JP2007014944A5 - - Google Patents
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- Publication number
- JP2007014944A5 JP2007014944A5 JP2006141909A JP2006141909A JP2007014944A5 JP 2007014944 A5 JP2007014944 A5 JP 2007014944A5 JP 2006141909 A JP2006141909 A JP 2006141909A JP 2006141909 A JP2006141909 A JP 2006141909A JP 2007014944 A5 JP2007014944 A5 JP 2007014944A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- nozzles
- solution
- held
- support base
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000758 substrate Substances 0.000 claims 30
- 238000000576 coating method Methods 0.000 claims 12
- 239000011248 coating agent Substances 0.000 claims 9
- 238000007599 discharging Methods 0.000 claims 8
- 239000004744 fabric Substances 0.000 claims 6
- 239000011159 matrix material Substances 0.000 claims 6
- 240000004282 Grewia occidentalis Species 0.000 claims 2
Claims (11)
前記回転支持台に保持された前記基板と対向して設けられ、前記基板に溶液を吐出する複数のノズルと、
前記複数のノズルを各々自在に移動させる駆動機構とを有することを特徴とする塗布装置。 A rotating support for holding the substrate;
The rotating support base provided the substrate and a counter which is held, a plurality of nozzles for discharging the solution into the substrate,
Coated cloth device; and a driving mechanism for moving each freely said plurality of nozzles.
前記回転支持台に保持された前記基板と対向して設けられ、前記基板に溶液を吐出する複数のノズルと、
前記複数のノズルを各々自在に移動させる駆動機構と、
前記溶液を収納するタンクと、
前記タンクに配管を介して連結され、前記複数のノズルから吐出する溶液量を制御する制御部とを有することを特徴とする塗布装置。 A rotating support for holding the substrate;
The rotating support base provided the substrate and a counter which is held, a plurality of nozzles for discharging the solution into the substrate,
A drive mechanism for freely moving each of the plurality of nozzles ;
A tank for storing the previous Symbol solution,
The tank is connected via a pipe, coated fabric device you; and a control unit for controlling the amount of solution to be discharged from the plurality of nozzles.
前記回転支持台に保持された前記基板と対向してマトリクス状に設けられたガイドレールと、Guide rails provided in a matrix so as to face the substrate held on the rotation support base,
前記ガイドレールに保持され、前記基板に溶液を吐出する複数のノズルとを有し、A plurality of nozzles that are held by the guide rail and discharge the solution to the substrate;
前記複数のノズルは、ガイドレールに沿って各々自在に移動可能であることを特徴とする塗布装置。The coating device, wherein the plurality of nozzles are freely movable along guide rails.
前記回転支持台に保持された前記基板と対向してマトリクス状に設けられたガイドレールと、
前記ガイドレールに保持され、前記基板に溶液を吐出する複数のノズルと、
前記溶液を収納するタンクと、
前記タンクに配管を介して連結され、前記複数のノズルから吐出する溶液量を制御する制御部とを有し、
前記複数のノズルは、ガイドレールに沿って各々自在に移動可能であることを特徴とする塗布装置。 A rotating support for holding the substrate;
A guide rail provided in a matrix in the substrate and a counter which is held on the rotating support base,
The held in the guide rail, a plurality of nozzles for discharging the solution into the substrate,
A tank for storing the solution ;
A controller connected to the tank via a pipe and controlling the amount of solution discharged from the plurality of nozzles;
Wherein the plurality of nozzles, the coating fabric device you characterized in that along the guide rails are each freely movable.
前記回転支持台に保持された基板と対向してマトリクス状に設けられたガイドレールと、Guide rails provided in a matrix so as to face the substrate held on the rotation support table,
前記ガイドレールに保持され、前記基板に溶液を吐出する複数のノズルとを有する塗布装置を用いた塗布方法であって、A coating method using a coating apparatus having a plurality of nozzles that are held by the guide rail and discharge a solution to the substrate,
前記ガイドレールに沿って前記複数のノズルを各々自在に移動させて所定の位置に配置し、A plurality of the nozzles are freely moved along the guide rails and arranged at predetermined positions,
前記複数のノズルから前記回転支持台上に保持された基板に溶液を吐出し、Discharging the solution from the plurality of nozzles onto the substrate held on the rotating support base;
前記回転支持台を回転することを特徴とする塗布方法。An application method comprising rotating the rotation support base.
前記回転支持台に保持された基板と対向してマトリクス状に設けられたガイドレールと、
前記ガイドレールに保持され、前記基板に溶液を吐出する複数のノズルと、
前記溶液を収納するタンクと、
前記タンクに配管を介して連結され、前記複数のノズルから吐出する溶液量を制御する制御部とを有する塗布装置を用いた塗布方法であって、
前記ガイドレールに沿って前記複数のノズルを各々自在に移動させて所定の位置に配置し、
前記複数のノズルから前記回転支持台上に保持された基板に溶液を吐出し、
前記回転支持台を回転することを特徴とする塗布方法。 A rotating support for holding the substrate;
Guide rails provided in a matrix so as to face the substrate held on the rotation support table ,
The held in the guide rail, a plurality of nozzles for discharging the solution into the substrate,
A tank for storing the solution ;
The tank is connected via a pipe, I coated fabric method der using the coating cloth device that having a control unit for controlling the amount of solution to be discharged from the plurality of nozzles,
A plurality of the nozzles are freely moved along the guide rails and arranged at predetermined positions,
Discharging the solution from the plurality of nozzles onto the substrate held on the rotating support base ;
Coated cloth how to characterized by rotating the rotating support base.
前記回転支持台に保持された基板と対向してマトリクス状に設けられたガイドレールと、Guide rails provided in a matrix so as to face the substrate held on the rotation support table,
前記ガイドレールに保持され、前記基板に溶液を吐出する複数のノズルとを有する塗布装置を用いた塗布方法であって、A coating method using a coating apparatus having a plurality of nozzles that are held by the guide rail and discharge a solution to the substrate,
前記ガイドレールに沿って前記複数のノズルを各々自在に移動させて少なくとも基板の四隅端の位置に配置し、The plurality of nozzles are freely moved along the guide rails, and are arranged at least at the four corner ends of the substrate,
前記複数のノズルから前記回転支持台上に保持された基板に溶液を吐出し、Discharging the solution from the plurality of nozzles onto the substrate held on the rotating support base;
前記回転支持台を回転することを特徴とする塗布方法。An application method comprising rotating the rotation support base.
前記回転支持台に保持された基板と対向してマトリクス状に設けられたガイドレールと、Guide rails provided in a matrix so as to face the substrate held on the rotation support table,
前記ガイドレールに保持され、前記基板に溶液を吐出する複数のノズルと、A plurality of nozzles that are held by the guide rail and that discharge the solution to the substrate;
前記溶液を収納するタンクと、A tank for storing the solution;
前記タンクに配管を介して連結され、前記複数のノズルから吐出する溶液量を制御する制御部とを有する塗布装置を用いた塗布方法であって、A coating method using a coating apparatus connected to the tank via a pipe and having a control unit for controlling the amount of solution discharged from the plurality of nozzles;
前記ガイドレールに沿って前記複数のノズルを各々自在に移動させて少なくとも基板の四隅端の位置に配置し、The plurality of nozzles are freely moved along the guide rails, and are arranged at least at the four corner ends of the substrate,
前記複数のノズルから前記回転支持台上に保持された基板に溶液を吐出し、Discharging the solution from the plurality of nozzles onto the substrate held on the rotating support base;
前記回転支持台を回転することを特徴とする塗布方法。An application method comprising rotating the rotation support base.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006141909A JP4954610B2 (en) | 2005-06-10 | 2006-05-22 | Coating apparatus, coating method, and manufacturing method of semiconductor device |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005170921 | 2005-06-10 | ||
JP2005170921 | 2005-06-10 | ||
JP2006141909A JP4954610B2 (en) | 2005-06-10 | 2006-05-22 | Coating apparatus, coating method, and manufacturing method of semiconductor device |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2007014944A JP2007014944A (en) | 2007-01-25 |
JP2007014944A5 true JP2007014944A5 (en) | 2009-07-02 |
JP4954610B2 JP4954610B2 (en) | 2012-06-20 |
Family
ID=37752549
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006141909A Expired - Fee Related JP4954610B2 (en) | 2005-06-10 | 2006-05-22 | Coating apparatus, coating method, and manufacturing method of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4954610B2 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5521731B2 (en) * | 2010-04-20 | 2014-06-18 | 凸版印刷株式会社 | Development processing method and development processing apparatus |
JP6203098B2 (en) * | 2013-03-29 | 2017-09-27 | 芝浦メカトロニクス株式会社 | Substrate processing apparatus and substrate processing method |
JP6321699B2 (en) * | 2016-02-23 | 2018-05-09 | 本田技研工業株式会社 | Coating apparatus and coating method |
CN116981182B (en) * | 2018-04-04 | 2024-05-21 | 苏州康尼格电子科技股份有限公司 | PCBA (printed circuit board assembly) board packaging equipment and PCBA board packaging method |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09160256A (en) * | 1995-12-07 | 1997-06-20 | Dainippon Screen Mfg Co Ltd | Liquid discharger |
JPH09319094A (en) * | 1996-05-27 | 1997-12-12 | Mitsubishi Electric Corp | Spin coating method and spin coating device |
JP3338804B2 (en) * | 1999-08-31 | 2002-10-28 | 秋田日本電気株式会社 | Resist coating apparatus and method |
JP3754322B2 (en) * | 2001-05-24 | 2006-03-08 | 東京エレクトロン株式会社 | Coating film forming method and apparatus |
JP4068437B2 (en) * | 2001-11-26 | 2008-03-26 | 東京エレクトロン株式会社 | Coating film forming device |
JP2004237157A (en) * | 2003-02-04 | 2004-08-26 | Matsushita Electric Ind Co Ltd | Rotary coating apparatus |
JP2004275989A (en) * | 2003-03-19 | 2004-10-07 | Sumitomo Precision Prod Co Ltd | Substrate processing apparatus |
US7770535B2 (en) * | 2005-06-10 | 2010-08-10 | Semiconductor Energy Laboratory Co., Ltd. | Chemical solution application apparatus and chemical solution application method |
-
2006
- 2006-05-22 JP JP2006141909A patent/JP4954610B2/en not_active Expired - Fee Related
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