JP2007142372A5 - - Google Patents
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- JP2007142372A5 JP2007142372A5 JP2006270280A JP2006270280A JP2007142372A5 JP 2007142372 A5 JP2007142372 A5 JP 2007142372A5 JP 2006270280 A JP2006270280 A JP 2006270280A JP 2006270280 A JP2006270280 A JP 2006270280A JP 2007142372 A5 JP2007142372 A5 JP 2007142372A5
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- JP
- Japan
- Prior art keywords
- spacer layer
- substrate
- piezoelectric element
- layer
- connection terminal
- Prior art date
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- 239000010410 layer Substances 0.000 claims 29
- 125000006850 spacer group Chemical group 0.000 claims 29
- 239000000758 substrate Substances 0.000 claims 14
- 239000002346 layers by function Substances 0.000 claims 9
- 230000001070 adhesive effect Effects 0.000 claims 5
- 239000004065 semiconductor Substances 0.000 claims 5
- 239000000853 adhesive Substances 0.000 claims 3
- 230000003796 beauty Effects 0.000 claims 2
- 239000003990 capacitor Substances 0.000 claims 2
- 239000010408 film Substances 0.000 claims 2
- 239000000463 material Substances 0.000 claims 2
- 239000010409 thin film Substances 0.000 claims 1
Claims (10)
前記第1のスペーサ層上に設けられた圧電素子と、
前記圧電素子の上方又は側方に設けられた第2のスペーサ層と、
前記第2のスペーサ層上に設けられた第2の基板と、を有し、
前記圧電素子は、第1の電極、圧電材料、及び第2の電極を有し、
前記第1のスペーサ層と前記第2のスペーサ層はそれぞれ、接着性を有し、前記圧電素子と重なる開口部を有することを特徴とする微小電気機械式装置。 A first spacer layer provided on the first substrate;
A piezoelectric element provided on the first spacer layer;
A second spacer layer provided above or on the side of the piezoelectric element;
Anda second substrate provided on said second spacer layer,
The piezoelectric element has a first electrode, a piezoelectric material, a second electrode 及 beauty,
The first respective spacer layer and the second spacer layer has an adhesive property, micro-electro-mechanical device, which comprises perforated openings overlapping the piezoelectric element.
前記第1のスペーサ層上に設けられた機能層と、
前記機能層の上方又は側方に設けられた第2のスペーサ層と、
前記第2のスペーサ層上に設けられた第2の基板と、を有し、
前記機能層は、圧電素子、熱電素子、歪み抵抗素子、インダクタ、及びコンデンサから選ばれた一つまたは複数の機能を奏し、
前記第1のスペーサ層と前記第2のスペーサ層はそれぞれ、接着性を有し、前記機能層と重なる開口部を有することを特徴とする微小電気機械式装置。 A first spacer layer provided on the first substrate;
A functional layer provided on the first spacer layer;
A second spacer layer provided above or on the side of the functional layer;
And a second substrate provided on said second spacer layer,
The functional layer has one or more functions selected from piezoelectric elements, thermoelectric elements, strain resistance elements, inductors, and capacitors,
The first respective spacer layer and the second spacer layer has an adhesive property, micro-electro-mechanical device, which comprises perforated openings overlapping the functional layer.
前記第1の基板と前記第2の基板はそれぞれ、フィルム基板であることを特徴とする微小電気機械式装置。Each of the first substrate and the second substrate is a film substrate.
前記第1のスペーサ層は異方性導電接着剤を有することを特徴とする微小電気機械式装置。The micro electromechanical device, wherein the first spacer layer has an anisotropic conductive adhesive.
前記トランジスタに電気的に接続された接続端子と、
前記接続端子の上方又は側方に設けられた第1のスペーサ層と、
前記第1のスペーサ層上に設けられた圧電素子と、
前記圧電素子の上方又は側方に設けられた第2のスペーサ層と、
前記第2のスペーサ層上に設けられた第2の基板と、を有し、
前記圧電素子は、第1の電極、圧電材料、及び第2の電極を有し、
前記第1のスペーサ層と前記第2のスペーサ層はそれぞれ、接着性を有し、前記圧電素子と重なる開口部を有することを特徴とする半導体装置。 A transistor provided over a first substrate,
A connection terminal electrically connected to the transistor ;
A first spacer layer provided above or on the side of the connection terminal ;
A piezoelectric element provided on the first spacer layer;
A second spacer layer provided above or on the side of the piezoelectric element;
And a second substrate provided on said second spacer layer,
The piezoelectric element has a first electrode, a piezoelectric material, a second electrode 及 beauty,
Wherein each of the first spacer layer and the second spacer layer, having adhesion, the semiconductor device characterized in that it have the aperture overlapping the piezoelectric element.
前記トランジスタに電気的に接続された接続端子と、
前記接続端子の上方又は側方に設けられた第1のスペーサ層と、
前記第1のスペーサ層上に設けられた機能層と、
前記機能層の上方又は側方に設けられた第2のスペーサ層と、
前記第2のスペーサ層上に設けられた第2の基板と、を有し、
前記機能層は、圧電素子、熱電素子、歪み抵抗素子、インダクタ、及びコンデンサから選ばれた一つまたは複数の機能を奏し、
前記第1のスペーサ層と前記第2のスペーサ層はそれぞれ、接着性を有し、前記機能層と重なる開口部を有することを特徴とする半導体装置。 A transistor provided on a first substrate;
A connection terminal electrically connected to the transistor ;
A first spacer layer provided above or on the side of the connection terminal ;
A functional layer provided on the first spacer layer;
A second spacer layer provided above or on the side of the functional layer;
And a second substrate provided on said second spacer layer,
The functional layer has one or more functions selected from piezoelectric elements, thermoelectric elements, strain resistance elements, inductors, and capacitors,
Wherein each of the first spacer layer and the second spacer layer, having adhesion, the semiconductor device characterized in that it have the aperture overlapping the functional layer.
前記第1の基板と前記第2の基板はそれぞれ、フィルム基板であることを特徴とする半導体装置。 In claim 5 or claim 6 ,
Each said first substrate and the second substrate, wherein a film substrate der Rukoto.
前記第1のスペーサ層は異方性導電接着剤を有し、The first spacer layer has an anisotropic conductive adhesive;
前記接続端子と前記圧電素子は、前記第1のスペーサ層を介して電気的に接続されていることを特徴とする半導体装置。The semiconductor device, wherein the connection terminal and the piezoelectric element are electrically connected via the first spacer layer.
前記第1のスペーサ層は異方性導電接着剤を有し、The first spacer layer has an anisotropic conductive adhesive;
前記接続端子と前記機能層は、前記第1のスペーサ層を介して電気的に接続されていることを特徴とする半導体装置。The semiconductor device, wherein the connection terminal and the functional layer are electrically connected through the first spacer layer.
前記トランジスタは薄膜トランジスタであることを特徴とする半導体装置。The semiconductor device, wherein the transistor is a thin film transistor.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006270280A JP2007142372A (en) | 2005-10-17 | 2006-10-02 | Micro electromechanical equipment, semiconductor device, and method for manufacturing them |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005302343 | 2005-10-17 | ||
JP2006270280A JP2007142372A (en) | 2005-10-17 | 2006-10-02 | Micro electromechanical equipment, semiconductor device, and method for manufacturing them |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007142372A JP2007142372A (en) | 2007-06-07 |
JP2007142372A5 true JP2007142372A5 (en) | 2009-11-12 |
Family
ID=38204824
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006270280A Withdrawn JP2007142372A (en) | 2005-10-17 | 2006-10-02 | Micro electromechanical equipment, semiconductor device, and method for manufacturing them |
Country Status (1)
Country | Link |
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JP (1) | JP2007142372A (en) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102010031055B4 (en) * | 2010-07-07 | 2023-02-23 | Robert Bosch Gmbh | Sensor module and method of manufacturing a sensor module |
JP5811588B2 (en) * | 2011-05-18 | 2015-11-11 | 国立大学法人佐賀大学 | Compound sensor |
KR101325148B1 (en) * | 2012-03-09 | 2013-11-06 | 한국생산기술연구원 | Energy harvesting apparatus having coin spring type micro piezoelectric transducer |
FR3006112B1 (en) * | 2013-05-24 | 2016-10-21 | Chambre De Commerce Et D'industrie De Region Paris Ile De France | PROCESS FOR MANUFACTURING A FLEXIBLE PIEZOELECTRIC SENSOR |
CN107181470B (en) | 2016-03-10 | 2020-10-02 | 中芯国际集成电路制造(上海)有限公司 | Film bulk acoustic resonator, semiconductor device and method of manufacturing the same |
CN107181472B (en) * | 2016-03-10 | 2020-11-03 | 中芯国际集成电路制造(上海)有限公司 | Film bulk acoustic resonator, semiconductor device and method of manufacturing the same |
CN107181469B (en) * | 2016-03-10 | 2020-11-17 | 中芯国际集成电路制造(上海)有限公司 | Film bulk acoustic resonator, semiconductor device and method of manufacturing the same |
JPWO2019048985A1 (en) | 2017-09-06 | 2020-10-29 | 株式会社半導体エネルギー研究所 | Power storage systems, vehicles, electronic devices and semiconductor devices |
JP2019212728A (en) * | 2018-06-04 | 2019-12-12 | 株式会社東海理化電機製作所 | Flexible substrate, piezoelectric element unit, and tactile presentation device |
CN111384920A (en) * | 2018-12-29 | 2020-07-07 | 中芯集成电路(宁波)有限公司上海分公司 | Integrated structure of crystal resonator and control circuit and integration method thereof |
CN111403334B (en) * | 2018-12-29 | 2023-07-28 | 中芯集成电路(宁波)有限公司上海分公司 | Integrated structure of crystal resonator and control circuit and integrated method thereof |
CN112039457A (en) * | 2019-07-19 | 2020-12-04 | 中芯集成电路(宁波)有限公司上海分公司 | Method for manufacturing film bulk acoustic wave resonator |
CN110868179A (en) * | 2019-10-11 | 2020-03-06 | 中国电子科技集团公司第十三研究所 | Resonator packaging system |
CN113131896B (en) * | 2019-12-31 | 2024-04-30 | 中芯集成电路(宁波)有限公司 | Thin film piezoelectric acoustic resonator, manufacturing method thereof and filter |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06188670A (en) * | 1992-12-15 | 1994-07-08 | Tdk Corp | Piezoelectric component and manufacture thereof |
JP3697850B2 (en) * | 1997-09-04 | 2005-09-21 | セイコーエプソン株式会社 | Liquid jet recording head and manufacturing method thereof |
JP3846779B2 (en) * | 2001-09-07 | 2006-11-15 | Tdk株式会社 | Piezoelectric vibrator, piezoelectric component and manufacturing method thereof |
JP3841278B2 (en) * | 2002-01-21 | 2006-11-01 | Tdk株式会社 | Piezoelectric parts |
JP3994758B2 (en) * | 2002-03-01 | 2007-10-24 | 株式会社村田製作所 | Manufacturing method of chip-type electronic component |
JP2005270640A (en) * | 2004-02-26 | 2005-10-06 | Semiconductor Energy Lab Co Ltd | Sports implement, amusement tool, and training tool |
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2006
- 2006-10-02 JP JP2006270280A patent/JP2007142372A/en not_active Withdrawn
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