JP2007194583A - 周辺露光用光源装置 - Google Patents

周辺露光用光源装置 Download PDF

Info

Publication number
JP2007194583A
JP2007194583A JP2006212992A JP2006212992A JP2007194583A JP 2007194583 A JP2007194583 A JP 2007194583A JP 2006212992 A JP2006212992 A JP 2006212992A JP 2006212992 A JP2006212992 A JP 2006212992A JP 2007194583 A JP2007194583 A JP 2007194583A
Authority
JP
Japan
Prior art keywords
wafer
light source
source device
peripheral exposure
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2006212992A
Other languages
English (en)
Japanese (ja)
Inventor
Miharu Goshima
美治 五嶋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ark Tech
ARK TECH KK
Original Assignee
Ark Tech
ARK TECH KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ark Tech, ARK TECH KK filed Critical Ark Tech
Priority to JP2006212992A priority Critical patent/JP2007194583A/ja
Priority to KR1020060091304A priority patent/KR20070066846A/ko
Publication of JP2007194583A publication Critical patent/JP2007194583A/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/70391—Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2006212992A 2005-12-21 2006-08-04 周辺露光用光源装置 Withdrawn JP2007194583A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2006212992A JP2007194583A (ja) 2005-12-21 2006-08-04 周辺露光用光源装置
KR1020060091304A KR20070066846A (ko) 2005-12-21 2006-09-20 주변 노광용 광원 장치

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005368464 2005-12-21
JP2006212992A JP2007194583A (ja) 2005-12-21 2006-08-04 周辺露光用光源装置

Publications (1)

Publication Number Publication Date
JP2007194583A true JP2007194583A (ja) 2007-08-02

Family

ID=38365861

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006212992A Withdrawn JP2007194583A (ja) 2005-12-21 2006-08-04 周辺露光用光源装置

Country Status (2)

Country Link
JP (1) JP2007194583A (ko)
KR (1) KR20070066846A (ko)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013058552A1 (ko) * 2011-10-19 2013-04-25 주식회사 인피테크 노광용 ｌｅｄ 광원 모듈, 노광용 ｌｅｄ 광원 장치 및 노광용 ｌｅｄ 광원장치 관리시스템
CN105487340A (zh) * 2014-10-01 2016-04-13 豪雅冠得股份有限公司 用于周边曝光装置的光照射装置
JP2016115813A (ja) * 2014-12-15 2016-06-23 東京エレクトロン株式会社 光照射装置
KR20160110097A (ko) 2015-03-11 2016-09-21 호야 칸데오 옵트로닉스 가부시키가이샤 광 조사 장치

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101037466B1 (ko) * 2008-11-21 2011-05-26 삼성전기주식회사 간이 노광기
KR100960083B1 (ko) * 2009-07-22 2010-05-31 홍진표 웨이퍼 엣지 노광용 광원 장치
KR101219323B1 (ko) * 2010-09-16 2013-01-18 엘지이노텍 주식회사 노광 장치
KR101401238B1 (ko) * 2012-09-28 2014-05-29 주식회사 인피테크 디스플레이 패널 노광용 ｌｅｄ 광원장치
KR102148856B1 (ko) * 2018-10-30 2020-08-27 주식회사 에이아이오코리아 Uv led 광원을 이용한 노광장치

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013058552A1 (ko) * 2011-10-19 2013-04-25 주식회사 인피테크 노광용 ｌｅｄ 광원 모듈, 노광용 ｌｅｄ 광원 장치 및 노광용 ｌｅｄ 광원장치 관리시스템
KR101344037B1 (ko) * 2011-10-19 2013-12-24 주식회사 인피테크 노광용 ｌｅｄ 광원 모듈, 노광용 ｌｅｄ 광원 장치 및 노광용 ｌｅｄ 광원장치 관리시스템
CN103502723A (zh) * 2011-10-19 2014-01-08 (株)茵匹泰克 曝光用ｌｅｄ光源模块、曝光用ｌｅｄ光源装置及曝光用ｌｅｄ光源装置管理系统
JP2014519053A (ja) * 2011-10-19 2014-08-07 インフィテック． カンパニー、 リミテッド 露光用ｌｅｄ光源モジュール、露光用ｌｅｄ光源装置及び露光用ｌｅｄ光源装置管理システム
CN105487340A (zh) * 2014-10-01 2016-04-13 豪雅冠得股份有限公司 用于周边曝光装置的光照射装置
CN105487340B (zh) * 2014-10-01 2018-03-23 豪雅冠得股份有限公司 用于周边曝光装置的光照射装置
JP2016115813A (ja) * 2014-12-15 2016-06-23 東京エレクトロン株式会社 光照射装置
KR20160110097A (ko) 2015-03-11 2016-09-21 호야 칸데오 옵트로닉스 가부시키가이샤 광 조사 장치
CN105974741A (zh) * 2015-03-11 2016-09-28 豪雅冠得股份有限公司 光照射装置

Also Published As

Publication number Publication date
KR20070066846A (ko) 2007-06-27

Similar Documents

Publication Publication Date Title
JP2007194583A (ja) 周辺露光用光源装置
US9743478B2 (en) Light intensity adjustable ultraviolet device for curing optical fiber coating
JP4495019B2 (ja) 周辺露光装置
CN101872132B (zh) 曝光装置、曝光光束照射方法及显示用面板基板制造方法
JP5861696B2 (ja) 光照射装置
TWI272622B (en) Ultraviolet irradiating device
JP2011155160A (ja) 光処理装置および光処理方法
JP2007026517A (ja) 紫外線照射装置
JPWO2008142975A1 (ja) ダイシング装置およびダイシング方法
US20080296258A1 (en) Plenum reactor system
JP2010205860A (ja) 光照射装置
US11353792B2 (en) Substrate processing apparatus
JP5408499B2 (ja) 光照射装置
JP7501177B2 (ja) 光加熱装置及び加熱処理方法
JP5355261B2 (ja) プロキシミティ露光装置、プロキシミティ露光装置の露光光形成方法、及び表示用パネル基板の製造方法
KR101591859B1 (ko) Led 광원 노광장치
JP2012215539A (ja) 太陽電池パネル用耐候試験装置
JP2009230828A (ja) 光照射装置
JP2013093107A (ja) 紫外線照射装置
KR102115460B1 (ko) 광조사 장치
JPH0523581A (ja) 紫外線照射装置
KR20140025661A (ko) 자외선 발광다이오드 램프 및 이를 이용한 주변장치
JP2017053910A (ja) 光配向装置
KR200478829Y1 (ko) 냉각 기능을 갖는 휴대용 uv 경화장치
JP5820218B2 (ja) 光照射装置、基板処理装置および光照射装置の制御方法

Legal Events

Date Code Title Description
A300 Withdrawal of application because of no request for examination

Free format text: JAPANESE INTERMEDIATE CODE: A300

Effective date: 20091006