると、被めっき物の個体間にわたってめっきが成長し、被めっき物同士の付着が発生し易くなる。そのため、めっき処理後の洗浄処理において、被めっき物同士の分離効率が低下するおそれがある。これに対し、本願発明者らは、上述した電気絶縁部材の比重に着目し、めっき処理において電気絶縁部材をバレル上部に位置させて電流線を遮蔽し、かつ洗浄処理において電気絶縁部材をバレル下部に移動させ、この電気絶縁部材をそのまま利用して流動する被めっき物の攪拌効率を高めてやれば、めっき効率の向上と、被めっき物同士の分離効率の向上とを両立させることができるとの知見を得て、本発明を完成するに至った。   On the other hand, when the improvement of the plating efficiency is pursued, the plating grows between the individual objects to be plated, and adhesion between the objects to be plated easily occurs. Therefore, in the cleaning process after the plating process, the separation efficiency between the objects to be plated may be reduced. On the other hand, the inventors of the present application pay attention to the specific gravity of the electrical insulating member described above, position the electrical insulating member on the barrel upper part in the plating process to shield the current line, and in the cleaning process, place the electrical insulating member on the lower barrel part. If the efficiency of stirring the flowing object to be plated is increased by using the electrical insulating member as it is, it is possible to achieve both the improvement of the plating efficiency and the improvement of the separation efficiency of the objects to be plated. As a result, the present invention has been completed.

本発明に係るバレルめっき方法は、複数の被めっき物をバレル内で攪拌しながらめっき処理を行うバレルめっき方法であって、めっき液よりも比重が小さく、かつ洗浄液よりも比重が大きい板状の電気絶縁部材を用意し、電気絶縁部材と複数の被めっき物とをバレル内に収容する工程と、バレルをめっき液に浸漬させると共に、バレルの外側に配置された陽極とバレル内に収容された複数の被めっき物との間の一部を電気絶縁部材によって遮蔽した状態で通電し、バレルを回転させながら複数の被めっき物にめっきを形成する工程と、めっき液を除去した後、バレルを洗浄液に浸漬させ、バレルを回転させながら複数の被めっき物を洗浄する工程とを備えたことを特徴としている。   The barrel plating method according to the present invention is a barrel plating method in which a plurality of objects to be plated are plated while being stirred in a barrel, and has a plate-like shape having a specific gravity smaller than a plating solution and larger than a cleaning solution. An electrical insulating member was prepared, and the electrical insulating member and a plurality of objects to be plated were accommodated in the barrel, the barrel was immersed in the plating solution, and the anode disposed outside the barrel and the barrel were accommodated in the barrel. A process of forming a plating on a plurality of objects to be plated while rotating a barrel and energizing in a state where a part between the objects to be plated is shielded by an electric insulating member, and after removing the plating solution, A step of immersing the substrate in a cleaning solution and cleaning a plurality of objects to be plated while rotating the barrel.

このバレルめっき方法では、めっき液よりも比重が小さく、かつ洗浄液よりも比重の大きい板状の電気絶縁部材を用意し、複数の被めっき物と共にバレル内に収容する。この電気絶縁部材は、電解めっき処理においてバレルがめっき液に浸漬されると、バレル内の上部に浮き上がり、バレルの内壁上部を覆うように存在する。したがって、陽極からバレルの上部に向かう電力線の経路が遮られ、電力線は被めっき物が位置するバレルの下部に集中するようになるため、めっき効率の向上を図ることができる。一方、電気絶縁部材は、被めっき物の洗浄処理においてバレルが洗浄液に浸漬されると、被めっき物に覆い被さるようにバレル内の下部に沈む。したがって、この状態でバレルを回転させると、電気絶縁部材によって被めっき物の流動範囲が規制され、被めっき物が他の被めっき物や電気絶縁部材に頻繁に当たることとなる。これにより、洗浄処理において被めっき物が十分に攪拌され、電解めっき処理の際に被めっき物同士の付着が発生していても、その分離効率を高めることが可能となる。   In this barrel plating method, a plate-shaped electrical insulating member having a specific gravity smaller than that of the plating solution and larger than that of the cleaning solution is prepared and accommodated in the barrel together with a plurality of objects to be plated. When the barrel is immersed in the plating solution in the electrolytic plating process, the electrical insulating member floats on the upper part of the barrel and exists so as to cover the upper part of the inner wall of the barrel. Therefore, the path of the power line from the anode toward the upper part of the barrel is blocked, and the power line is concentrated at the lower part of the barrel where the object to be plated is located, so that the plating efficiency can be improved. On the other hand, when the barrel is immersed in the cleaning liquid in the cleaning process of the object to be plated, the electric insulating member sinks to the lower part of the barrel so as to cover the object to be plated. Therefore, when the barrel is rotated in this state, the flow range of the object to be plated is restricted by the electric insulating member, and the object to be plated frequently hits other objects to be plated or the electric insulating member. As a result, the objects to be plated are sufficiently agitated in the cleaning process, and even if the objects to be plated adhere to each other during the electrolytic plating process, the separation efficiency can be increased.

また、電気絶縁部材の長さ寸法は、バレルの回転軸方向の内寸法を基準として100%未満であることが好ましく、電気絶縁部材の幅寸法は、バレルの内径を基準として50%以下であることが好ましい。こうすると、電気絶縁部材がバレルの内壁に引っ掛かりにくくなるので、電解めっき処理から洗浄処理に移行する際に、バレルの上部からバレルの下部に向けて電気絶縁部材を確実に移動させることができる。   The length of the electrical insulating member is preferably less than 100% based on the inner dimension of the barrel in the rotation axis direction, and the width of the electrical insulating member is 50% or less based on the inner diameter of the barrel. It is preferable. If it carries out like this, since it will become difficult to catch an electric insulation member on the inner wall of a barrel, when changing from an electrolytic plating process to a washing process, an electric insulation member can be reliably moved toward the lower part of a barrel from the upper part of a barrel.

また、電気絶縁部材の長さ寸法は、バレルの回転軸方向の内寸法を基準として50%以上であることが好ましい。この場合、電解めっき処理における電力線の経路の遮蔽と、洗浄処理における被めっき物の流動範囲の規制とを好適に行うことができる。   Moreover, it is preferable that the length dimension of an electrical insulation member is 50% or more on the basis of the internal dimension of the barrel in the rotating shaft direction. In this case, it is possible to suitably perform shielding of the power line path in the electrolytic plating process and restriction of the flow range of the object to be plated in the cleaning process.

電気絶縁部材は、当該電気絶縁部材の長手方向に沿う縁部同士が向かい合う方向に屈曲可能となっていることが好ましい。こうすると、洗浄処理において、流動する被めっき物の表面に電気絶縁部材を略密着させることが可能となり、被めっき物の流動範囲をより確実に規制できる。この結果、被めっき物の分離効率を一層高めることができる。   The electrical insulating member is preferably bendable in a direction in which edges along the longitudinal direction of the electrical insulating member face each other. If it carries out like this, in an washing | cleaning process, it will become possible to make an electrical insulation member adhere substantially to the surface of the to-be-plated to-be-plated object, and can control the flow range of to-be-plated object more reliably. As a result, the separation efficiency of the object to be plated can be further increased.

本発明に係るバレルめっき方法によれば、めっき効率の向上と、被めっき物同士の分離効率の向上とを両立させることができる。   According to the barrel plating method of the present invention, it is possible to achieve both improvement in plating efficiency and improvement in separation efficiency between objects to be plated.

以下、図面を参照しながら、本発明に係るバレルめっき方法の好適な実施形態について詳細に説明する。   Hereinafter, a preferred embodiment of a barrel plating method according to the present invention will be described in detail with reference to the drawings.

図1は、本発明に係るバレルめっき方法の一実施形態を実現するためのバレルめっき装置の構成概要を示す図である。また、図2は、図1に示したバレルめっき装置を側方から見た図である。図1及び図2に示すように、バレルめっき装置1は、めっき液5又は洗浄液6(図7参照)を貯留するめっき槽2と、被めっき物である複数の電子部品10を収容するバレル3と、1対のアノード電極4,4とを備え、電子部品10をめっき液5中で攪拌しながらめっき処理を行う装置として構成されている。   FIG. 1 is a diagram showing a configuration outline of a barrel plating apparatus for realizing an embodiment of a barrel plating method according to the present invention. FIG. 2 is a side view of the barrel plating apparatus shown in FIG. As shown in FIGS. 1 and 2, a barrel plating apparatus 1 includes a plating tank 2 that stores a plating solution 5 or a cleaning solution 6 (see FIG. 7), and a barrel 3 that houses a plurality of electronic components 10 that are objects to be plated. And a pair of anode electrodes 4, 4, and configured as a device for performing a plating process while stirring the electronic component 10 in the plating solution 5.

バレル3は、例えば金属によって断面正六角形状の筒状に形成され、めっき槽2の略中央において水平に配置されている。バレル3の内部は、電子部品10、及び後述する電気絶縁部材20を収容する収容空間となっている。また、バレル3内には、電子部品10の個体間を導通させるためのダミーメディア(図示しない)も電子部品10と共に収容される。   The barrel 3 is formed in a cylindrical shape having a regular hexagonal cross section by metal, for example, and is disposed horizontally at the approximate center of the plating tank 2. The interior of the barrel 3 is a housing space for housing the electronic component 10 and an electrical insulating member 20 described later. Further, in the barrel 3, a dummy medium (not shown) for electrically connecting the individual electronic components 10 is also accommodated together with the electronic components 10.

バレル3の側壁には、メッシュ状の窓部(図示しない)が形成されている。この窓部は、バレル3内に収容された電子部品10等を外部に通さないようにブロックする一方、めっき槽2からバレル3内へのめっき液5又は洗浄液6の流入を許容する。そして、バレル3は、めっき槽2の外部に設置された整流器(図示しない)に接続されてカソード電極として機能し、後述するめっき処理及び洗浄処理を行う際に、回転軸7を中心に所定の速度で回転する。   A mesh-shaped window (not shown) is formed on the side wall of the barrel 3. This window portion blocks the electronic component 10 and the like housed in the barrel 3 from passing outside, and allows the plating solution 5 or the cleaning solution 6 to flow from the plating tank 2 into the barrel 3. The barrel 3 is connected to a rectifier (not shown) installed outside the plating tank 2 and functions as a cathode electrode. When performing a plating process and a cleaning process to be described later, the barrel 3 has a predetermined centering on the rotating shaft 7. Rotates at speed.

アノード電極4,4は、めっき槽2内において、バレル3の両側にそれぞれ配置されている。アノード電極4,4の上端部から延びるリード線は、めっき槽2の上方に引き出され、バレル3と同様に整流器に接続されている。アノード電極4,4及びバレル3が通電すると、バレル3の外部に位置するアノード電極4,4からバレル3に向けて所定密度の電流線が形成される。   The anode electrodes 4 and 4 are disposed on both sides of the barrel 3 in the plating tank 2. Lead wires extending from the upper end portions of the anode electrodes 4 and 4 are drawn out above the plating tank 2 and connected to a rectifier in the same manner as the barrel 3. When the anode electrodes 4, 4 and the barrel 3 are energized, current lines having a predetermined density are formed from the anode electrodes 4, 4 located outside the barrel 3 toward the barrel 3.

ここで、バレル3に収容される電子部品10の個体の一例を図3に示す。同図に示す例では、電子部品10は、導電パターンが形成されたセラミック層を積層してなる素子部11と、この素子部11の両端にそれぞれ形成された1対の端子電極12,12とによって構成される、いわゆる積層型電子部品である。このような電子部品10としては、チップコンデンサ、チップバリスタ、チップインダクタ、チップビーズなどが挙げられる。   Here, an example of the individual electronic component 10 housed in the barrel 3 is shown in FIG. In the example shown in the figure, an electronic component 10 includes an element portion 11 formed by laminating ceramic layers on which conductive patterns are formed, and a pair of terminal electrodes 12 and 12 respectively formed at both ends of the element portion 11. This is a so-called multilayer electronic component. Examples of such an electronic component 10 include a chip capacitor, a chip varistor, a chip inductor, and a chip bead.

次に、電気絶縁部材20の一例を図4に示す。同図に示す例では、電気絶縁部材20は、例えばポリスチレンにより、厚さ5mm程度の矩形の板状に形成されている。電気絶縁部材20の幅寸法W1は、バレル3の内径W2を基準として約50%となっており(図1参照)、電気絶縁部材20の長さ寸法L1は、バレル3の回転軸方向の内寸法L2を基準として約75%となっている(図2参照)。また、電気絶縁部材20の比重は、めっき液5より小さく、かつ洗浄液6よりも比重の大きくなっている。したがって、バレル3がめっき液5に浸漬されると、電気絶縁部材20は、バレル3内で上方に浮き上がり、バレル3が洗浄液6に浸漬されると、電気絶縁部材20は、バレル3内で下方に沈むようになっている。   Next, an example of the electrical insulating member 20 is shown in FIG. In the example shown in the figure, the electrical insulating member 20 is formed in a rectangular plate shape having a thickness of about 5 mm, for example, from polystyrene. The width dimension W1 of the electrical insulating member 20 is about 50% based on the inner diameter W2 of the barrel 3 (see FIG. 1), and the length dimension L1 of the electrical insulating member 20 is the inner dimension of the barrel 3 in the rotation axis direction. It is about 75% based on the dimension L2 (see FIG. 2). The specific gravity of the electrical insulating member 20 is smaller than that of the plating solution 5 and larger than that of the cleaning solution 6. Therefore, when the barrel 3 is immersed in the plating solution 5, the electrical insulating member 20 is lifted upward in the barrel 3, and when the barrel 3 is immersed in the cleaning solution 6, the electrical insulating member 20 is lowered in the barrel 3. It is supposed to sink into.

さらに、図4に示すように、電気絶縁部材20の中央部分には、長手方向に沿って溝部21が形成されている。これにより、電気絶縁部材20は、溝部21が形成されていない方向に対して、長手方向に沿う縁部22,22同士が向かい合うように屈曲可能となっている。そして、電気絶縁部材20は、この屈曲方向が電子部品10側に向くようにして、バレル3内に収容されている。   Furthermore, as shown in FIG. 4, a groove portion 21 is formed in the central portion of the electrical insulating member 20 along the longitudinal direction. Thereby, the electrical insulating member 20 can be bent so that the edge portions 22 along the longitudinal direction face each other with respect to the direction in which the groove portion 21 is not formed. The electric insulating member 20 is accommodated in the barrel 3 so that the bending direction is directed to the electronic component 10 side.

続いて、上述したバレルめっき装置1を用いたバレルめっき方法について、図5に示すフローチャートを参照しながら説明する。   Next, a barrel plating method using the barrel plating apparatus 1 described above will be described with reference to a flowchart shown in FIG.

まず、被めっき物である複数の電子部品10、板状の電気絶縁部材20、及びダミーメディア(図示しない)をバレル3内に収容する(ステップS01)。次に、バレル3をめっき槽2中に配置し、めっき槽2に洗浄用の水を流入させることにより、バレル3内の電子部品10等を予め洗浄する。洗浄後、めっき槽2から洗浄用の水を除去し、めっき槽2にめっき液5を流入させる。これにより、バレル3をめっき液5中に浸漬する(ステップS02)。   First, a plurality of electronic components 10, which are objects to be plated, a plate-shaped electrical insulating member 20, and a dummy medium (not shown) are accommodated in the barrel 3 (step S01). Next, the barrel 3 is disposed in the plating tank 2, and washing water is allowed to flow into the plating tank 2, whereby the electronic components 10 and the like in the barrel 3 are cleaned in advance. After washing, the washing water is removed from the plating tank 2 and the plating solution 5 is caused to flow into the plating tank 2. Thereby, the barrel 3 is immersed in the plating solution 5 (step S02).

バレル3をめっき液5に浸漬した後、アノード電極4及びバレル3に通電を行う。そして、回転軸7を中心としてバレル3を所定の速度で回転させることにより、電子部品10を攪拌しながら電解めっき処理を行う(ステップS03)。この電解めっき処理においては、図6に示すように、めっき液5よりも比重の小さい電気絶縁部材20がバレル3内の上方に浮き上がり、バレル3の内壁上部を覆うように存在する。そのため、アノード電極4からバレル3の上部に向かう電力線の経路が一部遮蔽され、電力線Cは、電子部品10が位置するバレル3の下部に集中する。この状態で、個々の電子部品10は、ダミーメディアを介してバレル3と電気的に接続され、電子部品10の端子電極12,12の表面にめっき液5中のめっき金属が析出する。   After the barrel 3 is immersed in the plating solution 5, the anode electrode 4 and the barrel 3 are energized. Then, by rotating the barrel 3 around the rotation shaft 7 at a predetermined speed, the electroplating process is performed while stirring the electronic component 10 (step S03). In this electrolytic plating process, as shown in FIG. 6, an electrical insulating member 20 having a specific gravity smaller than that of the plating solution 5 is lifted upward in the barrel 3 and covers the upper part of the inner wall of the barrel 3. Therefore, a part of the path of the power line from the anode electrode 4 to the upper part of the barrel 3 is shielded, and the power line C concentrates on the lower part of the barrel 3 where the electronic component 10 is located. In this state, each electronic component 10 is electrically connected to the barrel 3 via a dummy medium, and the plating metal in the plating solution 5 is deposited on the surface of the terminal electrodes 12 and 12 of the electronic component 10.

電解めっき処理が終了した後、めっき槽2からめっき液5を除去する(ステップS04)。そして、めっき液5の代わりに洗浄液6をめっき槽2に流入し、バレル3を洗浄液6に浸漬する(ステップS05)。そして、回転軸7を中心としてバレル3を所定の速度で回転させることにより、電子部品10を攪拌しながら洗浄処理を行う(ステップS06)。洗浄液6としては、例えば純水が用いられる。   After the electrolytic plating process is completed, the plating solution 5 is removed from the plating tank 2 (step S04). And the washing | cleaning liquid 6 flows into the plating tank 2 instead of the plating liquid 5, and the barrel 3 is immersed in the washing | cleaning liquid 6 (step S05). Then, the cleaning process is performed while the electronic component 10 is being agitated by rotating the barrel 3 around the rotation shaft 7 at a predetermined speed (step S06). For example, pure water is used as the cleaning liquid 6.

この洗浄処理においては、図7に示すように、洗浄液6よりも比重の大きい電気絶縁部材20が、電子部品10に覆い被さるようにバレル3の下部に沈む。また、電気絶縁部材20がバレル3の下方に沈む際、電気絶縁部材20の長手方向に沿う縁部22,22同士が向かい合うように屈曲し、流動する電子部品10の表面に電気絶縁部材20が略密着する。したがって、この状態でバレル3を回転させた場合、電気絶縁部材20によって電子部品10の流動範囲が規制され、電子部品10が他の電子部品10や電気絶縁部材20の下面側に頻繁に当たりながら、電子部品10の洗浄処理がなされる。   In this cleaning process, as shown in FIG. 7, an electrical insulating member 20 having a specific gravity greater than that of the cleaning liquid 6 sinks in the lower portion of the barrel 3 so as to cover the electronic component 10. Further, when the electrical insulating member 20 sinks below the barrel 3, the edges 22, 22 along the longitudinal direction of the electrical insulating member 20 are bent so that they face each other, and the electrical insulating member 20 is formed on the surface of the flowing electronic component 10. Close contact. Therefore, when the barrel 3 is rotated in this state, the flow range of the electronic component 10 is regulated by the electrical insulating member 20, and the electronic component 10 frequently hits the other electronic component 10 or the lower surface side of the electrical insulating member 20, The electronic component 10 is cleaned.

洗浄工程の後、バレル3をめっき槽2から取り出し、篩等によって電子部品10と電気絶縁部材20等とを選別する。そして、所定の乾燥工程を行うことにより、図3に例示した積層型の電子部品10の製造が完了する。   After the cleaning step, the barrel 3 is taken out from the plating tank 2 and the electronic component 10 and the electrical insulating member 20 are selected by a sieve or the like. Then, by performing a predetermined drying process, the manufacture of the multilayer electronic component 10 illustrated in FIG. 3 is completed.

以上説明したように、本実施形態に係るバレルめっき方法では、めっき液5よりも比重が小さく、かつ洗浄液6よりも比重の大きい板状の電気絶縁部材20を用意し、電子部品10と共にバレル3内に収容する。この電気絶縁部材20は、電解めっき処理においてバレル3がめっき液5に浸漬されると、バレル3内の上部に浮き上がり、バレル3の内壁上部を覆うように存在するため、アノード電極4からバレル3の上部に向かう電力線の経路が遮られることとなる。したがって、図8に示すように、電気絶縁部材20をバレル3内に収容しない場合には、電力線Cがアノード電極4から均等な密度でバレル3に向かうが、このバレルめっき方法では、図6に示したように、電子部品10が位置するバレル3の下部に電力線Cが集中するようになるため、めっき効率の向上が図られる。   As described above, in the barrel plating method according to the present embodiment, the plate-like electrical insulating member 20 having a specific gravity smaller than that of the plating solution 5 and larger than that of the cleaning solution 6 is prepared. Housed inside. When the barrel 3 is immersed in the plating solution 5 in the electrolytic plating process, the electrical insulating member 20 floats up to the upper part of the barrel 3 and covers the upper part of the inner wall of the barrel 3. The path of the power line going to the top of will be blocked. Therefore, as shown in FIG. 8, when the electrical insulating member 20 is not accommodated in the barrel 3, the power line C is directed from the anode electrode 4 to the barrel 3 with an equal density. As shown, since the power line C is concentrated at the lower part of the barrel 3 where the electronic component 10 is located, the plating efficiency can be improved.

一方、電気絶縁部材20は、電子部品10の洗浄処理において、バレル3が洗浄液6に浸漬されると、電子部品10に覆い被さるようにバレル3内の下部に沈む。また、電気絶縁部材20がバレル3の下方に沈む際、電気絶縁部材20の長手方向に沿う縁部22,22同士が向かい合うように屈曲し、流動する電子部品10の表面に電気絶縁部材20が略密着する。この状態でバレル3を回転させた場合、電気絶縁部材20によって電子部品10の流動範囲が規制され、電子部品10が他の電子部品10や電気絶縁部材20の下面側に頻繁に当たりながら、電子部品10の洗浄処理がなされることとなる。これにより、洗浄処理において電子部品10が十分に攪拌され、電解めっき処理の際に電子部品10同士の付着が発生していても、その分離効率を高めることが可能となる。なお、電気絶縁部材20は、電子部品10に比べて十分に大きな板状をなしているので、洗浄処理が終了した後は、電気絶縁部材20を電子部品10から容易に選別して取り出すことができる。   On the other hand, when the barrel 3 is immersed in the cleaning liquid 6 in the cleaning process of the electronic component 10, the electrical insulating member 20 sinks to the lower part of the barrel 3 so as to cover the electronic component 10. Further, when the electrical insulating member 20 sinks below the barrel 3, the edges 22, 22 along the longitudinal direction of the electrical insulating member 20 are bent so that they face each other, and the electrical insulating member 20 is formed on the surface of the flowing electronic component 10. Close contact. When the barrel 3 is rotated in this state, the flow range of the electronic component 10 is restricted by the electric insulating member 20, and the electronic component 10 frequently hits the other electronic component 10 or the lower surface side of the electric insulating member 20. Ten cleaning processes are performed. Thereby, even if the electronic components 10 are sufficiently stirred in the cleaning process and the electronic components 10 are adhered to each other during the electrolytic plating process, the separation efficiency can be increased. Since the electrical insulating member 20 has a sufficiently large plate shape as compared with the electronic component 10, the electrical insulating member 20 can be easily selected and removed from the electronic component 10 after the cleaning process is completed. it can.

また、このバレルめっき方法では、電気絶縁部材20の幅寸法W1は、バレル3の内径W2を基準として約50%となっており、電気絶縁部材20の長さ寸法L1は、バレル3の回転軸方向の内寸法L2を基準として約75%となっている。このような構成により、電気絶縁部材20がバレル3の内壁に引っ掛かりにくくなるので、電解めっき処理から洗浄処理に移行する際に、バレル3の上部からバレル3の下部に向けて電気絶縁部材20を確実に移動させることができる。さらに、上述のように、電気絶縁部材20の長さ寸法L1は、バレル3の回転軸方向の内寸法を基準として50%以上となっているので、電解めっき処理における電力線Cの経路の遮蔽と、洗浄処理における電子部品10の流動範囲の規制とを好適に行うことができる。   In this barrel plating method, the width dimension W1 of the electrical insulating member 20 is about 50% with respect to the inner diameter W2 of the barrel 3, and the length dimension L1 of the electrical insulating member 20 is the rotational axis of the barrel 3. It is about 75% based on the inner dimension L2 in the direction. With such a configuration, the electric insulating member 20 is less likely to be caught on the inner wall of the barrel 3, so that when the electroplating process is shifted to the cleaning process, the electric insulating member 20 is moved from the upper part of the barrel 3 toward the lower part of the barrel 3. It can be moved reliably. Furthermore, as described above, since the length dimension L1 of the electrical insulating member 20 is 50% or more based on the inner dimension of the barrel 3 in the rotation axis direction, the path of the power line C in the electrolytic plating process is shielded. The flow range of the electronic component 10 in the cleaning process can be suitably controlled.

本発明は、上記実施形態に限られるものではない。例えば上述した実施形態では、溝部21の形成によって電気絶縁部材20を屈曲可能としているが、このような溝部21の形成は必ずしも必要ではなく、電解めっき処理及び洗浄処理を通じて屈曲しない電気絶縁部材を用いてもよい。また、電気絶縁部材20の形状は、バレル3内に収容する電子部品10の大きさや数量などに応じて適宜変更可能である。このとき、電気絶縁部材20の幅寸法W1をバレル3の内径W2を基準として50%以下とし、かつ電気絶縁部材20の長さ寸法L1をバレル3の回転軸方向の内寸法L2を基準として100%未満50%以上とすることにより、上述した実施形態と同様の作用効果が得られる。   The present invention is not limited to the above embodiment. For example, in the above-described embodiment, the electrical insulating member 20 can be bent by forming the groove portion 21, but such a groove portion 21 is not necessarily formed, and an electrical insulating member that is not bent through the electrolytic plating process and the cleaning process is used. May be. Further, the shape of the electrical insulating member 20 can be appropriately changed according to the size and quantity of the electronic component 10 accommodated in the barrel 3. At this time, the width dimension W1 of the electric insulating member 20 is set to 50% or less with respect to the inner diameter W2 of the barrel 3, and the length dimension L1 of the electric insulating member 20 is set to 100 based on the inner dimension L2 of the barrel 3 in the rotation axis direction. By setting it to less than 50% and less than 50%, it is possible to obtain the same effect as the above-described embodiment.

本発明に係るバレルめっき方法の一実施形態を実現するためのバレルめっき装置の構成概要を示す図である。It is a figure which shows the structure outline | summary of the barrel plating apparatus for implement | achieving one Embodiment of the barrel plating method which concerns on this invention. 図1に示したバレルめっき装置を側方から見た図である。It is the figure which looked at the barrel plating apparatus shown in FIG. 1 from the side. バレルに収容する電子部品の一例を示す斜視図である。It is a perspective view which shows an example of the electronic component accommodated in a barrel. バレルに収容する電気絶縁部材の一例を示す斜視図である。It is a perspective view which shows an example of the electrical insulation member accommodated in a barrel. バレルめっき方法の手順を示すフローチャートである。It is a flowchart which shows the procedure of a barrel plating method. 電解めっき処理中のバレル内の状態を示す図である。It is a figure which shows the state in the barrel during an electrolytic plating process. 洗浄処理中のバレル内の状態を示す図である。It is a figure which shows the state in the barrel under a washing process. 電気絶縁部材を収容しない場合の電解めっき処理中のバレル内の状態を示す図である。It is a figure which shows the state in the barrel during the electroplating process in the case of not accommodating an electrical insulation member.

符号の説明Explanation of symbols

3…バレル、5…めっき液、6…洗浄液、10…電子部品(被めっき物)、20…電気絶縁部材、L1…電気絶縁部材の長さ寸法、L2…バレルの回転軸方向の内寸法、W1…電気絶縁部材の幅寸法、W2…バレルの内径。
3 ... Barrel, 5 ... Plating solution, 6 ... Cleaning solution, 10 ... Electronic component (to-be-plated object), 20 ... Electrical insulation member, L1 ... Length dimension of electrical insulation member, L2 ... Internal dimension of barrel in the rotation axis direction, W1 is the width dimension of the electrical insulating member, W2 is the inner diameter of the barrel.

Claims (5)

複数の被めっき物をバレル内で攪拌しながらめっき処理を行うバレルめっき方法であって、
めっき液よりも比重が小さく、かつ洗浄液よりも比重が大きい板状の電気絶縁部材を用意し、前記電気絶縁部材と前記複数の被めっき物とを前記バレル内に収容する工程と、
前記バレルを前記めっき液に浸漬させると共に、前記バレルの外側に配置された陽極と前記バレル内に収容された前記複数の被めっき物との間の一部を前記電気絶縁部材によって遮蔽した状態で通電し、前記バレルを回転させながら前記複数の被めっき物にめっきを形成する工程と、
前記めっき液を除去した後、前記バレルを前記洗浄液に浸漬させ、前記バレルを回転させながら前記複数の被めっき物を洗浄する工程とを備えたことを特徴とするバレルめっき方法。
A barrel plating method for performing plating while stirring a plurality of objects to be plated in a barrel,
Preparing a plate-like electrical insulating member having a specific gravity smaller than the plating solution and larger than the cleaning solution, and storing the electrical insulating member and the plurality of objects to be plated in the barrel;
The barrel is immersed in the plating solution, and a portion between the anode disposed outside the barrel and the plurality of objects to be plated accommodated in the barrel is shielded by the electrical insulating member. Energizing and forming plating on the plurality of objects to be plated while rotating the barrel;
And a step of immersing the barrel in the cleaning solution and cleaning the plurality of objects to be plated while rotating the barrel after removing the plating solution.
前記電気絶縁部材の長さ寸法は、前記バレルの回転軸方向の内寸法を基準として100%未満であることを特徴とする請求項1記載のバレルめっき方法。   The barrel plating method according to claim 1, wherein a length dimension of the electrical insulating member is less than 100% based on an inner dimension of the barrel in the rotation axis direction. 前記電気絶縁部材の長さ寸法は、前記バレルの回転軸方向の内寸法を基準として50%以上であることを特徴とする請求項1又は2記載のバレルめっき方法。   3. The barrel plating method according to claim 1, wherein a length dimension of the electrical insulating member is 50% or more based on an inner dimension of the barrel in a rotation axis direction. 前記電気絶縁部材の幅寸法は、前記バレルの内径を基準として50%以下であることを特徴とする請求項1〜3のいずれか一項記載のバレルめっき方法。   4. The barrel plating method according to claim 1, wherein a width dimension of the electrical insulating member is 50% or less based on an inner diameter of the barrel. 5. 前記電気絶縁部材は、当該電気絶縁部材の長手方向に沿う縁部同士が向かい合う方向に屈曲可能となっていることを特徴とする請求項1〜4のいずれか一項記載のバレルめっき方法。

The barrel plating method according to claim 1, wherein the electrical insulating member is bendable in a direction in which edges along the longitudinal direction of the electrical insulating member face each other.

JP2006097916A 2006-03-31 2006-03-31 Barrel plating method Expired - Fee Related JP4198161B2 (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012214856A (en) * 2011-04-01 2012-11-08 Mitaka Seisaku:Kk Barrel apparatus for barrel plating
CN104099626A (en) * 2013-04-15 2014-10-15 昆山东威电镀设备技术有限公司 Anode material cleaning and screening machine

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012214856A (en) * 2011-04-01 2012-11-08 Mitaka Seisaku:Kk Barrel apparatus for barrel plating
CN104099626A (en) * 2013-04-15 2014-10-15 昆山东威电镀设备技术有限公司 Anode material cleaning and screening machine

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