JP2007169427A - Optical semiconductor-encapsulating composition, its manufacturing process and optical semiconductor-encapsulating agent - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an optical semiconductor-encapsulating composition giving an optical semiconductor-encapsulating agent which is used for potting, colorless, transparent, durable and not liable to crack for solder reflow and heat cycle. <P>SOLUTION: The optical semiconductor-encapsulating composition contains (A) a polyorganosiloxane having an epoxy group with an epoxy equivalent of 150-600 g/mole, a glass transition temperature of -80°C-150°C and a polystyrene-converted weight average molecular weight of 500-1,000,000 and (B) a polyorganosiloxane having an epoxy group with an epoxy equivalent of over 600 g/mole and not more than 1,600 g/mole, a glass transition temperature of not higher than -50°C and a polystyrene-converted weight average molecular weight of 500-1,000,000. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to an optical semiconductor sealing composition, a method for producing the same, an optical semiconductor sealing material, and an optical semiconductor.

Conventionally, as an optical semiconductor sealing resin, an epoxy compound mainly composed of bisphenol A glycidyl ether has been generally used. Since such an epoxy compound has an aromatic ring, an optical semiconductor that emits blue or ultraviolet light. In order to perform sealing, durability against ultraviolet rays (UV durability) was insufficient.
In order to improve the UV durability of the optical semiconductor sealing resin, it has been proposed to use an alicyclic epoxy compound (see Patent Document 1), but the UV durability is still not sufficient. It was.
On the other hand, it is known that a resin having a siloxane skeleton is excellent in weather resistance, and in recent years, studies using a resin having polydimethylsiloxane as a main skeleton as an optical semiconductor sealing material have been extensively conducted. However, in the case of this resin, the hardness of the cured product is insufficient and it has tackiness, so dust is easily attached, gold wires used for wiring are cut by vibration, and adhesion to the substrate is insufficient. It has been pointed out that it is easy to peel off.

In order to increase the hardness and adhesion of the cured product, silsesquioxane resins have been proposed as siloxane-based materials that are hard and have high adhesion, and in particular, silsesquioxane resins having an epoxy group were used. An optical semiconductor sealing material is disclosed in Patent Document 2. However, in order to potting the silsesquioxane resin disclosed in Patent Document 2, gelation occurs when the solvent is distilled off, and molding becomes difficult, and cracks and bubbles are generated when the film thickness is increased. Therefore, it could not be put into practical use as an optical semiconductor sealing material. As a method for producing an epoxy group-containing polyorganosiloxane, a method is known in which an epoxy derivative having a vinyl group is added to a polyorganosiloxane having a Si—H bond using a platinum, rhodium or ruthenium catalyst (patent). Document 3, Patent Document 4, Patent Document 5, Patent Document 6, Patent Document 7, and Patent Document 8). However, the polyorganosiloxane having Si-H has a problem that it is unstable with respect to moisture, is difficult to handle, and is expensive. There is also a problem that coloring occurs when the catalyst remains.
In addition, the optical semiconductor sealing element needs to withstand solder reflow and a heat cycle of −40 ° C. to 100 ° C. However, if the mechanical properties of the sealing resin are weak, there is a problem that the optical output is reduced due to cracks. is there.
JP 2003-82062 A Japanese Patent Laid-Open No. 62-106632 JP-A-1-297421 Japanese Patent Laid-Open No. 2-0667290 JP-A-4-252228 JP-A-4-352793 JP-A-8-041168 JP 2000-103859 A

The present invention has been made in view of the above circumstances, and its problem is that it can be potted, is colorless and transparent, has excellent durability, and is less likely to cause cracks in solder reflow and heat cycle. It is in providing the optical semiconductor sealed with the composition for optical semiconductor sealing which can form, its manufacturing method, the said optical semiconductor sealing material, and the said optical semiconductor sealing material.
Other objects and advantages of the present invention will become apparent from the following description.

According to the present invention, the above objects and advantages of the present invention are as follows.
(A) Polyorganosiloxane having an epoxy group with a polystyrene-converted weight average molecular weight of 500 to 1,000,000 having an epoxy equivalent of 150 to 600 g / mol and a glass transition temperature of -80 ° C to 150 ° C, and (B) Contains a polyorganosiloxane having an epoxy group with a weight average molecular weight in terms of polystyrene of 500 to 1,000,000 having an epoxy equivalent of more than 600 g / mole and 1,600 g / mole or less and a glass transition temperature of -50 ° C. or less It is achieved by a composition for encapsulating an optical semiconductor characterized in that:

According to the present invention, the above objects and advantages of the present invention are secondly,
(A) Polyorganosiloxane having an epoxy group with a polystyrene-converted weight average molecular weight of 500 to 1,000,000 having an epoxy equivalent of 150 to 600 g / mol and a glass transition temperature of -80 ° C to 150 ° C, and (B) Mixing a polyorganosiloxane having an epoxy group having a weight average molecular weight in terms of polystyrene of 500 to 1,000,000 having an epoxy equivalent of more than 600 g / mole and not more than 1600 g / mole and a glass transition temperature of not more than −50 ° C. It is achieved by a method for producing a composition for encapsulating an optical semiconductor characterized by:

According to the present invention, the above objects and advantages of the present invention are thirdly,
This is achieved by an optical semiconductor sealing material comprising a cured product obtained by heat-curing the above-mentioned optical semiconductor sealing composition of the present invention.

Further, according to the present invention, the above-mentioned objects and advantages of the present invention are as follows.
This is achieved by an optical semiconductor encapsulated with the above optical semiconductor encapsulant of the present invention.

  The composition for optical semiconductor sealing of the present invention can improve cracks and peeling caused by solder reflow and heat cycle tests, and can provide an optical semiconductor sealing material that is colorless and transparent and excellent in UV durability. For example, it can be used very suitably for sealing a blue LED or a white LED having a light emission peak wavelength in a region of 500 nm or less.

  Hereinafter, the present invention will be described in detail.

Polyorganosiloxane and production method thereof The polyorganosiloxane (A) and (B) of the present invention is a silane compound represented by the following formula (1) (hereinafter referred to as “silane compound (1)”) and / or the silane compound. Partial condensate (hereinafter, the silane compound (1) and the partial condensate are collectively referred to as “silane compound (1)”) and a silane compound represented by the following formula (2) (hereinafter, “silane compound ( 2) "and / or a partial condensate thereof (hereinafter, the silane compound (2) and the partial condensate thereof are collectively referred to as" silane compound (2) etc. "), an organic solvent, an organic base, and It is a polyorganosiloxane obtained by heating in the presence of water to cause hydrolysis and condensation.

[In the formula (1), X represents a monovalent organic group having one or more epoxy groups, Y ¹ is a chlorine atom, a bromine atom, an iodine atom, or a linear, branched or cyclic group having 1 to 20 carbon atoms. R ¹ represents a hydrogen atom, a fluorine atom, a linear, branched or cyclic alkyl group having 1 to 20 carbon atoms, a linear, branched or cyclic substituted alkyl group having 1 to 20 carbon atoms. Group, a C2-C20 linear, branched or cyclic alkenyl group, a C6-C20 aryl group or a C7-C20 aralkyl group, n is an integer of 0-2. ]

[In the formula (2), Y ² represents a chlorine atom, a bromine atom, an iodine atom or a linear, branched or cyclic alkoxyl group having 1 to 20 carbon atoms, and R ² represents a hydrogen atom, a fluorine atom or a carbon number. 1-20 linear, branched or cyclic alkyl groups, 1-20 carbon linear, branched or cyclic substituted alkyl groups, 2-20 linear, branched or cyclic alkyl groups An alkenyl group, an aryl group having 6 to 20 carbon atoms or an aralkyl group having 7 to 20 carbon atoms is shown, and m is an integer of 0 to 3. ]
In the formula (1), the monovalent organic group having one or more epoxy groups of X is not particularly limited, but is preferably a hydrocarbon group having an epoxy group, such as γ-glycidoxypropyl. Group, 3,4-epoxycyclopentyl group, 3,4-epoxycyclohexyl group, (3,4-epoxycyclopentyl) methyl group, (3,4-epoxycyclohexyl) methyl group, 2- (3,4-epoxycyclopentyl) Ethyl group, 2- (3,4-epoxycyclohexyl) ethyl group, 2- (3,4-epoxycyclopentyl) propyl group, 2- (3,4-epoxycyclohexyl) propyl group, 3- (3,4-epoxy) Carbon having 5 to 20 carbon atoms such as cyclopentyl) propyl group and 3- (3,4-epoxycyclohexyl) propyl group It can be mentioned hydrogen group.
Among the monovalent organic groups having one or more of these epoxy groups, the above monovalent organic groups including γ-glycidoxypropyl group, 2- (3,4-epoxycyclohexyl) ethyl group, and epoxycyclohexyl group are A 2- (3,4-epoxycyclohexyl) ethyl group is particularly preferable.

In Formula (1), Y ¹ represents a chlorine atom, a bromine atom, an iodine atom, or a linear, branched or cyclic alkoxyl group having 1 to 20 carbon atoms. These groups generate a silanol group in the process of hydrolysis / condensation reaction in the presence of an organic base and water, and cause a condensation reaction between the silanol groups, or the silanol group and chlorine atom, bromine atom, iodine It is a group that forms a siloxane bond by causing a condensation reaction with an atom or a silicon atom having the alkoxyl group.
In the formula (1), examples of the linear, branched or cyclic alkoxyl group having 1 to 20 carbon atoms of Y ¹ include, for example, methoxy group, ethoxy group, n-propoxy group, i-propoxy group, n-butoxy Group, i-butoxy group, sec-butoxy group, t-butoxy group, n-pentyloxy group, n-hexyloxy group, cyclopentyloxy group, cyclohexyloxy group and the like.
Y ¹ in Formula (1) is preferably a chlorine atom, a methoxy group, an ethoxy group, or the like.

In the formula (1), examples of the linear, branched or cyclic alkyl group having 1 to 20 carbon atoms of R ¹ include a methyl group, an ethyl group, an n-propyl group, an i-propyl group, and an n-butyl group. Group, i-butyl group, sec-butyl group, t-butyl group, n-pentyl group, n-hexyl group, cyclopentyl group, cyclohexyl group and the like.

Examples of the linear, branched or cyclic substituted alkyl group having 1 to 20 carbon atoms for R ¹ include, for example:
Fluoromethyl group, trifluoromethyl group, 2-fluoroethyl group, (trifluoromethyl) methyl group, pentafluoroethyl group, 3-fluoro-n-propyl group, 2- (trifluoromethyl) ethyl group, (pentafluoro Ethyl) methyl group, heptafluoro-n-propyl group, 4-fluoro-n-butyl group, 3- (trifluoromethyl) -n-propyl group, 2- (pentafluoroethyl) ethyl group, (heptafluoro-n) -Propyl) methyl group, nonafluoro-n-butyl group, 5-fluoro-n-pentyl group, 4- (trifluoromethyl) -n-butyl group, 3- (pentafluoroethyl) -n-propyl group, 2- (Heptafluoro-n-propyl) ethyl group, (nonafluoro-n-butyl) methyl group, perfluoro-n-pentyl group, 6- Fluoro-n-hexyl group, 5- (trifluoromethyl) -n-pentyl group, 4- (pentafluoroethyl) -n-butyl group, 3- (heptafluoro-n-propyl) -n-propyl group, 2 -(Nonafluoro-n-butyl) ethyl group, (perfluoro-n-pentyl) methyl group, perfluoro-n-hexyl group, 7- (trifluoromethyl) -n-heptyl group, 6- (pentafluoroethyl) -N-hexyl group, 5- (heptafluoro-n-propyl) -n-pentyl group, 4- (nonafluoro-n-butyl) -n-butyl group, 3- (perfluoro-n-pentyl) -n- Propyl group, 2- (perfluoro-n-hexyl) ethyl group, (perfluoro-n-heptyl) methyl group, perfluoro-n-octyl group, 9- (trifluoromethyl)- -Nonyl group, 8- (pentafluoroethyl) -n-octyl group, 7- (heptafluoro-n-propyl) -n-heptyl group, 6- (nonafluoro-n-butyl) -n-hexyl group, 5- (Perfluoro-n-pentyl) -n-pentyl group, 4- (perfluoro-n-hexyl) -n-butyl group, 3- (perfluoro-n-heptyl) -n-propyl group, 2- (per A fluoroalkyl group such as a fluoro-n-octyl) ethyl group, a (perfluoro-n-nonyl) methyl group, a perfluoro-n-decyl group, a 4-fluorocyclopentyl group, and a 4-fluorocyclohexyl group;
Chloromethyl group, 2-chloroethyl group, 3-chloro-n-propyl group, 4-chloro-n-butyl group, 3-chlorocyclopentyl group, 4-chlorocyclohexyl group, hydroxymethyl group, 2-hydroxyethyl group, 3 -Hydroxycyclopentyl group, 4-hydroxycyclohexyl group; 3- (meth) acryloxypropyl group, 3-mercaptopropyl group and the like can be mentioned.

Examples of the linear, branched or cyclic alkenyl group having 2 to 20 carbon atoms for R ¹ include a vinyl group, 1-methylvinyl group, 1-propenyl group, allyl group (2-propenyl group), Examples include 2-methyl-2-propenyl group, 1-butenyl group, 2-butenyl group, 3-butenyl group, 3-cyclopentenyl group, 3-cyclohexenyl group and the like.
Examples of the aryl group having 6 to 20 carbon atoms of R ¹ include a phenyl group, o-tolyl group, m-tolyl group, p-tolyl group, 2,3-xylyl group, 2,4-xylyl group, Examples include 2,5-xylyl group, 2,6-xylyl group, 3,4-xylyl group, 3,5-xylyl group, 1-naphthyl group, and the like.
As the aralkyl group having 7 to 20 carbon atoms of R ^1, examples thereof include a benzyl group, a phenethyl group.
R ¹ in formula (1) is preferably a methyl group, an ethyl group, or the like.

As a specific example of the silane compound (1),
As compounds of n = 0, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropyltriethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 2- (3,4-epoxy Cyclohexyl) ethyltriethoxysilane and the like;
As compounds of n = 1, (γ-glycidoxypropyl) (methyl) dimethoxysilane, (γ-glycidoxypropyl) (ethyl) dimethoxysilane, (γ-glycidoxypropyl) (methyl) diethoxysilane, (Γ-glycidoxypropyl) (ethyl) diethoxysilane, [2- (3,4-epoxycyclohexyl) ethyl] (methyl) dimethoxysilane, [2- (3,4-epoxycyclohexyl) ethyl] (ethyl) Dimethoxysilane, [2- (3,4-epoxycyclohexyl) ethyl] (methyl) diethoxysilane, [2- (3,4-epoxycyclohexyl) ethyl] (ethyl) diethoxysilane, and the like;
As compounds of n = 2, (γ-glycidoxypropyl) (methoxy) dimethylsilane, (γ-glycidoxypropyl) (methoxy) diethylsilane, (γ-glycidoxypropyl) (ethoxy) dimethylsilane, ( γ-glycidoxypropyl) (ethoxy) diethylsilane, [2- (3,4-epoxycyclohexyl) ethyl] (methoxy) dimethylsilane, [2- (3,4-epoxycyclohexyl) ethyl] (methoxy) diethylsilane , [2- (3,4-epoxycyclohexyl) ethyl] (ethoxy) dimethylsilane, [2- (3,4-epoxycyclohexyl) ethyl] (ethoxy) diethylsilane, and the like.

Examples of the partial condensate of the silane compound (1) include trade names such as ES1001N, ES1002T, ES1023 (manufactured by Shin-Etsu Silicone Co., Ltd.); methyl silicate MSEP2 (manufactured by Mitsubishi Chemical Corporation), and the like. be able to.
In this invention, a silane compound (1) and its partial condensate can be used individually or in mixture of 2 or more types, respectively.

In the formula (2), Y ² represents a chlorine atom, a bromine atom, an iodine atom or a straight, branched or cyclic alkoxyl groups. These groups generate a silanol group in the process of hydrolysis / condensation reaction in the presence of an organic base and water, and cause a condensation reaction between the silanol groups, or the silanol group and chlorine atom, bromine atom, iodine It is a group that forms a siloxane bond by causing a condensation reaction with an atom or a silicon atom having the alkoxyl group.
In the formula (2), examples of the linear, branched or cyclic alkoxyl group having 1 to 20 carbon atoms of Y ² are the same as those exemplified for the corresponding group of Y ¹ in the formula (1). Groups and the like.
As Y ² in the formula (2), for example, a chlorine atom, a methoxy group, an ethoxy group, an n-propoxy group, an i-propoxy group, an n-butoxy group, a sec-butoxy group, a t-butoxy group and the like are preferable.

In the formula (2), linear carbon atoms R ² 20, branched or cyclic alkyl group, a linear, branched or cyclic substituted alkyl group having 1 to 20 carbon atoms, 2 carbon atoms Examples of the linear, branched or cyclic alkenyl group having 20 carbon atoms, the aryl group having 6 to 20 carbon atoms, and the aralkyl group having 7 to 20 carbon atoms include groups corresponding to R ¹ in the formula (1), respectively. Examples thereof include the same groups as those exemplified.
Examples of R ² in the formula (2) include a fluorine atom, a methyl group, an ethyl group, a 2- (trifluoromethyl) ethyl group, a 2- (perfluoro-n-hexyl) ethyl group, and 2- (perfluoro-n). -Octyl) ethyl group, hydroxymethyl group, 2-hydroxyethyl group, 3- (meth) acryloxypropyl group, 3-mercaptopropyl group, vinyl group, allyl group, phenyl group and the like are preferable.

As a specific example of the silane compound (2),
As compounds of m = 0, tetrachlorosilane, tetramethoxysilane, tetraethoxysilane, tetra-n-propoxysilane, tetra-i-propoxysilane, tetra-n-butoxysilane, tetra-sec-butoxysilane and the like;
As compounds of m = 1, trichlorosilane, trimethoxysilane, triethoxysilane, tri-n-propoxysilane, tri-i-propoxysilane, tri-n-butoxysilane, tri-sec-butoxysilane,
Fluorotrichlorosilane, fluorotrimethoxysilane, fluorotriethoxysilane, fluorotri-n-propoxysilane, fluorotri-i-propoxysilane, fluorotri-n-butoxysilane, fluorotri-sec-butoxysilane,
Methyltrichlorosilane, methyltrimethoxysilane, methyltriethoxysilane, methyltri-n-propoxysilane, methyltri-i-propoxysilane, methyltri-n-butoxysilane, methyltri-sec-butoxysilane, 2- (trifluoromethyl) ethyl Trichlorosilane, 2- (trifluoromethyl) ethyltrimethoxysilane, 2- (trifluoromethyl) ethyltriethoxysilane, 2- (trifluoromethyl) ethyltri-n-propoxysilane, 2- (trifluoromethyl) ethyltri -I-propoxysilane, 2- (trifluoromethyl) ethyltri-n-butoxysilane, 2- (trifluoromethyl) ethyltri-sec-butoxysilane,
2- (perfluoro-n-hexyl) ethyltrichlorosilane, 2- (perfluoro-n-hexyl) ethyltrimethoxysilane, 2- (perfluoro-n-hexyl) ethyltriethoxysilane, 2- (perfluoro- n-hexyl) ethyltri-n-propoxysilane, 2- (perfluoro-n-hexyl) ethyltri-i-propoxysilane, 2- (perfluoro-n-hexyl) ethyltri-n-butoxysilane, 2- (perfluoro -N-hexyl) ethyltri-sec-butoxysilane, 2- (perfluoro-n-octyl) ethyltrichlorosilane, 2- (perfluoro-n-octyl) ethyltrimethoxysilane, 2- (perfluoro-n-octyl) ) Ethyltriethoxysilane, 2- (perfluoro-n-octyl) ethyl Tri-n-propoxysilane, 2- (perfluoro-n-octyl) ethyltri-i-propoxysilane, 2- (perfluoro-n-octyl) ethyltri-n-butoxysilane, 2- (perfluoro-n-octyl) ) Ethyltri-sec-butoxysilane,
Hydroxymethyltrichlorosilane, hydroxymethyltrimethoxysilane, hydroxyethyltrimethoxysilane, hydroxymethyltri-n-propoxysilane, hydroxymethyltri-i-propoxysilane, hydroxymethyltri-n-butoxysilane, hydroxymethyltri-sec- Butoxysilane, 3- (meth) acryloxypropyltrichlorosilane, 3- (meth) acryloxypropyltrimethoxysilane, 3- (meth) acryloxypropyltriethoxysilane, 3- (meth) acryloxypropyltri-n- Propoxysilane, 3- (meth) acryloxypropyltri-i-propoxysilane, 3- (meth) acryloxypropyltri-n-butoxysilane, 3- (meth) acryloxypropyltri-sec-butoxy Silane,
3-mercaptopropyltrichlorosilane, 3-mercaptopropyltrimethoxysilane, 3-mercaptopropyltriethoxysilane, 3-mercaptopropyltri-n-propoxysilane, 3-mercaptopropyltri-i-propoxysilane, 3-mercaptopropyltri -N-butoxysilane, 3-mercaptopropyltri-sec-butoxysilane,
Vinyltrichlorosilane, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltri-n-propoxysilane, vinyltri-i-propoxysilane, vinyltri-n-butoxysilane, vinyltri-sec-butoxysilane,
Allyltrichlorosilane, allyltrimethoxysilane, allyltriethoxysilane, allyltri-n-propoxysilane, allyltri-i-propoxysilane, allyltri-n-butoxysilane, allyltri-sec-butoxysilane,
Phenyltrichlorosilane, phenyltrimethoxysilane, phenyltriethoxysilane, phenyltri-n-propoxysilane, phenyltri-i-propoxysilane, phenyltri-n-butoxysilane, phenyltri-sec-butoxysilane, etc .:

As compounds of m = 2, methyldichlorosilane, methyldimethoxysilane, methyldiethoxysilane, methyldi-n-propoxysilane, methyldi-i-propoxysilane, methyldi-n-butoxysilane, methyldi-sec-butoxysilane,
Dimethyldichlorosilane, dimethyldimethoxysilane, dimethyldiethoxysilane, dimethyldi-n-propoxysilane, dimethyldi-i-propoxysilane, dimethyldi-n-butoxysilane, dimethyldi-sec-butoxysilane,
(Methyl) [2- (perfluoroon-n-octyl) ethyl] dichlorosilane, (methyl) [2- (perfluoroon-n-octyl) ethyl] dimethoxysilane, (methyl) [2- (perfluoroon-n-octyl) ethyl Diemethoxysilane, (methyl) [2- (perfluoro-n-octyl) ethyl] di-n-propoxysilane, (methyl) [2- (perfluoro-n-octyl) ethyl] di-i-propoxysilane, ( Methyl) [2- (perfluoro-n-octyl) ethyl] di-n-butoxysilane, (methyl) [2- (perfluoro-n-octyl) ethyl] di-sec-butoxysilane,
(Methyl) (γ-glycidoxypropyl) dichlorosilane, (methyl) (γ-glycidoxypropyl) dimethoxysilane, (methyl) (γ-glycidoxypropyl) diethoxysilane, (methyl) (γ-glycyl Sidoxypropyl) di-n-propoxysilane, (methyl) (γ-glycidoxypropyl) di-i-propoxysilane, (methyl) (γ-glycidoxypropyl) di-n-butoxysilane, (methyl) (Γ-glycidoxypropyl) di-sec-butoxysilane,
(Methyl) (3-mercaptopropyl) dichlorosilane, (methyl) (3-mercaptopropyl) dimethoxysilane, (methyl) (3-mercaptopropyl) diethoxysilane, (methyl) (3-mercaptopropyl) di-n- Propoxysilane, (methyl) (3-mercaptopropyl) di-i-propoxysilane, (methyl) (3-mercaptopropyl) di-n-butoxysilane, (methyl) (3-mercaptopropyl) di-sec-butoxysilane ,
(Methyl) (vinyl) dichlorosilane, (methyl) (vinyl) dimethoxysilane, (methyl) (vinyl) diethoxysilane, (methyl) (vinyl) di-n-propoxysilane, (methyl) (vinyl) di-i -Propoxysilane, (methyl) (vinyl) di-n-butoxysilane, (methyl) (vinyl) di-sec-butoxysilane,
Divinyldichlorosilane, divinyldimethoxysilane, divinyldiethoxysilane, divinyldi-n-propoxysilane, divinyldi-i-propoxysilane, divinyldi-n-butoxysilane, divinyldi-sec-butoxysilane,
Diphenyldichlorosilane, diphenyldimethoxysilane, diphenyldiethoxysilane, diphenyldi-n-propoxysilane, diphenyldi-i-propoxysilane, diphenyldi-n-butoxysilane, diphenyldi-sec-butoxysilane and the like;

As compounds of m = 3, chlorodimethylsilane, methoxydimethylsilane, ethoxydimethylsilane, chlorotrimethylsilane, bromotrimethylsilane, iodotrimethylsilane, methoxytrimethylsilane, ethoxytrimethylsilane, n-propoxytrimethylsilane, i-propoxytrimethylsilane N-butoxytrimethylsilane, sec-butoxytrimethylsilane, t-butoxytrimethylsilane,
(Chloro) (vinyl) dimethylsilane, (methoxy) (vinyl) dimethylsilane, (ethoxy) (vinyl) dimethylsilane,
(Chloro) (methyl) diphenylsilane, (methoxy) (methyl) diphenylsilane, (ethoxy) (methyl) diphenylsilane and the like can be exemplified.

  Among these silane compounds (2), tetramethoxysilane, tetraethoxysilane, methyltrimethoxysilane, methyltriethoxysilane, 3- (meth) acryloxypropyltrimethoxysilane, 3- (meth) acryloxypropyltriethoxy Silane, vinyltrimethoxysilane, vinyltriethoxysilane, allyltrimethoxysilane, allyltriethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, dimethyldimethoxysilane, dimethyldiethoxysilane and the like are preferable.

  Moreover, as a partial condensate of a silane compound (2), it is a brand name, for example, KC-89, KC-89S, X-21-3153, X-21-5841, X-21-5842, X-21- 5843, X-21-5844, X-21-5845, X-21-5845, X-21-5847, X-21-5848, X-22-160AS, X-22-170B, X-22-170BX, X-22-170D, X-22-170DX, X-22-176B, X-22-176D, X-22-176DX, X-22-176F, X-40-2308, X-40-2651, X- 40-2655A, X-40-2671, X-40-2672, X-40-9220, X-40-9225, X-40-9227, X-40-9246, X-40-9247, X-4 -9250, X-40-9323, X-41-1053, X-41-1056, X-41-1805, X-41-1810, KF6001, KF6002, KF6003, KR212, KR-213, KR-217, KR220L , KR242A, KR271, KR282, KR300, KR311, KR401N, KR500, KR510, KR5206, KR5230, KR5235, KR9218, KR9706 (manufactured by Shin-Etsu Silicone Co., Ltd.); Glass Resin (made by Showa Denko KK); SH805, SH806A, SH840, SR2400, SR2402, SR2405, SR2406, SR2410, SR2411, SR2416, SR2420 (above, manufactured by Toray Dow Corning Silicone Co., Ltd.); FZ37 1, FZ3722 (manufactured by Nippon Unicar Co., Ltd.); DMS-S12, DMS-S15, DMS-S21, DMS-S27, DMS-S31, DMS-S32, DMS-S33, DMS-S35, DMS-S38, DMS-S42, DMS-S45, DMS-S51, DMS-227, PSD-0332, PDS-1615, PDS-9931, XMS-5025 (above, manufactured by Chisso Corporation); methyl silicate MS51, methyl silicate MS56 (above Ethyl silicate 28, ethyl silicate 40, ethyl silicate 48 (above, Colcoat Co., Ltd.); GR100, GR650, GR908, GR950 (above, Showa Denko Co., Ltd.), etc. be able to.

In this invention, a silane compound (2) and its partial condensate can be used individually or in mixture of 2 or more types, respectively.
The polyorganosiloxanes (A) and (B) are obtained by heating and hydrolyzing and condensing the silane compound (1) and the silane compound (2) in the presence of an organic solvent, an organic base and water. It is preferable to manufacture.
As the organic solvent, for example, hydrocarbons, ketones, esters, ethers, alcohols and the like can be used.

  Examples of the hydrocarbon include toluene and xylene; Examples of the ketone include methyl ethyl ketone, methyl isobutyl ketone, methyl n-amyl ketone, diethyl ketone, and cyclohexanone; Examples of the ester include ethyl acetate and n-acetate. Butyl, i-amyl acetate, propylene glycol monomethyl ether acetate, 3-methoxybutyl acetate, ethyl lactate and the like; Examples of the ether include ethylene glycol dimethyl ether, ethylene glycol diethyl ether, tetrahydrofuran, dioxane and the like; Examples of the alcohol include 1-hexanol, 4-methyl-2-pentanol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono n- propyl ether, ethylene glycol monobutyl -n- butyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono -n- propyl ether may be mentioned, respectively. Of these, water-insoluble ones are preferred. These organic solvents can be used alone or in admixture of two or more.

The amount of the organic solvent used is preferably 50 to 10,000 parts by weight, more preferably 100 to 5,000 parts by weight with respect to 100 parts by weight of the total silane compounds.
Examples of the organic base include primary and secondary organic amines such as ethylamine and diethylamine; tertiary organic amines such as triethylamine, tri-n-propylamine, tri-n-butylamine, pyridine and 4-dimethylaminopyridine; A quaternary organic amine such as methylammonium hydroxide can be used.
Among these organic bases, tertiary organic amines such as triethylamine, tri-n-propylamine, tri-n-butylamine, pyridine and 4-dimethylaminopyridine; quaternary organic amines such as tetramethylammonium hydroxide preferable.

When producing polyorganosiloxanes (A) and (B), by using an organic base as a catalyst, the desired polysiloxane can be produced at a high hydrolysis / condensation rate without causing side reactions such as ring opening of epoxy groups. Since an organosiloxane can be obtained, a composition having good production stability and good curability can be obtained.
The amount of organic amine used varies depending on the reaction conditions such as the type of organic amine and temperature, and is not particularly limited, but is preferably 0.01 to 3 moles, more preferably 0.05 to the total amount of the silane compound. 1 mole. In addition, the amount used in the case of using an organic base other than the organic amine is also sufficient in an amount almost equivalent to the organic amine.

The amount of water used in producing the polyorganosiloxane is preferably 0.5 to 100 times mol, more preferably 1 to 30 times mol, with respect to the total silane compound.
The hydrolysis / condensation reaction in producing the polyorganosiloxane is performed by dissolving the silane compound (1) and the like and the silane compound (2) and the like in an organic solvent, and mixing the solution with an organic base and water. It can be carried out by heating in a bath or the like.

During the hydrolysis / condensation reaction, it is desirable to heat at a heating temperature of 130 ° C. or lower, preferably 40 to 120 ° C. for about 0.5 to 12 hours, preferably about 1 to 8 hours. During the heating operation, the mixed solution may be stirred or left under reflux.
After completion of the reaction, the organic solvent layer is separated from the reaction solution and usually washed with water. In this cleaning, the cleaning operation is facilitated by cleaning with water containing a small amount of salt, for example, an aqueous ammonium nitrate solution of about 0.2% by weight. Washing is performed until the water after washing becomes neutral, and then the organic solvent layer is dried with a desiccant such as anhydrous calcium sulfate or molecular sieves if necessary, and then concentrated to obtain the desired polyorganosiloxane. Can be obtained.

  Since the polyorganosiloxane thus obtained has few remaining hydrolyzable groups such as alkoxyl groups and silanol groups, the polyorganosiloxane can be stored without gelation at room temperature for one month or more without being diluted with a solvent. Further, if desired, after the reaction is completed, the remaining silanol group is converted to hexamethyldisilazane, trimethylchlorosilane, t-butyldimethylchlorosilane, N, O-bis (trimethylsilyl) acetamide, bis (trimethylsilyl) trifluoroacetamide, N- (trimethylsilyl). Silanol groups can be further reduced by trimethylsilylation with acetamide, (N, N-dimethylamino) trimethylsilane, (diethylamino) trimethylsilane, N- (trimethylsilyl) imidazole, trimethylsilyldiphenylurea, bis (trimethylsilyl) urea, etc. it can. Of these, hexamethyldisilazane, trimethylchlorosilane, and bis (trimethylsilyl) trifluoroacetamide are preferable. The remaining silanol may be esterified with ethyl orthoformate.

When the silanol group is trimethylsilylated, the peel resistance to the lead frame is improved. It is considered that the curing shrinkage between silanols can be suppressed and the water absorption rate decreases.
Further, the hydrolysis / condensation reaction in the presence of an organic base and water has an advantage that side reactions such as a ring-opening reaction and a polymerization reaction of an epoxy group in the silane compound (1) and the like do not occur.
The polyorganosiloxane has a polystyrene-equivalent weight average molecular weight (hereinafter referred to as “Mw”) of 500 to 1,000,000, preferably 1,000 to 100,000.

It is preferable that the epoxy equivalent of (A) component polyorganosiloxane is 150-600 g / mol, and glass transition temperature is -80 degreeC-150 degreeC. The (B) component polyorganosiloxane preferably has an epoxy amount of more than 600 g / mole and 1,600 g / mole or less and a glass transition temperature of -50 ° C. or less.
The glass transition temperature can be measured by DSC at a heating rate of 20 ° C./min.
The ratio of the component (A) to the component (B) is preferably 5 to 120 parts by weight, more preferably 10 to 100 parts by weight with respect to 100 parts by weight of the component (A). If the component (B) is less than 5 parts by weight, cracks and peeling are likely to occur in solder reflow and heat cycle tests, and if it exceeds 120 parts by weight, the cured resin may be too soft and cause tackiness.

  The polyorganosiloxanes (A) and (B) can be used very suitably as the main component in each composition for optical semiconductor sealing described later, and can be a die bond adhesive, alone or mixed with a general polyorganosiloxane. For example, it is useful as a molded product, a film, a laminate material, a paint, and the like.

-(C) Carboxylic anhydride or polyvalent carboxylic acid-
The composition for optical semiconductor encapsulation may contain (C) a carboxylic acid anhydride or a polyvalent carboxylic acid. The component (C) is a component (curing agent) that causes a curing reaction with the polyorganosiloxane (A).
The (C) carboxylic acid anhydride or polyvalent carboxylic acid is not particularly limited, but an alicyclic carboxylic acid anhydride is preferable.
Examples of the alicyclic carboxylic acid anhydride include compounds represented by the following formulas (3) to (13).

Diels-Alder of alicyclic compounds with conjugated double bonds such as 4-methyltetrahydrophthalic anhydride, methyl nadic anhydride, dodecenyl succinic anhydride, α-terpinene, allocymene and maleic anhydride Reaction products and hydrogenated products thereof can be exemplified. In addition, arbitrary structural isomers and arbitrary geometric isomers can be used as the Diels-Alder reaction product and hydrogenated products thereof.
Moreover, the compound represented by Formula (14) can also be used as a hardening | curing agent.

Specific examples of the compound represented by formula (14) include compounds represented by formulas (15) to (19).

In addition, the alicyclic carboxylic acid anhydride can be used after being appropriately chemically modified as long as the curing reaction is not substantially hindered.
Among these alicyclic carboxylic acid anhydrides, from the viewpoint of fluidity and transparency of the composition, the formula (3), formula (5), formula (7), formula (8) or formula (9), formula A compound represented by (14) is preferred. Particularly preferred are compounds represented by formula (3), formula (5), formula (7), and formula (14).

In this invention, an alicyclic carboxylic acid anhydride can be used individually or in mixture of 2 or more types.
Moreover, in the composition for optical semiconductor sealing, 1 or more types of aliphatic carboxylic acid anhydrides and aromatic carboxylic acid anhydrides can also be used as (C) carboxylic acid anhydride. These are preferably used in combination with an alicyclic carboxylic acid anhydride.
The aliphatic carboxylic acid anhydride and the aromatic carboxylic acid anhydride can also be appropriately chemically modified as long as the curing reaction is not substantially hindered.
The total use ratio of the aliphatic carboxylic acid anhydride and the aromatic carboxylic acid anhydride is preferably 50% by weight or less, more preferably 30% by weight or less, based on the total amount with the alicyclic carboxylic acid anhydride. .

In the composition for optical semiconductor encapsulation, the amount of (C) carboxylic acid anhydride or polyvalent carboxylic acid used is carboxylic acid anhydride groups per 1 mol of epoxy groups in the polyorganosiloxane of components (A) and (B). Or as an equivalent ratio of a carboxyl group, Preferably it is 0.3-1.5, More preferably, it is 0.5-1.3. In this case, even if the amount ratio is less than 0.3 or more than 1.5, there is a possibility that inconveniences such as a decrease in the glass transition point (Tg) and coloring of the obtained cured product may occur.
Furthermore, in the composition for optical semiconductor sealing, in addition to (C) carboxylic acid anhydride or polyvalent carboxylic acid, it is known as a curing agent for epoxy compounds and epoxy resins within the range not impairing the intended effect of the present invention. These components (hereinafter referred to as “other curing agents”), for example, phenols, dicyandiamides, organic hydrazides such as adipic hydrazide, phthalic hydrazide, and the like can be used in combination.
The use ratio of the other curing agent is preferably 50% by weight or less, more preferably 30% by weight or less based on (C) the carboxylic acid anhydride or the polyvalent carboxylic acid anhydride.

The optical semiconductor composition of the present invention may contain a curing accelerator for the purpose of increasing the curing rate. Such a curing accelerator is not particularly limited, for example,
Tertiary amines such as benzyldimethylamine, 2,4,6-tris (dimethylaminomethyl) phenol, cyclohexyldimethylamine, triethanolamine;
2-methylimidazole, 2-n-heptylimidazole, 2-n-undecylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 1-benzyl-2-methylimidazole, 1-benzyl-2-phenyl Imidazole, 1,2-dimethylimidazole, 2-ethyl-4-methylimidazole, 1- (2-cyanoethyl) -2-methylimidazole, 1- (2-cyanoethyl) -2-n-undecylimidazole, 1- ( 2-cyanoethyl) -2-phenylimidazole, 1- (2-cyanoethyl) -2-ethyl-4-methylimidazole, 2-phenyl-4-methyl-5-hydroxymethylimidazole, 2-phenyl-4,5-di (Hydroxymethyl) imidazole, 1- (2-cyanoethyl) -2-fur Nyl-4,5-di [(2′-cyanoethoxy) methyl] imidazole, 1- (2-cyanoethyl) -2-n-undecylimidazolium trimellitate, 1- (2-cyanoethyl) -2-phenyl Imidazolium trimellitate, 1- (2-cyanoethyl) -2-ethyl-4-methylimidazolium trimellitate, 2,4-diamino-6- [2'-methylimidazolyl- (1 ')] ethyl-s -Triazine, 2,4-diamino-6- (2'-n-undecylimidazolyl) ethyl-s-triazine, 2,4-diamino-6- [2'-ethyl-4'-methylimidazolyl- (1 ' )] Ethyl-s-triazine, isocyanuric acid adduct of 2-methylimidazole, isocyanuric acid adduct of 2-phenylimidazole, 2,4-diamino-6- [2′-methyl] Imidazolyl - (1 ')] such imidazoles of isocyanuric acid adduct of ethyl -s- triazine;
Organophosphorus compounds such as diphenylphosphine, triphenylphosphine, triphenyl phosphite;
Benzyltriphenylphosphonium chloride, tetra-n-butylphosphonium bromide, methyltriphenylphosphonium bromide, ethyltriphenylphosphonium bromide, n-butyltriphenylphosphonium bromide, tetraphenylphosphonium bromide Ethyltriphenylphosphonium iodide, ethyltriphenylphosphonium acetate, tetrabutylphosphonium acetate, tetra-n-butylphosphonium o, o-diethylphosphorodithionate, methyltributylphosphonium dimethyl fos Fate, tetra-n-butylphosphonium benzotriazolate, tetra-n-butylphosphonium tetrafluoroborate, tetra-n-butyl Phosphonium tetraphenyl borate, tetraphenyl phosphonium tetraphenyl borate, triphenyl benzyl phosphonium tetraphenylborate, quaternary phosphonium salts such as tetra -n- butyl phosphonium tetrafluoroborate;
Diazabicycloalkenes such as 1,8-diazabicyclo [5.4.0] undecene-7 and organic acid salts thereof;
Organometallic compounds such as zinc octylate, tin octylate, aluminum acetylacetone complex;
Tetraethylammonium bromide, tetra-n-butylammonium bromide, the following formula (20)

A quaternary ammonium salt such as
Boron compounds such as boron trifluoride and triphenyl borate; metal halides such as zinc chloride and stannic chloride,
High melting point dispersion type latent curing accelerators such as amine addition type accelerators such as dicyandiamide and adducts of amine and epoxy resin; surfaces of curing accelerators such as imidazoles, organophosphorus compounds and quaternary phosphonium salts Microcapsule-type latent curing accelerator coated with polymer; amine salt-type latent curing accelerator; high-temperature dissociation type thermal cationic polymerization type latent curing accelerator such as Lewis acid salt and Bronsted acid salt Can be mentioned.

Of these curing accelerators, imidazoles, quaternary phosphonium salts, diazabicycloalkenes, organometallic compounds, and quaternary ammonium salts are colorless and transparent, and a cured product that is difficult to discolor even when heated for a long time is obtained. This is preferable.
The said hardening accelerator can be used individually or in mixture of 2 or more types.
In the composition for optical semiconductor encapsulation, the use amount of the curing accelerator is preferably 0 to 6 parts by weight, more preferably 0 to 4 parts per 100 parts by weight of the polyorganosiloxane of the components (A) and (B). Parts by weight. When the usage-amount of a hardening accelerator exceeds 6 weight part, there exists a possibility of producing inconveniences, such as coloring, in the hardened | cured material obtained.

-Other additives-
The composition for optical semiconductor encapsulation of the present invention can be blended with inorganic oxide particles as necessary for the purpose of improving UV durability, adjusting viscosity, and the like.
The inorganic oxide particles are not particularly limited, but include, for example, at least one element selected from the group consisting of Si, Al, Zr, Ti, Zn, Ge, In, Sn, Sb, and Ce. And more specifically, silica, alumina, zirconia, titanium oxide, zinc oxide, germanium oxide, indium oxide, tin oxide, indium-tin oxide (ITO), and antimony oxide. And particles such as antimony-tin oxide (ATO) and cerium oxide.

Of these inorganic oxide particles, fine particles such as silica, alumina, zirconia, and antimony oxide are preferable.
The inorganic oxide particles can also be used after appropriate surface treatment such as alkylation, polysiloxylation, (meth) acryloxyalkylation, glycoxyalkylation, aminoalkylation and the like.
The said inorganic oxide particle can be used individually or in mixture of 2 or more types.

Further, if necessary, one or more kinds of dispersants such as an anionic surfactant, a cationic surfactant, a nonionic surfactant, and a polymer dispersant can be used in combination with the inorganic oxide particles.
The primary average particle diameter of the inorganic oxide particles is preferably 100 nm or less, more preferably 1 to 80 nm. In this case, when the primary average particle diameter of the inorganic oxide particles exceeds 100 nm, the transparency of the resulting cured product may be impaired.
The amount of the inorganic oxide particles to be used is preferably 90 parts by weight or less, more preferably 80 parts by weight or less with respect to 100 parts by weight of the polyorganosiloxane of the components (A) and (B). When the usage-amount of inorganic oxide particle exceeds 90 weight part, there exists a possibility that a composition may thicken and processing may become difficult.
In some cases, the inorganic oxide particles can be used as a dispersion dispersed in an appropriate solvent.

The solvent is not particularly limited as long as it is inactive with respect to each component constituting the composition for optical semiconductor encapsulation of the present invention and a curing reaction and has an appropriate volatility.
Alcohols such as methanol, ethanol, i-propanol, n-butanol, n-octanol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, diethylene glycol mono-n-butyl ether, propyl glycol monomethyl ether, propyl glycol monoethyl ether;
Ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone;
Esters or lactones such as ethyl acetate, n-butyl acetate, ethyl lactate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, γ-butyrolactone;
Aromatic hydrocarbons such as benzene, toluene, xylene;
Examples thereof include amides such as dimethylformamide, dimethylacetamide, N-methylpyrrolidone, lactams, and the like.

These solvents can be used alone or in admixture of two or more.
The solid content concentration of the dispersion of inorganic oxide particles is preferably 1 to 60% by weight, more preferably 5 to 50% by weight.
Inorganic oxide particles and dispersions thereof are commercially available, and these commercially available products can also be used.

As a commercial item (trade name) of inorganic oxide particles and dispersions thereof, for example, as silica particle dispersions, methanol silica sol, IPA-ST, MEK-ST, NBA-ST, XBA-ST, DMAC-ST, ST-UP, ST-OUP, ST-C, ST-N, ST-O, ST-OL, ST-20, ST-40, ST-50 (above, manufactured by Nissan Chemical Industries, Ltd.); Organosol PL- 2PGME (propylene glycol monomethyl ether dispersion, manufactured by Fuso Chemical Industry Co., Ltd.), etc. as silica particles, Aerosil 130, Aerosil 300, Aerosil 380, Aerosil TT600, Aerosil OX50 (above, Nippon Aerosil Co., Ltd.); Sil Dex H31, Sildex H32, Sildex H51, Sildex H52, Sildex H121 Sildex H122 (manufactured by Asahi Glass Co., Ltd.); E220A, E220 (manufactured by Nippon Silica Industry Co., Ltd.); SYLYSIA470 (manufactured by Fuji Silysia Co., Ltd.), SG flake (manufactured by Nippon Sheet Glass Co., Ltd.), etc. As alumina particle dispersions, alumina sol-100, alumina sol-200, alumina sol-520 (all of which are aqueous dispersions, manufactured by Nissan Chemical Industries, Ltd.); AS-1501 (i-propanol dispersion, Sumitomo Osaka Cement) AS-150T (toluene dispersion, manufactured by Sumitomo Osaka Cement Co., Ltd.), etc., as a zirconia particle dispersion, HXU-110JC (toluene dispersion, manufactured by Sumitomo Osaka Cement Co., Ltd.), etc. As a dispersion of zinc antimonate particles, Celnax (aqueous dispersion, manufactured by Nissan Chemical Industries, Ltd.), etc. As dispersion liquid, Nidoraru (aqueous dispersion, Taki Chemical Co., Ltd.) and the like, can be exemplified respectively.
Moreover, in order to suppress coloring, the composition for optical semiconductor sealing of this invention can also mix | blend antioxidant, a light stabilizer, and a ultraviolet absorber as needed.

  Examples of the antioxidant include trade names such as Sumizer BHT, Sumizer GM, Sumizer GS, Sumizer MDP-S, Sumizer BBM-S, Sumizer WX-R, Sumizer GA-80, Sumitizer TZ-S, TP. Chemical Industry Co., Ltd.); Irganox 1076, Irganox 565, Irganox 1520, Irganox 245, Irganox 1010, Irganox 1098, Irganox 1330, Irganox 1425, Irganox 3114, Irganox MD nox1790 (manufactured by Cytec); TNP (manufactured by Yokkaichi Gosei Co., Ltd.); Weston 618 (manufactured by Vorg Warner); Irgafos 168 (manufactured by Ciba Specialty Chemicals); AdekastabPEP-36, Adekastab HP-10 (above, Asahi Denka Kogyo) Co., Ltd.), Sandstab P-EPQ, Ultranox 626, and the like.

  Examples of the light stabilizer include, for example, Biosorb 04 (manufactured by Kyodo Yakuhin Co., Ltd.); Tinuvin 622, Tinuvin 765 (manufactured by Ciba Specialty Chemicals); Cyasorb UV-3346 (manufactured by Cytec); AdekatabLA-57 (Manufactured by Asahi Denka Kogyo Co., Ltd.), Chimassorb 119, Chimassorb 944 and the like.

  Examples of the ultraviolet absorber include, for example, Viosorb 80, Viosorb 110, Viosorb 130, Viosorb 520, Viosorb 583, Viosorb 590 (above, manufactured by Kyodo Yakuhin Co., Ltd.); -Specialty Chemicals Co., Ltd.); AdekatabLA-31 (Asahi Denka Kogyo Co., Ltd.) etc. can be mentioned.

Furthermore, in the composition for optical semiconductor encapsulation of the present invention, an alicyclic epoxy compound, an aromatic epoxy compound, ethylene glycol, propylene glycol, etc., if necessary, within a range not impairing the intended effect of the present invention. Carbon dioxide generation inhibitors such as aliphatic polyols, aliphatic or aromatic carboxylic acids and phenolic compounds; flexibility imparting agents such as polyalkylene glycols and polydimethylsiloxane derivatives; various rubbers and organic polymer beads, etc. In addition to impact resistance improvers, plasticizers, lubricants, other silane coupling agents, flame retardants, antistatic agents, leveling agents, ion trap agents, slidability improvers, far modification modifiers, surface tension reducing agents, You may mix | blend additives other than the above, such as an antifoamer, an anti-settling agent, an antioxidant, a mold release agent, a fluorescent agent, a coloring agent, and a conductive filler.
Examples of alicyclic epoxy compounds include:

And so on. (21) is HBE100 (New Nippon Rika Co., Ltd.), YX8000 (Japan Epoxy Resin Co., Ltd.), (22) is YL7040, (23) is YL6753, (24) is YED216D (above, Japan Epoxy Resin Co., Ltd.) ), (25) is CE2021 (Daicel Chemical Industries, Ltd.), (26) is LS7970 (Shin-Etsu Chemical Co., Ltd.), (28) is SR-HHPA (Sakamoto Pharmaceutical Co., Ltd.), and (29) is Tepic. (Nissan Chemical Co., Ltd.). In addition, CE2080, CE3000, CE2000, Eporide GT300, Eporide GT400, EHPE3150 (above, Daicel Chemical Industries, Ltd.), YL7170, YL8034 (above, Japan Epoxy Resin Co., Ltd.), W-100 (Shin Nippon Rika Co., Ltd.) ) Etc. can also be used. Of these, (21), (23), (25), (28), and (29) are preferable, and (28) is particularly preferable.

The addition amount of the alicyclic epoxy compound is preferably 1 to 120 parts by weight, more preferably 10 to 50 parts by weight with respect to 100 parts by weight of the component (A). If it is less than the lower limit, the adhesion to the lead frame is not sufficient, and if it exceeds the upper limit, the durability may not be sufficient.
In addition, an adhesion assistant may be added for the purpose of improving the adhesion with the lead frame. β- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropyltriethoxysilane, γ-glycidoxypropylmethyldiethoxysilane, γ-glycid X-propylmethyldimethoxysilane, N-β (aminoethyl) γ-aminopropylmethyldimethoxysilane, N-β (aminoethyl) γ-aminopropyltrimethoxysilane, N-β (aminoethyl) γ-aminopropyltriethoxysilane , Γ-aminopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, N-phenyl-γ-aminopropyltrimethoxysilane, γ-chloropropyltrimethoxysilane, γ-mercaptopropyltrimethoxysilane, dodecanedithiol, formula ( 34) and (35) Compound.

In addition, titanate adhesion assistants such as formulas (36) and (37) can also be used.

Among these, β- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropyltriethoxysilane, γ-glycidoxypropylmethyldiethoxysilane, γ -Glycidoxypropylmethyldimethoxysilane, γ-mercaptopropyltrimethoxysilane, dodecanedithiol, and compounds of formulas (34) and (35) are preferred.
The addition amount of the adhesion assistant is preferably 0.01 to 30 parts by weight, more preferably 0.1 to 20 parts by weight with respect to 100 parts by weight of the components (A) and (B).
A stress relaxation agent can be added for the purpose of preventing cracks and peeling from the lead frame.
Examples of the epoxy-modified silicone include KF-105, X-22-163A, X-22-163B, X-22-163C, KF-1001, KF-101, X-22-2000, X-22-169AS, X-22. -169B, KF-102 (Shin-Etsu Chemical Co., Ltd.), SF8421 (Toray Dow), X-22-162C, X-22-3701E, X-22-3710 (Shin-Etsu Chemical ( Ltd.), mercapto-modified X-22-167B, KF-2001, KF-2004 (above Shin-Etsu Chemical Co., Ltd.), CI1000 (Nippon Soda Co., Ltd.) as both-terminal carboxy-modified hydrogenated polybutadiene, both-terminal hydroxy-modified Examples of polybutadiene include GI2000 and GI3000 (above, manufactured by Nippon Soda Co., Ltd.). .

Further, a surfactant can be added for the purpose of adjusting the surface tension of the resin.
Specifically, F-474, F-479 (above, Dainippon Ink and Chemicals), FC-4430, FC-4432 (above, Sumitomo 3M), KP323, KP341 (above, Shin-Etsu Chemical) (Co)), PAINTAD32, PAINTAD54, DK8-8011 (Toray Dow), Emulgen 104P, Emulgen 109P, Emulgen 123, and Rheodor 8P.

The method for preparing the composition for optical semiconductor encapsulation is not particularly limited, and can be prepared by mixing each component by a conventionally known method, but as a preferred method for preparing the composition for optical semiconductor encapsulation. If necessary, the polyorganosiloxane of component (A) and component (B) obtained by hydrolyzing and condensing silane compound (1) and the like and silane compound (2) and the like in the manner described above. (C) The method of mixing with carboxylic anhydride or polyhydric carboxylic acid can be mentioned.
In addition, when the composition for optical semiconductor sealing contains (C) component, the polyorganosiloxane liquid which has (A) component and (B) component as a main component, and the hardening | curing agent which has (C) component as a main component. The liquid may be prepared separately, and both may be mixed at the time of use.

Optical Semiconductor Encapsulant The optical semiconductor encapsulant of the present invention comprises a cured product obtained by heating and curing an optical semiconductor encapsulating composition.
When forming the optical semiconductor encapsulant of the present invention, each optical semiconductor encapsulating composition is applied to a predetermined portion of the substrate having the optical semiconductor layer by, for example, coating, potting, impregnation, etc., and then heated. And let it harden.
The method for applying each optical semiconductor sealing composition is not particularly limited, and examples thereof include known methods such as application or potting with a dispenser, application by screen printing under vacuum or normal pressure, and reaction injection molding. Can be adopted.
In addition, the method for curing each optical semiconductor sealing composition after construction is not particularly limited. For example, a conventionally known curing device such as a closed curing furnace or a tunnel furnace capable of continuous curing is used. Can be used.

The heating method for curing is not particularly limited, and conventionally known methods such as hot air circulation heating, infrared heating, and high frequency heating can be employed.
The curing conditions are preferably about 80 to 250 ° C. and about 30 seconds to 15 hours, for example. At the time of curing, when it is intended to reduce the internal stress of the cured product, for example, after preliminary curing at 80 to 120 ° C. for about 0.5 to 5 hours, 0.1 to 120 to 180 ° C., for example. It is preferable to perform post-curing under conditions of about 15 hours, and when aiming at short-time curing, for example, it is preferable to perform curing at 150 to 250 ° C. for about 30 seconds to 30 minutes.

Optical Semiconductor The optical semiconductor of the present invention comprises an optical semiconductor sealed with the optical semiconductor sealing material of the present invention.
The film thickness of the optical semiconductor sealing material in the optical semiconductor of the present invention is preferably 0.05 mm or more, more preferably 0.1 mm or more. The upper limit value of the thickness of the optical semiconductor sealing material is appropriately selected according to the use of the optical semiconductor to be sealed.
The composition for sealing an optical semiconductor of the present invention is an optical semiconductor that can be potted and does not cause cracks or bubbles in a cured product even when the film thickness is thick, and is colorless and transparent and excellent in UV durability. A sealing material can be formed, for example, can be used very suitably for sealing of blue LED, white LED, etc. which have a light emission peak wavelength in the area | region of 500 nm or less. Moreover, since it has excellent UV durability, it can also be used as a bonding material for optical semiconductors.

  The following examples further illustrate the embodiments of the present invention more specifically, but the present invention is not limited to these examples.

The measuring method of the viscosity, Mw, and epoxy equivalent of (A) polyorganosiloxane obtained in each synthesis example is as follows.
Viscosity measurement method:
It measured at 25 degreeC with the TV type viscometer.
Mw measurement method:
Column: TSKgelGRCXLII manufactured by Tosoh Corporation, solvent: tetrahydrofuran, temperature: 40 ° C., and pressure: 68 kgf / cm ² .
Method for measuring epoxy equivalent:

-Potassium iodide aqueous solution-
It was prepared by dissolving 3.0 g of potassium iodide having a low iodate content (0.003% by weight or less) in 5.0 g of distilled water.

-Titration method of epoxy group-
Each sample (polyorganosiloxane) 1.0-1.5 g was put into a 125 ml Erlenmeyer flask equipped with a Dimroth condenser through two branches fitted with a reflux and a burette, and a magnetic stirrer with a hot plate. The mixture was refluxed with stirring, and immediately after the sample was dissolved, 20 drops of an indicator and an aqueous potassium iodide solution were added. Thereafter, the mixture was refluxed again and titrated with 1N hydrochloric acid until the end point was reached. The end point is that when one drop of 1N hydrochloric acid is added, the solution turns from blue to yellow and the yellow persists for more than 1 minute.

-Calculation method of epoxy equivalent-
When the sample weight was W (g) and the amount of 1N hydrochloric acid dropped was V (milliliter), the epoxy equivalent was calculated according to the following formula.
Epoxy equivalent = 1000 × W / V
Glass transition temperature measurement method: DSC (manufactured by TA Instruments) apparatus was used, and measurement was performed at a temperature increase rate of 10 ° C./min in a nitrogen atmosphere from −100 to 50 ° C.

Synthesis example 1
In a reaction vessel equipped with a stirrer, a thermometer, a dropping funnel and a reflux condenser, 60.0 g of 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane (ECETS), 40.0 g of dimethyldimethoxysilane (DMDS), 500 g of methyl isobutyl ketone (MIBK) and 10.0 g of triethylamine were added and mixed at room temperature. Next, 100 g of deionized water was dropped from the dropping funnel over 30 minutes, and the mixture was reacted at 80 ° C. for 6 hours while mixing under reflux. After completion of the reaction, the organic layer is taken out and washed with a 0.2 wt% ammonium nitrate aqueous solution until the water after washing becomes neutral, and then the solvent and water are distilled off under reduced pressure. (A) Polyorganosiloxane Was obtained as a viscous transparent liquid.
As a result of ¹ H-NMR analysis of this polyorganosiloxane, a peak based on epoxy groups was obtained in the vicinity of chemical shift (δ) = 3.2 ppm according to the theoretical intensity, and side reactions of epoxy groups occurred during the reaction. Not confirmed.
Table 1 shows the viscosity, Mw and epoxy equivalent of this polyorganosiloxane.

Synthesis Examples 2-4
Each (A) polyorganosiloxane was obtained as a viscous transparent liquid in the same manner as in Synthesis Example 1 except that the raw materials used were as shown in Table 1.
Table 1 shows the viscosity, Mw and epoxy equivalent of each polyorganosiloxane.

The molding jig and curing conditions of the composition for optical semiconductor encapsulation, and the evaluation points of the appearance, UV durability and hardness of the cured product are as follows.
Molding jig:
Two glass plates with a polyethylene terephthalate film attached to the surface were opposed to each other, and a silicon rubber rod having a diameter of 2 mm was sandwiched between the ends of the glass plate in a U shape to form a molding jig.

Curing conditions:
The composition for optical semiconductor sealing was poured into the molding jig and cured by heating in an oven at 120 ° C. for 2 hours and in an oven at 140 ° C. for 2 hours.

Evaluation procedure for UV durability:
The cured product was irradiated with ultraviolet rays (UV) continuously at 63 ° C. for 2 weeks using an ultraviolet long life fade meter (manufactured by Suga Test Instruments Co., Ltd.), and the transmittance at a wavelength of 470 nm before and after irradiation was measured spectrophotometrically. Measured with a meter.

Heat-resistant:
The transmittance at 470 nm was measured at the initial stage of the cured product and after being left in an oven at 150 ° C. for 120 hours.

Evaluation procedure for cracking and peeling:
Ten samples were prepared by injecting a semiconductor sealing composition into a lead frame and curing at 120 ° C. for 2 hours and 140 ° C. for 2 hours. After this sample was repeated 200 times at −50 to 100 ° C. heat cycle, cracks and peeling were observed with a microscope.
Less than 5 out of 10 samples with cracks and peeling
6 or more of 10 samples with cracks / peeling ×

Example 1
Each component shown in Table 2 was used. That is, as component (A), 8.0 g of (A) polyorganosiloxane obtained in Synthesis Example 1, 2.0 g of polyorganosiloxane obtained in Synthesis Example 4 as (B) component, and methylhexahydro as acid anhydride curing agent 4.7 g of phthalic anhydride (see formula (3), trade name MH700, manufactured by Shin Nippon Rika Co., Ltd.), tetra-n-butylphosphonium O, O-diethylphosphorodithionate 0 as a curing accelerator .05 g (trade name Hishicolin PX-4ET, manufactured by Nippon Chemical Industry Co., Ltd.) is added, mixed uniformly, defoamed, and then injected into a molding jig and cured to obtain a non-colored transparent cured product. Obtained. The evaluation results of this cured product are shown in Table 3.

Examples 2-3 and Comparative Example 1
A cured product was obtained in the same manner as in Example 1 except that each component shown in Table 2 was used. Table 3 shows the evaluation results of each cured product.
The contents of the other components in Table 2 are as follows.
PX-4ET: Tetra-n-butylphosphonium O, O-diethylphosphorodithionate (trade name Hishicolin PX-4ET, manufactured by Nippon Chemical Industry Co., Ltd.).
As shown in the examples, the addition of the component (B) polysiloxane can improve cracking and peeling while maintaining UV durability and heat resistance.

Claims (7)

(A) Polyorganosiloxane having an epoxy group with a polystyrene-converted weight average molecular weight of 500 to 1,000,000 having an epoxy equivalent of 150 to 600 g / mol and a glass transition temperature of -80 ° C to 150 ° C, and (B) Containing a polyorganosiloxane having an epoxy group with a weight average molecular weight in terms of polystyrene of 500 to 1,000,000 having an epoxy equivalent of more than 600 g / mole and 1600 g / mole or less and a glass transition temperature of -50 ° C. or less. A composition for sealing an optical semiconductor. Both (A) component and (B) component are a silane compound and / or its partial condensate represented by the following formula (1), and a silane compound and / or its partial condensate represented by the following formula (2): The composition for optical semiconductor sealing of Claim 1 obtained by heating in presence of an organic solvent, an organic base, and water, and making it hydrolyze and condense.

[In the formula (1), X represents a monovalent organic group having one or more epoxy groups, Y ¹ is a chlorine atom, a bromine atom, an iodine atom, or a linear, branched or cyclic group having 1 to 20 carbon atoms. R ¹ represents a hydrogen atom, a fluorine atom, a linear, branched or cyclic alkyl group having 1 to 20 carbon atoms, a linear, branched or cyclic substituted alkyl group having 1 to 20 carbon atoms. Group, a C2-C20 linear, branched or cyclic alkenyl group, a C6-C20 aryl group or a C7-C20 aralkyl group, n is an integer of 0-2. ]

[In the formula (2), Y ² represents a chlorine atom, a bromine atom, an iodine atom or a linear, branched or cyclic alkoxyl group having 1 to 20 carbon atoms, and R ² represents a hydrogen atom, a fluorine atom or a carbon number. 1-20 linear, branched or cyclic alkyl groups, 1-20 carbon linear, branched or cyclic substituted alkyl groups, 2-20 linear, branched or cyclic alkyl groups An alkenyl group, an aryl group having 6 to 20 carbon atoms or an aralkyl group having 7 to 20 carbon atoms is shown, and m is an integer of 0 to 3. ] (C) The composition for optical semiconductor sealing of Claim 1 which further contains a carboxylic anhydride or polyhydric carboxylic acid. (A) Polyorganosiloxane having an epoxy group with a polystyrene-converted weight average molecular weight of 500 to 1,000,000 having an epoxy equivalent of 150 to 600 g / mol and a glass transition temperature of -80 ° C to 150 ° C, and (B) Mixing a polyorganosiloxane having an epoxy group having a weight average molecular weight in terms of polystyrene of 500 to 1,000,000 having an epoxy equivalent of more than 600 g / mole and not more than 1600 g / mole and a glass transition temperature of not more than −50 ° C. The manufacturing method of the composition for optical semiconductor sealing characterized by these. The method according to claim 4, wherein (C) a carboxylic acid anhydride or a polyvalent carboxylic acid is further mixed during mixing of the component (A) and the component (B). The optical semiconductor sealing material which consists of hardened | cured material which heat-hardened the composition for optical semiconductor sealing in any one of Claims 1-3. An optical semiconductor sealed with the optical semiconductor sealing material according to claim 6.