JP2007121999A - Color filter for liquid crystal display, and method of manufacturing same - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To produce a color filter for liquid crystal display, which improves resolution upon exposure-transfer by correcting mask deflection, and will not cause color unevenness. <P>SOLUTION: The color filter is produced such that, a mask 6 held at the lower surface of a mask stage is brought close to a substrate 2 held on a substrate stage and the light for exposure irradiates the mask 6 from an irradiation means, thereby forming a black matrix 20, color filter pixels (R, G, B) or the like on the substrate 2 by exposing and transferring the pattern of the mask 6 to the substrate 2. On the top surface of the substrate for producing the color filter, a mask support 22 is formed on the upper portion of the black matrix 20 formed in advance. When the mask 6 and the substrate 2 approach each other, by having the mask support 22 abuts against the mask 6, the deflection of the mask 6 is corrected. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a color filter for a liquid crystal display (LCD) manufactured by proximity exposure and a manufacturing method thereof.

  An LCD color filter forms a grid-like black matrix on a transparent substrate, and forms R (red), G (green), and B (blue) color filter pixels so as to fill the gaps between the grids. It is manufactured by. In forming the black matrix, a black matrix forming photosensitive agent is applied to the surface of the substrate, and exposure and development processes are performed through a black matrix mask. Next, a first color, for example, a red photosensitive colorant is applied to the substrate on which the black matrix is formed, and exposure and development processes are performed through a mask for the first color, thereby allowing R (red). Color filter pixels are formed. Next, for the second color (for example, green) and the third color (for example, blue), G (green) and B (blue) color filter pixels are formed by performing the same process as the first color.

  In the above-described exposure process for manufacturing an LCD color filter, a proximity exposure apparatus is generally used. The proximity exposure apparatus holds a substrate on a substrate stage and a mask (a black matrix mask, a first color mask, a second color mask, and the like) held on the lower surface of a mask holding frame of the mask stage. By bringing the gap width GB of both into a few tens of μm to several hundreds of μm, for example, by approaching the third color mask) and irradiating the exposure light toward the mask with an irradiation device from the side away from the substrate of the mask. This is an apparatus for exposing and transferring a mask pattern for a matrix to a substrate and exposing and transferring a mask pattern for first to third colors to the substrate.

  By the way, the proximity exposure apparatus has a method in which the mask is made the same size as the substrate and is exposed in a lump. In such a system, when a mask pattern is exposed and transferred onto a large substrate, the mask with an increased size is bent by its own weight, and the gap width with the substrate is not uniform. For this reason, the resolution is deteriorated during exposure transfer and color unevenness is likely to occur, which may reduce the quality of the color filter for LCD.

Therefore, as a technique for correcting the deflection of a mask whose size has been increased, for example, two holder members arranged so as to hold only two sides on both sides of the mask facing each other, and these holder members It is known that a mask holding part that corrects the bending of the mask by pressing the edges on both sides of the mask held by the mask from above and corrects the bending of the mask by operating the mask holder is known. (For example, Patent Document 1).
JP 2001-109160 A

However, when the mask holder is operated as in Patent Document 1, it takes time to correct the bending of the mask, which may reduce the production efficiency of the color filter for LCD.
The present invention has been made in order to eliminate such inconveniences, and by correcting the deflection of the mask, the resolution at the time of exposure transfer is improved, and a color filter for a liquid crystal display device that does not cause color unevenness is manufactured. An object of the present invention is to provide a color filter for a liquid crystal display device and a method for manufacturing the same, which can prevent the decrease in production efficiency by eliminating the work of correcting the deflection of the mask.

In order to solve the above-mentioned problems, in the color filter for a liquid crystal display device according to claim 1 of the present invention, the mask held on the lower surface of the mask stage is brought close to the substrate held on the substrate stage. The liquid crystal display device is manufactured by irradiating the mask with exposure light from an irradiating unit and exposing and transferring the mask pattern onto the substrate to form a black matrix, color filter pixels, etc. on the substrate. In the color filter, a mask support member is formed on the black matrix formed on the substrate, and the mask support member is in contact with the lower surface of the mask when the mask and the substrate are close to each other. A color filter for a liquid crystal display device that corrects the deflection of the mask.
According to a second aspect of the present invention, in the color filter for a liquid crystal display device according to the first aspect, the mask support member formed on the substrate has the mask similar to the black matrix and the color filter pixel. Columnar photo spacers formed by exposing and transferring the pattern to the substrate.

According to a third aspect of the present invention, the mask held on the lower surface of the mask stage is brought close to the substrate held on the substrate stage, and exposure light is irradiated to the mask from the irradiation means. In a color filter for a liquid crystal display device manufactured by forming a black matrix, color filter pixels, etc. on the substrate by exposing and transferring the mask pattern onto the substrate, a mask support member is formed on the lower surface of the mask And the mask support member abuts on the black matrix formed on the upper surface of the substrate to correct the deflection of the mask when the mask and the substrate are close to each other. Color filter.
According to a fourth aspect of the present invention, in the color filter for liquid crystal display according to any one of the first to third aspects, the added value of the height of the mask support member and the height of the black matrix is It is set to the same value as the gap width when the mask and the substrate are close to each other.

  On the other hand, in the invention described in claim 5, the mask held on the lower surface of the mask stage is brought close to the substrate held on the substrate stage, and the exposure light is irradiated to the mask from the irradiation means. In the method of manufacturing a color filter for a liquid crystal display device by forming a black matrix, color filter pixels, etc. on the substrate by exposing and transferring the pattern of the mask to the substrate, the lower surface of the mask and the upper surface of the substrate Forming a mask support member projecting from one of the masks, and correcting the deflection of the mask when the mask support member is positioned between the mask and the substrate when the mask and the substrate are brought close to each other A method for producing a color for a liquid crystal display device.

  According to a sixth aspect of the present invention, in the method for manufacturing a color filter for a liquid crystal display device according to the fifth aspect, the step of forming the mask support member on the upper surface of the substrate is performed on the substrate. A columnar photo spacer is formed on the black matrix by exposing and transferring the mask pattern onto the substrate.

According to the color filter for a liquid crystal display device according to the present invention, when the mask and the substrate are close to each other during the manufacturing, the upper surface of the substrate and the lower surface of the mask are formed on the mask support member formed on one of the upper surface of the substrate and the lower surface of the mask. Since the other of the two abuts and the deflection of the mask is corrected, the resolution at the time of exposure transfer is improved, and a high-quality color filter for a liquid crystal display device without color unevenness can be manufactured.
In addition, according to the method for manufacturing a color filter for a liquid crystal display device according to the present invention, the work of correcting the deflection of the mask becomes unnecessary, so that a reduction in production efficiency can be prevented.

Hereinafter, a method of manufacturing a color filter for a liquid crystal display device (LCD) according to the present invention will be described with reference to the drawings.
FIG. 1 is a view showing a proximity exposure apparatus used in the present embodiment.
In this proximity exposure apparatus, a transparent substrate 2 is placed on a substrate stage 4, a mask 6 is held by a mask stage 8, and is placed close to and opposed to the substrate 2. This is an apparatus for exposing and transferring the pattern formed on the mask 6 onto the workpiece 2 by irradiating the mask 6.

  Reference numeral 12 in FIG. 1 denotes a Y-axis feed base that moves the substrate stage 4 in the Y-axis direction, and an X-axis feed base 14 that moves the substrate stage 4 in the X-axis direction is installed on the Y-axis feed base 12. Has been. Further, the substrate stage 4 is installed on the X-axis feed base 14 so as to be movable in the Z-axis direction (in the direction approaching or separating from the mask). The workpiece 2 on the substrate stage 4 is held by being vacuumed by a workpiece chuck or the like.

The mask stage 8 is inserted in a mask frame 16 having a substantially rectangular frame and a central opening of the mask frame 16 through a gap, and is movable in the X, Y, and θ directions (in the X and Y planes). The mask + frame 16 is held in a fixed position above the substrate stage 4 by a support column 19 protruding from an apparatus base (not shown).
An inwardly extending flange is provided along the entire circumference of the opening on the lower surface of the central opening of the mask holding frame 18, and a mask 6 on which a pattern to be exposed is drawn on the lower surface of the flange. It is held by vacuum suction with a work chuck or the like.

Next, a manufacturing procedure of the first embodiment of the color filter for LCD using the proximity exposure apparatus having the above-described configuration will be described with reference to FIGS.
First, a photosensitive resin for forming a black matrix is applied on a transparent substrate 2, and this substrate 2 is placed on a substrate stage 4. Next, the mask 6 on which the black matrix pattern is drawn is held by the mask stage 8. Then, by irradiating exposure light from the irradiation device 10 to the mask 6 for black matrix, a lattice-like black matrix 20 is formed on the substrate 2 as shown in FIG. Then, after the black matrix 20 is formed, a development process is performed.
Next, a photosensitive resin for forming a photo spacer is applied on the substrate 2 on which the black matrix 20 is formed, and the substrate 2 is placed on the substrate stage 4. In addition, as the photosensitive resin for forming the photo spacer, Teflon (registered trademark) excellent in dissociation and hydrophobicity is preferable.

  Next, although not shown, the mask 6 on which the photospacer pattern is drawn is held by the mask stage 8. Then, by exposing the exposure light from the irradiation device 10 to the photo spacer mask, as shown in FIG. 3, columnar photo spacers 22 are formed on the black matrix 20. A plurality of photo spacers 22 are formed over substantially the entire surface of the substrate 2, and the height of the black matrix 20 and the height of the photo spacer 22 is set to H and protrudes. The height H corresponds to the gap width GB between the substrate 2 and the mask 6 when the proximity exposure apparatus performs exposure transfer. The photo spacer 22 is a member for providing a predetermined gap between the LCD color filter and the transistor side substrate by contacting the transistor side substrate disposed opposite to the LCD color filter.

  Next, a red photosensitive colorant of the first color is applied on the substrate 2 on which the black matrix 20 and the photo spacer 22 are formed, and placed on the substrate stage 4. Next, the mask 6 on which the first color pattern is drawn is held by the mask stage 8. Then, the mask 6 is moved closer to the substrate 2 by moving the mask stage 8 downward, and the mask 6 is placed on a plurality of photo spacers 22 formed on the substrate 2 as shown in FIG. Then, R (red) color filter pixels are formed at predetermined positions between the black matrixes 20 by irradiating light for exposure from the irradiation device 10 to the mask 6 for the first color. Then, after the R (red) color filter pixels are formed, a development process is performed.

  Next, a green photosensitive colorant of the second color is applied on the substrate 2 on which R (red) color filter pixels are formed, and placed on the substrate stage 4. Next, the mask 6 on which the second color pattern is drawn is held by the mask stage 8. Then, the mask 6 is moved closer to the substrate 2 by moving the mask stage 8 downward, and the mask 6 is placed on a plurality of photo spacers 22 formed on the substrate 2 as shown in FIG. Then, the light for exposure is irradiated from the irradiation device 10 to the mask 6 for the second color, thereby forming G (green) color filter pixels at predetermined positions between the black matrices 20. Then, after the G (green) color filter pixels are formed, a development process is performed.

Next, a blue photosensitive colorant of the third color is applied on the substrate 2 on which the G (green) color filter pixels are formed, and placed on the substrate stage 4. Next, the mask 6 on which the third color pattern is drawn is held by the mask stage 8. Then, the mask 6 is moved closer to the substrate 2 by moving the mask stage 8 downward, and the mask 6 is placed on a plurality of photo spacers 22 formed on the substrate 2 as shown in FIG. Then, the exposure light is emitted from the irradiation device 10 to the mask 6 for the third color, whereby B (blue) color filter pixels are formed at predetermined positions between the black matrices 20. Then, after the B (blue) color filter pixels are formed, a development process is performed.
Further, although not shown, a transparent overcoat layer is formed on the R (red), G (green), and B (blue) color filter pixels formed on the substrate 2.

  Therefore, in the present embodiment, when R (red), G (green), and B (blue) color filter pixels are formed in the manufacture of a color filter for LCD, the same height is provided over substantially the entire surface of the substrate 2. Since the mask 6 is placed on the plurality of photo spacers 22 protruding at H, the mask 6 can be prevented from bending. The height H of the photo spacer 22 coincides with the gap width GB between the substrate 2 and the mask 6 that are close to each other in the proximity exposure, so that the mask 6 is simply placed on the photo spacer 22. The optimal gap width is set. Therefore, according to the present embodiment, the resolution at the time of exposure transfer is improved, and a high quality LCD color filter without color unevenness can be manufactured.

Further, in the present embodiment, the work for correcting the deflection of the mask 6 is not required, so that it is possible to prevent the production efficiency of the LCD color filter from being lowered.
Furthermore, a photosensitive resin for forming a photo spacer is applied onto the substrate 2 on which the black matrix 20 is formed, and the exposure light of the irradiation device 10 is simply irradiated onto the mask 6 on which the photo spacer pattern is drawn. Since the columnar photospacer 22 is easily formed on 2, the photospacer 22 can be efficiently formed.

Next, the manufacturing procedure of the color filter for LCD of 2nd Embodiment which concerns on this invention is demonstrated with reference to FIG.1, FIG.2, FIG.5 and FIG. In addition, the same code | symbol is attached | subjected to the same component as 1st Embodiment, and the description is abbreviate | omitted.
In this embodiment, first, as shown in FIG. 2 of the first embodiment, a grid-like black matrix 20 is formed on the substrate 2.
Next, as shown in FIG. 5, a photo-resin forming photosensitive resin is applied on the mask 6 on which the first color (red) eye pattern P1 is drawn. Then, the photo spacer 22 is formed on the surface of the mask 6 other than the region where the first color pattern P1 is drawn by irradiating the mask 6 with exposure light.

  Then, the mask 6 on which the first color pattern P1 and the photo spacer 22 are formed is held by the mask stage 8. Then, the mask stage 8 is moved downward, and the mask 6 is moved to the substrate 2 until the photo spacer 22 formed on the lower surface of the mask 6 contacts the black matrix 20 formed on the upper surface of the substrate 2 as shown in FIG. Keep it close to. Thus, in a state where the mask 6 is close to the substrate 2, the total height of the black matrix 20 and the photo spacer 22 is H. This height H coincides with the gap width GB between the substrate 2 and the mask 6 when the proximity exposure apparatus performs exposure transfer. The exposure device 10 irradiates exposure light to the mask 6 on which the first color pattern P1 and the photo spacer 22 are formed, so that R (red) is applied to a predetermined position between the photo spacer 22 and the black matrix 20. Color filter pixels are formed. Then, after the R (red) color filter pixels are formed, a development process is performed.

Next, although not shown, a black matrix forming photosensitive resin is applied to the mask 6 on which the second color (green) eye pattern is drawn, and the mask 6 is irradiated with exposure light. As a result, a photo spacer is formed on the surface of the mask 6 other than the region where the second color pattern is drawn. Next, the mask 6 on which the second color pattern and the photo spacer are formed is held by the mask stage 8. Then, the mask stage 8 is moved downward, the photo spacer formed on the lower surface of the mask 6 contacts the black matrix 20 formed on the upper surface of the substrate 2, and the combined height of the black matrix 20 and the photo spacer is When the gap width GB between the substrate 2 and the mask 6 coincides, exposure light is irradiated from the irradiation device 10 to the mask 6 on which the second color pattern and the photo spacer are formed. Thus, G (green) color filter pixels are formed at predetermined positions between the photo spacer and the black matrix 20. Then, after the G (green) color filter pixels are formed, a development process is performed.
Then, similarly to the first color red step and the second color green step, the third color blue step is also performed.

Also in this embodiment, when forming R (red), G (green), and B (blue) color filter pixels in the manufacture of LCD color filters, the mask 6 is moved to the substrate 2 by moving the mask stage 8 downward. When approaching upward, the photo spacer 22 formed on the lower surface of the mask 6 comes into contact with the bracket matrix 20 formed on the upper surface of the substrate 2, and the bending of the mask 6 can be eliminated. Then, the height H of the black matrix 20 and the height of the photo spacer 22 is equal to the gap width GB between the substrate 2 and the mask 6 that are close to each other in the proximity exposure. The optimum gap width is set by simply bringing 6 close to the substrate 2. Therefore, this embodiment also improves the resolution at the time of exposure transfer, can produce a high-quality LCD color filter without color unevenness, and eliminates the need to correct the deflection of the mask 6. It is possible to prevent a decrease in production efficiency of the color filter for LCD.
Moreover, the mask 6 of this embodiment can also exhibit the effect that the photo spacers 22 formed outside the region where the first color pattern to the third color pattern are drawn serve as a pattern protection member.

It is a figure which shows the outline | summary of the proximity exposure apparatus which concerns on this invention. It is a figure which shows the process of forming a black matrix on the upper surface of a board | substrate in the manufacturing process of the color filter for liquid crystal display devices of 1st or 2nd embodiment which concerns on this invention. It is a figure which shows the process of forming a photo spacer in the manufacturing process of the color filter for liquid crystal display devices of 1st Embodiment which concerns on this invention. It is a figure which shows the process of forming a color filter pixel in the manufacturing process of the color filter for liquid crystal display devices of 1st or 2nd embodiment which concerns on this invention. It is a figure which shows the process of forming a photo spacer other than the area | region where the pattern of the mask is drawn in the manufacturing process of the color filter for liquid crystal display devices of 2nd Embodiment which concerns on this invention. The figure which shows the process of making the photo spacer formed in the mask contact | abut to the black matrix formed in the board | substrate by making a mask adjoin to a board | substrate in the manufacturing process of the color filter for liquid crystal display devices of 2nd Embodiment which concerns on this invention. is there.

Explanation of symbols

2 Substrate 4 Substrate stage 6 Mask 8 Mask stage 10 Irradiation device 16 Mask frame 18 Mask holding frame 20 Black matrix 22 Photo spacer (mask support member)
R Red color filter pixel (color filter pixel)
G Green color filter pixel (color filter pixel)
B Blue color filter pixel (color filter pixel)
GB gap width

Claims (6)

The mask held on the lower surface of the mask stage is brought close to the substrate held on the substrate stage, the exposure light is irradiated to the mask from the irradiation means, and the pattern of the mask is exposed to the substrate In a color filter for a liquid crystal display device manufactured by forming a black matrix, a color filter pixel or the like on the substrate by transferring,
A mask support member is formed on an upper portion of the black matrix formed on the substrate, and the mask support member abuts on the lower surface of the mask when the mask and the substrate come close to each other, and the mask is bent. A color filter for a liquid crystal display device characterized by correcting the above.   The mask support member formed on the substrate is a columnar photo spacer formed by exposing and transferring the pattern of the mask to the substrate, similarly to the black matrix and the color filter pixels. The color filter for a liquid crystal display device according to claim 1. The mask held on the lower surface of the mask stage is brought close to the substrate held on the substrate stage, the exposure light is irradiated to the mask from the irradiation means, and the pattern of the mask is exposed to the substrate In a color filter for a liquid crystal display device manufactured by forming a black matrix, a color filter pixel or the like on the substrate by transferring,
A mask support member is formed on the lower surface of the mask, and the mask support member comes into contact with the black matrix formed on the upper surface of the substrate when the mask and the substrate are close to each other, thereby bending the mask. A color filter for a liquid crystal display device characterized by correcting.   4. The added value of the height of the mask support member and the height of the black matrix is set to the same value as the gap width when the mask and the substrate are close to each other. The color filter for liquid crystal display of any one of these. The mask held on the lower surface of the mask stage is brought close to the substrate held on the substrate stage, the exposure light is irradiated to the mask from the irradiation means, and the pattern of the mask is exposed to the substrate In a method for producing a color filter for a liquid crystal display device by forming a black matrix, a color filter pixel or the like on the substrate by transferring,
Forming a mask support member protruding from one of the lower surface of the mask and the upper surface of the substrate;
A step of correcting the deflection of the mask by positioning the mask support member between the mask and the substrate when the mask and the substrate are brought close to each other. Color manufacturing method.   When performing the step of forming the mask support member on the upper surface of the substrate, columnar photo spacers are formed on the black matrix formed on the substrate by exposing and transferring the mask pattern onto the substrate. The method for producing a color filter for a liquid crystal display device according to claim 5, wherein the color filter is formed.

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