JP2007141481A - Gas discharge display panel - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a gas discharge display panel capable of realizing excellent sputtering resistance compared with the existing one by reforming a protective layer. <P>SOLUTION: In this PDP1 as an embodiment of this invention, a protective layer 15 has a structure in which noble gas atoms such as Ar and Zn are dispersed into metal oxides such as MgO which serves as a base material. Thereby, the protective layer is reformed, film density and crystalization property are improved to acquire the protective layer with excellent sputtering resistance compared with the conventional constitution. As a result, rise of the discharge starting voltage of PDP can be prevented and service life of the panel can be elongated. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a gas discharge display panel such as a plasma display panel and a method for manufacturing the same, and more particularly to a configuration of a protective layer and a method for forming the protective layer.

  The gas discharge display panel is a display device that displays an image by exciting and emitting ultraviolet rays by gas discharge, and a typical panel is a plasma display panel (hereinafter referred to as “PDP”). PDPs are roughly classified into an alternating current (AC) type and a direct current (DC) type, and the AC type is excellent in terms of luminance, luminous efficiency, life, and the like, and is widely spread.

  The AC type PDP has a plurality of barrier ribs on the surface of two thin panel glasses (front panel glass and back panel glass) with a plurality of electrodes (display electrodes or address electrodes) and a dielectric layer covering the electrodes. And a phosphor layer disposed between the plurality of partition walls, and a discharge cell (subpixel) is formed in a matrix, and a discharge gas is sealed between the two panel glasses. A protective layer (film) is formed on the surface of the dielectric layer covering the display electrodes of the front panel glass.

  In PDP, based on a so-called time-division gray scale display method in driving, fluorescent light is emitted by appropriately supplying power to the plurality of electrodes to obtain a discharge in a discharge gas. Specifically, when the PDP is driven, a frame to be displayed is first divided into a plurality of subframes, and each subframe is further divided into a plurality of periods. In each subframe, the wall charge of the entire screen is initialized (reset) in the initialization period, and then address discharge is performed so that the wall charge is accumulated only in the discharge cells to be lit in the address period. By simultaneously applying an alternating voltage (sustain voltage) to the discharge cells, discharge is maintained for a certain time. Since each discharge performed in the PDP occurs based on a probability phenomenon, the rate of occurrence of discharge in each discharge cell (called discharge probability) basically has a property of variation. Therefore, according to this property, for example, the address discharge can increase the discharge probability in proportion to the applied pulse width for executing the address discharge.

  A general configuration of the PDP is disclosed in, for example, Patent Document 1 and the like.

  Here, the protective layer covering the dielectric layer of the front panel glass is formed to protect the dielectric layer from ion bombardment during discharge, and also functions as a cathode electrode material in contact with the discharge space. Film quality has a great influence on discharge characteristics. As the material of the protective layer, since the secondary electron emission coefficient is large and the use thereof, the discharge start voltage Vf is reduced and the sputtering resistance is high, so that magnesium oxide (MgO) is used. Widely used as a base material. The protective layer using MgO retains the charge generated by the discharge in the address period (hereinafter referred to as “address discharge”) and contributes to the discharge in the sustain period (hereinafter referred to as “sustain discharge”). This has the effect of reducing the discharge start voltage. Furthermore, since secondary electrons are efficiently emitted, it is advantageous for reducing power consumption for driving the PDP. The protective layer is usually formed to a thickness of about 0.5 to 1 μm by a vacuum deposition method.

  By the way, with the recent trend toward higher definition and larger screens in display devices, the power consumption of PDPs has been further reduced. In response to this demand, measures have been taken to reduce power consumption by modifying the protective layer and reducing the discharge start voltage Vf.

  Specifically, for example, as shown in Patent Document 2, a configuration in which a rare gas atom having a predetermined concentration is added to a MgO crystal that is a base material of a protective layer is disclosed. According to the configuration, the noble gas atoms contained in the crystal are diffused in the discharge space during driving, contributing to the discharge by facilitating the ionization of other noble gas atoms filled in the discharge space. A so-called Penning effect is exhibited. It has been clarified that according to such a method, the discharge start voltage can be reduced to some extent as compared with a protective layer made of pure MgO crystal.

Patent Document 3 discloses a technique for modifying a protective layer by dispersing Zn as an additive in the protective layer. According to this technique, it is said that the discharge start voltage can be lowered by improving the electron emission characteristics of the protective layer.
JP-A-9-92133 JP 2002-358898 A JP 2004-241309 A

  However, according to the intensive studies by the present inventors, it has been found that it is difficult to achieve a sufficient power consumption reduction effect even if the above-described various conventional techniques are used. Specifically, in order to reduce the power consumption of the PDP, for example, means for increasing the Xe partial pressure in the discharge gas is used. By doing so, the luminous efficiency is improved, but there is a problem that the sputter resistance of the protective layer is lowered. As a result, the secondary electron emission ability of the protective layer is reduced, and the discharge start voltage is increased. Therefore, in order to realize more effective low power consumption, it is necessary to prevent the sputtering resistance from being lowered under a high Xe partial pressure.

  The present invention has been made in view of the above problems, and its purpose is to improve the sputtering resistance of the protective layer as compared with the prior art, thereby preventing an increase in the discharge start voltage and further providing a long life of display characteristics. It is to plan.

  In order to solve the above problems, the present invention provides a gas discharge display panel including a panel having a dielectric layer and a protective layer sequentially laminated on the surface, wherein the protective layer is formed on a base material made of a metal oxide. Furthermore, a configuration in which rare gas atoms and Zn are dispersed is adopted.

  Here, the rare gas atom may be an Ar atom.

  Here, the Ar atoms are dispersed at a ratio of 10 mass ppm to 1000 mass ppm with respect to the base material.

  Further, the Zn is dispersed at a ratio of 0.005 mass% to 20 mass% with respect to the base material.

  Further, the present invention is a gas discharge display panel comprising a panel having a dielectric layer and a protective layer sequentially laminated on the surface, wherein the protective layer is 10 mass ppm or more and 1000 mass ppm relative to a base material made of a metal oxide. The following Ar was dispersed.

  Further, the present invention is a gas discharge display panel comprising a panel having a dielectric layer and a protective layer sequentially laminated on the surface, wherein the protective layer is 0.005% by mass or more and 20% by mass with respect to a base material made of a metal oxide. It was assumed that the following Zn was dispersed.

  Here, the metal oxide may be MgO.

  The optical refractive index of the protective layer may be 1.65 or more for light having a wavelength of 500 nm.

  Furthermore, the protective layer may be oriented in (200).

  The present invention provides a protective layer for a gas discharge display panel in which a rare gas atom and Zn are further dispersed with respect to a base material made of a metal oxide, so that the protective layer has a higher spatter resistance than conventional ones. It is possible to improve the performance.

  That is, according to the present invention, first, compressive stress acts by adding a rare gas atom to the protective layer, and further, by adding Zn, the crystallinity of the protective layer is improved and the film density is increased. As a result, the sputter resistance of the protective layer is improved, and a reduction in secondary electron emission ability can be prevented. By doing so, low power consumption and long life of the panel can be realized at the same time.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings.

<Embodiment 1>
1-1. Configuration of PDP FIG. 1 is a partial cross-sectional perspective view showing a main configuration of an AC type PDP 1 according to Embodiment 1 of the present invention. In the figure, the z direction corresponds to the thickness direction of the PDP 1, and the xy plane corresponds to a plane parallel to the panel surface of the PDP 1. Here, the PDP 1 has a specification according to the NTSC specification of the 42-inch class as an example, but the PDP of the present invention may naturally be applied to other specifications and sizes such as XGA and SXGA.

  As shown in FIG. 1, the configuration of the PDP 1 is roughly divided into a front panel 10 and a back panel 16 that are disposed with their main surfaces facing each other.

A front panel glass 11 serving as a substrate of the front panel 10 has a plurality of pairs of display electrodes 12 and 13 (scan electrodes 12 and sustain electrodes 13) formed on one main surface thereof. Each of the display electrodes 12 and 13 is made of an Ag thick film (thickness 2 μm to 10 μm) with respect to the strip-shaped transparent electrodes 120 and 130 (thickness 0.1 μm, width 150 μm) made of a transparent conductive material such as ITO or SnO _2. Further, bus lines 121 and 131 (thickness 7 μm, width 95 μm) made of aluminum (Al) thin film (thickness 0.1 μm to 1 μm) or Cr / Cu / Cr laminated thin film (thickness 0.1 μm to 1 μm) are laminated. Become. The sheet resistance of the transparent electrodes 120 and 130 is lowered by the bus lines 121 and 131.

The front panel glass 11 on which the display electrodes 12 and 13 are disposed has lead oxide (PbO), bismuth oxide (Bi ₂ O ₃ ), or phosphorus oxide (PO ₄ ) as a main component over the entire main surface of the glass 11. A dielectric layer 14 of low melting point glass (thickness 20 μm to 50 μm) is formed by a mask screen printing method or the like. The dielectric layer 14 has a current limiting function peculiar to the AC type PDP, and is an element that realizes a longer life than the DC type PDP. The surface of the dielectric layer 14 is coated with a protective layer 15 having a thickness of about 1.0 μm.

  Here, the feature of the first embodiment is the structure of the protective layer 15, which will be described in detail later.

  A back panel glass 17 serving as a substrate of the back panel 16 has an Ag thick film (thickness 2 μm to 10 μm), an aluminum (Al) thin film (thickness 0.1 μm to 1 μm), or a Cr / Cu / Cr laminate on one main surface. A plurality of address electrodes 18 having a width of 60 μm made of a thin film (thickness 0.1 μm to 1 μm) and the like are arranged in parallel in stripes at regular intervals (360 μm) in the y direction with the x direction as a longitudinal direction. A dielectric film 19 having a thickness of 30 μm is coated over the entire surface of the back panel glass 17 so as to be enclosed.

  On the dielectric film 19, a partition wall 20 (height of about 150 μm and width of 40 μm) is further arranged in accordance with the gap between the adjacent address electrodes 18, and the cell SU is partitioned by the adjacent partition wall 20, and in the x direction. It serves to prevent the occurrence of erroneous discharge and optical crosstalk. The phosphor layers 21 corresponding to red (R), green (G), and blue (B) for color display are formed on the side surfaces of the two adjacent barrier ribs 20 and the surface of the dielectric film 19 therebetween. To 23 are formed.

  The address electrode 18 may be directly enclosed by the phosphor layers 21 to 23 without using the dielectric film 19.

  The front panel 10 and the back panel 16 are arranged so that the longitudinal directions of the address electrodes 18 and the display electrodes 12 and 13 are orthogonal to each other, and the outer peripheral edges of the panels 10 and 16 are sealed with glass frit. ing. A discharge gas (filled gas) made of an inert gas component such as He, Xe, or Ne is sealed between the panels 10 and 16 at a predetermined pressure (usually about 53.2 kPa to 79.8 kPa).

  A space between adjacent barrier ribs 20 is a discharge space 24. A region where a pair of adjacent display electrodes 12 and 13 and one address electrode 18 intersect with each other across the discharge space 24 is a cell (“subpixel”) for image display. Also called.) Corresponds to SU. The cell pitch is 1080 μm in the x direction and 360 μm in the y direction. One pixel (1080 μm × 1080 μm) is composed of three adjacent RGB cells SU.

1-2. Driving method of PDP In the PDP 1 having the above-described configuration, an AC voltage of several tens to several hundreds of kHz is applied to the gap between the pair of display electrodes 12 and 13 by a driving unit (not illustrated). A discharge is generated in the cell SU, and the phosphor layers 21 to 23 are excited by ultraviolet rays from the excited Xe atoms to emit visible light.

  As an example of the driving method, there is a so-called in-field time division gradation display method. In this method, a field to be displayed is divided into a plurality of subfields, and each subfield is further divided into a plurality of periods. In each subfield, the wall charge of the entire screen is initialized (reset) in the initialization period, and then address discharge is performed to accumulate wall charges only in the discharge cells to be lit in the address period. By applying an alternating voltage (sustain voltage) to all the discharge cells all at once, the discharge is maintained for a certain period of time to display light.

  At the time of this driving, in order to represent the gradation of light emission in each cell by binary control of ON / OFF in the driving unit, each time-series field F that is an input image from the outside is, for example, six Divide into subfields. Weighting is performed so that the relative ratio of luminance in each subfield is, for example, 1: 2: 4: 8: 16: 32, and the number of times of sustain (sustain discharge) emission is set in each subfield.

  Here, FIG. 2 is an example of a drive waveform process of the PDP 1. FIG. 2 shows the drive waveform of the mth subfield in the field. As shown in FIG. 2, an initialization period, an address period, a discharge sustain period, and an erase period are allocated to each subfield.

  The initialization period is a period in which the wall charges of the entire screen are erased (initialization discharge) in order to prevent the influence of the previous lighting of the cells (the influence of the accumulated wall charges). In the waveform example shown in FIG. 2, a reset pulse having a positive ramp-down waveform exceeding the discharge start voltage Vf is applied to all the display electrodes 12 and 13. At the same time, a positive pulse is applied to all address electrodes 18 in order to prevent charging and ion bombardment on the back panel 16 side. Due to the differential voltage between the rising and falling edges of the applied pulse, an initializing discharge, which is a weak surface discharge, is generated in all cells, wall charges are accumulated in all cells, and the entire screen is uniformly charged.

  The address period is a period for performing addressing (setting of lighting / non-lighting) of a cell selected based on the image signal divided into subfields. In this period, the scan electrode 12 is biased to a positive potential with respect to the ground potential, and all the sustain electrodes 13 are biased to a negative potential. In this state, each line is selected one by one from the line at the top of the panel (cells in a horizontal row corresponding to a pair of display electrodes), and a negative scan pulse is applied to the corresponding scan electrode 12. Further, a positive address pulse is applied to the address electrode 18 corresponding to the cell to be lit. As a result, the weak surface discharge in the initialization period is inherited, address discharge is performed only in the cells to be lit, and wall charges are accumulated.

  The discharge sustaining period is a period in which the lighting state set by the address discharge is expanded and the discharge is maintained in order to ensure the luminance according to the gradation level. Here, in order to prevent unnecessary discharge, all the address electrodes 18 are biased to a positive potential, and a positive sustain pulse is applied to all the sustain electrodes 13. Thereafter, a sustain pulse is alternately applied to the scan electrode 12 and the sustain electrode 13, and the discharge is repeated for a predetermined period.

  In the erasing period, a gradual decrease pulse is applied to the scan electrode 12, thereby erasing the wall charges.

  Note that the length of the initialization period and the address period is constant regardless of the luminance weight, but the length of the discharge sustain period is longer as the luminance weight is larger. That is, the length of the display period of each subfield is different from each other.

  In PDP 1, each discharge performed in the subfield generates a vacuum ultraviolet ray composed of a resonance line having a sharp peak at 147 nm caused by Xe and a molecular beam centered at 173 nm. This vacuum ultraviolet ray is irradiated to each phosphor layer 21 to 23 to generate visible light. Then, multi-color / multi-gradation display is performed by a combination of sub-field units for each color of RGB.

  Here, the feature of the present invention is the structure of the protective layer 15. The PDP 1 in the present embodiment has a structure in which a rare gas atom and Zn are further dispersed as a protective layer 15 in a metal oxide serving as a base material.

  By adopting such a protective layer structure, the protective layer is modified and the crystallinity and film density are improved, so that the effect of improving the sputtering resistance can be obtained compared to the conventional structure. Thus, low power consumption and long life of the PDP are realized.

<Features and effects of the first embodiment>
Regarding the modification of the protective layer as a measure for reducing the power consumption of the PDP, as described in Patent Documents 2 to 3 and the like, measures such as reduction of the discharge start voltage by improving the electron emission characteristics are taken. However, if the Xe partial pressure in the discharge gas is increased in order to improve the luminous efficiency, it is difficult to obtain any effective effect due to the problem of sputtering resistance. On the other hand, in the present invention, by dispersing rare gas atoms and Zn in the protective layer, it is possible to improve the sputtering resistance as compared with the prior art as shown in FIG.

  The reason why such performance is obtained is that the present invention maintains a state in which the rare gas atoms and Zn added to the protective layer are dispersed in the MgO crystal structure in the protective layer. Specifically, the compressive stress is applied to the film by the dispersed rare gas atoms to increase the film density, and the Zn is substituted at the Mg site, so that the crystal orientation is changed from (111) to (200). It is considered that the sputter resistance can be greatly improved by a synergistic effect with the change and the crystallinity.

(Regarding the method of forming the protective layer)
Here, an example of a method for forming the protective layer 15 according to the present embodiment will be described.

  First, as a method for forming a film on the surface of the formed dielectric layer 13 as a target, an electron beam (EB) vapor deposition method is used. As a vapor deposition source used for film formation, for example, pellet-shaped or powder-shaped MgO or a sintered body thereof is used. As a method for adding Zn, a pellet-like MgO mixed with a pellet- or powder-like Zn compound, a mixture of powder-like MgO and a powder-like Zn compound, or a mixture thereof is calcined. Use a knot. At this time, the concentration of the Zn compound was set to 0.005 mass% to 20 mass%.

  And in an oxygen atmosphere, the said vapor deposition source is heated by using a Pierce type electron beam gun as a heating source, and a protective layer is formed. Here, as a method of adding rare gas atoms to the protective layer, the deposition source is heated to form a film as described above while irradiating the substrate surface with rare gas ions.

  At this time, the amount of electron beam current, the amount of oxygen partial pressure, the substrate temperature, etc. at the time of film formation do not directly affect the configuration of the present invention, and can be adapted to conventional setting conditions.

  The film forming method is not limited to the electron beam evaporation method, and a sputtering method, an ion plating method, or the like may be used.

(Comparative experiment and experimental results regarding this embodiment)
Next, an example of the present invention was prepared, and a performance comparison experiment was performed on the example together with a comparative example. The experimental results will be described below.

  The structure of the protective layer in various Examples and Comparative Examples was as follows.

  (Comparative Example): A protective layer in which impurities such as rare gas atoms and Zn were not added to a base material made of MgO was formed.

  Example 1 A protective layer in which Ar atoms were added at 200 ppm by mass with respect to a base material made of MgO was formed.

  (Example 2): A protective layer in which 200 mass ppm of Ar atoms and 0.5 mass% of Zn were added to a base material made of MgO was used.

  Example 3 A protective layer in which 200 mass ppm of Ar atoms and 1 mass% of Zn were added to a base material made of MgO was used.

  (Example 4) A protective layer in which 200 mass ppm of Ar atoms and 3 mass% of Zn were added to a base material made of MgO was used.

  Example 5 A protective layer in which 200 mass ppm of Ar atoms and 5 mass% of Zn were added to a base material made of MgO was used.

  (Example 6): A protective layer in which 200 mass ppm of Ar atoms and 10 mass% of Zn were added to a base material made of MgO was used.

  (Example 7): A protective layer in which 200 mass ppm of Ar atoms and 15 mass% of Zn were added to a base material made of MgO was used.

  First, the sputter resistance of the comparative example, example 1, and example 3 was evaluated. As an experimental method, each sample is fixed on a 6-inch wafer using wax and placed on an electrode of an Ar ion etching apparatus. Then, after evacuating the chamber, Ar gas is introduced at 100 sccm and the pressure is adjusted to 0.67 Pa. In this state, 700 W and 300 W RF power is applied to the ICP and the electrodes, respectively, and etching is performed for 5 minutes. FIG. 3 shows the spatter amount (sputter rate) per unit time of each sample thus obtained.

  As can be seen from this figure, MgO containing no Ar atoms or Zn (comparative example) has a sputter rate of 32.0 nm / s, whereas MgO containing 200 ppm by mass of Ar atoms (Example 1) The sputtering rate of 23.5 nm / s, MgO containing 200 mass ppm of Ar atoms and 1 mass% of Zn (Example 3) is 18.6 nm / s, both of which have higher sputtering resistance than the comparative example. Improved. That is, the sputtering resistance can be improved by adding Ar to the MgO film, and the sputtering resistance can be further improved by further adding Zn thereto.

Next, the refractive index of the comparative example, example 1, and examples 3 to 5 was measured using a spectroscopic ellipsometer. Here, the film density and refractive index are
n = (1−p) nν + pns (n: refractive index of film, nν: refractive index of void, ns: refractive index of bulk, p: film density)
It is known that there is a relationship represented by

  According to the above relationship, the denser the film, the higher the refractive index. Therefore, it can be said that the film having a larger refractive index has better sputter resistance. Here, the refractive index data of each sample is shown in FIG.

  As can be seen from this figure, the refractive index of MgO not added with Ar atoms or Zn (comparative example) is 1.610, whereas the refractive index of MgO containing 200 mass ppm of Ar atoms (Example 1). The rate was 1.695. The refractive indexes of MgO (Examples 3 to 5) to which a predetermined amount of Zn was further added were 1.703, 1.711, and 1.707, respectively. That is, it has been found that the film density can be improved by adding Ar to the MgO film, and the film density can be further improved by further adding Zn thereto. From these results, in order to improve the sputtering resistance, the refractive index needs to be 1.65 or more. In addition, if the refractive index is too high, that is, if the film density is too high, the porosity of the film is reduced, and the surface area of the MgO film, which is a columnar structure, is reduced. The Therefore, the refractive index is desirably 2.00 or less.

  Next, X-ray diffraction (XRD) measurement was performed on the comparative example and Examples 1 to 7, and the crystallinity was evaluated. The XRD patterns of the obtained samples are shown in FIGS. First, in FIGS. 5A and 5B, peaks appear at 36.9 ° and 78.6 °, which are peaks at (111) and (222), respectively. On the other hand, in FIGS. 5C to 5H, a peak appears at 42.9 °, which is the peak of (200). Here, FIG. 6 shows a graph of the peak intensity of the comparative example and each example. FIG. 6 shows that the peak intensity increases as the Zn concentration increases. From this, it is considered that the crystallinity is improved by the addition of Zn.

  Based on the above experimental results, when a predetermined amount of Zn is added to MgO, the crystal orientation changes from (111) to (200) with a high filling rate, and as a result, the film density increases, thereby increasing the sputtering resistance. Is considered to have improved. Further, by adding a predetermined amount of Ar to MgO, a compressive stress acts on the film, the film density is increased, and the sputtering resistance is similarly improved. Furthermore, when MgO contains Zn and Ar in a predetermined amount, the effects of the two layers appear and a protective layer having very excellent sputtering resistance can be realized.

  Next, the addition amount of Ar atoms and Zn necessary in the present invention will be specifically described.

<Addition amounts of Ar atom and Zn to magnesium oxide>
Next, the results of the study of the components of the protective layer by which the inventors of the present application can effectively obtain the effects of the present invention will be shown.

  Here, the content of Ar atoms in the protective layer 15 can be examined by a Rutherford backscattering method (RBS; Rutherford Backward Scattering).

  Meanwhile, the Zn content in the protective layer 15 can be examined by secondary ion mass spectrometry (SIMS).

  First, an investigation based on RBS revealed that the range of the amount of Ar atoms added to magnesium oxide is preferably 10 ppm by mass to 1000 ppm by mass.

  In addition, when Ar content was less than 10 mass ppm, it turned out that the compressive stress which acts on a film | membrane is small and the increase effect of a film | membrane density will become very small. On the contrary, it has been clarified that when the Ar content exceeds 1000 mass ppm, the crystallinity of the protective layer is adversely affected. For this reason, when the Ar content is not within the predetermined range, the sputtering resistance as the protective film is not improved, or conversely decreases.

  On the other hand, as a result of investigation based on SIMS, it was found that the range of the addition amount of Zn to be added is preferably 0.005 mass% or more and 20 mass% or less.

  In this case, if the Zn content is less than 0.005% by mass, the effect of adding Zn becomes very small, which is not desirable. On the other hand, if the amount of Zn added is greater than 20% by mass, the crystallinity of the protective layer is adversely affected as in the case of Ar atoms, which is also undesirable. For this reason, when the Zn content is not within the predetermined range, the sputtering resistance as the protective film is not improved, or conversely decreases.

  The gas discharge display panel of the present invention can be used for a display device using a PDP used in, for example, a transportation facility, public facility, or home television device.

Sectional perspective view which shows typically the structure of PDP in Embodiment 1. FIG. A diagram showing an example of a PDP driving process Graph showing data on the sputter resistance of the protective layer Graph showing data on the refractive index of the protective layer The figure which shows the data about the X-ray diffraction pattern of the protective layer Graph showing data on X-ray diffraction peak intensity of protective layer

Explanation of symbols

1 PDP
10 Front Panel 12 Scan Electrode 13 Sustain Electrode 15 Protective Layer 18 Address Electrode

Claims (9)

A gas discharge display panel comprising a panel in which a dielectric layer and a protective layer are sequentially laminated on the surface,
The protective layer is a gas discharge display panel in which a rare gas atom and Zn are further dispersed in a base material made of a metal oxide. The gas discharge display panel according to claim 1, wherein the rare gas atom is an Ar atom. The gas discharge display panel according to claim 2, wherein the Ar atoms are contained in a proportion of 10 mass ppm to 1000 mass ppm with respect to the base material. 2. The gas discharge display panel according to claim 1, wherein the Zn is contained in a proportion of 0.005 mass% to 20 mass% with respect to the base material. A gas discharge display panel comprising a panel in which a dielectric layer and a protective layer are sequentially laminated on the surface,
The protective layer is a gas discharge display panel in which Ar of 10 mass ppm to 1000 mass ppm is dispersed with respect to a base material made of a metal oxide. A gas discharge display panel comprising a panel in which a dielectric layer and a protective layer are sequentially laminated on the surface,
The protective layer is a gas discharge display panel in which 0.005% by mass or more and 20% by mass or less of Zn is dispersed in a base material made of a metal oxide. The gas discharge display panel according to claim 1, wherein the metal oxide is MgO. 8. The gas discharge display panel according to claim 1, wherein the protective layer has an optical refractive index of 1.65 or more with respect to light having a wavelength of 500 nm. The gas discharge display panel according to any one of claims 1, 2, 3, 4, 6, and 7, wherein the protective layer is oriented in (200).

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