JP2006514161A5 - - Google Patents

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Publication number
JP2006514161A5
JP2006514161A5 JP2004568825A JP2004568825A JP2006514161A5 JP 2006514161 A5 JP2006514161 A5 JP 2006514161A5 JP 2004568825 A JP2004568825 A JP 2004568825A JP 2004568825 A JP2004568825 A JP 2004568825A JP 2006514161 A5 JP2006514161 A5 JP 2006514161A5
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JP
Japan
Prior art keywords
plasma
orifices
flow rate
reactant gases
plasmas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004568825A
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English (en)
Japanese (ja)
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JP2006514161A (ja
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Publication date
Application filed filed Critical
Priority claimed from PCT/US2003/005209 external-priority patent/WO2004076716A1/en
Publication of JP2006514161A publication Critical patent/JP2006514161A/ja
Publication of JP2006514161A5 publication Critical patent/JP2006514161A5/ja
Pending legal-status Critical Current

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JP2004568825A 2003-02-20 2003-02-20 平坦な表面上に大面積の皮膜を堆積するための装置及び方法 Pending JP2006514161A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2003/005209 WO2004076716A1 (en) 2003-02-20 2003-02-20 Apparatus and method for depositing large area coatings on planar surfaces

Publications (2)

Publication Number Publication Date
JP2006514161A JP2006514161A (ja) 2006-04-27
JP2006514161A5 true JP2006514161A5 (zh) 2006-06-15

Family

ID=32925324

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004568825A Pending JP2006514161A (ja) 2003-02-20 2003-02-20 平坦な表面上に大面積の皮膜を堆積するための装置及び方法

Country Status (6)

Country Link
EP (1) EP1597409A1 (zh)
JP (1) JP2006514161A (zh)
KR (1) KR100977955B1 (zh)
CN (1) CN1764738B (zh)
AU (1) AU2003211169A1 (zh)
WO (1) WO2004076716A1 (zh)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6743524B2 (en) * 2002-05-23 2004-06-01 General Electric Company Barrier layer for an article and method of making said barrier layer by expanding thermal plasma
US7521653B2 (en) 2004-08-03 2009-04-21 Exatec Llc Plasma arc coating system
EP2100485B1 (en) 2006-12-28 2013-05-29 Exatec, LLC. Apparatus and method for plasma arc coating
WO2008144658A1 (en) 2007-05-17 2008-11-27 Exatec, Llc Apparatus and method for depositing multiple coating materials in a common plasma coating zone
CN102618846B (zh) * 2012-04-18 2014-04-09 南京航空航天大学 一种多炬等离子体喷射cvd法沉积超硬膜的方法及装置
EP2784175A1 (fr) * 2013-03-28 2014-10-01 NeoCoat SA Equipement de dépôt de diamant en phase vapeur
CN103924210A (zh) * 2014-04-24 2014-07-16 无锡元坤新材料科技有限公司 一种等离子体沉积装置及金刚石涂层的制备方法
WO2016077345A1 (en) * 2014-11-10 2016-05-19 Superior Industries International, Inc. Method of coating alloy wheels
CN107881485B (zh) * 2017-11-01 2019-10-01 深圳市华星光电半导体显示技术有限公司 等离子体增强化学气相沉积设备及oled面板的封装方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0772341B2 (ja) * 1991-02-21 1995-08-02 中外炉工業株式会社 圧力勾配型プラズマガンによるプラズマ発生装置
US6365016B1 (en) * 1999-03-17 2002-04-02 General Electric Company Method and apparatus for arc plasma deposition with evaporation of reagents
US6397776B1 (en) * 2001-06-11 2002-06-04 General Electric Company Apparatus for large area chemical vapor deposition using multiple expanding thermal plasma generators
US6948448B2 (en) * 2001-11-27 2005-09-27 General Electric Company Apparatus and method for depositing large area coatings on planar surfaces
US6681716B2 (en) * 2001-11-27 2004-01-27 General Electric Company Apparatus and method for depositing large area coatings on non-planar surfaces
JP2003268556A (ja) * 2002-03-08 2003-09-25 Sumitomo Heavy Ind Ltd プラズマ処理装置

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