JP2007169757A - Tool for plating treatment - Google Patents

Tool for plating treatment Download PDF

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JP2007169757A
JP2007169757A JP2005372245A JP2005372245A JP2007169757A JP 2007169757 A JP2007169757 A JP 2007169757A JP 2005372245 A JP2005372245 A JP 2005372245A JP 2005372245 A JP2005372245 A JP 2005372245A JP 2007169757 A JP2007169757 A JP 2007169757A
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plating
outer peripheral
substrate
shaft
holding
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Yasuyuki Nakanishi
保之 中西
Keiichi Oinuma
圭一 生沼
Yuji Masuyama
祐二 増山
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Resonac Holdings Corp
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Showa Denko KK
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a tool for plating treatment capable of performing the uniform electroless Ni-P plating treatment by consistently holding a large number of aluminum-made substrates for magnetic disks having the small outside diameter of ≤ 65 mm as objects for treatment. <P>SOLUTION: Four outer circumference holding shafts 3 are mounted between a pair of right and left flanges 2, 2 at an equal interval on the same circumference in a horizontally stretching manner. A holding groove 6 in which an outer circumferential edge of a substrate 10 to be treated is fitted is formed on each shaft 3. Further, one outer circumference holding shaft 3A is movably displaceable to expand a space from the adjacent shaft 3 by the movement, and to form an access port of the substrate 10. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明はめっき処理用治具、特に情報記録媒体としての磁気ディスク用のアルミニウム基板に対して、無電解Ni−Pめっき処理を施すのに用いられるめっき処理用治具に関する。   The present invention relates to a plating processing jig, and more particularly to a plating processing jig used for performing an electroless Ni-P plating process on an aluminum substrate for a magnetic disk as an information recording medium.

尚、本発明において、アルミニウムの語は、その合金を含む意味で用いるものとする。   In the present invention, the term “aluminum” is used in a sense including the alloy.

磁気ディスク基板としては、従来ガラス製の基板とアルミニウム製の基板とがあり、一般に直径が2.5インチを超える基板にあっては主にアルミニウム製の基板が用いられ、それ以下の小径サイズの基板にあっては、主にガラス製基板が用いられている。   As magnetic disk substrates, there are conventional glass substrates and aluminum substrates. Generally, substrates having a diameter of more than 2.5 inches mainly use aluminum substrates, and have a smaller diameter than that. As the substrate, a glass substrate is mainly used.

アルミニウム製基板は、素材から打抜いたサブストレートに所要の前処理を施したのち、Ni−Pめっき液浴による無電解めっき処理を施して表面にNi−P合金被膜を形成し、これを非磁性の基体として該基体上に磁性層(記録層)である強磁性の金属薄膜を積層形成している。   The substrate made of aluminum is subjected to the necessary pretreatment on the substrate punched from the material, and then subjected to electroless plating treatment with a Ni-P plating solution bath to form a Ni-P alloy coating on the surface. As a magnetic substrate, a ferromagnetic metal thin film as a magnetic layer (recording layer) is laminated on the substrate.

従来、上記のアルミニウム製基板のめっき処理は、下記特許文献1〜4に示されるようなめっき処理用治具を用いて、次のような方法で行われている。
特開平7−90596号公報 特開平7−243050号公報 特開平11−209877号公報 特開平11−335857号公報
Conventionally, the above-described plating treatment of an aluminum substrate is performed by the following method using a plating treatment jig as shown in Patent Documents 1 to 4 below.
JP-A-7-90596 Japanese Patent Laid-Open No. 7-243050 JP-A-11-209877 JP 11-335857 A

即ち、アルミニウム製基板は、中心に円形の貫通孔を有するドーナツ形のものであることから、めっき処理用治具として、図9に示すように外周面に多数個の基板保持用の環状溝(図示略)を形成した吊持用シャフト(30)を用い、これを上記貫通孔に通して多数個の基板(10)を並列状に保持するものとしている。そして、上記基板(10)を保持したシャフト(30)をカローセルと呼称される回転胴(31)の左右1対の回転盤(31a)(31a)の周縁部間に横架状に取付け、めっき処理槽(32)内に浸潰した状態で上記回転盤(31)をギヤ駆動機構(33)を介してゆっくりと回転させ、基板(30)に公自転を与えながらNi−Pめっき液を隈無く接触させるものとしている。図9中、(34)は回転駆動用モーター、(35)は回転胴(31)のハンガー装置を示す。   That is, since the aluminum substrate has a donut shape having a circular through-hole at the center, as shown in FIG. 9, a large number of annular grooves for holding the substrate ( A suspension shaft (30) having a not-shown shape is used, and this is passed through the through hole to hold a large number of substrates (10) in parallel. Then, the shaft (30) holding the substrate (10) is mounted horizontally between the peripheral portions of a pair of left and right rotating disks (31a) (31a) of a rotating drum (31) called a carousel, and plated. The said rotating disk (31) is slowly rotated via a gear drive mechanism (33) in the state immersed in the processing tank (32), and Ni-P plating solution is poured while giving rotation to the substrate (30). It is supposed to be contacted without any problems. In FIG. 9, (34) shows a rotation driving motor, and (35) shows a hanger device for the rotating drum (31).

上記のようなめっき処理用治具(30)を用いためっき処理は、被処理対象物であるアルミニウム基板(10)が、直径65mm以上の比較的大径の基板である場合には、好適に採用しうる。   Plating processing using the above-described plating processing jig (30) is preferably performed when the aluminum substrate (10) to be processed is a relatively large substrate having a diameter of 65 mm or more. Can be adopted.

ところが、近時、外径が65mm未満であるような1インチディスクや0.85インチディスク等の極めて小径の磁気ディスク用基板についても、従来のガラス製基板に代えて、コストダウンの要請からアルミニウム製基板の供給が求められるようになってきており、このような小径の基板の場合には、従来の前記のような内周吊持方式のめっき処理用治具(30)では、これを用いてめっき処理を行うことが実際上困難であった。その1つの理由は、基板自体が小径であることにより、その中心の貫通孔も小さく、これに挿通しうるような細い吊持用シャフトでは、多数個の基板の吊持荷重に耐えることができず、撓みを生じて安定的に基板を保持できないこと、また、基板が軽量のものであることにより、カローセルの回転によって起きるめっき液の流れで、基板が浮遊して吊持用シャフトの保持溝から外れる現象、つまり溝跳びを起こし易いこと等による。   However, recently, even for extremely small-diameter magnetic disk substrates such as 1-inch disks and 0.85-inch disks whose outer diameter is less than 65 mm, aluminum is used instead of conventional glass substrates because of cost reduction demands. In the case of such a small-diameter substrate, this is used in the plating jig (30) for the inner suspension method as described above. It was actually difficult to perform the plating process. One reason is that the substrate itself has a small diameter, so the center through-hole is small, and a thin suspension shaft that can be inserted through it can withstand the load of multiple substrates. Therefore, the substrate cannot be stably held due to bending, and because the substrate is lightweight, the substrate floats due to the plating solution flow caused by the rotation of the carousel, and the holding groove of the suspension shaft This is due to a phenomenon that is likely to cause a groove jump.

本発明は、上記のような従来技術の背景下において、特に直径が65mm未満であるような小径あるいは超小径のアルミニウム製基板を被処理対象物として、これに安定的に効率良くめっき処理を施すことを可能にするめっき処理用治具を提供することを目的とする。そしてまた、このようなめっき処理用治具を用いた好適なめっき処理装置および処理方法を提供することを目的とする。   In the present invention, in the background of the prior art as described above, a small or ultra-small aluminum substrate having a diameter of less than 65 mm is used as an object to be processed, and this is stably and efficiently plated. An object of the present invention is to provide a jig for plating treatment that makes it possible. It is another object of the present invention to provide a suitable plating processing apparatus and processing method using such a plating processing jig.

本発明は、上記課題に対して、被処理基板を複数本の保持用シャフトで外周側からこれを把持するようにしためっき処理用治具を提供するものであって、具体的には下記の解決手段を提示するものである。   The present invention provides a plating processing jig in which a substrate to be processed is gripped from the outer peripheral side by a plurality of holding shafts, specifically, the following problems. The solution is presented.

[1] 互いに離間して対向状に配置された左右1対のフランジと、これらの両フランジ間に、同一円周線上において所定間隔おきに横架配置された3本以上の外周保持シャフトと、少なくとも一方の前記フランジから外方に突設された支持ロッドとを備え、
前記外周保持シャフトのうち少なくとも複数本に、被処理基板の外周縁部が嵌まり込む保持溝が、軸線方向の所定間隔おきに多数個形成され、前記被処理基板を、3本以上の前記外周保持シャフトに囲まれる空間部内に、外周縁部を前記保持溝に嵌合した態様において並列状に保持しうるものとなされると共に、
少なくとも1本の外周保持シャフトが、前記両フランジに対して着脱自在または隣接する外周保持シャフトとの間の間隔を拡大しうる方向に移動変位自在に構成され、該シャフトを取外しまたは移動させることにより出し入れ口を形成して被処理基板の着脱を行い得るものとなされていることを特徴とするめっき処理用治具。
[1] A pair of left and right flanges arranged opposite to each other at a distance from each other, and three or more outer peripheral holding shafts arranged horizontally at predetermined intervals on the same circumferential line between these flanges, A support rod projecting outward from at least one of the flanges,
A plurality of holding grooves into which outer peripheral edge portions of the substrate to be processed are fitted are formed in at least a plurality of the outer peripheral holding shafts at predetermined intervals in the axial direction, and the substrate to be processed is divided into three or more of the outer periphery. In the space surrounded by the holding shaft, the outer peripheral edge portion can be held in parallel in the aspect of fitting the holding groove,
At least one outer peripheral holding shaft is configured to be detachable with respect to the both flanges, or to be movable and displaceable in a direction in which the interval between the adjacent outer peripheral holding shafts can be enlarged, and by removing or moving the shaft A plating jig characterized in that a substrate can be attached and detached by forming a loading / unloading port.

[2] 外周保持シャフトが4本である前記[1]に記載のめっき処理用治具。   [2] The plating jig according to [1], wherein the number of outer peripheral holding shafts is four.

[3] 移動変位自在な1本の前記外周保持シャフトが、左右両フランジに設けられた円弧状または直線状の長孔に沿って、周方向または半径方向と直交する方向にスライド移動可能なものとなされている前記[1]または[2]に記載のめっき処理用治具。   [3] One movable outer displacement holding shaft that is slidable in a direction perpendicular to the circumferential direction or the radial direction along arc-shaped or linear elongated holes provided in the left and right flanges The jig for plating treatment as set forth in [1] or [2].

[4] 移動変位自在な1本の前記外周保持シャフトのスライド移動機構が、外周保持シャフトの取付軸の両端をフランジの長孔を貫通して外方に延長させ、この延長軸部に常時フランジ方向に付勢された止着用スリーブをスライド自在に装着する一方、前記長孔の両端部に、フランジの外面側において径大の係止用凹陥部を形成し、この凹陥部に前記止着用スリーブの端部を嵌合係止せしめることによって、シャフトをフランジに位置決め固定しうるようになされている前記[3]に記載のめっき処理用治具。   [4] A single sliding movement mechanism of the outer peripheral holding shaft, which is movable and displaceable, extends both ends of the mounting shaft of the outer peripheral holding shaft to the outside through the long hole of the flange. A fastening sleeve biased in the direction is slidably mounted, and a locking recess having a large diameter is formed at both ends of the long hole on the outer surface side of the flange, and the fastening sleeve is formed in the recess. The plating processing jig according to [3], wherein the shaft can be positioned and fixed to the flange by fitting and locking the ends of the plating.

[5] 外周保持シャフトの長さ方向の中間部に、各シャフトと係合する係合部を有するシャフト間隔規制用の拘束板が配設されてなる前記[1]〜[4]のいずれか1項に記載のめっき処理用治具。   [5] Any one of the above [1] to [4], wherein a shaft spacing restricting plate having an engaging portion that engages with each shaft is disposed at an intermediate portion in the length direction of the outer peripheral holding shaft. The jig for plating treatment according to Item 1.

[6] 複数本の外周保持シャフトに囲まれる空間部内に、被処理基板が、半径方向及び軸線方向にいずれも遊びを有する状態に保持されるものとなされている請求項[1]〜[5]のいずれか1項に記載のめっき処理用治具。   [6] The claims [1] to [5], wherein the substrate to be processed is held in a state surrounded by a plurality of outer peripheral holding shafts so as to have play in both the radial direction and the axial direction. ] The jig for a plating process of any one of these.

[7] 外周保持シャフトの、基板方向に向いた外周面の一部のみに、前記保持溝が設けられている前記[1]〜[6]のいずれか1項に記載のめっき処理用治具。   [7] The plating processing jig according to any one of [1] to [6], wherein the holding groove is provided only in a part of the outer peripheral surface of the outer peripheral holding shaft facing the substrate. .

[8] 前記保持溝が断面U字状の溝である前記[1]〜[7]のいずれか1項に記載のめっき処理用治具。   [8] The plating jig according to any one of [1] to [7], wherein the holding groove is a groove having a U-shaped cross section.

[9] 前記左右フランジの外周面の、前記出し入れ口と反対側の位置に切欠平面部が形成され、作業台面上に該フランジを安定載置しうるものとなされている前記[1]〜[8]のいずれか1項に記載のめっき処理用治具。   [9] The [1] to [1], wherein a notch plane portion is formed on the outer peripheral surface of the left and right flanges at a position opposite to the loading / unloading port, and the flange can be stably placed on the work table surface. 8] The plating jig according to any one of [8].

[10] 前記[1]〜[9]のいずれか1項に記載のめっき処理用治具が、めっき処理槽に設けられたカローセルの左右1対の回転盤間に横架状に、かつ着脱自在に装着されてなるめっき処理装置。   [10] The plating jig according to any one of the above [1] to [9] is horizontally mounted between a pair of left and right turntables of a carousel provided in a plating tank and is attached and detached. Plating equipment that can be installed freely.

[11] 前記[10]に記載のめっき処理装置を用いて行うめっき処理方法。   [11] A plating method performed using the plating apparatus according to [10].

[12] 被処理基板が磁気ディスク用のアルミニウム基板であり、めっき処理がNi−Pめっき液浴による無電解めっき処理である前記[11]に記載のめっき処理方法。   [12] The plating method according to [11], wherein the substrate to be processed is an aluminum substrate for a magnetic disk, and the plating process is an electroless plating process using a Ni-P plating solution bath.

[13] 請求項[12]に記載のめっき処理方法を製造工程中に含む磁気ディスク用アルミニウム基板の製造方法。   [13] A method for manufacturing an aluminum substrate for a magnetic disk, comprising the plating method according to claim [12] in a manufacturing process.

[14] 前記[12]に記載のめっき処理方法でめっき処理された磁気ディスク用アルミニウム基板。   [14] An aluminum substrate for a magnetic disk plated by the plating method according to [12].

[15] 外径が65mm以下である、請求項14に記載の磁気ディスク用アルミニウム基板。   [15] The aluminum substrate for a magnetic disk according to claim 14, wherein the outer diameter is 65 mm or less.

前記発明[1]に記載のめっき処理用治具によれば、従来のめっき処理用治具では処理できなかったような小径のアルミニウム製基板に対しても、これを効率良く、安定的にめっき処理することが可能となる。また、左右のフランジの少なくとも一方から突出する支持ロッドを、従来のめっき処理用治具を用いるめっき処理装置のカローセルに対して適合性を有するものとすることにより、従来の処理装置を何ら改変することなくそのまま用いて所要の無電解Ni−Pめっき処理を施すことができ、設備上の経済的有利性を享受しうる。   According to the jig for plating treatment described in the invention [1], it can be efficiently and stably plated even on a small-diameter aluminum substrate which could not be processed by a conventional plating jig. It becomes possible to process. Further, the conventional processing apparatus is modified by making the support rod protruding from at least one of the left and right flanges compatible with the carousel of the plating processing apparatus using the conventional plating processing jig. It can be used as it is without being subjected to the required electroless Ni—P plating treatment, and can enjoy the economic advantage of the facility.

また、前記[2]の発明に係るめっき処理用治具によれば、小径の被処理基板の外周を、4本の外周保持シャフトで外周把持するので、被処理基板を安定良く保持しうるほか、隣接する外周保持シャフト間の間隔を十分に広く確保することができ、ひいては被処理基板の配設空間領域内へのめっき処理液の流れ込みが上記シャフトによって阻害されるのを回避することができ、被処理基板に対して良好なめっき処理を施しうる。   In addition, according to the jig for plating processing according to the invention of [2], since the outer periphery of the small-diameter substrate to be processed is held by the four outer peripheral holding shafts, the substrate to be processed can be stably held. The spacing between the adjacent outer peripheral holding shafts can be sufficiently widened, and as a result, the flow of the plating solution into the arrangement space region of the substrate to be processed can be prevented from being obstructed by the shaft. A good plating process can be performed on the substrate to be processed.

また、前記[3]の発明に係るめっき処理用治具によれば、該治具への被処理基板の出し入れ、着脱を、作業性良く行うことができる。   In addition, according to the plating processing jig according to the invention [3], the substrate to be processed can be taken in and out of the jig with good workability.

また、前記[4]の発明に係るめっき処理用治具によれば、上記の着脱作業性を更に向上しうる。   Moreover, according to the jig for a plating process which concerns on the invention of said [4], said attachment / detachment workability | operativity can be improved further.

また、前記[5]の発明に係るめっき処理用治具によれば、外周保持用シャフトを長さの長いものに設定して、一度に多数個の被処理基板をセッティング保持しうるようなものとした場合においても、外周保持用シャフトの相互間隔が不均整になるのを防止でき、ひいては被処理基板のすべてを安定良く保持することができる。   Also, according to the plating processing jig according to the invention of [5], the outer periphery holding shaft is set to have a long length so that a large number of substrates to be processed can be set and held at a time. Even in this case, it is possible to prevent the interval between the outer peripheral holding shafts from becoming uneven, and as a result, all of the substrates to be processed can be stably held.

また、前記[6]の発明に係るめっき処理用治具によれば、被処理用基板が、外周保持シャフトに囲まれる空間内において遊びを有する状態に保持されることにより、基板の外周縁の定位置が常時上記シャフトに接することによるめっきむらの発生を回避して、周縁部の全周に亘って均一なめっき皮膜の生成を可能とする。   Further, according to the jig for plating processing according to the invention of [6], the substrate to be processed is held in a state having play in the space surrounded by the outer periphery holding shaft, so that the outer peripheral edge of the substrate is Occurrence of plating unevenness due to the fixed position always contacting the shaft is avoided, and a uniform plating film can be generated over the entire periphery.

また、前記[7]の発明のめっき処理用治具によれば、外周保持シャフトの全周に環状の保持溝を形成する場合に較べ、全体に占める溝の容積を大幅に減少することができる。その結果、溝に溜まる処理液の保水(液)量を減少することができ、前工程の処理液のめっき処理槽への持ち込みや後工程の処理槽へのめっき液の持ち込みの量を減少し、処理液の濃度管理を容易にする。   Further, according to the plating processing jig of the above [7], the volume of the groove occupying the whole can be greatly reduced as compared with the case where the annular holding groove is formed on the entire circumference of the outer peripheral holding shaft. . As a result, the water retention (liquid) amount of the processing liquid collected in the groove can be reduced, and the amount of the processing liquid brought into the plating tank and the amount of the plating liquid brought into the processing tank in the subsequent process can be reduced. , Makes it easy to manage the concentration of the treatment liquid.

また、前記[8]の発明に係るめっき処理用治具によれば、保持溝を断面V字状あるいはコ字状等に形成したものに較べ、被処理基板の外周縁部に発生しやすいノジュールと呼ばれるNi−P合金の小突起によるめっき欠陥の発生を効果的に抑制しうる。   In addition, according to the plating processing jig according to the invention of [8], nodules that are likely to occur at the outer peripheral edge portion of the substrate to be processed are compared to those in which the holding groove is formed in a V-shaped or U-shaped cross section. It is possible to effectively suppress the occurrence of plating defects due to small protrusions of the Ni—P alloy.

また、前記[9]の発明によれば、被処理基板の出し入れ口を上向きにして、めっき処理用治具を作業台面上に安定良く載置しうるので、該治具への被処理基板の出し入れ作業を行い易く、その作業性を向上しうる。   In addition, according to the invention [9], the plating processing jig can be stably placed on the work surface with the loading / unloading port of the processing substrate facing upward, so that the processing substrate can be placed on the jig. It is easy to carry out and take out work, and the workability can be improved.

また、前記[10]の発明に係るめっき処理装置によれば、前記[1]〜[9]項の発明と同等の効果を享受しうる。   Moreover, according to the plating apparatus which concerns on the said [10] invention, the effect equivalent to the invention of said [1]-[9] item can be enjoyed.

同様に、前記[11]の発明に係るめっき処理方法によっても、前記[1]〜[9]項の発明と同等の効果を享受しうる。   Similarly, the plating treatment method according to the invention [11] can also achieve the same effects as those of the inventions [1] to [9].

また、前記[12]の発明に係るめっき処理方法によれば、小径のアルミニウム基板であっても、その全表面に均一な無電解Ni−P層を形成した磁気ディスク用のアルミニウム基板を効率よく得ることができる。   Further, according to the plating method of the invention of [12], an aluminum substrate for a magnetic disk in which a uniform electroless Ni-P layer is formed on the entire surface of a small-diameter aluminum substrate can be efficiently obtained. Obtainable.

また、前記[13]の発明によれば、品質に優れた磁気ディスク用アルミニウム基板の製造を可能とする。   In addition, according to the invention [13], it is possible to manufacture a magnetic disk aluminum substrate having excellent quality.

更にまた、前記[14]に係る磁気ディスク用アルミニウム基板は、均一なNi−Pめっき皮膜を有する高品質のものとなしうる。   Furthermore, the aluminum substrate for magnetic disks according to [14] can be a high-quality one having a uniform Ni-P plating film.

また、前記[15]の発明によれば、直径65mm以下の小径のアルミニウム基板について、高品質のものとなしうる。   According to the invention [15], a small-diameter aluminum substrate having a diameter of 65 mm or less can be made high-quality.

次に、この発明の好ましい実施形態について、図示実施例を参照して説明する。   Next, preferred embodiments of the present invention will be described with reference to the illustrated examples.

図1は、この発明に係るめっき処理用治具(1)の全体を示すものである。   FIG. 1 shows an entire plating processing jig (1) according to the present invention.

この治具(1)は、互いに離間して対向状に配置された左右に1対の円盤状のフランジ(2)(2)と、これらの両フランジ(2)(2)間に、外周縁部近くの同一円周線上において所定間隔おきに横架状に連結配置された4本の外周保持シャフト(3)と、前記両フランジ(2)(2)の各中心から、外方に同軸上に突設された左右1対の支持ロッド(4)(4)とを備える。   This jig (1) has a pair of disc-shaped flanges (2) and (2) on the left and right sides that are arranged to be opposed to each other and between the flanges (2) and (2). Coaxially outward from the centers of the four outer periphery holding shafts (3) and the two flanges (2) and (2), which are horizontally connected at predetermined intervals on the same circumferential line near the portion. And a pair of left and right support rods (4) and (4).

上記左右の両フランジ(2)(2)は、硬質合成樹脂製のものであり、外周縁部どおしがステンレス等の不錆性金属からなる複数本の連結シャフト(5)(5)で相互に一体的に連結されている。   The left and right flanges (2) and (2) are made of hard synthetic resin, and a plurality of connecting shafts (5) and (5) whose outer peripheral edge is made of a non-rusting metal such as stainless steel. They are integrally connected to each other.

外周保持シャフト(3)は、これも硬質合成樹脂製のもので、例えば直径12mmの太さを有する丸棒からなり、両端部と中央部の所定長さ領域部分を除く他の領域の全体に亘って、外周面に環状の保持溝(6)が軸線方向に所定間隔おきに多数個刻設形成されている。   The outer periphery holding shaft (3) is also made of a hard synthetic resin, and is made of, for example, a round bar having a diameter of 12 mm. A number of annular holding grooves (6) are formed on the outer peripheral surface at predetermined intervals in the axial direction.

上記保持溝(6)は、被処理基板(10)の外周縁部を嵌め込むためのものであり、図2に示すように各外周保持シャフト(3)において同じ位置に整合状態に設けられている。かつその溝形状は断面U字状のものとなされ、かつ被処理基板(10)の厚さに対して3倍を超える十分に広い溝幅を有するものとなされている。   The holding groove (6) is for fitting the outer peripheral edge of the substrate (10) to be processed, and is provided in alignment at the same position in each outer peripheral holding shaft (3) as shown in FIG. Yes. The groove shape is U-shaped in cross section and has a sufficiently wide groove width exceeding three times the thickness of the substrate to be processed (10).

そこで、被処理対象物たる小径のアルミニウム製の磁気ディスク用基板(10)は、4本の上記外周保持シャフト(3)によって囲まれるそれらの内側の空間(7)内に、外周縁部を上記保持溝(6)に嵌合した状態で、図1に領線で示すように多数個が並列状に保持されるものとなされている。アルミニウム製の磁気ディスク基板は、直径65mm以下のものが、本治具の使用に適している。   Therefore, the small-diameter aluminum magnetic disk substrate (10), which is the object to be processed, has the outer peripheral edge portion in the inner space (7) surrounded by the four outer peripheral holding shafts (3). In the state of being fitted in the holding groove (6), a large number are held in parallel as shown by the region in FIG. A magnetic disk substrate made of aluminum having a diameter of 65 mm or less is suitable for use with the jig.

この保持状態において、被処理用基板(10)は、外周保持シャフト(3)によって固定的な拘束状態に保持されるのではなく、軸線方向及び半径方向に若干の遊びを有するルーズな状態の保持されるものとなされている。つまり、4本の外周保持シャフト(3)の保持溝(6)の溝底面上の基板との当接点を結ぶ円の直径が、基板(10)の直径より僅かに大きく設定され、これによって基板(10)は半径線方向に若干の遊びを有する状態で保持されるものとなされている。上記の直径差は、例えば1mmから2mm程度に設定される。また、基板(10)は、前記のように保持溝(6)の溝幅が相対的に十分に大きいものとなされていることにより、保持溝(6)内でシャフトの軸線方向にも若干遊動可能な状態で保持されるものとなされている。   In this holding state, the substrate to be processed (10) is not held in a fixed restrained state by the outer peripheral holding shaft (3), but is held in a loose state having some play in the axial direction and the radial direction. It is supposed to be done. That is, the diameter of the circle connecting the contact points of the holding grooves (6) of the four outer peripheral holding shafts (3) with the substrate on the groove bottom surface is set slightly larger than the diameter of the substrate (10). (10) is held in a state having some play in the radial direction. The diameter difference is set to about 1 mm to 2 mm, for example. Further, the substrate (10) is slightly loose in the axial direction of the shaft within the holding groove (6) because the groove width of the holding groove (6) is relatively sufficiently large as described above. It is supposed to be held in a possible state.

被処理用基板(10)のこのような遊びを有する状態での保持は、めっき処理中にシャフト(3)に当接する基板(10)の外周縁の当接位置が常時一定であると、その部分においてめっき処理液の接触が阻害され、全面に均一なめっき処理が行われなくなる事態の発生を回避するためである。   The holding of the substrate to be processed (10) in a state having such play is that the contact position of the outer peripheral edge of the substrate (10) that contacts the shaft (3) during the plating process is always constant. This is to avoid the occurrence of a situation in which contact with the plating solution is inhibited in the portion and uniform plating is not performed on the entire surface.

上記の4本の外周保持シャフト(3)は、そのいずれもがフランジ(2)(2)に対して不動状態に固定されたものである場合には、前記空間(7)に対して被処理基板(10)の出し入れ、即ち着脱を行うことができない。このため、上記4本のシャフト(3)のうちの1本(3A)は、これを隣接する他の1本のシャフトとの間の間隔を拡大しうる方向に移動変位させることができるものとなされている。この移動変位可能な1本のシャフト(3A)は、その両端の取付軸が、左右両フランジ(2)(2)に形成された、半径方向と直交する方向の直線状の長孔(8)に貫通されており、この長孔(8)の長さ範囲内でスライド移動させ得るものとなされている。そして、当該長孔(8)の一端側の基板保持位置で、上記取付軸をフランジ(2)の外面側から固定ねじ(9)で固定しうるものとなされている。   When all of the four outer peripheral holding shafts (3) are fixed to the flanges (2) and (2) in a stationary state, the space (7) is treated. The substrate (10) cannot be taken in and out, that is, cannot be attached or detached. For this reason, one (3A) of the four shafts (3) can be moved and displaced in a direction in which the interval between the other adjacent shafts can be enlarged. Has been made. This single shaft (3A) that can be moved and displaced has a straight elongated hole (8) in which the mounting shafts at both ends are formed in the left and right flanges (2) and (2) in a direction perpendicular to the radial direction. And is slidable within the length range of the long hole (8). The mounting shaft can be fixed with a fixing screw (9) from the outer surface side of the flange (2) at the substrate holding position on one end side of the long hole (8).

従って、治具(1)への基板(10)の出し入れに際しては、図3の(イ)に示す定常の基板保持位置から上記固定ねじ(9)を緩めて図3の(ロ)に示すように、シャフト(3A)を長孔(8)の他端側の退避位置に移動し、これによって隣接する他のシャフト(3)との間に大きく開放された出し入れ口(11)を形成して前記空間部(7)への基板(10)の出し入れを行いうるものとなされている。   Therefore, when the substrate (10) is put in and out of the jig (1), the fixing screw (9) is loosened from the steady substrate holding position shown in FIG. In addition, the shaft (3A) is moved to the retracted position on the other end side of the long hole (8), thereby forming a large opening / closing port (11) with the other adjacent shaft (3). The substrate (10) can be taken in and out of the space (7).

4本の外周保持シャフト(3)は、前記空間部(7)内に総数50〜80枚程度の多数の被処理基板(10)を収容保持しうるものとなされ、それ故に全長300mmを超える長さを有するものとなされる。一方、該外周保持シャフト(3)は前述のように直径12mm程度の比較的細いもので構成される。このため、多数の基板(10)を収容保持した状態では、その重量によって上記外周保持シャフト(3)に撓みを生じるおそれがある。そしてこれに撓みを生じると基板(10)の保持力が部分的に不安定なものとなり、一部の基板(10)がシャフト(3)から外れて脱落してしまうおそれがある。   The four outer peripheral holding shafts (3) can accommodate and hold a large number of substrates to be processed (10) of about 50 to 80 in the space portion (7), and therefore have a length exceeding 300 mm in total length. It is supposed to have On the other hand, the outer peripheral holding shaft (3) is constituted by a relatively thin one having a diameter of about 12 mm as described above. For this reason, in the state which accommodated and hold | maintained many board | substrates (10), there exists a possibility that the said outer periphery holding shaft (3) may bend by the weight. If this occurs, the holding force of the substrate (10) becomes partially unstable, and a part of the substrate (10) may come off the shaft (3) and fall off.

このような問題点に対処するため、本発明に係るめっき処理用治具(1)においては、外周保持シャフト(3)の長さ方向の中間部に、1ないし複数個のシャフト間隔規制用の拘束板(12)を配置したものとしている。   In order to cope with such a problem, in the plating jig (1) according to the present invention, one or a plurality of shaft spacing regulating members are provided in the middle portion in the length direction of the outer peripheral holding shaft (3). The restraint plate (12) is arranged.

図示実施例における当該拘束板(12)は、硬質合成樹脂製の円板状のものであり、外周保持シャフト(3)の長さ方向の中央部に1個だけ組付けられている。該拘束板(12)は、図4に示すように外周縁に前記外周保持シャフト(3)の配置に対応して、周方向に等間隔に4個の切欠円形、つまり入口側が狭く奥部が広くなったΩの切欠係合部(13)を有し、これにそれぞれ前記シャフト(3)の中央部が緊密に嵌合され、各シャフト(3)の相互関係位置を拘束して相互間隔を一定に保ち得るものとなされている。但し、1本の前記可動の外周保持シャフト(3A)に対応する切欠係合部(13)は、該シャフト(3A)の横移動を阻害しないように図4に示すように水平方向の切欠部(13a)に連続したものとなされている。   The constraining plate (12) in the illustrated embodiment is a hard synthetic resin disc-like member, and only one is attached to the central portion in the length direction of the outer peripheral holding shaft (3). As shown in FIG. 4, the constraining plate (12) has four notch circles at equal intervals in the circumferential direction corresponding to the arrangement of the outer peripheral holding shaft (3) on the outer peripheral edge, that is, the inlet side is narrow and the inner part is narrow. It has a wide notch engaging portion (13) of Ω, and the center portion of the shaft (3) is tightly fitted to each of them, and the mutual position of each shaft (3) is constrained so that the mutual distance is reduced. It can be kept constant. However, the notch engaging portion (13) corresponding to one movable outer peripheral holding shaft (3A) has a horizontal notch as shown in FIG. 4 so as not to hinder the lateral movement of the shaft (3A). (13a).

また、左右1対の前記フランジ(2)(2)は、その円盤状の外周面の一部に、図1及び図3に示すように直線状の切欠平面部(14)が形成されている。この切欠平面部(14)は、前記の可動の1本の外周保持シャフト(3A)を移動させることによって形成される前記出し入れ口(11)と反対側の位置に設けられたものである。従って、図3の(ロ)に示すようにこの切欠平面部(14)を下向きにして作業台面(T)上に治具(1)を載置した場合、フランジ(2)の不本意な転動を防いで常時上記出し入れ口(11)を上向きの状態に安定良く保持し、被処理基板(10)の組込み及び取出しを安易に行いうるものとなされている。   Further, the pair of left and right flanges (2) and (2) are formed with a linear notch plane part (14) as shown in FIG. 1 and FIG. . The notched flat portion (14) is provided at a position opposite to the loading / unloading port (11) formed by moving the movable single outer peripheral holding shaft (3A). Therefore, when the jig (1) is placed on the work table surface (T) with the notch plane portion (14) facing downward as shown in FIG. It prevents movement and always holds the loading / unloading port (11) stably in an upward state so that the substrate (10) to be processed can be easily assembled and removed.

更にまた、図1に示すように、左右フランジ(2)(2)から突設された支持ロッド(4)(4)は、その各先端の取付部(16)を、図5に示すようにカローセル(31)回転盤(31a)(31a)に設けられた治具取付用のC形軸受部材(31b)に嵌合状態に担持せしめることにより、めっき処理用治具(1)を両回転盤(31a)(31a)間に着脱可能に横架取付けしうるものとなされている。   Furthermore, as shown in FIG. 1, the support rods (4) and (4) projecting from the left and right flanges (2) and (2) have attachment portions (16) at their respective ends as shown in FIG. The plating processing jig (1) is mounted on the rotary disk by holding the carousel (31) and the C-shaped bearing member (31b) for mounting the jig on the rotating disk (31a) (31a) in a fitted state. (31a) It can be detachably mounted horizontally between (31a).

上記構成のめっき処理用治具(1)を用いて、小径の磁気ディスク用の基板(10)に無電解Ni−Pめっき処理を施すに際しては、一般的には50〜75枚程度の多数枚の被処理基板(10)を前述のように治具(1)に並列状態に収納配列したのち、このめっき処理治具(1)を、図5に示すようにめっき処理装置の1対の大型回転盤(31a)(31a)間に横架状に多数個取付ける。   When the electroless Ni-P plating process is applied to the small-diameter magnetic disk substrate (10) using the plating jig (1) having the above-described configuration, a large number of approximately 50 to 75 sheets is generally used. After the substrate (10) to be processed is accommodated and arranged in parallel with the jig (1) as described above, the plating processing jig (1) is used as a pair of large-size plating processing apparatuses as shown in FIG. A large number of horizontal plates are mounted between the rotating disks (31a) and (31a).

そして、図9に示すように、めっき処理槽(32)内のめっき液中にカローセル(31)の全体を浸漬した状態で、回転駆動機構(33)によりゆっくりと回転させる。これにより、被処理基板(10)は、めっき液浴中で回転盤(31a)の回転中心まわりに公転しながら、4本の外周保持シャフト(3)間で若干の遊動を繰返し、両面の全体にめっき液が万遍なく接触され、所要の均一なNi−Pめっき皮膜が施される。   And as shown in FIG. 9, it rotates slowly by the rotational drive mechanism (33) in the state which immersed the whole carousel (31) in the plating solution in a plating processing tank (32). As a result, the substrate to be treated (10) repetitively moves slightly between the four outer peripheral holding shafts (3) while revolving around the rotation center of the turntable (31a) in the plating solution bath, and the entire surface of both surfaces The plating solution is uniformly contacted with the desired Ni-P plating film.

以上、この発明の好ましい1つの実施形態について説明したが、本発明はこれに限定されるものではなく、発明の要旨を逸脱しない範囲で種々の変更が許容される。   As mentioned above, although one preferred embodiment of this invention was described, this invention is not limited to this, A various change is accept | permitted in the range which does not deviate from the summary of invention.

先ず、外周保持シャフト(3)の本数に関し、これは4本に限らず、要は基板(10)を外周側から把持してその保持を可能とするものであればよいから、3本以上の設置でも実施可能である。ただ、基板(10)の安定保持のためには、4本の設置で必要かつ十分であり、最も好ましい。5本以上に設定すると、治具の製造コストの増大による不利益に加えて、基板保持空間部内へのめっき液の円滑な流入の妨げになるおそれが生じるからである。   First, regarding the number of outer peripheral holding shafts (3), this is not limited to four. In short, it is sufficient that the substrate (10) is gripped from the outer peripheral side and can be held. Installation is also possible. However, in order to stably hold the substrate (10), four installations are necessary and sufficient, and are most preferable. This is because if it is set to 5 or more, in addition to the disadvantage caused by the increase in the manufacturing cost of the jig, there is a possibility that the smooth inflow of the plating solution into the substrate holding space portion may be hindered.

また、外周保持シャフト(3)に形成する保持溝(6)は、必ずしもこれをすべての保持シャフトに設けることを必要としない。しかしながら、基板(10)を安定的に保持するためには、少なくとも複数本の外周保持シャフト(3)は保持溝(6)を有するものとすべきである。   Further, the holding groove (6) formed in the outer peripheral holding shaft (3) does not necessarily need to be provided in all holding shafts. However, in order to stably hold the substrate (10), at least the plurality of outer peripheral holding shafts (3) should have holding grooves (6).

また、この保持溝(6)は、シャフト(3)の全周に亘って環状形態のものとすることを必ずしも必要としない。外周保持シャフト(3)は、保持空間(7)に面する内方に向いた周面の一部で基板(10)を保持するものであるから、図6に示すように、この内方向きの部分だけに、即ち基板方向に向いた外周面の一部だけに保持溝(6a)を形成したものとしても良い。この場合、保持溝(6a)の総容積が減少する分だけ、該保持溝(6a)による保水(液)量を減少し、処理槽からの処理液の持ち出しおよび持ち込みの量を減らすことができる利点を期待できる。   Further, the holding groove (6) does not necessarily need to have an annular shape over the entire circumference of the shaft (3). Since the outer peripheral holding shaft (3) holds the substrate (10) with a part of the inner peripheral surface facing the holding space (7), as shown in FIG. The holding groove (6a) may be formed only in this part, that is, only in a part of the outer peripheral surface facing the substrate direction. In this case, the amount of water retained (liquid) by the holding groove (6a) can be reduced by the amount by which the total volume of the holding groove (6a) is reduced, and the amount of processing liquid taken out and brought from the processing tank can be reduced. Benefits can be expected.

既存のめっき処理装置の種類によっては、カローセル(31)の回転盤(31a)が1個だけで、めっき処理用治具(1)をカンチレバー態様に片持ち支持して取付けるようになされたものがある。このようなめっき処理装置に適用するめっき処理用治具の場合には、支持ロッド(4)を一方のフランジ(2)側にのみ設けたものとしても良い。   Depending on the type of existing plating apparatus, there is only one carousel (31) rotating plate (31a), and the plating jig (1) cantilevered in a cantilever manner. is there. In the case of a plating processing jig applied to such a plating processing apparatus, the support rod (4) may be provided only on one flange (2) side.

更にまた、基板(10)の出し入れ口(11)を形成するための可動の1本の外周保持シャフト(3A)は、これをフランジ(2)から一時的に取外し可能なものとし、これを取外すことによって上記出し入れ口(11)を開放しうるようなものとしても良い。   Furthermore, the movable outer peripheral holding shaft (3A) for forming the inlet / outlet (11) for the substrate (10) is temporarily removable from the flange (2), and is removed. It is good also as what can open the said entrance / exit (11) by this.

また、上記可動の外周保持シャフトをスライド移動させるための長孔(8)は、これをフランジ(2)の周方向に長い円弧状のものに形成しても良い。   The long hole (8) for sliding the movable outer peripheral holding shaft may be formed in an arc shape that is long in the circumferential direction of the flange (2).

更には、そのスライド移動操作をより簡便に行いうるように図7および図8に示すようなスライド移動機構(18)を採用しても良い。この機構(18)は外周保持シャフト(3)の取付軸の両端をフランジ(2)の長孔(8)を貫通して外方に延長させ、この延長軸部(3a)にばね(19)によって常時フランジ(2)方向に付勢された止着用スリーブ(20)をスライド自在に装着する一方、前記長孔(8)の両端部に、フランジ(2)の外面側において径大の係止用凹陥部(8a)を形成し、この凹陥部(8a)に前記止着用カラー部材(20)の端部を嵌合係止めせしめることによって、シャフト(3)をフランジ(2)に位置決め固定しうるようになされたものである。このスライド移動機構(18)による場合、基板(10)脱着を行うに際して、止着用スリーブ(20)をばね(19)に抗して外方にスライドさせ、係止用凹陥部(8a)との係合を解くことで外周保持シャフト(3)を長孔(8)に沿って移動させることができる。従って、シャフト(3)の基板保持位置と、出し入れ口(11)をつくる退避位置との間での移動操作をより簡単に行うことができ作業性が良い。   Furthermore, a slide moving mechanism (18) as shown in FIGS. 7 and 8 may be adopted so that the slide moving operation can be performed more easily. In this mechanism (18), both ends of the mounting shaft of the outer peripheral holding shaft (3) are extended outwardly through the long hole (8) of the flange (2), and a spring (19) is attached to the extended shaft portion (3a). The fastening sleeve (20) constantly urged in the direction of the flange (2) is slidably mounted on the both ends of the long hole (8), and the outer diameter side of the flange (2) is engaged with the large diameter. The shaft (3) is positioned and fixed to the flange (2) by forming a concave portion (8a) for use and fitting and locking the end of the fastening collar member (20) to the concave portion (8a). It was made to be able to. In the case of this slide movement mechanism (18), when the substrate (10) is attached / detached, the fastening sleeve (20) is slid outwardly against the spring (19), so that the locking recess (8a) By releasing the engagement, the outer peripheral holding shaft (3) can be moved along the long hole (8). Therefore, the operation of moving between the substrate holding position of the shaft (3) and the retracted position for creating the loading / unloading port (11) can be performed more easily, and the workability is good.

本発明に係るめっき処理用治具の全体形状を示す斜視図である。It is a perspective view showing the whole shape of the jig for plating processing concerning the present invention. 外周保持シャフトに囲まれる基板保持空間部を示す一部破砕正面図である。It is a partially broken front view which shows the board | substrate holding | maintenance space part enclosed by an outer periphery holding shaft. 図1のIII−III線の矢視断面図であり、図(イ)は可動の外周保持シャフトを基板保持位置に設置した状態を、図(ロ)は同シャフトを出し入れ口を開放する退避位置に移動したときの状態をそれぞれ示すものである。FIG. 3 is a cross-sectional view taken along the line III-III in FIG. 1, where FIG. (A) shows a state where a movable outer periphery holding shaft is installed at a substrate holding position, and FIG. The state when moving to is shown respectively. 図1のIV−IV線の矢視断面図である。FIG. 4 is a cross-sectional view taken along line IV-IV in FIG. 1. 本発明に係るめっき処理用治具をカローセルに装着した状態を示す斜視図である。It is a perspective view which shows the state which mounted | wore the carousel with the jig for plating processing which concerns on this invention. 外周保持シャフトの保持溝の変形例を示す図3対応部分の断面図である。It is sectional drawing of the part corresponding to FIG. 3 which shows the modification of the holding groove of an outer periphery holding shaft. 可動の外周保持シャフトのスライド移動機構の変形例を示す要部斜視図である。It is a principal part perspective view which shows the modification of the slide movement mechanism of a movable outer periphery holding shaft. 図7のVIII−VIII線の断面図である。It is sectional drawing of the VIII-VIII line of FIG. 従来のめっき処理用治具を装着しためっき処理装置の説明図である。It is explanatory drawing of the metal-plating processing apparatus equipped with the conventional jig for metal-plating processing.

符号の説明Explanation of symbols

1・・・・めっき処理用治具
2・・・・フランジ
3・・・・外周保持シャフト
3A・・・移動自在な外周保持シャフト
4・・・・支持ロッド
6・・・・保持溝
7・・・・基板保持用の空間部
8・・・・長孔
10・・・被処理基板
11・・・出し入れ口
12・・・拘束板
13・・・係合部
14・・・平担面
16・・・先端の取付部
18・・・スライド移動機構
19・・・ばね
20・・・止着用スリーブ
30・・・従来のめっき処理用治具
31・・・カローセル(回転胴)
31a・・回転盤
32・・・めっき処理槽
33・・・回転駆動機構
DESCRIPTION OF SYMBOLS 1 .... Jig for plating processing 2 .... Flange 3 .... Peripheral holding shaft 3A ... Movable outer peripheral holding shaft 4 .... Support rod 6 .... Holding groove 7. ··· Space for holding substrate 8 ··· Long hole 10 ··· Substrate to be processed 11 ··· In / out port 12 · · · Restricting plate 13 · · · Engaging portion 14 · · · Flat surface 16 ... Mounting part 18 at the tip 18 ... Slide movement mechanism 19 ... Spring 20 ... Fitting sleeve 30 ... Conventional plating jig 31 ... Carousel (rotary drum)
31a ... rotating plate 32 ... plating tank 33 ... rotation drive mechanism

Claims (15)

互いに離間して対向状に配置された左右1対のフランジと、これらの両フランジ間に、同一円周線上において所定間隔おきに横架配置された3本以上の外周保持シャフトと、少なくとも一方の前記フランジから外方に突設された支持ロッドとを備え、
前記外周保持シャフトのうち少なくとも複数本に、被処理基板の外周縁部が嵌まり込む保持溝が、軸線方向の所定間隔おきに多数個形成され、前記被処理基板を、3本以上の前記外周保持シャフトに囲まれる空間部内に、外周縁部を前記保持溝に嵌合した態様において並列状に保持しうるものとなされると共に、
少なくとも1本の外周保持シャフトが、前記両フランジに対して着脱自在または隣接する外周保持シャフトとの間の間隔を拡大しうる方向に移動変位自在に構成され、該シャフトを取外しまたは移動させることにより出し入れ口を形成して被処理基板の着脱を行い得るものとなされていることを特徴とするめっき処理用治具。
A pair of left and right flanges that are spaced apart from each other, three or more outer peripheral holding shafts that are horizontally disposed at predetermined intervals on the same circumferential line, and at least one of the flanges. A support rod projecting outward from the flange,
A plurality of holding grooves into which outer peripheral edge portions of the substrate to be processed are fitted are formed in at least a plurality of the outer peripheral holding shafts at predetermined intervals in the axial direction, and the substrate to be processed is divided into three or more of the outer periphery. In the space surrounded by the holding shaft, the outer peripheral edge portion can be held in parallel in the aspect of fitting the holding groove,
At least one outer peripheral holding shaft is configured to be detachable with respect to the both flanges, or to be movable and displaceable in a direction in which the interval between the adjacent outer peripheral holding shafts can be enlarged, and by removing or moving the shaft A plating jig characterized in that a substrate can be attached and detached by forming a loading / unloading port.
外周保持シャフトが4本である請求項1に記載のめっき処理用治具。   The jig for plating treatment according to claim 1, wherein the number of outer peripheral holding shafts is four. 移動変位自在な1本の前記外周保持シャフトが、左右両フランジに設けられた円弧状または直線状の長孔に沿って、周方向または半径方向と直交する方向にスライド移動可能なものとなされている請求項1または2に記載のめっき処理用治具。   The one outer periphery holding shaft that is movable and displaceable is slidable in a direction perpendicular to the circumferential direction or the radial direction along arcuate or straight elongated holes provided in the left and right flanges. The jig for plating treatment according to claim 1 or 2. 移動変位自在な1本の前記外周保持シャフトのスライド移動機構が、外周保持シャフトの取付軸の両端をフランジの長孔を貫通して外方に延長させ、この延長軸部に常時フランジ方向に付勢された止着用スリーブをスライド自在に装着する一方、前記長孔の両端部に、フランジの外面側において径大の係止用凹陥部を形成し、この凹陥部に前記止着用スリーブの端部を嵌合係止せしめることによって、シャフトをフランジに位置決め固定しうるようになされている請求項3に記載のめっき処理用治具。   One sliding movement mechanism of the outer peripheral holding shaft that can be moved and displaced extends both ends of the mounting shaft of the outer peripheral holding shaft outwardly through the long hole of the flange, and this extended shaft portion is always attached in the flange direction. While the slidable mounting sleeve is slidably mounted, a locking recess having a large diameter is formed at both ends of the long hole on the outer surface side of the flange, and the end of the locking sleeve is formed in the recess. The jig for plating processing according to claim 3, wherein the shaft can be positioned and fixed to the flange by fitting and locking. 外周保持シャフトの長さ方向の中間部に、各シャフトと係合する係合部を有するシャフト間隔規制用の拘束板が配設されてなる請求項1〜4のいずれか1項に記載のめっき処理用治具。   The plating according to any one of claims 1 to 4, wherein a constraining plate for regulating a shaft interval having an engaging portion that engages with each shaft is disposed at an intermediate portion in the length direction of the outer peripheral holding shaft. Processing jig. 複数本の外周保持シャフトに囲まれる空間部内に、被処理基板が、半径方向及び軸線方向にいずれも遊びを有する状態に保持されるものとなされている請求項1〜5のいずれか1項に記載のめっき処理用治具。   In any one of Claims 1-5 by which the to-be-processed board | substrate is hold | maintained in the state which has a play in a radial direction and an axial direction in the space part enclosed by several outer periphery holding shafts. The jig for plating treatment as described. 外周保持シャフトの、基板方向に向いた外周面の一部のみに、前記保持溝が設けられている請求項1〜6のいずれか1項に記載のめっき処理用治具。   The plating processing jig according to any one of claims 1 to 6, wherein the holding groove is provided only on a part of the outer peripheral surface of the outer peripheral holding shaft facing the substrate. 前記保持溝が断面U字状の溝である請求項1〜7のいずれか1項に記載のめっき処理用治具。   The jig for plating processing according to any one of claims 1 to 7, wherein the holding groove is a groove having a U-shaped cross section. 前記左右フランジの外周面の、前記出し入れ口と反対側の位置に切欠平面部が形成され、作業台面上に該フランジを安定載置しうるものとなされている請求項1〜8のいずれか1項に記載のめっき処理用治具。   The cutout plane part is formed in the outer peripheral surface of the said right-and-left flange on the opposite side to the said entrance / exit, and this flange can be stably mounted on a work-table surface. The plating treatment jig according to Item. 請求項1〜9のいずれか1項に記載のめっき処理用治具が、めっき処理槽に設けられたカローセルの左右1対の回転盤間に横架状に、かつ着脱自在に装着されてなるめっき処理装置。   The plating jig according to any one of claims 1 to 9 is mounted horizontally and detachably between a pair of left and right turntables of a carousel provided in a plating tank. Plating equipment. 請求項10に記載のめっき処理装置を用いて行うめっき処理方法。   The plating processing method performed using the plating processing apparatus of Claim 10. 被処理基板が磁気ディスク用のアルミニウム基板であり、めっき処理がNi−Pめっき液浴による無電解めっき処理である請求項11に記載のめっき処理方法。   The plating method according to claim 11, wherein the substrate to be processed is an aluminum substrate for a magnetic disk, and the plating process is an electroless plating process using a Ni—P plating solution bath. 請求項12に記載のめっき処理方法を製造工程中に含む磁気ディスク用アルミニウム基板の製造方法。   The manufacturing method of the aluminum substrate for magnetic discs which contains the plating processing method of Claim 12 in a manufacturing process. 請求項12に記載のめっき処理方法でめっき処理された磁気ディスク用アルミニウム基板。   An aluminum substrate for a magnetic disk plated by the plating method according to claim 12. 外径が65mm以下である、請求項14に記載の磁気ディスク用アルミニウム基板。   The aluminum substrate for magnetic disks according to claim 14, wherein the outer diameter is 65 mm or less.
JP2005372245A 2005-12-26 2005-12-26 Tool for plating treatment Pending JP2007169757A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2018083914A1 (en) * 2016-11-07 2019-09-19 鋼鈑工業株式会社 Plating processing jig and plating processing apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2018083914A1 (en) * 2016-11-07 2019-09-19 鋼鈑工業株式会社 Plating processing jig and plating processing apparatus
JP7034083B2 (en) 2016-11-07 2022-03-11 鋼鈑工業株式会社 Plating jig and plating equipment

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