JP2007235006A - Reinforcing plate for flexible printed circuit board and flexible printed circuit board using it - Google Patents

Reinforcing plate for flexible printed circuit board and flexible printed circuit board using it Download PDF

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JP2007235006A
JP2007235006A JP2006057320A JP2006057320A JP2007235006A JP 2007235006 A JP2007235006 A JP 2007235006A JP 2006057320 A JP2006057320 A JP 2006057320A JP 2006057320 A JP2006057320 A JP 2006057320A JP 2007235006 A JP2007235006 A JP 2007235006A
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reinforcing plate
printed circuit
flexible printed
circuit board
thickness
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Eiji Ono
英二 大野
Hideo Takahashi
秀雄 高橋
Yoshio Suzuki
祥生 鈴木
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Toray Industries Inc
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Toray Industries Inc
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a reinforcing plate for a flexible printed circuit board superior in adhesive property. <P>SOLUTION: The reinforcing plate for flexible printed circuit board has at least one polyimide resin layer, and has a thickness of 70-360 μm, wherein both contact angles of water of both surfaces are 50° or less at 25°C. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、フレキシブル印刷回路基板用補強板に関する。   The present invention relates to a reinforcing plate for a flexible printed circuit board.

近年、電子機器は小型化、薄型化、高密度化が進み、狭い空間内での実装にフレキシブル印刷回路基板の役割が重要となっている。また、実装技術の進歩により、高密度実装化の要求は急激に高まり、フレキシブル印刷回路基板に直接に部品を搭載する部品実装用フレキシブル印刷回路基板が多用されてきている。かかる部品実装用フレキシブル回路基板には剛性がないため、電子部品の搭載や、コネクタ接続部分には、補強板を貼り合わせて用いられている。このようなフレキシブル回路基板用補強板としては、機械特性、電気特性、耐化学薬品性、耐熱性、耐環境性などの点で優れていることから、ポリイミドフィルムが幅広く使用されている。   In recent years, electronic devices have been reduced in size, thickness, and density, and the role of a flexible printed circuit board has become important for mounting in a narrow space. Further, due to advances in mounting technology, the demand for high-density mounting has rapidly increased, and component-mounted flexible printed circuit boards that mount components directly on flexible printed circuit boards have been widely used. Since such a component mounting flexible circuit board does not have rigidity, a reinforcing plate is attached to an electronic component mounting or connector connecting portion. As such a reinforcing plate for a flexible circuit board, polyimide films are widely used because of excellent mechanical characteristics, electrical characteristics, chemical resistance, heat resistance, environmental resistance, and the like.

補強板は、フレキシブル印刷回路基板に剛性を付与することが目的である。これまでに、フレキシブル回路基板用補強板として、厚さが120μm以上のポリイミドフィルムを用いることが開示されている(例えば、特許文献1参照)。補強板は、通常接着剤シートを介してフレキシブル印刷回路と貼り合わされるため、接着剤シートとの接着性が重要となるが、従来公知のフレキシブル回路基板用補強板は、十分な接着性を有していなかった。
特開2004−149591号公報
The purpose of the reinforcing plate is to give rigidity to the flexible printed circuit board. So far, it has been disclosed to use a polyimide film having a thickness of 120 μm or more as a reinforcing plate for a flexible circuit board (for example, see Patent Document 1). Since the reinforcing plate is usually bonded to the flexible printed circuit via an adhesive sheet, the adhesiveness to the adhesive sheet is important. However, conventionally known reinforcing plates for flexible circuit boards have sufficient adhesiveness. I did not.
Japanese Patent Laid-Open No. 2004-149591

本発明は上記課題を解決し、接着性に優れたフレキシブル印刷回路用補強板を提供することを目的とする。   An object of the present invention is to solve the above-mentioned problems and to provide a flexible printed circuit reinforcing plate excellent in adhesiveness.

上記した本発明の目的は、少なくとも1層のポリイミド樹脂層を有するフレキシブル印刷回路基板用補強板であって、厚みが70μm以上360μm以下であり、かつ、両面の水の接触角がいずれも25℃において50度以下であることを特徴とするフレキシブル印刷回路基板用補強板により達成される。   An object of the present invention is a reinforcing plate for a flexible printed circuit board having at least one polyimide resin layer, the thickness is 70 μm or more and 360 μm or less, and the contact angles of water on both sides are both 25 ° C. Is achieved by a reinforcing plate for a flexible printed circuit board, which is characterized by being 50 degrees or less.

本発明によれば、接着性に優れたポリイミドフィルムベースのフレキシブル印刷回路用の補強板を提供することができる。   ADVANTAGE OF THE INVENTION According to this invention, the reinforcement board for flexible printed circuits based on the polyimide film excellent in adhesiveness can be provided.

本発明のフレキシブル印刷回路基板用補強板(以下、補強板という)は、少なくとも1層のポリイミド樹脂層を有する。ポリイミド樹脂層を有することにより、機械特性、電気特性、耐化学薬品性、耐熱性、耐環境性に優れる。   The flexible printed circuit board reinforcing plate (hereinafter referred to as a reinforcing plate) of the present invention has at least one polyimide resin layer. By having a polyimide resin layer, it is excellent in mechanical properties, electrical properties, chemical resistance, heat resistance, and environmental resistance.

本発明の補強板の厚みは、70μm以上360μm以下である。70μm未満では、剛性が不足し補強板として用いるには不十分である。また、360μmを超えると、打ち抜き加工性、作業性に問題があり、実用的でない。好ましくは175μm以上300μm以下である。   The thickness of the reinforcing plate of the present invention is 70 μm or more and 360 μm or less. If it is less than 70 μm, the rigidity is insufficient and it is insufficient for use as a reinforcing plate. On the other hand, if it exceeds 360 μm, there is a problem in punching workability and workability, which is not practical. Preferably they are 175 micrometers or more and 300 micrometers or less.

また、本発明の補強板は、両面の水の接触角がいずれも25℃において50度以下であることを特徴とする。好ましくは40度以下である。接触角が50度を越える場合、濡れ性が不足するため接着剤シートとの接着性が低下する。接触角を50度以下にする方法としては、後述する易接着処理が挙げられる。   The reinforcing plate of the present invention is characterized in that the contact angles of water on both sides are 50 degrees or less at 25 ° C. Preferably it is 40 degrees or less. When the contact angle exceeds 50 degrees, the wettability is insufficient and the adhesiveness with the adhesive sheet is lowered. Examples of the method for setting the contact angle to 50 degrees or less include an easy adhesion treatment described later.

一般にポリイミドフィルムは175μmを超えた厚みでは製膜効率が極端に低下し、コストが増大する。本発明では、一般的な厚みである50μmから175μmのポリイミドフィルムを、接着剤層を介して2層以上積層すると、175μmを超える厚みのフレキシブル印刷回路基板用補強板を安価に安定して得ることができるため好ましい。   In general, when the thickness of the polyimide film exceeds 175 μm, the film forming efficiency is extremely lowered and the cost is increased. In the present invention, when two or more layers of polyimide films having a general thickness of 50 μm to 175 μm are laminated via an adhesive layer, a flexible printed circuit board reinforcing plate having a thickness exceeding 175 μm can be stably obtained at a low cost. Is preferable.

接着剤層は、補強板の加熱プレス工程、めっき工程、半田リフロー工程などフレキシブル印刷回路の製造工程を考慮した場合、接着性、耐熱性、半田耐熱性、耐薬品性が求められる。本発明において、接着剤層はエポキシ樹脂、カルボキシル基含有アクリロニトリルブタジエンゴムおよび硬化剤を含有することが好ましい。   The adhesive layer is required to have adhesiveness, heat resistance, solder heat resistance, and chemical resistance in consideration of a flexible printed circuit manufacturing process such as a heating plate pressing process, a plating process, and a solder reflow process. In the present invention, the adhesive layer preferably contains an epoxy resin, a carboxyl group-containing acrylonitrile butadiene rubber and a curing agent.

エポキシ樹脂はエポキシ基を分子中に2個以上含むものであれば特に限定されないが、例えばビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ビフェノール型エポキシ樹脂あるいはノボラック型エポキシ樹脂などが挙げられる。また、難燃性付与のために、ハロゲン化エポキシ樹脂、特に臭素化エポキシ樹脂を用いることが有効である。この際、臭素化エポキシ樹脂のみでは難燃性の付与はできるものの接着剤の耐熱性の低下が大きくなるため、非臭素化エポキシ樹脂との混合系とすることがさらに有効である。臭素含有量およびエポキシ当量を考慮して2種類以上用いても良い。   The epoxy resin is not particularly limited as long as it contains two or more epoxy groups in the molecule, and examples thereof include bisphenol A type epoxy resin, bisphenol F type epoxy resin, biphenol type epoxy resin, and novolak type epoxy resin. In order to impart flame retardancy, it is effective to use a halogenated epoxy resin, particularly a brominated epoxy resin. At this time, although the flame resistance can be imparted only with the brominated epoxy resin, the heat resistance of the adhesive is greatly reduced. Therefore, it is more effective to use a mixed system with a non-brominated epoxy resin. Two or more kinds may be used in consideration of bromine content and epoxy equivalent.

本発明に好ましく使用されるカルボキシル基含有アクリロニトリルブタジエンゴム(以下NBR−Cと称する)としては、例えばアクリロニトリルとブタジエンを約10/90〜50/50のモル比で共重合させた共重合ゴムの末端基をカルボキシル化したもの、あるいはアクリロニトリル、ブタジエンとアクリル酸、マレイン酸などのカルボキシル基含有重合性単量体の三元共重合ゴムなどが挙げられる。アクリロニトリル量は、硬化物の耐薬品性の観点から10モル%以上が好ましく、溶剤に対する溶解性の観点から50モル%以下が好ましい。また、カルボキシル基含有量は0.01〜0.15ephrが好ましい。ここで、ephrとはequivalent parts per hundred rubberの略であり、NBR−C100重量部あたりのカルボキシル基の当量を意味する。カルボキシル基含有量が0.01ephr以上であれば、エポキシ樹脂との反応により耐熱性に優れた硬化物が得られる。一方、0.15ephr以下であれば、接着剤層を塗布する際の塗布性に優れた接着剤溶液が得られる。さらには0.03〜0.1ephrの範囲がより好ましい。   The carboxyl group-containing acrylonitrile butadiene rubber (hereinafter referred to as NBR-C) preferably used in the present invention is, for example, a terminal of a copolymer rubber obtained by copolymerizing acrylonitrile and butadiene in a molar ratio of about 10/90 to 50/50. Examples thereof include those obtained by carboxylating groups, or terpolymer rubbers of carboxyl group-containing polymerizable monomers such as acrylonitrile, butadiene, acrylic acid, and maleic acid. The amount of acrylonitrile is preferably 10 mol% or more from the viewpoint of chemical resistance of the cured product, and preferably 50 mol% or less from the viewpoint of solubility in a solvent. Further, the carboxyl group content is preferably 0.01 to 0.15 ephr. Here, ephr is an abbreviation for equivalent parts per hundred rubber, and means the equivalent of carboxyl groups per 100 parts by weight of NBR-C. If carboxyl group content is 0.01 ephr or more, the cured | curing material excellent in heat resistance will be obtained by reaction with an epoxy resin. On the other hand, if it is 0.15 ephr or less, an adhesive solution excellent in applicability when the adhesive layer is applied can be obtained. Furthermore, the range of 0.03-0.1 ephr is more preferable.

上記NBR−Cの含有量は、エポキシ樹脂100重量部に対して20〜200重量部が好ましく、30〜100重量部がより好ましい。20重量部以上であれば接着性が良好となり、200重量部以下であれば半田耐熱性が良好となる。   20-200 weight part is preferable with respect to 100 weight part of epoxy resins, and, as for content of the said NBR-C, 30-100 weight part is more preferable. If it is 20 parts by weight or more, the adhesion is good, and if it is 200 parts by weight or less, the solder heat resistance is good.

本発明において好ましく使用される硬化剤としては、ジアミノジフェニルメタン、ジアミノジフェニルスルフィド、ジアミノベンゾフェノン、ジアミノジフェニルスルホン、ジエチルトリアミンなどのアミン系化合物、2−アルキル−4−メチルイミダゾール、2−フェニル−4−アルキルイミダゾール等のイミダゾール誘導体、無水フタル酸、無水トリメリット酸等の有機酸、三フッ化ホウ素トリエチルアミン錯体等の三フッ化ホウ素のアミン錯体、ジシアンジアミド等が挙げられ、これらを単独または2種以上用いても良い。また、硬化剤としてレゾール型、ノボラック型フェノール樹脂等のフェノール樹脂を用いてもよい。フェノール樹脂としてはたとえばフェノール、クレゾール、p−t−ブチルフェノール等のアルキル置換フェノール、テルペン、ジシクロペンタジエン等の環状アルキル変性フェノール、ニトロ基、ハロゲン基、アミノ基、シアノ基等のヘテロ原子を含む官能基を有するもの、ナフタレン、アントラセン等の骨格を有するもの等が挙げられる。   Curing agents preferably used in the present invention include amine compounds such as diaminodiphenylmethane, diaminodiphenyl sulfide, diaminobenzophenone, diaminodiphenylsulfone, and diethyltriamine, 2-alkyl-4-methylimidazole, and 2-phenyl-4-alkyl. Examples include imidazole derivatives such as imidazole, organic acids such as phthalic anhydride and trimellitic anhydride, boron trifluoride amine complexes such as boron trifluoride triethylamine complex, and dicyandiamide. Also good. Moreover, you may use phenol resins, such as a resol type and a novolak type phenol resin, as a hardening | curing agent. Examples of the phenolic resin include alkyl-substituted phenols such as phenol, cresol and pt-butylphenol, cyclic alkyl-modified phenols such as terpene and dicyclopentadiene, and functional groups containing heteroatoms such as nitro group, halogen group, amino group and cyano group. Examples thereof include those having a group and those having a skeleton such as naphthalene and anthracene.

本発明において、接着剤層に必要に応じて、水酸化アルミニウム、水酸化マグネシウム、カルシウム・アルミネート水和物等の金属水酸化物、シリカ、アルミナ、酸化亜鉛、三酸化アンチモン、五酸化アンチモン、酸化マグネシウム、酸化チタン等の金属酸化物、炭酸カルシウム等の無機塩、カーボンブラック等の無機粒子を、単独または2種以上含有しても良い。また、以上の成分以外に、接着剤の特性を損なわない範囲で酸化防止剤、イオン捕捉剤などの有機、無機成分を含有することは何ら制限されるものではない。   In the present invention, if necessary for the adhesive layer, metal hydroxide such as aluminum hydroxide, magnesium hydroxide, calcium aluminate hydrate, silica, alumina, zinc oxide, antimony trioxide, antimony pentoxide, Metal oxides such as magnesium oxide and titanium oxide, inorganic salts such as calcium carbonate, and inorganic particles such as carbon black may be contained singly or in combination. In addition to the above components, it is not limited at all to contain organic and inorganic components such as an antioxidant and an ion scavenger within a range not impairing the properties of the adhesive.

次に、本発明の補強板の製造方法の例について説明する。本発明の補強板は、両面の水の接触角がいずれも25℃において50度以下であることを特徴とする。好ましくは40度以下である。接触角を50度以下にする方法として、例えば、ポリイミド樹脂層に対して、コロナ放電処理、低温プラズマ処理、サンドマット表面処理、アンカーコート処理のような易接着処理を行う方法が挙げられる。これらの処理を複数組み合わせて行ってもよい。   Next, the example of the manufacturing method of the reinforcement board of this invention is demonstrated. The reinforcing plate of the present invention is characterized in that the contact angles of water on both sides are 50 degrees or less at 25 ° C. Preferably it is 40 degrees or less. Examples of the method of setting the contact angle to 50 degrees or less include a method of subjecting a polyimide resin layer to easy adhesion treatment such as corona discharge treatment, low temperature plasma treatment, sand mat surface treatment, and anchor coat treatment. A plurality of these processes may be combined.

コロナ放電処理は、補強板の表面を処理せず、あるいはアセトン、イソプロピルアルコ−ル、エチルアルコ−ルなどの有機溶媒で処理した後行ってもよい。   The corona discharge treatment may be performed after the surface of the reinforcing plate is not treated, or after treatment with an organic solvent such as acetone, isopropyl alcohol, ethyl alcohol or the like.

低温プラズマ放電処理を行う場合、雰囲気の圧力は特に限定されないが、0.1〜1500Paの範囲が好ましい。この圧力範囲であれば、官能基を適度に導入することができる。より好ましくは0.1〜100Paである。ガス組成は特に限定されないが、酸素を含有することが好ましい。あるいは、希ガスを20モル%以上含有することも好ましい。希ガスとしてはHe、Ne、Ar、Xeなどが挙げられるが、Arが好ましい。希ガスにCO、N、H、HOなどを混合して使用してもよく、OH基またはCOOH基を導入できる点からCO、Oが好ましい。プラズマ照射時間は1秒〜10分程度が好ましい。より好ましくは1秒〜1分である。印加電圧は1〜8kVが好ましい。 When performing the low temperature plasma discharge treatment, the pressure of the atmosphere is not particularly limited, but a range of 0.1 to 1500 Pa is preferable. If it is this pressure range, a functional group can be introduced moderately. More preferably, it is 0.1-100 Pa. The gas composition is not particularly limited, but preferably contains oxygen. Or it is also preferable to contain 20 mol% or more of noble gases. Examples of the rare gas include He, Ne, Ar, and Xe, and Ar is preferable. Rare gas CO 2, N 2, H 2 , H 2 O , etc. may be mixed to use, CO 2 from the viewpoint of introducing an OH group or COOH group, O 2 is preferred. The plasma irradiation time is preferably about 1 second to 10 minutes. More preferably, it is 1 second to 1 minute. The applied voltage is preferably 1 to 8 kV.

次に、接着剤層を介して2層以上のポリイミド樹脂層を有する補強板の製造方法の例について説明する。   Next, an example of a method for manufacturing a reinforcing plate having two or more polyimide resin layers through an adhesive layer will be described.

(a)接着剤組成物を溶剤に溶解した塗料を、ポリイミドフィルム上に塗布、乾燥する。接着剤層の膜厚は10〜100μmとなるように塗布することが好ましい。乾燥条件は、一般的に100〜200℃、1〜5分である。溶剤は特に限定されないが、トルエン、キシレン、クロルベンゼン等の芳香族系、メチルエチルケトン、メチルイソブチルケトン等のケトン系、ジメチルホルムアミド、ジメチルアセトアミド、Nメチルピロリドン等の非プロトン系極性溶剤単独あるいは混合物が好適である。   (A) A paint obtained by dissolving the adhesive composition in a solvent is applied on a polyimide film and dried. It is preferable to apply so that the thickness of the adhesive layer is 10 to 100 μm. Drying conditions are generally 100 to 200 ° C. and 1 to 5 minutes. Solvents are not particularly limited, but aromatics such as toluene, xylene and chlorobenzene, ketones such as methylethylketone and methylisobutylketone, and aprotic polar solvents such as dimethylformamide, dimethylacetamide and N-methylpyrrolidone alone or a mixture are preferred. It is.

(b)前記(a)で作製した接着剤付きポリイミドフィルムにもう1層のポリイミドフィルムをラミネートしてポリイミドフィルム積層体を得る。所望の厚みを得るには、ポリイミドフィルムの厚み、接着剤の膜厚を調整すればよい。さらに厚みを増す場合は、接着剤層を介してポリイミドフィルムを複数回積層すればよい。   (B) Another polyimide film is laminated on the adhesive-coated polyimide film prepared in (a) to obtain a polyimide film laminate. In order to obtain a desired thickness, the thickness of the polyimide film and the film thickness of the adhesive may be adjusted. When the thickness is further increased, the polyimide film may be laminated a plurality of times through the adhesive layer.

(c)得られたポリイミドフィルム積層体を熱処理することにより、接着剤を熱硬化させた後、前述の易接着処理を行い、本発明の補強板を得る。熱処理はロール状、枚葉などで行うことができる。ロール状で熱処理する場合、ポリイミドフィルム中の水分が気化する際の膨張による膨れ、発泡を抑えるため、60℃〜100℃で1〜2時間、150℃〜160℃で1〜4時間の段階処理を実施することが好ましい。   (C) By heat-treating the obtained polyimide film laminate, the adhesive is heat-cured and then subjected to the aforementioned easy adhesion treatment to obtain the reinforcing plate of the present invention. The heat treatment can be performed in the form of a roll or a sheet. In the case of heat treatment in a roll shape, in order to suppress swelling and foaming due to expansion when moisture in the polyimide film is vaporized, step treatment is performed at 60 ° C to 100 ° C for 1 to 2 hours and at 150 ° C to 160 ° C for 1 to 4 hours. It is preferable to implement.

以下に実施例を挙げて本発明を説明するが、本発明はこれらの実施例に限定されるものではない。実施例の説明に入る前に評価方法について述べる。   EXAMPLES The present invention will be described below with reference to examples, but the present invention is not limited to these examples. The evaluation method will be described before the description of the examples.

(1)評価用サンプル作製方法
補強板を厚さ35μmの電解銅箔(日鉱マテリアルズ(株)製、JTC箔)の光沢面に接着剤シート(デュポン(株)製、パイララックスR)を介して、180℃、30kg/cm、30分のプレス条件で積層し評価用サンプルを作製した。
(1) Sample preparation method for evaluation A reinforcing plate is placed on the glossy surface of 35 μm thick electrolytic copper foil (Nikko Materials Co., Ltd., JTC foil) via an adhesive sheet (DuPont Co., Ltd., Piralux R). Then, a sample for evaluation was produced by laminating under press conditions of 180 ° C., 30 kg / cm 2 and 30 minutes.

(2)水の接触角
接触角の測定には、協和界面科学(株)製接触角計CA−D型を用いた。接触角の測定方法としては、補強板表面に蒸留水を約2.0μl着滴して液滴を作製し、前記液滴をCCDカメラにて画面に表示し、前記画面上の液滴の端部と頂点を結ぶ線の延長線上の目盛りを読み取り2倍した数値を接触角とした。
(2) Contact angle of water For the measurement of the contact angle, a contact angle meter CA-D type manufactured by Kyowa Interface Science Co., Ltd. was used. As a method for measuring the contact angle, about 2.0 μl of distilled water was deposited on the surface of the reinforcing plate to produce a droplet, and the droplet was displayed on a screen with a CCD camera. The scale on the extension line of the line connecting the part and the apex was read and doubled as the contact angle.

(3)接着力
上記(1)の方法で作製した評価用サンプルを用いて、JIS−C6481に準拠して2mm幅のポリイミドフィルムを90°方向に50mm/分の速度で剥離し、その際の接着力を測定した。
(3) Adhesive force Using the sample for evaluation produced by the method of (1) above, a 2 mm wide polyimide film was peeled off at a rate of 50 mm / min in the 90 ° direction in accordance with JIS-C6481, The adhesive force was measured.

(4)剛性
補強板に使用したポリイミドフィルムの弾性率と接着剤層を除いたポリイミドフィルム層の厚さから、下記式(1)で算出された数値を剛性とした。
剛性(N)= 弾性率(N/m)× 厚さ(m)× 厚さ(m) (1)
(5)半田耐熱性
JIS−C6481に準拠した方法で行った。上記(1)の方法で作製した評価用サンプルを40℃、90%RHの雰囲気下で24時間調湿した後、すみやかに半田浴上に30秒間浮かべ、膨れおよび剥がれのない最高温度を測定した。
(4) Rigidity The numerical value calculated by the following formula (1) from the elastic modulus of the polyimide film used for the reinforcing plate and the thickness of the polyimide film layer excluding the adhesive layer was defined as rigidity.
Rigidity (N) = Elastic modulus (N / m 2 ) × Thickness (m) × Thickness (m) (1)
(5) Solder heat resistance It carried out by the method based on JIS-C6481. The sample for evaluation produced by the above method (1) was conditioned for 24 hours in an atmosphere of 40 ° C. and 90% RH, then immediately floated on the solder bath for 30 seconds, and the maximum temperature without swelling and peeling was measured. .

実施例1
ポリイミド樹脂層として、厚さ75μmのポリイミドフィルム(宇部興産(株)製ユーピレックスS)を使用し、圧力50Pa、ガスCO、電圧3kVで5秒間の条件で表面、裏面を低温プラズマ放電処理し、厚さ75μmの補強板を得た。
Example 1
As the polyimide resin layer, a polyimide film with a thickness of 75 μm (Upilex S manufactured by Ube Industries, Ltd.) was used, and the surface and the back surface were subjected to low-temperature plasma discharge treatment under conditions of pressure 50 Pa, gas CO 2 , voltage 3 kV for 5 seconds, A reinforcing plate having a thickness of 75 μm was obtained.

実施例2
ポリイミドフィルムの厚さを125μmとした以外は、実施例1と同様にして厚さ125μmの補強板を得た。
Example 2
A reinforcing plate having a thickness of 125 μm was obtained in the same manner as in Example 1 except that the thickness of the polyimide film was 125 μm.

実施例3
水酸化アルミニウム(昭和電工(株)製、H−421)をトルエン溶液とした後、サンドミル処理して水酸化アルミニウム分散液を作製した。この分散液に、NBR−C(JSR(株)製、PNR−1H)、臭素化エポキシ樹脂(ジャパンエポキシレジン(株)製、エピコート5050 エポキシ当量395)、非臭素化エポキシ樹脂(ジャパンエポキシレジン(株)製、エピコート828エポキシ当量189)、3,3’−ジアミノジフェニルスルホン(3,3’−DDS)および分散液と等重量のメチルエチルケトンをそれぞれ表1の組成比となるように加え、30℃で撹拌、混合して接着剤溶液を作製した。
Example 3
Aluminum hydroxide (manufactured by Showa Denko KK, H-421) was used as a toluene solution, and then sand milled to prepare an aluminum hydroxide dispersion. NBR-C (manufactured by JSR Corporation, PNR-1H), brominated epoxy resin (manufactured by Japan Epoxy Resin Corporation, Epicoat 5050 epoxy equivalent 395), non-brominated epoxy resin (Japan Epoxy Resin ( Co., Ltd., Epicoat 828 epoxy equivalent 189), 3,3′-diaminodiphenylsulfone (3,3′-DDS) and an equivalent weight of methyl ethyl ketone were added so as to have the composition ratio shown in Table 1, respectively. The mixture was stirred and mixed to prepare an adhesive solution.

この接着剤をバーコータで、厚さ75μmのポリイミドフィルム(宇部興産(株)製、ユーピレックスS)に約25μmの乾燥厚さとなるように塗布し、150℃で5分間乾燥し、さらに厚さ75μmのポリイミドフィルムをラミネートし、150℃で1時間熱処理を実施して厚さ175μmの補強板を得た。その後、圧力30Pa、ガスCO、電圧4kVで5秒間の条件で、補強板の表面、裏面をプラズマ放電処理した。 This adhesive was applied to a 75 μm-thick polyimide film (Ube Industries, Upilex S) with a bar coater to a dry thickness of about 25 μm, dried at 150 ° C. for 5 minutes, and further 75 μm thick The polyimide film was laminated and heat-treated at 150 ° C. for 1 hour to obtain a reinforcing plate having a thickness of 175 μm. Thereafter, the surface and the back surface of the reinforcing plate were subjected to plasma discharge treatment under the conditions of pressure 30 Pa, gas CO 2 and voltage 4 kV for 5 seconds.

Figure 2007235006
Figure 2007235006

実施例4
ポリイミドフィルムの厚さを75μmと125μmにした以外は、実施例3と同様にして厚さ225μmの補強板を得た。
Example 4
A reinforcing plate having a thickness of 225 μm was obtained in the same manner as in Example 3 except that the thickness of the polyimide film was changed to 75 μm and 125 μm.

実施例5
実施例3と同様にして得た接着剤を厚さ75μmのポリイミドフィルムにバーコータで約25μmの乾燥厚さとなるように塗布し、150℃で5分間乾燥し、さらに厚さ75μmのポリイミドフィルムをラミネートして、厚さ175μmのポリイミドフィルム積層体を得た。この積層体にさらに接着剤を乾燥厚さ25μmとなるようにバーコータで塗布し、150℃で5分間乾燥し、厚さ75μmのポリイミドフィルムをラミネートして厚さ275μmの補強板を得た。他は実施例3と同様にして、熱処理を施し、補強板の表面、裏面を低温プラズマ放電処理した。
Example 5
The adhesive obtained in the same manner as in Example 3 was applied to a 75 μm thick polyimide film with a bar coater to a dry thickness of about 25 μm, dried at 150 ° C. for 5 minutes, and further laminated with a 75 μm thick polyimide film. Thus, a polyimide film laminate having a thickness of 175 μm was obtained. An adhesive was further applied to this laminate with a bar coater to a dry thickness of 25 μm, dried at 150 ° C. for 5 minutes, and a 75 μm thick polyimide film was laminated to obtain a 275 μm thick reinforcing plate. Otherwise, heat treatment was performed in the same manner as in Example 3, and the front and back surfaces of the reinforcing plate were subjected to low-temperature plasma discharge treatment.

実施例6
DCスターラーを備えた300mlセパラブルフラスコ中に4,4’−ジアミノジフェニルエーテル19.43g(97mmol)、N,N’−ジメチルアセトアミド149.5gを入れ窒素雰囲気下、室温で撹拌した。30分撹拌後、5−ノルボルネン−2,3−ジカルボン酸二無水物0.159g(0.97mmol)を加えて撹拌した。更に30分から1時間後にピロメリット酸二無水物20.53g(94mmol)を数回に分けて投入した。1時間撹拌した後、ピロメリット酸二無水物のN,N’−ジメチルアセトアミド溶液(6重量%)10.58gを30分かけて滴下し更に1時間撹拌し、ポリアミック酸溶液を作製した。
Example 6
In a 300 ml separable flask equipped with a DC stirrer, 19.43 g (97 mmol) of 4,4′-diaminodiphenyl ether and 149.5 g of N, N′-dimethylacetamide were placed and stirred at room temperature under a nitrogen atmosphere. After stirring for 30 minutes, 0.159 g (0.97 mmol) of 5-norbornene-2,3-dicarboxylic dianhydride was added and stirred. Further, 30 minutes to 1 hour later, 20.53 g (94 mmol) of pyromellitic dianhydride was added in several portions. After stirring for 1 hour, 10.58 g of a pyromellitic dianhydride N, N′-dimethylacetamide solution (6 wt%) was added dropwise over 30 minutes and the mixture was further stirred for 1 hour to prepare a polyamic acid solution.

一方、DCスターラーを備えた300mlセパラブルフラスコ中に4,4’−ジアミノジフェニルメタン9.91g(50mmol)、N,N’−ジメチルアセトアミド103.86gをいれ窒素雰囲気下、室温で撹拌した。30分撹拌後、ベンゾフェノンテトラカルボン酸二無水物10.63g(33mmol)を数回に分けて投入した。1時間撹拌したのち5−ノルボルネン−2,3−ジカルボン酸無水物5.41g(33mmol)を投入し更に30分撹拌し、PMR溶液を作製した。   On the other hand, in a 300 ml separable flask equipped with a DC stirrer, 9.91 g (50 mmol) of 4,4′-diaminodiphenylmethane and 103.86 g of N, N′-dimethylacetamide were placed and stirred at room temperature under a nitrogen atmosphere. After stirring for 30 minutes, 10.63 g (33 mmol) of benzophenonetetracarboxylic dianhydride was added in several portions. After stirring for 1 hour, 5.41 g (33 mmol) of 5-norbornene-2,3-dicarboxylic anhydride was added and stirred for another 30 minutes to prepare a PMR solution.

100gのポリアミック酸溶液にPMR溶液を5.08g添加し、撹拌、脱泡して得られたポリアミック酸混合物溶液の一部をポリエステルフィルム上にとり、スピンコーターを用いて均一な膜を形成した。これを100℃のオーブンで1時間加熱することにより自己保持性のポリアミック酸フィルムを得た。得られたポリアミック酸フィルムを200℃30分、300℃20分、400℃5分の条件で熱処理を行うことにより、厚さ175μmのポリイミドフィルムを得た。   5.08 g of PMR solution was added to 100 g of polyamic acid solution, and a part of the polyamic acid mixture solution obtained by stirring and defoaming was taken on a polyester film, and a uniform film was formed using a spin coater. This was heated in an oven at 100 ° C. for 1 hour to obtain a self-holding polyamic acid film. The obtained polyamic acid film was heat-treated at 200 ° C. for 30 minutes, 300 ° C. for 20 minutes, and 400 ° C. for 5 minutes to obtain a polyimide film having a thickness of 175 μm.

このようにして得られた厚さ175μmのポリイミドフィルムに実施例3と同様の方法で、約10μmの乾燥厚みとなるよう接着剤を塗布乾燥し、さらに上記の厚さ175μmのポリイミドフィルムをラミネートした。あとは、実施例3と同様にして、接着剤の硬化および低温プラズマ放電処理を施し、厚さ360μmの補強板を得た。   The polyimide film having a thickness of 175 μm thus obtained was coated with an adhesive so as to have a dry thickness of about 10 μm by the same method as in Example 3 and further laminated with the polyimide film having a thickness of 175 μm. . Thereafter, the adhesive was cured and subjected to low-temperature plasma discharge treatment in the same manner as in Example 3 to obtain a reinforcing plate having a thickness of 360 μm.

比較例1
補強板として宇部興産(株)製ユーピレックス75Sを使用した。
Comparative Example 1
Upilex 75S manufactured by Ube Industries, Ltd. was used as a reinforcing plate.

比較例2
補強板として東レデュポン(株)製カプトン300Vを使用した。
Comparative Example 2
As a reinforcing plate, Kapton 300V manufactured by Toray DuPont Co., Ltd. was used.

比較例3
補強板として宇部興産(株)製ユーピレックス125Sを使用した。
Comparative Example 3
Upilex 125S manufactured by Ube Industries, Ltd. was used as a reinforcing plate.

比較例4
補強板として実施例6で得た厚さ175μmのポリイミドフィルムを単層で使用した。
Comparative Example 4
A 175 μm thick polyimide film obtained in Example 6 was used as a reinforcing plate in a single layer.

実施例1〜6、比較例1〜4の評価結果を表2に示す。表2から、本発明により得られる補強板は、比較例に対して接着性に優れることがわかる。   Table 2 shows the evaluation results of Examples 1 to 6 and Comparative Examples 1 to 4. From Table 2, it can be seen that the reinforcing plate obtained by the present invention is superior in adhesiveness to the comparative example.

Figure 2007235006
Figure 2007235006

Claims (4)

少なくとも1層のポリイミド樹脂層を有するフレキシブル印刷回路基板用補強板であって、厚みが70μm以上360μm以下であり、かつ、両面の水の接触角がいずれも25℃において50度以下であることを特徴とするフレキシブル印刷回路基板用補強板。 A reinforcing plate for a flexible printed circuit board having at least one polyimide resin layer, having a thickness of 70 μm or more and 360 μm or less, and a contact angle of water on both sides of 50 ° C. or less at 25 ° C. A reinforcing plate for a flexible printed circuit board. 表面がコロナ放電処理、低温プラズマ処理、サンドマット表面処理、アンカーコート処理から選ばれる少なくとも1つの方法により処理されたものであることを特徴とする請求項1記載のフレキシブル印刷回路基板用補強板。 The reinforcing plate for a flexible printed circuit board according to claim 1, wherein the surface is treated by at least one method selected from corona discharge treatment, low temperature plasma treatment, sand mat surface treatment, and anchor coat treatment. 接着剤層を介して2層以上のポリイミド樹脂層を有することを特徴とする請求項1記載のフレキシブル印刷回路基板用補強板。 The reinforcing plate for a flexible printed circuit board according to claim 1, comprising two or more polyimide resin layers through an adhesive layer. 請求項1〜3のいずれか記載のフレキシブル印刷回路基板用補強板を用いたフレキシブル印刷回路基板。 The flexible printed circuit board using the reinforcement board for flexible printed circuit boards in any one of Claims 1-3.
JP2006057320A 2006-03-03 2006-03-03 Reinforcing plate for flexible printed circuit board and flexible printed circuit board using it Pending JP2007235006A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101612327B1 (en) 2014-04-25 2016-04-14 주식회사 케이에이치엘텍 A procucing method for inforcement for pfcb
JP2019212713A (en) * 2018-06-01 2019-12-12 住友電工プリントサーキット株式会社 Flexible printed wiring board

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101612327B1 (en) 2014-04-25 2016-04-14 주식회사 케이에이치엘텍 A procucing method for inforcement for pfcb
JP2019212713A (en) * 2018-06-01 2019-12-12 住友電工プリントサーキット株式会社 Flexible printed wiring board
JP7020754B2 (en) 2018-06-01 2022-02-16 住友電工プリントサーキット株式会社 Flexible printed wiring board

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