JP2007023420A - Process release material - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a process release material given by using an acrylic resin as a material for a release layer, improved in releasability of the release layer from artificial leather, capable of being prevented from adhesion of a resin of the release layer to an embossing roll in case of emboss processing, and having the release layer furnished with an embossed pattern of a clear profile. <P>SOLUTION: This process release material is characterized so that the material is equipped with the release layer having the embossed pattern and comprising a cured film of the acrylic ionizing radiation-curing resin on a base material and a metal or metal oxide film is formed on the release layer. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a process release material.

Conventionally, synthetic leather is coated with a polyurethane solution on a release paper to form a surface layer, dried and solvent evaporated, and then an adhesive layer is applied on the surface layer and bonded to a substrate made of woven or non-woven fabric. And after curing at a temperature of 40 ° C. for about 2 days, after which the release paper is peeled off and finished by finishing such as printing and gloss adjustment (see Non-Patent Document 1). As a release paper used for the production of this synthetic leather, there is a process release paper having a release layer made of an electron beam curable resin composition mainly composed of acrylate. However, release paper having a release layer made of an electron beam curable resin composition containing acrylate as a main component and acrylate has a higher polarity than silicone, and the synthetic leather is often peeled off, and often cannot be peeled off at all. Even if a release material such as silicone oil is added to the electron beam curable coating composition constituting the release layer in order to improve the synthetic leather release properties of this release paper, the added silicone oil will effectively surface when cast. In some cases, the effect of improving peelability may not be obtained. In addition, even if the peelability improvement effect was initially seen, the repeated release of the synthetic leather would result in the release of the peelable material on the surface of the process being peeled off by the synthetic leather, reducing the peelability improvement effect. There has been a problem of the problem (see Patent Document 1).
The Chemical Society of Japan, Chemical Handbook, Applied Chemistry, Maruzen Co., Ltd., October 15, 1986, P, 685-686 Japanese Patent Publication No. 63-2780

  The subject of this invention is providing the process mold release material which eliminated the above-mentioned conventional fault, improved the peelability with the synthetic leather of a mold release layer, using acrylic resin as a material of a mold release layer. .

  The invention according to claim 1 solves the above-described problem, and a release layer made of a cured film of an acrylic ionizing radiation curable resin having an embossed pattern is provided on a substrate, and the release layer is provided on the release layer. A gist is a process release material for producing synthetic leather, which is provided with a thin film of metal or metal oxide.

  In the present invention, a metal or metal oxide vapor-deposited film can be applied as the metal or metal oxide thin film.

  In the process release material of the present invention, a release layer made of a cured film of an acrylic ionizing radiation curable resin having an emboss pattern is provided on a base material, and a thin film of metal or metal oxide is provided on the release layer. Since the release layer made of a cured film of an acrylic ionizing radiation curable resin is covered with a metal or metal oxide thin film, the release layer is inactivated against -NCO. As a result, the releasability from the surface layer of the synthetic leather coated thereon is improved. Further, it is not necessary to include a release agent or the like in the release layer as in the prior art. Moreover, the resin of a release layer does not adhere to an embossing roll at the time of embossing, and the emboss pattern with a clear outline can be provided to a release layer.

  FIG. 1 shows a process release material of the present invention.

  As shown in FIG. 1, the process release material 5 of the present invention includes a release layer 2 made of a cured film of an acrylic ionizing radiation curable resin having an embossed pattern 3 on a substrate 1, and this release layer 2. A thin film 4 of metal or metal oxide is provided thereon. Since it is comprised in this way, the release layer 2 is inactive with respect to -NCO contained in the adhesive used for manufacturing synthetic leather by being covered with the metal or metal oxide thin film 4 Therefore, the releasability with the surface layer of the synthetic leather coated thereon is improved. Further, it is not necessary to include a release agent or the like in the release layer 2 as in the prior art. Moreover, the resin of a release layer does not adhere to an embossing roll at the time of embossing, and the emboss pattern with a clear outline can be provided to a release layer.

In the present invention, the substrate 1 may be clay-coated heat-resistant neutral paper, biaxially stretched polypropylene film, polyester film, or the like having good heat resistance. When paper is used as a base material, it is particularly composed of a base paper having a clay coat layer on one side, and the base paper has a tensile strength according to JISP8113 of at least 10 KN / mN or more in the longitudinal direction even when left at 230 ° C. for 3 minutes. It is maintained and is a neutral paper having heat resistance in which the tear strength according to JISP 8116 is maintained at 500 mN or more in both the vertical and horizontal directions, and the clay coat layer absorbs surface irregularities due to pulp fibers of the base paper In particular, a base paper having a smoothness according to JISP8119 of 100 seconds or more is preferable. This base paper can withstand repeated use more than 5 times in the synthetic leather manufacturing process and transfer the mold of the release paper with high transfer accuracy without causing the elongation of the release paper during the transfer process. Form. Moreover, it is preferable that the basic weight of a paper base material is 100-200 g / m < ² > from the surface of the intensity | strength as a product, synthetic leather processing workability | operativity, the repeated use durability of a release paper, and embossing suitability. When the basis weight is lower than 100 g / m ² , curling and undulation are likely to occur during the production of synthetic leather. On the contrary, when the basis weight is higher than 200 g / m ² , the embossability is poor, and when the release paper is thick, the winding diameter is increased and workability is lowered. The clay coating amount is preferably 5 to 540 g / m ² . If it is less than 5 g / m ² , the required smoothness cannot be obtained. On the other hand, if it exceeds 40 g / m ² , the embossing property of the embossing is lowered.

Next, typical resins that can be used as the material of the release layer 2 in the present invention are as follows.
(1) Polyester acrylate and polyester methacrylate.
(2) Urethane acrylate and urethane methacrylate.
(3) Monofunctional acrylate, monofunctional methacrylate, acryloyl compound, acrylamide compound; for example, methyl acrylate, ethyl acrylate, butyl acrylate, 2-ethylhexyl acrylate, 2-hydroxyethyl acrylate, 2-hydroxy methacrylate, 2-hydroxypropyl acrylate, Tetrahydrofurfuryl acrylate, phenoxyethyl acrylate, cyclohexyl acrylate, cyclohexyl methacrylate, acryloyl morpholine, benzyl acrylate, glycidyl methacrylate, N, N-dimethylaminoethyl acrylate, N, N-diethylaminoethyl methacrylate, butoxyethyl acrylate, acrylamide ether compound, etc. . Ethylene oxide-modified phenoxylated phosphoric acid acrylate, ethylene oxide-modified butoxylated phosphoric acid acrylate, and the like.

(4) Polyfunctional acrylate, polyfunctional methacrylate; for example, 1,6-hexanediol diacrylate, 1,6-hexanediol dimethacrylate, neopentyl glycol diacrylate, diethylene glycol diacrylate, polyethylene glycol dimethacrylate, polyethylene glycol dimethacrylate , Polypropylene glycol diacrylate, polypropylene glycol dimethacrylate, pentaerythritol triacrylate, isocyanuric acid triacrylate, trimethylolpropane triacrylate, trimethylolpropane trimethacrylate, ethylene oxide modified pentaerythritol tetraacrylate, propylene oxide modified dipentaerythritol polyacrylate, penta Erisrito Acrylate acrylic acid adduct.
(5) Epoxy acrylate and epoxy methacrylate.

  Next, as the metal or metal oxide thin film 3, aluminum (Al), silicon (Si), tin (Sn), titanium (Ti), lead formed by vacuum deposition, ion plating, sputtering, or the like is used. Metals such as (Pb), or aluminum (Al), silicon (Si), tin (Sn), titanium (Ti), lead (Pb), magnesium (Mg), calcium (Ca), potassium (K), sodium ( A thin film of a metal oxide such as Na), boron (B), zirconium (Zr), or yttrium (Y) can be used.

  Next, the manufacturing process of the mold release material of this invention is demonstrated.

  First, as shown in FIG. 2, the base material 1 is unwound from the take-up roll 11 of the base material 1, a coating material 7 containing an acrylic ionizing radiation curable resin is applied in the coating part 6, and the solvent in the drying part 8. Is embossed in the embossing section 9 and then irradiated with ultraviolet rays or an electron beam by the ionizing radiation irradiating apparatus 10 to cure the acrylic ionizing radiation resin layer having the embossed pattern, thereby winding the roll 12. Form.

Next, as shown in FIG. 3, on the substrate 1 obtained as described above, an acrylic ionizing radioactive resin cured film having an embossed pattern is provided, and then a take-up vacuum deposition apparatus as shown in FIG. 21 is used to form a metal or metal oxide thin film 4. The wind-up type vapor deposition apparatus 21 includes a vacuum chamber 22 whose inside is maintained at a pressure lower than 10 ⁻² Pa. Inside the vacuum chamber 22 is an unwinding unit 23, guide rolls 24 and 25, and a cooled coating drum 26. The guide rolls 27 and 28 and the winding unit 29 are provided, and a metal or metal oxide evaporation source M and an evaporation source M are held below the coating drum 26 via masks 32 and 32. A crucible 30 for heating and an oxygen gas outlet 31 are provided.

  In the winding type vacuum vapor deposition apparatus 21, the winding roll 12 obtained as described above is attached to the unwinding part 23, and the base material 1 extends from the unwinding part 23 to the release layer 2 side downward. It is unwound and guided to the guide rolls 24 and 25 and sent to the coating drum 26. On the other hand, the crucible 30 is heated to evaporate, for example, metal aluminum or aluminum oxide from the evaporation source M, and if necessary, oxygen gas is blown out from the oxygen gas blowing port 31 through the masks 32 and 32. The metal or metal oxide thin film (vacuum deposited film) 3 is formed by colliding with the release layer 2 on the substrate 1 conveyed on the coating drum 26, and wound around the winding unit 29.

  The thickness of the metal or metal oxide thin film is preferably about 100 to 1000 mm. If the thickness of the metal or metal oxide thin film is less than 100 mm, cracks are likely to occur and sufficient peelability is not obtained, which is not preferable. On the other hand, if the thickness of the metal or metal oxide exceeds 1000 mm, it is not preferable because the production cost is excessive.

  Next, the present invention will be described in more detail with reference to examples and comparative examples.

A ratio of 3 wt% of initiator (Ciba Specialty Chemicals: Irgacure 907) to a coating liquid mainly composed of trimethylolpropane triacrylate resin (softening point: 37 ° C.) on paper (basis weight 125 g / m ² ) The mixture before was applied with about 21 g / m ² with a reverse coater to obtain an original plate before embossing. Thereafter, heat embossing was performed at an embossing temperature of 80 ° C. using an embossing roll having a lattice pattern embossing pattern with an embossing group (manufactured by Yuri Roll Machinery). Thereafter, using a 160 W / cm high-pressure mercury lamp furnace, the surface resin was UV-cured. Thereafter, in order to inactivate the surface, an aluminum vapor deposition film having a thickness of 500 mm is formed by a vacuum vapor deposition method using an electron beam (EB) heating method using aluminum as a vapor deposition source in a batch type vacuum vapor deposition apparatus. A release paper was prepared. Actually, in order to make a synthetic leather using this release paper for synthetic leather, 1 liquid PU (Chrisbon NB-130, manufactured by Dainippon Ink and Chemicals), 2 liquid adhesive (Chrisbon 4070, Crisbon NX, Crisbon HM) ), Formed on the release paper in the order of the back skin, subjected to aging at 40 ° C. for 2 days, and then peeled off the release paper from the release paper. As a result, the release paper and the release leather could be peeled smoothly.

[Comparative example]
A release paper for synthetic leather was produced in the same manner as in the Examples, but without performing the vapor deposition step on the surface with hot embossing. In order to make synthetic leather using this release paper for synthetic leather, 1 liquid PU (Chrisbon NB-130, manufactured by Dainippon Ink and Chemicals), 2 liquid adhesive (Chrisbon 4070, Crisbon NX, Crisbon HM), backskin order When formed on a release paper, aged at 40 ° C. for 2 days, and then peeled off the peel from the release paper, the produced leather was not peeled off from the release paper, and a usable leather could not be obtained.

  The process release material of the present invention can be used for the production of synthetic leather such as polyurethane synthetic leather and polyvinyl chloride synthetic leather.

It is sectional drawing of the process release material of this invention. It is sectional drawing which shows the process in which the mold release layer with an embossing is formed in manufacture of the process release material of this invention. 1 is a schematic view of a take-up vacuum deposition apparatus used in the process of forming a metal or metal oxide deposition film on an embossed release layer.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Base material 2 Release layer 3 Emboss 4 Metal or metal oxide thin film 5 Process release material 6 Coating part 7 Coating material 8 Drying part 9 Embossing part 10 Ionizing radiation irradiation apparatus 11 Winding roll 12 Winding roll

Claims (1)

A synthetic leather manufacturing comprising a release layer comprising a cured film of an acrylic ionizing radiation curable resin having an embossed pattern on a substrate, and a thin film of metal or metal oxide provided on the release layer Process release material.

Images